Photoetching machine mask micromotion platform with voice coil driving structure

By adopting voice coil driving structure and displacement sensing components on the micro-moving platform, the problem that the existing micro-moving platform cannot meet the manufacturing requirements of high-precision masks is solved, and higher response speed, accuracy and efficiency are achieved.

CN119717411APending Publication Date: 2025-03-28JIAXING WEITUO ELECTRONICS TECH CO LTD
View PDF 1 Cites 0 Cited by

Patent Information

Application Number
CN202510134267.8
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-02-07
Publication Date
2025-03-28

AI Technical Summary

Technical Problem

The existing micro-moving platform cannot meet the requirements of improving the manufacturing accuracy of semiconductor integrated circuit masks, and the driving structure response speed and motion accuracy are insufficient.

Method used

The micro-moving platform adopting a voice coil driving structure includes a fixed support substrate, an adapter support base block, a limit retaining support plate, a rolling support ball bead, a pivoting limit bolt, a movable matching pad block, a movable assembly carrier plate and a voice coil driving assembly. The voice coil driving assembly drives the movable assembly carrier plate and is equipped with a displacement sensing assembly and a clamping positioning assembly.

Benefits of technology

It improves the response speed, motion accuracy and smoothness of the micro-moving platform, enhances the accuracy and efficiency of mask plate manufacturing, and adapts to different models and specifications of mask plates.

✦ Generated by Eureka AI based on patent content.

Smart Images

  • Figure CN119717411A_ABST
    Figure CN119717411A_ABST
Patent Text Reader

Abstract

The invention provides a photoetching machine mask micro-motion platform with a voice coil driving structure, which comprises a fixed support substrate, an adapter bracket seat block, a limit retaining support plate, a rolling support ball bead, a pivoting limit bolt, a movable matching cushion block, a movable assembly carrier plate and a voice coil driving component, and is characterized in that the driving structure of the micro-motion platform is manufactured by adopting a voice coil motor; the response speed and the motion precision of the micro-motion platform are greatly improved, the motion smoothness of the platform is improved, the voice coil motor is a direct-drive motor, intermediate transmission links are reduced, the energy loss is reduced, the efficiency and the response speed of the system are improved, and the service life of the micro-motion platform is prolonged. The displacement sensor feeds back the position of the micro-motion platform to the controller in real time to control the motion of the coarse motion platform, so that the motion heights of the coarse motion platform and the micro-motion platform are consistent, the precision of the whole motion platform is improved, and the manufacturing precision and efficiency of the mask plate are greatly improved.
Need to check novelty before this filing date? Find Prior Art

Description

Technical Field

[0001] The invention relates to integrated circuit production equipment, and in particular to a photolithography machine mask micro-motion platform with a voice coil driving structure. Background Art

[0002] Patent document CN113820924B discloses a micro-motion platform, which includes a base, a driving mechanism and a moving seat, the moving seat is arranged at intervals on the upper side of the base, the driving mechanism is installed between the base and the moving seat, the driving mechanism includes at least three circumferentially spaced driving members, the driving direction of the driving member is perpendicular to the supporting plane of the moving seat, and the driving end of the driving member is flexibly connected to the moving seat; at least three height sensors and at least three plane sensors are arranged between the base and the moving seat, at least three height sensors and plane sensors are distributed at the corners of the moving seat, the height sensor detects the height displacement of the moving seat, the plane sensor detects the plane displacement of the moving seat, and the detection directions of at least three plane sensors are arranged in an intersecting manner. However, with the development of semiconductor integrated circuits, the manufacturing accuracy requirements for the mask are getting higher and higher, and thus the requirements for the micro-motion platform carrying the mask are also constantly increasing, and this conventional micro-motion platform can no longer meet its requirements. Therefore, it is necessary to optimize its structure to overcome the above defects. Summary of the invention

[0003] The purpose of the present invention is to provide a photolithography machine mask micro-motion platform with a voice coil driving structure.

