Display panel, display panel preparation method and display device

Abstract

The invention discloses a display panel, a display panel preparation method and a display device, the display panel comprises a first area and a second area which are adjacent, the light transmittance of the first area is greater than that of the second area, the display panel comprises a substrate, and a groove is at least formed in the first area and one side of the substrate; the array layer is arranged on one side of the substrate, the array layer comprises a thin film transistor, and at least part of the thin film transistor is arranged in the groove; the shading layer is arranged on the side, facing the substrate, of the thin film transistor, and the orthographic projection of the shading layer on the substrate at least partially covers the orthographic projection of the thin film transistor on the substrate. And refraction and scattering in the array layer are avoided, so that the problem of splash screen of the display panel due to leakage current caused by light irradiation of the thin film transistors is avoided, and the display effect and the use performance of the display panel are improved.

Description

Technical Field

[0001] The present application belongs to the field of display technology, and in particular relates to a display panel, a method for manufacturing a display panel, and a display device. Background Art

[0002] Organic Light Emitting Diode (OLED) and flat-panel display devices based on technologies such as Light Emitting Diode (LED) have been widely used in various consumer electronic products such as mobile phones, televisions, laptops, and desktop computers due to their advantages such as high image quality, power saving, thin body, and wide range of applications, becoming the mainstream display device.

[0003] However, the performance of current OLED display products needs to be improved.

[0004] Therefore, there is an urgent need for a new display panel, a method for manufacturing a display panel, and a display device. Summary of the Invention

[0005] The embodiments of the present application provide a display panel, a method for preparing a display panel, and a display device. By arranging a thin film transistor in a groove of a substrate and providing a light shielding layer, the problem of flickering of the display panel caused by leakage current of the thin film transistor due to exposure to light is avoided, thereby improving the display effect and performance of the display panel.

[0006] On the one hand, an embodiment of the present application provides a display panel, including a first area and a second area adjacent to each other, the transmittance of the first area being greater than the transmittance of the second area, the display panel including: a substrate, at least in the first area, a groove being provided on one side of the substrate; an array layer provided on one side of the substrate, the array layer including thin-film transistors, at least part of the thin-film transistors being provided in the groove; a light-shielding layer provided on a side of the thin-film transistor facing the substrate, the orthographic projection of the light-shielding layer on the substrate at least partially covering the orthographic projection of the thin-film transistor on the substrate.

[0007] According to one aspect of the present application, the groove wall and the groove bottom form a first surface, and the light-shielding layer is provided on at least a portion of the first surface; preferably, the light-shielding layer includes a metal material or an organic material; preferably, the light-shielding layer includes at least one of molybdenum metal, aluminum metal, and silver metal, or the light-shielding layer includes a black organic glue material.

[0008] According to one aspect of the present application, adjacent thin film transistors are connected via connecting lines, and the connecting lines are at least partially disposed in the substrate; or, the connecting lines are disposed in the array layer.

[0009] According to one aspect of the present application, it also includes a display function layer arranged on the side of the array layer away from the substrate; in the direction away from the substrate, the display function layer includes a first electrode layer, a light-emitting layer and a second electrode layer on one side that are stacked, and the orthographic projection of the first electrode layer on the substrate at least partially covers the orthographic projection of the thin film transistor on the substrate; preferably, the orthographic projection of the first electrode layer on the substrate at least partially covers the orthographic projection of the groove on the substrate.

[0010] According to one aspect of the present application, it also includes a signal line electrically connected to the thin film transistor or the display function layer; the light-shielding layer includes a conductive material, and at least a portion of the light-shielding layer forms the signal line.

[0011] According to one aspect of the present application, the substrate is an integrated structure; or, the substrate is a split structure, the substrate includes a first part and a second part connected to each other, the second part is arranged on one side of the first part, and the second part surrounds the groove.

