A rotary reciprocating photovoltaic silicon wafer cleaning device

Abstract

The present invention discloses a rotary reciprocating photovoltaic silicon wafer cleaning device, which relates to the technical field of photovoltaic silicon wafer cleaning, and includes a cleaning tank. Two sets of conveying components are arranged in the inner cavity of the cleaning tank, and a flushing component is arranged in the inner cavity of the cleaning tank. In this rotary reciprocating photovoltaic silicon wafer cleaning device, through the combined use of a reciprocating mechanism and a rotating mechanism, the rotating mechanism drives the conveying rod to rotate. When the photovoltaic silicon wafer is placed on the conveying rod for conveying, the photovoltaic silicon wafer will move a certain distance in the direction of the reciprocating mechanism and then move a certain distance in the reverse direction. Due to the setting that the number of teeth of one half gear is more and the number of teeth of the other half gear is less, the distance that the photovoltaic silicon wafer moves forward is greater than the distance that it moves backward. When the photovoltaic silicon wafer is located between two cleaning sponges, the reciprocating movement of the cleaning sponges will clean the photovoltaic silicon wafer, thereby achieving the effect of cleaning the same place of the photovoltaic silicon wafer multiple times.

Description

Technical Field

[0001] The present invention relates to the technical field of photovoltaic silicon wafer cleaning, and particularly to a rotary reciprocating photovoltaic silicon wafer cleaning device. Background Technique

[0002] Photovoltaic silicon wafers are high-purity sheet silicon formed by processes such as slicing, polishing, and cleaning of silicon rods. They are the core raw materials of photovoltaic cells and important semiconductor materials. They have characteristics such as high-efficiency conversion, long life, and low attenuation rate, and are the key materials for manufacturing solar cells.

[0003] In the prior art, cleaning equipment is usually used to clean photovoltaic silicon wafers. Although some existing cleaning equipment is provided with a wiping structure, when the photovoltaic silicon wafer passes through the wiping structure, the wiping structure mostly wipes the same place on the photovoltaic silicon wafer once, which is not convenient for repeatedly wiping the photovoltaic silicon wafer, resulting in a poor cleaning effect on the photovoltaic silicon wafer.

[0004] Combining the above problems, we will find that it is very difficult to avoid the above-mentioned problems simultaneously when the existing cleaning equipment on the market is in use. And even if it can be solved, it needs to be solved by cooperating with external tools, thus unable to achieve the desired effect. Therefore, we propose a rotary reciprocating photovoltaic silicon wafer cleaning device. Summary of the Invention

[0005] The purpose of the present invention is to provide a rotary reciprocating photovoltaic silicon wafer cleaning device to solve the problems raised in the above background technique.

[0006] To achieve the above purpose, the present invention provides the following technical solution: A rotary reciprocating photovoltaic silicon wafer cleaning device, including a cleaning box. Two sets of conveying components are arranged in the inner cavity of the cleaning box. A flushing component is arranged in the inner cavity of the cleaning box, and the flushing component is used to flush the photovoltaic silicon wafer. The conveying component includes a conveying rod rotatably connected to the inner cavity of the cleaning box. The number of the conveying rods is several. One end of the conveying rod penetrates to the outside of the cleaning box and is fixedly connected with a double-groove transmission shaft. Adjacent two of the double-groove transmission shafts are connected by a belt drive. A reciprocating mechanism is arranged between the opposite sides of the two conveying components, and the reciprocating mechanism is used to wipe the photovoltaic silicon wafer. A rotating mechanism for cooperating with the conveying component is arranged on one side of the cleaning box, and the rotating mechanism is used to drive the conveying rod. A feeding mechanism for cooperating with the reciprocating mechanism is arranged on the other side of the cleaning box, and the feeding mechanism is used to apply a cleaning agent to the surface of the photovoltaic silicon wafer.

[0007] Preferably, the reciprocating mechanism includes a fixed frame fixedly connected to the inner wall of the cleaning tank. The number of the fixed frames is two. A sliding plate is slidably connected to the inner cavity of the fixed frame. Cleaning sponges are fixedly connected to one side of the two fixed frames facing each other. Two guide rods are slidably connected to the inner cavity of the fixed frame. One side of the two guide rods facing each other is fixedly connected to the sliding plate. The other side of the two guide rods extends through the fixed frame and into the inner cavity of the cleaning tank. The surface of the guide rod is slidably connected to the inner cavity of the cleaning tank. One end of one of the guide rods is fixedly connected to a first spring. One end of the first spring is fixedly connected to the inner wall of the cleaning tank. A rotating rod is rotatably connected to the inner wall of the cleaning tank. A cam is fixedly connected to the surface of the rotating rod. The number of the cams is two. The surface of the cam contacts one end of the guide rod.

