Self-cleaning electron beam evaporation device

Abstract

The invention relates to the technical field of electron beam evaporation coating, in particular to a self-cleaning electron beam evaporation device which comprises a box with a vacuum cavity, an electron beam emission hole is formed in the bottom in the vacuum cavity, a support located above the electron beam emission hole is arranged in the vacuum cavity, and a crucible is arranged on the support. A baffle located above the crucible is horizontally and rotatably connected into the vacuum cavity, a rotating rod is vertically and rotatably connected into the vacuum cavity, the rotating rod is connected with the baffle and is hollow, a soft water passing pipe is arranged in the baffle, and a plurality of nozzles communicated with the water passing pipe are arranged on the lower surface of the baffle. One end of the water pipe away from the nozzle extends out of the lower end of the rotating rod and is connected with a clean water tank. After film coating, the baffle rotates to the position over the crucible, the spray head is aligned to the crucible, and cleaning liquid in the cleaning water tank is pumped into the baffle through the water pipe and sprayed out of the spray head to wash the inner wall of the crucible, so that residual materials in the crucible are washed, and cleanliness of the crucible is guaranteed.

Description

Technical Field

[0001] The present application relates to the technical field of electron beam evaporation coating, and in particular to a self-cleaning electron beam evaporation coating device. Background Art

[0002] Electron beam evaporation is a commonly used thin film preparation technology in the semiconductor manufacturing process. During the electron beam evaporation process, the target material is placed in a crucible, and the crucible and the target material inside are heated by the electron beam. After the target material is evaporated, a film is formed on the surface of the substrate.

[0003] The crucible is a container for the evaporation source. The crucible has a high temperature during the evaporation process. The target material inside is heated and evaporates. The target material in direct contact with the inner wall of the crucible is easy to stick to the inner wall of the crucible. Every time the electron beam evaporation equipment performs a coating, there will be more or less target material residue on the inner wall of the crucible. In order to facilitate the next evaporation, the crucible needs to be taken out and cleaned every time, which is inconvenient. Summary of the invention

[0004] In order to facilitate the cleaning of the crucible, the present application provides a self-cleaning electron beam evaporation device.

[0005] The present application provides a self-cleaning electron beam evaporation device that adopts the following technical solution: A self-cleaning electron beam evaporation device comprises a box body with a vacuum cavity, wherein an electron beam emission hole is arranged at the bottom of the vacuum cavity, a bracket is arranged in the vacuum cavity and is located above the electron beam emission hole, a crucible is arranged on the bracket, a baffle plate located above the crucible is horizontally rotatably connected in the vacuum cavity, a rotating rod is vertically rotatably connected in the vacuum cavity, the rotating rod is connected to the baffle plate, the rotating rod is hollow, a soft water pipe is arranged in the baffle plate, a plurality of nozzles connected to the water pipe are arranged on the lower surface of the baffle plate, and an end of the water pipe away from the nozzle extends from the lower end of the rotating rod and is connected to a clean water tank.

[0006] By adopting the above technical solution, after coating, the baffle rotates to the top of the crucible, the nozzle is aimed at the crucible, the cleaning liquid in the clean water tank is injected into the baffle through the water pipe and sprayed out from the nozzle to rinse the inner wall of the crucible, thereby rinsing the residual material in the crucible to ensure the cleanliness of the crucible.

[0007] Preferably, a concave annular groove matching the upper end surface of the crucible is formed on the lower surface of the baffle, and the nozzle is located in the inner circle of the annular groove.

[0008] By adopting the above technical solution, the upper end of the crucible is embedded in the annular groove, the nozzle washes the inner wall of the crucible, and the baffle blocks the upper end of the crucible to prevent the cleaning liquid from splashing.

[0009] Preferably, a water spray disc located in the inner circle of the annular groove is provided at the center of the lower surface of the baffle, the edge of the water spray disc is slidably connected to the baffle through a soft bellows, and the nozzle is installed on the water spray disc.

[0010] By adopting the above technical solution, when the nozzle is washing the inner wall of the crucible, the water spray plate can move up and down, thereby adjusting the position of the nozzle, increasing the cleaning range of the nozzle, and improving the cleaning effect.

