Ion source height and angle adjusting device of plasma cleaning equipment

Abstract

The invention discloses an ion source height and angle adjusting device for plasma cleaning equipment, which is mounted on a cleaning chamber of the plasma cleaning equipment and comprises a mounting flange, two magnetic fluids are respectively mounted at the bottoms of two sides of the mounting flange, a middle shaft is arranged in each magnetic fluid, and the middle shaft is provided with a first rotating shaft and a second rotating shaft. An inner shaft is arranged in each middle shaft, an ejector rod is mounted in each inner shaft through a thread, a sliding block is connected to the top end of each middle shaft through a thread, the sliding block is mounted on the mounting flange in a sliding manner, each ejector rod is in non-fixed connection with a supporting block, and the supporting block is fixedly connected with the end part of the ion source and is in non-fixed connection with the sliding block at the same time. According to the ion source height and angle adjusting device of the plasma cleaning equipment, the height and angle of the ion source can be adjusted under the condition that the ion source does not need to be disassembled and assembled, the operation duration of adjustment is shortened, and the operation complexity degree of adjustment is reduced.

Description

Technical Field

[0001] The invention relates to the field of cleaning equipment, and in particular to a device for adjusting the height and angle of an ion source of a plasma cleaning equipment. Background Art

[0002] The principle of plasma cleaning is to use gas to become plasma under the action of a specific electric field. The "active" components of plasma include active particles such as ions, electrons and free radicals. Under the action of bias, the active particles are accelerated to generate kinetic energy, bombarding the surface of the object to be cleaned, and reacting physically and chemically with surface pollutants, thereby modifying the surface of the object (hydrophilicity) and removing surface pollutants (mainly organic matter), achieving effects that conventional cleaning methods cannot achieve, and enabling process operations such as coating between multiple materials.

[0003] Plasma cleaning equipment is an article cleaning equipment designed and manufactured using the above principle, in which plasma is generated under the action of an ion source such as a radio frequency plasma generator, a microwave plasma generator, etc. Plasma cleaning equipment has excellent effects from research and development to process production and use, from surface micro-machining to surface treatment and modification, and is widely used.

[0004] The ion source of existing plasma cleaning equipment is generally assembled in a fixed position, that is, the height and angle are fixed. When the position needs to be changed, the ion source must be disassembled and reassembled. This is not only cumbersome and time-consuming, but also seriously affects the overall utilization rate of the equipment. There is also the risk of causing personal injury and equipment damage. Summary of the invention

[0005] In order to solve the above problems, the present invention provides an ion source height and angle adjustment device for plasma cleaning equipment, which can adjust the height and angle of the ion source without disassembling the ion source, greatly shortening the adjustment operation time, reducing the tediousness of the adjustment operation, and improving the overall utilization rate of the plasma cleaning equipment. Compared with the operation method of disassembling the ion source to adjust the height and angle, it greatly reduces the risk of personal injury and equipment damage.

[0006] According to one aspect of the present invention, there is provided a device for adjusting the height and angle of an ion source of a plasma cleaning device, which is installed on a cleaning chamber of the plasma cleaning device, wherein an ion source is arranged inside the cleaning chamber, and comprises a mounting flange, wherein the mounting flange is mounted on the bottom of the cleaning chamber, and two magnetic fluids are respectively mounted on the bottoms of both sides of the mounting flange;

[0007] A vertical central axis is disposed inside each of the magnetic fluids, a vertical inner axis is disposed inside each of the central axes, and a vertical top rod is installed inside each of the inner axes through threads;

[0008] The top thread of each of the central shafts is connected to a slider, and the slider is slidably mounted on the mounting flange, and a first hand wheel is connected to the bottom end of the central shaft;

[0009] Each of the push rods is non-fixedly connected to a support block, and the bottom end of the inner shaft is connected to a second hand wheel;

[0010] Wherein, the support block is fixedly connected to the end of the ion source, and the support block is non-fixedly connected to the slider.