[0004] The technical solution adopted by the present invention to solve the technical problem is:

[0005] A photolithography machine mask micro-motion platform with a voice coil drive structure, comprising:

[0006] A fixed support substrate, which is installed in the coarse motion platform of the photolithography machine through a connecting piece and has an assembly space inside;

[0007] A transfer support seat block, which is provided with a plurality of pieces, each of which is mounted on the top of the fixed support base plate through a connecting piece and protrudes above the fixed support base plate;

[0008] A limit-holding support plate, which is provided with a plurality of pieces, each of which is located above the transfer support block, and has a limit hole formed inside, and the limit hole is provided with a plurality of pieces, each of which penetrates through both ends of the limit-holding support plate in the axial direction, and is arranged in sequence along the circumference of the limit-holding support plate;

[0009] The rolling support ball is provided with a plurality of pieces, each of which is placed in a limit hole, and its two ends are exposed from both sides of the limit holding support plate, and the position of the rolling support ball is maintained by the limit holding support plate. The bottom of the rolling support ball is placed on the top of the transfer support seat block, and can roll on the transfer support seat block;

[0010] A pivoting limit bolt, the bolt rod of which passes through the bottom of the transfer support block from the middle and is then screwed into the movable assembly carrier plate, the bolt head of which protrudes above the transfer support block, a pivoting core hole is provided in the limit holding support plate, the bolt head extends into the pivoting core hole, so that the limit holding support plate and the rolling support pad ball can be deflected on the bolt head;

[0011] The movable matching pad is provided with a plurality of pieces, each of which corresponds to the position of the transfer support seat block, and the bottom of the movable matching pad is placed on the top of the rolling support ball and can move on the rolling support ball;

[0012] A movable assembly carrier plate, which is located above the movable matching pad, and whose bottom is connected to the movable matching pad by a connecting piece, and can move together with the movable matching pad;

[0013] The voice coil driving component is installed between the fixed support base plate and the movable assembly carrier plate, and the movable assembly carrier plate is driven to move by the voice coil driving component.

[0014] Specifically, the voice coil drive assembly includes:

[0015] A pair of transverse voice coil stators are provided, each transverse voice coil stator is respectively mounted on two ends of a fixed support substrate and arranged in a transverse direction;

[0016] A pair of transverse voice coil movers are provided, each of which is installed at both ends of the movable assembly carrier plate, arranged in the transverse direction, and respectively cooperated with the transverse voice coil stator, and the movable assembly carrier plate is driven to move in the transverse direction by the transverse voice coil stator and the transverse voice coil mover;

[0017] A pair of longitudinal voice coil stators are provided, each longitudinal voice coil stator is respectively mounted on two ends of a fixed support substrate and arranged in the longitudinal direction;

[0018] A pair of longitudinal voice coil movers are provided, each longitudinal voice coil mover is respectively installed at two ends of the movable assembly carrier plate, arranged in the longitudinal direction, and respectively cooperate with the longitudinal voice coil stator. The movable assembly carrier plate is driven to move in the longitudinal direction by the longitudinal voice coil stator and the longitudinal voice coil mover.

[0019] In one embodiment of the present invention, the micro-motion platform further comprises:

[0020] The displacement sensing component is installed between the movable assembly carrier plate and the movable assembly carrier plate, and the displacement sensing component senses the moving distance of the movable assembly carrier plate.

[0021] Specifically, the displacement sensing component includes:

[0022] A lateral sensing seat plate, the lateral sensing seat plate being mounted on an edge of a fixed supporting base plate;

[0023] A transverse sensing terminal, which is mounted on the transverse sensing base plate and points toward the movable assembly carrier plate;

[0024] A transverse sensing end plate, which is mounted on the movable assembly carrier and can move with the movable assembly carrier, and cooperates with the transverse sensing terminal, so that the transverse sensing terminal can sense the transverse movement distance of the movable assembly carrier through the movement process of the transverse sensing end plate;

[0025] A longitudinal sensing seat plate, the longitudinal sensing seat plate being mounted on an edge of a fixed supporting base plate;

[0026] A longitudinal sensing terminal, which is mounted on the longitudinal sensing base plate and points to the movable assembly carrier plate;

[0027] A longitudinal sensing end plate, which is mounted on the movable assembly carrier plate and can move with the movable assembly carrier plate, cooperates with the longitudinal sensing end head, so that the longitudinal sensing end head can sense the longitudinal movement distance of the movable assembly carrier plate through the movement process of the longitudinal sensing end plate;

[0028] A transverse reflective mirror surface, which is mounted on the movable assembly carrier plate through a support block and arranged in the transverse direction, and can sense the transverse movement distance of the movable assembly carrier plate through a transverse photoelectric sensing device adapted thereto;

[0029] The longitudinal reflecting mirror is installed on the movable assembly carrier through a supporting seat block and arranged in the longitudinal direction. The longitudinal moving distance of the movable assembly carrier can be sensed by a longitudinal photoelectric sensing device adapted thereto.

