An extreme ultraviolet motor system for photolithography machine

Abstract

The present invention provides an extreme ultraviolet motor system for a photolithography machine, comprising a stator assembly, a rotor assembly, a drive mechanism and a control system, wherein: the drive mechanism adopts a PID control algorithm, and determines the input signal of the motor through position loop control, speed loop control and current loop control in sequence to ensure the precise movement of the motor; the feedback adjustment system can monitor the running state of the motor in real time, and adjust and optimize as needed. The present invention achieves sub-nanometer motion accuracy through the PID control algorithm; the material selection of the stator assembly reduces magnetic field fluctuations and heat generation, and improves the stability of the motor; the feedback adjustment system has an adaptive adjustment function, and can be dynamically adjusted and optimized according to different processing requirements and environmental changes.

Description

Technical Field

[0001] The present invention relates to the technical field of photolithography machines, and in particular to an extreme ultraviolet motor system for a photolithography machine. Background Art

[0002] With the continuous development of semiconductor technology, the performance of lithography machines, as key equipment in the integrated circuit manufacturing process, directly affects the quality and production efficiency of chips. As one of the most advanced lithography technologies, extreme ultraviolet (EUV) lithography machines have higher requirements on the accuracy and stability of motors. Existing lithography machine motors still have deficiencies in accuracy, stability and anti-interference ability, and are difficult to meet the needs of EUV lithography machines. Summary of the invention

[0003] The purpose of the present invention is to overcome the shortcomings of the prior art and provide an extreme ultraviolet motor system for a lithography machine, which is specifically achieved through the following technical solutions:

[0004] An extreme ultraviolet motor system for a photolithography machine comprises a stator assembly, a rotor assembly, a drive mechanism and a control system, wherein:

[0005] The stator assembly generates electromagnetic coupling with the rotor assembly through an electromagnetic field, thereby driving the rotor assembly to rotate;

[0006] The rotor assembly is mounted on the driving mechanism through bearings and is controlled to rotate by the driving mechanism;

[0007] The drive mechanism adopts PID control algorithm to determine the input signal of the motor through position loop control, speed loop control and current loop control in sequence to ensure the precise movement of the motor;

[0008] The feedback adjustment system can monitor the running status of the motor in real time and make adjustments and optimizations as needed.

[0009] Optionally or preferably, the stator assembly includes a stator and a winding wound on the stator; the stator core is made of neodymium iron boron to reduce magnetic field fluctuations and heat generation; and the winding adopts a distributed staggered winding process.

[0010] Optionally or preferably, it also includes a cooling system, wherein the surface of the stator assembly, the surface of the rotor assembly, the surface of the drive mechanism and the interface of the cooling system are all coated with heat dissipation silicone grease; the cooling system includes a heat pipe and a phase change sheet; the heat pipe is in contact with the drive mechanism and the radiator.

[0011] Optionally or preferably, the position loop control is the outermost control of the driving mechanism, and the position loop control adjusts the speed and direction of the motor according to the error between the required position of the lithography machine and the current position of the motor. The output of the position loop control is up (t) is:

[0012]

[0013] in, and They are proportional, integral and differential gains in position loop control respectively; e p is the position error;

[0014] e p =P demand -P actual

[0015] Among them, P demand is the position of the lithography machine required, P actual is the current position of the motor.

[0016] Optionally or preferably, the speed loop control takes the output of the position loop control as input, and the output u of the speed loop control ω (t) is:

[0017]

[0018] in, and They are proportional, integral and differential gains in speed loop control respectively; e ω is the speed error;

[0019] e ω =ω target -ω actual

[0020] Among them, ω target is the target speed of the motor, ω actual is the current speed of the motor.

[0021] Optionally or preferably, the current loop control takes the output of the speed loop control as input, and the output u of the current loop control I (t) is:

[0022]

[0023] in, and They are the proportional and integral gains in the current loop control; e I is the current error;

[0024] e I =I target -I actual

[0025] Among them, I targetis the target armature current of the motor; I actual is the actual armature current of the motor; the drive mechanism converts u I (t) is used as the input signal of the motor.

[0026] Optionally or preferably, the feedback adjustment system measures the actual output of the motor system, compares it with the desired target value, and calculates an error signal; this error signal is used to adjust the control input to make the output of the system closer to the desired value.