[0011] In some embodiments, all structures above the mounting flange are contained within the cleaning chamber. This is beneficial in that the structural relationship between the cleaning chamber and each mechanism is described, wherein the structures above the mounting flange are all disposed within the cleaning chamber.

[0012] In some embodiments, the upper and lower ends of each central axis extend beyond the upper and lower ends of each magnetic fluid, the upper and lower ends of each inner axis extend beyond the upper and lower ends of each central axis, and the upper and lower ends of each push rod extend beyond the upper and lower ends of each inner axis. This is beneficial in that it further describes the relationship between the magnetic fluid, the central axis, the inner axis, and the push rod.

[0013] In some embodiments, the bottom of each central shaft is threadedly connected to a fastening nut, the middle of the fastening nut has a hollow fastener, the inner shaft passes through the fastener, and a spring is arranged on the outside of the fastener. The advantage is that the relative position of the central shaft and the inner shaft can be kept fixed by the fastening nut, and the bottom of the central shaft can be stably installed by the spring.

[0014] In some embodiments, the slider is slidably mounted on an upper bracket, and the upper bracket is fixedly mounted on the mounting flange. The invention is beneficial in that a specific method of slidably mounting the slider on the mounting flange is described.

[0015] In some embodiments, the slider is provided with a threaded hole extending vertically, the central axis extends into the threaded hole, and the push rod passes through the threaded hole. The advantage is that the central axis and the slider can be stably threadedly connected by providing the threaded hole.

[0016] In some embodiments, the top end of the mandrel is non-fixedly connected to the support block via a pin. The invention is beneficial in that it describes a specific method of non-fixedly connecting the top end of the mandrel to the support block.

[0017] In some embodiments, the support block is fixedly connected to the end of the ion source by bolts, and the support block is non-fixedly connected to the slider by a turn pin. It is beneficial in that the specific way of connecting the support block to the ion source and the slider is described.

[0018] In some embodiments, the lower part of each of the central axis and the lower part of each of the inner axis are fixed by two clamps, respectively. The advantage is that each clamp can fix the central axis or the inner axis without height or angle adjustment.

[0019] In some embodiments, the two holding clips at the same end are connected to the bottom of the mounting flange via the same lower bracket. The benefit of this is that the specific installation method of each holding clip is further described. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1 A front view of an ion source height and angle adjustment device for a plasma cleaning device according to an embodiment of the present invention;

[0021] Figure 2 for Figure 1 A front view of an ion source height and angle adjustment device of a plasma cleaning device with a cleaning chamber removed;

[0022] Figure 3 for Figure 2 A front cross-sectional view of a device for adjusting the height and angle of an ion source of a plasma cleaning device;

[0023] Figure 4 for Figure 3 A partial front cross-sectional view of a device for adjusting the height and angle of an ion source of a plasma cleaning device;

[0024] Figure 5 for Figure 2 A schematic diagram of the structure of the fastening nut in FIG.

[0025] Figure 6 (a) Figure 3 Frontal view of the central axis and related structures shown;

[0026] Figure 6 (b) Figure 6 (a) Three-dimensional view of the central axis and related structures shown;

[0027] Figure 7 (a) Figure 3 A front view of the inner shaft and related structures shown;

[0028] Figure 7 (b) Figure 7 (a) Three-dimensional view of the inner shaft and related structures shown.

[0029] In the figure: a cleaning chamber 10, an ion source 11, a mounting flange 12, a magnetic fluid 20, a central axis 21, an inner axis 22, a push rod 23, a fastening nut 24, a fastener 25, a spring 26, a slider 30, a first hand wheel 31, an upper bracket 32, a threaded hole 33, a support block 40, a second hand wheel 41, a pin 42, a rotating pin 43, a clamp 50, and a lower bracket 51. DETAILED DESCRIPTION

[0030] The present invention will be further described in detail below in conjunction with the accompanying drawings.