[0008] Preferably, the rotating mechanism includes a fixed frame fixedly connected to one side of the cleaning tank. Two first gears are rotatably connected to the inner cavity of the fixed frame. The two first gears are meshed with each other. A half gear is fixedly connected to one side of each of the two first gears. One end of two of the conveying rods penetrates to the outside of the cleaning tank and is fixedly connected to a second gear. A third gear is meshed between the two opposite sides of the two second gears. One side of the third gear is rotatably connected to the inner cavity of the cleaning tank. A fourth gear is fixedly connected to the other side of the third gear. The fourth gear is located between the two half gears. The fourth gear is meshed with the half gear. A first motor is fixedly connected to one side of the fixed frame. The output end of the first motor penetrates to the inner cavity of the fixed frame and is fixedly connected to one side of one of the first gears.

[0009] Preferably, a rotating rod is fixedly connected to one side of the third gear. The surface of the rotating rod is rotatably connected to the inner wall of the cleaning tank. A first bevel gear is fixedly connected to the surface of the rotating rod. A second bevel gear is fixedly connected to one end of the rotating rod. The first bevel gear is meshed with the second bevel gear.

[0010] Preferably, the flushing assembly includes a fixed pipe fixedly connected to one side of the cleaning tank. A water pump is arranged on one side of the fixed pipe. The output end of the water pump is fixedly communicated with the surface of the fixed pipe. Two sets of connecting assemblies are arranged in the inner cavity of the cleaning tank. The connecting assembly includes two fixed shells fixedly connected to the inner cavity of the cleaning tank. Spray heads are fixedly communicated with one side of the two fixed shells facing each other. The number of the spray heads is several. A connecting pipe is fixedly communicated with one side of the fixed shell. One end of the connecting pipe penetrates to the outside of the cleaning tank and is fixedly communicated with the surface of the fixed pipe.

[0011] Preferably, four support rods are fixedly connected to the top of the cleaning box. The top of the four support rods are jointly fixedly connected to a support plate. A hydraulic telescopic rod is fixedly connected to the top of the support plate. The telescopic end of the hydraulic telescopic rod penetrates through the support plate and is fixedly connected to a moving plate. A pressing roller for cooperating with the conveying rod is rotatably connected to the inner cavity of the moving plate. The number of the pressing rollers is several.

[0012] Preferably, the feeding mechanism includes a mounting plate fixedly connected to one side of the cleaning box. One side of the mounting plate is fixedly connected to a mounting rod. One end of the mounting rod is fixedly connected to a mounting cylinder. A piston block is slidably connected to the inner cavity of the mounting cylinder. One side of the piston block is fixedly connected to an adjusting rod. The surface of the adjusting rod is slidably connected to the inner cavity of the mounting cylinder. A liquid storage tank is fixedly connected to the top of the support plate. The number of the liquid storage tanks is two. A first one-way valve is fixedly communicated with the surface of the mounting cylinder. One end of the first one-way valve is fixedly communicated with a first long pipe. One ends of the two first long pipes are respectively fixedly communicated with one side of the two liquid storage tanks. Two second one-way valves are also fixedly communicated with the surface of the mounting cylinder. One end of the second one-way valve is fixedly communicated with a second long pipe. One ends of the two second long pipes both penetrate into the inner cavity of the cleaning box and are respectively communicated with the two fixed frames. Liquid outlet holes are formed in the inner wall of the fixed frame. The number of the liquid outlet holes is several. The liquid outlet holes are communicated with the mounting cylinder through the fixed frame, the second long pipe and the second one-way valve.

[0013] Preferably, one end of the adjusting rod is fixedly connected to a short rod. A toothed plate is slidably connected to one side of the short rod. A fifth gear for cooperating with the toothed plate is fixedly connected to one side of one of the double-groove transmission shafts. A sliding rod is slidably connected to the top of the cleaning box. The number of the sliding rods is two. The tops of the two sliding rods are jointly fixedly connected to a pressing rod. An extrusion block for cooperating with the pressing rod is fixedly connected to one side of the moving plate. An L-shaped rod is slidably connected to one side of the pressing rod. The number of the L-shaped rods is two. One ends of the two L-shaped rods are both fixedly connected to the toothed plate.

[0014] Preferably, a second spring is movably sleeved on the surface of the sliding rod. One end of the second spring is fixedly connected to the pressing rod. The other end of the second spring is fixedly connected to the top of the cleaning box. A third spring is movably sleeved on the surface of the adjusting rod. One end of the third spring is fixedly connected to the mounting cylinder. The other end of the third spring is fixedly connected to the surface of the short rod.

[0015] Preferably, a sealing ring is fixedly connected to the inner wall of the mounting cylinder. The inner wall of the sealing ring is in close contact with the surface of the adjusting rod.

[0016] Compared with the prior art, the beneficial effects of the present invention are:

[0017] 1. By setting the combined use of a reciprocating mechanism and a rotating mechanism, when the rotating mechanism drives the conveying rod to rotate and the photovoltaic silicon wafer is placed on the conveying rod for conveying, the photovoltaic silicon wafer will move a certain distance in the direction of the reciprocating mechanism and then move back a certain distance. Due to the setting that one half-gear has more teeth and the other half-gear has fewer teeth, the forward movement distance of the photovoltaic silicon wafer is greater than the reverse movement distance. When the photovoltaic silicon wafer is between two cleaning sponges, the reciprocating movement of the cleaning sponges will clean the photovoltaic silicon wafer. Combining the forward movement of the photovoltaic silicon wafer by a certain distance and then the reverse movement by a certain distance, the effect of cleaning the same place on the photovoltaic silicon wafer multiple times is achieved.

