Large substrate alloy resistance detection device and detection method

Abstract

The invention discloses a large-substrate alloy resistance detection device and a detection method. The large-substrate alloy resistance detection device comprises a rack, a resistance value detection assembly and a CCD detection assembly, wherein the resistance value detection assembly and the CCD detection assembly are located on the rack. The resistance value detection assembly comprises a material loading sliding table and a test seat, a working cavity is formed in the material loading sliding table, an adsorption groove is formed in the working cavity, the CCD detection assembly comprises a distance adjusting support, a laser engraving head and a camera, the test seat tests the resistance value of a resistor monomer in the material loading sliding table, and the CCD detection assembly collects image information of each resistor monomer; two detection stations are integrated on the same equipment, so that the detection efficiency is improved; a plurality of probes are arranged on the test board, single resistors in the alloy resistor semi-finished product can be detected row by row, the detection efficiency is improved, the test board and the camera are located on the upper side and the lower side of the material loading sliding table, detection of the test board and the camera can be conducted synchronously, complementary interference is achieved, and the detection time is further shortened; the CCD detection assembly is provided with a laser marking head, defective products can be marked, and the detection and sorting efficiency is improved.

Description

Technical Field

[0001] The invention relates to the field of alloy resistor production, and in particular to a large substrate alloy resistor detection device. Background Art

[0002] See also Figure 1 and Figure 2 The figure shows an alloy resistor semi-finished product 30, which includes a frame 31 and a plurality of resistor monomers 20 arranged in an array in the frame 31. Adjacent resistor monomers 20 are connected by edge materials 32. The alloy resistor semi-finished product 30 is obtained by stamping a large substrate. After the resistance of each resistor monomer 20 is adjusted, the alloy resistor semi-finished product 30 needs to be transferred to a pelletizing station, the frame 31 and the edge materials 32 are cut off, and the resistor monomer 20 is taken out. Before shipment, the obtained resistor monomer 20 needs to be inspected to determine whether there are defects in the appearance of the obtained resistor monomer 20 and whether the resistance value meets the standard.

[0003] Shipping inspection includes resistance value inspection and appearance inspection. Therefore, after pelletizing, the obtained resistor monomer 20 needs to be spread on the conveyor belt and transferred to the CCD inspection station through the conveyor belt. Then, the products that meet the appearance standards are transferred to the resistance value test station for further screening to sort out the defective products.

[0004] However, there are many resistor monomers 20 in the frame 31 and the resistor monomers 20 are small in size. When performing image detection, the resistor monomers 20 need to be straightened, and when performing resistance detection, a fixture needs to be provided to position the resistor monomers 20 to ensure that the probe can accurately contact the pins 21 thereon. The recycling and transfer after pelletizing increases the material transmission time, and the detection efficiency cannot keep up with the rate of mass production. Semi-finished products are easily accumulated in the shipment inspection link, which reduces the production efficiency of the alloy resistors, and requires space to store the semi-finished products to be tested. Summary of the invention

[0005] The purpose of the present invention is to overcome the deficiencies in the prior art and provide a large substrate alloy resistor detection device and detection method to improve the detection efficiency of resistor monomers and reduce the problem of semi-finished product accumulation in the shipment inspection link.

[0006] The objective of the present invention is achieved through the following technical solutions:

[0007] A large substrate alloy resistor detection device is used to detect the resistance and appearance of a semi-finished alloy resistor, comprising: a frame and a resistance detection component and a CCD detection component located on the frame;

[0008] The resistance detection assembly includes a loading slide and a test seat, the loading slide is provided with a working cavity for accommodating the alloy resistor semi-finished product, the working cavity is provided with an adsorption groove, the adsorption groove faces the resistor monomer, the test seat is slidably arranged below the loading slide, and the test seat is provided with a plurality of probes, and the probes are used to contact the pins of the resistor monomer;

[0009] The CCD detection component includes a distance-adjusting bracket, a laser engraving head and a camera located on the distance-adjusting bracket, and the laser engraving head and the camera are both arranged toward the material-carrying slide.

