Display device and method of manufacturing same

Abstract

The invention relates to a display device and a method of manufacturing the same. The display device includes: a pixel defining layer provided with a pixel opening defined by the pixel defining layer; a light emitting element including a light emitting layer having at least a portion disposed in the pixel opening; a refractive pattern disposed on the light emitting element and overlapping the pixel opening; and a cover layer covering the refractive pattern and having a refractive index smaller than a refractive index of the refractive pattern. A plurality of grooves are defined in an upper surface of the refractive pattern, and each of the plurality of grooves has a diameter equal to or greater than about 50 nm and equal to or less than about 500 nm.

Description

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS

[0002] This application claims priority to and the benefit of Korean Patent Application No. 10-2023-0119461 filed in the Korean Intellectual Property Office on September 8, 2023, the entire contents of which are incorporated herein by reference. Technical Field

[0003] The present disclosure relates to a display device and a method for manufacturing the display device. More particularly, the present disclosure relates to a display device capable of improving luminous efficiency and reducing reflection of external light and a method for manufacturing the display device. Background Art

[0004] Various display devices applied to multimedia devices such as televisions, mobile phones, tablet computers, and gaming devices are being developed. The display devices include various optical functional layers to provide users with color images with excellent quality.

[0005] Research efforts on display devices with a thin thickness are being implemented to realize various display devices, such as display devices with curved surfaces, rollable display devices, and foldable display devices. By reducing the number of optical functional layers and including optical functional layers having various functions, a display device with a thin thickness can be realized.

[0006] It should be understood that this background technology section is intended, in part, to provide a useful background for understanding the technology. However, this background technology section may also include ideas, concepts or understandings that are not part of a part of the content known or understood by a person skilled in the relevant art before the corresponding effective application date of the subject matter disclosed herein. Summary of the invention

[0007] The technical objectives to be achieved by the present disclosure are not limited to the technical objectives described herein, and those skilled in the art can clearly understand other technical objectives not mentioned herein from the present disclosure.

[0008] The present disclosure provides a display device including a refraction pattern which improves light emitting efficiency and reduces reflection of external light.

[0009] The present disclosure provides a method of manufacturing a display device, which can simplify a manufacturing process to reduce process time and cost.

[0010] An embodiment of the present invention provides a display device, the display device comprising: a pixel defining layer provided with a pixel opening defined by the pixel defining layer; a light emitting element including a light emitting layer, at least a portion of the light emitting layer being disposed in the pixel opening; a refraction pattern disposed on the light emitting element and overlapping the pixel opening; and a covering layer covering the refraction pattern and having a refractive index smaller than that of the refraction pattern. A plurality of grooves are defined in an upper surface of the refraction pattern, and each of the plurality of grooves has a diameter equal to or greater than about 50 nm and equal to or less than about 500 nm.

[0011] The refraction pattern further includes a lower surface opposite to the upper surface and a side surface connecting the upper surface and the lower surface.

[0012] The side surface comprises a flat surface with a selectable inclination.

[0013] Each of the plurality of grooves has a depth equal to or greater than about 50 nm and equal to or less than about 500 nm.

[0014] A plurality of grooves are provided in the upper surface at three or more and nine or less per unit area, and the unit area is about 4 square micrometers.

[0015] The refractive index of the refraction pattern is equal to or greater than about 1.6.

[0016] The refractive pattern includes a photosensitive polymer.

[0017] The photosensitive polymer includes a block copolymer moiety.

[0018] The refraction pattern has a thickness equal to or greater than about 0.5 micrometers and equal to or less than about 1.5 micrometers.

[0019] The pixel openings include a first pixel opening, a second pixel opening, and a third pixel opening having different sizes from each other, and the refraction patterns include a first refraction pattern corresponding to the first pixel opening, a second refraction pattern corresponding to the second pixel opening, and a third refraction pattern corresponding to the third pixel opening.

[0020] The display device also includes a polarizer disposed on the cover layer.

[0021] The display device further includes an encapsulation layer disposed on the light emitting element, and the refraction pattern is disposed on the encapsulation layer.

[0022] The display device further includes an input sensor disposed between the light emitting element and the refraction pattern. The input sensor includes a first insulating layer disposed on the encapsulation layer, a first conductive layer disposed on the first insulating layer, a second insulating layer disposed on the first insulating layer and covering the first conductive layer, and a second conductive layer disposed on the second insulating layer, and the refraction pattern is disposed on the second insulating layer.

[0023] The input sensor further includes a third insulating layer covering the second conductive layer and disposed on the second insulating layer, and the refraction pattern is disposed on the third insulating layer.

[0024] An embodiment of the present invention provides a method for manufacturing a display device. The method for manufacturing a display device includes: providing a pixel defining layer and a light emitting element, the pixel defining layer is provided with a pixel opening defined by the pixel defining layer, the light emitting element includes a light emitting layer, and the light emitting layer has at least a portion disposed in the pixel opening; forming a preliminary refraction pattern including a photosensitive polymer on the light emitting element so that the preliminary refraction pattern overlaps with the pixel opening in a plan view; placing a mask on the preliminary refraction pattern, the mask including a grid member overlapping with the preliminary refraction pattern in a plan view, and the mask is provided with a plurality of holes defined by the grid member; exposing the grid member to ultraviolet light; and applying a developing solution on the preliminary refraction pattern to form a refraction pattern including an upper surface, the upper surface including a plurality of grooves having a diameter equal to or greater than about 50 nm and equal to or less than about 500 nm.

[0025] The exposure amount of ultraviolet light is equal to or greater than about one joule (1 J).

[0026] A distance between a first hole among the plurality of holes and a second hole adjacent to the first hole is equal to or greater than about 50 nm and equal to or less than about 500 nm.

[0027] The photosensitive polymer includes a block copolymer moiety.

[0028] The method further includes forming a cover layer covering the refractive pattern and having a refractive index smaller than that of the refractive pattern.

[0029] A plurality of grooves are provided in the upper surface at three or more and nine or less per unit area, and the unit area is about 4 square micrometers.

[0030] According to the above, the display device includes the refraction pattern provided with grooves, a plurality of grooves are defined in an upper surface of the refraction pattern, and thus, light emitting efficiency and reflection of external light are improved.

[0031] According to the above, the manufacturing process of the refraction pattern is simplified, and thus, the process time and the process cost are reduced in the method of manufacturing the display device. BRIEF DESCRIPTION OF THE DRAWINGS

[0032] The above and other aspects and features of the present disclosure will become more apparent by describing in detail embodiments of the present disclosure with reference to the accompanying drawings, in which:

[0033] Figure 1 is a perspective view of a display device according to an embodiment of the present disclosure;

[0034] Figure 2 is an exploded perspective view of a display device according to an embodiment of the present disclosure;

[0035] Figure 3 is a schematic cross-sectional view of a display device according to an embodiment of the present disclosure;

[0036] Figure 4A is a plan view of a display panel according to an embodiment of the present disclosure;

[0037] Figure 4B is a schematic cross-sectional view of a display panel according to an embodiment of the present disclosure;

[0038] Figure 5A is an enlarged plan view of an active area of ​​a display panel according to an embodiment of the present disclosure;

[0039] Figure 5B is an enlarged plan view of a light emitting area defined in an active area of ​​a display panel according to an embodiment of the present disclosure;

[0040] Figure 5C is an enlarged plan view of a plurality of light emitting regions defined in an active region of a display panel according to an embodiment of the present disclosure;

[0041] Figure 5D According to an embodiment of the present disclosure, Figure 5A A schematic cross-sectional view of the display device taken along line II';

[0042] Figure 6 is a schematic cross-sectional view of a portion of a display device according to an embodiment of the present disclosure;

[0043] Figure 7 is a flowchart illustrating a method of manufacturing a display device according to an embodiment of the present disclosure;

[0044] Figure 8 is a schematic cross-sectional view showing a process of a method for manufacturing a display device according to an embodiment of the present disclosure;

[0045] Fig. 9 is a schematic cross-sectional view showing a process of a method for manufacturing a display device according to an embodiment of the present disclosure;

[0046] Fig.10is a schematic cross-sectional view showing a process of a method for manufacturing a display device according to an embodiment of the present disclosure;

[0047] Fig.11 is a schematic cross-sectional view showing a process of a method for manufacturing a display device according to an embodiment of the present disclosure;

[0048] Fig.12 is a schematic cross-sectional view showing a process of a method of manufacturing a display device according to an embodiment of the present disclosure; and

[0049] Fig.13 is a graph showing changes in light emitting efficiency according to the number of grooves per unit area. DETAILED DESCRIPTION

[0050] The present disclosure will now be described more fully hereinafter with reference to the accompanying drawings showing embodiments, in which the present disclosure is described. However, the present disclosure may be implemented in different forms and should not be construed as limited to the embodiments set forth herein. Instead, these embodiments are provided so that the present disclosure will be thorough and complete and will fully convey the scope of the present disclosure to those skilled in the art.

