Anode and double rotating cathodes with symmetrical anodes
By designing a double rotating cathode with symmetrical anode and anode, the problem of uneven etching of the target material caused by the diagonal effect in magnetron sputtering is solved, and the target material utilization rate and film thickness uniformity are improved.
Patent Information
- Application Number
- CN202411982419.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-31
- Publication Date
- 2025-05-02
AI Technical Summary
During magnetron sputtering, the diagonal effect caused by the asymmetric distribution of the anode leads to uneven etching of the target material and the reduction of the target material utilization, which has a negative impact on the coating.
A double rotating cathode with anode and anode symmetrical is designed to form two independent target placement spaces through two sets of symmetrical anode bodies and support components to slow down the diagonal effect, and to improve the target utilization and film thickness uniformity through symmetrical electric field distribution.
Effectively slow down the diagonal effect, improve the utilization rate of target materials and film thickness uniformity, and improve the quality and performance of the coating.
Smart Images
Figure CN119913467A_ABST
Abstract
Description
Technical Field
[0001] The invention relates to the technical field of magnetron sputtering, and in particular to an anode and an anode-symmetrical double-rotating cathode. Background Art
[0002] The anode is an important component of the double rotating cathode. It is used to assist the normal sputtering. Its main functions include the following aspects:
[0003] 1. During magnetron sputtering, the target material on the cathode will be bombarded by ions, causing the atoms or molecules on the surface of the target material to detach from the surface and fly into the vacuum. These atoms or molecules detached from the surface will carry an electric charge, and the anode can absorb these charged particles to maintain the charge balance of the system.
[0004] 2. Formation and maintenance of plasma: The anode can provide a stable electric or magnetic field to help form and maintain plasma.
[0005] 3. Control the energy and direction of sputtered particles: In the magnetron process, the anode can be used to control the energy and direction of the sputtered particles. By adjusting the voltage and position of the anode, the energy and direction of the sputtered particles can be controlled to achieve the desired film quality and performance.
[0006] 4. Prevent excessive erosion of the target material: During magnetron sputtering, the anode can help prevent excessive erosion of the target material. Since the anode can absorb charged particles, it can reduce the bombardment of charged particles on the target material, thereby preventing excessive erosion of the target material.
[0007] The diagonal effect is an asymmetric etching phenomenon that occurs in magnetron sputtering due to the asymmetric distribution of the anode. Figure 1-2 As shown, the corner etching of the sputtering track on the side close to the anode along the direction of the Hall current is significantly enhanced, while the corresponding corner etching on the other side is relatively weak. If there are two targets, the etching is enhanced along the diagonal direction, resulting in uneven etching of the target material and reduced target material utilization, which has a negative impact on the coating. Summary of the invention
[0008] In order to solve the technical problems existing in the background technology, the present invention proposes an anode and a double rotating cathode with symmetrical anodes.
[0009] An anode provided by the present invention comprises: at least two groups of anode bodies and a support component for supporting the two groups of anode bodies;
[0010] Each group of anode bodies includes a first side anode body and a second side anode body which are arranged opposite to each other and have a target placement space reserved therebetween, and the two groups of anode bodies are arranged side by side so that the first side anode body / second side anode body in one group of anode bodies and the first side anode body / second side anode body in the other group of anode bodies are back to back.
[0011] Preferably, the first side anode bodies in the two groups of anode bodies are provided with a first side guard plate near their target material placement space sides, and the second side anode bodies in the two groups of anode bodies are provided with a second side guard plate near their target material placement space sides.
[0012] Preferably, the support component includes an end support and a middle support, wherein a plurality of end supports are provided and are respectively arranged at the ends of the first side anode body and the second side anode body; a plurality of middle supports are provided and are respectively arranged in the middle parts of the first side anode body and the second side anode body.
[0013] Preferably, it also includes a functional seat for passing cooling water and connecting electricity, and the functional seat is installed on the supporting component.
[0014] The present invention provides a double-rotating cathode with symmetrical anode, comprising: a first target material, a second target material, and the anode as described above;
[0015] The first target material and the second target material are respectively located between the first side anode body and the second side anode body in the two groups of anode bodies.
[0016] Preferably, the distance between the first target and the first anode body and the second anode body on both sides thereof is equal to the distance between the second target and the first anode body and the second anode body on both sides thereof.
[0017] Preferably, it also includes a machine body, and the first target material, the second target material and the supporting component are all mounted on the machine body.
[0018] The anode in the present invention can separate the target material into two different target material placement spaces to form two similar independent units, which can effectively alleviate the diagonal effect and improve the target material utilization rate and film thickness uniformity. BRIEF DESCRIPTION OF THE DRAWINGS
[0019] Figure 1 This is a diagram illustrating the principle of diagonal effect;
[0020] Figure 2 This is a diagram showing the etching condition of the double cathode after one cycle of use under the influence of the diagonal effect;
[0021] Figure 3 A schematic diagram of the structure of an anode proposed by the present invention;
[0022] Figure 4An axonometric diagram of an anode proposed by the present invention;
[0023] Figure 5 This is a schematic structural diagram of a double rotating cathode with symmetrical anode proposed by the present invention. DETAILED DESCRIPTION
[0024] Reference Figure 3-4 , an anode provided by the present invention comprises: at least two groups of anode bodies and a support component for providing support for the two groups of anode bodies;
[0025] Each group of anode bodies includes a first side anode body 3 and a second side anode body 6 which are arranged opposite to each other and have a target material placement space reserved therebetween, and the two groups of anode bodies are arranged side by side so that the first side anode body 3 / second side anode body 6 in one group of anode bodies and the first side anode body 3 / second side anode body 6 in the other group of anode bodies are back to back, so that the two groups of anode bodies have a symmetrical structure, and the target material placement spaces in the two groups of anode bodies form independent intervals.
