Contact cleaning system

Abstract

Embodiments of the present invention provide a conveyor for a contact cleaning system, the conveyor comprising: an inbound conveyor; and an outbound conveyor spaced apart from the inbound conveyor by a distance (A) wherein the inbound conveyor and / or outbound conveyor are / is movable relative to the other of the inbound conveyor or outbound conveyor between a retracted position, in which the distance (A) is a first distance (Aclean), and an extended position, in which the distance (A) is a second distance (Aclean), in which the distance (A) is a second distance (Aclean), in which the distance (A) is a third distance (Aclean). The distance (A) is less than the first distance (Aclean).

Description

Technical Field

[0001] The present disclosure relates to a conveyor for a contact cleaning system, and particularly, but not exclusively, to a conveyor for a contact cleaning system having an inbound conveyor and an outbound conveyor movable between a retracted position and an extended position. The present disclosure also relates to a contact cleaning system including the conveyor. Background Art

[0002] The contact cleaning system generally includes a conveyor that conveys the substrate to be cleaned to a contact cleaning roller. The contact cleaning roller has a contact surface that includes an elastomeric material. The contact cleaning roller rotates and when the contact surface engages with the surface of the substrate, the contact surface collects debris or other contaminants and removes these debris or other contaminants from the substrate surface.

[0003] Examples of prior art contact cleaning systems have an upper set of contact cleaning rollers positioned above the conveyor surface. These contact cleaning rollers clean the upper surface of the substrate only when the substrate passes under these contact cleaning rollers. If both the upper and lower surfaces of the substrate need to be cleaned, the substrate must be turned over and conveyed along the conveyor again. Turning the substrate over and repositioning it on the conveyor requires manual manipulation of the substrate, which may result in more debris being introduced onto the substrate surface.

[0004] Other examples of prior art contact cleaning systems clean the upper and lower surfaces of the substrate simultaneously. These contact cleaning systems also include a lower contact cleaning roller set positioned in the plane of the conveyor. The lower contact cleaning roller set is positioned directly below the upper contact cleaning roller set so that the upper and lower contact cleaning roller sets both clean the upper and lower surfaces of the substrate simultaneously as the substrate passes between the upper and lower contact cleaning roller sets. The inbound conveyor conveys the substrate toward the contact cleaning rollers, and the substrate is conveyed onto the lower contact cleaning rollers, which support the substrate as the substrate passes. The contact cleaning rollers rotate to clean the substrate surface and convey the substrate through the contact cleaning rollers and onto the outbound conveyor, which conveys the substrate away from the contact cleaning rollers.

[0005] These contact cleaning systems can be operated in a cleaning mode in which both the upper contact cleaning roller set and the lower contact cleaning roller set will contact the substrate. They can also be operated in an avoidance mode in which the lower contact cleaning rollers are moved away from the plane of the conveyors. This may be desirable when only the upper surface of the substrate is to be cleaned, or when the substrate is to be completely avoided from cleaning. In the avoidance mode, the substrate is not supported when it is transferred from the inbound conveyor to the outbound conveyor.

[0006] It is an object of embodiments of the present invention to at least alleviate one or more problems of the prior art. Summary of the invention

[0007] Aspects and embodiments of the present invention provide a conveyor for a contact cleaning system and a contact cleaning system as claimed in the accompanying claims.

[0008] According to one aspect of the present invention, there is provided a conveyor for a contact cleaning system, the conveyor comprising: an inbound conveyor; and an outbound conveyor, the outbound conveyor being spaced apart from the inbound conveyor by a distance (A), wherein the inbound conveyor and / or the outbound conveyor is movable relative to the other of the inbound conveyor or the outbound conveyor between a retracted position and an extended position, in which the distance (A) is a first distance (A) 清洁 ), in the extended position, the distance (A) is less than the first distance (A 清洁 ).

[0009] Advantageously, when the inbound conveyor and / or the outbound conveyor are in the extended position, a substrate being conveyed from the inbound conveyor to the outbound conveyor remains supported by the conveyor.

[0010] In certain embodiments, the inbound conveyor and the outbound conveyor may be configured to receive at least one contact cleaning roller therebetween when the inbound conveyor and the outbound conveyor are in the retracted position. The inbound conveyor and the outbound conveyor may be configured to receive at least one contact cleaning roller therebetween when the inbound conveyor and the outbound conveyor are in the retracted position, such that the substrate may be supported by the at least one contact cleaning roller as it is conveyed from the inbound conveyor to the outbound conveyor.

