Internal temperature control system of photoetching machine

Abstract

The invention provides an internal temperature control system of a photoetching machine, which comprises a temperature sensor used for detecting actual temperature; the first-stage temperature control system comprises a first-stage temperature controller for controlling the temperature in a first temperature range; the secondary temperature control system comprises a secondary temperature controller which is used for controlling the temperature in a second temperature range which is smaller than the first temperature range; wherein in response to the fact that the difference value between the actual temperature and the target temperature is smaller than or equal to a first temperature threshold value corresponding to the first temperature range and larger than a second temperature threshold value corresponding to the second temperature range, the first-stage temperature controller works; and in response to the fact that the difference value between the actual temperature and the target temperature is smaller than or equal to a second temperature threshold value corresponding to the second temperature range, the second-stage temperature controller works. Therefore, the stability of temperature control is improved.

Description

Technical Field

[0001] The present application relates to the technical field of photolithography machines, and more specifically, to an internal temperature control system of a photolithography machine. Background Art

[0002] The photolithography machine is an important equipment in the semiconductor manufacturing process. Its function is to accurately transfer the circuit pattern in the mask plate (also known as the mask plate) to a silicon wafer or other substrate according to the predetermined size and position through the exposure process.

[0003] Since photolithography machines are usually installed in highly controlled environments, such as clean rooms, in order to ensure the accuracy of the photolithography process, the stability of the ambient temperature is very high, usually at the level of 0.01°C. However, the sensors and temperature controllers in the temperature control system of the current photolithography machines are usually from different brands and manufacturers, and are in different forms such as air cooling and water cooling, which affects the temperature control of the photolithography machine.

[0004] Therefore, it is desirable to provide an improved internal temperature control system of a lithography machine. Summary of the invention

[0005] An embodiment of the present application provides an internal temperature control system for a lithography machine, which performs temperature control based on the difference between an actual temperature and a target temperature through a multi-stage temperature control system with different temperature control ranges, thereby improving the stability of temperature control.

[0006] According to one aspect of the present application, a temperature control system inside a lithography machine is provided, comprising: a temperature sensor for detecting an actual temperature; a primary temperature control system comprising a primary temperature controller for controlling a temperature within a first temperature range; and a secondary temperature control system comprising a secondary temperature controller for controlling a temperature within a second temperature range smaller than the first temperature range;

[0007] In which, in response to the difference between the actual temperature and the target temperature being less than or equal to a first temperature threshold corresponding to the first temperature range and greater than a second temperature threshold corresponding to the second temperature range, the first-level temperature controller works; and, in response to the difference between the actual temperature and the target temperature being less than or equal to the second temperature threshold corresponding to the second temperature range, the second-level temperature controller works.

[0008] In the above-mentioned internal temperature control system of the lithography machine, it further includes: a three-stage temperature control system, including a three-stage temperature controller for controlling the temperature within a third temperature range that is smaller than the second temperature range; wherein, in response to the difference between the actual temperature and the target temperature being less than or equal to the second temperature threshold corresponding to the second temperature range and greater than the third temperature threshold corresponding to the third temperature range, the secondary temperature controller works; and, in response to the difference between the actual temperature and the target temperature being less than or equal to the third temperature threshold corresponding to the third temperature range, the three-stage temperature controller works.

[0009] In the above-mentioned internal temperature control system of the lithography machine, in response to the difference between the actual temperature and the target temperature being greater than a first temperature threshold corresponding to the first temperature range, both the primary temperature controller and the secondary temperature controller operate.

[0010] In the above-mentioned internal temperature control system of the lithography machine, in response to the difference between the actual temperature and the target temperature being greater than the first temperature threshold corresponding to the first temperature range, the first-stage temperature controller, the second-stage temperature controller and the third-stage temperature controller all work.

[0011] In the above-mentioned internal temperature control system of the lithography machine, the first temperature range is ±1°C, the second temperature range is ±0.1°C, and the third temperature range is ±0.01°C.

[0012] In the above-mentioned internal temperature control system of the lithography machine, the temperature sensor includes a first-level temperature sensor corresponding to the first-level temperature control system and having a first sensing accuracy corresponding to the first temperature range, a second-level temperature sensor corresponding to the second-level temperature control system and having a second sensing accuracy corresponding to the second temperature range, and a third-level temperature sensor corresponding to the third-level temperature control system and having a third sensing accuracy corresponding to the third temperature range.

