Coating device

Abstract

The invention relates to a coating device, a cavity is formed in the coating device, and the coating device comprises a movable substrate arranged at the top of the cavity; the evaporation source is arranged at the bottom of the cavity; the at least two spraying assemblies are mounted on the side, close to the movable base plate, of the evaporation source in a sliding manner; and the movable mechanism is arranged on the spraying assemblies and used for adjusting the distance between the adjacent spraying assemblies. Uniformity checking verification of configuration of a given movable substrate and an evaporation source opening is achieved through a uniformity checking core algorithm, so that the problem of uneven film coating is avoided, after layout design parameters are calculated, a control module controls the movable substrate and an evaporation source nozzle to move to corresponding positions, and a worker can conduct film coating conveniently.

Description

Technical Field

[0001] The invention relates to the field of equipment design and manufacturing and algorithm control, and in particular to a coating device. Background Art

[0002] In the process of vacuum optical coating particle deposition, the uniformity of film deposition thickness is a core issue that must be considered first. The uniformity of a film generally refers to the situation in which the thickness of the film changes as the position of the movable substrate changes. Usually, because the movable substrate is large enough relative to the evaporation source area, it is often necessary to use an evaporation source in the form of multiple evaporation nozzles, such as a line source. However, many process practices have shown that the uniformity of the film thickness deposited on a large movable substrate often fails to meet the uniformity standards. Occasionally, uniformity optimization may be achieved by closing the evaporation source or shielding the correction plate, but in fact, no optimal and reasonable uniform coating solution is fundamentally given.

[0003] If the uniformity of the thin film is not fundamentally resolved, the subsequent series of adjustments will always be based on patchwork ideas to optimize the side, which will make it difficult to ensure the repeatability of the film formation process. Therefore, it is necessary to design a coating device.

[0004] It should be noted that the information disclosed in the above background technology section is only used to enhance the understanding of the background of the present disclosure, and therefore may include information that does not constitute the prior art known to ordinary technicians in the field. Summary of the invention

[0005] To this end, the technical problem to be solved by the present invention is to overcome the problem that the uniformity of the deposited film thickness on the large movable substrate in the existing device often fails to meet the uniformity standard, and occasionally the uniformity is optimized by closing the evaporation source or blocking the correction plate, but in fact no optimal and reasonable uniform coating solution is fundamentally given.

[0006] In order to solve the above technical problems, the present invention provides a coating device, wherein a cavity is formed inside, and the coating device comprises:

[0007] A movable substrate is disposed on the top of the cavity;

[0008] an evaporation source, disposed at the bottom of the cavity;

[0009] At least two spraying assemblies are slidably mounted on a side of the evaporation source close to the movable substrate;

[0010] The movable mechanism is arranged on the spraying assembly and is used for adjusting the distance between adjacent spraying assemblies.

[0011] In one embodiment of the present invention, the spray assembly comprises:

[0012] A crucible, slidably mounted on a side of the evaporation source close to the movable substrate;

[0013] The evaporation source nozzle is fixedly mounted on the crucible.

[0014] In one embodiment of the present invention, the movable mechanism comprises:

[0015] A gear, disposed in the movable mechanism, wherein the gear is an incomplete gear structure;

[0016] A rack is arranged in the movable mechanism and located on both sides of the gear, and the rack is meshed with the gear.

[0017] In one embodiment of the present invention, it also includes:

[0018] A signal processor is arranged on the evaporation source, and the signal processor includes a laser sensor and a film thickness sensor. The laser sensor is used to measure the distance between the movable substrate and the evaporation source and the distance between the nozzles of the evaporation source, and the film thickness sensor is used to collect real-time film thickness values.

[0019] In one embodiment of the present invention, it also includes:

[0020] The external device is arranged outside the inner cavity, and a calculation module is provided on the external device. The calculation module is used to generate a film thickness distribution curve diagram based on the distance between the movable substrate and the evaporation source and the nozzle spacing of the evaporation source, calculate the film thickness distribution curve diagram, generate a film thickness uniformity value, and calculate the film thickness uniformity according to the real-time film thickness value.

