An automatic cleaning device and method for carbon nanotube reaction chambers

Abstract

This invention relates to the field of carbon nanotube preparation technology, and provides an automatic cleaning device and method for carbon nanotube reaction chambers. It aims to solve the problem in existing technologies where impurities easily adhere to the inner wall of the reactor during carbon nanotube production, leading to reduced production efficiency and increased costs. The device includes a settling section, a reaction section, a heating furnace, a guide shaft, a cleaning device, and a lifting device. The cleaning device consists of a fixed block, a scraper unit, etc. The scraper unit includes a first arm, a lever arm, a scraper, a counterweight, and a limiting mechanism. The cleaning method includes: the cleaning device is initially positioned in the settling section. After the reaction section discharges material, the lifting device is activated, driving the cleaning device along the guide shaft into the reaction section and moving it repeatedly. The scraper is tangential to the inner wall of the reaction section, and the adhering material is scraped off by the rotation of the lever arm and the up-and-down movement of the cleaning device. After cleaning, the cleaning device is pulled back to the settling section. This invention allows cleaning to be performed without stopping the machine, improving production efficiency and reducing production costs.

Description

Technical Field

[0001] This invention relates to the field of carbon nanotube preparation technology, specifically to an automatic cleaning device and method for carbon nanotube reaction chambers. Background Technology

[0002] Carbon nanotubes, also known as buckytubes, are a type of one-dimensional quantum material with a special structure (radial dimensions on the order of nanometers, axial dimensions on the order of micrometers, and both ends of the tube are basically sealed). As a one-dimensional nanomaterial, carbon nanotubes are lightweight, have a perfectly connected hexagonal structure, and possess many extraordinary mechanical, electrical, and chemical properties.

[0003] In existing fluidized bed carbon nanotube production processes, the catalyst tends to adhere to the inner wall of the reactor. As the carbon nanotubes grow, the aggregated carbon nanotubes gradually accumulate on the inner wall, forming a thick deposit that, over time, affects heat and mass transfer processes within the reactor, reducing reactor efficiency. Current technologies require production to be stopped, the reaction chamber opened, and specialized equipment used for cleaning. This interruption extends the production cycle, impacting product output and supply. It also involves additional operating time, cleaning personnel wages, maintenance costs, and energy waste. Furthermore, frequent shutdowns may accelerate equipment wear and aging, reducing reliability and lifespan. Additionally, production interruptions and fluctuations in process parameters can affect product quality and consistency.

[0004] Therefore, designing an automatic cleaning device and method for carbon nanotube reaction chambers that enables cleaning without shutting down the system is of great significance. Summary of the Invention

[0005] To address the problems existing in the background art, the present invention provides an automatic cleaning device for a carbon nanotube reaction chamber, comprising a settling section, a reaction section connected below the settling section, and a heating furnace surrounding the outer wall of the reaction section, and further comprising:

[0006] Guide shafts are fixedly installed within the settlement and reaction sections;

[0007] A cleaning device that slides vertically onto a guide shaft;

[0008] The lifting device installed in the settlement section is connected to the cleaning device through a high-temperature resistant rope, which drives the cleaning device to move along the guide shaft.

[0009] The cleaning device includes a fixed block and a plurality of scraper units mounted on the fixed block, wherein the scraper units include:

[0010] An arm is mounted on a fixed block;

[0011] A lever arm is connected to a section of arm by rotating a pivot.

[0012] A scraper fixed to the lever arm, with its front end tangent to the inner wall of the reaction section;

[0013] A counterweight suspended below the lever arm;

[0014] A limiting mechanism is provided at the connection between the lever arm and the control arm. The limiting mechanism includes an upper limit block installed above the control arm and a lower limit block installed below the control arm. The rotation range of the control arm is limited by the upper limit block and the lower limit block.

[0015] In the preferred embodiment, a through hole is provided at the center of the fixing block, and the guide shaft passes through the through hole of the fixing block and is slidably connected to the fixing block.

[0016] In the preferred embodiment, the front end face of the scraper is arc-shaped, and the front end faces of the scrapers of all scraper units form a circular structure.

