Substrate cleaning device and cleaning method

Abstract

The invention discloses a substrate cleaning device and method, and the device comprises a substrate which is provided with a first to-be-cleaned surface; the cleaning assembly comprises a first fluid cleaning unit and a second fluid cleaning unit, the first fluid cleaning unit is provided with a first jet orifice, the first jet orifice is arranged towards the first to-be-cleaned surface, the included angle A between the jet direction of the first jet orifice and the first to-be-cleaned surface is larger than 0 degree and smaller than 90 degrees; the second fluid cleaning unit is provided with a second jet orifice, the second jet orifice faces the first to-be-cleaned surface, the included angle B between the jet direction of the second jet orifice and the first to-be-cleaned surface is larger than 0 degree and smaller than 90 degrees; the conveying unit is connected with the base plate or the cleaning assembly, and the conveying unit can drive the base plate or the cleaning assembly to move in the first direction. The substrate can be cleaned without using a cleaning brush.

Description

Technical Field

[0001] The present invention relates to the technical field of semiconductor manufacturing equipment, and in particular to a substrate cleaning device and a cleaning method. Background Art

[0002] In the preparation process of semiconductor devices, substrate cleaning is a crucial link. The purpose of cleaning the substrate is to remove particles, organic impurities and other contaminants attached to the surface of the substrate to prevent the contaminants on the substrate from affecting subsequent processes and avoid defects in semiconductor devices caused by contaminants on the surface of the substrate.

[0003] At present, the substrate is often cleaned by combining a cleaning brush with a cleaning agent. The cleaning brush contacts the surface of the substrate, and the friction between the cleaning brush and the substrate surface is used to scrub the substrate. The cleaning agent is sprayed on the cleaning brush. While the cleaning brush is scrubbing, the cleaning agent contacts the surface of the substrate to clean the surface of the substrate.

[0004] However, for a substrate with a larger area, when the cleaning brush is used to clean the substrate, the cleaning brush is likely to scratch the surface of the substrate and cause deformation of the substrate. Summary of the invention

[0005] In view of this, the present invention provides a substrate cleaning device and a cleaning method to solve the existing problem that for substrates with larger areas, the cleaning brush is prone to scratching the substrate surface and causing deformation of the substrate during the process of brushing the substrate with the cleaning brush.

[0006] The present invention provides a substrate cleaning device, comprising:

[0007] A substrate having a first surface to be cleaned;

[0008] A cleaning assembly, comprising a first fluid cleaning unit and a second fluid cleaning unit, wherein the first fluid cleaning unit has a first jet port, the first jet port is arranged toward the first surface to be cleaned, and the angle between the jet direction of the first jet port and the first surface to be cleaned is A, wherein 0°<A<90°; the second fluid cleaning unit has a second jet port, the second jet port is arranged toward the first surface to be cleaned, and the angle between the jet direction of the second jet port and the first surface to be cleaned is B, wherein 0°<B<90°;

[0009] A conveying unit is connected to the substrate or the cleaning component, and the conveying unit can drive the substrate or the cleaning component to move toward a first direction.

[0010] In the substrate cleaning device provided by the present application, the angle between the spray direction of the first spray port and the first surface to be cleaned is between 0° and 90°, so that the first fluid sprayed from the first spray port impacts the first surface to be cleaned at a set angle. Firstly, the first fluid sprayed from the first spray port has an impact force, which can peel off the pollutants attached to the impact area of ​​the first surface to be cleaned. Secondly, by adjusting the spray direction of the first spray port, the flow direction of the first fluid on the first surface to be cleaned can be controlled so that the first fluid takes away the pollutants in the impact area of ​​the first surface to be cleaned. In addition, the spray direction of the first spray port is prevented from being perpendicular to the first surface to be cleaned, so as to reduce the splashing of the first fluid and thus reduce the waste of the first fluid. The angle between the spray direction of the second jet port and the first surface to be cleaned is between 0° and 90°, so that the second fluid sprayed from the second jet port impacts the first surface to be cleaned at a set angle. First, the second fluid sprayed from the second jet port has an impact force, which can peel off the pollutants attached to the impact area of ​​the first surface to be cleaned. Secondly, by adjusting the spray direction of the second jet port, the flow direction of the second fluid on the first surface to be cleaned can be controlled so that the second fluid takes away the pollutants in the impact area of ​​the first surface to be cleaned. In addition, the spray direction of the second jet port is prevented from being perpendicular to the first surface to be cleaned to reduce the splashing of the second fluid, thereby reducing the waste of the second fluid. The substrate or the cleaning component is driven to move toward the first direction by the conveying unit to achieve the cleaning of the first surface to be cleaned along the first direction. In the process of cleaning the substrate, the cleaning of the first surface to be cleaned can be completed without using a cleaning brush, thereby avoiding scratching the substrate surface during the cleaning process and causing deformation of the substrate.