[0013] In the above-mentioned internal temperature control system of the lithography machine, in the first level control, the actual temperature detected by the first level temperature sensor is sent to the second level temperature controller as a first level feedforward signal, and the second level temperature controller performs temperature control according to the actual temperature detected by the second level temperature sensor and the first level feedforward signal.

[0014] In the above-mentioned internal temperature control system of the lithography machine, in the second-level control, the actual temperature detected by the secondary temperature sensor is sent to the primary temperature controller as a secondary feedback signal, the primary temperature controller performs temperature control according to the secondary feedback signal, the secondary temperature controller performs temperature control according to the actual temperature detected by the secondary temperature sensor, and the actual temperature detected by the secondary temperature sensor is sent to the tertiary temperature controller as a secondary feedforward signal.

[0015] In the above-mentioned internal temperature control system of the lithography machine, in the third-level control, the three-level temperature controller performs temperature control according to the actual temperature detected by the three-level temperature sensor and the secondary feedforward signal, and sends the actual temperature detected by the three-level temperature sensor as a three-level feedback signal to the secondary temperature controller, and the secondary temperature controller performs temperature control according to the three-level feedback signal.

[0016] In the above-mentioned internal temperature control system of the lithography machine, the output of the temperature sensor is an analog signal.

[0017] The internal temperature control system of the lithography machine provided in the embodiment of the present application can perform temperature control based on the difference between the actual temperature and the target temperature through a multi-level temperature control system with different temperature control ranges, thereby improving the stability of temperature control. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] By reading the detailed description of the preferred specific embodiments below, various other advantages and benefits of the present application will become clear to those of ordinary skill in the art. The drawings in the specification are only used for the purpose of illustrating the preferred embodiments and are not considered to be limitations of the present application. Obviously, the drawings described below are only some embodiments of the present application. For those of ordinary skill in the art, other drawings can also be obtained based on these drawings without creative work. Moreover, the same reference numerals are used to represent the same components throughout the drawings.

[0019] Figure 1 The figure shows a schematic diagram of the internal temperature control system of the lithography machine according to an embodiment of the present application.

[0020] Figure 2 The figure shows a schematic diagram of three levels of the internal temperature control system of the lithography machine according to an embodiment of the present application.

[0021] Figure 3 The figure shows a schematic diagram of the hardware modules of the internal temperature control system of the lithography machine according to an embodiment of the present application.

[0022] Figure 4A and Figure 4BA schematic diagram of a hybrid control strategy for an internal temperature control system of a lithography machine according to an embodiment of the present application is illustrated. DETAILED DESCRIPTION

[0023] Below, the exemplary embodiments according to the present application will be described in detail with reference to the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments of the present application, and it should be understood that the present application is not limited to the exemplary embodiments described here.

[0024] In the embodiment of the present application, the internal temperature control system of the lithography machine is divided into multiple levels as a whole, such as Figure 1 Here, Figure 1 FIG. 1 is a schematic diagram of a temperature control system inside a lithography machine according to an embodiment of the present application. Figure 1 As shown, the internal temperature control system of the lithography machine includes a primary temperature control system and a secondary control system, wherein the primary control system includes a primary temperature controller for controlling the temperature within a first temperature range, and the secondary temperature control system includes a secondary temperature controller for controlling the temperature within a second temperature range smaller than the first temperature range.

[0025] In addition, the internal temperature control system of the lithography machine according to the embodiment of the present application may also include more levels. For example, Figure 2 The figure shows a schematic diagram of three levels of the internal temperature control system of the lithography machine according to an embodiment of the present application. Figure 2 As shown, the first level of the temperature control system inside the lithography machine is 1A, the second level is 2A, 2B, and the third level is 3A, 3B, 3C, and 3D. In addition, the control accuracy of each level of temperature control system is different. For example, in the first level control system, the control accuracy of the temperature is ±1°C; in the second level control system, the control accuracy of the temperature is ±0.1°C, and in the third level control system, the control accuracy of the temperature is ±0.01°C. Of course, those skilled in the art can understand that the control accuracy values ​​of the first level, second level, and third level control systems are only examples. In fact, it is only necessary that the control accuracy of the second level control system is higher than that of the first level control system, and the control accuracy of the third level control system is higher than that of the second level control system. For example, the control accuracy of the first level, second level, and third level control systems can be ±1°C, ±0.5°C, and ±0.2°C. In addition, in the embodiment of the present application, each control system of each level, such as 1A, 2A, 3A, etc., includes a corresponding temperature controller and a temperature sensor.

