Wafer box cleaning and drying device

Abstract

The invention relates to the technical field of cleaning and drying devices, and discloses a wafer box cleaning and drying device which comprises a front box, a bottom frame is fixedly connected to the inner wall of the front box, a plurality of mounting frames are fixedly connected to the top of the bottom frame, drying mechanisms are slidably connected to the interiors of the mounting frames, and a supporting plate is fixedly connected to one side of the bottom frame. And one side of the supporting plate is fixedly connected with a cover plate centrifugal cleaning mechanism, and one side of the cover plate centrifugal cleaning mechanism is fixedly connected with a top plate. According to the wafer box cleaning and drying device, through the arrangement of the box cover splitting mechanism, the cover plate centrifugal cleaning mechanism, the drying mechanism and the feeding mechanism, the effect of automatically splitting, cleaning and drying the wafer box is achieved, the energy consumption expenditure for cleaning the wafer box is reduced, automatic disassembly and assembly are achieved, the labor cost is reduced, and the working efficiency is improved. Safety and efficiency in the wafer box conveying process are ensured, and the automation degree and the cleaning efficiency of the wafer box cleaning and drying device are further improved.

Description

Technical Field

[0001] The present invention relates to the technical field of cleaning and drying devices, and in particular to a wafer box cleaning and drying device. Background Art

[0002] The wafer box consists of a cover and a body. The wafers are stored inside the wafer box to protect them from dust and other pollutants. In order to ensure the purity and performance of the wafers, we must regularly clean the wafer box and cover. The existing wafer box cleaning and drying devices often have poor cleaning effects in actual use, making it difficult to completely remove dirt, and lack convenient drying functions after cleaning. This not only affects the cleaning efficiency, but may also have adverse effects on the quality of the wafers.

[0003] After searching the existing patents: a wafer box cleaning machine with a drying device (publication number: CN218692358U), including a shell, the inner wall of the shell is fixedly provided with a dryer, a wafer box cleaning machine with a drying device has the following beneficial effects: the wafer box that needs to be dried can be dried by the dryer, and the wafer box can be moved and rotated during the drying process through the rotation of the motor, so as to achieve all-round drying, and the bottom can also be dried through the structure with wire mesh, which can improve the drying efficiency of the cleaned wafer box, the drying speed is fast, and the dust entering the wafer box after drying is reduced, and the appearance of the wafer box is improved through machine drying. The cleanliness of the wafer box is improved when packaging the wafer, and the high cleanliness of the wafer box will naturally not affect the cleanliness of the wafer.

[0004] Although the above patent improves the drying efficiency of the wafer box after cleaning, the drying speed is fast, the dust entering the wafer box after drying is reduced, and the appearance cleanliness of the wafer box is improved through machine drying when packaging wafers, it is not convenient to automatically split, clean and dry a large number of wafer boxes, and it is difficult to improve the cleaning efficiency and the degree of automation.

[0005] Therefore, it is necessary to invent a wafer box cleaning and drying device to solve the above problems. Summary of the invention

[0006] 1. Technical issues to be resolved

[0007] The technical problem solved by the invention is to provide a wafer box cleaning and drying device which is highly practical, can be simply operated and has a relatively simple structure, thereby solving the problem in the above-mentioned background technology that it is inconvenient to automatically split, clean and dry a large number of wafer boxes, and it is difficult to improve the cleaning efficiency and the degree of automation.

[0008] (II) Technical solution

[0009] To achieve the above objectives, the present invention is implemented through the following technical solutions: a wafer box cleaning and drying device, comprising a front box, the inner wall of the front box is fixedly connected to a bottom frame, the top of the bottom frame is fixedly connected to a plurality of mounting frames, the interior of the mounting frame is slidably connected to a drying mechanism, one side of the bottom frame is fixedly connected to a support plate, one side of the support plate is fixedly connected to a cover plate centrifugal cleaning mechanism, one side of the cover plate centrifugal cleaning mechanism is fixedly connected to a top plate, one side of the top plate is provided with a box cover splitting mechanism, one side of the top plate is fixedly connected to a connecting plate, one side of the connecting plate is fixedly installed with a feeding mechanism, the drying mechanism comprises two groups of driving frames slidably connected to the inside of the mounting frame, one side of the driving frame is fixedly installed with an isolation cover, the other sides of the two groups of driving frames are fixedly connected with push rod motors, one side of the isolation cover is clamped with a chassis, the top of the isolation cover is through-connected with a small vacuum pump, the chassis The cleaning mechanism of the utility model discloses cleaning the cleaning agent, and the cleaning agent is provided with the cleaning agent to clean the cleaning agent.