[0030] The transverse sensing terminal and the longitudinal sensing terminal are connected to the coarse motion platform through lines respectively, and the position information of the movable assembly carrier can be transmitted to the coarse motion platform. Its structure is the existing technology, so it is not described in detail.

[0031] In one embodiment of the present invention, the micro-motion platform further comprises:

[0032] The clamping and positioning component is installed on the movable assembly carrier and can move with the movable assembly carrier. There is a space for placing the mask plate inside it. The clamping and positioning component clamps and positions the mask plate and drives the mask plate to move together.

[0033] Specifically, the clamping and positioning assembly includes:

[0034] Transverse holes, which are provided in two groups, each group of transverse holes is respectively opened in the movable assembly carrier plate, and the connection line formed by them extends in the transverse direction;

[0035] Longitudinal holes, which are provided in two groups, each group of longitudinal holes is respectively opened in the movable assembly carrier plate, and the connection line formed by them extends in the longitudinal direction;

[0036] An oblique notch is provided in the movable assembly carrier plate and extends in an oblique direction, and its position corresponds to the position of the transverse eyelet and the longitudinal eyelet;

[0037] A pair of transverse seat blocks are provided, each transverse seat block is installed in the movable assembly carrier plate through a connecting bolt adapted to the transverse hole, and the installation position can be adjusted along the connecting line formed by the transverse hole;

[0038] A pair of transverse rollers are provided, each of which is mounted on a transverse seat block through a rotating structure, and can be adjusted along with the transverse seat block to adjust the installation position and to fit the longitudinal edge shape of the mask plate. The transverse rollers are used to position the longitudinal edge of the mask plate;

[0039] A pair of longitudinal seat blocks are provided, each of which is installed in the movable assembly carrier plate through a connecting bolt adapted to the longitudinal eyelet, and the installation position can be adjusted along the connecting line formed by the longitudinal eyelet;

[0040] A pair of longitudinal rollers are provided, each of which is mounted on a longitudinal seat block through a rotating structure, and can be adjusted in mounting position together with the longitudinal seat block, and the longitudinal rollers are used to position the lateral edge of the mask;

[0041] A guide rail, which is located in the oblique groove, extends in an oblique direction, and is connected to the movable assembly carrier plate through a connecting bolt;

[0042] A clamping seat plate, which is located in the oblique notch and is mounted on the guide rail through a slider and can move along the guide rail;

[0043] A clamping tension spring, which is located in the oblique notch, one end of which is engaged with the clamping seat plate, and the other end of which is engaged with the movable assembly carrier plate;

[0044] A clamping seat block, which is mounted on the clamping seat plate and can move with the clamping seat plate;

[0045] A pair of clamping rollers are provided, each of which is mounted on a clamping seat block through a rotating structure, can move with the clamping seat block, and is respectively adapted to the shape of the lateral and longitudinal edges of the mask plate, and the lateral and longitudinal edges of the mask plate are positioned and clamped by the clamping rollers;

[0046] A drive frame, which is located in the oblique slot and is engaged with the movable assembly carrier plate by connecting bolts;

[0047] A driving cylinder, the cylinder body of which is mounted on the driving frame, and the end of the piston rod of which is engaged with the clamping seat plate;

[0048] A pair of suction supports are provided, each suction support is installed in the movable assembly carrier through connecting bolts, and is connected to the suction equipment through a pipeline, and the suction support is used to suction and position the mask.