[0010] In one embodiment, the resistance detection component also includes a feed slide, an intermediate platform and a secondary slide. The loading slide is located on the intermediate platform. The feed slide is used to drive the intermediate platform to approach or move away from the CCD detection component, and the secondary slide is used to drive the test seat to translate.

[0011] In one of the embodiments, the resistance detection assembly also includes an auxiliary pressure rod and a docking cap, wherein the auxiliary pressure rod is located directly above the test seat, and the auxiliary pressure rod includes a supporting portion and a holding portion matching the working chamber, and the holding portion is used to press the alloy resistor semi-finished product; a lifting cylinder is provided at each end of the supporting portion, and a track is provided on each side of the loading slide, and the extension direction of the track is consistent with the extension direction of the secondary slide rail, and the docking cap is used to connect the lifting cylinder and the track.

[0012] In one of the embodiments, the docking cap is threadedly connected to the output end of the lifting cylinder, an upper stop ring and a lower stop ring are provided on the outer wall of the docking cap, and the track is located between the upper stop ring and the lower stop ring.

[0013] In one of the embodiments, a guide rod is provided on the secondary slide rail, and an arc-shaped groove matching the guide rod is formed on the support portion.

[0014] In one of the embodiments, a plurality of through holes communicating with the working chamber are formed on the loading slide.

[0015] In one of the embodiments, a resin plug is provided in the through hole, and the resin plug is provided with a central hole and a plurality of sealing springs arranged around the central hole, and the plurality of sealing springs are mutually supported to close the central hole.

[0016] In one embodiment, the test seat includes a main body, a lifting cylinder and a needle row, the lifting cylinder is connected to the secondary slide rail, the main body is provided with a plurality of slots, the slots are used to accommodate the needle row, the probes are distributed on the needle row at intervals, and the lifting cylinder is used to push the main body close to or away from the loading slide.

[0017] A method for detecting alloy resistance, based on the large substrate alloy resistance detection device, comprises the following steps:

[0018] Step 1: Place the semi-finished alloy resistor in the working chamber;

[0019] Step 2: The test seat starts to move to the bottom of the alloy resistor semi-finished product, and the probe contacts the pins of the resistor monomer, and the resistance value of the entire row of resistor monomers is detected at the same time to obtain the resistance value information of each resistor monomer;

[0020] Step 3: The probe is retracted, and the test socket is moved horizontally to the bottom of the next row of resistors and their resistance values ​​are tested;

[0021] Step 4: The loading slide moves horizontally toward the location of the CCD detection component, and when the resistor monomer that has completed the resistance value test moves to the bottom of the spacing bracket, it pauses, and the camera takes an image of the resistor monomer to obtain the image information of the resistor monomer;

[0022] Step 5: The laser engraving head engraves marks on the surface of the resistor monomer whose resistance value information and image information do not meet the standards;

[0023] Step 6: The loading slide starts again to move the next row of resistor monomers to the bottom of the spacing bracket, and repeat steps 4 and 5;

[0024] Step 7: Repeat steps 2 to 6 until all resistor monomers in the alloy resistor semi-finished product have been tested, the loading slide is reset, and the alloy resistor semi-finished product is removed.

[0025] The above large substrate alloy resistance detection device has the following beneficial effects:

[0026] 1. While the loading slide carries the semi-finished alloy resistor to be tested, the test seat tests the resistance value of the resistor monomer on it, and the CCD detection component collects the image information of each resistor monomer. The two detection stations are integrated on the same equipment without the need for midway transfer, which is conducive to improving the detection efficiency;

[0027] 2. The test bench is equipped with multiple probes, which can detect the resistor monomers in the alloy resistor semi-finished products row by row, improving the detection efficiency. The test bench and the camera are located on the upper and lower sides of the loading slide. The two tests can be carried out simultaneously and complement each other to further reduce the detection time;

[0028] 3. The CCD detection component is equipped with a laser engraving head, which can mark defective products and improve the detection and sorting efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0029] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings required for use in the embodiments are briefly introduced below. It should be understood that the following drawings only show certain embodiments of the present invention and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other related drawings can be obtained based on these drawings without creative work.

