Wide plasma cleaning machine and system thereof
By designing a liftable plasma generator and an automatically flipped flip unit in a plasma cleaning machine, the problems of high fixation, incomplete cleaning and manual flip in the prior art are solved, and a more efficient and automated cleaning process is achieved.
Patent Information
- Application Number
- CN202510043144.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-01-10
- Publication Date
- 2025-03-21
AI Technical Summary
The existing plasma cleaning machines have plasma generator height fixed and unadjustable, and poor applicability; multiple cylindrical nozzles are not completely cleaned; only one side of the processed parts needs to be turned manually, which is inefficient and has great labor demand.
Design a wide-format plasma cleaning machine, including a liftable plasma generator and a flip unit. The plasma generator adjusts the height through a hydraulic lifting rod, and the flip unit automatically flips the machining parts using a clamping assembly and a flip motor to ensure double-sided cleaning.
It improves the applicability and automation of plasma cleaning machines, reduces manpower demand, and improves processing efficiency and cleaning effect.
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Figure CN119657574A_ABST
Abstract
Description
Technical Field
[0001] The invention relates to the technical field of plasma cleaning, in particular to a wide-width plasma cleaning machine and a system thereof. Background Art
[0002] Plasma is a state of matter. Matter usually exists in three states: solid, liquid, and gas. However, in some special cases, there is a fourth state, such as the matter in the ionosphere in the earth's atmosphere. The following substances exist in the plasma state: electrons in high-speed motion; neutral atoms, molecules, and atomic groups (free radicals) in an activated state; ionized atoms and molecules; unreacted molecules and atoms, etc., but the matter generally remains electrically neutral. In a vacuum chamber, a high-energy disordered plasma is generated by ignition of a radio frequency power supply under a certain pressure, and the surface of the product being cleaned is bombarded by isotopes to achieve the cleaning purpose.
[0003] Surface cleaning: It can remove organic pollutants, grease, oxides and other impurities on the surface of objects, provide a clean surface for subsequent coating, plating and other processes, and ensure the uniformity and adhesion of the coating or film; Surface modification: introducing new functional groups or changing the chemical structure of the material surface to improve properties such as hydrophilicity, adhesion and biocompatibility. It is widely used in the fields of biomedicine and materials science. Improve adhesion: improve surface condition, increase the bonding strength between coating or film and substrate, and improve product quality and durability; Ashing photoresist: used to remove residual photoresist in semiconductor manufacturing to ensure smooth progress of subsequent processes; In the prior art, the height of the plasma generator is generally fixed and cannot be adjusted, which makes it inconvenient to perform plasma cleaning on workpieces of different thicknesses, resulting in poor applicability; the existing plasma cleaning machine is generally provided with multiple cylindrical nozzles, which clean the workpiece surface by controlling multiple spray groups to reciprocate, which easily causes inadequate cleaning; when a wide-width plasma cleaning machine cleans the workpiece, it can only clean one side of the workpiece, and needs to be manually flipped when the other side needs to be cleaned.
[0004] The height of the plasma generator is generally fixed and cannot be adjusted, resulting in poor applicability and increased processing costs; multiple cylindrical nozzles perform reciprocating motion to clean the surface of the workpiece, which can easily result in incomplete cleaning; only one side of the workpiece can be cleaned, and manual flipping is required when the other side needs to be cleaned, resulting in increased manpower requirements and low processing efficiency. Summary of the invention
[0005] In view of the deficiencies in the prior art, the present invention provides a wide-width plasma cleaning machine and a system thereof, which solve the problems that the height of the plasma generator is generally fixed and cannot be adjusted, resulting in poor applicability and increased processing costs; multiple cylindrical nozzles perform reciprocating motion to clean the surface of the workpiece, which easily causes inadequate cleaning; only one side of the workpiece can be cleaned, and manual flipping is required when the other side needs to be cleaned, resulting in increased manpower requirements and low processing efficiency.
[0006] To achieve the above objectives, the present invention is implemented through the following technical solutions: a wide-width plasma cleaning machine, comprising a workbench, a plasma generator and a flip unit, wherein the plasma generator is located above the workbench, the flip unit is arranged at the rear side of the workbench, and the workbench comprises: Supporting cross board; A first lifting hydraulic rod, wherein the first lifting hydraulic rod is used to adjust the height of the plasma generator; A conveying component, wherein the conveying component is used to convey the workpiece to be processed; The plasma generator comprises: A housing, wherein the housing is made of insulating material; A gas delivery pipe, the gas delivery pipe is used to deliver process gas required for plasma generation; The flip unit comprises: A bottom plate, the bottom plate is used to support the turning unit; Lifting blocks; A clamping assembly is used to clamp a workpiece to be processed.