[0049] The lateral positioning structure and the longitudinal positioning structure of the clamping and positioning assembly can adjust the installation position along the lateral and longitudinal holes respectively; the clamping drive structure is installed through the oblique slot and can move obliquely, and can flexibly adapt to masks of different sizes, thereby improving the versatility and applicability of the lithography machine; the driving cylinder can automatically drive the clamping seat plate to move, thereby realizing rapid clamping and release of the mask, thereby improving the automation degree and efficiency of the lithography process; the detachable connection structure and the adjustable installation position can adapt to masks of different models and specifications, thereby improving the compatibility and flexibility of the equipment.

[0050] In one embodiment of the present invention, the micro-motion platform further comprises:

[0051] A positioning mark plate body, which is mounted on the top of the movable assembly carrier plate through a positioning seat block, and the movable assembly carrier plate can be aligned through the positioning mark plate body;

[0052] A light intensity sensing module is installed on the top of the movable assembly carrier through a positioning seat plate, and the light intensity of the photolithography mechanism can be sensed by the light intensity sensing module.

[0053] In one embodiment of the present invention, the voice coil drive assembly further comprises:

[0054] Transverse limit switch, which has two groups, each group of which is installed at both ends of the fixed support base plate and cooperates with the transverse voice coil mover to limit the movement range of the transverse voice coil mover;

[0055] The longitudinal limit switch is provided with two groups, each group of longitudinal limit switches is respectively installed at the two ends of the movable assembly carrier plate and cooperates with the longitudinal voice coil mover. The longitudinal limit switch limits the movement range of the longitudinal voice coil mover.

[0056] The advantages of the present invention are:

[0057] The driving structure of the micro-motion platform is made of voice coil motor, which not only greatly improves the response speed and movement accuracy of the micro-motion platform, but also improves the smoothness of the platform movement. The voice coil motor is a direct-drive motor, which reduces the intermediate transmission links, reduces energy loss, and improves the efficiency and response speed of the system. The displacement sensor feeds back the position of the micro-motion platform to the controller in real time to control the movement of the coarse motion platform, making the coarse and fine motion platform movements highly consistent, improving the accuracy of the entire motion platform, and greatly improving the manufacturing accuracy and efficiency of the mask. BRIEF DESCRIPTION OF THE DRAWINGS

[0058] Figure 1 It is a structural schematic diagram of a mask micro-motion platform of a photolithography machine with a voice coil driving structure proposed by the present invention;

[0059] Figure 2 This is a partial exploded view of the micro-motion platform;

[0060] Figure 3 It is a structural schematic diagram of the clamping and positioning assembly. DETAILED DESCRIPTION

[0061] In order to make the purpose, technical scheme and advantages of the embodiments of the present invention clearer, the technical scheme in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are part of the embodiments of the present invention, not all of the embodiments. The components of the embodiments of the present invention generally described and shown in the drawings here can be arranged and designed in various different configurations. Therefore, the following detailed description of the embodiments of the present invention provided in the drawings is not intended to limit the scope of the claimed invention, but merely represents selected embodiments of the present invention. Based on the embodiments in the present invention, all other embodiments obtained by ordinary technicians in this field without making creative work belong to the scope of protection of the present invention.

[0062] like Figure 1 to Figure 3As shown, the reticle micro-motion platform of the lithography machine with a voice coil drive structure proposed by the present invention comprises a fixed support substrate 101, an adapter support seat block 102, a limit holding support plate 103, a rolling support pad ball 104, a pivot limit bolt 105, a movable matching pad block 106, a movable assembly carrier plate 107 and a voice coil drive component. The fixed support substrate is installed in the coarse motion platform of the lithography machine through a connecting piece, and has an assembly space inside. The adapter support seat block is provided with a plurality of pieces, each of which is respectively installed on the top of the fixed support substrate through a connecting piece and protrudes above the fixed support substrate. The limit holding support plate is provided with a plurality of pieces, each of which is respectively located above the adapter support seat block, and a limit hole is provided inside. The limit hole is provided with a plurality of pieces, each of which passes through both ends of the limit holding support plate along the axial direction, and is arranged sequentially along the circumference of the limit holding support plate. The rolling support pad ball is provided with a plurality of pieces, each of which is respectively placed in the limit hole, and its The two ends are exposed from both sides of the limit holding support plate respectively, and the position of the rolling support pad ball is maintained by the limit holding support plate, and the bottom of the rolling support pad ball is placed on the top of the transfer support seat block, and can roll on the transfer support seat block, and the bolt rod of the pivot limit bolt passes through the bottom of the transfer support seat block from the middle and is screwed into the movable assembly carrier plate, and its bolt head protrudes above the transfer support seat block, and a pivot core hole is opened in the limit holding support plate, and the bolt head extends into the pivot core hole, so that the limit holding support plate and the rolling support pad ball can be deflected on the bolt head, and the movable matching pad block is provided with a plurality of parts, each movable matching pad block corresponds to the position of the transfer support seat block respectively, and its bottom is placed on the top of the rolling support pad ball, and can move on the rolling support pad ball, and the movable assembly carrier plate is located above the movable matching pad block, and its bottom is connected with the movable matching pad block through a connecting piece, and can move with the movable matching pad block, and the voice coil drive component is installed between the fixed supporting substrate and the movable assembly carrier plate, and the movable assembly carrier plate is driven to move by the voice coil drive component.