[0011] Preferably, a vertical pipe vertically connected to the water spray disc is fixed above the water spray disc, the vertical pipe is connected to a water pipe through a hose, a driving impeller with an axis perpendicular to the axis of the water spray disc is rotatably connected in the water pipe, the driving impeller is coaxially connected to a driving shaft, the driving shaft passes through the water pipe and is connected to a driving gear, the driving gear is an incomplete gear, two opposite reciprocating racks are fixed above the water spray disc, the driving gear is rotatably connected between the two reciprocating racks, and the driving gear can only mesh with one of the reciprocating racks at the same time.

[0012] By adopting the above technical solution, when water flows into the vertical pipe through the water pipe, it will pass through the driving impeller, which will drive the driving impeller to rotate. The driving impeller drives the driving gear to rotate through the driving shaft. When the driving gear is engaged with the reciprocating racks on both sides, the reciprocating racks on both sides are driven to rotate in different directions. For example, when the driving gear is engaged with the reciprocating rack on the left, the reciprocating rack is driven to move upward, and when the driving gear is engaged with the reciprocating rack on the right, the reciprocating rack on the right is driven to move downward. Therefore, when water flows in the water pipe, the driving impeller rotates unidirectionally continuously, but the reciprocating racks on both sides drive the water spray plate and the nozzle to move up and down, which is convenient to use.

[0013] Preferably, the water spray disc includes a fixed disc and a rotating disc rotatably connected to the bottom of the fixed disc, the fixed disc is connected to the bellows, a rotating tube is vertically fixed to the center of the rotating disc, the lower end of the vertical tube passes through the fixed disc and is rotatably connected to the rotating tube, the rotating disc is hollow and has a drainage cavity inside, the lower end of the rotating tube is located in the drainage cavity, a plurality of connecting holes for connecting the rotating tube and the drainage cavity are evenly arranged on the side wall of the rotating tube, the connecting holes are horizontally and obliquely opened on the side wall of the rotating tube, and the nozzle is installed on the lower surface of the rotating disc and is connected to the drainage cavity.

[0014] By adopting the above technical solution, water flows from the rotating tube into the rotating disk through the connecting hole and is finally discharged through the nozzle. When the water flows out from the connecting hole, the connecting hole is inclined to exert a horizontal thrust on the rotating tube, thereby driving the rotating tube and the rotating disk to rotate, and the nozzle rotates accordingly to clean the inner wall of the crucible, thereby increasing the cleaning range and improving the cleaning effect.

[0015] Preferably, a plurality of return springs are provided on the upper surface of the water spray disc, and one end of the return spring away from the water spray disc is connected to the baffle plate. When the return spring is in a natural state, the lower surface of the water spray disc is not lower than the lower surface of the baffle plate.

[0016] By adopting the above technical solution, the reset spring limits the position of the water spray plate to prevent the water spray plate from being too low and affecting the placement of the crucible.

[0017] Preferably, the nozzle comprises an inclined nozzle located at the edge and a straight nozzle located in the center, the straight nozzle faces the bottom of the crucible, the inclined nozzle faces the side wall of the crucible, and the angle between the inclined nozzle and the vertical line gradually decreases towards the straight nozzle.

[0018] By adopting the above technical solution, the straight nozzle cleans the bottom of the crucible, and the inclined nozzle cleans the side wall of the crucible, and the two cooperate with each other to improve the cleaning effect of the crucible.

[0019] Preferably, the bracket is provided with a clamping frame for clamping the crucible, the clamping frame includes a vertically arranged clamping plate, an annular plate and a bottom plate are vertically slidably connected to the clamping plate, the annular plate is located above the crucible, and the inner ring diameter of the annular plate is not less than the inner diameter of the upper end of the crucible but not larger than the outer diameter of the upper end of the crucible, the bottom plate is located below the crucible, and a support rod is vertically slidably connected to the clamping frame, the upper end of the support rod is rotatably connected to a rotating shaft, and the rotating shaft is fixedly connected to the middle of the clamping plate.