[0011] Advantageously, the inbound and outbound conveyors are adjustable such that in a retracted position the at least one contact cleaning roller may be received therebetween, and in an extended position the inbound and outbound conveyors may support the substrate without the at least one contact cleaning roller therebetween.

[0012] In certain embodiments, in the retracted position, surfaces of the inbound conveyor, the outbound conveyor, and the at least one contact cleaning roller may be coplanar such that a substrate conveyed from the inbound conveyor to the outbound conveyor via the at least one contact cleaning roller remains level.

[0013] Advantageously, the inbound conveyor, the outbound conveyor and the at least one contact cleaning roller convey the substrate along a horizontal surface. This can prevent damage to the substrate.

[0014] In certain embodiments, when the inbound conveyor and the outbound conveyor are in the extended position, the distance (A) may be less than the length of the substrate to be supported on the conveyor. When the inbound conveyor and the outbound conveyor are in the extended position, the distance (A) may be less than the length of the substrate to be supported on the conveyor, such that when the substrate is conveyed from the inbound conveyor to the outbound conveyor, the substrate may be supported by both the inbound conveyor and the outbound conveyor.

[0015] Advantageously, the distance (A) can be selected or adjusted based on the length of the substrate, and the substrate will be supported by the inbound and outbound conveyors without falling between these conveyors, which could result in damage to the substrate.

[0016] In some embodiments, the distance (A) may be the minimum distance (A) in the extended position. min ).

[0017] In some embodiments, the minimum distance (A min ) can be about 0.5 mm to about 50 mm. Preferably, the minimum distance (A min ) may be about 25 mm to about 45 mm. Preferably, the minimum distance (A min ) can be about 30mm to about 40mm, for example about 39mm.

[0018] In some embodiments, the distance (A) may be the maximum distance (A) in the retracted position. max ).

[0019] In some embodiments, the maximum distance (A max ) may be about 90 mm to about 110 mm. Preferably, the maximum distance (A max ) can be approximately 102mm.

[0020] In certain embodiments, the inbound conveyor may include an inbound conveyor tensioning mechanism configured to maintain the inbound conveyor in a tensioned configuration in each of the retracted position and the extended position.

[0021] In certain embodiments, the outbound conveyor may include an outbound conveyor tensioning mechanism configured to maintain the outbound conveyor in a tensioned configuration in each of the retracted position and the extended position.

[0022] In certain embodiments, the inbound conveyor and the outbound conveyor may include a tensioning mechanism configured to maintain both the inbound conveyor and the outbound conveyor in a taut configuration in each of the retracted position and the extended position.

[0023] Advantageously, the tensioning mechanism ensures that each of the inbound conveyor and / or the outbound conveyor remains taut as the inbound conveyor and / or the outbound conveyor moves between the retracted position and the extended position.

[0024] In certain embodiments, the tensioning mechanism, the inbound conveyor tensioning mechanism, and / or the outbound conveyor tensioning mechanism may include a series of pulleys arranged to support a respective conveyor, such as an inbound conveyor or an outbound conveyor, in a tensioned configuration. The series of pulleys may be attached to a frame of the inbound conveyor or a frame of the outbound conveyor. At least one pulley in the series of pulleys may be arranged to move between a first position and a second position relative to the frame of the inbound conveyor or the frame of the outbound conveyor so as to maintain the inbound conveyor or the outbound conveyor in a tensioned configuration as the inbound conveyor or the outbound conveyor moves.

[0025] In certain embodiments, the conveyor may further include at least one mechanical adjustment device configured to move the inbound conveyor and / or the outbound conveyor between a retracted position and an extended position.

[0026] In certain embodiments, the conveyor further comprises at least one pneumatic adjustment device configured to move the inbound conveyor and / or the outbound conveyor between a retracted position and an extended position.

[0027] In certain embodiments, the conveyor further comprises at least one electromechanical adjustment device configured to move the inbound conveyor and / or the outbound conveyor between a retracted position and an extended position.

[0028] Advantageously, the position of the inbound conveyor and / or the outbound conveyor may be automatically adjusted between the retracted position and the extended position without requiring manual intervention by an operator.

[0029] In certain embodiments, the inbound conveyor and / or the outbound conveyor may include a frame. The frame may include a stationary frame portion and a movable frame portion slidably connected to the stationary frame portion. The inbound conveyor and / or the outbound conveyor may be supported on both the stationary frame portion and the movable frame portion. The movable frame portion may be arranged to slide relative to the stationary frame portion to move toward the other of the inbound conveyor or the outbound conveyor.

