A wafer carrier

Abstract

The present application provides a wafer carrier, which relates to the technical field of wafer production. The wafer carrier includes: a wafer bearing assembly, a rolling drive assembly, and a rolling upper pressing assembly. The bottom rolling support part is installed on the inner bottom side of the box frame, and placing grooves for placing wafers are arranged on both sides inside the box frame. The fixed support part is installed on the side of the box frame, the rotating shaft is rotatably arranged with the fixed support part, a disk corresponding to each placing groove is fixedly sleeved outside the rotating shaft, and a rotating connection part is arranged at the end of the rotating shaft. The rolling upper pressing assembly is installed on the box frame to limit the wafers. While the wafers inside the box frame move reciprocally up and down for cleaning, the wafer area originally located inside the placing groove can complete rotation without additional power while the box frame moves reciprocally up and down. The wafer area located inside the placing groove will be washed out as it rotates, realizing that the wafers inside the box frame can be completely washed and improving the cleaning quality of the wafers.

Description

Technical Field

[0001] The present application relates to the technical field of wafer production, and more particularly, to a wafer carrier. Background Art

[0002] The processing method of wafers is mainly batch processing. After the silicon ingot is ground, polished, and sliced, silicon wafers are formed. Wafers need to be cleaned by a cleaning device during the production process.

[0003] When the silicon wafers are placed inside the cleaning device for cleaning operations, first, a batch of wafers need to be placed inside the cassette rack. The cassette rack will be immersed below the water surface in the inclined device groove. Then, the cleaning device will drive the cassette rack and the wafers inside it to reciprocate vertically to clean the wafers inside the cassette rack. Since the wafers are placed inside the cassette rack and during the vertical reciprocating cleaning process, the area where the wafers fit with the placement grooves inside the cassette rack is difficult to be cleaned thoroughly, thus affecting the cleaning quality of the wafers. Summary of the Invention

[0004] The present application aims to solve at least one of the technical problems existing in the prior art. For this purpose, the present application provides a wafer carrier to solve the problem that the area where the wafers fit with the placement grooves inside the cassette rack is difficult to be cleaned thoroughly during the vertical reciprocating cleaning process.

[0005] A wafer carrier according to an embodiment of the present application includes: a wafer bearing assembly, a rolling drive assembly, and a rolling upper pressing assembly.

[0006] The wafer bearing assembly includes a cassette rack and a bottom rolling support part. The bottom rolling support part is installed on the bottom side inside the cassette rack. Placement grooves for placing wafers are provided on both sides inside the cassette rack. An arc-shaped groove communicating with the placement grooves is provided on one side of the cassette rack.

[0007] The rolling drive assembly includes a floating plate, a rotating shaft, a fixed support part, and a strip-shaped shell. The fixed support part is installed on the side of the cassette rack. The rotating shaft is rotatably arranged with the fixed support part, and a disk corresponding to each placement groove is fixedly sleeved outside the rotating shaft. A rotating connection part is provided at the end of the rotating shaft. The bottom and top of the inclined strip-shaped shell are respectively connected with a lower rod and an upper rod. The floating plate is fixedly connected to the bottom end of the lower rod. The lower rod and the upper rod are movably penetrated through the fixed support part in the vertical direction.

[0008] The rolling upper pressing assembly is installed on the cassette rack to limit the wafers.

[0009] Preferably, the bottom rolling support part includes a support plate and a lower rolling shaft. The support plate is fixed at the end of the cassette rack. The end of the lower rolling shaft is rotatably connected to the support plate.

[0010] Preferably, a first roller groove corresponding to the placement groove one by one is arranged outside the lower roller.

[0011] Preferably, the fixed support part includes a seat frame, a side frame, an elastic support member and a second seat block. The seat frame and the side frame are slidably arranged in the vertical position, and the elastic support member connects the seat frame and the side frame. Limit rings are arranged at both the top end and the bottom end of the side frame. The second seat block is fixed on one side of the side frame, and the end of the rotating shaft is rotatably arranged with the second seat block.

[0012] Preferably, the rolling upper pressing assembly includes a support arm, an upper roller and a support block. The support block is fixed on the side part of the box frame. The upper roller is rotatably arranged at the top ends of the two support arms. The support block is rotatably installed with the support arm through a pin shaft. Pressing support areas and loosening support areas that are engaged with the top of the side frame are respectively arranged at the bottom of the support arm. A first avoidance notch through which the support arm passes is arranged along the upper edge of one side of the box frame. Handles are arranged outside the two support arms.