[0018] 2. By setting a feeding mechanism, when the conveying rod rotates, the fifth gear rotates synchronously. Using the cooperation between the fifth gear and the toothed plate, the piston block is driven to move in the inner cavity of the installation cylinder, so that the piston block squeezes the cleaning agent into the second long tube through the second one-way valve and discharges it from the liquid outlet hole, so that the cleaning agent is applied to the top and bottom of the photovoltaic silicon wafer, further enhancing the cleaning effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] Figure 1 is a schematic diagram of the overall structure of the present invention;

[0020] Figure 2 is a schematic diagram of the structure of the cleaning box, mounting plate and conveying rod of the present invention;

[0021] Figure 3 is a schematic diagram of the structure of the conveying rod, fixed tube and fixed shell of the present invention;

[0022] Figure 4 is a schematic diagram of the structure of the fixed frame, sliding plate and conveying rod of the present invention;

[0023] Figure 5 is an exploded view of the first gear, second gear and fourth gear of the present invention;

[0024] Figure 6 is a schematic diagram of the structure of the moving plate, pressing rod, installation cylinder and first long tube of the present invention;

[0025] Figure 7 is a sectional view of the installation cylinder of the present invention;

[0026] Figure 8 is an exploded view of the fixed frame and the sliding plate of the present invention.

[0027] In the figure: 1. Cleaning tank; 2. Conveying assembly; 201. Conveying rod; 202. Double-groove transmission shaft; 203. Belt; 3. Flushing assembly; 301. Fixed pipe; 302. Water pump; 303. Fixed housing; 304. Sprinkler head; 305. Connecting pipe; 4. Reciprocating mechanism; 401. Fixed frame; 402. Sliding plate; 403. Cleaning sponge; 404. Guide rod; 405. First spring; 406. Rotating rod; 407. Cam; 5. Rotating mechanism; 501. Fixed bracket; 502. First gear; 503. Half gear; 504. Second gear; 505. Third gear; 506. Fourth gear; 507. First motor; 508. Rotating rod; 509. First bevel gear; 510. Second bevel gear; 6. Feeding mechanism; 601. Mounting plate; 602. Mounting rod; 603. Mounting cylinder; 604. Piston block; 605. Adjusting rod; 606. Liquid storage tank; 607. First one-way valve; 608. First long pipe; 609. Second one-way valve; 610. Second long pipe; 611. Liquid outlet hole; 612. Short rod; 613. Rack; 614. Fifth gear; 615. Sliding rod; 616. Pressing rod; 617. Extrusion block; 618. L-shaped rod; 619. Second spring; 620. Third spring; 621. Sealing ring; 7. Support rod; 8. Support plate; 9. Hydraulic telescopic rod; 10. Moving plate; 11. Pressing roller. Detailed implementation manners

[0028] Next, the technical solutions in the embodiments of the present invention will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

[0029] Embodiment 1: Please refer to Figures 1-8The present invention provides a technical solution: a rotary reciprocating photovoltaic silicon wafer cleaning device, comprising a cleaning box 1, the inner cavity of the cleaning box 1 is provided with two groups of conveying components 2, the inner cavity of the cleaning box 1 is provided with a flushing component 3, the flushing component 3 is used to flush the photovoltaic silicon wafer, the conveying component 2 comprises a conveying rod 201 rotatably connected to the inner cavity of the cleaning box 1, the number of the conveying rods 201 is several, one end of the conveying rod 201 passes through the outside of the cleaning box 1 and is fixedly connected with a double-groove transmission shaft 202, the two adjacent double-groove transmission shafts 202 are connected by a belt 203, and the two conveying components 2 are connected on opposite sides. A reciprocating mechanism 4 is provided, and the reciprocating mechanism 4 is used to wipe the photovoltaic silicon wafers. A rotating mechanism 5 used in conjunction with the conveying component 2 is provided on one side of the cleaning box 1, and the rotating mechanism 5 is used to drive the conveying rod 201. A feeding mechanism 6 used in conjunction with the reciprocating mechanism 4 is provided on the other side of the cleaning box 1, and the feeding mechanism 6 is used to apply cleaning agent to the surface of the photovoltaic silicon wafers. By setting up a plurality of double-groove transmission shafts 202 and belts 203 for use in conjunction, when one of the conveying rods 201 is rotated, the conveying rods 201 of the same group can be driven to rotate, thereby achieving the effect of conveying the photovoltaic silicon wafers.