[0020] By adopting the above technical solution, the crucible is clamped between the annular plate and the bottom plate, and the support rod drives the crucible to move upward as a whole to contact the lower surface of the baffle plate, which is convenient for cleaning. After cleaning, the baffle plate is removed, and the rotating shaft drives the clamping plate to rotate, thereby turning the crucible upside down to discharge the cleaning liquid in the crucible.

[0021] Preferably, the bracket includes a drainage board horizontally slidably connected to the vacuum chamber, the drainage board is surrounded by vertically upward water retaining plates, the drainage board is provided with drainage holes, and the drainage holes are connected to the drainage box through a soft drainage pipe.

[0022] By adopting the above technical solution, when the crucible is rinsed, the drain plate slides to the bottom of the crucible to receive the cleaning liquid flowing out of the crucible, and the water baffle shields the cleaning liquid to prevent the cleaning liquid from splashing. The cleaning liquid in the crucible is also poured onto the drain plate and discharged through the drain pipe. Then the drain plate is moved away so that the crucible is directly opposite to the electron beam emission hole to avoid affecting the coating.

[0023] In summary, this application includes the following beneficial technical effects: By setting the baffle and the nozzle, the nozzle is aimed at the crucible, and the cleaning liquid in the cleaning water tank is injected into the baffle through the water pipe and sprayed out from the nozzle to wash the inner wall of the crucible, thereby washing the residual material in the crucible to ensure the cleanliness of the crucible. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] Figure 1 It is a schematic diagram of the overall structure of the embodiment; Figure 2 Schematic diagram of the connection between the baffle and the clean water tank and the bracket and the drainage tank in the embodiment; Figure 3 Schematic diagram of the internal structure of the baffle in the embodiment; Figure 4 2 is a schematic diagram of the structure of the clamping frame in the embodiment.

[0025] Description of reference numerals: 1. Box; 11. Vacuum chamber; 12. Planetary pot; 2. Bracket; 21. Water baffle; 22. Drain plate; 3. Crucible; 4. Baffle; 41. Rotating rod; 42. Annular groove; 43. Receiving groove; 5. Clean water tank; 51. Water pipe; 52. Driving impeller; 521. Driving shaft; 522. Driving gear; 6. Water spray plate; 61. Fixed plate; 611. Vertical pipe; 612. Reciprocating gear strip; 62, rotating disk; 621, rotating tube; 6211, connecting hole; 622, drainage chamber; 63, nozzle; 631, inclined nozzle; 632, straight nozzle; 64, bellows; 65, hose; 66, return spring; 7, clamping frame; 71, clamping plate; 72, annular plate; 73, bottom plate; 74, support rod; 75, rotating shaft; 76, clamping screw; 8, drainage box; 81, drainage pipe. DETAILED DESCRIPTION

[0026] The present application is further described in detail below in conjunction with all the accompanying drawings.

[0027] Example

[0028] The present application discloses a self-cleaning electron beam evaporation device. Figure 1 to Figure 2 , including a box body 1, a vacuum chamber 11 is arranged in the box body 1, and a plurality of planetary pots 12 are rotatably connected above the vacuum chamber 11. An electron beam emission hole is opened below the vacuum chamber 11, a bracket 2 is arranged above the electron beam emission hole, and a crucible 3 is arranged on the bracket 2. A baffle 4 located above the crucible 3 is horizontally rotatably connected in the vacuum chamber 11. A clean water tank 5 and a drainage tank 8 located below the vacuum chamber 11 are arranged in the box body 1. The clean water tank 5 is filled with cleaning liquid.

[0029] Reference Figure 1 to Figure 2The bottom of the vacuum chamber 11 is vertically connected to a rotating rod 41 passing through the vacuum chamber 11, and a rotating motor for driving the rotating rod 41 to rotate is provided in the box body 1. The baffle 4 is fixedly connected to the upper end of the rotating rod 41. The rotating rod 41 drives the baffle 4 to rotate horizontally.