[0030] According to another aspect of the present invention, a contact cleaning system is provided, which includes: a conveyor, wherein the conveyor is configured to support a substrate on a conveyor surface; and at least one of the following: one or more upper contact cleaning rollers, the one or more upper contact cleaning rollers being positioned above the conveyor surface, wherein the one or more upper contact cleaning rollers are movable between a cleaning position and a retracted position, in which the surfaces of the one or more upper contact cleaning rollers are arranged to contact the upper surface of the substrate conveyed from the inbound conveyor to the outbound conveyor, and in which the surfaces of the one or more upper contact cleaning rollers are facing away from the inbound conveyor. The inbound conveyor and the outbound conveyor are retracted upward; and one or more lower contact cleaning rollers, the one or more lower contact cleaning rollers are positioned below the conveyor surface, wherein the one or more lower contact cleaning rollers are movable between a cleaning position and a retracted position, in which the surfaces of the one or more lower contact cleaning rollers are coplanar with the inbound conveyor and the outbound conveyor, and in which the surfaces of the one or more lower contact cleaning rollers are retracted below the plane of the inbound conveyor and the outbound conveyor; and wherein the inbound conveyor is arranged to convey the substrate toward the one or more upper contact cleaning rollers and / or the one or more lower contact cleaning rollers.

[0031] Advantageously, by moving the inbound conveyor and / or the outbound conveyor and moving one or more lower contact cleaning rollers and / or upper contact cleaning rollers, the contact cleaning system can be adjusted to clean the top surface of the substrate, the lower surface of the substrate, both the upper and lower surfaces of the substrate, or to allow the substrate to bypass all contact cleaning rollers.

[0032] In certain embodiments, the inbound and outbound conveyors, one or more lower contact cleaning rollers, and one or more upper contact cleaning rollers can be moved between top and bottom cleaning modes, a top cleaning mode, and an avoidance mode of the contact cleaning system. In the top and bottom cleaning modes, one or more upper contact cleaning rollers are in a cleaning position, one or more lower contact cleaning rollers are in a cleaning position, and the inbound and / or outbound conveyors are in a retracted position. In the top cleaning mode, one or more upper contact cleaning rollers are in a cleaning position, one or more lower contact cleaning rollers are in a retracted position, and the inbound and / or outbound conveyors are in an extended position. In the avoidance cleaning mode, one or more upper contact cleaning rollers are in a retracted position, one or more lower contact cleaning rollers are in a retracted position, and the inbound and / or outbound conveyors are in an extended position.

[0033] In certain embodiments, the inbound conveyor and the outbound conveyor may be in a retracted position when the one or more lower contact cleaning rollers are in the retracted position. The distance between the inbound conveyor and the outbound conveyor may be sized to accommodate the one or more lower contact cleaning rollers therebetween.

[0034] Advantageously, the inbound conveyor conveys the substrate to one or more lower contact cleaning rollers to allow cleaning of the lower surface of the substrate.

[0035] In certain embodiments, the contact cleaning system may include one or more upper contact cleaning rollers, and one or more lower contact cleaning rollers.

[0036] Advantageously, when one or more lower contact cleaning rollers and one or more upper contact cleaning rollers are both in the cleaning position, both the upper and lower surfaces of the substrate can be cleaned simultaneously. Thus, the contact cleaning system is in a top and bottom cleaning mode.

[0037] Within the scope of the present application, it is expressly intended that the various aspects, embodiments, examples and alternatives listed in the preceding paragraphs, claims and / or the following description and drawings, and in particular the individual features thereof, may be adopted independently or in any combination. That is, all embodiments and / or features of any embodiment may be combined in any manner and / or combination, unless such features are incompatible. Applicants reserve the right to amend any originally filed claim or to file any new claim accordingly, including the right to amend any originally filed claim to be subordinate to any other claim and / or to include any features of any other claim, even though the claim was not initially filed in that manner. BRIEF DESCRIPTION OF THE DRAWINGS

[0038] One or more embodiments of the present invention will now be described, by way of example only, with reference to the accompanying drawings, in which:

[0039] Figure 1 The contact cleaning system according to the present invention is shown in top and bottom cleaning modes;

[0040] Figure 2 Shown in top cleaning mode Figure 1 Contact cleaning system;

[0041] Figure 3 Shows the avoidance mode Figure 1 Contact cleaning system;

[0042] Figure 4 Shown in top and bottom cleaning mode Figure 1 A magnified view of the contact cleaning system; and

[0043] Figure 5 Shown in top cleaning mode Figure 1 A magnified view of the contact cleaning system. DETAILED DESCRIPTION

[0044] Figures 1 to 3 A contact cleaning system 100 according to the present invention is shown. The contact cleaning system 100 comprises two lower contact cleaning rollers 102 and two upper contact cleaning rollers 104. The contact cleaning system 100 further comprises an inbound conveyor 106 arranged to convey substrates towards the lower contact cleaning rollers 102 and the upper contact cleaning rollers 104, and an outbound conveyor 108 arranged to convey substrates away from the lower contact cleaning rollers 102 and the upper contact cleaning rollers 104.