[0021] In one embodiment of the present invention, the calculation module further includes:

[0022] The distance between the movable substrate and the evaporation source and the distance between the nozzles of the evaporation source are used to generate a film thickness distribution curve diagram, and the specific formula is as follows;

[0023]

[0024] Where, δ represents the evaporation source nozzle spacing, h represents the distance between the movable substrate and the evaporation source, m represents the number of evaporation source nozzles, k represents the number of Gaussian integration points, x represents the coordinate position of any point in the width direction of the movable substrate, and w i and H i They represent the Gaussian integral position and weight coefficient respectively, n is the evaporation index of the evaporation source nozzle, i represents all integer values ​​between 1 and k, and j represents all integer values ​​between 1 and m.

[0025] In one embodiment of the present invention, the external device further includes a comparison module, the comparison module is used to compare the uniform value of the film thickness with a preset threshold value, generate a comparison result, and determine the layout design parameters according to the comparison result;

[0026] When the film deposition starts, the film thickness uniformity value and the film thickness uniformity are compared to generate a comparison result.

[0027] In one embodiment of the present invention, the comparison module further comprises: if the film thickness uniformity value is less than a preset threshold value; then re-acquire the evaporation source nozzle spacing and the distance between the movable substrate and the evaporation source; if the film thickness uniformity value is greater than or equal to the preset threshold value; then determine the layout design parameters according to the evaporation source nozzle spacing and the distance between the movable substrate and the evaporation source;

[0028] If the comparison result is greater than or equal to 0.1 percent, the distance between the movable substrate and the evaporation source and the distance between the evaporation source nozzles are adjusted.

[0029] In one embodiment of the present invention, the external device further includes a control module, and the control module is used to control the movement of the movable substrate and the movable mechanism according to the determined layout design parameters.

[0030] In one embodiment of the present invention, the external device further includes:

[0031] A display module is arranged on the surface of the external device, and is used to display the layout design parameters.

[0032] The above technical solution of the present invention has the following advantages compared with the prior art:

[0033] The coating device described in the present invention can control the movable mechanism to move the spraying component to a suitable position through the control module after the layout design parameters are determined, and can also control the movement of the movable substrate through the control module. BRIEF DESCRIPTION OF THE DRAWINGS

[0034] In order to make the contents of the present invention more clearly understood, the present invention is further described in detail below based on specific embodiments of the present invention in conjunction with the accompanying drawings.

[0035] Figure 1 is a structural diagram of the inner cavity provided by the present invention;

[0036] Figure 2 is a structural diagram of an external device provided by the present invention;

[0037] Figure 3 is a cross-sectional view provided by the present invention;

[0038] Figure 4 is a structural diagram of the movable mechanism provided by the present invention;

[0039] Figure 5 It is a flow chart provided by the present invention.

[0040] Explanation of the reference numerals in the specification: 1. movable substrate; 2. evaporation source; 3. spraying assembly; 31. crucible; 32. evaporation source nozzle; 4. movable mechanism; 41. gear; 42. rack; 5. signal processor; 6. external device; 7. display module. DETAILED DESCRIPTION

[0041] The present invention is further described below in conjunction with the accompanying drawings and specific embodiments so that those skilled in the art can better understand the present invention and implement it, but the embodiments are not intended to limit the present invention.

[0042] Reference Figure 1 and Figure 3 As shown, the present invention provides a coating device with a cavity formed inside, and the coating device comprises: a movable substrate 1, arranged at the top of the cavity; an evaporation source 2, arranged at the bottom of the cavity; at least two spraying assemblies 3, slidably installed on a side of the evaporation source 2 close to the movable substrate 1; and a movable mechanism 4, arranged on the spraying assemblies 3, for adjusting the distance between adjacent spraying assemblies 3.

[0043] In this embodiment, a cavity is formed inside the coating device, and a movable substrate 1 is provided at the top of the cavity. The movable substrate 1 is driven by a motor to move toward or away from the evaporation source 2, thereby adjusting the distance between the movable substrate 1 and the evaporation source 2. The evaporation source 2 is provided at the bottom of the cavity, and a plurality of spraying components 3 are provided on the evaporation source 2. When the spraying components 3 spray out the powder, it will be deposited on the surface of the movable substrate 1, undergo a film forming process, and finally form a thin film. The spraying components 3 are slidably installed on the side of the evaporation source 2 close to the movable substrate 1, and a movable mechanism 4 is fixedly installed at the bottom of the spraying components 3. The movable mechanism 4 drives the spraying components 3 to move left and right to adjust the distance between adjacent spraying components 3. When the movable mechanism 4 drives the spraying components 3 to move left and right, a hole that allows the spraying components 3 to move needs to be provided at a position horizontal to the spraying components 3. In order to seal the hole after the movement, a protective sleeve is provided between the hole and the spraying components 3.

