Self-cleaning method for surface of insulator of high-voltage power transmission tower

Abstract

The invention discloses a surface self-cleaning method for an insulator of a high-voltage power transmission tower, which comprises the following steps: obtaining an insulator to be used with a dirt-free surface, and placing the insulator on an X-Y two-dimensional moving platform of a laser processing system; performing scanning processing on the insulator by using the laser processing system to obtain the insulator on which a micro-nano surface with a special distance is formed on a non-flat surface; and the insulator with the micro-nano surface and the special distance is placed in a preset solution to be soaked for a preset duration, the insulator is taken out to stand and dried, and the super-hydrophobic surface self-cleaning insulator with the average contact angle larger than a preset angle is obtained. Compared with an untreated insulator, the treated insulator can effectively prevent water drops on the surface of the insulator from gathering to form a water film in rainy days in subsequent use, and meanwhile, automatic cleaning of dust deposited on the surface again is realized, so that the problems that the dust on the surface of the insulator is difficult to manually remove, the efficiency is low and the like at present are solved; and the insulation performance of the insulator is ensured.

Description

Technical Field

[0001] The invention belongs to the technical field of insulators, in particular to a self-cleaning method for the surface of an insulator of a high-voltage transmission tower. Background Art

[0002] As an indispensable component of overhead lines and transmission line systems, insulators mainly support and isolate the conductive parts to ensure the safe and stable transmission of current. They are usually made of non-conductive materials such as ceramics, glass or composite materials. In practical applications, industrial dust, dust, smoke particles or other impurities may accumulate on the surface of insulators. When the humidity in the air is high, the soluble in the dirty dust will slowly dissolve, making it easy to form a conductive film on its surface, resulting in reduced insulation performance and discharge. As the dirty layer increases, local discharge will extend to flashover. Insulator flashover is the main threat to the safe operation of the power system. In addition, due to the hydrophilicity of the insulator itself, the gathered water droplets will connect together to form a water film, which can cover the dust and pollutants on the surface of the insulator. Even on an uneven surface, the presence of a fine water film can provide a path for current to pass. Secondly, as the water film evaporates, the charged ions in it will remain on the surface and cannot be completely removed, causing the surface to become more and more conductive after a certain period of time.

[0003] At present, dust removal on the surface of insulators mainly relies on manual cleaning, such as using a high-pressure water gun to remove accumulated dust. However, manual cleaning is not only inefficient, but if the high-pressure water flow is too strong, it may cause tiny cracks in the insulating material, thereby reducing its insulation performance. In addition, during the cleaning process, the splashing of dust and dirt may cause secondary pollution or damage to adjacent electrical components, and droplets will be left on the surface of the cleaned insulator and then converge into a water film. At present, there is also a method of coating an insulating anti-fouling coating on the surface of the insulator to reduce the adhesion of dust and thus improve its insulation performance. However, this method is prone to improper operation, resulting in uneven coating, which affects the protection effect. In addition, it has certain requirements for the application environment (temperature, humidity, etc.), which brings additional construction restrictions. The aging, embrittlement or chemical degradation of certain protective agents will also reduce the insulation performance of the insulator.

[0004] Similar to the self-cleaning effect of the lotus leaf surface, polar water molecules can effectively interact with dust particles with a certain polarity or charge. When water contacts the surface of an object, adhesion is generated between the water molecules and the dust particles, causing some dust to adhere to the water droplets, which is an effective means of removing surface dust. Figure 1 As shown in Figure 2, due to the hydrophilicity of the insulator surface (surface hydrophilicity is measured by the contact angle), water droplets are more likely to gather into a water film on a dusty surface (such as Figure 2As shown in the figure, impurities dissolve in water to form conductive ions, which further reduces its insulation. Similarly, on the surface of dust-free insulators, due to its surface hydrophilicity, raindrops can also form and reduce the insulation performance of the insulator, which has become a technical problem that needs to be solved urgently. Summary of the invention

[0005] The purpose of the present invention is to provide a self-cleaning method for the surface of a high-voltage transmission tower insulator to solve the deficiencies in the prior art. The insulator treated by the method of the present invention can effectively prevent water droplets on the surface of the insulator from gathering to form a water film on rainy days during subsequent use, and at the same time realize automatic cleaning of dust that settles on the surface again, thereby improving the current problems of difficulty and low efficiency in manual removal of dust on the surface of the insulator, and ensuring the insulation performance of the insulator.