[0013] Preferably, a second roller groove corresponding to the placement groove one by one is arranged outside the upper roller.

[0014] Preferably, the elastic support member includes a pin rod, a spring, a first seat block and a fixed block. The fixed block is fixedly arranged with the seat frame. The pin rod is fixed above the fixed block. The first seat block is connected with the side frame. The top end of the pin rod movably penetrates through the first seat block. The spring is sleeved outside the pin rod. A limit cover is arranged at the top end of the pin rod.

[0015] Preferably, the rotating connection part includes a connecting strip plate and a shaft rod. The two ends of the connecting strip plate are respectively connected with one end of the rotating shaft and one end of the shaft rod. The other end of the shaft rod moves inside the strip shell.

[0016] Preferably, the rolling driving assembly further includes a top block, and the top block is arranged at the top end of the upper rod.

[0017] The wafer carrier also includes an outer cover protection assembly. The outer cover protection assembly includes an outer cover shell. The outer cover shell is located outside the rolling driving assembly and is connected with the side part of the box frame. A circulation port is arranged on the side part of the outer cover shell, and a second avoidance notch for passing through the support arm in cooperation is arranged above the outer cover shell.

[0018] Preferably, the outer cover protection assembly further includes a diversion shell, a diversion plate, blade plates and a sleeve. The sleeve is fixed outside the rotating shaft between adjacent wheel discs. Multiple groups of blade plates are arranged in an annular array outside the sleeve. The diversion shell is located outside the circulation port and is fixed with the outer cover shell. The diversion plate is installed inside the diversion shell, and inclined diversion grooves corresponding to the sleeve one by one are arranged on the diversion plate.

[0019] The beneficial effects of this application are as follows: A wafer carrier rack obtained through the above design. When the cleaning equipment drives the cassette rack to move up and down reciprocally to clean the wafers inside the cassette rack, the surfaces of the wafers exposed outside the placement slots can directly contact the cleaning liquid inside the cleaning tank and be cleaned. The up-and-down reciprocating movement of the cassette rack drives the rotation of the rotating shaft and the turntable through the cooperation of components such as the floating plate and the strip shell, and finally drives the rotation of the wafers inside the cassette rack. That is, while the wafers inside the cassette rack are being cleaned by moving up and down reciprocally, the wafer area originally located inside the placement slots can complete rotation without additional power while the cassette rack is moving up and down reciprocally. The wafer area located inside the placement slots will rotate out and be cleaned, realizing that the wafers inside the cassette rack can be completely cleaned and improving the cleaning quality of the wafers.

[0020] Additional aspects and advantages of the present application will be given in part in the following description, become apparent in part from the following description, or be learned through the practice of the present application. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the following will briefly introduce the drawings required for use in the embodiments of the present application. It should be understood that the following drawings only show some embodiments of the present application, and therefore should not be regarded as limiting the scope. For those of ordinary skill in the art, without creative efforts, other related drawings can also be obtained based on these drawings.

[0022] Figure 1 is a schematic structural diagram of a wafer carrier rack according to an embodiment of the present application;

[0023] Figure 2 is a schematic structural diagram of a wafer carrying component, a rolling drive component, and a rolling upper pressing component according to an embodiment of the present application;

[0024] Figure 3 is a schematic structural diagram of a wafer carrying component according to an embodiment of the present application;

[0025] Figure 4 is a schematic structural diagram of a floating plate, a rotating shaft, and a turntable according to an embodiment of the present application;

[0026] Figure 5 is a schematic structural diagram of a rotating connection part, a fixed support part, a strip shell, a lower rod, an upper rod, and a top block according to an embodiment of the present application;

[0027] Figure 6 is a schematic structural diagram of a fixed support part according to an embodiment of the present application;

[0028] Figure 7 is a schematic structural diagram of an elastic support member according to an embodiment of the present application;

[0029] Figure 8 Schematic diagram of the rolling upper pressing component structure according to an embodiment of the present application;

[0030] Figure 9 Schematic diagram of the rotating shaft, wheel disc and outer cover protection component structure according to an embodiment of the present application;

[0031] Figure 10 Schematic diagram of the rotating shaft, wheel disc, flow guide plate, flow guide groove, blade and sleeve structure according to an embodiment of the present application;

[0032] Figure 11 Schematic diagram of the blade and sleeve structure according to an embodiment of the present application.