[0030] Figure 1 It is a structural schematic diagram of a resistor monomer;

[0031] Figure 2 This is a schematic diagram of the structure of a semi-finished alloy resistor;

[0032] Figure 3 It is a structural schematic diagram of a large substrate alloy resistance detection device;

[0033] Figure 4 It is a schematic diagram of the coordination between the resistance detection component and the CCD detection component;

[0034] Figure 5 It is a front view of a large substrate alloy resistance detection device;

[0035] Figure 6 It is a structural diagram of the test socket;

[0036] Figure 7 This is a schematic diagram of the coordination between the resin plug and the probe;

[0037] Figure 8 Schematic diagram of the coordination between the guide rod and the auxiliary pressure rod. DETAILED DESCRIPTION

[0038] In order to facilitate the understanding of the present invention, the present invention will be described more fully below with reference to the relevant drawings. The preferred embodiments of the present invention are given in the drawings. However, the present invention can be implemented in many different forms and is not limited to the embodiments described herein. On the contrary, the purpose of providing these embodiments is to make the disclosure of the present invention more thoroughly understood.

[0039] It should be noted that when an element is referred to as being "fixed to" another element, it may be directly on the other element or there may be a central element. When an element is considered to be "connected to" another element, it may be directly connected to the other element or there may be a central element at the same time. The terms "vertical", "horizontal", "left", "right" and similar expressions used herein are for illustrative purposes only and do not represent the only implementation method.

[0040] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as those commonly understood by those skilled in the art of the present invention. The terms used herein in the specification of the present invention are only for the purpose of describing specific embodiments and are not intended to limit the present invention. The term "and / or" used herein includes any and all combinations of one or more related listed items.

[0041] See also Figures 3 to 5 The present invention provides a large substrate alloy resistor detection device 10 for detecting the resistance and appearance of an alloy resistor semi-finished product 30, which includes: a frame 100 and a resistance detection component 200 and a CCD detection component 300 located on the frame 100.

[0042] See also Figure 4 , Figure 5 and Figure 6 The resistance detection assembly 200 includes a loading slide 210 and a test seat 220. The loading slide 210 is provided with a working chamber 211 for accommodating the alloy resistor semi-finished product 30. The working chamber 211 is provided with an adsorption groove 212, and the adsorption groove 212 faces the resistor monomer 20. The test seat 220 is slidably arranged below the loading slide 210. The test seat 220 is provided with a plurality of probes 230, and the probes 230 are used to contact the pins 21 of the resistor monomer 20.

[0043] See also Figure 4 and Figure 5 The CCD detection component 300 includes a distance-adjusting bracket 310 and a laser engraving head 320 and a camera 330 located on the distance-adjusting bracket 310 . The laser engraving head 320 and the camera 330 are both arranged toward the loading slide 210 .

[0044] The alloy resistance detection method based on the large substrate alloy resistance detection device 10 includes the following steps:

[0045] Step 1: Place the alloy resistor semi-finished product 30 in the working chamber 211. The frame 31 and the edge material 32 in the alloy resistor semi-finished product 30 are not cut off, and the individual resistor monomers 20 in the frame 31 are distributed in an array, and the resistor monomers 20 are connected by the edge material 32; when the alloy resistor semi-finished product 30 is located in the working chamber 211, the resistor monomer 20 covers the adsorption groove 212, and the adsorption groove 212 is connected to the external air pump, and the adsorption groove 212 generates negative pressure to adsorb the resistor monomer 20, thereby making the alloy resistor semi-finished product 30 and the working chamber 211 close together, ensuring that the individual resistor monomers 20 in the alloy resistor semi-finished product 30 are in a flat state, ensuring its flatness for subsequent CCD image detection.