[0011] In an optional embodiment, the first fluid cleaning unit and the second fluid cleaning unit are arranged sequentially along the first direction.

[0012] When the substrate or the cleaning component moves along the first direction, the first fluid cleaning unit and the second fluid cleaning unit can successively clean the same area of ​​the first surface to be cleaned, so as to achieve double cleaning of the area. In addition, the cleaning component can complete the cleaning of the first surface to be cleaned along the first direction by the first fluid cleaning unit and the second fluid cleaning unit by scanning along the first direction once, thereby shortening the cleaning time and improving the cleaning efficiency.

[0013] In an optional embodiment, the spraying direction of the first spraying port is parallel to the spraying direction of the second spraying port.

[0014] Since the injection direction of the first injection port is parallel to the injection direction of the second injection port, the flow directions of the first fluid and the second fluid on the first surface to be cleaned are the same, thereby avoiding the situation where the flow directions of the first fluid and the second fluid on the first surface to be cleaned are different, causing the first fluid and the second fluid to flow back to the area where cleaning is completed, thereby avoiding secondary contamination.

[0015] In an optional embodiment, the spraying length of the first spraying port on the first surface to be cleaned along the second direction is greater than or equal to the extension length of the substrate along the second direction;

[0016] The spraying length of the second spraying port on the first surface to be cleaned along the second direction is greater than or equal to the extending length of the substrate along the second direction;

[0017] The second direction is perpendicular to the first direction.

[0018] In the present application, the cleaning component can be scanned once along the first direction to complete the cleaning of the first surface to be cleaned by the first fluid cleaning unit and the second fluid cleaning unit, thereby shortening the cleaning time and improving the cleaning efficiency.

[0019] In an optional embodiment, the substrate has a second surface to be cleaned disposed opposite to the first surface to be cleaned;

[0020] The first fluid cleaning unit has a third jet port, the third jet port is arranged toward the second surface to be cleaned, and the included angle between the jet direction of the third jet port and the second surface to be cleaned is C, wherein 0°<C<90°;

[0021] The second fluid cleaning unit has a fourth jet port, the fourth jet port is arranged toward the second surface to be cleaned, and the included angle between the jet direction of the fourth jet port and the second surface to be cleaned is D, wherein 0°<D<90°.

[0022] The angle between the spray direction of the third spray port and the second surface to be cleaned is between 0°-90°, the first fluid sprayed from the third spray port can peel off pollutants attached to the impact area of ​​the second surface to be cleaned, and the first fluid sprayed from the third spray port can flow in a set direction to carry away the pollutants; the angle between the spray direction of the fourth spray port and the second surface to be cleaned is between 0°-90°, the second fluid sprayed from the fourth spray port can peel off pollutants attached to the impact area of ​​the second surface to be cleaned, and the second fluid sprayed from the fourth spray port can flow in a set direction to carry away the pollutants; in addition, the cleaning component can complete the cleaning of the first surface to be cleaned and the second surface to be cleaned by the first fluid cleaning unit and the second fluid cleaning unit by scanning once along the first direction, thereby shortening the cleaning time and improving the cleaning efficiency.

[0023] In an optional embodiment, the cleaning component further includes a drying unit, the first fluid cleaning unit, the second fluid cleaning unit, and the drying unit are arranged in sequence along the first direction, and the drying unit is used to dry the substrate.