[0044] The spray assembly 3 includes: a crucible 31 slidably mounted on a side of the evaporation source 2 close to the movable substrate 1 ; and an evaporation source nozzle 32 fixedly mounted on the crucible 31 .

[0045] In this embodiment, the spraying assembly 3 also includes a crucible 31 and an evaporation source nozzle 32. The crucible 31 contains a substance for spraying. A heating device and a cooling device are also provided next to the crucible 31 for heating or cooling the crucible 31. The crucible 31 is also provided with an evaporation source nozzle 32, and the evaporation source nozzle 32 is fixedly installed on the crucible 31.

[0046] The movable mechanism 4 includes: a gear 41 disposed in the movable mechanism 4 , the gear 41 being an incomplete gear structure; a rack 42 disposed in the movable mechanism 4 and located on both sides of the gear 41 , the rack 42 meshing with the gear 41 .

[0047] In this embodiment, refer to Figure 4 As shown, the movable mechanism 4 installed at the lower part of the spray assembly 3 can drive the spray assembly 3 to move in the horizontal direction, wherein the movable mechanism 4 also includes a gear 41 and a rack 42, the gear 41 is arranged in the movable mechanism 4, in order to enable the movable mechanism 4 to move horizontally, racks 42 are arranged on both sides of the gear 41, the racks 42 are meshed with the gear 41, and the gear 41 is an incomplete gear structure, the number of teeth on the driving wheel of the incomplete gear structure is incomplete, usually only one or a few teeth, when the gear 41 rotates clockwise, the gear 41 is meshed with one of the racks 42, and is not meshed with the other rack 42, at this time the movable mechanism 4 moves in one direction in the horizontal direction. When the movable mechanism 4 moves to the extreme position on one side, at this time the gear 41 is not meshed with one of the racks 42, but is meshed with the other rack 42, at this time the movable mechanism 4 moves in another direction in the horizontal direction. Thus, the movable mechanism 4 realizes reciprocating motion.

[0048] It also includes: a signal processor 5, which is arranged on the evaporation source 2, and the signal processor 5 includes a laser sensor and a film thickness sensor. The laser sensor is used to measure the distance between the movable substrate 1 and the evaporation source 2 and the distance between the evaporation source nozzles 32, and the film thickness sensor is used to collect real-time film thickness values.

[0049] In this embodiment, a signal processor 5 is also provided on the evaporation source 2. The signal processor 5 is located on one side of the spray assembly 3. The signal processor 5 can collect the distance h between the movable substrate 1 and the evaporation source 2, and the spacing δ between adjacent evaporation source nozzles 32. Exemplarily, the signal processor 5 includes a laser sensor and a film thickness sensor. The laser sensor is used to measure the distance between the movable substrate 1 and the evaporation source 2, and the film thickness sensor is used to monitor the real-time film thickness T, wherein the film thickness sensor can be a multi-point film thickness meter.

[0050] It also includes: an external device 6, which is arranged outside the inner cavity, and a calculation module is provided on the external device 6, and the calculation module is used to generate a film thickness distribution curve diagram based on the distance between the movable substrate 1 and the evaporation source 2 and the spacing between the evaporation source nozzles 32, and calculate the film thickness distribution curve diagram to generate a film thickness uniformity value, and calculate the film thickness uniformity according to the real-time film thickness value. Among them, the calculation module also includes: generating a film thickness distribution curve diagram based on the distance between the movable substrate 1 and the evaporation source 2 and the spacing between the evaporation source nozzles 32, and the specific formula is as follows;

[0051]

[0052] Wherein, δ represents the spacing between the evaporation source nozzles 32, h represents the distance between the movable substrate 1 and the evaporation source 2, m represents the number of evaporation source nozzles 32, k represents the number of Gaussian integration points, x represents the coordinate position of any point in the width direction of the movable substrate 1, and w i and H i They represent Gaussian integral position and weight coefficient respectively, n is the evaporation index of the evaporation source nozzle 32, i represents all integer values ​​between 1 and k, and j represents all integer values ​​between 1 and m.