[0010] As a further solution of the present invention, connecting pieces are fixedly connected to both sides of the top of the front box, and a rear box is fixedly installed on one side of the connecting piece.

[0011] As a further solution of the present invention, a plurality of sets of fixing plates are fixedly connected to one side of the rear box, a roller is fixedly connected to the bottom of the fixing plate, and a support seat is fixedly connected to one side of the fixing plate.

[0012] As a further solution of the present invention, a conveying pipe is connected through the surface of the isolation cover, and telescopic cylinders are fixedly connected to both sides of the positioning frame.

[0013] As a further solution of the present invention, a slide rail is fixedly connected to one side of the base frame, and a mechanical arm is slidably connected to the surface of the slide rail.

[0014] As a further solution of the present invention, one end of the mechanical arm is rotatably connected to a fixed frame, and a driving belt is provided on the top of the slide rail.

[0015] As a further solution of the present invention, a plurality of groups of lifting rings are fixedly connected to one side of the front box, and a plurality of groups of ventilation holes are arranged on the other side of the front box.

[0016] (III) Beneficial effects

[0017] The present invention provides a wafer box cleaning and drying device, which has the following beneficial effects:

[0018] 1. The wafer box cleaning and drying device is provided with a box cover splitting mechanism, a cover plate centrifugal cleaning mechanism, a drying mechanism and a feeding mechanism. When in use, the cylinder provided inside the box body is used to drive the locking buckle on the clamping plate to be installed inside the wafer box, and the box cover is adsorbed by the suction cup, and the wafer box is quickly removed, and then the box cover is transported to the cleaning tank inside the cover plate centrifugal cleaning mechanism, and is clamped and fixed by the positioning fixture on the cleaning tank. Nozzles are arranged on the inner sides of the cleaning tank and the sealing cover, which will spray water upward and downward respectively to ensure that the cleaning liquid can evenly cover every corner of the wafer box cover, and the internal rotating motor is used to drive the cleaning tank to rotate to generate centrifugal force, so that the water is thrown out and heated and dried by the internal heating rod, and then the wafer box is moved to one side of the feeding mechanism by the robotic arm, and the positioning column on the feeding table matches the positioning groove at the bottom of the wafer box to accurately position. And support, start the driving mechanism inside the base, drive the loading table to slide on the base, and transport it to the drying mechanism, place the wafer box on the placement plate inside the drying box, use the push rod motor to drive the driving frame to move, close to the chassis, and use a small vacuum pump to extract the air in the isolation cover and the drying box, so that a vacuum environment is formed in the isolation cover and the drying box, and the heating rods in the drying box are powered on to generate heat. In a vacuum state, due to the extremely small number of gas molecules, the effects of heat conduction and convection heat transfer are significantly reduced. This environment is conducive to the rapid drying and dehumidification of the wafer box, thereby achieving the effect of automatically splitting, cleaning and drying the wafer box, reducing the energy consumption expenditure for cleaning the wafer box, automating the disassembly and assembly, reducing labor costs, ensuring the safety and efficiency of the wafer box transmission process, and further improving the automation level and cleaning efficiency of the wafer box cleaning and drying device. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] Figure 1 It is a schematic diagram of the overall structure of the present invention;

[0020] Figure 2 It is a schematic diagram of the split structure of the present invention;

[0021] Figure 3 This is a schematic diagram of the opening structure of the front box and the rear box of the present invention;

[0022] Figure 4 This is a schematic diagram of the overall internal structure of the rear box of the present invention;

[0023] Figure 5 This is a schematic diagram of the front structure of the front box of the present invention;

[0024] Figure 6 This is a schematic diagram of the back structure of the front box of the present invention;

[0025] Figure 7 This is a schematic diagram of the structure of the mechanical arm of the present invention;

[0026] Figure 8 This is a schematic diagram of the piping structure inside the front box of the present invention.