[0007] Preferably, a side plate is fixedly provided on the lower side of the supporting transverse plate, a supporting column is fixedly provided on the inner side of the side plate, and the top end of the supporting column is fixedly connected to the supporting transverse plate.
[0008] Preferably, the first lifting hydraulic rod is located outside the side plate, and a connecting plate is fixedly connected to the bottom of the first lifting hydraulic rod, and the connecting plate is fixedly connected to the side plate.
[0009] Preferably, a conveying roller is inserted into the inner side of the conveying component, and a plurality of rubber rings are sleeved on the conveying roller to prevent the workpiece from being damaged during the conveying process. A guide plate is fixedly provided on the inner side of the conveying component, and the guide plate is located above the conveying roller.
[0010] Preferably, the shell is provided with a connector, which is sleeved on the output end of the first lifting hydraulic rod, and the bottom of the shell is provided with a nozzle, which is arranged in a thin and narrow line shape distributed in a front-to-back manner. A positioning piece is fixedly provided on the inner side of the shell, and the positioning piece is sleeved with a high-voltage electrode.
[0011] Preferably, the gas pipe is plugged into the outer shell, and the gas pipe passes through the outer shell and is plugged with a grounding electrode, the grounding electrode is located on the inner side of the outer shell, the grounding electrode is sleeved on the outer side of the high-voltage electrode, a discharge air gap is formed between the grounding electrode and the high-voltage electrode, the gas pipe extends to the inner side of the grounding electrode and is located above the high-voltage electrode, and a portion of the gas pipe located on the inner side of the outer shell is provided with a number of evenly distributed diversion holes.
[0012] Preferably, a slide bar and a second lifting hydraulic rod are provided on the top of the base plate, and a slide groove is provided on the inner side of the slide bar.
[0013] Preferably, a wing plate and a plug plate are provided on the outer side of the lifting block, the lower side of the plug plate is fixedly connected to the output end of the second lifting hydraulic rod, the plug plate is fixedly connected to the top of the wing plate, the plug plate is plugged into the inner side of the slide groove, a flip motor is plugged into the inner side of the lifting block, and a transmission gear is sleeved on the output end of the flip motor.
[0014] Preferably, a rotating shaft rod is fixedly connected to the outer side of the clamping assembly, and the rotating shaft rod is inserted into the inner side of the lifting block and is located below the flipping motor. A linkage gear is sleeved on the outer side of the rotating shaft rod, and the linkage gear is meshingly connected with the transmission gear. A limit rod is fixedly arranged on the inner side of the clamping assembly, and a two-way threaded rod is inserted into the inner side of the clamping assembly. A clamping plate is arranged on the inner side of the clamping assembly, and a threaded sleeve and a sliding sleeve are arranged on the clamping plate. The threaded sleeve and the sliding sleeve are respectively sleeved on the outer side of the two-way threaded rod and the limit rod. The flipping motor drives the clamping assembly to clamp the workpiece for flipping, which improves the automation degree of the wide-width plasma cleaning machine, improves work efficiency, and reduces manpower requirements.
[0015] A wide-width plasma cleaning system comprises a wide-width plasma cleaning machine.
[0016] The present invention discloses a wide-width plasma cleaning machine and a system thereof, which have the following beneficial effects: 1. The wide-width plasma cleaning machine is equipped with a workbench, and the first hydraulic lifting rod arranged on the workbench is used to drive the plasma generator to move up and down, so that the height of the plasma generator can be adjusted according to the thickness of the workpiece to be processed; 2. The wide-width plasma cleaning machine is equipped with a long strip plasma generator, which is equipped with multiple narrow linear nozzles arranged in a front-to-back manner. The workpiece can be cleaned multiple times at one time, which increases the coverage width of the plasma generator and improves the cleaning effect; 3. The wide-width plasma cleaning machine is provided with a flipping unit, which uses a clamping assembly to clamp the workpiece. The lifting block is lifted and lowered under the push of the second lifting hydraulic rod. The flipping motor drives the clamping assembly to clamp the workpiece and flip it, which improves the automation degree of the wide-width plasma cleaning machine, improves work efficiency, and reduces manpower requirements. BRIEF DESCRIPTION OF THE DRAWINGS
[0017] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.