[0046] Step 2: The test socket 220 starts to move to the bottom of the alloy resistor semi-finished product 30, and the probe 230 contacts the pin 21 of the resistor monomer 20, and the resistance value of the entire row of resistor monomers 20 is detected at the same time, and the resistance value information of each resistor monomer 20 is obtained; it should be noted that the resistor monomers 20 in the alloy resistor semi-finished product 30 are distributed in a rectangular array, and a plurality of probes 230 are arranged on the test socket 220, which can electrically connect the test socket 220 to a whole row of resistor monomers 20 at the same time, so as to test the resistance value of the whole row of resistor monomers 20.

[0047] Step 3: The probe 230 is retracted, and the test seat 220 is translated to the bottom of the next row of resistor monomers 20 to test their resistance values; and similarly, the test seat 220 detects the resistance values ​​of each resistor monomer 20 in the alloy resistor semi-finished product 30 row by row.

[0048] Step 4: The loading slide 210 moves horizontally toward the position of the CCD detection component 300, and when the resistor monomer 20 that has completed the resistance value test moves to the bottom of the spacing bracket 310, it pauses, and the camera 330 takes an image of the resistor monomer to obtain image information of the resistor monomer 20;

[0049] Step 5: The laser engraving head 320 engraves a mark on the surface of the resistor monomer whose resistance value information and image information do not meet the standards;

[0050] Step 6: The loading slide 210 is started again to move the next row of resistor monomers to the bottom of the spacing bracket 310, and the operations of steps 4 and 5 are repeated;

[0051] Step 7: Repeat steps 2 to 6 until all resistor monomers 20 in the alloy resistor semi-finished product 30 have been tested, the loading slide 210 is reset, and the alloy resistor semi-finished product 30 is removed.

[0052] It can be seen from the above detection method that after the alloy resistor semi-finished product 30 is placed in the working chamber 211, the test socket 220 starts to detect the resistance value, and the camera 330 performs an appearance detection on the resistor monomer 20 that has completed the resistance value detection, that is, when the camera 330 moves to the target resistor monomer 20, the resistance value information of the resistor monomer 20 has been obtained. If the resistance value of the resistor monomer 20 does not meet the standard, the laser engraving head 320 will engrave a mark indicating that the resistance value does not meet the standard on its surface while the camera 330 takes the image, and when the image taken by the camera 330 does not match the preset value, a mark indicating poor appearance will be engraved on the photographed resistor monomer 20. In the subsequent workstation, the resistor monomer 20 with poor resistance value is adjusted, or the resistor monomer 20 with poor appearance is sorted out. The products are sorted by the marks engraved by the laser engraving head 320, which improves the sorting efficiency and distinguishes the products that can be reworked.

[0053] Since the test socket 220 and the camera 330 are distributed on the upper and lower sides of the loading slide 210, the resistance value detection and appearance detection of the resistor monomer 20 can be performed simultaneously without interfering with each other, which is beneficial to improving the shipment detection efficiency of the alloy resistor.

[0054] The above large substrate alloy resistance detection device has the following beneficial effects:

[0055] 1. While the loading slide carries the semi-finished alloy resistor to be tested, the test seat tests the resistance value of the resistor monomer on it, and the CCD detection component collects the image information of each resistor monomer. The two detection stations are integrated on the same equipment without the need for midway transfer, which is conducive to improving the detection efficiency;

[0056] 2. The test bench is equipped with multiple probes, which can detect the resistor monomers in the alloy resistor semi-finished products row by row, improving the detection efficiency. The test bench and the camera are located on the upper and lower sides of the loading slide. The two tests can be carried out simultaneously and complement each other to further reduce the detection time;

[0057] 3. The CCD detection component is equipped with a laser engraving head, which can mark defective products and improve the detection and sorting efficiency.

[0058] See also Figure 3 and Figure 5 In one embodiment, the resistance detection component 200 also includes a feed slide 240, an intermediate platform 250 and a secondary slide 260. The loading slide 210 is located on the intermediate platform 250. The feed slide 240 is used to drive the intermediate platform 250 to approach or move away from the CCD detection component 300, and the secondary slide 260 is used to drive the test seat 220 to translate.