[0006] An embodiment of the present application provides a method for self-cleaning the surface of a high-voltage transmission tower insulator, the method comprising:

[0007] Obtaining an insulator to be used with no dirt on the surface, and placing the insulator on an XY two-dimensional moving platform of a laser processing system;

[0008] Using the laser processing system, scanning the insulator is performed to obtain an insulator having a micro-nano surface with a special spacing formed on a non-flat surface;

[0009] The insulator with the micro-nano surface having a special spacing is placed in a preset solution and immersed for a preset time, and then taken out, left to stand, and dried to obtain a self-cleaning insulator with a super-hydrophobic surface having an average contact angle greater than a preset angle.

[0010] Optionally, the method further comprises: obtaining an insulator to be used with no dirt on the surface and placing the insulator in front of an XY two-dimensional moving platform of a laser processing system;

[0011] The surface of the insulator is cleaned by using an ultrasonic cleaner and anhydrous ethanol deionized water until the surface of the insulator is free of dirt, so as to obtain the insulator to be processed.

[0012] Optionally, the ultrasonic frequency of the ultrasonic cleaner is 40 Hz; and the insulator is made of ceramic material.

[0013] Optionally, the central wavelength of the laser processing system is 800nm-1030nm, the pulse width is 30fs-290fs, the laser repetition frequency is 1KHz-25KHz, and an optical path system that produces a long focal depth is built.

[0014] Optionally, the laser processing system is used to perform scanning processing on the insulator to obtain an insulator having a micro-nano surface with a special spacing formed on a non-flat surface, comprising:

[0015] The processing parameters of the laser processing system are adjusted, and a long focal depth beam is used to perform scanning processing on the insulator to be used, so as to form a micro-nano surface with a special spacing on the non-planar surface of the insulator.

[0016] Optionally, the processing parameters of the laser processing system include a femtosecond laser with a laser power of 500mw-3w, a laser wavelength of 800-1030nm, a laser focus spot diameter of 20μm, a laser repetition frequency of 25KHz, a laser scanning speed of 5-50mm / s, a scanning spacing in the X direction of 0-100μm, and a scanning spacing in the Y direction of 0-100μm.

[0017] Optionally, the scanning process of the insulator to be used by using a long focal depth beam includes:

[0018] By using a galvanometer system to regulate the beam, the program is used to control and set the on and off of the laser and the scanning trajectory and processing speed of the galvanometer system;

[0019] The insulator having a micro-nano surface with a special pitch includes an insulator having a grid-type micro-nano surface.

[0020] Optionally, the preset solution includes NC319 solution, and the NC319 solution is prepared from nano-silicon dioxide and anhydrous ethanol.

[0021] Optionally, the preset duration includes 5-10 minutes.

[0022] Optionally, the preset angle is not less than 150 degrees.

[0023] Compared with the prior art, the present invention first obtains an insulator to be used with no dirt on the surface, and places the insulator on the XY two-dimensional mobile platform of the laser processing system; uses the laser processing system to perform scanning processing on the insulator to obtain an insulator with a micro-nano surface with a special spacing formed on a non-flat surface; the insulator with a micro-nano surface with a special spacing is placed in a preset solution and soaked for a preset time, and then taken out and left to stand and dry to obtain a self-cleaning insulator with a super-hydrophobic surface with an average contact angle greater than a preset angle. The insulator treated by the method of the present invention can effectively prevent water droplets on the surface of the insulator from gathering to form a water film on rainy days and realize automatic cleaning of dust that settles on the surface again in subsequent use, improving the current problems of difficulty and low efficiency in manual removal of dust on the surface of the insulator, and ensuring the insulation performance of the insulator. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] Figure 1 A schematic diagram of the contact angle of an insulator whose surface is covered with dust and the contact angle of the surface after the surface is cleaned, provided as the background technology of the present invention;