[0063] In this embodiment, the voice coil driving assembly includes a transverse voice coil stator 201, a transverse voice coil mover 202, a longitudinal voice coil stator 203 and a longitudinal voice coil mover 204. A pair of transverse voice coil stators are provided, each of which is installed at two ends of a fixed support substrate and arranged in the transverse direction. A pair of transverse voice coil movers are provided, each of which is installed at two ends of a movable assembly carrier plate, arranged in the transverse direction and respectively cooperated with the transverse voice coil stator. The movable assembly carrier plate is driven to move in the transverse direction by the transverse voice coil stator and the transverse voice coil mover. A pair of longitudinal voice coil stators are provided, each of which is installed at two ends of a fixed support substrate and arranged in the longitudinal direction. A pair of longitudinal voice coil movers are provided, each of which is installed at two ends of a movable assembly carrier plate, arranged in the longitudinal direction and respectively cooperated with the longitudinal voice coil stator. The movable assembly carrier plate is driven to move in the longitudinal direction by the longitudinal voice coil stator and the longitudinal voice coil mover.

[0064] In this embodiment, the voice coil drive assembly further includes a transverse limit switch 205 and a longitudinal limit switch 206. Two groups of transverse limit switches are provided. Each group of transverse limit switches is respectively installed at both ends of the fixed support substrate and cooperates with the transverse voice coil mover. The transverse limit switch limits the movement range of the transverse voice coil mover. Two groups of longitudinal limit switches are provided. Each group of longitudinal limit switches is respectively installed at both ends of the movable assembly carrier and cooperates with the longitudinal voice coil mover. The longitudinal limit switch limits the movement range of the longitudinal voice coil mover.

[0065] In this embodiment, the micro-motion platform further includes a displacement sensing component, which is installed between the movable assembly carrier plate and the movable assembly carrier plate, and the displacement sensing component senses the moving distance of the movable assembly carrier plate.

[0066] Specifically, the displacement sensing component includes a transverse sensing base plate 301, a transverse sensing terminal 302, a transverse sensing end plate 303, a longitudinal sensing base plate 304, a longitudinal sensing terminal 305, a longitudinal sensing end plate 306, a transverse reflection mirror 307 and a longitudinal reflection mirror 308. The transverse sensing base plate is installed on the edge of the fixed support substrate, the transverse sensing terminal is installed on the transverse sensing base plate and points to the movable assembly carrier, the transverse sensing end plate is installed on the movable assembly carrier and can move with the movable assembly carrier, and it cooperates with the transverse sensing terminal so that the transverse sensing terminal can sense the transverse movement distance of the movable assembly carrier through the movement process of the transverse sensing end plate, the longitudinal sensing base plate is installed on the edge of the fixed support substrate, and the longitudinal sensing terminal is installed on the transverse sensing base plate. The longitudinal sensing end is installed on the longitudinal sensing base plate and points to the movable assembly carrier. The longitudinal sensing end plate is installed on the movable assembly carrier and can move with the movable assembly carrier. It cooperates with the longitudinal sensing end so that the longitudinal sensing end can sense the longitudinal movement distance of the movable assembly carrier through the movement process of the longitudinal sensing end plate. The transverse reflection mirror is installed on the movable assembly carrier through a support seat block and arranged in the transverse direction. The transverse movement distance of the movable assembly carrier can be sensed by a transverse photoelectric sensing device adapted thereto. The longitudinal reflection mirror is installed on the movable assembly carrier through a support seat block and arranged in the longitudinal direction. The longitudinal movement distance of the movable assembly carrier can be sensed by a longitudinal photoelectric sensing device adapted thereto.