[0024] In the present application, the cleaning component can complete the cleaning and drying of the first surface to be cleaned and the second surface to be cleaned by scanning once along the first direction, thereby shortening the cleaning and drying time, further improving the efficiency of cleaning the substrate, and avoiding the formation of water stains on the first surface to be cleaned and the second surface to be cleaned.

[0025] In an optional embodiment, the drying unit comprises:

[0026] A first air outlet is arranged toward the first surface to be cleaned;

[0027] The second air outlet is arranged toward the second surface to be cleaned.

[0028] In an optional embodiment, the fluid used by the drying unit is nitrogen, and the flow rates of the fluid in the first outlet and the second outlet are both 2m / s-10m / s.

[0029] By using nitrogen gas, oxidation of the substrate is avoided. In addition, nitrogen gas is blown toward the first cleaning surface and the second cleaning surface to remove moisture attached to the first surface to be cleaned and the second surface to be cleaned.

[0030] In an optional embodiment, the first fluid used in the first fluid cleaning unit is a mixed solution of hydrogen chloride, hydrogen peroxide and water or a mixed solution of ammonia water, hydrogen peroxide and water, and the injection speed of the first injection port is 1000ml / min-2000ml / min;

[0031] The first fluid can dissolve various pollutants to achieve the first cleaning of the first surface to be cleaned, and the second fluid can remove the first fluid remaining on the first surface to be cleaned to achieve the second cleaning of the first surface to be cleaned. By setting the injection speed of the first injection port to 1000ml / min-2000ml / min, the first fluid ejected from the first injection port has a set impact force, so as to effectively remove the pollutants attached to the first surface to be cleaned.

[0032] The fluid used in the second fluid cleaning unit is deionized water, and the injection speed of the second injection port is 100 ml / min-500 ml / min.

[0033] In a second aspect, the present invention further provides a cleaning method, using the above-mentioned substrate cleaning device, comprising:

[0034] The conveying unit drives the substrate or the cleaning component to move toward a first direction;

[0035] The first fluid cleaning unit sprays a first fluid onto a first surface to be cleaned through a first spray port;

[0036] The second fluid cleaning unit sprays a second fluid toward the first surface to be cleaned through a second spray port.

[0037] In the present application, the first fluid ejected from the first jet port peels off the pollutants attached to the first surface to be cleaned, and the first fluid on the first surface to be cleaned flows in a set direction to carry away the pollutants, and the second fluid ejected from the second jet port cleans the first surface to be cleaned to achieve a double cleaning effect. In addition, the cleaning component can complete the cleaning of the first surface to be cleaned by the first fluid cleaning unit and the second fluid cleaning unit by scanning once along the first direction, thereby shortening the cleaning time and improving the cleaning efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0038] In order to more clearly illustrate the specific implementation methods of the present invention or the technical solutions in the prior art, the drawings required for use in the specific implementation methods or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are some implementation methods of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0039] Figure 1 It is a structural schematic diagram of the substrate cleaning device in the present invention;

[0040] Figure 2 is a front view of the substrate cleaning device of the present invention;

[0041] Figures 3 to 6 This is a step diagram of the substrate cleaning method of the present invention (the third injection port, the fourth injection port and the second air outlet are not shown in the step diagram).

[0042] Description of reference numerals:

[0043] 100. Substrate;

[0044] 201, first fluid cleaning unit; 2011, first injection port; 2012, third injection port; 202, second fluid cleaning unit; 2021, second injection port; 2022, fourth injection port;

[0045] 300, conveying unit;

[0046] 400, drying unit; 401, first air outlet; 402, second air outlet. DETAILED DESCRIPTION

[0047] The technical solution of the present invention will be described clearly and completely below in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0048] In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc., indicating the orientation or positional relationship, are based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as limiting the present invention. In addition, the terms "first", "second", and "third" are used for descriptive purposes only, and cannot be understood as indicating or implying relative importance.

[0049] In the description of the present invention, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0050] In addition, the technical features involved in the different embodiments of the present invention described below can be combined with each other as long as they do not conflict with each other.