[0051] It will be understood that in the specification, when an element (or region, layer or portion, etc.) is referred to as being "on" another element, "disposed on" another element, "connected to" or "coupled to" another element, the element may be directly disposed on, connected to or coupled to the above-mentioned another element, or an intervening element may be disposed between the element and the other element. It will be understood that the term "connected to" or "coupled to" may include physical or electrical connection or coupling.

[0052] In the drawings, the size, thickness, ratio, and dimensions of elements may be exaggerated for ease of description and clarity. The same reference numerals and / or reference symbols refer to the same elements throughout.

[0053] In this specification and claims, for the purpose of its meaning and interpretation, the term "and / or" is intended to include any combination of the terms "and" and "or". For example, "A and / or B" may be understood to mean "A, B, or A and B". The terms "and" and "or" may be used in a conjunction or disjunction sense and may be understood to be equivalent to "and / or".

[0054] In this specification and claims, for the purpose of its meaning and interpretation, the phrase "at least one of..." is intended to include the meaning of "at least one selected from the group of..." For example, "at least one of A and B" can be understood to mean "A, B, or A and B".

[0055] It will be understood that although the terms first, second, etc. may be used herein to describe various elements, these elements should not be limited by these terms. These terms are only used to distinguish one element from another element. For example, without departing from the scope of the present disclosure, a first element may be referred to as a second element, and similarly, a second element may be referred to as a first element.

[0056] As used herein, the singular forms "a", "an" and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise.

[0057] For ease of description, spatially relative terms such as "below", "below", "below", "above", or "on" may be used herein to describe the relationship between one element or assembly and another element or assembly as shown in the drawings. It will be understood that, in addition to the orientation depicted in the drawings, spatially relative terms are also intended to cover different orientations of the device in use or operation. For example, in the case where the device shown in the drawings is flipped, a device positioned "below" or "below" another device may be placed "above" another device. Accordingly, the illustrative term "below" may include both a lower position and an upper position. The device may also be positioned in other directions, and therefore spatially relative terms may be interpreted differently depending on the orientation.

[0058] The term "overlap / overlapping / overlapped" means that a first object can be above or below a second object or to the side of the second object, and vice versa. In addition, the term "overlap" may include layer, stack, facing or facing, extending over, covering or partially covering, or any other suitable term that will be appreciated and understood by a person of ordinary skill in the art.

[0059] The terms "facing" and "facing" mean that the first element can be directly or indirectly opposite to the second element. In the case where a third element is interposed between the first and second elements, the first and second elements can be understood to be indirectly opposite to each other although still facing each other.

[0060] When an element is described as “not “overlapping” or “not overlapping” another element, this may include the elements being spaced apart, offset or spaced apart from each other, or any other suitable terminology as would be appreciated and understood by one of ordinary skill in the art.

[0061] When the terms “comprises / comprising,” “includes / including,” and / or “has / have / having,” and variations thereof are used in this specification, they indicate the presence of stated features, integers, steps, operations, elements, components, and / or groups thereof, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and / or groups thereof.

[0062] As used herein, "about" or "approximately" includes the stated value and means within an acceptable range of deviation for the particular value as determined by one of ordinary skill in the art, taking into account the measurement in question and the errors associated with the measurement of a particular quantity (i.e., the limitations of the measurement system). For example, "about" can mean within one or more standard deviations, or within ±30%, ±20%, ±10%, or ±5% of the stated value.

[0063] Unless otherwise defined or implied herein, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by those of ordinary skill in the art to which the present disclosure applies. It will also be understood that, unless expressly defined as such herein, terms (such as those defined in general dictionaries) should be interpreted as having a meaning consistent with their meaning in the context of the relevant art, and will not be interpreted in an idealized or overly formal sense.

[0064] The phrase "in a plan view" means observing an object from the top, and the phrase "in a schematic cross-sectional view" means observing a cross section of an object cut vertically from the side. Thus, the expression "in a plan view" used herein may mean observing an object from the top in a third direction DR3. The phrase "in a schematic cross-sectional view" means observing a cross section of an object cut vertically from the side in the first direction DR1 or in the second direction DR2. The third direction DR3 may also be referred to as a "thickness direction". The direction intersecting the first direction DR1 is referred to as the second direction DR2. A direction substantially perpendicular to a plane defined by the first direction DR1 and the second direction DR2 is referred to as the third direction DR3 or the "thickness direction".

[0065] When an element is referred to as “contacting” or “being contacted” with another element, the element may be “electrically in contact” or “physically in contact” with the other element; or “indirectly in contact” or “directly in contact” with the other element.

[0066] A description that a component is "configured to" perform a specified operation may be defined as a situation where the component is constructed and arranged to have structural features that enable the component to perform the specified operation.

[0067] The embodiments may be described and illustrated in the drawings in terms of functional blocks, units and / or modules.

[0068] Those skilled in the art will understand that these blocks, units and / or modules are physically implemented by electronic (or optical) circuits (such as logic circuits, discrete components, microprocessors, hard-wired circuits, storage elements and wiring connections, etc.), which can be formed using semiconductor-based manufacturing techniques or other manufacturing techniques.

[0069] Where blocks, units and / or modules are implemented by a microprocessor or other similar hardware, they may be programmed and controlled using software (eg, microcode) to perform the various functions discussed herein, and may optionally be driven by firmware and / or software.

[0070] It is also contemplated that each block, unit and / or module may be implemented by dedicated hardware or a combination of dedicated hardware to perform certain functions and by a processor (eg, one or more programmed microprocessors and associated circuits) to perform other functions.

[0071] Each block, unit and / or module of the embodiments may be physically divided into two or more interacting and discrete blocks, units and / or modules without departing from the scope of the present disclosure.

[0072] Furthermore, the blocks, units and / or modules of the embodiments may be physically combined into more complex blocks, units and / or modules without departing from the scope of the present disclosure.

[0073] Hereinafter, embodiments of the present disclosure will be described with reference to the accompanying drawings.

[0074] Figure 1 is a perspective view of a display device DD according to an embodiment of the present disclosure. Figure 2 is an exploded perspective view of a display device DD according to an embodiment of the present disclosure. Figure 3 is a schematic cross-sectional view of a display device DD according to an embodiment of the present disclosure.

[0075] Reference Figure 1 , the display device DD can be activated in response to the electrical signal. The display device DD can be applied to various embodiments. For example, the display device DD can be applied to electronic devices such as smart watches, computers (e.g., tablet computers, notebook computers), and smart TVs. In the embodiments, a smart phone will be described as a representative example of the display device DD.

[0076] The display device DD may display an image IM toward a third direction DR3 through a display surface FS substantially parallel to each of the first direction DR1 and the second direction DR2. The image IM may include a video as well as a still image. Figure 1A clock widget and an application icon are shown as representative examples of the image IM. The display surface FS through which the image IM is displayed may correspond to the front surface of the display device DD and the front surface of the window WM.

[0077] In an embodiment, the front (or upper) surface and the rear (or lower) surface of each member of the display device DD may be defined relative to the direction in which the image IM is displayed. The front surface and the rear surface may face each other in the third direction DR3, and the normal direction of each of the front surface and the rear surface may be substantially parallel to the third direction DR3.

[0078] Reference Figure 2 , the display device DD may include a window WM, a display module DM, a driving circuit DC, and a housing HU. In an embodiment, the window WM and the housing HU may be coupled to each other to provide an appearance of the display device DD.

[0079] The window WM may include an optically transparent insulating material. As an example, the window WM may include glass or a plastic material or a combination thereof. The window WM may have a single-layer structure or a multi-layer structure. As an example, the window WM may include a plastic film or a glass substrate coupled to each other by an adhesive and a plastic film coupled to the glass substrate by an adhesive.

[0080] The front surface of the window WM may define a display surface FS of the display device DD as described above. The transmissive area TA may be an optically transparent area. For example, the transmissive area TA may be an area having a visible light transmittance of about 90% or more.