[0030] The reciprocating mechanism 4 includes a fixed frame 401 fixedly connected to the inner wall of the cleaning box 1, the number of the fixed frames 401 is two, the inner cavity of the fixed frame 401 is slidably connected to a sliding plate 402, the opposite sides of the two fixed frames 401 are fixedly connected to a cleaning sponge 403, the inner cavity of the fixed frame 401 is slidably connected to two guide rods 404, the opposite sides of the two guide rods 404 are fixedly connected to the sliding plate 402, the opposite sides of the two guide rods 404 penetrate the fixed frame 401 and extend to the inner cavity of the cleaning box 1, the surface of the guide rod 404 is slidably connected to the inner cavity of the cleaning box 1, one end of one of the guide rods 404 is fixedly connected to a first spring 405, and one end of the first spring 405 is fixedly connected to the inner wall of the cleaning box 1 The inner wall of the cleaning box 1 is rotatably connected with a rotating rod 406, and a cam 407 is fixedly connected to the surface of the rotating rod 406. There are two cams 407, and the surface of the cam 407 contacts one end of the guide rod 404. By setting a reciprocating mechanism 4, when the photovoltaic silicon wafer is located between the two cleaning sponges 403, the cam 407 is rotated so that the cam 407 squeezes the guide rod 404, so that the guide rod 404 drives the sliding plate 402 to move in the inner cavity of the fixed frame 401, and then the force deformation of the first spring 405 is used to make the guide rod 404 keep in contact with the cam 407, so that the sliding plate 402 drives the cleaning sponge 403 to reciprocate, thereby achieving the effect of multiple cleaning of the photovoltaic silicon wafer.

[0031] The specific implementation manner of this embodiment is as follows: Two fixed frames 401 are located between two sets of conveying components 2. A plurality of fixing rings are fixedly sleeved on the surface of the conveying rod 201. The photovoltaic silicon wafer is placed between two adjacent fixing rings, so that the bottom of the photovoltaic silicon wafer is horizontally flush with the top of the lower fixed frame 401. After the photovoltaic silicon wafer is located between two cleaning sponges 403, the rotation of the cam 407 will squeeze the guide rod 404, causing the guide rod 404 to drive the sliding plate 402 to move in the inner cavity of the fixed frame 401. Then, the force deformation of the first spring 405 is used to keep the guide rod 404 in contact with the cam 407, so that the sliding plate 402 drives the cleaning sponge 403 to move reciprocally, achieving the effect of cleaning the photovoltaic silicon wafer multiple times.

[0032] Embodiment 2: Please refer to Figures 1-8 , the present invention provides a technical solution: A rotary reciprocating photovoltaic silicon wafer cleaning device, and the present invention makes corresponding improvements to the technical problems mentioned in the background art.

[0033] The rotation mechanism 5 includes a fixed frame 501 fixedly connected to one side of the cleaning box 1. Two first gears 502 are rotatably connected to the inner cavity of the fixed frame 501. The two first gears 502 are meshed with each other. A semi-gear 503 is fixedly connected to one side of each of the two first gears 502. One end of each of the two conveying rods 201 penetrates to the outside of the cleaning box 1 and is fixedly connected to a second gear 504. A third gear 505 is meshed between the opposite sides of the two second gears 504. One side of the third gear 505 is rotatably connected to the inner cavity of the cleaning box 1. The other side of the third gear 505 is fixedly connected to a fourth gear 506. The fourth gear 506 is located between the two semi-gears 503 and is meshed with the semi-gear 503. A first motor 507 is fixedly connected to one side of the fixed frame 501. The output end of the first motor 507 penetrates to the inner cavity of the fixed frame 501 and is fixedly connected to one side of one of the first gears 502. By setting the rotation mechanism 5, when driving the conveying rod 201, the first motor 507 is started by using an external control switch. The output end of the first motor 507 drives the first gear 502 to rotate, so that one of the first gears 502 drives the semi-gear 503 with more teeth to rotate forward, and the other first gear 502 drives the semi-gear 503 with fewer teeth to rotate backward. As a result, the fourth gear 506 first rotates a certain angle and then rotates backward. Then, through the rotation of the fourth gear 506, the two second gears 504 rotate in the same direction, achieving the effect of driving the conveying rod 201, so that the photovoltaic silicon wafer moves forward a certain distance and then moves backward a certain distance, and the distance that the photovoltaic silicon wafer moves forward is greater than the distance that it moves backward.

[0034] One side of the third gear 505 is fixedly connected to a rotating rod 508. The surface of the rotating rod 508 is rotatably connected to the inner wall of the cleaning tank 1. The surface of the rotating rod 508 is fixedly connected to a first bevel gear 509. One end of the rotating rod 406 is fixedly connected to a second bevel gear 510. The first bevel gear 509 meshes with the second bevel gear 510. By setting the combined use of the rotating rod 508, the first bevel gear 509 and the second bevel gear 510, since the number of teeth of the first bevel gear 509 is greater than that of the second bevel gear 510, when rotating the third gear 505, it will drive the rotating rod 508 to rotate rapidly, thereby causing the first bevel gear 509 to rotate. Since the first bevel gear 509 meshes with the second bevel gear 510, it achieves the effect of driving the second bevel gear 510 to rotate. The rotation of the second bevel gear 510 will drive the rotating rod 406 and the cam 407 to rotate, achieving the effect of driving the cam 407 to rotate.