[0051] Example 1

[0052] This embodiment provides a substrate 100 cleaning device, such as Figures 1 to 6 As shown, it includes a substrate 100, a cleaning component and a conveying unit 300, the substrate 100 has a first surface to be cleaned, the cleaning component includes a first fluid cleaning unit 201 and a second fluid cleaning unit, the first fluid cleaning unit 201 has a first jet port 2011; the first jet port 2011 is arranged toward the first surface to be cleaned, and the angle between the jet direction of the first jet port 2011 and the first surface to be cleaned is A, wherein 0°<A<90°; the second fluid cleaning unit 202 has a second jet port 2021, the second jet port 2021 is arranged toward the first surface to be cleaned, and the angle between the jet direction of the second jet port 2021 and the first surface to be cleaned is B, wherein 0°<B<90°; the conveying unit 300 is connected to the substrate 100 or the cleaning component, and the conveying unit 300 can drive the substrate 100 or the cleaning component to move toward the first direction.

[0053] Specifically, the material of the substrate 100 may be one or more of glass, epoxy resin, silicon substrate, and other common substrate materials. In this embodiment, the material of the substrate 100 is glass for illustration. The shape of the cross section of the substrate 100 may be rectangular, circular, triangular, elliptical or other common shapes. Preferably, in this embodiment, the cross-sectional shape of the substrate 100 is rectangular, the length of the substrate 100 is 300-800mm, the width of the substrate 100 is 300-800mm, and the thickness of the substrate 100 is 0.5-1.0mm. In this embodiment, the length of the substrate 100 is 700mm, the width is 600mm, and the thickness is 0.7mm. The first surface to be cleaned is the lower surface of the substrate 100. The first injection port 2011 is a nozzle, and the first fluid cleaning unit also includes a first liquid supply source and a first pump body. The first liquid supply source is a container, and the first liquid supply source contains a first fluid. The first pump body transports the first fluid in the first liquid supply source to the first injection port 2011 through a pipeline, and the first injection port 2011 sprays the first fluid on the first surface to be cleaned to clean the first surface to be cleaned; the second injection port 2021 is also a nozzle, and the second fluid cleaning unit 202 also includes a second liquid supply source and a second pump body. The second liquid supply source is also a container, and the second liquid supply source contains a second fluid. The second pump body transports the second fluid in the second liquid supply source to the second injection port 2021 through a pipeline, and the second injection port 2021 transports the second fluid to the first surface to be cleaned to clean the first surface to be cleaned. The distances between the first jet port 2011 and the second jet port 2021 and the first surface to be cleaned can be adjusted according to the material of the substrate 100 and the jet speed, and the jet speeds of the first jet port 2011 and the second jet port 2021 can also be adjusted according to the material of the substrate 100 and the distance between the jet port and the first surface to be cleaned. The angle between the jet direction of the first jet port 2011 and the first surface to be cleaned is A, wherein 0°<A<90°, that is, the first jet port 2011 is tilted. Preferably, the angle between the jet direction of the first jet port 2011 and the first surface to be cleaned is 65°, which can ensure that the first fluid sprayed on the first surface to be cleaned by the first jet port 2011 has a set impact force, and can also ensure that the first fluid sprayed on the first surface to be cleaned has the power to flow in a set direction. The angle between the jet direction of the second jet port 2021 and the first surface to be cleaned is B, wherein 0°<B<90°, that is, the second jet port 2021 is tilted. Preferably, the angle between the spray direction of the second spray port 2021 and the first surface to be cleaned is 65, which can ensure that the second fluid sprayed from the second spray port 2021 on the first surface to be cleaned has a set impact force, and can also ensure that the second fluid sprayed on the first surface to be cleaned has the power to flow in the set direction.The conveying unit 300 may be a linear motor, a hydraulic cylinder, a cam mechanism, a crank slider mechanism, a belt drive mechanism or other devices that perform linear motion. Preferably, in this embodiment, the conveying unit 300 is a plurality of rollers arranged at intervals along a first direction. The substrate 100 is placed on the rollers covered by the rollers. The rollers are rotated to drive the substrate 100 to move in the first direction. The first direction is the direction in which the first jet port 2011 and the second jet port 2021 can scan the first surface to be cleaned. Preferably, in this embodiment, the first direction is the length direction along the substrate 100. In an alternative embodiment, the conveying unit 300 may also drive the cleaning unit to move along the first direction. The specific embodiment of the conveying unit 300 is not repeated here.