[0018] Figure 1 It is a schematic diagram of the overall structure of the present invention; Figure 2 It is a structural schematic diagram of the workbench of the present invention; Figure 3 It is a schematic diagram of the mechanism of the plasma generator of the present invention; Figure 4 It is a schematic diagram of the side cross-sectional structure of the plasma generator of the present invention; Figure 5 It is a schematic diagram of the end cross-sectional structure of the plasma generator of the present invention; Figure 6 The structural diagram of the flip unit of the present invention is Figure 7 The structural diagram of the lifting block of the present invention is Figure 8 It is a schematic diagram of the structure of the clamping assembly of the present invention.
[0019] In the figure: 1, workbench; 11, supporting horizontal plate; 111, side plate; 112, supporting column; 12, first lifting hydraulic rod; 121, connecting plate; 13, conveying assembly; 131, conveying roller; 132, guide plate; 2, plasma generator; 21, housing; 211, connector; 212, nozzle; 213, positioning member; 22, gas pipe; 221, diverter hole; 23, grounding electrode; 24, high-voltage electrode; 3. Flip unit; 31. Bottom plate; 311. Slide rod; 312. Slide groove; 313. Second lifting hydraulic rod; 32. Lifting block; 321. Wing plate; 322. Insert plate; 323. Flip motor; 324. Transmission gear; 33. Clamping assembly; 331. Rotating shaft rod; 332. Linkage gear; 333. Limit rod; 334. Bidirectional threaded rod; 335. Clamp plate; 3351. Threaded sleeve; 3352. Sliding sleeve. DETAILED DESCRIPTION
[0020] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention are clearly and completely described. Obviously, the described embodiments are part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.
[0021] The embodiments of the present application provide a wide-width plasma cleaning machine and a system thereof, thereby solving the problems that the height of a plasma generator is generally fixed and cannot be adjusted, resulting in poor applicability and increased processing costs; multiple cylindrical nozzles perform reciprocating motion to clean the surface of a workpiece, which easily results in inadequate cleaning; only one side of the workpiece can be cleaned, and manual flipping is required when the other side needs to be cleaned, resulting in increased manpower requirements and low processing efficiency, thereby improving the applicability and automation level of the plasma cleaning machine.
[0022] The embodiment of the invention discloses a wide-width plasma cleaning machine and a system thereof.
[0023] In the prior art, the structure is as follows: High-voltage digital power generator: uses medium-frequency power to generate plasma, digital control to achieve power self-matching, stable output, and is not affected by factors such as gas pressure, voltage fluctuations and gun electrode aging.
[0024] Plasma generator spray gun: Direct spray gun is used to process small area and complex shape materials, and can be matched with the production line to realize fully automatic online production.
[0025] Control system: Controls equipment operation and protects the overall system, ensuring stability and safety, making the operation process smooth and reliable.
[0026] Working principle: by applying energy to ionize the gas into plasma, the properties of active components in the plasma, such as ions, electrons, atoms, active groups, etc., are used to treat the sample surface to achieve the purpose of cleaning, modification, etching, etc. Embodiment 1 According to the attached Figure 1-7 As shown, the wide-width plasma cleaning machine includes a workbench 1, a plasma generator 2 and a turning unit 3, wherein the plasma generator 2 is located above the workbench 1, the turning unit 3 is arranged at the rear side of the workbench 1, and the workbench 1 includes a supporting horizontal plate 11; A first lifting hydraulic rod 12, the first lifting hydraulic rod 12 is used to adjust the height of the plasma generator 2; A conveying component 13, the conveying component 13 is used to convey the workpiece to be processed; The plasma generator 2 includes a housing 21, and the housing 21 is configured of an insulating material; A gas delivery pipe 22, the gas delivery pipe 22 is used to deliver process gas required for plasma generation; The flip unit 3 includes a bottom plate 31 and a lifting block 32, and the bottom plate 31 is used to support the flip unit 3; The clamping assembly 33 is used to clamp the workpiece to be processed.
[0027] A workbench 1 is provided, and a first hydraulic lifting rod 12 provided on the workbench 1 is used to drive a plasma generator 2 to move up and down, so that the plasma generator 2 can adjust its height according to the thickness of the workpiece to be processed; a long strip plasma generator 2 is provided, and a plurality of narrow linear nozzles 212 distributed front and back are provided on the plasma generator 2, so that the workpiece can be cleaned multiple times at one time, thereby increasing the coverage width of the plasma generator 2 and improving the cleaning effect; a flip unit 3 is provided, and a clamping assembly 33 is used to clamp the workpiece, and a lifting block 32 is lifted and lowered under the push of a second lifting hydraulic rod 313, and a flip motor 323 drives the clamping assembly 33 to clamp the workpiece and flip it, thereby improving the automation degree of the wide-width plasma cleaning machine, improving the work efficiency, and reducing the manpower demand.