[0030] Reference Figures 1 to 3 The rotating rod 41 is hollow, and a soft water pipe 51 is inserted into the rotating rod 41. The lower end of the water pipe 51 is connected to the clean water tank 5 through a water pump, and the upper end of the water pipe 51 is connected to the baffle 4. A water spray plate 6 is provided at the center of the lower surface of the baffle 4, and a plurality of nozzles 63 are provided on the water spray plate 6. The water pipe 51 is connected to the water spray plate 6 to supply water to the nozzles 63. After coating, the baffle 4 rotates to the top of the crucible 3, and the cleaning liquid in the clean water tank 5 is pumped into the nozzles 63 through the water pipe 51, and the nozzles 63 rinse the inner wall of the crucible 3.

[0031] Reference Figures 1 to 3 The lower surface of the baffle 4 is provided with an inwardly concave annular groove 42, which matches the upper end surface of the crucible 3, and the upper end of the crucible 3 can be embedded in the annular groove 42. The water spray plate 6 is located in the inner circle of the annular groove 42. During cleaning, the upper end of the crucible 3 is embedded in the annular groove 42, the water spray plate 6 is located in the crucible 3 to clean the crucible 3, and the baffle 4 shields the upper end of the crucible 3 to prevent the cleaning liquid from splashing.

[0032] Reference Figures 1 to 3 The water spraying disk 6 includes a fixed disk 61 located at the top and a rotating disk 62 coaxially connected to the bottom of the fixed disk 61, and the nozzle 63 is installed on the rotating disk 62. The edge of the upper end of the fixed disk 61 is slidably connected to the lower surface of the baffle 4 through a soft bellows 64. When the rotating disk 62 cleans the crucible 3, the fixed disk 61 drives the rotating disk 62 to move up and down, thereby increasing the cleaning range of the rotating disk 62. A plurality of reset springs 66 are provided between the upper surface of the fixed disk 61 and the baffle 4. When the reset springs 66 are in a natural state, the lower surface of the rotating disk 62 is not lower than the lower surface of the baffle 4. The reset springs 66 limit the position of the rotating disk 62 to prevent the position of the rotating disk 62 from being too low to affect the shielding function of the baffle 4.

[0033] Reference Figures 1 to 3, a vertical pipe 611 vertically connected to the fixed disk 61 is coaxially fixed to the fixed disk 61. The vertical pipe 611 is connected to the water pipe 51 through a hose 65. The part of the water pipe 51 facing the hose 65 is vertically arranged and is internally rotatably connected to a driving impeller 52 whose axis is perpendicular to the axis of the water spray disk 6. The driving impeller 52 is coaxially connected to a driving shaft 521. The driving shaft 521 passes through the water pipe 51 and is connected to a driving gear 522. The driving gear 522 is an incomplete gear. Two reciprocating racks 612 facing each other are fixed above the water spray disk 6. The driving gear 522 is rotatably connected between the two reciprocating racks 612, and the driving gear 522 can only mesh with one of the reciprocating racks 612 at the same time, and cannot mesh with both reciprocating racks 612 at the same time.

[0034] Reference Figures 1 to 3 When water flows into the vertical pipe 611 through the water pipe 51, it will pass through the driving impeller 52, which will drive the driving impeller 52 to rotate. The driving impeller 52 drives the driving gear 522 to rotate through the driving shaft 521. When the driving gear 522 is engaged with the reciprocating racks 612 on both sides, the reciprocating racks 612 on both sides are driven to rotate in different directions. For example, when the driving gear 522 is engaged with the reciprocating rack 612 on the left side, the reciprocating rack 612 is driven to move upward, and when the driving gear 522 is engaged with the reciprocating rack 612 on the right side, the reciprocating rack 612 on the right side is driven to move downward. Therefore, when the water flows in the water pipe 51, the driving impeller 52 does not stop rotating in one direction, but it drives the water spray plate 6 and the nozzle 63 to move up and down through the reciprocating racks 612 on both sides, which is convenient to use.