[0012] According to one aspect of the present application, in a direction perpendicular to the plane where the substrate is located, the cross-section of the groove includes a bottom edge and a side edge connected to the bottom edge, and the angle between the bottom edge and the side edge is greater than or equal to 90°; preferably, in a direction perpendicular to the plane where the substrate is located, the cross-section of the groove is rectangular or trapezoidal.

[0013] On the other hand, the present invention also provides a method for preparing a display panel, wherein the display panel includes a first area and a second area adjacent to each other, the transmittance of the first area being greater than the transmittance of the second area, and the method for preparing the display panel includes the following steps: providing a substrate, wherein a groove is provided on one side of the substrate; forming a light-shielding layer and an array layer on one side of the substrate, wherein the array layer includes a thin film transistor, at least part of the thin film transistor is provided in the groove, and the light-shielding layer is provided on the side of the thin film transistor facing the substrate, and the orthographic projection of the light-shielding layer on the substrate at least partially covers the orthographic projection of the thin film transistor on the substrate.

[0014] According to another aspect of the present application, the step of providing a substrate includes: providing a substrate material layer; etching the substrate material layer to form a substrate having a groove; or providing a first part; forming a second part on one side of the first part, the second part enclosing the groove.

[0015] Yet another aspect of the present invention provides a display device, comprising: a display panel, wherein the display panel is the display panel in any of the above embodiments; and an optical element disposed in the first area.

[0016] Compared with the prior art, the display panel provided by the embodiment of the present invention includes a substrate, an array layer and a light-shielding layer. The thin-film transistor is arranged in a groove of the substrate, so that when an optical element is provided, the light output by the optical element can be refracted and reflected on the surface of the groove, so as to reduce the amount of light output by the optical element, such as the refracted light, that irradiates the thin-film transistor. Furthermore, the orthographic projection of the light-shielding layer on the substrate at least partially covers the orthographic projection of the thin-film transistor on the substrate, so as to utilize the light-shielding layer to block the light output by the optical element, prevent the light output by the optical element from entering the array layer, avoid refraction and scattering in the array layer, and thereby avoid the problem of flickering of the display panel due to leakage current caused by the thin-film transistor being irradiated by light, thereby improving the display effect and performance of the display panel. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the following briefly introduces the drawings required for use in the embodiments of the present application. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.

[0018] Figure 1 is a schematic structural diagram of a display panel provided by an embodiment of the present invention;

[0019] Figure 2 An embodiment provides Figure 1 Schematic diagram of the cross-sectional structure at the middle BB;

[0020] Figure 3 Another embodiment provides Figure 1 Schematic diagram of the cross-sectional structure at the middle BB;

[0021] Figure 4 Yet another embodiment provides Figure 1 Schematic diagram of the cross-sectional structure at the middle BB;

[0022] Figure 5 Yet another embodiment provides Figure 1 Schematic diagram of the cross-sectional structure at the middle BB;

[0023] Figure 6 is a flow chart of a method for manufacturing a display panel provided by an embodiment of the present invention;

[0024] Figure 7 1 is a schematic cross-sectional view of a structure obtained in step S110 of a method for manufacturing a display panel provided in an embodiment of the present invention.

[0025] In the attached figure:

[0026] 1-substrate; 11-first part; 12-second part; 2-array layer; 3-light-shielding layer; 4-display function layer; 41-first electrode layer; 42-light-emitting layer; 43-second electrode layer; L-connecting line; T-thin film transistor; Y-active layer; G-gate; S-source; D-drain; 20-optical element; K-groove; AA1-first area; AA2-second area. DETAILED DESCRIPTION

[0027] The features and exemplary embodiments of various aspects of the present application will be described in detail below. In order to make the purpose, technical solutions and advantages of the present application clearer, the present application will be further described in detail below in conjunction with the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described herein are only configured to explain the present application and are not configured to limit the present application. For those skilled in the art, the present application can be implemented without the need for some of these specific details. The following description of the embodiments is merely to provide a better understanding of the present application by illustrating the examples of the present application.