[0028] Furthermore, a side plate 111 is fixedly provided on the lower side of the supporting transverse plate 11 , a supporting column 112 is fixedly provided on the inner side of the side plate 111 , and the top end of the supporting column 112 is fixedly connected to the supporting transverse plate 11 .
[0029] Furthermore, the first lifting hydraulic rod 12 is located on the outside of the side plate 111, and a connecting plate 121 is fixedly connected to the bottom of the first lifting hydraulic rod 12. The connecting plate 121 is fixedly connected to the side plate 111. The first hydraulic lifting rod 12 drives the plasma generator 2 to move up and down, making it convenient for the plasma generator 2 to adjust the height according to the thickness of the workpiece to be processed.
[0030] Furthermore, a conveying roller 131 is inserted into the inner side of the conveying component 13 , and a plurality of rubber rings are sleeved on the conveying roller 131 to prevent the workpiece from being damaged during the conveying process. A guide plate 132 is fixedly provided on the inner side of the conveying component 13 , and the guide plate 132 is located above the conveying roller 131 .
[0031] Particularly disclosed, the outer shell 21 is provided with a connector 211, and the connector 211 is sleeved on the output end of the first lifting hydraulic rod 12. A nozzle 212 is provided at the bottom of the outer shell 21, and the nozzle 212 is arranged to be a thin and narrow linear type distributed in a front-to-back arrangement. A positioning member 213 is fixedly provided on the inner side of the outer shell 21, and the positioning member 213 is sleeved with a high-voltage electrode 24. The plasma generator 2 is provided with a plurality of thin and narrow linear nozzles 212 distributed in a front-to-back arrangement, and the workpiece is cleaned multiple times at one time, thereby increasing the coverage width of the plasma generator 2 and improving the cleaning effect.
[0032] Particularly disclosed, the gas pipe 22 is plugged into the outer shell 21, and the gas pipe 22 passes through the outer shell 21 and is plugged with a grounding electrode 23, the grounding electrode 23 is located on the inner side of the outer shell 21, the grounding electrode 23 is sleeved on the outer side of the high-voltage electrode 24, a discharge air gap is formed between the grounding electrode 23 and the high-voltage electrode 24, the gas pipe 22 extends to the inner side of the grounding electrode 23 and is located above the high-voltage electrode 24, and a portion of the gas pipe 22 located on the inner side of the outer shell 21 is provided with a number of evenly distributed diversion holes 221.
[0033] Specifically disclosed, a slide bar 311 and a second lifting hydraulic rod 313 are arranged on the top of the bottom plate 31 , and a slide groove 312 is opened inside the slide bar 311 .
[0034] It should be particularly emphasized that a wing plate 321 and a plug plate 322 are provided on the outer side of the lifting block 32, the lower side of the plug plate 322 is fixedly connected to the output end of the second lifting hydraulic rod 313, the plug plate 322 is fixedly connected to the top of the wing plate 321, the plug plate 322 is inserted into the inner side of the slide groove 312, and a flip motor 323 is inserted into the inner side of the lifting block 32, and a transmission gear 324 is sleeved on the output end of the flip motor 323.
[0035] Embodiment 2 The wide-width plasma cleaning machine comprises a workbench 1, a plasma generator 2 and a turning unit 3. The plasma generator 2 is located above the workbench 1, and the turning unit 3 is arranged at the rear side of the workbench 1. The workbench 1 comprises: Supporting horizontal plate 11; A first lifting hydraulic rod 12, the first lifting hydraulic rod 12 is used to adjust the height of the plasma generator 2; A conveying component 13, the conveying component 13 is used to convey the workpiece to be processed; The plasma generator 2 comprises: A housing 21, wherein the housing 21 is made of insulating material; A gas delivery pipe 22, the gas delivery pipe 22 is used to deliver process gas required for plasma generation; The flip unit 3 includes: A bottom plate 31, the bottom plate 31 is used to support the turning unit 3; Lifting block 32; The clamping assembly 33 is used to clamp the workpiece to be processed.