[0017] In the preferred embodiment, a connecting lug is installed on the lever arm, and a counterweight is suspended from the connecting lug.

[0018] In the preferred embodiment, six scraper units are provided.

[0019] In the preferred embodiment, a U-shaped groove is provided on one end of the arm, the lever arm is rotatably connected in the U-shaped groove, and the upper limit block and the lower limit block are respectively installed above and below the U-shaped groove.

[0020] In the preferred embodiment, a lifting component is also installed on the fixed block, and the lifting device is connected to the lifting component via a high-temperature resistant rope.

[0021] This invention provides a method for cleaning a carbon nanotube reaction chamber using an automatic cleaning device, comprising the following steps:

[0022] S1. The initial position of the cleaning device is in the settling section, waiting for the carbon nanotube products in the reaction section to be discharged, thus meeting the cleaning conditions.

[0023] S2. The cleaning device enters the working state, the lifting device is started, and the cleaning device is released through the high temperature resistant rope and moves downward along the guide shaft, so that the cleaning device enters the reaction section from the settling section.

[0024] S3. When the cleaning device enters the reaction section, the lifting device drives the cleaning device to move repeatedly in the vertical direction. The scraper is tangent to the inner wall of the reaction section. Through the rotation of the lever arm and the up and down movement of the cleaning device, the attached substances on the inner wall are scraped off. When the scraper encounters the deformation caused by the accumulation of impurities on the inner wall, the lever arm rotates freely around the pivot fixed on the first arm, causing the scraper to rotate adaptively and avoid jamming.

[0025] During the raising and lowering of the cleaning device, the counterweight is suspended on the connecting lug below the lever arm, providing pressure to the scraper.

[0026] When the scraper moves upward, the lower limit block restricts the rotation angle of the lever arm to prevent it from rotating excessively;

[0027] As the scraper moves downward, the upper limit block restricts the rotation angle of the lever arm to prevent it from rotating excessively.

[0028] S4. After the cleaning device completes the cleaning in the reaction section, the lifting device pulls the cleaning device back to the initial position of the settling section using high-temperature resistant ropes.

[0029] The beneficial effects achieved by this invention are as follows:

[0030] First, this invention designs a cleaning device that rises and falls within the carbon nanotube reaction section. The scraper unit within this device is ingeniously designed, acting directly on the inner wall of the reaction section to effectively scrape away adhering substances and maintain the cleanliness of the reaction chamber. The arrangement of multiple scraper units ensures effective cleaning. The lever arm design within the scraper unit allows the scraper to rotate freely when encountering deformation of the inner wall during cleaning, adaptively adjusting the cleaning angle and avoiding jamming, thus ensuring continuous and smooth cleaning.

[0031] Secondly, this invention incorporates a counterweight suspended below the lever arm, providing stable pressure to the scraper, enhancing the cleaning effect, and helping to maintain the balance of the cleaning device during operation. The limiting mechanism restricts the range of rotation of the lever arm, preventing excessive rotation and thus ensuring the smooth operation of the cleaning process.

[0032] Third, the cleaning device of this invention is initially located in the settling section, and cleaning is performed after the carbon nanotube products in the reaction section have been discharged. This ensures that the cleaning process can be carried out without stopping the equipment, avoiding production interruptions and improving production efficiency and product quality. The cleaning device can meet the requirements for normal operation in high-temperature environments without waiting for the equipment to stop and cool down, further improving production efficiency and equipment utilization. After cleaning is completed, the lifting device pulls the cleaning device back to its initial position in the settling section, facilitating the recovery and storage of the cleaning device. At the same time, the relatively low temperature in the settling section also helps to reduce heat accumulation in the cleaning device, extending its service life.