[0025] Figure 2 It is a schematic diagram of the water film formed by the raindrops on the surface of the insulator and its movement state on the surface before the high-voltage transmission tower is covered with dust and has no self-cleaning dust removal effect before the present invention is implemented;

[0026] Figure 3 A schematic flow chart of a method for self-cleaning the surface of an insulator of a high-voltage transmission tower provided by an embodiment of the present invention;

[0027] Figure 4 A schematic diagram of a micro-nano structure processed by laser and a corresponding average contact angle microscopic image provided by an embodiment of the present invention;

[0028] Figure 5 A schematic diagram of the size of the contact angle and error bars of the surface of an insulator after modification with different processing parameters provided by an embodiment of the present invention;

[0029] Figure 6 A schematic diagram of the self-cleaning and dust removal effect of a modified insulator surface provided in an embodiment of the present invention. DETAILED DESCRIPTION

[0030] The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present invention, but should not be construed as limiting the present invention.

[0031] Industrial dust and dirt accumulated on the surface of the insulator form a conductive film in a high humidity environment. In addition, the hydrophilicity of the insulator surface causes water droplets to gather and form a water film, which will reduce the insulation performance of the insulator and cause discharge. Figure 2 , Figure 2 When there is dust on the surface and the insulator is not treated, raindrops gather on the surface of the insulator and gradually form a water film, and the dust cannot be removed. Currently, dust removal on the surface of the insulator mainly relies on manual cleaning, but this method is inefficient and may damage the insulating material. Although coating with insulating anti-fouling coating can reduce dust adhesion, improper operation and environmental requirements will affect the insulation effect of the insulator. Therefore, the present application uses a self-cleaning method for the surface of high-voltage transmission tower insulators to effectively remove dust from the surface of the insulator to prevent flashover, and at the same time prevent the influence of water droplets gathered on rainy days on the insulation performance of the insulator. See Figure 3 , Figure 3 A schematic flow chart of a method for self-cleaning the surface of an insulator of a high-voltage transmission tower provided in an embodiment of the present invention may include the following steps:

[0032] S301: Obtain an insulator to be used with no dirt on the surface, and place the insulator on an XY two-dimensional moving platform of a laser processing system.

[0033] Fix the insulator to be processed on the XY two-dimensional moving platform in the laser processing system, adjust the surface of the insulator sample to a suitable processing position and focal length range, and wait for processing.

[0034] It should be noted that the insulator is fixed on the XY two-dimensional mobile platform, and the position is adjusted using the XY two-dimensional mobile platform so that it is located within the laser processing area. Since a long-focus deep beam is used for subsequent scanning processing, there is no need to adjust the Z-axis direction, which greatly improves the processing efficiency.

[0035] Specifically, the method of obtaining an insulator to be used with no dirt on the surface and placing the insulator in front of an XY two-dimensional moving platform of a laser processing system may further include:

[0036] The surface of the insulator is cleaned by using an ultrasonic cleaner and deionized water with anhydrous ethanol, and after the dirt on the surface of the insulator is removed, an insulator with no dirt on the surface is obtained.

[0037] It should be noted that the ultrasonic frequency of the ultrasonic cleaner is 40 Hz; the insulator is made of ceramic material.

[0038] For example, before processing the insulator, the surface of the insulator can be ultrasonically cleaned in anhydrous ethanol to remove surface dirt and then dried; further, the drying can be left in a ventilated place to dry naturally.

[0039] S302: Using the laser processing system, perform scanning processing on the insulator to obtain an insulator having a micro-nano surface with a special spacing formed on a non-flat surface.

[0040] Specifically, the central wavelength of the laser processing system is 800nm-1030nm, the pulse width is 30fs-290fs, the laser repetition frequency is 1KHz-25KHz, and an optical path system for generating a long focal depth light beam is constructed.

[0041] The step of using the laser processing system to perform scanning processing on the insulator to obtain an insulator having a micro-nano surface with a special spacing formed on a non-flat surface may include:

[0042] The processing parameters of the laser processing system are adjusted, and a long focal depth beam is used to perform scanning processing on the insulator to be used, so as to form a micro-nano surface with a special spacing on the non-flat surface of the insulator.