[0054] In this embodiment, the angle between the spray direction of the first spray port 2011 and the first surface to be cleaned is 65°, so that the first fluid sprayed from the first spray port 2011 impacts the first surface to be cleaned at an angle of 65°. First, the first fluid sprayed from the first spray port 2011 has an impact force, which can peel off the pollutants attached to the impact area of ​​the first surface to be cleaned. Secondly, the first fluid on the first surface to be cleaned has a specific flow direction, and the first fluid on the first surface to be cleaned will also be separated from it under the action of gravity, so that the first fluid can take away the pollutants in the impact area of ​​the first surface to be cleaned, and avoid the first fluid carrying pollutants from flowing back to the impact area. In addition, the spray direction of the first spray port 2011 is prevented from being perpendicular to the first surface to be cleaned, so as to reduce the splashing of the first fluid and thus reduce the waste of the first fluid. The angle between the spray direction of the second jet port 2021 and the first surface to be cleaned is 65°, so that the second fluid sprayed from the second jet port 2021 impacts the first surface to be cleaned at an angle of 65°. First, the second fluid sprayed from the second jet port 2021 has an impact force, which can peel off the pollutants attached to the impact area of ​​the first surface to be cleaned. Secondly, the second fluid on the first surface to be cleaned has a specific flow direction, and the second fluid on the first surface to be cleaned will also be separated from it under the action of gravity, so that the second fluid can take away the pollutants in the impact area of ​​the first surface to be cleaned, and avoid the second fluid carrying pollutants from flowing back to the impact area. In addition, the spray direction of the second jet port 2021 is prevented from being perpendicular to the first surface to be cleaned to reduce the splashing of the second fluid, thereby reducing the waste of the second fluid. The substrate 100 or the cleaning component is driven to move toward the first direction by the conveying unit 300 to achieve the cleaning of the first surface to be cleaned along the first direction. In the process of cleaning the substrate 100, the cleaning of the first surface to be cleaned can be completed without using a cleaning brush, thereby avoiding scratching the surface of the substrate 100 during the cleaning process and causing the deformation of the substrate 100.

[0055] In one embodiment, Figures 1 to 3As shown, the first fluid cleaning unit and the second fluid cleaning unit 202 are arranged in sequence along the first direction. When the substrate 100 or the cleaning component moves along the first direction, the first fluid cleaning unit 201 and the second fluid cleaning unit 202 can sequentially clean the same area of ​​the first surface to be cleaned, so as to achieve double cleaning of the area. In addition, the cleaning component can complete the cleaning of the first surface to be cleaned along the first direction by the first fluid cleaning unit 201 and the second fluid cleaning unit 202 by scanning along the first direction once, thereby shortening the cleaning time and improving the cleaning efficiency.

[0056] In one embodiment, Figure 2 As shown, the spray direction of the first spray port 2011 is parallel to the spray direction of the second spray port 2021. Since the spray direction of the first spray port 2011 is parallel to the spray direction of the second spray port 2021, the flow directions of the first fluid and the second fluid on the first surface to be cleaned are the same, which avoids the first fluid and the second fluid on the first surface to be cleaned from flowing in different directions, thereby avoiding secondary contamination.

[0057] In one embodiment, Figure 1 As shown, the spraying length of the first jet port 2011 on the first surface to be cleaned along the second direction is greater than or equal to the extension length of the substrate 100 along the second direction; the spraying length of the second jet port 2021 on the first surface to be cleaned along the second direction is greater than or equal to the extension length of the substrate 100 along the second direction; the second direction is perpendicular to the first direction. The second direction is the direction extending along the width of the substrate 100. The first jet port 2011 can be a plurality of nozzles arranged at intervals along the second direction. The spraying areas of the plurality of nozzles overlap or connect with each other on the first surface to be cleaned, and the length of the total area overlapped or connected with each other along the second direction is greater than or equal to the extension length of the substrate 100 along the second direction. The second jet port 2021 adopts the same setting method as the first jet port 2011, which will not be repeated here. Of course, those skilled in the art can adjust the number of nozzles according to the spraying area of ​​the nozzle and the surface area of ​​the substrate 100. So that the cleaning component can complete the cleaning of the first surface to be cleaned by the first fluid cleaning unit and the second fluid cleaning unit 202 by scanning once along the first direction, so as to shorten the cleaning time and improve the cleaning efficiency.