[0081] The bezel area BZA may be an area having a relatively low transmittance compared to the transmission area TA. The bezel area BZA may define the shape of the transmission area TA. The bezel area BZA may be disposed adjacent to the transmission area TA and may surround the transmission area TA.

[0082] The bezel area BZA may have a selectable color. The bezel area BZA may cover the peripheral area NAA of the display module DM to prevent the peripheral area NAA from being observed from the outside. However, this is merely an example, and according to an embodiment of the present disclosure, the bezel area BZA may be omitted from the window WM.

[0083] The display module DM can display the image IM (refer to Figure 1 ), and may sense external input. The display module DM may include a front surface IS, the front surface IS including an active area AA and a peripheral area NAA. The active area AA may be an area activated in response to an electrical signal.

[0084] In an embodiment, the active area AA may be an image IM (see Figure 1) is displayed and an external input is sensed. The transmission area TA may overlap at least a portion of the active area AA. For example, the transmission area TA may overlap the entire surface or at least a portion of the active area AA.

[0085] Accordingly, the user can observe the image IM through the transmission area TA (refer to Figure 1 ) or an external input may be provided, however, this is merely an example. According to an embodiment, by displaying an image IM (refer to Figure 1 ) and an area through which an external input is sensed may be separated from each other in the active area AA, and they should not be limited to the embodiments.

[0086] The peripheral area NAA may be covered by the frame area BZA. The peripheral area NAA may be disposed adjacent to the active area AA. The peripheral area NAA may surround the active area AA. A driving circuit or driving line for driving the active area AA may be disposed in the peripheral area NAA.

[0087] The driving circuit DC may include a flexible circuit board CF and a main circuit board MB. The flexible circuit board CF may be electrically connected to the display module DM. The flexible circuit board CF may connect the display module DM to the main circuit board MB. However, this is merely an example. According to an embodiment, the flexible circuit board CF may not be electrically connected to a separate circuit board, and the flexible circuit board CF may be a rigid substrate.

[0088] The flexible circuit board CF may be electrically connected to a pad of the display module DM which may be disposed in the peripheral area NAA. The flexible circuit board CF may provide an electrical signal to the display module DM to drive the display module DM. The electrical signal may be generated by the flexible circuit board CF or the main circuit board MB.

[0089] The main circuit board MB may include various driving circuits to drive the display module DM or a connector to provide power. The main circuit board MB may be electrically connected to the display module DM through a flexible circuit board CF.

[0090] The housing HU may be coupled with the window WM. The housing HU may be coupled with the window WM to provide an optional inner space. The display module DM may be accommodated in the inner space.

[0091] The housing HU may have a relatively high rigidity material. For example, the housing HU may include a frame and / or a plate including glass, plastic, or metal material or a combination thereof. The housing HU may stably protect the components of the display device DD that may be accommodated in the internal space from external impacts.

[0092] Figure 3 is a schematic cross-sectional view of a display device DD according to an embodiment of the present disclosure. Figure 3In the figure, the display device DD is simply illustrated to show the stacking relationship of the functional panels and / or functional components constituting the display device DD.

[0093] The display device DD may include a display module DM, a light control layer LCL, and a window WM. The display module DM may include a display panel DP and an input sensor ISL. According to an embodiment, the input sensor ISL may be omitted.

[0094] The display panel DP can generate an image IM (refer to Figure 1 The display panel DP may include pixels PX (refer to Figure 4A ). The display panel DP may be a light-emitting display panel including a light-emitting element as its display element, however, it should not be particularly limited. For example, the display panel DP may be an organic light-emitting display panel or an inorganic light-emitting display panel. The light-emitting layer of the organic light-emitting display panel may include an organic light-emitting material. The light-emitting layer of the inorganic light-emitting display panel may include quantum dots, quantum rods, inorganic light-emitting diodes (LEDs), or a combination thereof. Hereinafter, an organic light-emitting display panel will be described as a representative example of the display panel DP.

[0095] The input sensor ISL may be disposed on the display panel DP. The input sensor ISL may obtain coordinate information of an external input (eg, a touch event). The input sensor ISL may sense the external input by a capacitive method.

[0096] The light control layer LCL may be disposed on the input sensor ISL. The light control layer LCL may include Figure 5A and Figure 5B The refraction pattern PT and the cover layer CVL described. The refraction pattern PT and the cover layer CVL may have different refractive indices from each other.

[0097] The light control layer LCL may control the path of the light generated by the display panel DP (hereinafter, referred to as source light). In addition, the light control layer LCL may reduce the reflectivity of natural light (or sunlight) incident thereto from above the window WM. This will be described in detail later.

[0098] The window WM may be disposed on the light control layer LCL. The window WM may be coupled to the light control layer LCL through a window adhesive layer ADL. The window adhesive layer ADL may include a pressure sensitive adhesive (PSA) or an optically clear adhesive (OCA).

[0099] Figure 4A is a plan view of a display panel DP according to an embodiment of the present disclosure. Figure 4B is a schematic cross-sectional view of a display panel DP according to an embodiment of the present disclosure.

[0100] Reference Figure 4A, display panel DP (reference Figure 3 ) may include a base layer BS, the base layer BS includes a reference Figure 2 Described are the active area AA and the surrounding area NAA.

[0101] The display panel DP may include pixels PX disposed in the active area AA and signal lines SGL electrically connected to the pixels PX. The display panel DP may include a driving circuit GDC and a pad part PLD which may be disposed in the peripheral area NAA.

[0102] The pixels PX may be arranged in the first direction DR1 and the second direction DR2. The pixels PX may include pixel rows extending in the first direction DR1 and arranged in the second direction DR2, and pixel columns extending in the second direction DR2 and arranged in the first direction DR1.

[0103] The signal line SGL may include a gate line GL, a data line DL, a power line PL, and a control signal line CSL. Each of the plurality of gate lines GL may be electrically connected to a corresponding pixel among the plurality of pixels PX, and each of the plurality of data lines DL may be electrically connected to a corresponding pixel among the plurality of pixels PX. The power line PL may be electrically connected to the pixel PX. The control signal line CSL may be electrically connected to the drive circuit GDC and may provide a control signal to the drive circuit GDC.

[0104] The driving circuit GDC may include a gate driving circuit. The gate driving circuit may generate a gate signal and may sequentially output the gate signal to the gate lines GL. The gate driving circuit may also output other control signals to the pixel driving circuit.

[0105] The pad part PLD can be electrically connected to the reference Figure 2 The flexible circuit board CF is described. The pad part PLD may include a pixel pad D-PD and an input pad I-PD.

[0106] The pixel pad D-PD may be used to connect the flexible circuit board CF (refer to Figure 2 ) is connected to a pad of the display panel DP. Each of the plurality of pixel pads D-PD may be electrically connected to a corresponding signal line among a plurality of signal lines SGL. The pixel pad D-PD may be electrically connected to a corresponding pixel PX via the signal line SGL. In addition, the drive circuit GDC may be electrically connected to a pixel pad among the pixel pads D-PD.

[0107] The input pad I-PD can be used to connect the flexible circuit board CF (refer to Figure 2 ) is connected to the input sensor ISL (refer to Figure 3 ) pad. Figure 4A1 shows a structure in which the input pad I-PD may be provided in the display panel DP, however, the present disclosure should not be limited to the structure described herein. According to an embodiment, the input pad I-PD may be provided in the input sensor ISL (refer to Figure 3 ) and can be electrically connected to a circuit board different from the circuit board to which the pixel pad D-PD is electrically connected.

[0108] Reference Figure 4B , the display panel DP may include a base layer BS, a circuit element layer DP-CL, a display element layer DP-OLED and an encapsulation layer TFE.

[0109] The base layer BS may include a synthetic resin layer. The base layer BS may be a glass substrate, a metal substrate, or an organic / inorganic composite substrate. As an example, the base layer BS may be a silicon substrate including silicon. The base layer BS may be a silicon wafer.

[0110] At least one inorganic layer may be disposed on the upper surface of the base layer BS. The buffer layer BFL may increase the adhesion between the base layer BS and the semiconductor pattern. The buffer layer BFL may include a silicon oxide layer, a silicon nitride layer, or a combination thereof, and the silicon oxide layer and the silicon nitride layer may be alternately stacked with each other.