[0033] Fourth, this invention features a guide shaft fixedly installed within the settling and reaction sections, providing a stable movement path for the cleaning device. This significantly improves cleaning efficiency and accuracy, ensuring the cleaning device can move precisely vertically within the reaction section and preventing deviations and errors during the cleaning process. Simultaneously, the cleaning device, slidably connected to the guide shaft vertically, can move smoothly along the shaft, achieving comprehensive cleaning of the inner wall of the reaction section. This effectively reduces interference and damage to the equipment during cleaning, ensuring its stability and safety. Furthermore, the lifting device installed in the settling section is connected to the cleaning device via a high-temperature resistant rope, enabling remote control and automated cleaning, further improving production efficiency and safety. Attached Figure Description

[0034] Figure 1 This is a structural diagram of the automatic cleaning device for the carbon nanotube reaction chamber of the present invention;

[0035] Figure 2 yes Figure 1 Structural diagram of the cleaning device entering the reaction section;

[0036] Figure 3 yes Figure 1 Structural diagram of the cleaning device located in the settling section;

[0037] Figure 4 This is a 3D structural diagram of the cleaning device;

[0038] Figure 5 This is the front view of the cleaning device;

[0039] Figure 6 This is the front view of the scraper unit.

[0040] Numbering on the map:

[0041] 1. Reaction section; 2. Cleaning device; 2-1. Fixing block; 2-2. Lifting component; 2-3. First arm; 2-4. Lever arm; 2-5. Connecting lug; 2-6. Counterweight; 2-7. Scraper; 2-8. Upper limit block; 2-9. Lower limit block; 3. Settling section; 4. Lifting device; 5. Guide shaft; 6. Heating furnace. Detailed Implementation

[0042] The technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings. In addition, the forms of the various structures described in the following embodiments are merely illustrative. The present invention is not limited to the structures described in the following embodiments. All other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0043] Reference Figures 1-6 This invention provides an automatic cleaning device for a carbon nanotube reaction chamber, the components of which include:

[0044] Settling section 3 connects to reaction section 1 below. Reaction section 1 is the main production area for carbon nanotubes, and impurities easily adhere to its inner wall. Settling section 3 is connected above it, and a heating furnace is arranged around its outer wall. Inside, a guide shaft 5 and a cleaning device 2 are located. The heating furnace provides the necessary heating conditions for reaction section 1, ensuring the smooth production of carbon nanotubes. The guide shaft 5 provides a vertical sliding track for the cleaning device 2, ensuring that the cleaning device 2 can move up and down along the guide shaft 5. The cleaning device 2 is fixedly installed within settling section 3 and reaction section 1, sliding along them.

[0045] The cleaning device 2 includes a fixed block 2-1, a lifting component 2-2, a single-section arm 2-3, a lever arm 2-4, a connecting lug 2-5, a counterweight 2-6, a scraper 2-7, an upper limit block 2-8, and a lower limit block 2-9. The fixed block 2-1 has a through hole in its center, through which a guide shaft 5 passes and is slidably connected to the fixed block 2-1. The lifting component 2-2 is also mounted on the fixed block 2-1, and the lifting device 4 is connected to the lifting component 2-2 via a high-temperature resistant rope. The single-section arm 2-3 is mounted on the fixed block 2-1 and has a U-shaped groove, within which the lever arm 2-4 is rotatably connected. The lever arm 2-4 is rotatably connected to the U-shaped groove of the single-section arm 2-3 via a rotating shaft, allowing it to rotate freely around the shaft. The scraper 2-7 and the connecting lug 2-5 are mounted on the lever arm 2-4; the scraper 2-7 is fixed to the lever arm 2-4, and the connecting lug 2-5 is used to suspend the counterweight 2-6.

[0046] Scraper 2-7, with an arc-shaped front end tangent to the inner wall of reaction section 1, is used to scrape off deposits on the inner wall. Multiple scraper units are combined, with their front ends forming a circular structure. Counterweight 2-6, suspended from connecting lug 2-5 below lever arm 2-4, provides pressure to scraper 2-7. A limiting mechanism, consisting of upper limit block 2-8 and lower limit block 2-9, is installed above and below lever arm 2-4 respectively, limiting the rotation range of lever arm 2-4 and preventing excessive rotation.