[0026] Here, in the internal temperature control system of the lithography machine according to the embodiment of the present application, when the difference between the actual temperature and the target temperature is large, for example, when the system is started for the first time or restarted after a long shutdown, the ambient temperature may be far from the preset target temperature, such as T. At this time, in order to quickly adjust the temperature to a value close to the set value, the heating module processing board or the cooling module processing board will command all temperature controllers to run at full power, whether heating or cooling. This step is to quickly narrow the gap between the actual temperature and the target temperature.

[0027] Once the temperature sensor detects that the actual temperature is close to the target temperature, for example, within the range of T ± 1 ° C, the temperature controller of the first-level control system will start to work. The temperature controller will adjust the intensity of heating or cooling according to the current temperature deviation, gradually approaching the target temperature in a more gentle manner. The goal of this stage is to avoid overshoot caused by too fast temperature changes, and to stabilize the temperature as soon as possible.

[0028] When the temperature stabilizes further and the variation range is reduced to, for example, within T±0.1°C, the temperature controller of the second-level secondary control system will take over. The temperature controller of the second-level secondary control system has a higher resolution and can adjust the heat input or output more finely to prevent large temperature fluctuations. This step helps to achieve higher-precision temperature control.

[0029] Finally, when the temperature is extremely close to the set value, for example, within the range of T ± 0.01 ° C, the temperature controller of the third-level three-level control system will be activated. The temperature controllers of the third-level three-level control system are usually specially designed to achieve extremely precise temperature control, and their task is to keep the temperature constant within a small temperature variation range.

[0030] It is worth noting that although the above description is based on the internal temperature control system of a lithography machine as an example, the temperature control system according to the embodiment of the present application is not limited to application in lithography machines, but can also be applied to other temperature control scenarios that require a high degree of temperature control stability.

[0031] Based on this, an embodiment of the present application provides an internal temperature control system of a lithography machine, comprising: a temperature sensor for detecting an actual temperature; a primary temperature control system, comprising a primary temperature controller for controlling the temperature within a first temperature range; a secondary temperature control system, comprising a secondary temperature controller for controlling the temperature within a second temperature range that is smaller than the first temperature range; wherein, in response to the difference between the actual temperature and the target temperature being less than or equal to a first temperature threshold corresponding to the first temperature range and greater than a second temperature threshold corresponding to the second temperature range, the primary temperature controller works; and, in response to the difference between the actual temperature and the target temperature being less than or equal to the second temperature threshold corresponding to the second temperature range, the secondary temperature controller works.

[0032] Furthermore, the internal temperature control system of the above-mentioned lithography machine further includes a three-stage temperature control system, including a three-stage temperature controller for controlling the temperature within a third temperature range that is smaller than the second temperature range; wherein, in response to the difference between the actual temperature and the target temperature being less than or equal to a second temperature threshold corresponding to the second temperature range and greater than a third temperature threshold corresponding to the third temperature range, the secondary temperature controller works; and, in response to the difference between the actual temperature and the target temperature being less than or equal to a third temperature threshold corresponding to the third temperature range, the three-stage temperature controller works.

[0033] Furthermore, in the internal temperature control system of the above-mentioned lithography machine, in response to the difference between the actual temperature and the target temperature being greater than the first temperature threshold corresponding to the first temperature range, the first-stage temperature controller, the second-stage temperature controller and the third-stage temperature controller all work.

[0034] Furthermore, in the above-mentioned internal temperature control system of the lithography machine, the first temperature range is ±1°C, the second temperature range is ±0.1°C, and the third temperature range is ±0.01°C.

[0035] Figure 3 FIG. 1 is a schematic diagram of a hardware module of a temperature control system inside a lithography machine according to an embodiment of the present application. Figure 3 As shown, based on the temperature sensed by the temperature sensor, the sensor signal processing board turns on the heating module and the cooling module processing board to perform heating and cooling to control the temperature of the lithography machine.

