Optical biometry device

Abstract

An optical biomass measurement device includes: a substrate; the light source is arranged on the substrate; the photodiode sensor is arranged on the substrate and is transversely spaced from the light source; the plurality of light blocking walls are vertically arranged on the substrate and are transversely positioned on the two sides of the light source and the two sides of the photodiode sensor; the sealing glue layer covers the light source, the photodiode sensor and the light blocking walls; the cover plate is glued on the sealing glue layer; the plurality of light absorption films are vertically aligned with the light blocking walls and are arranged in a plurality of etching areas on the upper surface of the cover plate; the light filtering thin film is arranged on the cover plate and the light absorbing thin films; the plurality of nano metal particles are arranged on the filtering film at intervals; and the antibacterial optical thin film covers the nano metal particles and the filtering thin film.

Description

Technical Field

[0001] The present invention relates to an optical biometric device, and in particular to a non-invasive optical biometric device. Background Art

[0002] In recent years, smart wearable devices (eg, smart watches, etc.) have become popular and can be used as non-invasive optical biometric devices to provide users with various physiological information (eg, heart rate, blood oxygen saturation, blood pressure, blood sugar, etc.).

[0003] Since wearable devices are worn on the body for a long time and come into contact with sweat on the surface of human skin, these contact areas are likely to become a breeding ground for bacteria. With the long-term friction between these contact areas and human skin, these bacteria may enter the skin and cause infections such as abscesses or painful rashes.

[0004] In view of this, how to improve the antibacterial ability of wearable devices is an issue that the industry urgently needs to solve. Summary of the invention

[0005] The purpose of the present invention is to improve the antibacterial ability of an optical biometric device. The present invention improves the process of forming an antibacterial optical film so that the antibacterial optical film has a periodic nanostructure, thereby increasing the surface area (i.e., reaction area) of the antibacterial optical film to achieve the effect of improving the antibacterial ability. Accordingly, compared with traditional wearable devices, wearable devices using the optical biometric device of the present invention can have higher antibacterial ability.

[0006] To achieve the above-mentioned purpose, the present invention discloses an optical biometric device, comprising: a substrate; a light source disposed on the substrate; a photodiode sensor disposed on the substrate and laterally spaced from the light source; a plurality of light-blocking walls disposed vertically on the substrate and laterally located on both sides of the light source and the photodiode sensor; a sealing layer covering the light source, the photodiode sensor and the light-blocking walls; a cover plate glued to the sealing layer; a plurality of light-absorbing films, vertically aligned with the light-blocking walls, disposed in a plurality of etched areas on an upper surface of the cover plate; a light-filtering film disposed on the cover plate and the light-absorbing films; a plurality of nano-metal particles, disposed on the light-filtering film at a distance from each other; and an antibacterial optical film covering the nano-silver particles and the light-filtering film.

[0007] In one implementation, the nano-metal particles are a plurality of nano-silver particles.

[0008] In one implementation, a ratio of an area of ​​the nano-silver particles to an area of ​​the filter film is less than 10%.

[0009] In one implementation, a particle size of the nanosilver particles is less than 5 nanometers (nm).

[0010] In one implementation, the distance between the nano-silver particles is 50 nm to 100 nm.

[0011] In one implementation, the nano silver particles are formed by forming a silver film on the filter film and then performing a thermal annealing process.

[0012] In one implementation, the thermal annealing process is performed at 300° C. to 500° C. for 60 minutes.

[0013] In one implementation, a thickness of the antibacterial optical film is greater than 5 nm.

[0014] In one implementation, the antibacterial optical film has a refractive index of 1.5 to 2.5.

[0015] In one implementation, the antibacterial optical film is made of a zinc sulfide material.

[0016] In one implementation, the light source is a light emitting diode.

[0017] In one implementation, the filter film is formed by overlapping a plurality of titanium dioxide layers and a plurality of silicon dioxide layers.