[0033] Reference numerals:

[0034] 1 - Wafer carrier component; 11 - Box frame; 12 - Bottom rolling support part; 121 - Support plate; 122 - Lower roller shaft; 123 - First roller groove; 13 - Placement groove; 14 - Arc groove; 15 - First avoidance notch; 2 - Rolling drive component; 21 - Floating plate; 22 - Rotating shaft; 23 - Wheel disc; 24 - Rotating connection part; 241 - Connecting strip plate; 242 - Shaft rod; 25 - Fixed support part; 251 - Seat frame; 252 - Side frame; 253 - Elastic support member; 2531 - Pin rod; 2532 - Spring; 2533 - First seat block; 2534 - Limit cover; 2535 - Fixed block; 254 - Limit ring; 255 - Second seat block; 26 - Strip shell; 27 - Lower rod; 28 - Upper rod; 29 - Top block; 3 - Rolling upper pressing component; 31 - Support arm; 32 - Upper roller shaft; 33 - Second roller groove; 34 - Handle; 35 - Support block; 36 - Pin shaft; 37 - Lower pressing support area; 38 - Loosening support area; 4 - Outer cover protection component; 41 - Outer cover shell; 42 - Second avoidance notch; 43 - Circulation port; 44 - Flow guide shell; 45 - Flow guide plate; 46 - Flow guide groove; 47 - Blade; 48 - Sleeve. Detailed implementation manners

[0035] Next, the technical solutions in the embodiments of the present application will be described with reference to the accompanying drawings in the embodiments of the present application.

[0036] To make the purpose, technical solutions and advantages of the embodiments of the present application clearer, the technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are part of the embodiments of the present application, rather than all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative efforts fall within the protection scope of the present application.

[0037] Accordingly, the following detailed description of the embodiments of the present application provided in the accompanying drawings is not intended to limit the scope of the claimed present application, but merely represents selected embodiments of the present application. All other embodiments obtained by those of ordinary skill in the art based on the embodiments in the present application without creative efforts fall within the scope of protection of the present application.

[0038] A wafer carrier will be described below with reference to the accompanying drawings according to an embodiment of the present application.

[0039] Please refer to Figures 1 - 11 , a wafer carrier according to an embodiment of the present application includes: a wafer carrying component 1, a rolling driving component 2, and a rolling upper pressing component 3.

[0040] Among them, multiple groups of wafers are placed inside the wafer carrying component 1. The wafers inside are limited by the rolling upper pressing component 3, and then the wafer carrying component 1 is transferred to the cleaning tank of the cleaning device, and the hanging rack of the cleaning device fixes the wafer carrying component 1. When the cleaning device drives the wafer carrying component 1 to move up and down reciprocally to clean the wafers inside the wafer carrying component 1, the wafers in the wafer carrying component 1 can be rotated through the cooperation of the rolling driving component 2, so that the whole wafers can be cleaned, improving the cleaning quality of the wafers.

[0041] Please refer to Figures 2 - 5 , the wafer carrying component 1 includes a box frame 11 and a bottom rolling support part 12. The bottom rolling support part 12 is installed on the inner bottom side of the box frame 11. Placement grooves 13 for placing wafers are provided on both sides inside the box frame 11, and an arc groove 14 communicating with the placement groove 13 is provided on one side of the box frame 11. The rolling driving component 2 includes a floating plate 21, a rotating shaft 22, a fixed support part 25, and a strip shell 26. The fixed support part 25 is installed on the side of the box frame 11. The rotating shaft 22 is rotatably arranged with the fixed support part 25, and a wheel disc 23 corresponding to the placement groove 13 one by one is fixedly sleeved outside the rotating shaft 22. A rotating connection part 24 is arranged at the end of the rotating shaft 22. The bottom and top of the obliquely arranged strip shell 26 are respectively connected with a lower rod 27 and an upper rod 28. The floating plate 21 is fixedly connected with the bottom end of the lower rod 27, and the lower rod 27 and the upper rod 28 are movably penetrated through the fixed support part 25 in the vertical direction. The rolling upper pressing component 3 is installed on the box frame 11 to limit the wafers.