[0053] In this embodiment, an external device 6 is further provided outside the inner cavity, and a calculation module is provided on the external device 6. The calculation module inputs the distance h between the movable substrate 1 and the evaporation source 2 and the spacing δ between the adjacent evaporation source nozzles 32 into the formula (1), and draws a film thickness distribution curve according to the calculation result. The calculation module can also compare the real-time film thickness T collected by the film thickness sensor with the theoretical value T', that is, by 1-(t max -t min ) / (t max +t min ) is used to calculate the uniformity of the film thickness P', where t is the time.

[0054] The external device 6 also includes a comparison module, which is used to compare the film thickness uniformity value with a preset threshold value, generate a comparison result, and determine the layout design parameters according to the comparison result; when the coating starts, the film thickness uniformity value and the film thickness uniformity are compared to generate a comparison result. Wherein, the comparison module also includes: if the film thickness uniformity value is less than the preset threshold value; then re-acquire the distance between the evaporation source nozzles 32 and the distance between the movable substrate 1 and the evaporation source 2; if the film thickness uniformity value is greater than or equal to the preset threshold value; then determine the layout design parameters according to the distance between the evaporation source nozzles 32 and the distance between the movable substrate 1 and the evaporation source 2; if the comparison result is greater than or equal to 0.1 percent, then adjust the distance between the movable substrate 1 and the evaporation source 2 and the distance between the evaporation source nozzles 32.

[0055] In this embodiment, the maximum value t can be obtained through the film thickness distribution curve. max and the minimum value t min , maximum value t max is the peak value of the film thickness distribution curve, the minimum value t min is the valley value of the film thickness distribution curve, and the maximum value t max and the minimum value t min Bring it into (t max -t min ) / (t max +t min ) is used to calculate the film thickness distribution curve, and the calculated result is the film thickness uniformity value P. The film thickness uniformity value P and the preset threshold value are judged, wherein the preset threshold value is the uniformity target value, that is, the film thickness uniformity required by the customer. If the film thickness uniformity value P is greater than or equal to the uniformity target value, a comparison result is generated that the film thickness uniformity value P is greater than the uniformity target value; if the film thickness uniformity value is less than the uniformity target value, a comparison result is generated that the film thickness uniformity value P is less than the uniformity target value.

[0056] If the generated comparison result is that the film thickness uniformity value P is less than the uniformity target value, then based on the comparison result, return to the step of obtaining the spacing between the evaporation source nozzles 32 and the distance between the movable substrate 1 and the evaporation source 2, and recalculate according to the above steps. If the generated comparison result is that the film thickness uniformity value P is greater than or equal to the uniformity target value, then the layout design parameters are determined according to the comparison result. When the evaporation starts, the film thickness uniformity value P is compared with the film thickness uniformity P' to verify whether the film thickness uniformity value P meets the standard. When the comparison error is greater than or equal to 0.1%, it is necessary to fine-tune the distance h between the movable substrate 1 and the evaporation source 2 and the spacing δ between adjacent evaporation source nozzles 32.

[0057] The external device 6 further includes a control module, and the control module is used to control the movement of the movable substrate 1 and the movable mechanism 4 according to the determined layout design parameters.

[0058] In this embodiment, the external device 6 also includes a control module. After determining the layout design parameters, if the distance h between the current movable substrate 1 and the evaporation source 2, and the spacing δ between adjacent evaporation source nozzles 32 are different from the obtained layout design parameters, the control module can not only control the movable substrate 1 to move closer to or away from the evaporation source 2 through a motor drive to readjust h, but can also control the movable mechanism 4 to move to readjust δ.

[0059] The external device 6 further includes: a display module 7, which is arranged on the surface of the external device 6, and the display module 7 is used to display the layout design parameters.

[0060] In this embodiment, refer to Figure 2 As shown, the external device 6 also includes a display module 7, which is arranged on the surface of the external device 6. After the layout design parameters are determined, the display module 7 can display the data results to realize data visualization, wherein the display module 7 can be a display screen. The present application realizes the uniformity verification of the given movable substrate 1 and the opening configuration of the evaporation source 2 by using the uniformity verification core algorithm, thereby avoiding the problem of uneven coating. After the layout design parameters are calculated, the control module controls the movable substrate 1 and the evaporation source nozzle 32 to move to the corresponding position, so as to facilitate the staff to perform coating.

[0061] Reference Figure 5 As shown, the present invention also provides a method for uniform coating based on layout design parameters, the method comprising:

[0062] S100, obtaining the distance between the movable substrate 1 and the evaporation source 2 and the spacing between the evaporation source nozzles 32;

[0063] In step S100 , the evaporation source 2 is a linear evaporation source. At this time, the distance between the movable substrate 1 and the evaporation source 2 is h, and the distance between two adjacent evaporation source nozzles 32 on the linear evaporation source is δ.