[0036] The outer side of the clamping assembly 33 is fixedly connected with a rotating shaft rod 331, which is inserted into the inner side of the lifting block 32 and is located below the flipping motor 323. The outer side of the rotating shaft rod 331 is sleeved with a linkage gear 332, which is meshed with the transmission gear 324. A limit rod 333 is fixedly arranged on the inner side of the clamping assembly 33. A two-way threaded rod 334 is inserted into the inner side of the clamping assembly 33. A clamping plate 335 is arranged on the inner side of the clamping assembly 33. A threaded sleeve 3351 and a sliding sleeve 3352 are arranged on the clamping plate 335. The threaded sleeve 3351 and the sliding sleeve 3352 are respectively sleeved on the two-way threaded rod 334 and the outer side of the limit rod 333. The flipping motor 323 drives the clamping assembly 33 to clamp the workpiece for flipping, thereby improving the automation degree of the wide-width plasma cleaning machine, improving work efficiency, and reducing manpower requirements.
[0037] A wide-width plasma cleaning system comprises a wide-width plasma cleaning machine.
[0038] Working principle: First, the workpiece is placed on the conveying roller 131, and the guide plate 132 guides the workpiece to move the workpiece to the middle position of the conveying roller 131 to ensure the cleaning effect. The conveying roller conveys the workpiece to the bottom of the plasma generator 2; Then the process gas is transported to the plasma generator 2 through the gas delivery pipe 22. The process gas is evenly distributed to the discharge air gap between the high-voltage electrode 24 and the ground electrode 23 through the diverter holes 221 provided on the gas delivery pipe 22, and is ionized to form plasma. The plasma is ejected from the linear nozzle 212 provided below the plasma generator 2. The surface stains of the workpiece are removed by the plasma ejected from the plasma generator 2, and the surface activity of the workpiece is activated. Finally, after one side of the workpiece is cleaned, it is transported to the position of the flip unit 3 by the conveying roller 131. The flip unit 3 clamps the workpiece using the provided clamping assembly 33, and the second lifting hydraulic rod 313 pushes the lifting block to rise. The flip motor 323 drives the clamping assembly 33 to flip 180°, and then puts it back on the conveying roller 131 to clean the other side of the workpiece.
[0039] Wide-width plasma cleaning machines have a wide range of applications, mainly in the following areas: electronics industry Semiconductor manufacturing: In the photolithography, etching, deposition and other processes of chip manufacturing, it is used to clean the particulate impurities and organic pollutants on the surface of silicon wafers, as well as to clean the etching residues. It can also clean the chips and packaging materials to improve the packaging reliability. Optoelectronics industry, optical device manufacturing: It can remove organic pollutants, fingerprints and dust on the surface of optical lenses, prisms and optical fibers, and can also activate the surface to improve hydrophilicity and coating adhesion, and improve the uniformity and stability of optical coatings. In laser device manufacturing, it can improve the surface quality of the resonant cavity and reduce optical loss; New energy industry Lithium battery manufacturing: Surface treatment of battery positive and negative electrode materials, diaphragms, shells and other components to improve the wettability and bonding properties of materials, reduce battery internal resistance, and improve battery safety and performance. Fuel cell R&D and production: Surface modification of catalyst carriers and membrane electrode assemblies to improve the reactivity and stability of fuel cells. Solar panel production: remove organic pollutants and metal ions on the surface of silicon wafers to improve the photoelectric conversion efficiency of solar panels; The above shows and describes the basic principles and main features of the present invention and the advantages of the present invention. It should be understood by those skilled in the art that the present invention is not limited to the above embodiments. The above embodiments and descriptions are only for explaining the principles of the present invention. Without departing from the spirit and scope of the present invention, the present invention may have various changes and improvements, which fall within the scope of the present invention to be protected. The scope of protection of the present invention is defined by the attached claims and their equivalents.
Claims
1. A wide-width plasma cleaning machine, comprising a workbench (1), a plasma generator (2) and a turning unit (3), wherein the plasma generator (2) is located above the workbench (1), and the turning unit (3) is arranged at the rear side of the workbench (1), characterized in that: The workbench (1) comprises: Supporting cross plate (11); A first lifting hydraulic rod (12), wherein the first lifting hydraulic rod (12) is used to adjust the height of the plasma generator (2); A conveying component (13), wherein the conveying component (13) is used to convey a workpiece to be processed; The plasma generator (2) comprises: A housing (21), wherein the housing (21) is made of insulating material; A gas delivery pipe (22), wherein the gas delivery pipe (22) is used to deliver process gas required for plasma generation; The turning unit (3) comprises: A bottom plate (31), the bottom plate (31) being used to support the turning unit (3); Lifting block (32); A clamping assembly (33), wherein the clamping assembly (33) is used to clamp a workpiece to be processed.