[0031] like Figure 1-7 As shown, the device is installed on a cleaning chamber 10 of a plasma cleaning device, wherein an ion source 11 is arranged inside the cleaning chamber 10. The device comprises a mounting flange 12 and two magnetic fluids 20, wherein the mounting flange 12 is mounted at the bottom of the cleaning chamber 10, and the two magnetic fluids 20 are respectively mounted on the bottom surfaces of both sides of the bottom of the mounting flange 12 and support the two ends of the ion source 11 through the same structural arrangement.

[0032] like Figure 1 As shown, the cleaning chamber 10 contains all structures located above the mounting flange 12 inside.

[0033] The following description will be made by taking the installation of a magnetic fluid 20 at one end of the mounting flange 12 as an example.

[0034] A vertical central axis 21 is arranged inside the magnetic fluid 20, a vertical inner axis 22 is arranged inside the central axis 21, and a vertical push rod 23 is installed inside the inner axis 22 through a thread. The upper and lower ends of the central axis 21 extend beyond the upper and lower ends of the magnetic fluid 20, the upper and lower ends of the inner axis 22 extend beyond the upper and lower ends of the central axis 21, and the upper and lower ends of the push rod 23 extend beyond the upper and lower ends of the inner axis 22.

[0035] A fastening nut 24 is installed at the bottom of the middle shaft 21, and the bottom of the middle shaft 21 is threadedly connected to the fastening nut 24. Figure 5 As shown, a hollow fastener 25 is provided in the middle of the fastening nut 24. The fastener 25 is used to pass through the inner shaft 22 inside the middle shaft 21, so that the relative positions of the middle shaft 21 and the inner shaft 22 can be kept fixed.

[0036] In addition, a spring 26 is provided on the outer side of the fastener 25 in the fastening nut 24 , so as to stably install the bottom of the centering shaft 21 .

[0037] like Figure 3 and 6As shown, the upper part of the central axis 21 extends above the mounting flange 12 , and a slider 30 is threadedly connected to the top end of the central axis 21 , wherein the slider 30 is provided with a threaded hole 33 extending from top to bottom, and the top end of the central axis 21 has an external thread and extends into the threaded hole 33 .

[0038] The slider 30 is slidably mounted on an upper bracket 32 ​​, and can slide up and down along the upper bracket 32 ​​. The bottom end of the upper bracket 32 ​​is fixedly mounted on the mounting flange 12 .

[0039] In addition, a first hand wheel 31 is connected to the bottom end of the central axis 21 , and rotating the first hand wheel 31 will cause the central axis 21 to rotate, thereby driving the slider 30 to slide up and down along the upper bracket 32 ​​.

[0040] like Figure 3 and 7 As shown, the upper part of the inner shaft 22 also extends above the mounting flange 12, and the top rod 23 passes through the threaded hole 33 and its top end is non-fixedly connected to a support block 40 via a pin 42, and the support block 40 is fixedly connected to the end of the ion source 11 via bolts.

[0041] In addition, the support block 40 is also non-fixedly connected to the slider 30 via a rotating pin 43 , so that the slider 30 can slide up and down to drive the sliding support block 40 and even the end of the ion source 11 to move up and down.

[0042] The bottom end of the inner shaft 22 is connected to a second hand wheel 41 , and turning the second hand wheel 41 will cause the inner shaft 22 to rotate, thereby driving the push rod 23 connected with the internal thread to move up and down.

[0043] When the first hand wheel 31 is turned, the central shaft 21 rotates and drives the slider 30 to slide up and down along the upper bracket 32, thereby driving the support block 40 and the end of the ion source 11 to rise and fall. By operating the two first hand wheels 31 at both ends of the mounting flange 12, the overall height of the ion source 11 can be adjusted.

[0044] When the second hand wheel 41 is turned, the inner shaft 22 rotates and drives the top rod 23 to move up and down, thereby driving the support block 40 and the end of the ion source 11 to change the tilt angle. By operating the two second hand wheels 41 at both ends of the mounting flange 12, the overall tilt angle of the ion source 11 can be adjusted.