[0018] After referring to the accompanying drawings and the embodiments described below, a person having ordinary technical knowledge in this technical field will understand other objects of the present invention, as well as the technical means and embodiments of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] Figure 1 is a cross-sectional schematic diagram of an optical biometric measuring device according to an embodiment of the present invention;

[0020] Figure 2 is a top view schematic diagram showing a plurality of nano-metal particles formed on a filter film;

[0021] Figure 3A and Figure 3B is a schematic diagram showing a process of forming a plurality of nano-metal particles on a filter film; and

[0022] Figure 4A and Figure 4B Schematic diagrams of the implementation methods of antibacterial optical films with different thicknesses.

[0023] Description of Reference Numerals

[0024] 100: Optical biometric device

[0025] 11: Substrate

[0026] 13: Light Source

[0027] 15: Photodiode sensor

[0028] 17: Light blocking wall

[0029] 19: Sealing layer

[0030] 21: Cover

[0031] 23: Light absorbing film

[0032] 25: Filter film

[0033] 26: Silver film

[0034] 27: Nanometal particles

[0035] 29: Antibacterial optical film. DETAILED DESCRIPTION

[0036] The present invention will be explained below by way of examples, and the examples of the present invention are not intended to limit the present invention to any specific environment, application or special method as described in the examples. Therefore, the description of the examples is only for the purpose of explaining the present invention, and is not intended to limit the present invention. It should be noted that in the following examples and drawings, elements that are not directly related to the present invention have been omitted and are not shown, and the dimensional relationship between the elements in the drawings is only for easy understanding, and is not intended to limit the actual proportion.

[0037] One embodiment of the present invention is Figure 1 , which is a cross-sectional schematic diagram of an optical biometric device 100. The optical biometric device 100 can be used, for example, to measure blood sugar, but is not limited thereto. In other embodiments, by adjusting the applied spectral range, the optical biometric device of the present invention can also be used to measure other physiological information (e.g., heart rate, blood oxygen saturation, blood pressure, etc.).

[0038] The optical biometric device 100 includes a substrate 11 , a light source 13 , a photodiode (PD) sensor 15 , a plurality of light-blocking walls 17 , a sealing layer 19 , a cover plate 21 , a plurality of light-absorbing films 23 , a light-filtering film 25 , a plurality of nano-metal particles 27 and an antibacterial optical film 29 .

[0039] The substrate 11 may be a ceramic circuit board, but is not limited thereto. The thickness of the substrate 11 may be 0.45 mm, but is not limited thereto. The light source 13 is disposed on the substrate 11. The light source 13 may be a light emitting diode, for example, a light emitting diode that generates light with a wavelength of 700 nm to 2000 nm. In other embodiments, the light source 13 may be other light emitting devices that can generate light within a specific wavelength range.

[0040] The photodiode sensor 15 is also disposed on the substrate 11 and is laterally spaced from the light source 13. The photodiode sensor 15 may be an indium gallium arsenide (InGaAs) photodiode sensor, and its wavelength range of sensitivity is 900nm to 1700nm, but is not limited thereto. The light-blocking walls 17 (for example, 3 light-blocking walls) are vertically disposed on the substrate 11 and are laterally located on both sides of the light source 13 and on both sides of the photodiode sensor 15. The light-blocking walls 17 can ensure that the light emitted by the light source 13 is not directly received by the photodiode sensor 15, and can also prevent light leakage. For example, each light-blocking wall 17 can be made of an epoxy resin (Epoxy) that has a matte black appearance after curing, so that both visible light and invisible light will not penetrate each light-blocking wall 17. The height of the light-blocking walls 17 can be 0.5mm, but is not limited thereto.

[0041] The sealing layer 19 may be a transparent epoxy resin, which covers the light source 13, the photodiode sensor 15 and the light-blocking walls 17, and allows the cover plate 21 to be glued to the sealing layer 19. The cover plate 21 may be made of glass material. The thickness of the cover plate 21 may be 0.4 mm, but is not limited thereto. The light-absorbing films 23 are vertically aligned with the light-blocking walls 17 and are arranged in multiple etched areas on an upper surface of the cover plate 21. The light-absorbing films 23 are used to absorb unwanted reflected light.