[0035] The flushing assembly 3 includes a fixed pipe 301 fixedly connected to one side of the cleaning tank 1. A water pump 302 is arranged on one side of the fixed pipe 301. The output end of the water pump 302 is fixedly communicated with the surface of the fixed pipe 301. Two connecting assemblies are arranged in the inner cavity of the cleaning tank 1. The connecting assembly includes two fixed shells 303 fixedly connected to the inner cavity of the cleaning tank 1. Spray heads 304 are fixedly communicated with the opposite sides of the two fixed shells 303. The number of the spray heads 304 is several. A connecting pipe 305 is fixedly communicated with one side of the fixed shell 303. One end of the connecting pipe 305 penetrates to the outside of the cleaning tank 1 and is fixedly communicated with the surface of the fixed pipe 301. By setting the flushing assembly 3, the input end of the water pump 302 is communicated with an external water storage device. The water pump 302 is started to convey the water in the external water storage device into the inner cavity of the fixed pipe 301, and is conveyed into the fixed shell 303 through the connecting pipe 305 and sprayed out from the spray heads 304. The spray heads 304 on the lower fixed shell 303 are located between the two conveying rods 201, so that the spray heads 304 on the lower fixed shell 303 can spray on the bottom of the photovoltaic silicon wafer, thereby realizing the effect of spraying the photovoltaic silicon wafer.

[0036] Four support rods 7 are fixedly connected to the top of the cleaning box 1. The tops of the four support rods 7 are commonly fixedly connected to a support plate 8. A hydraulic telescopic rod 9 is fixedly connected to the top of the support plate 8. The telescopic end of the hydraulic telescopic rod 9 penetrates through the support plate 8 and is fixedly connected to a moving plate 10. A pressing roller 11 that cooperates with the conveying rod 201 is rotatably connected to the inner cavity of the moving plate 10. The number of pressing rollers 11 is several. By setting the cooperation of the support rod 7, the support plate 8, the hydraulic telescopic rod 9 and the pressing roller 11, after the photovoltaic silicon wafer moves to the lower part of the pressing roller 11, the hydraulic telescopic rod 9 is started by using an external control switch, so that the moving plate 10 drives the pressing roller 11 to move downward, so that the photovoltaic silicon wafer is located between the conveying rod 201 and the pressing roller 11, increasing the friction between the photovoltaic silicon wafer and the conveying rod 201. This friction is greater than the friction generated by the cleaning sponge 403 on the photovoltaic silicon wafer, so that the photovoltaic silicon wafer can pass through between the two cleaning sponges 403, avoiding the situation that the photovoltaic silicon wafer cannot move when the cleaning sponge 403 wipes the photovoltaic silicon wafer.

[0037] The specific implementation manner of this embodiment is as follows: When driving the conveying rod 201, the first motor 507 is started by using an external control switch. The output end of the first motor 507 drives the first gear 502 to rotate, so that one of the first gears 502 drives the semi-gear 503 with more teeth to rotate forward, and the other first gear 502 drives the semi-gear 503 with fewer teeth to rotate in the reverse direction. As a result, the fourth gear 506 rotates a certain angle first and then rotates in the reverse direction. Then, through the rotation of the fourth gear 506, the two second gears 504 rotate in the same direction, achieving the effect of driving the conveying rod 201, so that the photovoltaic silicon wafer moves forward a certain distance and then moves backward a certain distance. The distance that the photovoltaic silicon wafer moves forward is greater than the distance that it moves backward. When rotating the third gear 505, it will drive the rotating rod 508 to rotate rapidly, so that the first bevel gear 509 rotates. Since the first bevel gear 509 meshes with the second bevel gear 510, the effect of driving the second bevel gear 510 to rotate is achieved. The rotation of the second bevel gear 510 will drive the rotating rod 406 and the cam 407 to rotate, achieving the effect of driving the cam 407 to rotate, so that the cleaning sponge 403 reciprocates to clean the photovoltaic silicon wafer, thus realizing the effect of cleaning the same place of the photovoltaic silicon wafer multiple times.

[0038] Embodiment 3: Please refer to Figures 1-8 , the present invention provides a technical solution: a rotary reciprocating photovoltaic silicon wafer cleaning device, and the present invention makes corresponding improvements to the technical problems mentioned in the background technology.