[0028] It should be noted that, in this document, relational terms such as first and second, etc., are used only to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any actual relationship or order between these entities or operations. Moreover, the terms "comprises," "comprising," or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article, or device comprising a series of elements includes not only those elements, but also other elements not explicitly listed, or elements inherent to such process, method, article, or device. In the absence of further limitations, the elements defined by the phrase "comprising..." do not exclude the presence of other identical elements in the process, method, article, or device comprising the elements.

[0029] It should be understood that when describing the structure of a component, when a layer or a region is referred to as being "on" or "over" another layer or region, it may mean that it is directly on the other layer or region, or that other layers or regions are included between it and the other layer or region. Furthermore, if the component is turned over, the layer or region will be "below" or "beneath" the other layer or region.

[0030] It will be apparent to those skilled in the art that various modifications and variations can be made in this application without departing from the spirit or scope of this application. Therefore, this application is intended to cover modifications and variations of this application that fall within the scope of the corresponding claims (technical solutions claimed for protection) and their equivalents. It should be noted that the embodiments provided in the examples of this application can be combined with each other without contradiction.

[0031] The present invention provides a display panel, a method for manufacturing a display panel, and a display device. Figures 1 to 7 Various embodiments of a display panel, a method for manufacturing a display panel, and a display device are described.

[0032] See also Figures 1 to 2 A display panel provided in an embodiment of the present application includes a first area AA1 and a second area AA2 adjacent to each other, wherein the transmittance of the first area AA1 is greater than the transmittance of the second area AA2, and the display panel includes: a substrate 1, wherein a groove K is provided on one side of the substrate 1 at least in the first area AA1, and the substrate 1 includes a first surface forming the groove K; an array layer 2 provided on one side of the substrate 1, the array layer 2 including a thin film transistor T, at least part of the thin film transistor T being provided in the groove K; a light shielding layer 3 provided between the substrate 1 and the thin film transistor T, and the orthographic projection of the light shielding layer 3 on the substrate 1 at least partially covers the orthographic projection of the thin film transistor T on the substrate 1.

[0033] The display panel provided by the embodiment of the present invention includes a substrate 1, an array layer 2 and a light-shielding layer 3. The thin-film transistor T is arranged in a groove K of the substrate 1, so that when the optical element 20 is provided, the light output by the optical element 20 can be refracted and reflected on the surface of the groove K, so as to reduce the amount of light output by the optical element 20, such as the refracted light, that irradiates the thin-film transistor T. Furthermore, the orthographic projection of the light-shielding layer 3 on the substrate 1 at least partially covers the orthographic projection of the thin-film transistor T on the substrate 1, so as to utilize the light-shielding layer 3 to block the light output by the optical element 20, prevent the light output by the optical element 20 from entering the array layer 2, avoid refraction and scattering in the array layer 2, and thus avoid the problem of flickering of the display panel caused by leakage current of the thin-film transistor T due to irradiation by light, thereby improving the display effect and performance of the display panel.

[0034] In this embodiment, the display panel includes adjacent first and second areas AA1 and AA2. The transmittance of the first area AA1 is greater than the transmittance of the second area AA2. The first area AA1 can be used to set cameras, infrared recognition elements, and other elements with high light requirements. For example, an infrared face recognition element can be set in the first area AA1. The infrared face recognition element can emit infrared light in the direction of the substrate 1 to achieve face recognition. When the infrared light is irradiated to the thin film transistor T, it will cause the thin film transistor T to generate leakage current, affecting the performance of the thin film transistor T, and thus causing the display panel to have a flickering screen problem.

[0035] To solve the above problem, in this embodiment, the thin film transistor T is arranged in the groove K of the substrate 1 and a light shielding layer 3 is provided to avoid the problem of flickering of the display panel caused by leakage current of the thin film transistor T due to exposure to light, thereby improving the display effect and performance of the display panel.

[0036] Optionally, the substrate 1 can be a hard substrate, such as a glass substrate; or a flexible substrate, and its material can be polyimide, polystyrene, polyethylene terephthalate, polyparaxylene, polyethersulfone or polyethylene naphthalate. The substrate 1 is mainly used to support the device disposed thereon.