[0059] See also Figure 4 and Figure 5 The resistance detection component 200 also includes an auxiliary pressure rod 270 and a docking cap 280. The auxiliary pressure rod 270 is located directly above the test seat 220. The auxiliary pressure rod 270 includes a support portion 271 and a holding portion 272 matching the working chamber 211. The holding portion 272 is used to press the alloy resistor semi-finished product 30; a lifting cylinder 273 is provided at each end of the support portion 271, and a track 213 is provided on each side of the loading slide 210. The extension direction of the track 213 is consistent with the extension direction of the secondary slide rail 260. The docking cap 280 is used to connect the lifting cylinder 273 and the track 213.

[0060] See also Figure 8 The docking cap 280 is threadedly connected to the output end of the lifting cylinder 273 , and an upper stop ring 281 and a lower stop ring 282 are provided on the outer wall of the docking cap 280 , and the track 213 is located between the upper stop ring 281 and the lower stop ring 282 .

[0061] See also Figure 8 The secondary slide rail 260 is provided with a guide rod 261, and the support portion 271 is provided with an arc groove 2711 matching the guide rod 261. The secondary slide rail 260 drives the auxiliary pressure rod 270 to translate through the guide rod 261.

[0062] The test seat 220 includes a main body 221, a lifting cylinder 222 and a needle row 223. The lifting cylinder 222 is connected to the secondary slide rail 260. A plurality of slots are provided on the main body 221 for accommodating the needle row 223. The probes 230 are distributed at intervals on the needle row 223. The lifting cylinder 222 is used to push the main body 221 close to or away from the loading slide 210.

[0063] When performing resistance value detection, the auxiliary pressure rod 270 and the test socket 220 are translated synchronously, the test socket 220 moves to the bottom of the resistor monomer 20 to be tested, and the auxiliary pressure rod 270 moves synchronously to the top of the resistor monomer 20. The output end of the lifting cylinder 273 contracts, causing the holding part 272 to descend and press the resistor monomer 20. The lifting cylinder 222 pushes the main body 221 close to the loading slide 210, so that the probe 230 contacts the pin 21. In this process, the holding part 272 provides pressure to hold the resistor monomer 20 inside the working chamber 211, which can avoid the elastic force applied by the probe 230 causing the position of the resistor monomer 20 to shift.

[0064] It should be noted that after the alloy resistor semi-finished product 30 is placed in the working chamber 211, the test socket 220 starts to detect the resistance value of the resistor monomer 20, and the appearance inspection of the resistor monomer 20 is not started until the resistor monomer 20 is moved to the distance adjustment bracket 310. The camera 330 photographs the resistor monomer 20 that has completed the resistance value detection, that is, when the camera 330 performs the image shooting task, the test socket 220 has moved to the next row of resistor monomers 20, and the auxiliary pressure rod 270 will not block the shooting of the camera 330.

[0065] See also Figure 4 and Figure 7 In one embodiment, a plurality of through holes 214 communicating with the working chamber 211 are provided on the loading slide 210. A resin plug 400 is provided in the through hole 214, and the resin plug 400 is provided with a central hole (not shown) and a plurality of sealing springs 410 arranged around the central hole. The plurality of sealing springs 410 are mutually supported to close the central hole to ensure the sealing of the working chamber 211, so that the adsorption groove 212 can generate sufficient suction force to adsorb the resistor monomer 20. When the resistance value is tested, the probe 230 pushes the sealing spring 410 and passes through the through hole 214. After the probe 230 leaves the through hole 214, the sealing spring 410 can be restored under its own elastic action to close the central hole again.

[0066] The above-mentioned embodiments only express several implementation methods of the present invention, and the descriptions thereof are relatively specific and detailed, but they cannot be understood as limiting the scope of the invention patent. It should be pointed out that, for ordinary technicians in this field, several variations and improvements can be made without departing from the concept of the present invention, and these all belong to the protection scope of the present invention. Therefore, the protection scope of the patent of the present invention shall be subject to the attached claims.