[0042] Put multiple groups of wafers into the placement slots 13 inside the cassette rack 11 in sequence, limit the wafers inside through the rolling upper pressing assembly 3, and then transfer the cassette rack 11 to the cleaning tank of the cleaning equipment, and the hanging rack of the cleaning equipment fixes the cassette rack 11. When the cleaning equipment drives the cassette rack 11 to move up and down reciprocally to clean the wafers inside the cassette rack 11, the surfaces of the wafers exposed outside the placement slots 13 can directly contact the cleaning liquid inside the cleaning tank and be cleaned. While the cassette rack 11 is moving up and down reciprocally, the floating plate 21 in the rolling driving assembly 2 also relatively drives the strip housing 26 to move reciprocally in the vertical direction through the lower rod 27. Specifically, when the cassette rack 11 moves downward or upward, the floating plate 21 is subjected to the resistance of water and will form a displacement difference with the cassette rack 11. This displacement difference will rotate around the internal path of the strip housing 26 at one end of the rotating connection portion 24, and the other end of the rotating connection portion 24 will drive the rotating shaft 22 to rotate. The side of the turntable 23 close to the cassette rack 11 protrudes into the arc-shaped groove 14, and the outer side surface of the turntable 23 contacts the outer side surface of the wafer. The rotating rotating shaft 22 drives the external turntable 23 to rotate, that is, drives the wafers inside the cassette rack 11 to rotate. While the wafers inside the cassette rack 11 are being reciprocally moved up and down for cleaning, the wafer area originally located inside the placement slots 13 can complete rotation without additional power while the cassette rack 11 is moving up and down reciprocally. The wafer area located inside the placement slots 13 will rotate out and be cleaned, realizing that the wafers inside the cassette rack 11 can be completely cleaned and improving the cleaning quality of the wafers.

[0043] For specific settings, please refer to Figure 3 , the bottom rolling support portion 12 includes a support plate 121 and a lower roller 122. The support plate 121 is integrally formed and fixed at the end of the cassette rack 11, and the end of the lower roller 122 is rotatably connected to the support plate 121. A first roller groove 123 corresponding to the placement slots 13 one by one is arranged outside the lower roller 122. Two groups of the lower rollers 122 on one side of the support plate 121 are arranged, which are respectively used to support the two sides of the bottom of the wafers inside the cassette rack 11, and cooperate with the turntable 23 to realize the smooth rotation of the wafers inside the cassette rack 11. The arrangement of the first roller groove 123 outside the lower roller 122 is used for limiting and cooperating with each wafer, so that the wafers placed inside the placement slots 13 are not prone to deviation during rotation, that is, the stability of the wafers during rotation is improved.

[0044] In the above specific implementation manner, please refer to Figure 6 and Figure 8, the fixed support part 25 includes a base frame 251, a side frame 252, an elastic support member 253 and a second seat block 255. The base frame 251 is slidably arranged with the side frame 252 in the vertical position, and the elastic support member 253 connects the base frame 251 and the side frame 252. Limit rings 254 are arranged at both the top end and the bottom end of the side frame 252. The second seat block 255 is fixed on one side of the side frame 252, and the end of the rotating shaft 22 is rotatably arranged with the second seat block 255. The rolling upper pressing assembly 3 includes a support arm 31, an upper roller 32 and a support block 35. The support block 35 is fixed on the side of the box frame 11. The upper roller 32 is rotatably arranged at the top ends of the two support arms 31. The support block 35 is rotatably installed with the support arms 31 through a pin shaft 36. Pressing support areas 37 and releasing support areas 38 that are engaged with the top of the side frame 252 are respectively arranged at the bottom of the support arms 31. A first avoidance notch 15 through which the support arms 31 pass movably is arranged along the upper edge on one side of the box frame 11. Handles 34 are arranged outside the two support arms 31.