[0067] In this embodiment, the micro-motion platform also includes a clamping and positioning component 400, which is installed on the movable assembly carrier and can move with the movable assembly carrier. It has a space for placing the mask plate inside. The clamping and positioning component clamps and positions the mask plate and drives the mask plate to move together.

[0068] Specifically, the clamping and positioning assembly includes a transverse eyelet 401, a longitudinal eyelet 402, an oblique notch 403, a transverse seat block 404, a transverse roller 405, a longitudinal seat block 406, a longitudinal roller 407, a guide rail 408, a clamping seat plate 409, a clamping tension spring 410, a clamping seat block 411, a clamping roller 412, a driving seat frame 413, a driving cylinder 414 and a suction support 415;

[0069] There are two groups of transverse holes, each group of transverse holes is respectively opened in the movable assembly carrier plate, and the connection line formed by them extends in the transverse direction;

[0070] There are two groups of longitudinal holes, each group of longitudinal holes is respectively opened in the movable assembly carrier plate, and the connection line formed by them extends in the longitudinal direction;

[0071] The oblique slot is formed in the movable assembly carrier plate and extends in an oblique direction, and its position corresponds to the position of the transverse hole and the longitudinal hole;

[0072] A pair of transverse seat blocks are provided, each transverse seat block is installed in the movable assembly carrier plate through a connecting bolt adapted to the transverse hole, and the installation position can be adjusted along the connecting line formed by the transverse hole;

[0073] A pair of transverse rollers are provided, each of which is installed on a transverse seat block through a rotating structure, and can adjust the installation position together with the transverse seat block, and adapt to the shape of the longitudinal edge of the mask, and the transverse roller positions the longitudinal edge of the mask;

[0074] A pair of longitudinal seat blocks are provided, each of which is installed in the movable assembly carrier plate through connecting bolts adapted to the longitudinal holes, and the installation position can be adjusted along the connecting line formed by the longitudinal holes;

[0075] A pair of longitudinal rollers are provided, each of which is installed on a longitudinal seat block through a rotating structure, and the installation position can be adjusted together with the longitudinal seat block, and the longitudinal rollers are used to position the transverse edge of the mask;

[0076] The guide rail is located in the oblique groove, extends in an oblique direction, and is connected to the movable assembly carrier plate through connecting bolts;

[0077] The clamping seat plate is located in the oblique notch and is mounted on the guide rail through a slider and can move along the guide rail;

[0078] The clamping tension spring is located in the oblique notch, one end of which is engaged with the clamping seat plate, and the other end of which is engaged with the movable assembly carrier plate;

[0079] The clamping seat block is installed on the clamping seat plate and can move with the clamping seat plate;

[0080] A pair of clamping rollers are provided, each of which is installed on the clamping seat block through a rotating structure, can move with the clamping seat block, and is respectively adapted to the shape of the horizontal edge and the longitudinal edge of the mask plate, and the clamping rollers are used to position and clamp the horizontal edge and the longitudinal edge of the mask plate;

[0081] The drive seat frame is located in the oblique slot and is engaged with the movable assembly carrier plate by connecting bolts;

[0082] The cylinder body of the driving cylinder is mounted on the driving seat frame, and the end of the piston rod thereof is engaged with the clamping seat plate;

[0083] A pair of suction supports are provided, each suction support is installed in the movable assembly carrier through connecting bolts, and is connected with the suction equipment through pipelines, and the suction support is used to suction and position the mask.

[0084] In this embodiment, the micro-motion platform also includes a positioning mark plate 510 and a light intensity sensing module 520. The positioning mark plate is installed on the top of the movable assembly carrier through a positioning seat block, and the movable assembly carrier can be aligned through the positioning mark plate. The light intensity sensing module is installed on the top of the movable assembly carrier through a positioning seat plate, and the light intensity of the lithography mechanism can be sensed through the light intensity sensing module.

