A cleaning apparatus for semiconductor processing

Abstract

The application discloses a kind of semiconductor processing cleaning equipment, for cleaning wafer, semiconductor processing cleaning equipment includes machine body, further include: first cleaning component, placement box, clamping component and second cleaning component, first cleaning component is used to clean the fine particle on wafer surface, first cleaning component includes a pair of mounting plate, a pair of mounting plate is fixedly connected on the upper panel of machine body, rotationally connected with rotating wheel on mounting plate, rotating wheel is equipped with first transmission belt, a plurality of fixed blocks are fixedly connected on the side wall of first transmission belt, wafer is placed on a pair of fixed blocks.Compared with prior art, a kind of semiconductor processing cleaning equipment of the application can realize the flow line type cleaning of wafer, not only greatly improve the cleaning efficiency, reduce production time and cost, but also can effectively remove the particle and organic contaminant on wafer surface simultaneously, significantly improve the cleaning quality, to effectively promote the technical progress and development of semiconductor industry.

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