Claims

1. A large substrate alloy resistor detection device, used to detect the resistance value and appearance of alloy resistor semi-finished products, characterized in that: include: A frame and a resistance detection component and a CCD detection component located on the frame; The resistance detection assembly includes a loading slide and a test seat, the loading slide is provided with a working cavity for accommodating the alloy resistor semi-finished product, the working cavity is provided with an adsorption groove, the adsorption groove faces the resistor monomer, the test seat is slidably arranged below the loading slide, and the test seat is provided with a plurality of probes, and the probes are used to contact the pins of the resistor monomer; The CCD detection component includes a distance-adjusting bracket, a laser engraving head and a camera located on the distance-adjusting bracket, and the laser engraving head and the camera are both arranged toward the material-carrying slide.

2. The large substrate alloy resistance detection device according to claim 1, characterized in that: The resistance detection component also includes a feed slide, an intermediate platform and a secondary slide. The loading slide is located on the intermediate platform. The feed slide is used to drive the intermediate platform to approach or move away from the CCD detection component. The secondary slide is used to drive the test seat to translate.

3. The large substrate alloy resistance detection device according to claim 2, characterized in that: The resistance detection assembly also includes an auxiliary pressure rod and a docking cap, wherein the auxiliary pressure rod is located directly above the test seat, and the auxiliary pressure rod includes a supporting portion and a holding portion matching the working cavity, wherein the holding portion is used to press the alloy resistor semi-finished product; A lifting cylinder is provided at each end of the support portion, and a track is provided at each side of the loading slide. The extension direction of the track is consistent with the extension direction of the secondary slide rail, and the docking cap is used to connect the lifting cylinder and the track.

4. The large substrate alloy resistance detection device according to claim 3, characterized in that: The butt joint cap is threadedly connected to the output end of the lifting cylinder, an upper stop ring and a lower stop ring are arranged on the outer wall of the butt joint cap, and the track is located between the upper stop ring and the lower stop ring.

5. The large substrate alloy resistance detection device according to claim 3, characterized in that: A guide rod is arranged on the secondary slide rail, and an arc-shaped groove matching with the guide rod is opened on the support part.

6. The large substrate alloy resistance detection device according to claim 1, characterized in that: The material loading slide is provided with a plurality of through holes communicating with the working chamber.

7. The large substrate alloy resistance detection device according to claim 6, characterized in that: A resin plug is arranged in the through hole, and the resin plug is provided with a central hole and a plurality of sealing springs arranged around the central hole, and the plurality of sealing springs are mutually supported to close the central hole.

8. The large substrate alloy resistance detection device according to claim 2, characterized in that: The test seat includes a main body, a lifting cylinder and a needle row. The lifting cylinder is connected to the secondary slide rail. The main body is provided with a plurality of slots for accommodating the needle row. The probes are distributed on the needle row at intervals. The lifting cylinder is used to push the main body towards or away from the loading slide.

9. A method for detecting alloy resistance, based on the large substrate alloy resistance detection device according to any one of claims 1 to 8, comprising the following steps: Step 1: Place the semi-finished alloy resistor in the working chamber; Step 2: The test seat starts to move to the bottom of the alloy resistor semi-finished product, and the probe contacts the pins of the resistor monomer, and the resistance value of the entire row of resistor monomers is detected at the same time to obtain the resistance value information of each resistor monomer; Step 3: The probe is retracted, and the test socket is moved horizontally to the bottom of the next row of resistors and their resistance values ​​are tested; Step 4: The loading slide moves horizontally toward the location of the CCD detection component, and when the resistor monomer that has completed the resistance value test moves to the bottom of the spacing bracket, it pauses, and the camera takes an image of the resistor monomer to obtain the image information of the resistor monomer; Step 5: The laser engraving head engraves marks on the surface of the resistor monomer whose resistance value information and image information do not meet the standards; Step 6: The loading slide starts again to move the next row of resistor monomers to the bottom of the spacing bracket, and repeat steps 4 and 5; Step 7: Repeat steps 2 to 6 until all resistor monomers in the alloy resistor semi-finished product have been tested, the loading slide is reset, and the alloy resistor semi-finished product is removed.

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