[0045] When no wafer is placed inside the box frame 11, the releasing support area 38 of the support arm 31 in the rolling upper pressing assembly 3 is located at the top end of the side frame 252, that is, at this time, the releasing support area 38 at the bottom of the support arm 31 tightly abuts against the top end of the side frame 252, and at the same time, the elastic support member 253 is in a compressed state. After a wafer is placed inside the box frame 11, the operator pulls the handle 34 towards one side of the box frame 11. The pulled handle 34 will drive the support arm 31 and the upper roller 32 to rotate around the pin shaft 36 on one side of the support block 35 until the pressing support area 37 at the bottom end of the support arm 31 moves to abut against the top of the side frame 252. At the same time, the outer surface of the upper roller 32 just contacts the side surface of the area above the wafer, which is used to limit the wafer placed inside the box frame 11 and improve the stability of the wafer when rotating inside the box frame 11.

[0046] When the releasing support area 38 at the bottom of the support arm 31 contacts and tightly abuts against the top end of the side frame 252, the disk 23 outside the rotating shaft 22 will not contact the outer ring of the wafer inside the placement groove 13, that is, there is a certain small distance between the disk 23 and the outer ring of the wafer. When the support arm 31 rotates to drive the upper roller 32 to contact the outer ring surface of the wafer, at this time, the elastic support member 253 expands and elastically supports the side frame 252 to move slightly upward, so that the top end of the side frame 252 stably abuts against the pressing support area 37 at the bottom of the support arm 31. At the same time, the upward slight movement of the side frame 252 will also drive the second seat block 255 and the rotating shaft 22 to move upward. The upward moving rotating shaft 22 drives the outer disk 23 to move upward, so that the outer ring of the disk 23 can avoid rigid overpressure contact with the protruding outer ring surface of the wafer in the arc-shaped groove 14. When the second roller groove 33 cooperates with the upper roller 32 to drive the wafer to rotate at this time, it can avoid over-pressing the wafer inside the box frame 11, that is, it also has a better protection effect when the wafer inside the box frame 11 rotates.

[0047] Further, a second roller groove 33 corresponding to the placement groove 13 one by one is arranged outside the upper roller 32. The second roller groove 33 outside the upper roller 32 is used to limit the more stable rotation of the wafer in the cassette holder 11.

[0048] Specifically, please refer to Figure 7 , the elastic support member 253 includes a pin rod 2531, a spring 2532, a first seat block 2533 and a fixing block 2535. The fixing block 2535 is integrally formed and fixedly arranged with the seat frame 251. The pin rod 2531 is integrally formed and fixed above the fixing block 2535. The first seat block 2533 is connected to the side frame 252. The top end of the pin rod 2531 movably penetrates through the first seat block 2533. The spring 2532 is sleeved outside the pin rod 2531. A limit cover 2534 is arranged at the top end of the pin rod 2531. The spring 2532 in the elastic support member 253 cooperates with the pin rod 2531 and the first seat block 2533 to elastically support the side frame 252.

[0049] When specifically setting, please refer to Figure 5 , the rotating connection part 24 includes a connecting strip plate 241 and a shaft rod 242. Both ends of the connecting strip plate 241 are respectively connected to one end of the rotating shaft 22 and one end of the shaft rod 242. The other end of the shaft rod 242 moves inside the strip housing 26. When the strip housing 26 and the shaft rod 242 move and deviate up and down, and at the same time the shaft rod 242 will drive the rotating shaft 22 to rotate through the connecting strip plate 241, that is, drive the disk 23 outside the rotating shaft 22 to rotate.

[0050] Further, please refer to Figure 7 , the rolling drive assembly 2 further includes a top block 29. The top block 29 is arranged at the top end of the upper rod 28. The top block 29 is fixed to the top end of the upper rod 28 by screwing. The top block 29 is used to limit the stable axial movement of the upper rod 28 and the lower rod 27 inside the limit ring 254.

[0051] The above-mentioned wafer carrier has a certain lack of protection for the components in the rolling drive assembly 2 on one side of the cassette holder 11.