[0042] Specifically, the cover plate 21 is first formed by etching the upper surface of the cover plate 21 at the position aligned with the light blocking walls 17, and then the light absorbing films 23 are formed in the etching areas. Each light absorbing film 23 can be formed by overlapping multiple chromium (Cr) layers and multiple silicon dioxide (SiO2) layers, which have the characteristics of low reflection and high absorption. The thickness of each light absorbing film 23 can be 500nm to 1500nm. The preferred thickness of each light absorbing film 23 is 960nm.

[0043] The filter film 25 is disposed on the cover plate 21 and the light absorbing films 23 to allow a specific light band to penetrate and reflect the other bands. The thickness of the filter film 25 can be 4 micrometers (um) to 10um. The preferred thickness of the filter film 25 is 4um. For example, the filter film 25 can be formed by overlapping multiple titanium dioxide layers and multiple silicon dioxide layers, and can be formed by a physical vapor deposition (PVD) or chemical vapor deposition (CVD) method. The thickness of each titanium dioxide layer and each silicon dioxide layer can be determined according to the wavelength of the light, that is, based on the spectrum of the light source 13.

[0044] The nano-metal particles 27 are disposed on the filter film 25 at a distance from each other. Figure 2As shown, the nano-metal particles 27 are arranged periodically on the filter film 25. It should be noted that Figure 2 The patterns of the nano-metal particles 27 shown are for illustration only and are not intended to be limiting. In other words, the nano-metal particles 27 can be configured to present any periodically arranged patterns, and these possible patterns are all equivalent alternatives or obvious variations of the present invention.

[0045] For example, the nano-metal particles 27 may be a plurality of nano-silver particles to further provide an antibacterial effect. The ratio of an area of ​​the nano-silver particles to an area of ​​the filter film 25 may be less than 10%. The particle size of the nano-silver particles may be less than 5 nm. The distance between the nano-silver particles may be 50 nm to 100 nm. In one implementation, the particle size of the nano-silver particles is 5 nm, the distance between them is 50 nm (i.e., the period is 50 nm), and the ratio of the area of ​​the nano-silver particles to an area of ​​the filter film 25 is 8%.

[0046] Figure 3A and 3B The formation method of the nano-metal particles 27 (nano-silver particles are used as an example) in practice is described as follows: First, a silver film 26 is formed on the filter film 25 (for example, by physical vapor deposition). Figure 3A Next, a thermal annealing process is performed to form the nano-metal particles 27, as shown in FIG. Figure 3B As shown. For example, the thermal annealing process can be performed at 300°C to 500°C for 60 minutes to cluster the silver film 26 into a periodic nanoparticle structure. The particle size of the nano-metal particles 27 will change with the thickness of the silver film 26. Therefore, in practice, the particle size of the nano-metal particles can be changed by adjusting the thickness of the silver film 26.

[0047] The antibacterial optical film 29 covers the nano-metal particles 27 and the filter film 25. The antibacterial optical film 29 contacts the human skin when the optical biometric device 100 is used. The antibacterial optical film 29 can be made of a zinc sulfide (ZnS) material, but is not limited thereto. In addition, in practice, the thickness of the antibacterial optical film 29 can be greater than 5 nm, and the refractive index of the antibacterial optical film 29 can be 1.5 to 2.5, but is not limited thereto. In other words, a zinc sulfide layer greater than 5 nm can be plated on the periodic nanostructure (i.e., the filter film 25 on which the nano-metal particles 27 are disposed).

[0048] It should be noted that the present invention can first make the cover plate 21 and the structure above it into a module. In other words, the present invention can first form the light-absorbing films 23 in the etching areas of the cover plate 21, and then form the filter film 25 on the cover plate 21 and the light-absorbing films 23. Then, the nano-metal particles 27 and the antibacterial optical film 29 are formed on the filter film 25 to produce the module. Finally, the module is glued to the sealing layer 19 (that is, the cover plate 21 is glued to the sealing layer 19) to complete the optical biometric device 100 of the present invention. In one embodiment, the present invention can use a large cover plate, form the above-mentioned structure on it, and obtain multiple modules by cutting.

