Air injection structure with optical access channel and air injection system

Abstract

The invention discloses a gas injection structure with an optical access channel and a gas injection system, the gas injection structure comprises a gas inlet connecting piece and a gas nozzle, and the gas inlet connecting piece is connected with the gas nozzle; the gas nozzle is provided with an optical access channel, a middle gas inlet channel and an edge gas inlet channel, the optical access channel is located in the center of the gas nozzle and vertically extends downwards, and the middle gas inlet channel comprises a middle gas uniformizing structure and a middle gas inlet communicated with the middle gas uniformizing structure. The edge air inlet path comprises edge air uniformizing holes and edge air inlet holes communicated with the edge air uniformizing holes; and a sealing piece for independently sealing the optical access channel, the middle gas inlet gas path and the edge gas inlet gas path is arranged between the gas inlet connecting piece and the gas nozzle. The gas inlet structure can independently control any one of two paths of gas inlet, so that the gas inlet uniformity is effectively controlled, the gas inlet proportion is adjusted, the risk of arc discharge is reduced, and gas deposition and particle generation are reduced.

Description

Technical Field

[0001] The present invention relates to the field of semiconductor technology, and in particular to a process gas jetting structure of semiconductor processing equipment such as a plasma processing chamber, and also to a jetting system provided with the jetting structure. Background Art

[0002] When etching materials on wafers and depositing materials on wafers, a plasma processing chamber is used. In actual use, a process gas nozzle is generally installed through the opening of the dielectric window at the top of the plasma processing chamber. The center hole on the upper surface of the plasma processing chamber cooperates with the gas nozzle to spray the process gas into the interior of the plasma processing chamber. Therefore, the gas intake structure of the nozzle has a great influence on ensuring the uniformity of etching and deposition.

[0003] In etching equipment, most nozzles have two air intake modes: center and edge. To ensure the uniformity of air intake in etching equipment and prevent arc discharge from causing wafer defects, most nozzles have two air intake paths: center and edge to achieve uniform air intake.

[0004] For example, some nozzles eliminate the central air inlet path as an optical access channel to allow light to enter and exit the process chamber. This type of nozzle structure has the risk of arc discharge due to the bowl-shaped gas uniformity structure in the middle.

[0005] Some other nozzles have an optical access channel in the middle where no gas flows. The edges are divided into two air intake channels: the edge center and the edge periphery. There is no air intake in the middle, and the central optical access channel does not flow gas, which is prone to deposition and cannot be cleaned, causing particle contamination.

[0006] Some nozzles are provided with two-way air inlet at the edge and an inner cavity with an optical access path. The inner cavity is provided with an access area, and the access area is configured to flow process gas and transmit an optical access signal with a desired signal-to-noise ratio. The diaphragm contained in the inner cavity divides the access area of ​​the inner cavity into at least two independent through holes, and at least two independent through holes extend parallel to the optical path pointing to the optical access window. And each of the two through holes is configured to cooperate with the other through holes to flow the process gas and transmit the desired optical access signal through the optical access window, and the structure is extremely complex.

[0007] It can be seen that in the relevant technology, the air intake structure of the nozzle is a two-way air intake, namely, center air intake and edge air intake or edge center air intake and edge periphery air intake. The performance in terms of air intake uniformity and uniform air regulation is very limited, which will have an adverse effect on the uniformity of etching and deposition. Summary of the invention

[0008] The purpose of the present invention is to provide an air injection structure with an optical access channel. The air injection structure can not only effectively monitor the situation in the process chamber through the optical access channel, but also effectively control the uniformity of the air intake, reduce the risk of arc discharge, and reduce gas deposition and particle generation.

[0009] An object of the present invention is to provide an injection system provided with the injection structure having an optical access channel.

[0010] To achieve the above-mentioned objectives, the present invention provides an injection structure with an optical access channel, comprising an air inlet connector and a gas nozzle, wherein the air inlet connector is interconnected with the gas nozzle; the gas nozzle is provided with an optical access channel, an intermediate air inlet path and an edge air inlet path, the optical access channel is located at the center of the gas nozzle and extends downward in a vertical direction, the intermediate air inlet path comprises an intermediate air uniforming structure and an intermediate air inlet hole connected to the intermediate air uniforming structure, the edge air inlet path comprises an edge air uniforming hole and an edge air inlet hole connected to the edge air uniforming hole; a seal is provided between the air inlet connector and the gas nozzle for independently sealing the optical access channel, the intermediate air inlet path and the edge air inlet path.

[0011] In one embodiment, the intermediate gas uniformity structure is an annular gas uniformity groove surrounding the optical access channel in a circumferential direction.