[0026] The first side anode bodies 3 in the two groups of anode bodies are provided with a first side guard plate 1 near their target material placement space sides, and the second side anode bodies 6 in the two groups of anode bodies are provided with a second side guard plate 7 near their target material placement space sides, so that the corresponding first side guard plates 1 and second side guard plates 7 protect the anode bodies on the corresponding sides.
[0027] The support component includes an end support 5 and a middle support 4. A plurality of end supports 5 are provided and are respectively provided at the ends of both ends of the first side anode body 3 and the second side anode body 6 to support the ends of the two. A plurality of middle supports 4 are provided and are respectively provided at the middle parts of the first side anode body 3 and the second side anode body 6 to support the middle parts of the two to prevent the anode from bending sideways.
[0028] In addition, a functional seat 2 capable of passing cooling water and connecting electricity is also provided, and the functional seat 2 is installed on the supporting component. Specifically, the functional seat 2 is installed at the bottom of the end support 5.
[0029] Reference Figure 5 The present invention provides a double-rotating cathode with symmetrical anode, comprising: a first target material 8 and a second target material 9, and the anode as described above.
[0030] The first target 8 and the second target 9 are respectively located between the first side anode body 3 and the second side anode body 6 in the two groups of anode bodies, so that they are respectively located in two target placement spaces to achieve the purpose of alleviating the diagonal effect and improving the target utilization rate and film thickness uniformity.
[0031] Moreover, the distance between the first target 8 and the first anode body 3 and the second anode body 6 on both sides thereof is equal to the distance between the second target 9 and the first anode body 3 and the second anode body 6 on both sides thereof, so that the electric field distribution during operation is more uniform.
[0032] like Figure 5 As shown, the present invention provides an anode-symmetrical double-rotating cathode, which also includes a body 10 , on which the first target material 8 , the second target material 9 and the supporting components are all mounted.
[0033] As can be seen from the above, the two groups of anode bodies of the present invention separate the targets from each other to form two similar independent units. At the same time, the distance between the target and the anode is symmetrical, so that the electric field distribution during the working process is more uniform.
[0034] In summary, the present invention has the advantages of alleviating the diagonal effect, improving the target material utilization rate and the uniformity of the film thickness.
[0035] The above description is only a preferred specific implementation manner of the present invention, but the protection scope of the present invention is not limited thereto. Any technician familiar with the technical field can make equivalent replacements or changes according to the technical scheme and inventive concept of the present invention within the technical scope disclosed by the present invention, which should be covered by the protection scope of the present invention.
Claims
1. An anode, characterized in that: include: at least two groups of anode bodies and a support member for providing support for the two groups of anode bodies; Each group of anode bodies comprises a first side anode body (3) and a second side anode body (6) which are arranged opposite to each other and have a target placement space reserved therebetween, and the two groups of anode bodies are arranged in parallel so that the first side anode body (3) / second side anode body (6) in one group of anode bodies and the first side anode body (3) / second side anode body (6) in the other group of anode bodies are back to back.
2. An anode according to claim 1, characterized in that: The first side anode bodies (3) in the two groups of anode bodies are provided with a first side guard plate (1) close to the target material placement space, and the second side anode bodies (6) in the two groups of anode bodies are provided with a second side guard plate (7) close to the target material placement space.
3. An anode according to claim 1, characterized in that: The support component comprises an end support (5) and a middle support (4); a plurality of end supports (5) are provided and are respectively arranged at the ends of both ends of the first side anode body (3) and the second side anode body (6); a plurality of middle supports (4) are provided and are respectively arranged at the middle parts of the first side anode body (3) and the second side anode body (6).
4. An anode according to claim 1, characterized in that: It also comprises a functional seat (2) for passing cooling water and connecting electricity, and the functional seat (2) is installed on the supporting component.
5. A double rotating cathode with symmetrical anode, comprising: The first target material (8) and the second target material (9) are characterized by further comprising an anode according to any one of claims 1 to 4; The first target material (8) and the second target material (9) are respectively located between the first side anode body (3) and the second side anode body (6) in the two groups of anode bodies.
6. The double rotating cathode with symmetrical anode according to claim 1, characterized in that: The distance between the first target (8) and the first anode body (3) and the second anode body (6) on both sides thereof is equal to the distance between the second target (9) and the first anode body (3) and the second anode body (6) on both sides thereof.
7. The double rotating cathode with symmetrical anode according to claim 6, characterized in that: It also includes a machine body (10), on which the first target material (8), the second target material (9) and the supporting component are all mounted.