[0035] Reference Figures 1 to 3 A rotating tube 621 is coaxially fixed to the center of the rotating disk 62, and the upper end of the rotating tube 621 is rotatably connected to the lower end of the vertical tube 611. The rotating disk 62 is hollow and has a drainage cavity 622 formed inside. The lower end of the rotating tube 621 is located in the drainage cavity 622, and a plurality of connecting holes 6211 for connecting the rotating tube 621 and the drainage cavity 622 are evenly formed on the side wall in the circumferential direction. The connecting holes 6211 are horizontally and obliquely formed on the side wall of the rotating tube 621, that is, the straight line where the connecting holes 6211 are located does not pass through the center of the rotating tube 621. The nozzle 63 is installed on the lower surface of the rotating disk 62 and is connected to the drainage cavity 622.

[0036] Reference Figures 1 to 3 When the cleaning liquid flows into the rotating tube 621 through the vertical tube 611, and flows into the drainage cavity 622 through the connecting hole 6211, it is finally sprayed out through the nozzle 63. When the cleaning liquid flows out from the connecting hole 6211, the connecting hole 6211 is inclined to exert a horizontal thrust on the rotating tube 621, thereby driving the rotating tube 621 and the entire rotating disk 62 to rotate around the axis of the rotating disk 62, thereby driving the nozzle 63 to rotate, further increasing the cleaning range of the nozzle 63 and improving the cleaning effect.

[0037] Reference Figures 1 to 3 When the cleaning liquid flows out of the water pipe 51 and finally is discharged through the nozzle 63, it will drive the fixed plate 61 to reciprocate up and down, and also drive the rotating plate 62 to rotate, thereby increasing the cleaning range of the nozzle 63 in both vertical and horizontal directions and improving the cleaning effect. Moreover, the whole process does not require other additional power devices, and the normal flow and discharge of the cleaning liquid can drive the water spray plate 6 to move, which is convenient to use.

[0038] Reference Figures 1 to 3 The nozzle 63 includes an oblique nozzle 631 located at the edge and a straight nozzle 632 located at the center, the straight nozzle 632 faces the bottom of the crucible 3, the oblique nozzle 631 faces the side wall of the crucible 3, and the angle between the oblique nozzle 631 and the vertical line gradually decreases toward the straight nozzle 632. The straight nozzle 632 cleans the bottom of the crucible 3, and the oblique nozzle 631 cleans the side wall of the crucible 3, and the two cooperate with each other to improve the cleaning effect of the crucible 3.

[0039] Reference Figures 1 to 3 The support 2 includes a supporting mechanism and a drainage mechanism. The supporting mechanism clamps the crucible 3 for easy cleaning and coating, and the drainage mechanism discharges the cleaning liquid in the crucible 3. The drainage mechanism includes a water retaining plate 21 and a drainage plate 22. A drainage hole is provided in the center of the drainage plate 22, and the drainage hole is connected to the drainage box 8 through a soft corrugated retractable drainage pipe 81. The cleaning liquid overflowing from the crucible 3 during the cleaning process flows onto the drainage plate 22 and is finally discharged into the drainage box 8.

[0040] Reference Figures 1 to 3 The drain plate 22 is connected to the bottom of the vacuum chamber 11 by means of a cylinder for horizontal sliding. When the crucible 3 is being cleaned, the drain plate 22 moves to the bottom of the crucible to receive and discharge the cleaning liquid in the crucible 3. After cleaning, the drain plate 22 is removed to expose the electron beam emission hole so that it is facing the crucible, and normal coating work can be carried out.

[0041] Reference Figures 1 to 3 The water baffle 21 is vertically arranged around the drain plate 22. When the nozzle 63 rinses the crucible 3, the cleaning liquid overflows from the upper end of the crucible 3 and flows onto the drain plate 22. The water baffle 21 blocks the cleaning liquid to prevent it from overflowing into the vacuum chamber 11.

[0042] Reference Figures 2 to 4 The supporting mechanism includes a clamping frame 7, on which a support rod 74 is provided which is vertically slidably connected to the bracket 2, and the lower end of the support rod 74 passes through the box 1 and is connected to a cylinder for driving the support rod 74 to move up and down. The upper end of the support rod 74 is rotatably connected to a horizontally arranged rotating shaft 75, on which a clamping plate 71 is fixed. The center of the clamping plate 71 is fixedly connected to the rotating shaft 75.