[0058] In one embodiment, the substrate 100 has a second surface to be cleaned arranged opposite to the first surface to be cleaned; the second surface to be cleaned is the upper surface; the first fluid cleaning unit 201 has a third jet port 2012, the third jet port 2012 and the first jet port 2011 are located above and below the substrate 100, and are symmetrically arranged with each other, the third jet port 2012 is arranged toward the second surface to be cleaned, and the angle between the jet direction of the third jet port 2012 and the second surface to be cleaned is C, wherein 0°<C<90°; the second fluid cleaning unit has a fourth jet port 2022, the fourth jet port 2022 and the second jet port 2021 are located above and below the substrate 100, and are symmetrically arranged with each other, the fourth jet port 2022 is arranged toward the second surface to be cleaned, and the angle between the jet direction of the fourth jet port 2022 and the second surface to be cleaned is D, wherein 0°<D<90°. The angle between the spray direction of the third spray port 2012 and the second surface to be cleaned is between 0°-90°, the first fluid sprayed from the third spray port 2012 can peel off the pollutants attached to the impact area of ​​the second surface to be cleaned, and the first fluid sprayed from the third spray port 2012 can flow in a set direction to carry away the pollutants; the angle between the spray direction of the fourth spray port 2022 and the second surface to be cleaned is between 0°-90°, the second fluid sprayed from the fourth spray port 2022 can peel off the pollutants attached to the impact area of ​​the second surface to be cleaned, and the first fluid sprayed from the fourth spray port 2022 can flow in a set direction to carry away the pollutants; in addition, the cleaning component can complete the cleaning of the first surface to be cleaned and the second surface to be cleaned by the first fluid cleaning unit and the second fluid cleaning unit 202 by scanning once along the first direction, thereby shortening the cleaning time and improving the cleaning efficiency.

[0059] In one embodiment, the cleaning component further includes a drying unit 400, and the first fluid cleaning unit 201, the second fluid cleaning unit 202, and the drying unit 400 are arranged in sequence along the first direction, and the drying unit 400 is used to dry the substrate 100. The cleaning component can complete the cleaning and drying of the first surface to be cleaned and the second surface to be cleaned by scanning once along the first direction, shortening the cleaning and drying time, further improving the efficiency of cleaning the substrate 100, and avoiding the formation of water stains on the first surface to be cleaned and the second surface to be cleaned. Specifically, the drying unit 400 includes a first air outlet 401 and a second air outlet 402, the first air outlet 401 is arranged toward the first surface to be cleaned; the second air outlet 402 is arranged toward the second surface to be cleaned, the second air outlet 402 and the first air outlet 401 are located above and below the substrate 100, and are arranged symmetrically with each other. Preferably, the drying unit 400 includes a first air knife and a second air knife, and a plurality of first air outlets 401 are distributed at intervals on the first air knife, and a plurality of second air outlets 402 are distributed at intervals on the second air knife. The fluid used in the drying unit 400 is nitrogen, and the flow rate of the fluid in the first outlet and the second outlet 402 is 2m / s-10m / s. By using nitrogen, the substrate 100 is prevented from being oxidized. In addition, by blowing nitrogen to the first cleaning surface and the second cleaning surface, the moisture attached to the first surface to be cleaned and the second surface to be cleaned is removed.