[0039] The feeding mechanism 6 includes a mounting plate 601 fixedly connected to one side of the cleaning tank 1. One side of the mounting plate 601 is fixedly connected with a mounting rod 602. One end of the mounting rod 602 is fixedly connected with a mounting cylinder 603. A piston block 604 is slidably connected to the inner cavity of the mounting cylinder 603. One side of the piston block 604 is fixedly connected with an adjusting rod 605. The surface of the adjusting rod 605 is slidably connected to the inner cavity of the mounting cylinder 603. The top of the support plate 8 is fixedly connected with a liquid storage tank 606. The number of the liquid storage tanks 606 is two. The surface of the mounting cylinder 603 is fixedly communicated with a first one-way valve 607. One end of the first one-way valve 607 is fixedly communicated with a first long pipe 608. One ends of the two first long pipes 608 are respectively fixedly communicated with one side of the two liquid storage tanks 606. The surface of the mounting cylinder 603 is also fixedly communicated with two second one-way valves 609. One end of the second one-way valve 609 is fixedly communicated with a second long pipe 610. One ends of the two second long pipes 610 both penetrate into the inner cavity of the cleaning tank 1 and are respectively communicated with the two fixed frames 401. The inner wall of the fixed frame 401 is provided with liquid outlet holes 611. The number of the liquid outlet holes 611 is several. The liquid outlet holes 611 are communicated with the mounting cylinder 603 through the fixed frame 401, the second long pipe 610 and the second one-way valve 609. By setting the feeding mechanism 6, the piston block 604 is moved in the inner cavity of the mounting cylinder 603, so that the piston block 604 squeezes the cleaning agent into the second long pipe 610 through the second one-way valve 609 and discharges it from the liquid outlet holes 611, so that the cleaning agent is applied to the top and bottom of the photovoltaic silicon wafer, further increasing the cleaning effect.

[0040] One end of the adjusting rod 605 is fixedly connected to a short rod 612. One side of the short rod 612 is slidably connected to a toothed plate 613. One side of one of the double-groove transmission shafts 202 is fixedly connected to a fifth gear 614 that is used in cooperation with the toothed plate 613. The top of the cleaning tank 1 is slidably connected to a sliding rod 615. The number of sliding rods 615 is two. The tops of the two sliding rods 615 are jointly fixedly connected to a pressing rod 616. One side of the moving plate 10 is fixedly connected to a pressing block 617 that is used in cooperation with the pressing rod 616. One side of the pressing rod 616 is slidably connected to an L-shaped rod 618. The number of L-shaped rods 618 is two. One ends of the two L-shaped rods 618 are both fixedly connected to the toothed plate 613. By setting the cooperation of the short rod 612, the toothed plate 613, the fifth gear 614 and the pressing rod 616, when the hydraulic telescopic rod 9 drives the moving plate 10 to move downward, it will drive the pressing block 617 to move downward, so that the pressing block 617 presses the pressing rod 616, causing the pressing rod 616 to move downward. When the pressing rod 616 moves downward, it will drive the L-shaped rod 618 and the toothed plate 613 to move downward, so that the toothed plate 613 meshes with the fifth gear 614. When the double-groove transmission shaft 202 rotates, it will drive the fifth gear 614 to rotate, causing the short rod 612 and the adjusting rod 605 to move reciprocally, so as to achieve the effect of moving the piston block 604. Among them, when the end of the toothed plate 613 and the fifth gear 614 are in a disengaged state, the fifth gear 614 rotates in the reverse direction, which can drive the toothed plate 613 to move in the reverse direction. When the fifth gear 614 rotates in the forward direction, the toothed plate 613 can move to a state of being disengaged from the fifth gear 614, so as to realize the reciprocating movement of the short rod 612, the adjusting rod 605 and the piston block 604.

[0041] The surface of the sliding rod 615 is movably sleeved with a second spring 619. One end of the second spring 619 is fixedly connected to the pressing rod 616. The other end of the second spring 619 is fixedly connected to the top of the cleaning tank 1. The surface of the adjusting rod 605 is movably sleeved with a third spring 620. One end of the third spring 620 is fixedly connected to the mounting cylinder 603. The other end of the third spring 620 is fixedly connected to the surface of the short rod 612. By setting the second spring 619 and the third spring 620, when the pressing block 617 presses the pressing rod 616 downward, the second spring 619 will undergo a force-induced deformation. When the pressing of the pressing rod 616 is cancelled, the force-induced deformation of the second spring 619 will drive the pressing rod 616 to reset. And after the pressing rod 616 is reset, it will drive the toothed plate 613 and the L-shaped rod 618 to move upward, so that the toothed plate 613 is disengaged from the fifth gear 614. At this time, the force-induced deformation of the third spring 620 will drive the short rod 612 and the adjusting rod 605 to reset.

[0042] The inner wall of the installation cylinder 603 is fixedly connected with a sealing ring 621, and the inner wall of the sealing ring 621 is in close contact with the surface of the adjusting rod 605. By providing the sealing ring 621, the sealing ring 621 is in close contact with the adjusting rod 605, thereby increasing the sealing performance between the adjusting rod 605 and the installation cylinder 603 and preventing the cleaning liquid from leaking.