[0045] The inbound conveyor 106 and the outbound conveyor 108 are arranged in a single plane. In other words, the upper surface of the inbound conveyor 106 is flush with the upper surface of the outbound conveyor 108. Both the inbound conveyor 106 and the outbound conveyor 108 can be arranged in a single plane. Figure 1 The retracted position shown and Figure 2 and Figure 3 The extended positions shown are movable relative to each other, as will be discussed in further detail below. According to an alternative embodiment, only the inbound conveyor 106 or the outbound conveyor 108 is movable between the retracted position and the extended position.

[0046] The inbound conveyor 106 has an inbound conveyor tensioning mechanism 110 that holds the inbound conveyor 106 in a tensioned configuration in both the retracted position and the extended position. The outbound conveyor 108 has an outbound conveyor tensioning mechanism 112 that holds the outbound conveyor 108 in a tensioned configuration in both the retracted position and the extended position. The details of the inbound conveyor tensioning mechanism 110 and the outbound conveyor tensioning mechanism 112 will be discussed in further detail below.

[0047] The two lower contact cleaning rollers 102 are positioned below the plane of the inbound conveyor 106 and the outbound conveyor 108. The two lower contact cleaning rollers 102 are movable between a cleaning position and a retracted position, in which the surface of each of the lower contact cleaning rollers 102 is coplanar with the inbound conveyor 106 and the outbound conveyor 108, as shown in FIG. Figure 1 In the retracted position, the surface of each cleaning roller in the lower contact cleaning roller 102 is withdrawn or retracted to below the plane of the inbound conveyor 106 and the outbound conveyor 108, as Figure 2 and Figure 3In other words, when the lower contact cleaning rollers 102 are in the cleaning position, the surface of each of the lower contact cleaning rollers 102 is flush with the upper surface of the inbound conveyor 106 and the upper surface of the outbound conveyor 108. When the lower contact cleaning rollers 102 are in the retracted position, the surface of each of the lower contact cleaning rollers 102 is below the upper surface of the inbound conveyor 106 and the upper surface of the outbound conveyor 108. In the cleaning position, the lower contact cleaning rollers 102 can clean the lower surface of the substrate when the substrate is conveyed from the inbound conveyor 106 to the outbound conveyor 108. The surfaces of the lower contact cleaning rollers 102 are in the plane of the inbound conveyor 106 and the outbound conveyor 108, so that the substrate remains horizontal when the substrate is conveyed from the inbound conveyor 106 to the outbound conveyor 108. In the retracted position, the lower contact cleaning roller 102 will not contact the substrate as it is conveyed from the inbound conveyor 106 to the outbound conveyor 108 .

[0048] Two upper contact cleaning rollers 104 are positioned above the surfaces of the inbound conveyor 106 and the outbound conveyor 108. The upper contact cleaning rollers 104 are also movable between a cleaning position and a retracted position, in which the surface of each of the upper contact cleaning rollers 104 is arranged to contact the upper surface of a substrate conveyed from the inbound conveyor to the outbound conveyor, such as Figure 1 and Figure 2 In the retracted position, the surface of each cleaning roller in the upper contact cleaning roller 104 is withdrawn or retracted upward away from the inbound conveyor 106 and the outbound conveyor 108, such as Figure 3 In the cleaning position, the upper contact cleaning roller 104 can clean the upper surface of the substrate when the substrate is conveyed from the inbound conveyor 106 to the outbound conveyor 108. In the retracted position, the upper contact cleaning roller 104 will not contact the substrate when the substrate is conveyed from the inbound conveyor 106 to the outbound conveyor 108.

[0049] The lower contact cleaning roller 102 and the upper contact cleaning roller 104 have an elastomeric outer layer. When the substrate contacts the elastomeric outer layer, the elastomeric outer layer collects debris from the surface of the substrate.

[0050] Each of the upper contact cleaning roller 104 and the lower contact cleaning roller 102 is movable along a substantially vertical axis toward and away from the plane of the inbound conveyor 106 and the outbound conveyor 108 .