[0111] The display panel DP may include an insulating layer, a semiconductor pattern, and a conductive pattern for forming a signal line, for example. The insulating layer, the semiconductor layer, and the conductive layer may be formed by a coating or deposition process. The insulating layer, the semiconductor layer, and the conductive layer may then be selectively patterned by several photolithography processes. Accordingly, a semiconductor pattern included in the circuit element layer DP-CL and the display element layer DP-OLED and a conductive pattern for forming a signal line, for example, may be formed.

[0112] The semiconductor pattern may be disposed on the buffer layer BFL. The semiconductor pattern may include polysilicon, however, it should not be limited as described herein. According to an embodiment, the semiconductor pattern may include amorphous silicon or metal oxide, or a combination thereof.

[0113] Figure 4B A portion of the semiconductor pattern is shown, and the semiconductor pattern may also be provided in the light emitting regions LA1, LA2, and LA3 described later (refer to Figure 5A and Figure 5B ). The semiconductor pattern can be arranged throughout the light emitting area in a selected regularity. Depending on whether it is doped, or whether it is doped with an N-type dopant or a P-type dopant, the semiconductor pattern can have different electrical properties. The semiconductor pattern may include a first region with a relatively high doping concentration and a second region with a relatively low doping concentration. The first region may be doped with an N-type dopant or a P-type dopant. The P-type transistor may include a doped region doped with a P-type dopant.

[0114] The first region may have a conductivity greater than that of the second region and may be substantially used as an electrode or a signal line. The second region may substantially correspond to an active portion (or channel) of a transistor. In other words, a portion of the semiconductor pattern may be an active portion of a transistor, another portion of the semiconductor pattern may be a source or drain of the transistor, and another portion of the semiconductor pattern may be a conductive region.

[0115] like Figure 4B As shown in , the source S1 , the active portion A1 , and the drain D1 of the transistor T1 may be formed of a semiconductor pattern. Figure 4B A portion of a signal transmission line SCL formed of a semiconductor pattern is shown Although not shown in the drawings, the signal transmission line SCL may be electrically connected to a drain D1 of the transistor T1 in a plan view.

[0116] The first insulating layer 10, the second insulating layer 20, the third insulating layer 30, the fourth insulating layer 40, the fifth insulating layer 50, and the sixth insulating layer 60 may be disposed on the buffer layer BFL. Each of the first insulating layer 10 to the sixth insulating layer 60 may be an inorganic layer or an organic layer. The gate G1 may be disposed on the first insulating layer 10. The upper electrode UE may be disposed on the second insulating layer 20. The first connection electrode CNE1 may be disposed on the third insulating layer 30. The first connection electrode CNE1 may be electrically connected to the signal transmission line SCL via a contact hole CNT-1 defined by the first insulating layer 10 to the third insulating layer 30. The fourth insulating layer 40 and the fifth insulating layer 50 may be disposed on the third insulating layer 30. According to an embodiment, each of the fourth insulating layer 40 and the fifth insulating layer 50 may be an organic layer.

[0117] The second connection electrode CNE2 may be disposed on the fifth insulating layer 50. The second connection electrode CNE2 may be electrically connected to the first connection electrode CNE1 via a contact hole CNT-2 defined by the fourth insulating layer 40 and the fifth insulating layer 50.

[0118] The display element layer DP-OLED may be disposed on the circuit element layer DP-CL. According to an embodiment, the display element layer PD-OLED may include a light emitting element OLED, a pixel defining layer PDL, and a capping layer CPL.

[0119] The light emitting element OLED may be disposed on the sixth insulating layer 60. According to an embodiment, the light emitting element OLED may include a first electrode AE, a hole control layer HCL, a light emitting layer EML, an electron control layer ECL, and a second electrode CE.

[0120] The first electrode AE ​​may be disposed on the sixth insulating layer 60. The first electrode AE ​​may be electrically connected to the second connection electrode CNE2 via a contact hole CNT-3 defined by the sixth insulating layer 60. The pixel defining layer PDL may be disposed on the sixth insulating layer 60. The pixel opening OP-P may be defined by the pixel defining layer PDL. At least a portion of the first electrode AE ​​may be exposed through the pixel opening OP-P of the pixel defining layer PDL. In an embodiment, the light emitting area LA may be defined to correspond to a portion of the first electrode AE ​​exposed through the pixel opening OP-P. The non-light emitting area NLA may correspond to the active area AA (refer to Figure 2 ) except the light emitting area LA.

[0121] The pixel defining layer PDL may have a light absorbing material. The pixel defining layer PDL may include a black colorant. The black colorant may include a black dye or a black pigment. The black colorant may include carbon black, a metal material such as chromium, and an oxide thereof.

[0122] The hole control layer HCL may be disposed on the first electrode AE. The hole control layer HCL may be commonly disposed in the emission area LA and the non-emission area NLA. The hole control layer HCL may include a hole transport layer, and may further include a hole injection layer.

[0123] The light emitting layer EML may be disposed on the hole control layer HCL. The light emitting layer EML may be disposed in a region corresponding to the pixel opening OP-P. For example, the light emitting layer EML may be disposed to correspond to the light emitting region LA.

[0124] The electron control layer ECL may be disposed on the light emitting layer EML. The electron control layer ECL may include an electron transport layer and may further include an electron injection layer. The second electrode CE may be disposed on the electron control layer ECL. The electron control layer ECL and the second electrode CE may be commonly disposed throughout the light emitting area LA and the non-light emitting area NLA.

[0125] The capping layer CPL may be disposed on the second electrode CE. The capping layer CPL may be commonly disposed throughout the emission area LA and the non-emission area NLA.

[0126] According to an embodiment, the capping layer CPL may include an inorganic material. The capping layer CPL may be formed by a sputtering deposition process.

[0127] The capping layer CPL may cover the second electrode CE and thus may protect the second electrode CE and the light emitting layer EML from external moisture and contaminants. In addition, light totally reflected at the interface between the second electrode CE and the capping layer CPL may be reduced by adjusting the refractive index and thickness of the capping layer CPL.

[0128] The encapsulation layer TFE may be disposed on the display element layer DP-OLED. The encapsulation layer TFE may encapsulate the display element layer DP-OLED. The encapsulation layer TFE may include a single layer or multiple layers stacked on each other. The encapsulation layer TFE may include at least one organic layer.

[0129] According to an embodiment, the encapsulation layer TFE may include a first inorganic layer IOL1, an organic layer OL, and a second inorganic layer IOL2. The first inorganic layer IOL1 may be disposed on the capping layer CPL. The organic layer OL may be disposed on the first inorganic layer IOL1. The second inorganic layer IOL2 may be disposed on the organic layer OL and may cover the organic layer OL.

[0130] The first inorganic layer IOL1 and the second inorganic layer IOL2 may protect the display element layer DP-OLED from moisture and oxygen, and the organic layer OL may protect the display element layer DP-OED from foreign substances such as dust particles.

[0131] Figure 5A is a display panel DP according to an embodiment of the present disclosure (refer to Figure 3 ) of the active area AA (refer to Figure 2 ) is an enlarged plan view of the Figure 5B is an enlarged plan view of a light emitting area LA-A defined in an active area AA of a display panel DP according to an embodiment of the present disclosure. Figure 5C is an enlarged plan view of a plurality of light emitting areas LA1 , LA2 , and LA3 defined in the active area AA of the display panel DP according to an embodiment of the present disclosure. Figure 5D According to an embodiment of the present disclosure, Figure 5A Schematic cross-sectional view of the display device DD taken along line II'. Figure 6 is a schematic cross-sectional view of a portion of a display device DD according to an embodiment of the present disclosure.

[0132] Figure 5A is a diagram showing the display device DD (see Figure 3 ) is a plan view of the relationship between the light control layer LCL and the light emitting areas LA1, LA2 and LA3 when viewed from the front surface of the TFT.

[0133] Figure 5B and Figure 5C Yes Figure 5A 2 is an enlarged plan view of a portion of the light control layer LCL and the light emitting areas LA1, LA2 and LA3 shown in FIG.

[0134] Reference Figure 4B and Figure 5A, the pixel opening OP-P may include a first pixel opening OP-P1, a second pixel opening OP-P2, and a third pixel opening OP-P3 having sizes different from each other. In a plan view, the size of the first pixel opening OP-P1 may be larger than the size of the second pixel opening OP-P2, and in a plan view, the size of the first pixel opening OP-P1 may be smaller than the size of the third pixel opening OP-P3.