[0085] In the description of the present invention, it should be noted that when terms such as "upper", "lower", "inner", "outer", "left", "right" and the like indicating orientation or positional relationship appear, it should be understood that the orientation or positional relationship shown in the drawings, or the orientation or positional relationship in which the invention product is usually placed when in use, or the orientation or positional relationship commonly understood by those skilled in the art, is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the equipment or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation of the present invention. In addition, when terms such as "first" and "second" appear, they are only used to distinguish the description, and cannot be understood as indicating or implying relative importance. In the description of the present invention, it should also be noted that, unless otherwise clearly specified and limited, terms such as "installation", "setting", and "connection" should be understood in a broad sense. For example, "connection" can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or an indirect connection through an intermediate medium, or it can be a connection between the two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

Claims

1. A photolithography machine mask micro-motion platform with a voice coil drive structure, characterized in that: include: A fixed support substrate, which is installed in the coarse motion platform of the photolithography machine through a connecting piece and has an assembly space inside; A transfer support seat block, which is provided with a plurality of pieces, each of which is mounted on the top of the fixed support base plate through a connecting piece and protrudes above the fixed support base plate; A limit-holding support plate, which is provided with a plurality of pieces, each of which is located above the transfer support block, and has a limit hole formed inside, and the limit hole is provided with a plurality of pieces, each of which penetrates through both ends of the limit-holding support plate in the axial direction, and is arranged in sequence along the circumference of the limit-holding support plate; The rolling support ball is provided with a plurality of pieces, each of which is placed in a limit hole, and its two ends are exposed from both sides of the limit holding support plate, and the position of the rolling support ball is maintained by the limit holding support plate. The bottom of the rolling support ball is placed on the top of the transfer support seat block, and can roll on the transfer support seat block; A pivoting limit bolt, the bolt rod of which passes through the bottom of the transfer support block from the middle and is then screwed into the movable assembly carrier plate, the bolt head of which protrudes above the transfer support block, a pivoting core hole is provided in the limit holding support plate, the bolt head extends into the pivoting core hole, so that the limit holding support plate and the rolling support pad ball can be deflected on the bolt head; The movable matching pad is provided with a plurality of pieces, each of which corresponds to the position of the transfer support seat block, and the bottom of the movable matching pad is placed on the top of the rolling support ball and can move on the rolling support ball; A movable assembly carrier plate, which is located above the movable matching pad, and whose bottom is connected to the movable matching pad by a connecting piece, and can move together with the movable matching pad; The voice coil driving component is installed between the fixed support base plate and the movable assembly carrier plate, and the movable assembly carrier plate is driven to move by the voice coil driving component.

2. The photolithography machine mask fine-motion platform with a voice coil drive structure according to claim 1, characterized in that: The voice coil drive assembly includes: A pair of transverse voice coil stators are provided, each transverse voice coil stator is respectively mounted on two ends of a fixed support substrate and arranged in a transverse direction; A transverse voice coil mover, wherein a pair of transverse voice coil movers are provided, each transverse voice coil mover is respectively mounted on two ends of the movable assembly carrier plate, arranged in the transverse direction, and respectively cooperates with the transverse voice coil stator; A pair of longitudinal voice coil stators are provided, each longitudinal voice coil stator is respectively mounted on two ends of a fixed support substrate and arranged in the longitudinal direction; A pair of longitudinal voice coil movers are provided, each longitudinal voice coil mover is respectively mounted on two ends of a movable assembly carrier plate, arranged in the longitudinal direction, and respectively matched with the longitudinal voice coil stator.

3. The photolithography machine mask fine-motion platform with a voice coil drive structure according to claim 1, characterized in that: Also includes: The displacement sensing component is installed between the movable assembly carrier plate and the movable assembly carrier plate, and the displacement sensing component senses the moving distance of the movable assembly carrier plate.