[0060] In one embodiment, the first fluid used in the first fluid cleaning unit is a mixed solution of hydrogen chloride, hydrogen peroxide and water or a mixed solution of ammonia, hydrogen peroxide and water, and the jet speed of the first jet port 2011 is 1000ml / min-2000ml / min; the first fluid can dissolve various pollutants to achieve the first cleaning of the first surface to be cleaned, and the second fluid can remove the first fluid remaining on the first surface to be cleaned to achieve the second cleaning of the first surface to be cleaned. By setting the jet speed of the first jet port 2011 to 1000ml / min-2000ml / min, the first fluid sprayed from the first jet port 2011 has a set impact force to effectively remove the pollutants attached to the first surface to be cleaned. The fluid used in the second fluid cleaning unit 202 is deionized water, and the jet speed of the second jet port 2021 is 100ml / min-500ml / min.

[0061] Example 2

[0062] This embodiment provides a cleaning method, using the substrate 100 cleaning device in Embodiment 1, comprising the following steps:

[0063] S101, such as Figure 3 As shown, the conveying unit 300 drives the substrate 100 to move toward the first direction.

[0064] Specifically, the conveying unit 300 is a plurality of rollers spaced apart along the first direction. The substrate 100 is placed on the rollers, and the rollers rotate to drive the substrate 100 to move toward the first direction. The speed at which the substrate 100 moves toward the first direction is 0.5-2 cm / s.

[0065] S102, such as Figure 4 As shown, the substrate 100 is transferred to the first cleaning position, which is the initial position where the first jet port 2011 can jet the first fluid onto the substrate 100, and the first fluid cleaning unit 201 starts to work, the first jet port 2011 jets the first fluid toward the first surface to be cleaned (lower surface), and the third jet port 2012 jets the first fluid toward the second surface to be cleaned (upper surface), and cleans the impact area. The first fluid is a mixed solution of hydrogen chloride, hydrogen peroxide and water or a mixed solution of ammonia, hydrogen peroxide and water, and the jet speed of the first jet port 2011 is 1000ml / min-2000ml / min.

[0066] S103, such as Figure 5 As shown, the conveying unit 300 drives the substrate 100 to continue to move in the first direction, and transfers the substrate 100 to the second cleaning position. The second cleaning position is the initial position where the second jet port 2021 can spray the second fluid on the substrate 100. The second fluid cleaning unit starts to work, and the second jet port 2021 sprays the second fluid toward the first surface to be cleaned (lower surface), and the fourth jet port 2022 sprays the second fluid toward the second surface to be cleaned (upper surface), and cleans the impact area. Among them, the second fluid is deionized water, and the spray speed of the second jet port 2021 is 100ml / min-500ml / min. After the first fluid cleaning unit cleans the substrate 100, the second fluid cleaning unit is cleaned accordingly, and the cleaning component scans once to complete double cleaning.

[0067] S104, such as Figure 6 As shown, the conveying unit 300 drives the substrate 100 to continue to move in the first direction, and transfers the substrate 100 to the third cleaning position. The third cleaning is that the drying unit 400 can blow nitrogen to the initial position of the surface of the substrate 100. The drying unit 400 starts to work, and the first air knife blows nitrogen toward the first surface to be cleaned through the first air outlet 401, and the second air knife blows nitrogen toward the second surface to be cleaned through the second air outlet 402 to dry the first surface to be cleaned and the second surface to be cleaned, that is, nitrogen is used to dry the second fluid remaining on the surface of the substrate 100. Among them, the nitrogen flow rate is 2m / s to 10m / s. The high-speed airflow drives the remaining second fluid to leave the surface of the substrate 100, ensuring that the cleaned substrate 100 is clean, dry, and free of impurities.

[0068] In this embodiment, the first fluid ejected from the first jet port 2011 peels off the pollutants attached to the first surface to be cleaned, and makes the first fluid on the first surface to be cleaned flow in a set direction to take away the pollutants, and the second fluid ejected from the second jet port 2021 cleans the first surface to be cleaned, so as to achieve a double cleaning effect. In addition, the cleaning component can complete the cleaning of the first surface to be cleaned by the first fluid cleaning unit and the second fluid cleaning unit 202 by scanning once in the first direction, thereby shortening the cleaning time and improving the cleaning efficiency.