[0135] Reference Figure 5A and Figure 5D , the light emitting layer EML may include a first light emitting layer EML1, a second light emitting layer EML2, and a third light emitting layer EML3. A region in which the first pixel opening OP-P1 may overlap with the first light emitting layer EML1 in a plan view may be defined as a first light emitting region LA1. A region in which the second pixel opening OP-P2 may overlap with the second light emitting layer EML2 in a plan view may be defined as a second light emitting region LA2. A region in which the third pixel opening OP-P3 may overlap with the third light emitting layer EML3 in a plan view may be defined as a third light emitting region LA3.

[0136] In a plan view, the first light emitting area LA1 and the third light emitting area LA3 may be arranged alternately with each other in the first direction DR1. In a plan view, the second light emitting area LA2 may be arranged in a pixel row different from the first light emitting area LA1 and the third light emitting area LA3, and in a plan view, the second light emitting area LA2 may be arranged in the same pixel row along the first direction DR1. The first light emitting area LA1 and the second light emitting area LA2 may be arranged alternately with each other in a fourth direction DR4 intersecting the first direction DR1 and the second direction DR2. The second light emitting area LA2 and the third light emitting area LA3 may be arranged alternately with each other in the fourth direction DR4. However, the present embodiment is not limited to the arrangement of the first light emitting area LA1, the second light emitting area LA2, and the third light emitting area LA3 as described herein.

[0137] Figure 5B It is shown Figure 5A FIG. 1 is an enlarged plan view of a pattern PT-A among the first pattern PT1, the second pattern PT2, and the third pattern PT3, and a light emitting area LA-A corresponding to the pattern PT-A among the first light emitting area LA1, the second light emitting area LA2, and the third light emitting area LA3. Figure 5B The description of the described pattern PT-A may be applied to the first pattern PT1 , the second pattern PT2 , and the third pattern PT3 .

[0138] Reference Figure 5B, in a plan view, the size of the pattern PT-A may be larger than the size of the corresponding light emitting area LA-A. Accordingly, in a plan view, the edge EP of the pattern PT-A may surround the edge EL of the corresponding light emitting area LA-A. In this case, the edge EP of the pattern PT-A may be spaced apart from the edge EL of the corresponding light emitting area LA-A by a selectable distance dA (hereinafter, referred to as the spacing distance dA).

[0139] Reference Figure 4B and Figure 5B , the edge EP of the pattern PT-A may be defined as the outermost portion of the pattern PT-A, which may contact the third insulating layer IL3 of the input sensor ISL (refer to Figure 5D In the present disclosure, the edge EL of the light emitting area LA-A may be defined as an outermost portion of the first electrode AE ​​that is exposed through the pixel opening OP-PA of the pixel defining layer PDL and is not covered by the pixel defining layer PDL.

[0140] A spacing distance dA between the edge EP of the pattern PT-A and the edge EL of the light emitting area LA-A may be equal to or greater than about 0.5 micrometers.

[0141] For example, in a plan view, the pattern PT-A may completely cover the corresponding light emitting area LA-A, and in a plan view, the pattern PT-A may have a size larger than that of the corresponding light emitting area LA-A, and thus, the light emitting element OLED (refer to Figure 4B ) The light emitted toward the side surface direction may pass through the pattern PT-A. Accordingly, the pattern PT-A may output the light traveling in the side surface direction to a direction substantially the same as the third direction DR3, and thus the light emitting efficiency of the display device DD may be improved. This will be described in detail later.

[0142] Figure 5C It is shown Figure 5A An enlarged plan view of each of the first pattern PT1, the second pattern PT2, and the third pattern PT3 shown in FIG.

[0143] The spacing distance between the edge E-P1 of the first pattern PT1 and the edge E-L1 of the first light emitting area LA1 in the plan view is called the first distance d1. The spacing distance between the edge E-P2 of the second pattern PT2 and the edge E-L2 of the second light emitting area LA2 in the plan view is called the second distance d2. The spacing distance between the edge E-P3 of the third pattern PT3 and the edge E-L3 of the third light emitting area LA3 in the plan view is called the third distance d3.

[0144] The first distance d1, the second distance d2, and the third distance d3 may have different values ​​from each other based on characteristics of light emitted from the first, second, and third light emitting areas LA1, LA2, and LA3.

[0145] Reference Figure 5D The display device DD may include a display panel DP, an input sensor ISL, a light control layer LCL, a window adhesive layer ADL and a window WM, and the display panel DP may include a base layer BS, a circuit element layer DP-CL, a display element layer DP-OLED and an encapsulation layer TFE.

[0146] Figure 5D It is schematically shown that each of the base body layer BS, the circuit element layers DP-CL, and the encapsulation layer TFE is a single layer. Figure 4B The display element layer DP-OLED including a pixel defining layer PDL and a light emitting element OLED including a first electrode AE, a hole control layer HCL, a light emitting layer EML, an electron control layer ECL and a second electrode CE are shown. Figure 5D In the same / similar reference numerals, Figures 1 to 4B , and therefore, detailed description of the same / similar elements will be omitted.

[0147] The light emitting element OLED may include a light emitting layer EML having at least a portion disposed in the pixel opening OP-P. The light emitting element OLED may include a first electrode AE, a light emitting layer EML disposed on the first electrode AE ​​and including at least a portion disposed in the pixel opening OP-P, and a second electrode CE disposed on the light emitting layer EML. The light emitting element OLED may be provided in plurality, and the light emitting element OLED may include a first light emitting element OLED1, a second light emitting element OLED2, and a third light emitting element OLED3.

[0148] The first light emitting element OLED1 may include a first electrode AE ​​exposed through the first pixel opening OP-P1, a first light emitting layer EML1 disposed on the first electrode AE ​​and emitting a first color light, and a second electrode CE disposed on the first light emitting layer EML1. At least a portion of the first light emitting layer EML1 may be disposed in the first pixel opening OP-P1. The first pixel opening OP-P1 may define a first light emitting area LA1.

[0149] The second light emitting element OLED2 may include a first electrode AE ​​exposed through the second pixel opening OP-P2, a second light emitting layer EML2 disposed on the first electrode AE ​​and emitting a second color light, and a second electrode CE disposed on the second light emitting layer EML2. At least a portion of the second light emitting layer EML2 may be disposed in the second pixel opening OP-P2. The second pixel opening OP-P2 may define a second light emitting area LA2.

[0150] The third light emitting element OLED3 may include a first electrode AE ​​exposed through a third pixel opening OP-P3, a third light emitting layer EML3 disposed on the first electrode AE ​​and emitting a third color light, and a second electrode CE disposed on the third light emitting layer EML3. At least a portion of the third light emitting layer EML3 may be disposed in the third pixel opening OP-P3. The third pixel opening OP-P3 may define a third light emitting area LA3.

[0151] The first light emitting layer EML1 included in the first light emitting element OLED1 may emit a first color light. The second light emitting layer EML2 included in the second light emitting element OLED2 may emit a second color light. The third light emitting layer EML3 included in the third light emitting element OLED3 may emit a third color light. The first color light, the second color light, and the third color light may have colors different from each other. As an example, the first color light from the first light emitting area LA1 may be red light, the second color light from the second light emitting area LA2 may be green light, and the third color light from the third light emitting area LA3 may be blue light. However, the present disclosure should not be limited to as described herein, and the first color light, the second color light, and the third color light may be selected as a combination of three color lights that produce white color light when they are mixed. According to an embodiment, the first color light, the second color light, and the third color light may have the same color.

[0152] The display device DD may further include an input sensor ISL disposed between the light emitting element OLED and the refraction pattern PT. The input sensor ISL may be directly disposed on the encapsulation layer TFE. The input sensor ISL may include a first insulating layer IL1, a first conductive layer CL1, a second insulating layer IL2, a second conductive layer CL2, and a third insulating layer IL3. The first insulating layer IL1 may be disposed on the encapsulation layer TFE. The first conductive layer CL1 may be disposed on the first insulating layer IL1. The second insulating layer IL2 may be disposed on the first insulating layer IL1 and may cover the first conductive layer CL1. The second conductive layer CL2 may be disposed on the second insulating layer IL2. The second conductive layer CL2 may be electrically connected to the first conductive layer CL1 via a contact hole CNT-A defined by the second insulating layer IL2. The third insulating layer IL3 may be disposed on the second insulating layer IL2 and may cover the second conductive layer CL2.