[0045] In addition, in Figure 1-3As shown, in order to fix the central axis 21 when the height adjustment is not performed, a clamp 50 for fixing can be installed at the bottom of each central axis 21, and in order to fix the inner axis 22 when the angle adjustment is not performed, a clamp 50 for fixing can be installed at the bottom of each inner axis 22. The two clamps 50 at the same end are located at different heights and are connected to the bottom of the mounting flange 12 through the same lower bracket 51.

[0046] The above are only some embodiments of the present invention. For those skilled in the art, several modifications and improvements can be made without departing from the creative concept of the present invention, which all belong to the protection scope of the present invention.

Claims

1. A device for adjusting the height and angle of an ion source of a plasma cleaning device, mounted on a cleaning chamber (10) of the plasma cleaning device, wherein an ion source (11) is disposed inside the cleaning chamber (10), characterized in that: It comprises a mounting flange (12), the mounting flange (12) being mounted on the bottom of the cleaning chamber (10), and two magnetic fluids (20) being mounted on the bottoms of both sides of the mounting flange (12); Each magnetic fluid (20) is provided with a vertical central axis (21), each central axis (21) is provided with a vertical inner axis (22), and each inner axis (22) is provided with a vertical top rod (23) threadedly mounted therein; The top thread of each of the central shafts (21) is connected to a slider (30), the slider (30) is slidably mounted on the mounting flange (12), and a first hand wheel (31) is connected to the bottom end of the central shaft (21); Each of the push rods (23) is non-fixedly connected to a support block (40), and the bottom end of the inner shaft (22) is connected to a second hand wheel (41); The support block (40) is fixedly connected to the end of the ion source (11), and the support block (40) is non-fixedly connected to the slider (30).

2. The device for adjusting the height and angle of an ion source of a plasma cleaning device according to claim 1, characterized in that: All structures located above the mounting flange (12) are contained within the cleaning chamber (10).

3. The device for adjusting the height and angle of an ion source of a plasma cleaning device according to claim 1, characterized in that: The upper and lower ends of each central axis (21) extend beyond the upper and lower ends of each magnetic fluid (20), the upper and lower ends of each inner axis (22) extend beyond the upper and lower ends of each central axis (21), and the upper and lower ends of each push rod (23) extend beyond the upper and lower ends of each inner axis (22).

4. The device for adjusting the height and angle of an ion source of a plasma cleaning device according to claim 1, characterized in that: The bottom of each central shaft (21) is threadedly connected to a fastening nut (24), the middle of the fastening nut (24) is provided with a hollow fastener (25), the inner shaft (22) passes through the fastener (25), and a spring (26) is provided on the outside of the fastener (25).

5. The device for adjusting the height and angle of an ion source of a plasma cleaning device according to claim 1, characterized in that: The slider (30) is slidably mounted on an upper bracket (32), and the upper bracket (32) is fixedly mounted on the mounting flange (12).

6. The device for adjusting the height and angle of an ion source of a plasma cleaning device according to claim 5, characterized in that: The slider (30) is provided with a threaded hole (33) which passes through from top to bottom, the central axis (21) extends into the threaded hole (33), and the push rod (23) passes through the threaded hole (33).

7. The device for adjusting the height and angle of an ion source of a plasma cleaning device according to claim 1, characterized in that: The top end of the push rod (23) is non-fixedly connected to the support block (40) via a pin (42).

8. The device for adjusting the height and angle of an ion source of a plasma cleaning device according to claim 1, characterized in that: The support block (40) is fixedly connected to the end of the ion source (11) via bolts, and the support block (40) is non-fixedly connected to the slider (30) via a rotating pin (43).

9. The device for adjusting the height and angle of an ion source of a plasma cleaning device according to claim 1, characterized in that: The lower part of each of the middle shafts (21) and the lower part of each of the inner shafts (22) are fixed by two clamps (50) respectively.

10. The device for adjusting the height and angle of an ion source of a plasma cleaning device according to claim 9, characterized in that: The two clamps (50) located at the same end are connected to the bottom of the mounting flange (12) via the same lower bracket (51).

Images