2. The wide-width plasma cleaning machine according to claim 1, characterized in that: A side plate (111) is fixedly arranged on the lower side of the supporting transverse plate (11), a supporting column (112) is fixedly arranged on the inner side of the side plate (111), and the top end of the supporting column (112) is fixedly connected to the supporting transverse plate (11).
3. The wide-width plasma cleaning machine according to claim 1, characterized in that: The first lifting hydraulic rod (12) is located outside the side plate (111), and a connecting plate (121) is fixedly connected to the bottom of the first lifting hydraulic rod (12), and the connecting plate (121) is fixedly connected to the side plate (111).
4. The wide-width plasma cleaning machine according to claim 1, characterized in that: A conveying roller (131) is inserted into the inner side of the conveying component (13), and a plurality of rubber rings are sleeved on the conveying roller (131) to prevent the workpiece from being damaged during the conveying process. A guide plate (132) is fixedly arranged on the inner side of the conveying component (13), and the guide plate (132) is located above the conveying roller (131).
5. The wide-width plasma cleaning machine according to claim 1, characterized in that: The housing (21) is provided with a connector (211), the connector (211) being sleeved on the output end of the first lifting hydraulic rod (12), the bottom of the housing (21) is provided with a nozzle (212), the nozzle (212) being arranged in a thin and narrow line shape arranged in a front-to-back manner, and a positioning piece (213) is fixedly provided on the inner side of the housing (21), the positioning piece (213) being sleeved with a high-voltage electrode (24).
6. The wide-width plasma cleaning machine according to claim 1, characterized in that: The gas delivery pipe (22) is plugged into the outer shell (21), and the gas delivery pipe (22) penetrates the outer shell (21) and is plugged with a grounding electrode (23), the grounding electrode (23) is located on the inner side of the outer shell (21), the grounding electrode (23) is sleeved on the outer side of the high-voltage electrode (24), a discharge air gap is formed between the grounding electrode (23) and the high-voltage electrode (24), the gas delivery pipe (22) extends to the inner side of the grounding electrode (23) and is located above the high-voltage electrode (24), and a portion of the gas delivery pipe (22) located on the inner side of the outer shell (21) is provided with a plurality of evenly distributed diversion holes (221).
7. The wide-width plasma cleaning machine according to claim 1, characterized in that: A sliding rod (311) and a second lifting hydraulic rod (313) are arranged on the top of the bottom plate (31), and a sliding groove (312) is provided on the inner side of the sliding rod (311).
8. The wide-width plasma cleaning machine according to claim 1, characterized in that: The lifting block (32) is provided with a wing plate (321) and a plug plate (322) on the outside, the plug plate (322) is fixedly connected to the output end of the second lifting hydraulic rod (313) on the lower side, the plug plate (322) is fixedly connected to the top of the wing plate (321), the plug plate (322) is plugged into the inside of the slide groove (312), the lifting block (32) is plugged with a flip motor (323) on the inside, and the output end of the flip motor (323) is sleeved with a transmission gear (324).
9. The wide-width plasma cleaning machine according to claim 1, characterized in that: The outer side of the clamping assembly (33) is fixedly connected to a rotating shaft rod (331), the rotating shaft rod (331) is inserted into the inner side of the lifting block (32) and is located below the flip motor (323), the outer side of the rotating shaft rod (331) is sleeved with a linkage gear (332), the linkage gear (332) is meshingly connected with the transmission gear (324), a limit rod (333) is fixedly provided on the inner side of the clamping assembly (33), and a bidirectional threaded rod (334) is inserted into the inner side of the clamping assembly (33), A clamping plate (335) is provided on the inner side of the clamping assembly (33), and a threaded sleeve (3351) and a sliding sleeve (3352) are provided on the clamping plate (335). The threaded sleeve (3351) and the sliding sleeve (3352) are respectively sleeved on the outer sides of the bidirectional threaded rod (334) and the limit rod (333). The turning motor (323) drives the clamping assembly (33) to clamp the workpiece and turn it over, thereby improving the automation level of the wide-width plasma cleaning machine, improving work efficiency, and reducing manpower requirements.
10. Wide-width plasma cleaning system, characterized in that: The invention comprises the wide-width plasma cleaning machine as described in any one of claims 1 to 9.
Citation Information
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