[0037] Optionally, the array layer 2 includes a pixel circuit, which includes a plurality of thin film transistors T. Exemplarily, the pixel circuit provided in the array layer 2 includes a thin film transistor T and a storage capacitor. The thin film transistor T includes an active layer Y, a gate G, a source S, and a drain D.

[0038] In some optional embodiments, the groove wall and groove bottom of the groove K form a first surface, and the light shielding layer 3 is provided on at least a portion of the first surface. That is, the light shielding layer 3 can partially cover the groove wall and groove bottom, or can completely cover the groove wall and groove bottom to ensure the shielding effect.

[0039] In some optional embodiments, the light shielding layer 3 includes a metal material or an organic material.

[0040] In some optional embodiments, in a direction perpendicular to the plane of the substrate 1 , the cross section of the groove K includes a bottom edge and side edges connected to the bottom edge, and an angle between the bottom edge and the side edges is greater than or equal to 90°.

[0041] It is understood that if the angle between the bottom and the side is too small, the size of the groove K will also be reduced, making it inconvenient to dispose the thin-film transistor T and the light-shielding layer 3 on the first surface. In this embodiment, when the angle between the bottom and the side is equal to 90°, the cross-sectional shape of the corresponding groove K can be rectangular in the direction perpendicular to the plane of the substrate 1. Alternatively, the angle between the bottom and the side can be greater than 90°, that is, an obtuse angle, and the cross-sectional shape of the groove K in the direction perpendicular to the plane of the substrate 1 is trapezoidal. Of course, the angle between the bottom and the side should not be too large, as such a large angle will affect the improvement effect of the groove K in reducing the illumination of the thin-film transistor T by the light emitted from the optical element 20.

[0042] For example, the angle between the bottom edge and the side edge may be equal to 100°, 110°, 120°, etc.

[0043] It should be noted that the material of the shading layer 3 can be any type of metal material or organic material as long as it can ensure that the shading effect meets the requirements. For example, the shading layer 3 includes molybdenum metal, aluminum metal, silver metal, etc., or the shading layer 3 includes black organic glue material.

[0044] See also Figure 3In some optional embodiments, the display panel further includes a display function layer 4 disposed on the side of the array layer 2 facing away from the substrate 1; in the direction away from the substrate 1, the display function layer 4 includes a first electrode layer 41, a light-emitting layer 42, and a second electrode layer 43 that are stacked on one side, and the orthographic projection of the first electrode layer 41 on the substrate 1 at least partially covers the orthographic projection of the thin film transistor T on the substrate 1.

[0045] In this embodiment, since the first electrode layer 41 is usually made of a material with a certain light-shielding effect, the first electrode layer 41 can be used to shield the thin film transistor T to prevent the reflected light of the display function layer 4 or external light from irradiating the thin film transistor T.

[0046] In this embodiment, the size of the first electrode layer 41 can be increased so that the first electrode layer 41 blocks the thin film transistor T in a larger area. For example, the orthographic projection of the first electrode layer 41 on the substrate 1 can cover the orthographic projection of the thin film transistor T on the substrate 1, that is, the size of the first electrode layer 41 is greater than or equal to the size of the thin film transistor T.

[0047] Optionally, the light-emitting layer 42 includes one or more of an electron injection layer, an electron transport layer, a light-emitting material layer, a hole blocking layer, an electron blocking layer, a hole transport layer, and a hole injection layer. The specific type of light-emitting layer 42 can be selected and is not particularly limited. The electron injection layer, electron transport layer, and hole blocking layer can be disposed between the second electrode layer 43 and the light-emitting material layer. The electron blocking layer, hole transport layer, and hole injection layer can be disposed between the first electrode layer 41 and the light-emitting material layer.

[0048] The material of the first electrode layer 41 is generally a material with a high work function to improve hole injection efficiency, and can be gold (Au), platinum (Pt), titanium (Ti), silver (Ag), indium tin oxide (ITO), zinc tin oxide (IZO), or a transparent conductive polymer (such as polyaniline). For example, the first electrode layer 41 can be made of an ITO-Ag-ITO composite material, without particular limitation.