[0051] The contact cleaning system 100 also includes two adhesive rollers 114. The first adhesive roller 114 is positioned to contact the two lower contact cleaning rollers 102. The second adhesive roller 114 is positioned to contact the two upper contact cleaning rollers 104. The surface of each adhesive roller 114 includes an adhesive that collects and removes debris from the elastomeric outer layer of the corresponding lower contact cleaning roller 102 or upper contact cleaning roller 104.

[0052] Figure 1 The contact cleaning system 100 is shown in a top and bottom cleaning mode. In the top and bottom cleaning mode, both the top and bottom surfaces of a substrate conveyed through the contact cleaning system 100 are cleaned.

[0053] The inbound conveyor 106 and the outbound conveyor 108 are in the retracted position. The distance (A) between the inbound conveyor 106 and the outbound conveyor 108 is the first distance (A 清洁 ).like Figure 1 As shown, the inbound conveyor 106 and the outbound conveyor 108 are fully retracted relative to each other so that the first distance (A 清洁 ) is the maximum distance (A max ). However, the first distance (A 清洁 ) can be less than the maximum distance (A max For example, the first distance (A 清洁 ) can be any suitable distance that allows the two lower contact cleaning rollers 102 to be received between the inbound conveyor 106 and the outbound conveyor 108.

[0054] like Figure 1 As shown, each of the lower contact cleaning roller 102 and the upper contact cleaning roller 104 is in a cleaning position in the top and bottom cleaning modes. The lower contact cleaning roller 102 is coplanar with the inbound conveyor 106 and the outbound conveyor 108, so that the substrate will be conveyed from the inbound conveyor 106 onto the lower contact cleaning roller 102 and to the outbound conveyor 108. The upper contact cleaning roller 104 is positioned opposite to the lower contact cleaning roller 102, and the substrate will be received between the lower contact cleaning roller 102 and the upper contact cleaning roller 104. The upper contact cleaning roller 104 is positioned so that they will contact the upper surface of the substrate, while the lower contact cleaning roller 102 simultaneously contacts the lower surface of the substrate. Therefore, when the substrate is conveyed from the inbound conveyor 106 to the outbound conveyor 108 via the lower contact cleaning roller 102 and the upper contact cleaning roller 104, both the upper surface and the lower surface of the substrate will be cleaned.

[0055] Figure 2The contact cleaning system 100 is shown in a top cleaning mode. In the top cleaning mode, only the top surface of a substrate being transported through the contact cleaning system 100 is cleaned.

[0056] The inbound conveyor 106 and the outbound conveyor 108 are in the extended position. The distance (A) between the inbound conveyor 106 and the outbound conveyor 108 is less than the first distance (A 清洁 ).like Figure 2 As shown, the inbound conveyor 106 and the outbound conveyor 108 are fully extended toward each other so that the distance (A) is the minimum distance (A min However, the distance between the inbound conveyor 106 and the outbound conveyor 108 may be less than the first distance (A 清洁 ). For example, the distance (A) can be any suitable distance that allows the substrate to be conveyed over the gap between the inbound conveyor 106 and the outbound conveyor 108. In other words, the distance (A) in the extended position is less than the length of the substrate, so that the substrate will be supported by both the inbound conveyor and the outbound conveyor when conveyed between the inbound conveyor 106 and the outbound conveyor 108.

[0057] like Figure 2 As shown, in the top cleaning mode, the lower contact cleaning rollers 102 are in the retracted position and the upper contact cleaning rollers 104 are in the cleaning position. The lower contact cleaning rollers 102 are retracted from the plane of the inbound conveyor 106 and the outbound conveyor 108 so that the substrate will be conveyed from the inbound conveyor 106 to the outbound conveyor 108 avoiding the lower contact cleaning rollers 102. The upper contact cleaning rollers 104 are positioned above the inbound conveyor 106 and the outbound conveyor 108. The upper contact cleaning rollers 104 are positioned so that these upper contact cleaning rollers will contact the upper surface of the substrate when the substrate is conveyed from the inbound conveyor 106 to the outbound conveyor 108. Therefore, the upper surface of the substrate will be cleaned when the substrate is conveyed from the inbound conveyor 106 to the outbound conveyor 108.

[0058] Alternatively, both the lower contact cleaning roller 102 and the upper contact cleaning roller 104 can be moved to the retracted position. In this configuration, the substrate is conveyed from the inbound conveyor 106 to the outbound conveyor 108 in the avoidance mode avoiding all contact cleaning rollers 102, 104, as will be referred to in Figure 3 Just as described.