[0012] In one embodiment, the intermediate air-uniform structure is intermediate air-uniform holes distributed along the circumferential direction.

[0013] In one embodiment, the air inlet connector is provided with an optical device mounting portion, an intermediate air uniforming groove and an edge air uniforming groove, the intermediate air uniforming groove corresponds to the intermediate air uniforming structure, the edge air uniforming groove corresponds to the edge air uniforming hole, and the intermediate air uniforming groove and the edge air uniforming groove are respectively provided with independent air inlets.

[0014] In one embodiment, the air inlet of the middle air-homogenizing groove is located on the side of the air-housing connector, and extends inward and perpendicular to the middle air-homogenizing groove.

[0015] In one embodiment, the air inlet of the edge air-homogenizing groove is located on the side of the air-housing connector, and extends inward and perpendicular to the middle air-homogenizing groove.

[0016] In one embodiment, the optical device mounting portion is a threaded hole.

[0017] In one embodiment, the diameter of the threaded hole is larger than the diameter of the optical access channel.

[0018] In one embodiment, the middle air intake hole of the middle air intake path is vertically downward.

[0019] In one embodiment, the middle air inlet hole is a stepped hole with an inner diameter decreasing step by step.

[0020] In one embodiment, the edge air inlet holes of the edge air inlet gas path form a set angle β with the center line of the gas nozzle.

[0021] In one embodiment, an angle β formed between the edge air inlet hole of the edge air inlet gas path and the center line of the gas nozzle is 30°-65°.

[0022] In one embodiment, the angle β between the edge air inlet hole of the edge air inlet gas path and the center line of the gas nozzle is 45°.

[0023] In one embodiment, the inner end of the gas nozzle is provided with a chamfered portion, and the outer peripheral surface thereof is provided with a step portion.

[0024] In one embodiment, the middle air inlet hole is located at the lower end surface of the gas nozzle, and the edge air inlet hole is located at the chamfered portion of the gas nozzle.

[0025] In one embodiment, the middle air inlet hole is located on the lower end surface of the gas nozzle, and the edge air inlet hole is located on the outer peripheral surface of the gas nozzle.

[0026] In one embodiment, the diameter of the middle air inlet hole is less than 2 mm.

[0027] In one embodiment, the diameter of the edge air inlet hole is between 1 mm and 1.5 mm.

[0028] To achieve the above-mentioned other purpose, the present invention provides an injection system, including a process gas chamber and an injection structure arranged at a central hole on the upper surface of the process gas chamber, wherein the injection structure is the injection structure with an optical access channel described in any of the above-mentioned technical solutions.

[0029] In one embodiment, the intermediate air intake path is connected to the intermediate air intake flow control unit via a first air intake pipe, the edge air intake path is connected to the edge air intake flow control unit via a second air intake pipe, and the intermediate air intake flow control unit and the edge air intake flow control unit are connected to an air source.

[0030] The jet structure with an optical access channel provided by the present invention is mainly composed of an air intake connector and two upper and lower parts of a gas nozzle, an optical access channel is provided in the middle, and two air intake channels are provided on the periphery of the optical access channel, namely a middle air intake path and an edge air intake path. The optical access channel can be used to effectively monitor the situation in the process chamber. The two air intake paths are independently sealed from each other, and any one of the two air intake paths can be controlled separately, thereby effectively controlling the uniformity of the air intake, adjusting the air intake ratio, reducing the risk of arc discharge, reducing gas deposition and particle generation, and thereby improving the production quality of semiconductor chips. The structure is simple and easy to maintain.

[0031] The jet system provided by the present invention is provided with the jet structure with the optical access channel. Since the jet structure with the optical access channel has the above-mentioned technical effects, the jet system should also have corresponding technical effects. BRIEF DESCRIPTION OF THE DRAWINGS

[0032] Figure 1 A schematic structural diagram of an air injection structure with an optical access channel provided by an embodiment of the present invention;

[0033] Figure 2 for Figure 1 A schematic diagram showing a structure in which the gas nozzle is installed in the center hole on the upper surface of the process gas chamber;

[0034] Figure 3 A schematic structural diagram of an injection system provided in an embodiment of the present invention.

[0035] In the figure:

[0036] 10. Air inlet connector 11. Optical device mounting portion 13. Intermediate air-homogenizing groove 131. First air inlet 15. Edge air-homogenizing groove 151. Second air inlet 20. Gas nozzle 21. Optical access channel 23. Annular air-homogenizing groove 24. Intermediate air inlet hole 25. Edge air-homogenizing hole 26. Edge air inlet hole 31. First sealing ring 32. Second sealing ring 33. Third sealing ring 70. Process chamber 71. Medium window 81. First air inlet pipe 82. Second air inlet pipe 91. Intermediate air inlet flow control unit 92. Edge air inlet flow control unit 100. Gas source DETAILED DESCRIPTION

[0037] In order to enable those skilled in the art to better understand the solution of the present invention, the present invention is further described in detail below in conjunction with the accompanying drawings and specific implementation methods.