[0049] The material of the second electrode layer 43 can be one of the metal materials such as silver (Ag), aluminum (Al), lithium (Li), magnesium (Mg), ytterbium (Yb), calcium (Ca) or indium (In), or it can be an alloy of the aforementioned metal materials, such as magnesium-silver alloy (Mg / Ag) and lithium-aluminum alloy (Li / Al). This embodiment does not impose any restrictions on this.

[0050] Optionally, a planarization layer is further included between the substrate 1 and the pixel definition layer. The material of the planarization layer may be hexamethyldisiloxane, epoxy resin or polyimide, or other materials, which is not limited in this embodiment.

[0051] Optionally, the orthographic projection of the first electrode layer 41 on the substrate 1 at least partially covers the orthographic projection of the groove K on the substrate 1 to prevent the reflected light of the display functional layer 4 or external light from being reflected at the groove K and irradiating the thin film transistor T.

[0052] See also Figure 4 In some optional embodiments, adjacent thin film transistors T are connected via connecting lines L, and the connecting lines L are at least partially disposed in the substrate 1 ; or, the connecting lines L are disposed in the array layer 2 .

[0053] Since the thin film transistors T need to be arranged in the groove K, in order to facilitate the connection between adjacent thin film transistors T through the connecting wires L, when preparing the substrate 1, pre-wiring and connection can be performed inside the substrate 1 in advance, and the connecting wires L can be set so that adjacent thin film transistors T are connected through the connecting wires L that are at least partially arranged in the substrate 1.

[0054] Alternatively, the connection line L may be disposed in the array layer 2 . For example, the connection line L may be routed along the first surface of the groove K for easy arrangement.

[0055] In some optional embodiments, the display panel further includes a signal line electrically connected to the thin film transistor T or the display function layer 4; the light shielding layer 3 includes a conductive material, and at least a portion of the light shielding layer 3 forms the signal line.

[0056] In this embodiment, the signal line can specifically be a voltage signal line, such as a high-level voltage signal line VDD, or a low-level voltage signal line VSS, etc. When the light-shielding layer 3 is prepared using conductive materials such as metal, at least part of the light-shielding layer 3 can be used as a signal line to simplify the preparation process and reduce production costs.

[0057] In some optional embodiments, the substrate 1 is an integrated structure, that is, a portion of the substrate 1 can be thinned by etching or other processes to form a groove K on one side of the substrate 1. The process is simple and easy to operate.

[0058] Alternatively, the substrate 1 may be thickened, see Figure 5 For example, the substrate 1 is a split structure, and the substrate 1 includes a first part 11 and a second part 12 connected to each other. The second part 12 is provided on one side of the first part 11 and the second part 12 forms a groove K.

[0059] In this embodiment, the second portion 12 is additionally provided on one side of the first portion 11 and patterned so that the second portion 12 forms a groove K. The second portion 12 is raised relative to the first portion 11 .

[0060] See also Figure 6The embodiment of the present application further provides a method for manufacturing a display panel, wherein the display panel includes a first area AA1 and a second area AA2 adjacent to each other, wherein the transmittance of the first area AA1 is greater than the transmittance of the second area AA2. The method for manufacturing the display panel includes the following steps:

[0061] S110: Provide a substrate 1, wherein a groove K is provided on one side of the substrate 1. Figure 7 As shown;

[0062] S120: forming a light shielding layer 3 and an array layer 2 on one side of the substrate 1, wherein the array layer 2 includes a thin film transistor T, at least part of which is disposed in the groove K, and the light shielding layer 3 is disposed on the side of the thin film transistor T facing the substrate 1, wherein the orthographic projection of the light shielding layer 3 on the substrate 1 at least partially covers the orthographic projection of the thin film transistor T on the substrate 1, as shown in FIG. Figure 2 shown.