[0043] Reference Figures 2 to 4A clamping screw 76 is provided on the clamping plate 71 along the length direction. The clamping screw 76 is provided with two sections of threads with opposite rotation directions, and the threads at both ends are connected with connecting blocks by threads, and the two connecting blocks are respectively connected with the annular plate 72 and the annular bottom plate 73. The annular plate 72 is located above the crucible 3, and the inner diameter of the annular plate 72 is not less than the inner diameter of the upper end of the crucible 3 but not greater than the outer diameter of the upper end of the crucible 3. The bottom plate 73 is located below the crucible 3.

[0044] Reference Figures 2 to 4 , the crucible 3 is installed between the annular plate 72 and the bottom plate 73, the bottom of the crucible 3 contacts the bottom plate 73, the clamping screw 76 rotates, the annular plate 72 and the bottom plate 73 move toward each other, and the annular plate 72 is pressed on the top of the crucible 3, so that the annular plate 72 is clamped and fixed. After the coating is completed, the support rod 74 drives the entire clamping plate 71 and the crucible 3 to move upward, and the upper end of the crucible 3 is embedded in the annular groove 42 for cleaning. After the nozzle 63 rinses the crucible 3, the baffle 4 is removed. The rotating shaft 75 rotates, and the clamping plate 71 drives the entire crucible 3 to rotate 180°, so that the opening of the crucible 3 faces downward to the drain plate 22, so that the cleaning liquid in the crucible 3 is discharged, which is convenient to use.

[0045] Reference Figures 2 to 4 The lower surface of the baffle plate 4 is provided with a receiving groove 43 that matches the annular plate 72 and the clamping plate 71. The clamping plate 71 drives the crucible 3 to move upward, the upper end of the crucible 3 is embedded in the annular groove 42, and the clamping plate 71 and the annular plate 72 are embedded in the receiving groove 43.

[0046] The implementation principle of a self-cleaning electron beam evaporation device in an embodiment of the present application is as follows: after coating, the baffle 4 rotates to the top of the crucible 3. The support rod 74 moves upward, and the upper end of the crucible 3 is embedded in the annular groove 42. The cleaning liquid is discharged from the water pipe 51 and sprayed from the nozzle 63 to rinse the inner wall of the crucible 3. During the cleaning liquid discharge process, the rotating disk 62 rotates while moving up and down to increase the cleaning range. After the cleaning is completed, the support rod 74 moves down a part, but the distance between the lower end of the crucible 3 and the drain plate 22 is greater than the height of the crucible 3. At this time, the upper end of the crucible 3 is out of the annular groove 42, and there is a distance between the baffle 4 and the crucible 3. The baffle 4 is removed, the shaft 75 rotates, the crucible 3 rotates 180°, the crucible 3 opens downward, and the cleaning liquid is discharged. The shaft 75 rotates again to make the crucible 3 open upward, and the support rod 74 moves down to reset.

[0047] The above are all preferred embodiments of the present application, and the protection scope of the present application is not limited thereto. Therefore, any equivalent changes made according to the structure, shape, and principle of the present application should be included in the protection scope of the present application.

Claims

1. A self-cleaning electron beam evaporation device, comprising a box (1) having a vacuum chamber (11), wherein an electron beam emission hole is provided at the bottom of the vacuum chamber (11), wherein a bracket (2) located above the electron beam emission hole is provided in the vacuum chamber (11), a crucible (3) is provided on the bracket (2), and a baffle (4) located above the crucible (3) is horizontally rotatably connected in the vacuum chamber (11), characterized in that: A rotating rod (41) is vertically rotatably connected in the vacuum chamber (11), the rotating rod (41) is connected to the baffle (4), the rotating rod (41) is hollow, a soft water pipe (51) is arranged in the baffle (4), a plurality of nozzles (63) connected to the water pipe (51) are arranged on the lower surface of the baffle (4), and one end of the water pipe (51) away from the nozzle (63) extends from the lower end of the rotating rod (41) and is connected to a clean water tank (5).

2. A self-cleaning electron beam evaporation device according to claim 1, characterized in that: The lower surface of the baffle (4) is provided with an inwardly concave annular groove (42) adapted to the upper end surface of the crucible (3), and the nozzle (63) is located in the inner circle of the annular groove (42).