[0038] In this article, the terms "upper, lower, inside, outside" and the like are established based on the positional relationships shown in the drawings. The corresponding positional relationships may also change depending on the drawings, and therefore cannot be understood as absolute limitations on the scope of protection; moreover, relational terms such as "first" and "second" and the like are merely used to distinguish one component from another with the same name, and do not necessarily require or imply any actual relationship or order between these components.

[0039] On etching equipment, when executing related processes, it is necessary to spray process gas onto the wafer. The applicant found in the research that in this process, the edge and center etching rates are generally different, so it is necessary to spray gas to different areas such as the center and edge of the wafer respectively. After the process is executed, the chamber needs to be plasma cleaned, and it is necessary to spray gas in multiple directions such as the side and downward. Although the traditional air inlet nozzle is set with center and edge jets, the position of the jet nozzle is fixed and cannot be controlled in different areas. It is impossible to control the downward or side jets separately, and it is impossible to control the airflow sprayed to the edge and center of the wafer separately, resulting in different uniformity performances when the etching equipment adopts different processes, and it is difficult to achieve greater improvements in uniformity.

[0040] Please refer to Figure 1 , Figure 1 A schematic structural diagram of an air injection structure with an optical access channel provided by an embodiment of the present invention;

[0041] As shown in the figure, in a specific embodiment, the multi-zone jet air intake structure provided by the present invention is mainly composed of an air intake connector 10 and a gas nozzle 20, the air intake connector 10 is located at the upper part, and the gas nozzle 20 is located at the lower part. The two are interconnected and sealed, and the air intake path is two, namely the middle air intake path and the edge air intake path.

[0042] The gas nozzle 20 is provided with an optical access channel 21 extending downward in the vertical direction at the center. The middle air inlet route is composed of an annular air uniforming groove 23 and an intermediate air inlet hole 24. The intermediate air inlet hole 24 is connected to the lower end of the annular air uniforming groove 23. In order to obtain a better air uniforming effect, the intermediate air inlet holes 24 are distributed in an annular shape, and there are multiple holes that are independent of each other; the edge air inlet route is composed of edge air uniforming holes 25 and edge air inlet holes 26. The edge air uniforming holes 25 and the edge air inlet holes 26 are distributed in an annular shape, and there are multiple holes that are independent of each other.

[0043] In other embodiments, annularly distributed middle air-uniform holes may be used to replace the annular air-uniform groove 23, which can also realize the air intake function and the air-uniform effect.

[0044] In this embodiment, the diameter of the middle air inlet hole 24 is less than 2 mm, and the diameter of the edge air inlet hole 26 is between 1 mm and 1.5 mm.

[0045] The outer peripheral surface of the gas nozzle 20 is provided with a step to facilitate positioning during installation. The inner end of the gas nozzle 20 is also provided with a chamfered portion. The middle air inlet hole 24 is located on the lower end surface of the gas nozzle 20 and extends vertically downward, and is a stepped hole with a gradually decreasing inner diameter. The edge air inlet hole 26 is located at the chamfered portion of the gas nozzle 20 and extends obliquely downward.

[0046] The air inlet connector 10 is provided with an optical device mounting portion 11, an intermediate air homogenizing groove 13 and an edge air homogenizing groove 15. The optical device mounting portion 11 is a threaded hole for installing an optical access window (not shown in the figure), which is connected to the optical access channel 21 and has a diameter larger than the optical access channel 21. The intermediate air homogenizing groove 13 is connected to the annular air homogenizing groove 23, and the edge air homogenizing groove 15 is connected to the edge air homogenizing hole 25. The intermediate air homogenizing groove 13 is provided with an independent first air inlet 131, and the edge air homogenizing groove 15 is provided with an independent second air inlet 151. The two air paths can realize independent air intake.

[0047] The first air inlet 131 of the middle air uniforming groove 13 is located on the side of the air inlet connector 10, extending inward and perpendicular to the middle air uniforming groove 13. The second air inlet 151 of the edge air uniforming groove 15 is located on the side of the air inlet connector 10, extending inward and perpendicular to the middle air uniforming groove 15. The first air inlet 131 and the second air inlet 151 are staggered a certain distance in the circumferential direction.