[0036] In addition, in the embodiment of the present application, in order to improve the adaptability and robustness of the automatic temperature control of the lithography machine and to improve the temperature control stability of the lithography machine, a hybrid control strategy based on feedforward and feedback is adopted. Specifically, during automatic temperature control, the temperature detected by the temperature sensor of the previous level is used as the feedforward of the temperature controller of this level, and the temperature detected by the temperature sensor of this level is used as the feedback of the temperature controller of the previous level, such as Figure 4A and Figure 4B shown. Figure 4A and Figure 4B A schematic diagram of a hybrid control strategy for an internal temperature control system of a lithography machine according to an embodiment of the present application is illustrated.

[0037] like Figure 4A As shown, for example, when the preset temperature in the entire lithography machine is T, the temperature detected by the 1A temperature sensor is T 1A (accuracy is ±1°C), the temperature detected by the 2A temperature sensor is T 2A (accuracy is ±0.1℃), at this time, the temperature that needs to be adjusted for the 2A temperature controller is (TT 2A ), and the temperature controller 1A needs to adjust the temperature to (TT 1A ). For 1A temperature controller and 2A temperature controller, adjust (TT 1A )℃Ratio adjustment(TT 2A )℃ will respond faster. Therefore, when the 1A temperature controller controls the temperature at T±1℃, the 2A temperature controller will perform temperature control. And the control of the three temperature controller levels is analogous.

[0038] In this way, the temperature detected by the previous temperature sensor is used as the feedforward signal of the next temperature controller, which means that when the previous temperature sensor detects that the temperature deviates from the set value, the information it provides can help the next temperature controller to react in advance, so as to adjust the temperature faster and reach the set value. 1A When the 2A temperature controller can adjust its output in advance based on this information, the adjustment (TT 2A )℃ process is faster.

[0039] At the same time, the temperature detected by the temperature sensor at this level will also be fed back to the temperature controller at the previous level as a feedback signal, which means that if the temperature sensor at the current level finds that the temperature has changed, it will affect the behavior of the temperature controller at the previous level, allowing the system to maintain temperature stability over a wider range. For example, if the 2A temperature sensor detects a temperature of T 2A , then the 2A temperature controller needs to be adjusted (TT 2A )℃, and this information will affect the operation of the 1A temperature controller.

[0040] For example, assuming that the temperature in the lithography machine is to be maintained at 22°C, when it is running at full power, the system detects that the temperature has risen too much, and the refrigeration module runs at full power to quickly adjust the temperature to close to 22.00°C.

[0041] In the first level of control, the 1A temperature sensor detects a temperature of 23°C. At this time, the 1A sensor sends the current temperature of 23°C to the 2A temperature controller as a feedforward signal. The 2A temperature sensor detects a temperature of 22.5°C, and the 2A temperature controller increases the cooling power in advance according to the feedforward signal to prevent the temperature from rising further. The 1A temperature controller continues to work and adjusts the cooling intensity smoothly.

[0042] In the second level of control, the 2A temperature sensor detects a temperature of 22.1°C. At this time, the 2A sensor feeds back the current temperature of 22.1°C as a feedback signal to the 1A temperature controller. The 1A temperature controller makes fine adjustments based on the feedback signal and increases the cooling capacity to accelerate the temperature drop process. The 2A temperature controller makes more precise temperature adjustments based on the precise data of the 2A temperature sensor to stabilize the temperature at around 22.0°C. At the same time, the 2A temperature sensor sends the 22.1°C information as a feedforward signal to the 3A temperature controller.

[0043] In the third level of control, the 3A temperature sensor detects a temperature of 22.01°C. At this point, the 3A temperature controller makes fine adjustments based on the feedforward signal (22.1°C) to keep the temperature around 22.00°C. In addition, the 3A temperature sensor feeds back any small temperature changes (such as 22.05°C) to the 2A temperature controller. The 2A temperature controller makes necessary adjustments based on the feedback information from the 3A temperature sensor to ensure that temperature fluctuations are minimized.

[0044] Therefore, in the internal temperature control system of the lithography machine according to an embodiment of the present application, the temperature sensor includes a first-level temperature sensor corresponding to the first-level temperature control system having a first sensing accuracy corresponding to the first temperature range, a second-level temperature sensor corresponding to the second-level temperature control system having a second sensing accuracy corresponding to the second temperature range, and a third-level temperature sensor corresponding to the third-level temperature control system having a third sensing accuracy corresponding to the third temperature range.