[0049] Figure 4A and Figure 4B 2 are respectively depicted the implementation of the antibacterial optical film 29 with different thicknesses. Under the condition that the particle size of the nano metal particles 27 (herein, nano silver particles are used for illustration) is 5 nm and the period is 50 nm, when the thickness of the antibacterial optical film 29 is 5 nm, the surface area of ​​the antibacterial optical film 29 can be increased by about 17% (e.g., Figure 4A When the thickness of the antibacterial optical film 29 is 25 nm, the surface area of ​​the antibacterial optical film 29 can be increased by about 70% (as shown in FIG. Figure 4B As shown in FIG. 1 , the surface area of ​​the antibacterial optical film 29 of the present invention can be increased by about 17% to 70% compared to the surface area of ​​the conventional flat antibacterial optical film. In addition, based on the implementation results, the preferred thickness of the antibacterial optical film 29 of the present invention is 25 nm.

[0050] In summary, the present invention forms periodically arranged nano-metal particles on the filter film, so that the subsequently formed antibacterial optical film also has a periodic nanostructure. Accordingly, the present invention can effectively increase the surface area (i.e., reaction area) of the antibacterial optical film and thus improve the antibacterial ability of the wearable device.

[0051] The above embodiments are only used to illustrate the implementation methods of the present invention and to explain the technical features of the present invention, and are not used to limit the protection scope of the present invention. Any equivalent substitution method or obvious variation method that can be easily completed by a person skilled in the art belongs to the scope claimed by the present invention, and the protection scope of the present invention shall be subject to the claims.

Claims

1. An optical biometric device, comprising: a substrate; a light source disposed on the substrate; a photodiode sensor disposed on the substrate and laterally spaced from the light source; A plurality of light-blocking walls are vertically disposed on the substrate and laterally located on both sides of the light source and on both sides of the photodiode sensor; A sealing layer covering the light source, the photodiode sensor and the light-blocking walls; A cover plate, glued on the sealing glue layer; A plurality of light-absorbing films are vertically aligned with the light-blocking walls and are disposed in a plurality of etching areas on an upper surface of the cover plate; A light filtering film, disposed on the cover plate and the light absorbing films; A plurality of nano-metal particles are disposed on the filter film at a distance from each other; and An antibacterial optical film covers the nano metal particles and the filter film.

2. The optical biometric device according to claim 1, wherein: The nano metal particles are a plurality of nano silver particles.

3. The optical biometric device according to claim 2, wherein: The ratio of an area of ​​the nano silver particles to an area of ​​the filter film is less than 10%.

4. The optical biometric device according to claim 2, wherein: The nano silver particles have a particle size less than 5 nanometers.

5. The optical biometric device according to claim 2, wherein: The distance between the nano silver particles is 50 nanometers to 100 nanometers.

6. The optical biometric device according to claim 2, wherein: The nano silver particles are formed by forming a silver film on the filter film and then performing a thermal annealing process.

7. The optical biometric device according to claim 6, wherein: The thermal annealing process is performed at 300° C. to 500° C. for 60 minutes.

8. The optical biometric device according to claim 1, wherein: The antibacterial optical film has a thickness greater than 5 nanometers.

9. The optical biometric device according to claim 1, wherein: The antibacterial optical film has a refractive index of 1.5 to 2.

5.

10. The optical biometric device according to claim 1, wherein: The antibacterial optical film is made of zinc sulfide material.

11. The optical biometric device according to claim 1, wherein: The light source is a light emitting diode.

12. The optical biometric device according to claim 1, wherein: The light filtering film is formed by overlapping a plurality of titanium dioxide layers and a plurality of silicon dioxide layers.

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