[0027] Optionally or preferably, the feedback adjustment system uses a DSP processor or an FPGA controller as a core controller to collect operating data of the motor for real-time processing and analysis.

[0028] Based on the above technical solution, the following technical effects can be produced:

[0029] The beneficial effects of an extreme ultraviolet motor system for a lithography machine provided by the present invention include:

[0030] (1) High precision: Through the PID control algorithm, sub-nanometer motion accuracy is achieved;

[0031] (2) High stability: The material selection of the stator components reduces magnetic field fluctuations and heat generation, and improves the stability of the motor;

[0032] (3) Intelligent control: The feedback adjustment system has adaptive adjustment function and can be dynamically adjusted and optimized according to different processing requirements and environmental changes. DETAILED DESCRIPTION

[0033] It should be understood that the specific embodiments described herein are only used to explain the present invention, and are not used to limit the present invention.

[0034] The technical solutions in the embodiments of the present invention are described clearly and completely below. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0035] Embodiment 1:

[0036] This embodiment provides an extreme ultraviolet motor system for a lithography machine, including a stator assembly, a rotor assembly, a drive mechanism and a control system, wherein:

[0037] The stator assembly generates electromagnetic coupling with the rotor assembly through an electromagnetic field, thereby driving the rotor assembly to rotate;

[0038] The rotor assembly is mounted on the driving mechanism through bearings and is controlled to rotate by the driving mechanism;

[0039] The drive mechanism adopts PID control algorithm to determine the input signal of the motor through position loop control, speed loop control and current loop control in sequence to ensure the precise movement of the motor;

[0040] The feedback adjustment system can monitor the running status of the motor in real time and perform adjustment and optimization as needed.

[0041] In this embodiment, the stator assembly includes a stator and a winding wound on the stator; the stator core is made of neodymium iron boron, a high magnetic permeability, low loss material that can increase magnetic flux density and magnetic field strength to reduce magnetic field fluctuations and heat generation; the winding adopts a distributed staggered winding process to ensure uniform current distribution, reduce copper loss and improve efficiency.

[0042] In this embodiment, a cooling system is also included, wherein the surface of the stator assembly, the surface of the rotor assembly, the surface of the drive mechanism and the interface of the cooling system are all coated with heat dissipation silicone grease; the cooling system includes a heat pipe and a phase change sheet; the heat pipe is in contact with the drive mechanism and the radiator; the heat generated when the motor is running will cause the working fluid in the heat pipe to evaporate, and the steam then moves inside the heat pipe to one end close to the radiator, where it condenses and releases heat, and then the working fluid flows back to the hot end, forming a closed cycle.

[0043] In this embodiment, the position loop control is the outermost control of the drive mechanism. The position loop control adjusts the speed and direction of the motor according to the error between the required position of the lithography machine and the current position of the motor. The output of the position loop control is u p (t) is:

[0044]

[0045] in, and They are proportional, integral and differential gains in position loop control respectively; e p is the position error;

[0046] e p =P demand -P actual

[0047] Among them, P demand is the position of the lithography machine required, P actual is the current position of the motor.

[0048] In this embodiment, the speed loop control uses the output of the position loop control as input, and the output u of the speed loop control is ω (t) is:

[0049]

[0050] in, and They are proportional, integral and differential gains in speed loop control respectively; e ω is the speed error;

[0051] e ω =ω target -ω actual

[0052] Among them, ω target is the target speed of the motor, ω actual is the current speed of the motor.

[0053] In this embodiment, the current loop control uses the output of the speed loop control as input, and the output u of the current loop control is I (t) is:

[0054]

[0055] in, and They are the proportional and integral gains in the current loop control; e I is the current error;

[0056] e I =I target -I actual

[0057] Among them, I target is the target armature current of the motor; I actual is the actual armature current of the motor; the drive mechanism converts u I (t) is used as the input signal of the motor.

[0058] In this embodiment, the feedback adjustment system measures the actual output of the motor system, compares it with the desired target value, and calculates an error signal; this error signal is used to adjust the control input to make the system output closer to the desired value.