[0045] Moreover, in the above-mentioned internal temperature control system of the lithography machine, in the first-level control, the actual temperature detected by the first-level temperature sensor is sent to the second-level temperature controller as a first-level feedforward signal, and the second-level temperature controller performs temperature control according to the actual temperature detected by the second-level temperature sensor and the first-level feedforward signal.

[0046] Furthermore, in the internal temperature control system of the above-mentioned lithography machine, in the second-level control, the actual temperature detected by the secondary temperature sensor is sent to the primary temperature controller as a secondary feedback signal, the primary temperature controller performs temperature control according to the secondary feedback signal, the secondary temperature controller performs temperature control according to the actual temperature detected by the secondary temperature sensor, and the actual temperature detected by the secondary temperature sensor is sent to the tertiary temperature controller as a secondary feedforward signal.

[0047] Furthermore, in the internal temperature control system of the above-mentioned lithography machine, in the third-level control, the three-level temperature controller performs temperature control according to the actual temperature detected by the three-level temperature sensor and the secondary feedforward signal, and sends the actual temperature detected by the three-level temperature sensor as a three-level feedback signal to the secondary temperature controller, and the secondary temperature controller performs temperature control according to the three-level feedback signal.

[0048] Therefore, by using the previous level temperature as a feedforward input to the next level controller, and sending the actual temperature situation of this level as feedback to the upper level controller, the adaptability and robustness of the temperature control system inside the lithography machine are enhanced. Moreover, as the levels go deeper, the temperature control accuracy gradually improves, and finally achieves an extremely high accuracy of ±0.01℃ at the third level, which is also crucial for lithography machine temperature control applications that require extremely small temperature fluctuations.

[0049] In addition, the above hybrid control strategy helps to improve the overall stability and anti-interference ability of the temperature control system inside the lithography machine. In this way, feedforward control enables the system to foresee and respond to potential temperature changes in advance, while feedback control ensures that even in the event of an unexpected situation, the system can quickly make adjustments to maintain temperature stability. This multi-level control system that combines feedforward and feedback mechanisms can significantly improve the speed and accuracy of temperature control and ensure high-quality execution of the lithography process.

[0050] In addition, in the embodiment of the present application, the output of the temperature sensor is preferably an analog signal, rather than communicating through a network interface (such as an Ethernet port) or a serial interface (such as RS-232). Here, the advantage of using an analog signal is that the analog signal can be transmitted directly through a physical connection without the need for complex protocol conversion and data packet processing. That is, due to the reduction of delays and potential errors in the data conversion process, the analog signal can provide a faster response speed and higher signal accuracy, thereby reducing delays and improving the real-time and reliability of the system, improving the speed and accuracy of signal processing, and is very beneficial for application scenarios with high real-time requirements.

[0051] The basic principles of the present application are described above in conjunction with specific embodiments. However, it should be noted that the advantages, strengths, effects, etc. mentioned in the present application are only examples and not limitations, and it cannot be considered that these advantages, strengths, effects, etc. are required by each embodiment of the present application. In addition, the specific details disclosed above are only for the purpose of illustration and ease of understanding, not for limitation, and the above details do not limit the present application to being implemented by adopting the above specific details.

[0052] The block diagrams of the devices, apparatuses, equipment, and systems involved in this application are only illustrative examples and are not intended to require or imply that they must be connected, arranged, and configured in the manner shown in the block diagram. As will be appreciated by those skilled in the art, these devices, apparatuses, equipment, and systems can be connected, arranged, and configured in any manner. Words such as "including", "comprising", "having", etc. are open words, referring to "including but not limited to", and can be used interchangeably with them. The words "or" and "and" used here refer to the words "and / or" and can be used interchangeably with them, unless the context clearly indicates otherwise. The words "such as" used here refer to the phrase "such as but not limited to", and can be used interchangeably with them.

[0053] It should also be noted that in the apparatus, device and method of the present application, each component or each step can be decomposed and / or recombined. Such decomposition and / or recombination should be regarded as equivalent solutions of the present application.