[0043] Among them, the processing parameters of the laser processing system may include a femtosecond laser with a laser power of 500mw-3w, a laser wavelength of 800-1030nm, a laser focus spot diameter of 20μm, a laser repetition frequency of 25KHz, a laser scanning speed of 5-50mm / s, an X-direction scanning spacing of 0-100μm, and a Y-direction scanning spacing of 0-100μm.

[0044] The scanning process of the insulator to be processed by using a long focal depth beam may include:

[0045] By using a galvanometer system to regulate the beam, the program is used to control and set the on and off of the laser and the scanning trajectory and processing speed of the galvanometer system;

[0046] The insulator having a micro-nano surface with a special pitch includes an insulator having a grid-type micro-nano surface.

[0047] In an optional embodiment, laser scanning processing is performed using a long focal depth beam, which can maintain the characteristics and shape of the beam over a longer distance, forming a micro-nano surface with different structural spacing on the non-flat surface of the insulator, reducing the height adjustment during the processing, and simplifying the processing operation process.

[0048] Alternatively, a laser with a central wavelength of 1030nm, a pulse width of 290fs, and a laser repetition frequency of 25KHz is used for scanning processing. After the laser passes through the galvanometer system, the laser spot diameter is about 20μm. Then the average laser processing power is adjusted to 1.5W through the attenuation plate, the laser scanning speed is set to 15mm / s, and the program is used to control the on and off of the laser and the scanning trajectory of the galvanometer system; the scanning spacing in the X and Y directions can be set to 30μm, and the insulator surface with high roughness can be processed. See Figure 4 , Figure 4 Schematic diagrams of microscopic images of laser-processed micro-nano structures and corresponding average contact angles provided in embodiments of the present invention, wherein (a) represents the surface microstructure of an insulator that has not been laser processed and only undergone low surface energy modification and the corresponding contact angle; (b)-(e) are schematic diagrams of the surface microstructure of an insulator that has been low surface energy modified and the corresponding contact angles when the laser scanning intervals are set to 30μm, 50μm, 70μm, and 90μm, respectively.

[0049] It should be noted that, in order to demonstrate the effect of the present invention, the contact angle of the surface that was not laser processed but only modified with low surface energy was also measured, such as Figure 4 As shown in (a), the average contact angle is 113.5°, which is a normal hydrophobic surface. To verify the effect of processing micro-nanostructure on hydrophobicity, Figure 4(c)-(e) show the contact angle measurement results under different processing structure parameters (the laser scanning spacing of the comparison group was set to 50μm, 70μm, and 90μm, respectively), see Figure 5 , Figure 5 A schematic diagram of the contact angle and corresponding error bars of the insulator surface after modification with different processing parameters provided by an embodiment of the present invention, such as Figure 5 As shown, the results show that with the increase of spacing, the hydrophobicity of the insulator surface decreases.

[0050] S303: placing the insulator having the micro-nano surface with a special spacing in a preset solution and soaking it for a preset time, taking it out and letting it stand and drying it, so as to obtain a self-cleaning insulator with a super-hydrophobic surface whose average contact angle is greater than a preset angle.

[0051] Specifically, the preset solution includes NC319 solution, and the NC319 solution is prepared from nano-silicon dioxide and anhydrous ethanol; the preset time includes 5-10 minutes; and the preset angle is not less than 150 degrees.

[0052] The insulator with a micro-nano surface having a special spacing obtained in step S302 is immersed in the NC319 solution for 5-10 minutes to perform low surface energy modification on the insulator, and then taken out and placed in a fume hood at 20°C-25°C for 1-2 hours to dry its surface, thereby forming a super-hydrophobic surface with an average contact angle greater than 150 degrees on the surface of the insulator.

[0053] It should be noted that the NC319 solution used to immerse the insulators needs to be dispersed by ultrasound for 20 minutes before immersion. The characterization of superhydrophobic surfaces can be measured by the contact angle of water droplets. Generally, it is defined that the average contact angle is less than 90 degrees for hydrophilic surfaces, the average contact angle is greater than 90 degrees for hydrophobic surfaces, and the average contact angle is greater than 150 degrees for superhydrophobic surfaces. The surface contact angle can be measured using a contact angle meter, and multiple measurements can be performed to obtain the average contact angle.