[0059] The working principle of the extreme ultraviolet motor system of this embodiment is as follows:

[0060] First, the feedback adjustment system sends control instructions to the drive mechanism according to the needs of the lithography machine; after receiving the instructions, the drive mechanism controls the speed and direction of the motor by adjusting the voltage, frequency or PWM signal; after the motor starts running, it drives the moving parts of the lithography machine to move precisely; at the same time, the cooling system continuously conducts and dissipates the heat generated by the motor to ensure that the temperature of the motor remains within a safe range; the feedback adjustment system monitors the operating status of the motor in real time, and makes dynamic adjustments and optimizations as needed.

[0061] The structures, functions and connection forms disclosed in this article can be implemented in other ways. For example, the embodiments described above are only illustrative, and the cooling system can be installed in other ways, such as multiple components can be combined or integrated into another component; in addition, the functional components in the various embodiments of this article can be integrated into one functional component, or each functional component can exist physically separately, or two or more functional components can be integrated into one functional component.

[0062] The above is only a preferred embodiment of the present invention. It should be understood that the present invention is not limited to the form disclosed herein, and should not be regarded as excluding other embodiments, but can be used in various other combinations, modifications and environments, and can be modified within the scope of the concept described herein through the above teachings or the technology or knowledge of the relevant field. The changes and modifications made by those skilled in the art shall not deviate from the spirit and scope of the present invention, and shall be within the scope of protection of the claims attached to the present invention.

Claims

1. An extreme ultraviolet motor system for a photolithography machine, characterized in that: It includes a stator assembly, a rotor assembly, a drive mechanism and a control system, wherein: The stator assembly generates electromagnetic coupling with the rotor assembly through an electromagnetic field, thereby driving the rotor assembly to rotate; The rotor assembly is mounted on the driving mechanism through bearings and is controlled to rotate by the driving mechanism; The drive mechanism adopts PID control algorithm to determine the input signal of the motor through position loop control, speed loop control and current loop control in sequence to ensure the precise movement of the motor; The feedback adjustment system can monitor the running status of the motor in real time and perform adjustment and optimization as needed.

2. The extreme ultraviolet motor system for a photolithography machine according to claim 1, characterized in that: The stator assembly comprises a stator and a winding wound on the stator; the stator core is made of neodymium iron boron to reduce magnetic field fluctuations and heat generation; and the winding adopts a distributed staggered winding process.

3. The extreme ultraviolet motor system for a photolithography machine according to claim 1, characterized in that: It also includes a cooling system, wherein the surface of the stator assembly, the surface of the rotor assembly, the surface of the drive mechanism and the interface of the cooling system are all coated with heat dissipation silicone grease; the cooling system includes a heat pipe and a phase change sheet; the heat pipe is in contact with the drive mechanism and the radiator.

4. The extreme ultraviolet motor system for a photolithography machine according to claim 1, characterized in that: The position loop control is the outermost control of the drive mechanism. The position loop control adjusts the speed and direction of the motor according to the error between the required position of the lithography machine and the current position of the motor. The output of the position loop control is u p (t) is: in, and They are proportional, integral and differential gains in position loop control respectively; e p is the position error; e p =P demand -P actual Among them, P demand is the position of the lithography machine required, P actual is the current position of the motor.

5. The extreme ultraviolet motor system for a photolithography machine according to claim 1, characterized in that: The speed loop control takes the output of the position loop control as input, and the output u of the speed loop control ω (t) is: in, and They are proportional, integral and differential gains in speed loop control respectively; e ω is the speed error; e ω =ω target -oh actual Among them, ω target is the target speed of the motor, ω actual is the current speed of the motor.

6. The extreme ultraviolet motor system for a photolithography machine according to claim 1, characterized in that: The current loop control takes the output of the speed loop control as input, and the output u of the current loop control I (t) is: in, and They are the proportional and integral gains in the current loop control; e I is the current error; yes I =I target -I actual Among them, I target is the target armature current of the motor; I actual is the actual armature current of the motor; the drive mechanism converts u I (t) is used as the input signal of the motor.

7. The extreme ultraviolet motor system for a photolithography machine according to claim 1, characterized in that: The feedback adjustment system measures the actual output of the motor system, compares it with the desired target value, and calculates an error signal; this error signal is used to adjust the control input to make the system output closer to the desired value.

8. The extreme ultraviolet motor system for a photolithography machine according to claim 1, characterized in that: The feedback adjustment system uses a DSP processor or an FPGA controller as a core controller, and collects the running data of the motor for real-time processing and analysis.

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