3. A self-cleaning electron beam evaporation device according to claim 2, characterized in that: A water spray disc (6) located in the inner circle of the annular groove (42) is provided at the center of the lower surface of the baffle (4); the edge of the water spray disc (6) is slidably connected to the baffle (4) via a soft bellows (64); and the spray head (63) is mounted on the water spray disc (6).

4. A self-cleaning electron beam evaporation device according to claim 3, characterized in that: A vertical pipe (611) vertically connected to the water spray disc (6) is fixed above the water spray disc (6); the vertical pipe (611) is connected to the water pipe (51) through a hose (65); a driving impeller (52) whose axis is perpendicular to the axis of the water spray disc (6) is rotatably connected inside the water pipe (51); the driving impeller (52) is coaxially connected to a driving shaft (521); the driving shaft (521) passes through the water pipe (51) and is connected to a driving gear (522); the driving gear (522) is an incomplete gear; two opposite reciprocating racks (612) are fixed above the water spray disc (6); the driving gear (522) is rotatably connected between the two reciprocating racks (612); and the driving gear (522) can only mesh with one of the reciprocating racks (612) at the same time.

5. A self-cleaning electron beam evaporation device according to claim 4, characterized in that: The water spray disc (6) comprises a fixed disc (61) and a rotating disc (62) rotatably connected to the lower side of the fixed disc (61); the fixed disc (61) is connected to a bellows (64); a rotating tube (621) is vertically fixed to the center of the rotating disc (62); the lower end of the vertical tube (611) passes through the fixed disc (61) and is rotatably connected to the rotating tube (621); the rotating disc (62) is hollow and has a drainage cavity (622) formed therein; the lower end of the rotating tube (621) is located in the drainage cavity (622); a plurality of communication holes (6211) for connecting the rotating tube (621) and the drainage cavity (622) are uniformly formed on the side wall of the rotating tube (621) in a circumferential direction; the communication holes (6211) are horizontally and obliquely formed on the side wall of the rotating tube (621); and the spray head (63) is mounted on the lower surface of the rotating disc (62) and is connected to the drainage cavity (622).

6. A self-cleaning electron beam evaporation device according to claim 4, characterized in that: A plurality of return springs (66) are provided on the upper surface of the water spray disc (6); one end of the return spring (66) away from the water spray disc (6) is connected to the baffle (4); when the return spring (66) is in a natural state, the lower surface of the water spray disc (6) is not lower than the lower surface of the baffle (4).

7. The self-cleaning electron beam evaporation device according to claim 1, characterized in that: The nozzle (63) comprises an inclined nozzle (631) located at the edge and a straight nozzle (632) located at the center, the straight nozzle (632) faces the bottom of the crucible (3), the inclined nozzle (631) faces the side wall of the crucible (3), and the angle between the inclined nozzle (631) and the vertical straight line gradually decreases towards the direction approaching the straight nozzle (632).

8. The self-cleaning electron beam evaporation device according to claim 1, characterized in that: The support (2) is provided with a clamping frame (7) for clamping the crucible (3), and the clamping frame (7) includes a vertically arranged clamping plate (71), and the clamping plate (71) is vertically slidably connected with an annular plate (72) and a bottom plate (73), the annular plate (72) is located above the crucible (3), and the inner diameter of the annular plate (72) is not less than the inner diameter of the upper end of the crucible (3) but not greater than the outer diameter of the upper end of the crucible (3), and the bottom plate (73) is located below the crucible (3), and the clamping frame (7) is vertically slidably connected with a support rod (74), and the upper end of the support rod (74) is rotatably connected with a rotating shaft (75), and the rotating shaft (75) is fixedly connected to the middle of the clamping plate (71).

9. The self-cleaning electron beam evaporation device according to claim 8, characterized in that: The support (2) comprises a drainage plate (22) horizontally slidably connected to the vacuum chamber (11), the drainage plate (22) is surrounded by vertically upward water retaining plates (21), the drainage plate (22) is provided with drainage holes, and the drainage holes are connected to the drainage box (8) through a soft drainage pipe (81).

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