[0048] A seal is provided between the air inlet connector 10 and the gas nozzle 20 for independently sealing the optical access channel, the middle air inlet path and the edge air inlet path from each other.

[0049] Specifically, a first sealing ring 31 is provided between the mating surfaces of the air intake connector 10 and the gas nozzle 20, between the optical access channel and the intermediate air intake path, a second sealing ring 32 is provided between the intermediate air intake path and the edge air intake path, and a third sealing ring 33 is provided on the outer side of the edge air intake path. By providing three sealing rings, the optical access channel, the intermediate air intake path and the edge air intake path are sealed independently of each other.

[0050] The edge air inlet hole 26 of the edge air inlet path forms a set angle β with the center line of the gas nozzle 20. Depending on the equipment and process requirements, this angle β can be controlled within a range of 30°-65°. In this embodiment, the angle β is 45°.

[0051] Please refer to Figure 2 , Figure 2 for Figure 1 The gas nozzle shown is installed in the central hole of the upper surface of the process gas chamber.

[0052] When in use, a sealed dielectric window 71 is provided on the top of the process chamber 70, and the gas nozzle 20 is installed in the annular groove at the center of the dielectric window 71 and sealed with a sealing ring. The central hole on the upper surface of the process chamber 70 cooperates with the two-way gas nozzle 20 to transport the process gas to the plasma center processing chamber in two directions for etching or deposition.

[0053] As shown by the arrows in the figure, through the above-mentioned air intake structure, when executing the relevant process, the etching rate sprayed to the center and edge areas of the wafer can be controlled by controlling the air intake flow in the direction of the middle air intake path and the edge air intake path, thereby adjusting the uniformity and other issues. In the plasma cleaning chamber mode, by adjusting the air intake flow in the direction of the edge air intake path, the deposits generated on the dielectric window 71, the upper cover, etc. after different processes can be properly cleaned, and by adjusting the air intake flow in the direction of the middle air intake path, the deposits generated on the lower electrode, side wall, etc. of the chamber can be cleaned.

[0054] Both air inlets enter the process chamber through the gas uniformity groove, and the two air inlet channels are independently sealed. Any of the two air inlets can be controlled separately, and the air inlet ratio is adjustable, which can effectively control the uniformity of the air intake, reduce the risk of arc discharge, and reduce the generation of gas deposition and particles. It has a simple structure and is easy to maintain.

[0055] The above embodiments are only preferred solutions of the present invention, and are not limited thereto. On this basis, targeted adjustments can be made according to actual needs to obtain different implementation methods. For example, the angle of the edge air inlet 26 can be adaptively adjusted, or the edge air inlet 26 is located on the outer peripheral surface of the gas nozzle 20, etc. Since there are many possible implementation methods, they will not be described one by one here.

[0056] Please refer to Figure 3 , Figure 3 A schematic structural diagram of an injection system provided in an embodiment of the present invention.

[0057] In addition to the above-mentioned injection structure, the present invention provides an injection system, which is mainly composed of a process gas chamber 70 and an air intake structure arranged at the center hole of the upper surface of the process gas chamber 70, wherein the air intake structure is the injection structure with an optical access channel described above.

[0058] The intermediate air intake path is connected to the intermediate air intake flow control unit 91 through the first air intake pipe 81, and the edge air intake path is connected to the edge air intake flow control unit 92 through the second air intake pipe 82. The intermediate air intake flow control unit 91 and the edge air intake flow control unit 92 are respectively connected to the gas source 100. When working, the gas source 100 can be connected to different injection hole groups of the gas nozzle 20 respectively, so as to realize injection in different directions of different hole groups, and realize the injection on and off and flow adjustment of different injection hole groups.

[0059] Of course, the middle intake air flow control unit 91 and the edge intake air flow control unit 92 can also be integrated into a general control unit, and this general control unit can control two intakes at the same time.

[0060] Regarding the rest of the structure of the jet system, please refer to the prior art and will not be described in detail herein.

[0061] The above is a detailed introduction to the jet structure and jet system with optical access channels provided by the present invention. Specific examples are used herein to illustrate the principles and implementation methods of the present invention, and the description of the above embodiments is only used to help understand the core idea of ​​the present invention. It should be pointed out that for ordinary technicians in this technical field, without departing from the principles of the present invention, the present invention can also be improved and modified in a number of ways, and these improvements and modifications also fall within the scope of protection of the claims of the present invention.