[0059] Figure 3 The contact cleaning system 100 is shown in an avoidance mode. In the avoidance mode, the substrate avoids the upper contact cleaning roller 104 and the lower contact cleaning roller 102 of the contact cleaning system 100 and is transported through the contact cleaning system 100 on the inbound conveyor 106 and the outbound conveyor 108.

[0060] The inbound conveyor 106 and the outbound conveyor 108 are in the extended position. The distance (A) between the inbound conveyor 106 and the outbound conveyor 108 is less than the first distance (A 清洁 ).like Figure 3 As shown, the inbound conveyor 106 and the outbound conveyor 108 are fully extended toward each other so that the distance (A) is the minimum distance (A min However, the distance between the inbound conveyor 106 and the outbound conveyor 108 may be less than the first distance (A 清洁 ). For example, the distance (A) can be any suitable distance that allows the substrate to be conveyed over the gap between the inbound conveyor 106 and the outbound conveyor 108. In other words, the distance (A) in the extended position is less than the length of the substrate, so that the substrate will be supported by both the inbound conveyor and the outbound conveyor when conveyed between the inbound conveyor 106 and the outbound conveyor 108.

[0061] like Figure 3 As shown, the lower contact cleaning roller 102 is in a retracted position and the upper contact cleaning roller 104 is in a retracted position. The lower contact cleaning roller 102 is retracted from the plane of the inbound conveyor 106 and the outbound conveyor 108 so that the substrate will be conveyed from the inbound conveyor 106 to the outbound conveyor 108 avoiding the lower contact cleaning roller 102. The upper contact cleaning roller 104 is positioned above the inbound conveyor 106 and the outbound conveyor 108. The upper contact cleaning roller 104 is retracted so that these upper contact cleaning rollers will not contact the upper surface of the substrate when the substrate is conveyed from the inbound conveyor 106 to the outbound conveyor 108. Therefore, when the substrate is conveyed from the inbound conveyor 106 to the outbound conveyor 108, neither the upper surface of the substrate nor the lower surface of the substrate will be cleaned.

[0062] In other words, in this configuration, the substrate is conveyed from the inbound conveyor 106 to the outbound conveyor 108 bypassing all of the contact cleaning rollers 102, 104. Therefore, the substrate will not be cleaned.

[0063] Figure 4 and Figure 5 An enlarged view of the inbound conveyor 106 is shown. Figure 4 The inbound conveyor 106 is shown in a retracted position, while Figure 5 The inbound conveyor 106 is shown in an extended position.

[0064] The inbound conveyor 106 has a stationary frame portion 116 and a movable frame portion 118. The movable frame portion 118 can be in a retracted position (e.g., Figure 4 ) and the extended position away from the stationary frame portion 116 (as shown Figure 5 The movable frame portion 118 can extend horizontally away from the stationary frame portion 116 and toward the outbound conveyor 108 along the plane of the inbound conveyor 106. The movable frame portion 118 is slidably mounted to the stationary frame portion 116 by a longitudinally extending rod.

[0065] The movable frame portion 118 can be moved by actuation of an adjustment device. In some examples, the adjustment device can be an automatic adjustment device. In one example, the adjustment device is a pneumatic adjustment device. In another example, the adjustment device is a mechanical adjustment device. In a further example, the adjustment device is an electromechanical adjustment device. The adjustment device can be coupled to the inbound conveyor 106, the outbound conveyor 108, or both the inbound conveyor 106 and the outbound conveyor 108.

[0066] The inbound conveyor 106 is mounted to the stationary frame portion 116 and the movable frame portion 118 via a series of pulleys 120. The series of pulleys 120 are part of the inbound conveyor tensioning mechanism 110 that holds the inbound conveyor 106 in a tensioned configuration in both the retracted position and the extended position. The pulleys 120 rotate to move the inbound conveyor 106 so that the inbound conveyor 106 conveys the substrate thereon toward the lower contact cleaning roller 102 and / or the upper contact cleaning roller 104. One of the pulleys 120a is mounted on the movable frame portion 118 so that when the movable frame portion 118 moves from the retracted position to the extended position, the inbound conveyor 106 moves from the retracted position to the extended position. Figure 1 and Figure 2 As shown, another pulley 120b is slidably mounted to the stationary frame portion 116. The pulley 120b slides relative to the stationary frame portion 116 to compensate for the movement of the pulley 120a mounted to the movable frame portion 118 so as to maintain the same tension on the inbound conveyor 106 when the inbound conveyor 106 is in the retracted position and the extended position.