[0043] The specific implementation of this embodiment is as follows: When the hydraulic telescopic rod 9 drives the moving plate 10 to move downward, it will drive the extrusion block 617 to move downward, causing the extrusion block 617 to extrude the pressure rod 616, making the pressure rod 616 move downward. When the pressure rod 616 moves downward, it will drive the L-shaped rod 618 and the toothed plate 613 to move downward, causing the toothed plate 613 to mesh with the fifth gear 614. When the double-groove transmission shaft 202 rotates, it will drive the fifth gear 614 to rotate, causing the short rod 612 and the adjusting rod 605 to move reciprocally, thereby achieving the effect of moving the piston block 604. When the piston block 604 moves in the inner cavity of the installation cylinder 603, the piston block 604 squeezes the cleaning agent into the second long tube 610 through one of the second one-way valves 609, and then transports it to the liquid outlet hole 611 through the fixed frame 401 and discharges it from the liquid outlet hole 611. At this time, the cleaning agent is sucked into the inner cavity of the installation cylinder 603 from the liquid storage tank 606, the first long tube 608, and the first one-way valve 607, realizing the effect of continuously infusing the cleaning sponge 403, so that the cleaning agent is applied to the top and bottom of the photovoltaic silicon wafer, further enhancing the cleaning effect. It should be noted that the first one-way valve 607 for transporting the cleaning agent to the installation cylinder 603 and the second one-way valve 609 for discharging the cleaning agent from the installation cylinder 603 are not on the same vertical line.

[0044] It should be noted that in this article, relational terms such as first and second are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any actual relationship or order between these entities or operations. Moreover, the term "comprising", "including" or any other variant thereof is intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements not only includes those elements, but also includes other elements not explicitly listed, or also includes elements inherent to such process, method, article or device.

[0045] Although the embodiments of the present invention have been shown and described, for those of ordinary skill in the art, it can be understood that various changes, modifications, substitutions and variations can be made to these embodiments without departing from the principles and spirit of the present invention. The scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A rotary reciprocating photovoltaic silicon wafer cleaning device, comprising a cleaning box (1), the inner cavity of the cleaning box (1) is provided with two groups of conveying components (2), the inner cavity of the cleaning box (1) is provided with a flushing component (3), the flushing component (3) is used to flush the photovoltaic silicon wafer, the conveying component (2) comprises a conveying rod (201) rotatably connected to the inner cavity of the cleaning box (1), the number of the conveying rods (201) is several, and the characteristics are: A reciprocating mechanism (4) is provided between opposite sides of the two conveying assemblies (2), and the reciprocating mechanism (4) is used to wipe the photovoltaic silicon wafers. A rotating mechanism (5) used in conjunction with the conveying assemblies (2) is provided on one side of the cleaning box (1); The reciprocating mechanism (4) comprises a fixed frame (401) fixedly connected to the inner wall of the cleaning box (1), the number of the fixed frames (401) being two, the inner cavity of the fixed frame (401) being slidably connected to a sliding plate (402), and the opposite sides of the two fixed frames (401) being fixedly connected to a cleaning sponge (403); The rotating mechanism (5) comprises a fixing frame (501) fixedly connected to one side of the cleaning box (1); the inner cavity of the fixing frame (501) is rotatably connected to two first gears (502); the two first gears (502) are meshed with each other; one side of the two first gears (502) is fixedly connected to a half gear (503); one end of the two conveying rods (201) passes through the outside of the cleaning box (1) and is fixedly connected to a second gear (504); a third gear (505) is meshedly connected between opposite sides of the two second gears (504); one side of the third gear (505) is rotatably connected to the inner cavity of the cleaning box (1); and the other side of the third gear (505) is fixedly connected to a fourth gear (506); The inner cavity of the fixed frame (401) is slidably connected to two guide rods (404), and the opposite sides of the two guide rods (404) are fixedly connected to the sliding plate (402). The opposite sides of the two guide rods (404) pass through the fixed frame (401) and extend to the inner cavity of the cleaning box (1). The surfaces of the guide rods (404) are slidably connected to the inner cavity of the cleaning box (1). One end of one of the guide rods (404) is fixedly connected to a first spring (405), and one end of the first spring (405) is fixedly connected to the inner wall of the cleaning box (1). The inner wall of the cleaning box (1) is rotatably connected to a rotating rod (406), and the surface of the rotating rod (406) is fixedly connected to a cam (407). There are two cams (407), and the surface of the cam (407) contacts one end of the guide rod (404).

2. The rotary reciprocating photovoltaic silicon wafer cleaning device according to claim 1, characterized in that: The rotating mechanism (5) is used to drive the conveying rod (201). The other side of the cleaning box (1) is provided with a feeding mechanism (6) used in conjunction with the reciprocating mechanism (4). The feeding mechanism (6) is used to apply a cleaning agent to the surface of the photovoltaic silicon wafer. One end of the conveying rod (201) passes through the outside of the cleaning box (1) and is fixedly connected to a double-grooved transmission shaft (202). Two adjacent double-grooved transmission shafts (202) are connected by a belt (203). The fourth gear (506) is located between the two half gears (503). The fourth gear (506) is meshed with the half gears (503). One side of the fixed frame (501) is fixedly connected to a first motor (507). The output end of the first motor (507) passes through the inner cavity of the fixed frame (501) and is fixedly connected to one side of one of the first gears (502).