[0052] Please refer to Figure 1 、 Figure 9 、 Figure 10 and Figure 11, the wafer carrier also includes an outer cover protection component 4, and the outer cover protection component 4 includes an outer cover shell 41. The outer cover shell 41 is located outside the rolling drive component 2 and is connected to the side of the cassette holder 11. The outer cover shell 41 and the cassette holder 11 can be fixedly installed by screws. A circulation port 43 is provided on the side of the outer cover shell 41, and a second avoidance notch 42 that penetrates and cooperates with the support arm 31 is provided above the outer cover shell 41. The outer cover protection component 4 further includes a diversion shell 44, a diversion plate 45, vane plates 47, and a sleeve 48. The sleeve 48 is fixed to the outside of the rotating shaft 22 between adjacent disk wheels 23. Multiple groups of vane plates 47 are arranged in a ring array outside the sleeve 48. The diversion shell 44 is located outside the circulation port 43 and is fixed to the outer cover shell 41. The diversion plate 45 is installed inside the diversion shell 44, and inclined diversion grooves 46 corresponding to the sleeve 48 one by one are provided on the diversion plate 45.

[0053] The outer cover protection component 4 in the outer cover protection component 4 is arranged outside the rolling drive component 2, which can play a good protective role for the components in the rolling drive component 2. The circulation port 43 on one side of the outer cover shell 41 is used to adjust the water pressure inside the outer cover shell 41, which can ensure that the floating plate 21 moves reciprocally stably in the vertical direction. That is, when the floating plate 21 moves upward inside the outer cover shell 41, the water that is pressurized too much inside the outer cover shell 41 will be discharged through the circulation port 43 on one side of the outer cover shell 41; when the floating plate 21 moves downward inside the outer cover shell 41, the water inside the cleaning tank will be replenished into the outer cover shell 41 through the circulation port 43, so as to realize the reciprocating movement of the floating plate 21 in the vertical direction.

[0054] When the cassette holder 11 drives the outer cover shell 41 to move upward, the water source inside the cleaning tank will enter the inside of the diversion shell 44 through the open mouth at the top of the diversion shell 44. The water source that enters the inside of the diversion shell 44 will flow along the diversion grooves 46 on the diversion plate 45 to impact the vane plates 47 outside the sleeve 48, which can assist the floating plate 21, the rotating connection part 24, the strip shell 26, the lower rod 27, the upper rod 28 and other structures to drive the rotating shaft 22 to rotate, that is, play a role in assisting the rotation of the disk wheel 23. Finally, the disk wheel 23 is driven to rotate by two methods at the same time, so that the disk wheel 23 can stably drive the wafer inside the cassette holder 11 to rotate and adjust the position of the wafer, and improve the cleaning quality of the wafer inside the cassette holder 11.

[0055] The diversion structure design of the diversion plate 45 and the diversion grooves 46 can make the water source that enters the inside of the diversion shell 44 directly impact a vane plate 47 outside the sleeve 48 close to the diversion plate 45 as much as possible, improve the impact force of the water source on the vane plate 47, so that the rotating shaft 22 can be driven to rotate more optimally, and then realize the more optimal driving of the disk wheel 23 to drive the wafer inside the cassette holder 11 to rotate.

[0056] The above are only the embodiments of the present application and are not intended to limit the protection scope of the present application. For those skilled in the art, various changes and modifications can be made to the present application. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application shall be included within the protection scope of the present application. It should be noted that similar reference numerals and letters denote similar items in the following drawings. Therefore, once an item is defined in one drawing, it does not need to be further defined and explained in subsequent drawings.

[0057] As mentioned above, the above are only the specific implementation manners of the present application, but the protection scope of the present application is not limited thereto. Any person skilled in the art can easily think of changes or replacements within the technical scope disclosed in the present application, and all should be covered within the protection scope of the present application. Therefore, the protection scope of the present application should be subject to the protection scope of the claims.