Claims

1. A jet structure with an optical access channel, characterized in that: It comprises an air intake connector (10) and a gas nozzle (20), wherein the air intake connector (10) and the gas nozzle (20) are interconnected; the gas nozzle (20) is provided with an optical access channel (21), an intermediate air intake path and an edge air intake path, wherein the optical access channel is located at the center of the gas nozzle (20) and extends downward in a vertical direction, the intermediate air intake path comprises an intermediate air homogenizing structure and an intermediate air intake hole (24) connected to the intermediate air homogenizing structure, and the edge air intake path comprises an edge air homogenizing hole (25) and an edge air intake hole (26) connected to the edge air homogenizing hole; a seal is provided between the air intake connector (10) and the gas nozzle (20) for independently sealing the optical access channel (21), the intermediate air intake path and the edge air intake path.

2. The jet structure with optical access channel according to claim 1, characterized in that: The intermediate gas homogenizing structure is an annular gas homogenizing groove (23) surrounding the optical access channel (21) in the circumferential direction.

3. The jet structure with optical access channel according to claim 1, characterized in that: The intermediate air-uniform structure is intermediate air-uniform holes distributed along the circumferential direction.

4. The jet structure with optical access channel according to claim 1, characterized in that: The air inlet connector (10) is provided with an optical device mounting portion (11), an intermediate air homogenizing groove (13) and an edge air homogenizing groove (15); the intermediate air homogenizing groove (13) corresponds to the intermediate air homogenizing structure; the edge air homogenizing groove (15) corresponds to the edge air homogenizing hole (25); and the intermediate air homogenizing groove (13) and the edge air homogenizing groove (15) are respectively provided with independent air inlets.

5. The jet structure with optical access channel according to claim 4, characterized in that: The air inlet of the middle air-homogenizing groove (13) is located on the side of the air-housing connecting piece (10), and extends inwardly and is perpendicular to the middle air-homogenizing groove (13).

6. The jet structure with optical access channel according to claim 4, characterized in that: The air inlet of the edge air-homogenizing groove (15) is located on the side of the air-housing connecting piece (10), and extends inwardly and is perpendicular to the middle air-homogenizing groove (15).

7. The jet structure with optical access channel according to claim 4, characterized in that: The optical device mounting portion is a threaded hole.

8. The jet structure with optical access channel according to claim 7, characterized in that: The diameter of the threaded hole is greater than the diameter of the optical access channel (21).

9. The jetting structure with optical access channel according to claim 1, characterized in that: The middle air inlet hole (24) of the middle air inlet path is vertically downward.

10. The jetting structure with optical access channel according to claim 9, characterized in that: The middle air inlet hole (24) is a stepped hole with an inner diameter that decreases step by step.

11. The jetting structure with optical access channel according to claim 1, characterized in that: The edge air inlet hole (26) of the edge air inlet gas path forms a set angle β with the center line of the gas nozzle (20).

12. The jetting structure with optical access channel according to claim 11, characterized in that The angle β formed between the edge air inlet hole (26) of the edge air inlet path and the center line of the gas nozzle (20) is 30°-65°.

13. The jetting structure with optical access channel according to claim 12, characterized in that: The angle β formed between the edge air inlet hole (26) of the edge air inlet path and the center line of the gas nozzle (20) is 45°.

14. The air injection structure with optical access channel according to claim 1, characterized in that The inner end of the gas nozzle (20) is provided with a chamfered portion, and the outer peripheral surface thereof is provided with a stepped portion.

15. The air injection structure with optical access channel according to claim 14, characterized in that The middle air inlet hole (24) is located at the lower end surface of the gas nozzle (20), and the edge air inlet hole (26) is located at the chamfered portion of the gas nozzle (20).

16. The air injection structure with optical access channel according to claim 14, characterized in that The middle air inlet hole (24) is located on the lower end surface of the gas nozzle (20), and the edge air inlet hole (26) is located on the outer peripheral surface of the gas nozzle (20).

17. The air injection structure with optical access channel according to any one of claims 1 to 16, characterized in that: The diameter of the middle air inlet hole (24) is less than 2 mm.

18. The air injection structure with optical access channel according to any one of claims 1 to 16, characterized in that: The diameter of the edge air inlet hole (26) is between 1 mm and 1.5 mm.

19. An air injection system, comprising a process air chamber and an air injection structure provided at a central hole on an upper surface of the process air chamber, characterized in that: The jet structure is the jet structure with an optical access channel as described in any one of claims 1 to 18 above.

20. The gas injection system according to claim 19, characterized in that The intermediate air intake path is connected to an intermediate air intake flow control unit (91) via a first air intake pipe (81), the edge air intake path is connected to an edge air intake flow control unit (92) via a second air intake pipe (82), and the intermediate air intake flow control unit (91) and the edge air intake flow control unit (92) are connected to an air source.

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