[0153] Each of the first insulating layer IL1, the second insulating layer IL2, and the third insulating layer IL3 may include at least one of an inorganic material and an organic material or a combination thereof. Each of the first conductive layer CL1 and the second conductive layer CL2 may have conductivity and may have a single layer structure or a multilayer structure.

[0154] In a plan view, at least one of the first conductive layer CL1 and the second conductive layer CL2 may be provided as a mesh line. In a plan view, the mesh line may not overlap with the light emitting layer EML. Accordingly, even if the input sensor ISL is directly formed on the display panel DP, light emitted from the light emitting element OLED may be provided to the user without being disturbed by the input sensor ISL.

[0155] The light control layer LCL may be disposed on the light emitting element OLED. The light control layer LCL may be disposed on the input sensor ISL. The light control layer LCL may include a refraction pattern PT and a cover layer CVL.

[0156] The refraction pattern PT may be disposed above the light emitting element OLED and may overlap with the pixel opening OP-P. The refraction pattern PT may be disposed above the encapsulation layer TFE. The refraction pattern PT may be disposed on the input sensor ISL. The refraction pattern PT may be disposed on the third insulating layer IL3. The refraction pattern PT may include a first pattern PT1, a second pattern PT2, and a third pattern PT3. The first pattern PT1 may overlap with the first pixel opening OP-P1, the second pattern PT2 may overlap with the second pixel opening OP-P2, and the third pattern PT3 may overlap with the third pixel opening OP-P3. In a plan view, the first pattern PT1, the second pattern PT2, and the third pattern PT3 may have different sizes from each other. The first pattern PT1 may completely overlap with the first light emitting area LA1, the second pattern PT2 may completely overlap with the second light emitting area LA2, and the third pattern PT3 may completely overlap with the third light emitting area LA3.

[0157] like Figure 5AAs shown in, the first pattern PT1, the second pattern PT2 and the third pattern PT3 may have an arrangement corresponding to the arrangement of the first light emitting area LA1, the second light emitting area LA2 and the third light emitting area LA3. As an example, in a plan view, the first pattern PT1 and the third pattern PT3 may be alternately arranged in the first direction DR1. The second pattern PT2 may be spaced apart from the first pattern PT1 and the third pattern PT3 in the second direction DR2, and the second pattern PT2 may be arranged in the first direction DR1. The first pattern PT1 and the second pattern PT2 may be alternately arranged in the fourth direction DR4. The second pattern PT2 and the third pattern PT3 may be alternately arranged in the fourth direction DR4. However, the arrangement of the first pattern PT1, the second pattern PT2 and the third pattern PT3 should not be limited to as described herein, and may be changed according to the arrangement of the first light emitting area LA1, the second light emitting area LA2 and the third light emitting area LA3.

[0158] like Figure 5D As shown in , when viewed in the schematic cross-sectional view, each of the first pattern PT1, the second pattern PT2, and the third pattern PT3 may have a trapezoidal shape. Each of the first pattern PT1, the second pattern PT2, and the third pattern PT3 may include an upper surface UP, a lower surface LP opposite to the upper surface UP and disposed closer to the display panel DP than the upper surface UP, and a side surface SP connecting the upper surface UP and the lower surface LP. In this case, the lower surface LP may be in contact with the third insulating layer IL3.

[0159] A plurality of grooves HM may be defined in the upper surface UP of the refraction pattern PT. The grooves HM may be configured to reflect the light L (refer to FIG. 1 ) emitted from the light emitting layer EML. Figure 6 ) is modified to be in the third direction DR3 (refer to Figure 5A ) are substantially in the same direction. For example, the light L emitted from the light emitting layer EML (refer to Figure 6 ) may travel in substantially the same direction as the third direction DR3 after passing through the groove HM, and therefore, the luminous efficiency of the display device DD may be improved. In the case where the groove is defined in the upper surface UP of the refraction pattern PT, the external light may not be fully reflected to the third direction DR3 and may be scattered to other directions, and the reflection of the external light may be improved.

[0160] Each of the plurality of grooves HM may have a diameter equal to or greater than about 50 nm and equal to or less than about 500 nm. The grooves HM may have diameters different from each other. As an example, some of the grooves HM may have a diameter of about 100 nm. In the case where the diameter of the groove HM is less than about 50 nm, the light L (refer to FIG. 1 ) emitted from the light emitting layer EML is small due to the small diameter. Figure 6) may contact the groove HM a relatively small number of times, and therefore, it is difficult to improve the luminous efficiency of the display device DD, and all reflection of external light may not be effectively prevented. In the case where the diameter of the groove HM is greater than about 500nm, the number of grooves HM defined in the upper surface UP is reduced. Accordingly, it is difficult to improve the luminous efficiency of the display device DD, and all reflection of external light may not be effectively prevented. Each of the multiple grooves HM may have a depth equal to or greater than about 50nm and equal to or less than about 500nm. As an example, the depth of the groove HM may be about 105nm. In the case where the depth of the groove HM is less than about 50nm, the light L emitted from the light emitting layer EML (refer to Figure 6 ) may contact the groove HM relatively few times. Therefore, it is difficult to improve the light emitting efficiency of the display device DD, and it may not be possible to effectively prevent all reflection of external light. In the case where the depth of the groove HM is greater than about 500 nm, the ultraviolet light UVL (refer to Fig.11 ) may penetrate the refraction pattern PT due to its strong intensity, and the difficulty of the manufacturing process may increase.

[0161] The number of grooves HM defined in the upper surface UP may be three or more and nine or less per unit area in the upper surface UP. The unit area may be about 4 square microns. The unit area may be an area defined by a square having horizontal sides and vertical sides, each of which has a length of about 2 microns. Sixteen grooves HM may be defined in the upper surface UP of the first pattern PT1. Nine grooves HM may be defined in the upper surface UP of the second pattern PT2. Twenty-five grooves HM may be defined in the upper surface UP of the third pattern PT3. In the case where two or less grooves HM are defined per unit area in the upper surface UP, the luminous efficiency may not be fully improved due to the small number of grooves HM. In the case where ten or more grooves HM are defined per unit area in the upper surface UP, two or more grooves HM adjacent to each other may overlap each other, and thus, the diameter of the groove HM may be greater than about 500nm.

[0162] The side surface SP of the refraction pattern PT may include a flat surface having a selectable inclination.The groove HM may not be defined in the side surface SP of the refraction pattern PT.

[0163] The lower surface LP of the refraction pattern PT may directly contact the upper surface of the encapsulation layer TFE. The lower surface LP of the refraction pattern PT may directly contact the upper surface of the input sensor ISL. The lower surface LP of the refraction pattern PT may directly contact the upper surface of the third insulating layer IL3.

[0164] The refraction pattern PT may include a photosensitive polymer. The photosensitive polymer may include repeating units of Formulae 1 to 5 below.

[0165] Formula 1

[0166]

[0167] Formula 2

[0168]

[0169] Formula 3

[0170]

[0171] Formula 4

[0172]

[0173] Formula 5

[0174]

[0175] In Formulae 1 to 5, a, b, c, d, and e are each independently an integer from 1 to 1000. The photosensitive polymer may further include a block copolymer structure portion. As an example, the block copolymer structure portion may include polystyrene-b-methyl methacrylate. The refractive pattern PT may further include a high refractive index monomer. As an example, the refractive pattern PT may include an acrylic resin.

[0176] The cover layer CVL may be disposed on the second insulating layer IL2 The cover layer CVL may make contact with the upper surface UP and the side surface SP of the refraction pattern PT and may cover the refraction pattern PT.

[0177] The cover layer CVL may be a layer obtained by dispersing a dye and / or pigment in a polymer resin. The dye and / or pigment included in the cover layer CVL may be a material that transmits only light within a selected wavelength range among the light emitted from the light emitting elements OLED1, OLED2, and OLED3.

[0178] The dye and pigment may absorb light in a wavelength range of about 490 nm to about 505 nm and light in a wavelength range of about 585 nm to about 600 nm, and may transmit light of wavelengths other than the above ranges. Since the dye and pigment included in the cover layer CVL absorb light in a selected wavelength range and transmit light of wavelengths other than the above ranges, reflection of external light may be prevented, and the color of light emitted from the display panel DP may be controlled.

[0179] The cover layer CVL may further include an adhesive material. Accordingly, the window adhesive layer ADL disposed on the cover layer CVL and attaching the window WM may be omitted.

[0180] The cover layer CVL may be patterned by a photolithography process or an inkjet printing process.