[0027] In the figure: 1, front box; 2, bottom frame; 3, mounting frame; 4, drying mechanism; 401, driving frame; 402, isolation cover; 403, chassis; 404, small vacuum pump; 405, push rod motor; 5, support plate; 6, cover plate centrifugal cleaning mechanism; 601, positioning frame; 602, moving frame; 603, cleaning tank; 604, rotating motor; 605, sealing cover; 606, water inlet pipe; 7, top plate; 8, box cover splitting mechanism; 801, connecting frame ;802, box body; 803, cover plate; 804, clamping plate; 9, connecting plate; 10, feeding mechanism; 1001, base; 1002, feeding table; 1003, mounting plate; 1004, mounting bracket; 11, connecting plate; 12, rear box; 13, fixing plate; 14, roller; 15, supporting seat; 16, conveying pipe; 17, telescopic cylinder; 18, slide rail; 19, mechanical arm; 20, fixing frame; 21, driving belt; 22, lifting ring. DETAILED DESCRIPTION

[0028] The technical solutions in the embodiments of the present invention will be described clearly and completely below in conjunction with the accompanying drawings in the embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0029] See also Figures 1 to 8The present invention provides a technical solution: a wafer box cleaning and drying device, a wafer box cleaning and drying device, comprising a front box 1, the inner wall of the front box 1 is fixedly connected with a bottom frame 2, the top of the bottom frame 2 is fixedly connected with a plurality of mounting frames 3, the interior of the mounting frames 3 is slidably connected with a drying mechanism 4, through the arrangement of a box cover splitting mechanism 8, a cover plate centrifugal cleaning mechanism 6, a drying mechanism 4 and a feeding mechanism 10, the effect of automatically splitting, cleaning and drying the wafer box is achieved, the energy consumption expenditure for cleaning the wafer box is reduced, the automatic disassembly and assembly reduces the labor cost, ensures the safety and efficiency of the wafer box transmission process, and further improves the wafer The automation degree and cleaning efficiency of the box cleaning and drying device are as follows: a support plate 5 is fixedly connected to one side of the bottom frame 2, a cover plate centrifugal cleaning mechanism 6 is fixedly connected to one side of the support plate 5, a top plate 7 is fixedly connected to one side of the cover plate centrifugal cleaning mechanism 6, a box cover splitting mechanism 8 is arranged on one side of the top plate 7, a connecting plate 9 is fixedly connected to one side of the drying mechanism 4, a feeding mechanism 10 is fixedly installed on one side of the connecting plate 9, the drying mechanism 4 includes two sets of driving frames 401 slidably connected to the inside of the mounting frame 3, an isolation cover 402 is fixedly installed on one side of the driving frame 401, and a push rod motor 405 is fixedly connected to the other side of the two sets of driving frames 401. A chassis 403 is clamped on one side of the cover 402, a small vacuum pump 404 is connected to the top of the isolation cover 402, and a drying box is provided on one side of the chassis 403; the cover plate centrifugal cleaning mechanism 6 includes a positioning frame 601 fixedly connected to one side of the support plate 5, two groups of mobile frames 602 are slidably connected to the inner side of the positioning frame 601, a cleaning tank 603 is fixedly installed on one side of the mobile frame 602, a positioning fixture is provided on one side of the cleaning tank 603, a rotating motor 604 is fixedly connected to the center of one side of the cleaning tank 603, a sealing cover 605 is fixedly connected to one side of the positioning frame 601, and the surfaces of the cleaning tank 603 and the sealing cover 605 are all penetrated It is connected with a water inlet pipe 606; the box cover splitting mechanism 8 includes a connecting frame 801 arranged on one side of the top plate 7, one side of the connecting frame 801 is fixedly connected with a box body 802, the surface of the box body 802 is fixedly connected with a clamping plate 804, the other side of the connecting frame 801 is fixedly connected with a cover removal plate 803, and the surface of the cover removal plate 803 is provided with four groups of suction cups; the feeding mechanism 10 includes a base 1001 fixedly installed on one side of the connecting plate 9, the surface of the base 1001 is slidably connected with a feeding platform 1002, both sides of the base 1001 are fixedly connected with mounting plates 1003, and the surface of the base 1001 is fixedly connected with mounting brackets 1004.