Claims

1. A wafer carrier, characterized in that: include: A wafer carrier assembly (1), the wafer carrier assembly (1) comprising a box frame (11) and a bottom rolling support portion (12), the bottom rolling support portion (12) being mounted on the bottom side of the box frame (11), both sides of the box frame (11) being provided with placement grooves (13) for placing wafers, and one side of the box frame (11) being provided with an arc groove (14) connected to the placement groove (13); A rolling drive assembly (2), the rolling drive assembly (2) comprising a floating plate (21), a rotating shaft (22), a fixed support portion (25) and a strip shell (26), the fixed support portion (25) being mounted on the side of a box frame (11), the rotating shaft (22) and the fixed support portion (25) being rotatably arranged, and a wheel disc (23) corresponding to the placement groove (13) is fixedly sleeved outside the rotating shaft (22), a rotating connection portion (24) is arranged at the end of the rotating shaft (22), the bottom and top of the inclined strip shell (26) are respectively connected to a lower rod (27) and an upper rod (28), the floating plate (21) is fixed to the bottom end of the lower rod (27) The lower rod (27) and the upper rod (28) are movably connected with the fixed support part (25) in the vertical direction. The cleaning equipment drives the box frame (11) to move up and down. The floating plate (21) is subjected to the resistance of water and forms a displacement difference with the box frame (11). This displacement difference rotates around the internal path of the strip shell (26) through one end of the rotating connection part (24). The other end of the rotating connection part (24) drives the rotating shaft (22) to rotate. The wheel disc (23) protrudes into the arc groove (14) on one side close to the box frame (11). The outer side surface of the wheel disc (23) contacts the outer side surface of the wafer, driving the wafer inside the box frame (11) to rotate and be cleaned; A rolling upper pressing assembly (3) is installed on the upper limit wafer of the box frame (11).

2. A wafer carrier according to claim 1, characterized in that: The bottom rolling support part (12) comprises a support plate (121) and a lower roller (122); the support plate (121) is fixed to the end of the box frame (11); and the end of the lower roller (122) is rotatably connected to the support plate (121).

3. A wafer carrier according to claim 2, characterized in that: The lower roller (122) is provided with first roller grooves (123) on the outside corresponding to the placement grooves (13).

4. The wafer carrier according to claim 1, characterized in that: The fixed support portion (25) comprises a seat frame (251), a side frame (252), an elastic support member (253) and a second seat block (255); the seat frame (251) and the side frame (252) are arranged to slide in a vertical position, and the elastic support member (253) connects the seat frame (251) and the side frame (252); the top and bottom ends of the side frame (252) are provided with limit rings (254); the second seat block (255) is fixed to one side of the side frame (252), and the end of the rotating shaft (22) is rotatably arranged with the second seat block (255).

5. The wafer carrier according to claim 4, characterized in that: The rolling pressure assembly (3) comprises a support arm (31), an upper roller (32) and a support block (35); the support block (35) is fixed to the side of the box frame (11); the upper roller (32) is rotatably arranged at the top of the two support arms (31); the support block (35) is rotatably installed with the support arm (31) through a pin shaft (36); a downward pressure support area (37) and a loosening support area (38) which are engaged with the top of the side frame (252) are respectively arranged at the bottom of the support arm (31); a first avoidance slot (15) through which the support arm (31) can move is arranged on the upper edge of one side of the box frame (11); and handles (34) are arranged on the outside of the two support arms (31).

6. The wafer carrier according to claim 5, characterized in that: The upper roller (32) is provided with second roller grooves (33) on the outside corresponding to the placement grooves (13).

7. The wafer carrier according to claim 4, characterized in that: The elastic support member (253) comprises a pin rod (2531), a spring (2532), a first seat block (2533) and a fixed block (2535); the fixed block (2535) is fixedly arranged on the seat frame (251); the pin rod (2531) is fixed above the fixed block (2535); the first seat block (2533) is connected to the side frame (252); the top end of the pin rod (2531) movably passes through the first seat block (2533); the spring (2532) is sleeved on the outside of the pin rod (2531); and a limit cover (2534) is arranged on the top end of the pin rod (2531).

8. The wafer carrier according to claim 1, characterized in that: The rotating connection part (24) comprises a connecting strip plate (241) and a shaft rod (242), wherein two ends of the connecting strip plate (241) are respectively connected to one end of the rotating shaft (22) and one end of the shaft rod (242), and the other end of the shaft rod (242) moves inside the strip housing (26).

9. The wafer carrier according to claim 1, characterized in that: The rolling drive assembly (2) further comprises a top block (29), wherein the top block (29) is arranged at the top end of the upper rod (28).

10. The wafer carrier according to claim 5, characterized in that: The invention also comprises an outer cover protection component (4), wherein the outer cover protection component (4) comprises an outer cover shell (41), wherein the outer cover shell (41) is located outside the rolling drive component (2) and connected to the side of the box frame (11), wherein a flow port (43) is arranged on the side of the outer cover shell (41), and a second avoidance slot (42) is arranged above the outer cover shell (41) and is intersected and matched with the support arm (31).

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