[0067] Outbound conveyor 108 (eg Figure 1 and Figure 2 100) also has a stationary frame portion 116 and a movable frame portion 118 that operate in the same manner as described above. The outbound conveyor 108 is mounted to the stationary frame portion 116 and the movable frame portion 118 via a series of pulleys 120 in the same manner as discussed above.

[0068] All features disclosed in this specification (including any accompanying claims, abstract and drawings) and / or all steps of any method or process so disclosed may be combined in any combination, except combinations where at least some of such features and / or steps are mutually exclusive.

[0069] Unless otherwise expressly stated, each feature disclosed in this specification (including any attached claims, abstracts and drawings) may be replaced by alternative features for the same, equivalent or similar purposes. Therefore, unless otherwise expressly stated, each feature disclosed is only an example of a general series of equivalent or similar features.

[0070] The invention is not limited to the details of any foregoing embodiments. The invention may extend to any novel feature or any novel combination of features disclosed in this specification (including any accompanying claims, abstract and drawings), or to any novel step or any novel combination of steps in any method or process so disclosed. The claims should not be interpreted as covering only the foregoing embodiments, but also any embodiment falling within the scope of the claims.

[0071] Certain embodiments of the invention are described in the following clauses:

[0072] 1. A conveyor for a contact cleaning system, the conveyor comprising:

[0073] Inbound conveyors; and

[0074] an outbound conveyor spaced apart from the inbound conveyor by a distance (A);

[0075] wherein the inbound conveyor and / or the outbound conveyor is movable relative to the other of the inbound conveyor or the outbound conveyor between a retracted position and an extended position, in which the distance (A) is a first distance (A 清洁 ), in the extended position, the distance (A) is less than the first distance (A 清洁 ).

[0076] 2. The conveyor of clause 1, wherein the inbound conveyor and the outbound conveyor are configured to receive at least one contact cleaning roller therebetween when the inbound conveyor and the outbound conveyor are in the retracted position.

[0077] 3. A conveyor according to clause 2, wherein, in the retracted position, the surfaces of the inbound conveyor, the outbound conveyor and the at least one contact cleaning roller are coplanar so that a substrate conveyed from the inbound conveyor to the outbound conveyor via the at least one contact cleaning roller remains horizontal.

[0078] 4. A conveyor according to any one of clauses 1 to 3, wherein when the inbound conveyor and the outbound conveyor are in the extended position, the distance (A) is less than the length of a substrate to be supported on the conveyor.

[0079] 5. A conveyor according to any one of clauses 1 to 4, wherein the distance (A) is the minimum distance (A) in the extended position.min ).

[0080] 6. A conveyor according to any one of clauses 1 to 5, wherein the distance (A) is the maximum distance (A) in the retracted position. max ).

[0081] 7. A conveyor according to any one of clauses 1 to 6, wherein the inbound conveyor includes an inbound conveyor tensioning mechanism configured to maintain the inbound conveyor in a tensioned configuration in each of the retracted position and the extended position.

[0082] 8. A conveyor according to any one of clauses 1 to 7, wherein the outbound conveyor includes an outbound conveyor tensioning mechanism configured to maintain the outbound conveyor in a tensioned configuration in each of the retracted position and the extended position.

[0083] 9. A conveyor according to any one of clauses 1 to 8, wherein the conveyor further comprises at least one of the following: a mechanical adjustment device, a pneumatic adjustment device or an electromechanical adjustment device, which is configured to move the inbound conveyor and / or the outbound conveyor between a retracted position and an extended position.

[0084] 10. A contact cleaning system comprising:

[0085] A conveyor according to any of clauses 1 to 9, wherein the conveyor is configured to support a substrate on a conveyor surface; and

[0086] At least one of the following:

[0087] one or more upper contact cleaning rollers positioned above the conveyor surface, wherein the one or more upper contact cleaning rollers are movable between a cleaning position in which a surface of the one or more upper contact cleaning rollers is arranged to contact an upper surface of a substrate conveyed from the inbound conveyor to the outbound conveyor, and a withdrawn position in which a surface of the one or more upper contact cleaning rollers is withdrawn upwardly away from the inbound conveyor and the outbound conveyor; and

[0088] one or more lower contact cleaning rollers positioned below the conveyor surface, wherein the one or more lower contact cleaning rollers are movable between a cleaning position in which a surface of the one or more lower contact cleaning rollers is coplanar with the inbound and outbound conveyors and a withdrawn position in which a surface of the one or more lower contact cleaning rollers is withdrawn below the plane of the inbound and outbound conveyors; and

[0089] Wherein, the inbound conveyor is arranged to convey the substrate towards the one or more upper contact cleaning rollers and / or the one or more lower contact cleaning rollers.