[0054] The above description of the disclosed aspects is provided to enable any person skilled in the art to make or use the present application. Various modifications to these aspects will be readily apparent to those skilled in the art, and the general principles defined herein may be applied to other aspects without departing from the scope of the present application. Therefore, the present application is not intended to be limited to the aspects shown herein, but rather to the widest scope consistent with the principles and novel features disclosed herein.

[0055] The above description has been given for the purpose of illustration and description. In addition, this description is not intended to limit the embodiments of the present application to the forms disclosed herein. Although multiple example aspects and embodiments have been discussed above, those skilled in the art will recognize certain variations, modifications, changes, additions and sub-combinations thereof.

Claims

1. A temperature control system inside a lithography machine, comprising: Temperature sensor, used to detect actual temperature; a primary temperature control system comprising a primary temperature controller for controlling temperature within a first temperature range; as well as a secondary temperature control system including a secondary temperature controller for controlling temperature within a second temperature range that is smaller than the first temperature range; wherein, in response to the difference between the actual temperature and the target temperature being less than or equal to a first temperature threshold corresponding to the first temperature range and greater than a second temperature threshold corresponding to the second temperature range, the primary temperature controller operates; as well as In response to a difference between the actual temperature and the target temperature being less than or equal to a second temperature threshold corresponding to the second temperature range, the secondary temperature controller operates.

2. The internal temperature control system of the lithography machine according to claim 1, further comprising: a three-stage temperature control system including a three-stage temperature controller for controlling temperature within a third temperature range that is smaller than the second temperature range; wherein, in response to the difference between the actual temperature and the target temperature being less than or equal to a second temperature threshold corresponding to the second temperature range and greater than a third temperature threshold corresponding to the third temperature range, the secondary temperature controller operates; and In response to a difference between the actual temperature and the target temperature being less than or equal to a third temperature threshold corresponding to the third temperature range, the three-stage temperature controller operates.

3. The internal temperature control system of the lithography machine according to claim 1, wherein: In response to a difference between the actual temperature and the target temperature being greater than a first temperature threshold corresponding to the first temperature range, both the primary temperature controller and the secondary temperature controller are operated.

4. The internal temperature control system of the lithography machine as claimed in claim 2, wherein: In response to a difference between the actual temperature and the target temperature being greater than a first temperature threshold corresponding to the first temperature range, the primary temperature controller, the secondary temperature controller and the tertiary temperature controller are all operated.

5. The internal temperature control system of the lithography machine as claimed in claim 4, wherein: The first temperature range is ±1°C, the second temperature range is ±0.1°C, and the third temperature range is ±0.01°C.

6. The internal temperature control system of the lithography machine as claimed in claim 2, wherein: The temperature sensor includes a primary temperature sensor corresponding to the primary temperature control system and having a first sensing accuracy corresponding to the first temperature range, a secondary temperature sensor corresponding to the secondary temperature control system and having a second sensing accuracy corresponding to the second temperature range, and a tertiary temperature sensor corresponding to the tertiary temperature control system and having a third sensing accuracy corresponding to the third temperature range.

7. The internal temperature control system of the lithography machine according to claim 6, wherein: In the first level control, the actual temperature detected by the primary temperature sensor is sent to the secondary temperature controller as a primary feedforward signal, and the secondary temperature controller performs temperature control according to the actual temperature detected by the secondary temperature sensor and the primary feedforward signal.

8. The internal temperature control system of the lithography machine according to claim 7, wherein: In the second-level control, the actual temperature detected by the secondary temperature sensor is sent to the primary temperature controller as a secondary feedback signal, the primary temperature controller performs temperature control according to the secondary feedback signal, the secondary temperature controller performs temperature control according to the actual temperature detected by the secondary temperature sensor, and the actual temperature detected by the secondary temperature sensor is sent to the tertiary temperature controller as a secondary feedforward signal.

9. The internal temperature control system of the lithography machine as claimed in claim 8, wherein: In the third-level control, the three-level temperature controller performs temperature control according to the actual temperature detected by the three-level temperature sensor and the secondary feedforward signal, and sends the actual temperature detected by the three-level temperature sensor as a three-level feedback signal to the two-level temperature controller, and the two-level temperature controller performs temperature control according to the three-level feedback signal.

10. The internal temperature control system of a lithography machine according to any one of claims 6 to 9, wherein: The output of the temperature sensor is an analog signal.

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