[0030] Both sides of the top of the front box 1 are fixedly connected with connecting pieces 11, and one side of the connecting piece 11 is fixedly installed with a rear box 12. Through the setting of the rear box 12, the drying mechanism 4 and the feeding mechanism 10 are placed.

[0031] A plurality of sets of fixing plates 13 are fixedly connected to one side of the rear box 12, a roller 14 is fixedly connected to the bottom of the fixing plate 13, and a support seat 15 is fixedly connected to one side of the fixing plate 13. The setting of the support seat 15 supports the rear box 12.

[0032] The surface of the isolation cover 402 is connected with a conveying pipe 16 , and both sides of the positioning frame 601 are fixedly connected with telescopic cylinders 17 . The setting of the telescopic cylinders 17 plays a role in pushing the moving frame 602 .

[0033] A slide rail 18 is fixedly connected to one side of the base frame 2, and a mechanical arm 19 is slidably connected to the surface of the slide rail 18. The mechanical arm 19 is provided to transport the wafer box.

[0034] One end of the mechanical arm 19 is rotatably connected to a fixing frame 20 , and a driving belt 21 is disposed on the top of the slide rail 18 . The driving belt 21 is disposed to drive the mechanical arm 19 to move.

[0035] One side of the front box 1 is fixedly connected with a plurality of hanging rings 22 , and the other side of the front box 1 is provided with a plurality of vents. The vents facilitate the air circulation inside the front box 1 and the rear box 12 .

[0036] In the present invention, the working steps of the device are as follows:

[0037] Step 1: When in use, the cylinder provided inside the box body 802 is used to drive the locking buckle on the clamping plate 804 to be installed inside the wafer box, and the suction cup is used to absorb the box cover, so as to quickly remove the cover of the wafer box, and then the box cover is transported to the cleaning tank 603 inside the cover plate centrifugal cleaning mechanism 6, and is clamped and fixed by the positioning fixture on the cleaning tank 603. The cleaning tank 603 and the sealing cover 605 are both provided with nozzles on the inner side, which will spray water upward and downward respectively to ensure that the cleaning liquid can evenly cover every corner of the wafer box cover, and the internal rotating motor 604 is used to drive the cleaning tank 603 to rotate to generate centrifugal force, so as to throw out the water and heat and dry it through the internal heating rod;

[0038] Step 2: Then, the robotic arm 19 is used to move the wafer box to one side of the loading mechanism 10, and the positioning column on the loading platform 1002 matches the positioning groove at the bottom of the wafer box, accurately positioning and supporting it, and the driving mechanism inside the base 1001 is started to drive the loading platform 1002 to slide on the base 1001;

[0039] The third step: transport it to the drying mechanism 4, place the wafer box on the placement plate inside the drying box, use the push rod motor 405 to drive the drive frame 401 to move close to the chassis 403, and use the small vacuum pump 404 to extract the air in the isolation cover 402 and the drying box, so that a vacuum environment is formed in the isolation cover 402 and the drying box, and the heating rod in the drying box is powered on to generate heat. In the vacuum state, due to the extremely small number of gas molecules, the effects of heat conduction and convection heat transfer are significantly reduced. This environment is conducive to the rapid drying and dehumidification of the wafer box.

[0040] It should be noted that the device structure and the drawings of the present invention mainly describe the principle of the present invention. In terms of the technology of the design principle, the settings of the power mechanism, power supply system and control system of the device are not fully described. On the premise that the technical personnel in this field understand the principle of the above invention, the details of the power mechanism, power supply system and control system can be clearly known. The control method of the application document is automatic control through a controller, and the control circuit of the controller can be realized by simple programming by the technical personnel in this field.