[0069] Although the embodiments of the present invention have been described in conjunction with the accompanying drawings, those skilled in the art may make various modifications and variations without departing from the spirit and scope of the present invention, and such modifications and variations are all within the scope defined by the appended claims.

Claims

1. A substrate cleaning device, characterized in that: include: A substrate (100) having a first surface to be cleaned; A cleaning component, comprising a first fluid cleaning unit (201) and a second fluid cleaning unit (202), wherein the first fluid cleaning unit (201) has a first jet port (2011), the first jet port (2011) is arranged toward the first surface to be cleaned, and the angle between the jet direction of the first jet port (2011) and the first surface to be cleaned is A, wherein 0°<A<90°; and the second fluid cleaning unit (202) has a second jet port (2021), the second jet port (2021) is arranged toward the first surface to be cleaned, and the angle between the jet direction of the second jet port (2021) and the first surface to be cleaned is B, wherein 0°<B<90°; The conveying unit (300) is connected to the substrate (100) or the cleaning component, and the conveying unit (300) can drive the substrate (100) or the cleaning component to move in a first direction.

2. The substrate cleaning device according to claim 1, characterized in that: The first fluid cleaning unit (201) and the second fluid cleaning unit (202) are arranged in sequence along the first direction.

3. The substrate cleaning device according to claim 2, characterized in that: The spraying direction of the first spraying port (2011) is parallel to the spraying direction of the second spraying port (2021).

4. The substrate cleaning device according to claim 3, characterized in that: The spraying length of the first spraying port (2011) on the first surface to be cleaned along the second direction is greater than or equal to the extension length of the substrate (100) along the second direction; The spraying length of the second spraying port (2021) on the first surface to be cleaned along the second direction is greater than or equal to the extension length of the substrate (100) along the second direction; The second direction is perpendicular to the first direction.

5. The substrate cleaning device according to any one of claims 1 to 4, characterized in that: The substrate (100) has a second surface to be cleaned arranged opposite to the first surface to be cleaned; The first fluid cleaning unit (201) has a third jet port (2012), the third jet port (2012) is arranged toward the second surface to be cleaned, and the angle between the jet direction of the third jet port (2012) and the second surface to be cleaned is C, wherein 0°<C<90°; The second fluid cleaning unit has a fourth jet port (2022), the fourth jet port (2022) is arranged toward the second surface to be cleaned, and the angle between the jet direction of the fourth jet port (2022) and the second surface to be cleaned is D, wherein 0°<D<90°.

6. The substrate cleaning device according to claim 5, characterized in that: The cleaning component further comprises a drying unit (400), wherein the first fluid cleaning unit (201), the second fluid cleaning unit (202), and the drying unit (400) are arranged in sequence along the first direction, and the drying unit (400) is used to dry the substrate (100).

7. The substrate cleaning device according to claim 6, characterized in that: The drying unit (400) comprises: A first air outlet (401) is arranged toward the first surface to be cleaned; The second air outlet (402) is arranged toward the second surface to be cleaned.

8. The substrate cleaning device according to claim 7, characterized in that: The fluid used by the drying unit (400) is nitrogen, and the flow rates of the fluid in the first air outlet (401) and the second air outlet (402) are both 2 m / s-10 m / s.

9. The substrate cleaning device according to claim 1, characterized in that: The first fluid used in the first fluid cleaning unit (201) is a mixed solution of hydrogen chloride, hydrogen peroxide and water or a mixed solution of ammonia water, hydrogen peroxide and water, and the injection speed of the first injection port (2011) is 1000ml / min-2000ml / min; The second fluid used in the second fluid cleaning unit (202) is deionized water, and the injection speed of the second injection port (2021) is 100 ml / min-500 ml / min.

10. A substrate cleaning method, characterized in that: A substrate (100) cleaning device according to any one of claims 1 to 9, comprising: The conveying unit (300) drives the substrate (100) or the cleaning component to move toward a first direction; The first fluid cleaning unit (201) sprays a first fluid onto a first surface to be cleaned through a first spray port (2011); The second fluid cleaning unit (202) sprays the second fluid onto the first surface to be cleaned through the second spray port (2021).

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