[0181] The refractive pattern PT may have a refractive index greater than that of the cover layer CVL. The refractive index of the refractive pattern PT may be equal to or greater than about 1.6. The refractive index of the cover layer CVL may be equal to or less than about 1.5. Since the cover layer CVL having a refractive index smaller than that of the refractive pattern PT covers the refractive pattern PT, the luminous efficiency may be further improved.

[0182] The refraction pattern PT may have a thickness D equal to or greater than about 0.5 micrometers and equal to or less than about 1.5 micrometers (refer to Figure 6 For example, the distance between the upper surface UP and the lower surface LP of the refraction pattern PT in the third direction DR3 (refer to Figure 5A ) can be equal to or greater than approximately 0.5 microns and equal to or less than approximately 1.5 microns.

[0183] The polarizer POL may be disposed on the cover layer CVL included in the light control layer LCL. The polarizer POL may reduce the reflectivity of external light incident thereto from the outside. The polarizer POL may include at least one of a phase retarder, a polarizer, a polarizing film, and a polarizing filter. However, the polarizer POL should not be limited to that described herein. As an example, the polarizer POL may include a color filter.

[0184] Figure 6 It is shown Figure 5C An enlarged cross-sectional view of any one of the first pattern PT1, the second pattern PT2, and the third pattern PT3 shown in FIG. Figure 6 A change in the path of light due to the difference in refractive index between the refraction pattern PT and the cover layer CVL is described.

[0185] The light control layer LCL may include the refraction pattern PT having a high refractive index and the cover layer CVL having a low refractive index and may transmit light emitted from the light emitting element OLED, and thus, light emitting efficiency of the display panel DP may be improved.

[0186] In detail, the light L traveling in the side surface direction among the light emitted from the light emitting element OLED may be refracted by the grooves HM defined in the upper surface UP of the refraction pattern PT, and thus, the path of the light L traveling in the direction inclined at a selectable angle with respect to the third direction DR3 may be changed to allow the light L traveling in the direction inclined with respect to the third direction DR3 to travel in substantially the same direction as the third direction DR3. Accordingly, in the light emitting elements OLED1, OLED2, and OLED3 (refer to Figure 5D ) can be improved, and therefore, the luminous efficiency of the display panel DP can be improved. As the resolution of the display panel DP increases, the degree of improvement of the luminous efficiency of the display panel DP can be more effective. The following Table 1 shows: relative to the luminous efficiency of the display panel including the refraction pattern PT without defining grooves in the upper surface of the refraction pattern PT, the maximum increase rate (%) of the luminous efficiency according to the resolution (ppi) of the display panel including three grooves HM per unit area defined in the upper surface of the refraction pattern PT, the unit area having 4 square micrometers.

[0187] Table 1

[0188] Resolution (ppi) Maximum increase rate of luminous efficiency (%) 540 120 806 140 1200 160

[0189] Referring to Table 1, in the case where two grooves HM are defined per unit area of ​​4 square microns in the upper surface UP of the refractive pattern PT, as the resolution increases, the maximum increase rate of the luminous efficiency increases. Accordingly, in the case where the grooves HM are formed in the upper surface UP of the refractive pattern PT, as the resolution increases, the increase rate of the luminous efficiency increases. The window adhesive layer ADL may be disposed on the polarizer POL. The window adhesive layer ADL may have a refractive index equal to or less than approximately 1.5. The difference in refractive index between the window adhesive layer ADL and the cover layer CVL may be equal to or less than approximately 0.1. The window adhesive layer ADL may be disposed between the polarizer POL and the window WM, and the window WM may be attached to the polarizer POL through the window adhesive layer ADL.

[0190] Hereinafter, a method of manufacturing a display device (ie, a method of manufacturing a display device) will be described.

[0191] The display device manufactured by the manufacturing method of the present disclosure is different from the display device DD described above (refer to Figure 5D Therefore, the details of the same elements described above will be omitted, and the same elements will be assigned the same reference numerals.

[0192] Figure 7 is a flowchart illustrating a method of manufacturing a display device according to an embodiment of the present disclosure. Figures 8 to 122 is a schematic cross-sectional view showing a process of a method for manufacturing a display device according to an embodiment of the present disclosure.

[0193] Fig. 9 2 is a schematic cross-sectional view illustrating a process of forming a preliminary refraction pattern PPT of a method of manufacturing a display device according to an embodiment of the present disclosure. Fig.10 2 is a schematic cross-sectional view showing a process of a method of manufacturing a display device according to an embodiment of the present disclosure, the process including placing a mask MK including a grille part CP through which holes HL are defined. Fig.11 2 is a schematic cross-sectional view illustrating a process of irradiating ultraviolet light UVL on the grille part CP of the method for manufacturing the display device according to the embodiment of the present disclosure. Fig.12 2 is a schematic cross-sectional view illustrating a process of forming a refraction pattern PT of a method of manufacturing a display device according to an embodiment of the present disclosure.

[0194] Reference Figure 7 , the manufacturing method of the display device may include providing a pixel defining layer and a light emitting element, the pixel defining layer is provided with a pixel opening defined by the pixel defining layer, and the light emitting element includes a light emitting layer at least a portion of which is disposed in the pixel opening (S110). The manufacturing method may also include forming a preliminary refraction pattern including a photosensitive polymer on the light emitting element so that the preliminary refraction pattern overlaps with the pixel opening in a plan view (S120). The manufacturing method may also include placing a mask on the preliminary refraction pattern, the mask including a grid member overlapping with the preliminary refraction pattern in a plan view, and the mask is provided with holes defined by the grid member (S130). The manufacturing method may also include: exposing the grid member to ultraviolet light (S140); and applying a developing solution on the preliminary refraction pattern to form a refraction pattern including an upper surface, the upper surface including a groove having a diameter equal to or greater than about 50 nm and equal to or less than about 500 nm (S150).

[0195] Reference Figure 7 and Figure 8 , providing a pixel defining layer PDL and a light emitting element OLED (the pixel defining layer PDL is provided with a pixel opening OP-P defined by the pixel defining layer PDL, and the light emitting element OLED includes at least a portion of a light emitting layer EML disposed in the pixel opening OP-P) (S110) may include forming an encapsulation layer TFE on the second electrode CE.

[0196] Reference Figure 7 and Fig. 9 In forming a preliminary refraction pattern PPT (S120) on the light emitting element OLED that overlaps with the pixel opening OP-P in a plan view and includes a photosensitive polymer, the preliminary refraction pattern PPT may include a block copolymer structure portion. The preliminary refraction pattern PPT and the refraction pattern PT (refer to Fig.12 ) may include the same material. The preliminary refraction pattern PPT may also include a monomer, a photoinitiator, an additive, a solvent, or a combination thereof. As an example, the preliminary refraction pattern PPT may also include a free radical photoinitiator or a positive ion photoinitiator. The preliminary refraction pattern PPT may have the same material as the refraction pattern PT (refer to Fig.12 ) has different physical properties. Refraction pattern PT (refer to Fig.12 ) may have a hardness higher than that of the preliminary refraction pattern PPT. The preliminary refraction pattern PPT may be disposed on the light emitting element OLED. The preliminary refraction pattern PPT may be disposed on the encapsulation layer TFE. The preliminary refraction pattern PPT may be directly disposed on the encapsulation layer TFE.

[0197] Reference Figure 7 and Fig.10 , a mask MK is placed on the preliminary refraction pattern PPT (the mask MK includes a grid part CP overlapping the preliminary refraction pattern PPT in a plan view and the mask MK is provided with a hole HL defined by the grid part CP (S130), and a distance dH between a first hole among the holes HL and a second hole adjacent to the first hole in a plan view may be equal to or greater than about 50 nm and equal to or less than about 500 nm. The hole HL may completely penetrate the mask MK and may have a circular, quadrilateral or pentagonal shape or a combination thereof in a plan view. The mask MK may include a grid part CP and a non-grid part NCP. The non-grid part NCP may be a part that does not define the hole HL. The grid part CP may overlap with the pixel opening OP-P in a plan view. The grid part CP may overlap with the light emitting layer EML in a plan view.