[0054] Figure 4 (b) shows the contact angle measurement results of the modified surface. As shown in 4(b), the water droplet has a very large contact angle with the surface, producing the same phenomenon as the lotus leaf surface. On rainy days, raindrops will roll off quickly on the super-hydrophobic surface of the insulator. At the same time, the adhesion of the water droplet will take away the dust on the surface, achieving the effect of self-cleaning and dust removal.

[0055] See also Figure 6 , Figure 6A schematic diagram of the self-cleaning and dust removal effect of a modified insulator surface provided in an embodiment of the present invention, (a)-(f) respectively show the process of water droplets rolling on the surface and taking away dust. It can be clearly seen that the surface dust is taken away by the rolling water droplets, and the trajectory of the water droplets after rolling is a dust-free surface, thereby achieving the surface self-cleaning and dust removal effect.

[0056] The present application uses laser processing technology to scan and process the surface of the insulator, and produces a super-hydrophobic surface by processing a micro-nano structure with a special surface and low surface energy modification. The surface of the insulator treated by the present invention makes the water droplets have a larger contact angle, which makes it very easy for the water droplets to roll off the surface of the insulator. By utilizing the adhesion between the water droplets and the dust particles, the moving water droplets can also drive the dust particles to roll, causing the dust to be taken away from the surface of the insulator by the water droplets, achieving the effect of self-cleaning of the surface dust. In addition, when there is no dust on the surface, the super-hydrophobic property of the surface after laser modification enables the water droplets to roll off quickly, and avoids the phenomenon of water droplets gathering on the surface. The insulator treated by the method of the present invention can effectively prevent the water droplets on the surface of the insulator from gathering to form a water film on rainy days in subsequent use, and realize the automatic cleaning of the dust that settles on the surface again, which improves the current problems of difficulty and low efficiency in manual removal of dust on the surface of the insulator, and ensures the insulation performance of the insulator.

[0057] Compared with the prior art, the present invention obtains an insulator to be used with no dirt on the surface, and places the insulator on the XY two-dimensional mobile platform of the laser processing system; uses the laser processing system to perform scanning processing on the insulator to obtain an insulator with a micro-nano surface with a special spacing formed on a non-flat surface; the insulator with a micro-nano surface with a special spacing is placed in a preset solution and soaked for a preset time, and then taken out and left to stand and dry to obtain a clean insulator with a super-hydrophobic surface with an average contact angle greater than a preset angle. It can effectively solve the problems of water droplets gathering on the hydrophilic surface of the insulator to form a water film on rainy days and the difficulty and low efficiency of manual removal of surface dust, so as to ensure the insulation performance of the insulator.

[0058] It should be noted that, for the above-mentioned method embodiments, for the sake of simplicity, they are all described as a series of action combinations, but those skilled in the art should know that the present invention is not limited by the described action sequence, because according to the present invention, certain steps can be performed in other sequences or simultaneously. Secondly, those skilled in the art should also know that the embodiments described in the specification are all preferred embodiments, and the actions and modules involved are not necessarily required by the present invention.

[0059] In the above embodiments, the description of each embodiment has its own emphasis. For parts that are not described in detail in a certain embodiment, reference can be made to the relevant descriptions of other embodiments.

[0060] In the several embodiments provided by the present invention, it should be understood that the disclosed devices can be implemented in other ways. For example, the device embodiments described above are only schematic, such as the division of the above units, which is only a logical function division. There may be other division methods in actual implementation, such as multiple units or components can be combined or integrated into another system, or some features can be ignored or not executed. Another point is that the mutual coupling or direct coupling or communication connection shown or discussed can be through some interfaces, and the indirect coupling or communication connection of devices or units can be electrical or other forms.

[0061] The units described above as separate components may or may not be physically separated, and the components shown as units may or may not be physical units, that is, they may be located in one place or distributed on multiple network units. Some or all of the units may be selected according to actual needs to achieve the purpose of the solution of this embodiment.