[0063] In the display panel manufacturing method provided in the embodiment of the present application, a thin film transistor T is arranged in a groove K of a substrate 1, so that when an optical element 20 is provided, light emitted by the optical element 20 can be refracted and reflected on the surface of the groove K, thereby reducing the amount of light emitted by the optical element 20 that directly irradiates the thin film transistor T. Furthermore, the orthographic projection of the light shielding layer 3 on the substrate 1 at least partially covers the orthographic projection of the thin film transistor T on the substrate 1, so that the light emitted by the optical element 20 is blocked by the light shielding layer 3, thereby preventing the light emitted by the optical element 20 from entering the array layer 2, avoiding refraction and scattering in the array layer 2, and thus avoiding the problem of flickering of the display panel due to leakage current caused by the thin film transistor T being irradiated by light, thereby improving the display effect and performance of the display panel.

[0064] In step S110, substrate 1 can be formed through processes such as coating, curing, and film formation. Substrate 1 can be a rigid substrate, such as a glass substrate, or a flexible substrate made of polyimide, polystyrene, polyethylene terephthalate, polyparaxylene, polyethersulfone, or polyethylene naphthalate. Substrate 1 primarily supports the devices disposed thereon.

[0065] Optionally, the step of providing the substrate 1 includes: providing a substrate material layer; etching the substrate material layer to form a substrate 1 having a groove K; or providing a first part 11; forming a second part 12 on one side of the first part 11, and the second part 12 surrounds the groove K.

[0066] In this embodiment, the substrate 1 is a split structure. A second portion 12 is additionally provided on one side of the first portion 11 and patterned accordingly so that the second portion 12 forms a groove K and the second portion 12 protrudes relative to the first portion 11 .

[0067] Of course, the substrate 1 may also adopt an integrated structure, and the groove K may be directly formed on the surface of the substrate 1 by etching or other process means.

[0068] In step S120 , the light shielding layer 3 may directly cover the first surface of the groove K, or may be formed on a certain film layer of the array layer 2 , as long as the light shielding layer 3 is located below the thin film transistor T.

[0069] The array layer 2 includes a pixel circuit, which includes a plurality of thin film transistors T. Exemplarily, the pixel circuit provided in the array layer 2 includes a thin film transistor T and a storage capacitor. The thin film transistor T includes an active layer Y, a gate G, a source S, and a drain D.

[0070] An embodiment of the present invention further provides a display device, including a display panel, which is the display panel in any of the above embodiments; and an optical element 20 disposed in the first area AA1.

[0071] In this embodiment, the display panel includes adjacent first and second areas AA1 and AA2. The transmittance of the first area AA1 is greater than that of the second area AA2. The first area AA1 can be used to set up cameras, infrared recognition elements, and other elements that have high light requirements. For example, an infrared face recognition element can be set in the first area AA1, and the infrared face recognition element can emit infrared light in the direction of the substrate 1 to achieve face recognition.

[0072] The display device provided by the embodiment of the present invention has the technical effects of the technical solution of the display panel in any of the above embodiments, and the explanations of the structures and terms that are the same as or corresponding to the above embodiments are not repeated here.

[0073] The display device provided in the embodiment of the present invention may be an organic light-emitting diode (OLED) display device, a quantum dot light-emitting diode (QLED) display device, or a micro flat panel display device (Micro-OLED or Micro-LED).

[0074] The display device provided in the embodiment of the present application can be applied to a mobile phone, or any electronic product with a display function, including but not limited to the following categories: televisions, laptops, desktop monitors, tablet computers, digital cameras, smart bracelets, smart glasses, car displays, medical equipment, industrial control equipment, touch interactive terminals, etc. The embodiment of the present application does not specifically limit this.

[0075] The above is only a specific implementation method of the present application. Those skilled in the art can clearly understand that for the convenience and brevity of description, the specific working processes of the systems, modules and units described above can refer to the corresponding processes in the aforementioned method embodiments, and will not be repeated here. It should be understood that the scope of protection of the present application is not limited to this. Any technician familiar with this technical field can easily think of various equivalent modifications or replacements within the technical scope disclosed in this application, and these modifications or replacements should be included in the scope of protection of this application.