[0090] 11. A contact cleaning system according to claim 10, wherein, when the one or more lower contact cleaning rollers are in the cleaning position, the inbound conveyor and the outbound conveyor are in a retracted position, and the distance between the inbound conveyor and the outbound conveyor is sized to accommodate the one or more lower contact cleaning rollers therebetween.

[0091] 12. The contact cleaning system according to clause 10 or 11, comprising the one or more upper contact cleaning rollers and the one or more lower contact cleaning rollers.

Claims

1. A conveyor for a contact cleaning system, the conveyor comprising: Inbound conveyor; as well as an outbound conveyor spaced apart from the inbound conveyor by a distance (A); wherein the inbound conveyor and / or the outbound conveyor is movable relative to the other of the inbound conveyor or the outbound conveyor between a retracted position and an extended position, wherein in the retracted position, the distance (A) is a first distance (A 清洁 ), in the extended position, the distance (A) is less than the first distance (A 清洁 ).

2. The conveyor according to claim 1, wherein: The inbound conveyor and the outbound conveyor are configured to receive at least one contact cleaning roller therebetween when the inbound conveyor and the outbound conveyor are in the retracted position.

3. The conveyor according to claim 2, wherein: In the retracted position, surfaces of the inbound conveyor, the outbound conveyor, and the at least one contact cleaning roller are coplanar such that a substrate conveyed from the inbound conveyor to the outbound conveyor via the at least one contact cleaning roller remains horizontal.

4. The conveyor according to any one of claims 1 to 3, wherein: When the inbound and outbound conveyors are in the extended positions, the distance (A) is less than the length of a substrate to be supported on the conveyors.

5. The conveyor according to any one of claims 1 to 4, wherein: The distance (A) is the minimum distance (A) in the extended position. min ).

6. The conveyor according to any one of claims 1 to 5, wherein: The distance (A) is the maximum distance (A) in the retracted position. max ).

7. The conveyor according to any one of claims 1 to 6, wherein: The inbound conveyor includes an inbound conveyor tensioning mechanism configured to maintain the inbound conveyor in a tensioned configuration in each of the retracted position and the extended position.

8. The conveyor according to any one of claims 1 to 7, wherein: The outbound conveyor includes an outbound conveyor tensioning mechanism configured to maintain the outbound conveyor in a tensioned configuration in each of the retracted position and the extended position.

9. The conveyor according to any one of claims 1 to 8, wherein: The conveyor further comprises at least one of a mechanical adjustment device, a pneumatic adjustment device or an electromechanical adjustment device configured to move the inbound conveyor and / or the outbound conveyor between the retracted position and the extended position.

10. A contact cleaning system comprising: A conveyor according to any one of claims 1 to 9, wherein the conveyor is configured to support a substrate on a conveyor surface; and At least one of the following: one or more upper contact cleaning rollers positioned above the conveyor surface, wherein the one or more upper contact cleaning rollers are movable between a cleaning position in which a surface of the one or more upper contact cleaning rollers is arranged to contact an upper surface of a substrate conveyed from the inbound conveyor to the outbound conveyor, and a withdrawn position in which the surface of the one or more upper contact cleaning rollers is withdrawn upwardly away from the inbound and outbound conveyors; and one or more lower contact cleaning rollers positioned below the conveyor surface, wherein the one or more lower contact cleaning rollers are movable between a cleaning position in which a surface of the one or more lower contact cleaning rollers is coplanar with the inbound conveyor and the outbound conveyor, and a withdrawn position in which the surface of the one or more lower contact cleaning rollers is withdrawn below the plane of the inbound conveyor and the outbound conveyor; and Wherein, the inbound conveyor is arranged to convey the substrate towards the one or more upper contact cleaning rollers and / or the one or more lower contact cleaning rollers.

11. The contact cleaning system according to claim 10, wherein: When the one or more lower contact cleaning rollers are in the cleaning position, the inbound conveyor and the outbound conveyor are in the retracted position, and the distance between the inbound conveyor and the outbound conveyor is sized to receive the one or more lower contact cleaning rollers therebetween.

12. The contact cleaning system of claim 10 or 11, comprising the one or more upper contact cleaning rollers and the one or more lower contact cleaning rollers.

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