[0062] In addition, each functional unit in each embodiment of the present invention may be integrated into one processing unit, or each unit may exist physically separately, or two or more units may be integrated into one unit. The above-mentioned integrated unit may be implemented in the form of hardware or in the form of software functional units.

[0063] If the above-mentioned integrated unit is implemented in the form of a software functional unit and sold or used as an independent product, it can be stored in a computer-readable memory. Based on this understanding, the technical solution of the present invention, in essence, or the part that contributes to the prior art, or all or part of the technical solution can be embodied in the form of a software product, and the computer software product is stored in a memory, including a number of instructions for a computer device (which can be a personal computer, a server or a network device, etc.) to perform all or part of the steps of the above-mentioned methods of each embodiment of the present invention. The aforementioned memory includes: U disk, read-only memory (ROM, Read-Only Memory), random access memory (RAM, Random Access Memory), mobile hard disk, magnetic disk or optical disk and other media that can store program codes.

[0064] The embodiments of the present invention are described in detail above. Specific examples are used herein to illustrate the principles and implementation methods of the present invention. The description of the above embodiments is only used to help understand the method of the present invention and its core idea. At the same time, for those skilled in the art, according to the idea of ​​the present invention, there will be changes in the specific implementation methods and application scope. In summary, the content of this specification should not be understood as limiting the present invention.

Claims

1. A method for self-cleaning the surface of a high-voltage transmission tower insulator, characterized in that: The method comprises: Obtaining an insulator to be used with no dirt on the surface, and placing the insulator on an XY two-dimensional moving platform of a laser processing system; Using the laser processing system, scanning the insulator is performed to obtain an insulator having a micro-nano surface with a special spacing formed on a non-flat surface; The insulator with the micro-nano surface having a special spacing is placed in a preset solution and immersed for a preset time, and then taken out, left to stand, and dried to obtain a self-cleaning insulator with a super-hydrophobic surface having an average contact angle greater than a preset angle.

2. The method according to claim 1, characterized in that The method further comprises: obtaining an insulator to be used with no dirt on the surface, and placing the insulator in front of an XY two-dimensional moving platform of a laser processing system; The surface of the insulator is cleaned by using an ultrasonic cleaner and anhydrous ethanol deionized water until the surface of the insulator is free of dirt, so as to obtain the insulator to be processed.

3. The method according to claim 2, characterized in that The ultrasonic frequency of the ultrasonic cleaner is 40 Hz; the insulator is made of ceramic material.

4. The method according to claim 3, characterized in that The central wavelength of the laser processing system is 800nm-1030nm, the pulse width is 30fs-290fs, the laser repetition frequency is 1KHz-25KHz, and an optical path system that produces a long focal depth is built.

5. The method according to claim 4, characterized in that The method of using the laser processing system to perform scanning processing on the insulator to obtain an insulator having a micro-nano surface with a special spacing formed on a non-flat surface comprises: The processing parameters of the laser processing system are adjusted, and a long focal depth beam is used to perform scanning processing on the insulator to be used, so as to form a micro-nano surface with a special spacing on the non-planar surface of the insulator.

6. The method according to claim 5, characterized in that The processing parameters of the laser processing system include a femtosecond laser with a laser power of 500mw-3w, a laser wavelength of 800-1030nm, a laser focus spot diameter of 20μm, a laser repetition frequency of 25KHz, a laser scanning speed of 5-50mm / s, a scanning spacing in the X direction of 0-100μm, and a scanning spacing in the Y direction of 0-100μm.

7. The method according to claim 5, characterized in that The method of performing scanning processing on the insulator to be used by using a long focal depth beam comprises: By using a galvanometer system to regulate the beam, the program is used to control and set the on and off of the laser and the scanning trajectory and processing speed of the galvanometer system; The insulator having a micro-nano surface with a special pitch includes an insulator having a grid-type micro-nano surface.

8. The method according to any one of claims 1 to 7, characterized in that: The preset solution includes NC319 solution, and the NC319 solution is prepared from nano silicon dioxide and anhydrous ethanol.

9. The method according to claim 8, characterized in that The preset duration includes 5-10 minutes.

10. The method according to claim 9, characterized in that The preset angle is not less than 150 degrees.

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