4. The photolithography machine mask fine-motion platform with a voice coil drive structure according to claim 3, characterized in that: The displacement sensing components include: A lateral sensing seat plate, the lateral sensing seat plate being mounted on an edge of a fixed supporting base plate; A transverse sensing terminal, which is mounted on the transverse sensing base plate and points toward the movable assembly carrier plate; A transverse sensing end plate, which is mounted on the movable assembly carrier and can move with the movable assembly carrier, and cooperates with the transverse sensing end head; A longitudinal sensing seat plate, the longitudinal sensing seat plate being mounted on an edge of a fixed supporting base plate; A longitudinal sensing terminal, which is mounted on the longitudinal sensing base plate and points to the movable assembly carrier plate; A longitudinal sensing end plate, which is mounted on the movable assembly carrier plate and can move with the movable assembly carrier plate, and cooperates with the longitudinal sensing end head; A transverse reflecting mirror surface, which is mounted on the movable assembly carrier plate through a supporting block and arranged in a transverse direction; A longitudinal reflecting mirror surface is installed on the movable assembly carrier plate through a supporting seat block and is arranged in the longitudinal direction.

5. The photolithography machine mask fine-motion platform with a voice coil drive structure according to claim 1, characterized in that: Also includes: The clamping and positioning component is installed on the movable assembly carrier and can move with the movable assembly carrier. The clamping and positioning component has a space for placing the mask plate inside.

6. The photolithography machine mask fine-motion platform with a voice coil drive structure according to claim 5, characterized in that: The clamping and positioning assembly includes: Transverse holes, which are provided in two groups, each group of transverse holes is respectively opened in the movable assembly carrier plate, and the connection line formed by them extends in the transverse direction; Longitudinal holes, which are provided in two groups, each group of longitudinal holes is respectively opened in the movable assembly carrier plate, and the connection line formed by them extends in the longitudinal direction; An oblique notch is provided in the movable assembly carrier plate and extends in an oblique direction, and its position corresponds to the position of the transverse eyelet and the longitudinal eyelet; A pair of transverse seat blocks are provided, each of which is mounted in the movable assembly carrier plate via connecting bolts adapted to the transverse holes; A pair of transverse rollers are provided, each of which is mounted on a transverse seat block through a rotating structure, and can be adjusted in mounting position together with the transverse seat block, and adapted to the shape of the longitudinal edge of the mask; A pair of longitudinal seat blocks are provided, each of which is mounted in the movable assembly carrier plate via connecting bolts adapted to the longitudinal holes; A pair of longitudinal rollers are provided, each of which is mounted on a longitudinal seat block through a rotating structure and can be adjusted in position together with the longitudinal seat block; A guide rail, which is located in the oblique groove, extends in an oblique direction, and is connected to the movable assembly carrier plate through a connecting bolt; A clamping seat plate, which is located in the oblique notch and is mounted on the guide rail through a slider and can move along the guide rail; A clamping tension spring, which is located in the oblique notch, one end of which is engaged with the clamping seat plate, and the other end of which is engaged with the movable assembly carrier plate; A clamping seat block, which is mounted on the clamping seat plate and can move with the clamping seat plate; A pair of clamping rollers are provided, each of which is mounted on a clamping seat block through a rotating structure, can move with the clamping seat block, and is adapted to the shape of the horizontal and longitudinal edges of the mask plate; A drive frame, which is located in the oblique slot and is engaged with the movable assembly carrier plate by connecting bolts; A driving cylinder, the cylinder body of which is mounted on the driving frame, and the end of the piston rod of which is engaged with the clamping seat plate; A suction support is provided in pair, each suction support is respectively installed in the movable assembly carrier plate through connecting bolts, and is connected with the suction equipment through a pipeline.

7. The photolithography machine mask fine-motion platform with a voice coil drive structure according to claim 1, characterized in that: Also includes: A positioning mark plate body, which is mounted on the top of the movable assembly carrier plate through a positioning seat block; A light intensity sensing module is installed on the top of the movable assembly carrier plate through a positioning seat plate.

8. The photolithography machine mask fine-motion platform with a voice coil drive structure according to claim 2, characterized in that: The voice coil drive assembly also includes: Transverse limit switch, which has two groups, each group of which is installed at both ends of the fixed support base plate and cooperates with the transverse voice coil mover; The longitudinal limit switch is provided with two groups, each group of longitudinal limit switches is respectively installed at two ends of the movable assembly carrier plate and cooperates with the longitudinal voice coil mover.

Citation Information

Patent Citations

  • A micro-motion platform for a lithography machine

    CN113820924B