[0076] It should also be noted that the exemplary embodiments mentioned in this application describe some methods or systems based on a series of steps or devices. However, this application is not limited to the order of the above steps. In other words, the steps can be performed in the order mentioned in the embodiments, or in a different order, or several steps can be performed simultaneously.

Claims

1. A display panel, characterized in that: The display panel comprises a first area and a second area adjacent to each other, wherein the light transmittance of the first area is greater than the light transmittance of the second area, and the display panel comprises: A substrate, wherein at least in the first region, a groove is provided on one side of the substrate; An array layer, disposed on one side of the substrate, the array layer comprising thin film transistors, at least part of the thin film transistors being disposed in the grooves; The light shielding layer is disposed on the side of the thin film transistor facing the substrate, and the orthographic projection of the light shielding layer on the substrate at least partially covers the orthographic projection of the thin film transistor on the substrate.

2. The display panel according to claim 1, characterized in that: The groove wall and the groove bottom of the groove form a first surface, and the light shielding layer is at least provided on a portion of the first surface; Preferably, the light shielding layer comprises a metal material or an organic material; Preferably, the light-shielding layer includes at least one of molybdenum metal, aluminum metal, and silver metal, or the light-shielding layer includes a black organic glue material.

3. The display panel according to claim 1, characterized in that: Adjacent thin film transistors are connected via connecting wires, and the connecting wires are at least partially disposed in the substrate; or, the connecting wires are disposed in the array layer.

4. The display panel according to claim 1, characterized in that: It also includes a display function layer disposed on a side of the array layer away from the substrate; In a direction away from the substrate, the display function layer includes a first electrode layer, a light-emitting layer and a second electrode layer which are stacked, and an orthographic projection of the first electrode layer on the substrate at least partially covers an orthographic projection of the thin film transistor on the substrate; Preferably, the orthographic projection of the first electrode layer on the substrate at least partially covers the orthographic projection of the groove on the substrate.

5. The display panel according to claim 3, characterized in that: Also includes a signal line electrically connected to the thin film transistor or the display function layer; The light shielding layer includes a conductive material, and at least a portion of the light shielding layer forms the signal line.

6. The display panel according to claim 1, characterized in that: The substrate is an integrated structure; or The substrate is a split structure, and comprises a first part and a second part connected to each other, wherein the second part is arranged on one side of the first part, and the second part surrounds the groove.

7. The display panel according to claim 1, characterized in that: In a direction perpendicular to the plane where the substrate is located, a cross section of the groove includes a bottom edge and a side edge connected to the bottom edge, and an angle between the bottom edge and the side edge is greater than or equal to 90°; Preferably, in a direction perpendicular to the plane where the substrate is located, the cross-sectional shape of the groove is rectangular or trapezoidal.

8. A method for preparing a display panel, characterized in that: The display panel comprises a first region and a second region adjacent to each other, the light transmittance of the first region is greater than the light transmittance of the second region, and the method for preparing the display panel comprises the following steps: Providing a substrate, wherein a groove is provided on one side of the substrate; A light-shielding layer and an array layer are formed on one side of the substrate, the array layer includes a thin film transistor, at least part of the thin film transistor is arranged in the groove, the light-shielding layer is arranged on the side of the thin film transistor facing the substrate, and the orthographic projection of the light-shielding layer on the substrate at least partially covers the orthographic projection of the thin film transistor on the substrate.

9. The method for preparing a display panel according to claim 8, characterized in that: The step of providing a substrate includes: providing a substrate material layer; Etching the substrate material layer to form a substrate with a groove; or, Provide the first part; A second portion is formed on one side of the first portion, and the second portion surrounds the groove.

10. A display device, characterized in that: include: A display panel, wherein the display panel is the display panel according to any one of claims 1 to 7; The optical element is arranged in the first area.

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