[0198] Reference Figure 7 and Fig.11 , in exposing the grating member CP to the ultraviolet light UVL (S140), the ultraviolet light UVL may be provided to the preliminary refraction pattern PPT through the grating member CP. The grating member CP may have a thickness smaller than a thickness of the non-grating member NCP. The degree of transmission of the ultraviolet light UVL in the grating member CP may be greater than the degree of transmission of the ultraviolet light UVL in the non-grating member NCP. The ultraviolet light UVL may be provided to the preliminary refraction pattern PPT through the hole HL or through a portion of the grating member CP that does not define the hole HL. The exposure amount of the ultraviolet light UVL may be equal to or greater than about one joule (1J). For example, the exposure amount of the ultraviolet light UVL may be about 3J. In a case where the exposure amount of the ultraviolet light UVL is less than about 1J, the exposure amount of the ultraviolet light UVL may be insufficient to cure the photosensitive polymer of the preliminary refraction pattern PPT, and therefore, the groove HM (refer to Fig.12 ) may not be formed. The groove HM formed by the ultraviolet light UVL having an exposure amount greater than about 3J (refer to Fig.12) may have substantially the same diameter as that of the groove HM formed by the ultraviolet light UVL having an exposure amount of about 3J.

[0199] Reference Figure 7 and Fig.12 , apply the developer on the preliminary refraction pattern PPT (refer to Fig.11 ) to form a refraction pattern PT including an upper surface UP, the upper surface UP including a groove HM having a diameter equal to or greater than about 50 nm and equal to or less than about 500 nm (S150), the preliminary refraction pattern PPT (refer to Fig.11 ) by UVL (refer to Fig.11 ) The irradiated portion may be cured after being treated with a developer to form a refraction pattern PT. The number of grooves HM defined in the upper surface UP of the refraction pattern PT may be 3 or more and 9 or less per unit area. The unit area may be about 4 square micrometers.

[0200] The method for manufacturing a display device may further include forming a cover layer CVL (refer to Figure 6 The cover layer CVL has a refractive index smaller than that of the refractive pattern PT. The cover layer CVL may be formed on the preliminary refractive pattern PPT (refer to Fig.11 ) is formed after coating a developing solution (S150) on the surface. The refraction pattern PT includes an upper surface UP in which the grooves HM have a diameter equal to or greater than about 50 nm and equal to or less than about 500 nm. The cover layer CVL (refer to Figure 6 ) may cover the refraction pattern PT and may provide a flat surface.

[0201] Hereinafter, the results of evaluating the light emitting efficiency of the display device are described in detail.

[0202] In order to evaluate the luminous efficiency of the display device of the present disclosure, a light control layer including a refraction pattern and a covering layer covering the refraction pattern are placed on a light emitting device emitting constant light as a light source. While changing the number of grooves per unit area of ​​4 square micrometers defined in the upper surface of the refraction pattern from 0 (no grooves are formed) to 9 grooves, the luminous efficiency is measured ten times. The diameter of the groove is about 100nm, the distance between the grooves in the plan view is about 1 micrometer, and the depth of the groove is about 105nm.

[0203] Fig.13 is a graph showing changes in light emitting efficiency according to the number of grooves per unit area.

[0204] Reference Fig.13, the graph shows the luminous efficiency when the number of grooves is a relative number of 1 to 9, based on the luminous efficiency being set to 1 in the case where no grooves are formed. As the number of grooves in the upper surface of the refraction pattern increases, the luminous efficiency increases linearly and reaches a maximum value of about 175% of the luminous efficiency. This is because as the number of grooves formed in the upper surface of the refraction pattern increases, the light generated by the light-emitting layer is more likely to contact the grooves, and the light travels in a direction substantially the same as the third direction after contacting the grooves, thereby improving the luminous efficiency. However, in the case where the number of grooves is too large, the grooves may overlap with each other, and as a result, the effect of improving the luminous efficiency may be reduced.

[0205] Embodiments have been disclosed herein, and although terms are used, they are used and interpreted in a general and descriptive sense only and not for the purpose of limitation. Unless otherwise specifically noted, in some cases, as will be apparent to one of ordinary skill in the art, features, characteristics and / or elements described in conjunction with embodiments may be used alone or in combination with features, characteristics and / or elements described in conjunction with other embodiments. Accordingly, it will be understood by one of ordinary skill in the art that various changes in form and details may be made without departing from the spirit and scope of the present disclosure as set forth in the appended claims.

Claims

1. A display device, wherein: The display device comprises: a pixel defining layer provided with a pixel opening defined by the pixel defining layer; a light emitting element, comprising a light emitting layer, at least a portion of which is disposed in the pixel opening; a refraction pattern disposed on the light emitting element and overlapping the pixel opening; and a covering layer covering the refractive pattern and having a refractive index smaller than that of the refractive pattern, wherein A plurality of grooves are defined in an upper surface of the refraction pattern, and Each of the plurality of grooves has a diameter equal to or greater than 50 nm and equal to or less than 500 nm.

2. The display device according to claim 1, wherein: The refraction pattern further includes a lower surface opposite to the upper surface and a side surface connecting the upper surface and the lower surface.

3. The display device according to claim 2, wherein: The side surface comprises a flat surface with a selectable inclination.

4. The display device according to claim 1, wherein: Each of the plurality of grooves has a depth equal to or greater than 50 nm and equal to or less than 500 nm.

5. The display device according to claim 1, wherein: The plurality of grooves are provided in the upper surface at three or more and nine or less per unit area, and The unit area is 4 square micrometers.

6. The display device according to claim 1, wherein: The refractive index of the refraction pattern is equal to or greater than 1.

6.

7. The display device according to claim 1, wherein: The refractive pattern includes a photosensitive polymer.

8. The display device according to claim 7, wherein: The photosensitive polymer includes a block copolymer moiety.

9. The display device according to claim 1, wherein: The refraction pattern has a thickness equal to or greater than 0.5 micrometers and equal to or less than 1.5 micrometers.

10. The display device according to claim 1, wherein: The pixel openings include a first pixel opening, a second pixel opening, and a third pixel opening having different sizes from each other, and The refraction pattern includes a first refraction pattern corresponding to the first pixel opening, a second refraction pattern corresponding to the second pixel opening, and a third refraction pattern corresponding to the third pixel opening.

11. The display device according to claim 1, wherein: The display device further includes: A polarizer is disposed on the cover layer.

12. The display device according to claim 1, wherein: The display device further includes: An encapsulation layer is provided on the light emitting element, Wherein, the refraction pattern is arranged on the encapsulation layer.

13. The display device according to claim 12, wherein: The display device further includes: an input sensor disposed between the light emitting element and the refraction pattern, Wherein, the input sensor comprises: A first insulating layer, disposed on the encapsulation layer; A first conductive layer, disposed on the first insulating layer; a second insulating layer disposed on the first insulating layer and covering the first conductive layer; and The second conductive layer is disposed on the second insulating layer, and the refraction pattern is disposed on the second insulating layer.

14. The display device according to claim 13, wherein: The input sensor further includes a third insulating layer covering the second conductive layer and disposed on the second insulating layer, and The refraction pattern is disposed on the third insulating layer.

15. A method for manufacturing a display device, wherein: The method comprises: Providing a pixel defining layer and a light emitting element, wherein the pixel defining layer is provided with a pixel opening defined by the pixel defining layer, and the light emitting element includes a light emitting layer, at least a portion of the light emitting layer being disposed in the pixel opening; forming a preliminary refraction pattern including a photosensitive polymer on the light emitting element so that the preliminary refraction pattern overlaps with the pixel opening in a plan view; placing a mask on the preliminary refraction pattern, the mask including a grid member overlapping the preliminary refraction pattern in a plan view, and the mask provided with a plurality of holes defined by the grid member; exposing the grid member to ultraviolet light; and A developing solution is coated on the preliminary refraction pattern to form a refraction pattern including an upper surface including a plurality of grooves having a diameter equal to or greater than 50 nm and equal to or less than 500 nm.

16. The method according to claim 15, wherein: The exposure amount of the ultraviolet light is equal to or greater than one joule.

17. The method according to claim 15, wherein: A distance between a first hole among the plurality of holes and a second hole adjacent to the first hole is equal to or greater than 50 nm and equal to or less than 500 nm.

18. The method according to claim 15, wherein: The photosensitive polymer includes a block copolymer moiety.

19. The method according to claim 15, wherein: The method further comprises: A cover layer is formed, the cover layer covering the refraction pattern and having a refractive index smaller than that of the refraction pattern.

20. The method according to claim 15, wherein: The plurality of grooves are provided in the upper surface at three or more and nine or less per unit area, and The unit area is 4 square micrometers.

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