[0041] The standard parts used therein can all be purchased from the market and can be customized according to the instructions and drawings. The specific connection methods of each part adopt conventional means such as mature bolts, rivets, welding, etc. in the prior art. The machinery, parts and equipment all adopt conventional models in the prior art, and the structures and principles of the components known to technical personnel in this field can be known by these technical personnel through technical manuals or through conventional experimental methods.

[0042] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A wafer box cleaning and drying device, comprising a front box (1), characterized in that: The inner wall of the front box (1) is fixedly connected to a base frame (2), the top of the base frame (2) is fixedly connected to a plurality of mounting frames (3), the interior of the mounting frames (3) is slidably connected to a drying mechanism (4), one side of the base frame (2) is fixedly connected to a support plate (5), one side of the support plate (5) is fixedly connected to a cover plate centrifugal cleaning mechanism (6), one side of the cover plate centrifugal cleaning mechanism (6) is fixedly connected to a top plate (7), one side of the top plate (7) is provided with a box cover splitting mechanism (8), one side of the drying mechanism (4) is fixedly connected to a connecting plate (9), one side of the connecting plate (9) is fixedly installed with a feeding mechanism (10), The drying mechanism (4) comprises two groups of driving frames (401) slidably connected to the inside of the mounting frame (3); an isolation cover (402) is fixedly installed on one side of the driving frame (401); a push rod motor (405) is fixedly connected to the other side of the two groups of driving frames (401); a chassis (403) is clamped on one side of the isolation cover (402); a small vacuum pump (404) is connected to the top of the isolation cover (402); and a drying box is arranged on one side of the chassis (403); The cover plate centrifugal cleaning mechanism (6) comprises a positioning frame (601) fixedly connected to one side of the support plate (5); two groups of movable frames (602) are slidably connected to the inner side of the positioning frame (601); a cleaning tank (603) is fixedly installed on one side of the movable frame (602); a positioning fixture is provided on one side of the cleaning tank (603); a rotating motor (604) is fixedly connected to the center of one side of the cleaning tank (603); a sealing cover (605) is fixedly connected to one side of the positioning frame (601); and a water inlet pipe (606) is connected through the surfaces of the cleaning tank (603) and the sealing cover (605); The box cover disassembly mechanism (8) comprises a connecting frame (801) arranged on one side of the top plate (7); a box body (802) is fixedly connected to one side of the connecting frame (801); a clamping plate (804) is fixedly connected to the surface of the box body (802); a cover removal plate (803) is fixedly connected to the other side of the connecting frame (801); and four groups of suction cups are arranged on the surface of the cover removal plate (803); The feeding mechanism (10) comprises a base (1001) fixedly mounted on one side of the connecting plate (9); a feeding platform (1002) is slidably connected to the surface of the base (1001); mounting plates (1003) are fixedly connected to both sides of the base (1001); and a mounting bracket (1004) is fixedly connected to the surface of the base (1001).

2. The wafer box cleaning and drying device according to claim 1, characterized in that: Both sides of the top of the front box (1) are fixedly connected with connecting pieces (11), and one side of the connecting piece (11) is fixedly mounted with a rear box (12).

3. The wafer box cleaning and drying device according to claim 2, characterized in that: A plurality of groups of fixing plates (13) are fixedly connected to one side of the rear box (12), a roller (14) is fixedly connected to the bottom of the fixing plate (13), and a support seat (15) is fixedly connected to one side of the fixing plate (13).

4. The wafer box cleaning and drying device according to claim 1, characterized in that: A conveying pipe (16) is connected through the surface of the isolation cover (402), and telescopic cylinders (17) are fixedly connected to both sides of the positioning frame (601).

5. The wafer box cleaning and drying device according to claim 1, characterized in that: A slide rail (18) is fixedly connected to one side of the base frame (2), and a mechanical arm (19) is slidably connected to the surface of the slide rail (18).

6. The wafer box cleaning and drying device according to claim 5, characterized in that: One end of the mechanical arm (19) is rotatably connected to a fixing frame (20), and a driving belt (21) is arranged on the top of the slide rail (18).

7. The wafer box cleaning and drying device according to claim 1, characterized in that: One side of the front box (1) is fixedly connected with a plurality of groups of lifting rings (22), and the other side of the front box (1) is provided with a plurality of groups of ventilation holes.

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