3. The rotary reciprocating photovoltaic silicon wafer cleaning device according to claim 2, characterized in that: A rotating rod (508) is fixedly connected to one side of the third gear (505), and the surface of the rotating rod (508) is rotatably connected to the inner wall of the cleaning box (1). A first bevel gear (509) is fixedly connected to the surface of the rotating rod (508), and one end of the rotating rod (406) is fixedly connected to a second bevel gear (510), and the first bevel gear (509) is meshed with the second bevel gear (510).

4. The rotary reciprocating photovoltaic silicon wafer cleaning device according to claim 1, characterized in that: The flushing assembly (3) comprises a fixed pipe (301) fixedly connected to one side of the cleaning box (1); a water pump (302) is provided on one side of the fixed pipe (301); an output end of the water pump (302) is fixedly connected to the surface of the fixed pipe (301); the inner cavity of the cleaning box (1) is provided with two groups of connecting assemblies; the connecting assemblies comprise two fixed shells (303) fixedly connected to the inner cavity of the cleaning box (1); opposite sides of the two fixed shells (303) are fixedly connected to a nozzle (304); the number of the nozzles (304) is several; one side of the fixed shell (303) is fixedly connected to a connecting pipe (305); one end of the connecting pipe (305) passes through the outside of the cleaning box (1) and is fixedly connected to the surface of the fixed pipe (301).

5. The rotary reciprocating photovoltaic silicon wafer cleaning device according to claim 2, characterized in that: The top of the cleaning box (1) is fixedly connected to four support rods (7), the tops of the four support rods (7) are commonly fixedly connected to a support plate (8), the top of the support plate (8) is fixedly connected to a hydraulic telescopic rod (9), the telescopic end of the hydraulic telescopic rod (9) passes through the support plate (8) and is fixedly connected to a movable plate (10), the inner cavity of the movable plate (10) is rotatably connected to a pressure roller (11) used in conjunction with a conveying rod (201), and the number of the pressure rollers (11) is several.

6. The rotary reciprocating photovoltaic silicon wafer cleaning device according to claim 5, characterized in that: The feeding mechanism (6) comprises a mounting plate (601) fixedly connected to one side of the cleaning box (1); a mounting rod (602) is fixedly connected to one side of the mounting plate (601); one end of the mounting rod (602) is fixedly connected to a mounting cylinder (603); the inner cavity of the mounting cylinder (603) is slidably connected to a piston block (604); one side of the piston block (604) is fixedly connected to an adjusting rod (605); the surface of the adjusting rod (605) is slidably connected to the inner cavity of the mounting cylinder (603); the top of the support plate (8) is fixedly connected to a liquid storage tank (606); the number of the liquid storage tanks (606) is two; the surface of the mounting cylinder (603) is fixedly connected to a first one-way valve (607); one end of the first one-way valve (607) is fixedly connected to the inner cavity of the mounting cylinder (603); The end of the mounting tube (603) is fixedly connected to a first long tube (608), one end of the two first long tubes (608) is fixedly connected to one side of two liquid storage tanks (606), and the surface of the mounting tube (603) is also fixedly connected to two second one-way valves (609), one end of the second one-way valve (609) is fixedly connected to a second long tube (610), one end of the two second long tubes (610) both penetrate into the inner cavity of the cleaning box (1) and are respectively connected to the two fixed frames (401), and the inner wall of the fixed frame (401) is provided with a plurality of liquid outlet holes (611), and the liquid outlet holes (611) are connected to the mounting tube (603) through the fixed frame (401), the second long tube (610) and the second one-way valve (609).

7. The rotary reciprocating photovoltaic silicon wafer cleaning device according to claim 6, characterized in that: One end of the adjusting rod (605) is fixedly connected to a short rod (612), and one side of the short rod (612) is slidably connected to a toothed plate (613), one side of one of the double-groove transmission shafts (202) is fixedly connected to a fifth gear (614) used in conjunction with the toothed plate (613), the top of the cleaning box (1) is slidably connected to a sliding rod (615), the number of the sliding rods (615) is two, and the tops of the two sliding rods (615) are commonly fixedly connected to a pressure rod (616), one side of the movable plate (10) is fixedly connected to an extrusion block (617) used in conjunction with the pressure rod (616), one side of the pressure rod (616) is slidably connected to an L-shaped rod (618), the number of the L-shaped rods (618) is two, and one end of the two L-shaped rods (618) is fixedly connected to the toothed plate (613).

8. The rotary reciprocating photovoltaic silicon wafer cleaning device according to claim 7, characterized in that: The movable sleeve on the surface of the sliding rod (615) is provided with a second spring (619), one end of the second spring (619) is fixedly connected to the pressure rod (616), and the other end of the second spring (619) is fixedly connected to the top of the cleaning box (1); the movable sleeve on the surface of the adjusting rod (605) is provided with a third spring (620), one end of the third spring (620) is fixedly connected to the mounting tube (603), and the other end of the third spring (620) is fixedly connected to the surface of the short rod (612).

9. The rotary reciprocating photovoltaic silicon wafer cleaning device according to claim 6, characterized in that: A sealing ring (621) is fixedly connected to the inner wall of the installation cylinder (603), and the inner wall of the sealing ring (621) is in close contact with the surface of the adjustment rod (605).

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