[0064] S200, generating a film thickness distribution curve diagram according to the spacing between the evaporation source nozzles 32 and the distance between the movable substrate 1 and the evaporation source 2;

[0065] In step S200, a calculation formula for generating a film thickness distribution curve diagram according to the spacing between the evaporation source nozzles 32 and the distance between the movable substrate 1 and the evaporation source 2 is as shown in the above formula (1).

[0066] In an actual application scenario, the obtained spacing δ between the evaporation source nozzles 32 and the distance h between the movable substrate 1 and the evaporation source 2 are input into formula (1), and a film thickness distribution curve is plotted based on the calculation results.

[0067] S300, calculating the film thickness distribution curve to generate a uniform film thickness value;

[0068] In step S300, the step of calculating the film thickness distribution curve includes: obtaining the maximum value t of the film thickness distribution curve max and the minimum value t min ; by (t max -t min ) / (t max +t min ) is used to calculate the film thickness distribution curve.

[0069] In actual application scenarios, the maximum value t can be obtained through the film thickness distribution curve.max and the minimum value t min , maximum value t max is the peak value of the film thickness distribution curve, the minimum value t min is the valley value of the film thickness distribution curve, and the maximum value t max and the minimum value t min Bring it into (t max -t min ) / (t max +t min ) is used to calculate the film thickness distribution curve, and the calculated result is the uniform film thickness value P.

[0070] S400, comparing the uniform film thickness value with a preset threshold value to generate a comparison result;

[0071] In step S400, the size of the film thickness uniformity value P and the preset threshold is determined, wherein the preset threshold is the uniformity target value. If the film thickness uniformity value P is greater than the uniformity target value, that is, the film thickness uniformity required by the customer, a comparison result is generated that the film thickness uniformity value P is greater than the uniformity target value; if the film thickness uniformity value is less than the uniformity target value, a comparison result is generated that the film thickness uniformity value P is less than the uniformity target value.

[0072] S500, determining layout design parameters according to the comparison result.

[0073] In step S500, the step of determining the layout design parameters according to the comparison result includes: if the film thickness uniformity value P is less than a preset threshold value, re-acquiring the spacing between the evaporation source nozzles 32 and the distance between the movable substrate 1 and the evaporation source 2. If the film thickness uniformity value P is greater than or equal to the preset threshold value, determining the layout design parameters according to the spacing between the evaporation source nozzles 32 and the distance between the movable substrate 1 and the evaporation source 2.

[0074] In actual application scenarios, if the generated comparison result is that the film thickness uniformity value is greater than the uniformity target value, then based on the comparison result, return to the step of obtaining the spacing between the evaporation source nozzle 32 and the distance between the movable substrate 1 and the evaporation source 2, and recalculate according to the above steps. If the generated comparison result is that the film thickness uniformity value is less than the uniformity target value, then determine the layout design parameters based on the comparison result.

[0075] In the description of the present invention, it should be understood that the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of the features. In the description of the present invention, the meaning of "plurality" is two or more, unless otherwise clearly and specifically defined.

[0076] In the present invention, unless otherwise clearly specified and limited, the terms "installed", "connected", "connected", "fixed" and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium; it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0077] In the present invention, unless otherwise clearly specified and limited, when a first feature is “on” or “below” a second feature, it may be that the first and second features are in direct contact, or that the first and second features are in indirect contact through an intermediate medium. Moreover, when a first feature is “above”, “above” or “above” a second feature, it may be that the first feature is directly above or obliquely above the second feature, or it may simply mean that the first feature is higher in level than the second feature. When a first feature is “below”, “below” or “below” a second feature, it may be that the first feature is directly below or obliquely below the second feature, or it may simply mean that the first feature is lower in level than the second feature.

[0078] In the description of this specification, the description of the terms "one embodiment", "some embodiments", "embodiment", "example", "specific example" or "some examples" etc. means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present invention. In this specification, the schematic representations of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described may be combined in any one or more embodiments or examples in a suitable manner. In addition, those skilled in the art may combine and combine the different embodiments or examples described in this specification and the features of the different embodiments or examples, unless they are contradictory.

[0079] Although the embodiments of the present invention have been shown and described above, it is to be understood that the above embodiments are exemplary and are not to be construed as limitations of the present invention. A person skilled in the art may alter, modify, replace and modify the above embodiments within the scope of the present invention.

[0080] Obviously, the above embodiments are merely examples for clear explanation and are not intended to limit the implementation methods. For those skilled in the art, other different forms of changes or modifications can be made based on the above description. It is not necessary and impossible to list all the implementation methods here. The obvious changes or modifications derived from these are still within the protection scope of the invention.

Claims

1. A coating device, wherein a cavity is formed inside, characterized in that: The coating device comprises: A movable substrate (1) is arranged on the top of the cavity; an evaporation source (2), arranged at the bottom of the cavity; At least two spraying assemblies (3) are slidably mounted on a side of the evaporation source (2) close to the movable substrate (1); The movable mechanism (4) is arranged on the spraying assembly (3) and is used to adjust the distance between adjacent spraying assemblies (3).

2. A coating device according to claim 1, characterized in that: The spraying assembly (3) comprises: A crucible (31) is slidably mounted on a side of the evaporation source (2) close to the movable substrate (1); The evaporation source nozzle (32) is fixedly mounted on the crucible (31).

3. A coating device according to claim 1, characterized in that: The movable mechanism (4) comprises: A gear (41) is disposed in the movable mechanism (4), wherein the gear (41) is an incomplete gear structure; A rack (42) is arranged in the movable mechanism (4) and located on both sides of the gear (41), and the rack (42) is meshed with the gear (41).

4. A coating device according to claim 1, characterized in that: Also includes: A signal processor (5) is arranged on the evaporation source (2), the signal processor (5) comprising a laser sensor and a film thickness sensor, the laser sensor being used to measure the distance between the movable substrate (1) and the evaporation source (2) and the spacing between the evaporation source nozzles (32), and the film thickness sensor being used to collect real-time film thickness values.

5. The coating device according to claim 1, characterized in that: Also includes: An external device (6) is arranged outside the inner cavity, and a calculation module is provided on the external device (6). The calculation module is used to generate a film thickness distribution curve diagram based on the distance between the movable substrate (1) and the evaporation source (2) and the spacing between the evaporation source nozzles (32), calculate the film thickness distribution curve diagram, generate a film thickness uniformity value, and calculate the film thickness uniformity according to the real-time film thickness value.

6. A coating device according to claim 5, characterized in that: The calculation module also includes: The distance between the movable substrate (1) and the evaporation source (2) and the spacing between the evaporation source nozzles (32) are used to generate a film thickness distribution curve diagram, and the specific formula is as follows; Wherein, δ represents the spacing between the evaporation source nozzles (32), h represents the distance between the movable substrate (1) and the evaporation source (2), m represents the number of evaporation source nozzles (32), k represents the number of Gaussian integration points, x represents the coordinate position of any point in the width direction of the movable substrate (1), and w i and H i They represent Gaussian integral position and weight coefficient respectively, n is the evaporation index of the evaporation source nozzle (32), i represents all integer values ​​between 1 and k, and j represents all integer values ​​between 1 and m.

7. A coating device according to claim 5, characterized in that: The external device (6) further comprises a comparison module, wherein the comparison module is used to compare the uniform film thickness value with a preset threshold value, generate a comparison result, and determine the layout design parameters according to the comparison result; When the film deposition starts, the film thickness uniformity value and the film thickness uniformity are compared to generate a comparison result.

8. A coating device according to claim 7, characterized in that: The comparison module further comprises: if the film thickness uniformity value is less than a preset threshold value; re-acquiring the spacing between the evaporation source nozzles (32) and the distance between the movable substrate (1) and the evaporation source (2); if the film thickness uniformity value is greater than or equal to the preset threshold value; determining the layout design parameters according to the spacing between the evaporation source nozzles (32) and the distance between the movable substrate (1) and the evaporation source (2); If the comparison result is greater than or equal to 0.1 percent, the distance between the movable substrate (1) and the evaporation source (2) and the spacing between the evaporation source nozzles (32) are adjusted.

9. A coating device according to claim 8, characterized in that: The external device (6) further comprises a control module, wherein the control module is used to control the movement of the movable substrate (1) and the movable mechanism (4) according to the determined layout design parameters.

10. The coating device according to claim 5, characterized in that: The external device (6) also includes: A display module (7) is arranged on the surface of the external device (6), and the display module (7) is used to display the layout design parameters.

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