[0047] The lifting device 4 is connected to the cleaning device 2 via a high-temperature resistant rope, driving the cleaning device 2 to move up and down along the guide shaft 5. Installed in the settlement section 3, it is connected to the lifting component 2-2 of the cleaning device 2 via a high-temperature resistant rope. The high-temperature resistant rope connects the lifting device 4 and the cleaning device 2, transmitting lifting force to enable the cleaning device 2 to move up and down along the guide shaft 5. The lifting device 4 can be an electric winch, powered by a three-phase asynchronous motor, with a planetary gear reducer reducing speed and increasing torque. The drum stores and releases the high-temperature resistant rope, used for connecting and lifting the cleaning device 2. The control system includes a PLC controller and sensors to ensure precise control of the motor and safe operation of the cleaning device 2. Safety protection devices include limit switches and an emergency stop button to further ensure the safety of equipment and personnel.

[0048] During the startup phase, the operator activates the control system via the control panel, and the motor begins to rotate. Subsequently, the motor drives the drum through the reducer to release the rope, causing the cleaning device 2 to descend along the guide shaft 5 to the reaction section 1 for cleaning. During the cleaning process, the control system monitors and adjusts the motor status in real time. After cleaning is complete, the motor reverses to retract the rope, pulling the cleaning device 2 back to its initial position. Finally, the operator shuts off the control system, completing the entire lifting process.

[0049] The present invention also provides a detailed working process of an automatic cleaning device for carbon nanotube reaction chambers, as follows:

[0050] During the production of carbon nanotubes, carbon nanotube products are continuously generated within reaction section 1. These products need to be discharged from the reaction chamber after the reaction is complete for subsequent cleaning. Cleaning device 2 is initially located within settling section 3 and is in standby mode. At this time, cleaning device 2 does not contact the inner wall of reaction section 1, waiting for reaction section 1 to complete its discharge operation. When the carbon nanotube products in reaction section 1 are completely discharged, and the deposits on the inner wall of reaction section 1 reach a level requiring cleaning, cleaning device 2 is ready to enter operational mode.

[0051] Once reaction section 1 has completed discharging and is ready for cleaning, the lifting device 4 is activated. The lifting device 4 is connected to the cleaning device 2 via a high-temperature resistant rope, allowing for precise control of the cleaning device 2's movement. As the lifting device 4 is activated, the high-temperature resistant rope is gradually released, and the cleaning device 2 begins to move downwards along the guide shaft 5. The guide shaft 5 serves as the sliding track for the cleaning device 2, ensuring that it enters reaction section 1 smoothly and accurately. Once the cleaning device 2 is fully inside reaction section 1, it is in the optimal position for cleaning operations.

[0052] Upon entering reaction section 1, cleaning device 2 begins its cleaning task. Lifting device 4 drives cleaning device 2 to move repeatedly in a vertical direction. This movement helps scraper 2-7 fully contact and scrape away the deposits on the inner wall of reaction section 1. The scraper unit is the core component of cleaning device 2, consisting of a section arm 2-3, a lever arm 2-4, and scraper 2-7. The front end of scraper 2-7 is tangential to the inner wall of reaction section 1, ensuring a tight fit and effective scraping. During cleaning, scraper 2-7 not only scrapes away deposits through up-and-down movement but also adapts to the deformation of the inner wall of reaction section 1 through the rotation of lever arm 2-4. When scraper 2-7 encounters deformation of the inner wall caused by impurity accumulation, lever arm 2-4 can rotate freely around a pivot fixed to section arm 2-3, thereby causing scraper 2-7 to adaptively adjust its angle and prevent jamming.

[0053] To ensure effective scraping, counterweight 2-6 plays a crucial role in the cleaning process. Suspended from the connecting lug 2-5 below the lever arm 2-4, counterweight 2-6 provides continuous pressure to the scraper 2-7. This pressure allows the scraper 2-7 to adhere more tightly to the inner wall of the reaction section 1, improving scraping efficiency. Simultaneously, the limiting mechanism also plays an important protective role. When the scraper 2-7 moves upward, the lower limit block 2-9 restricts the rotation angle of the lever arm 2-4, preventing excessive rotation and damage to the equipment; when the scraper 2-7 moves downward, the upper limit block 2-8 provides the same restriction.

[0054] After a period of cleaning, the deposits on the inner wall of reaction section 1 were basically removed. At this point, lifting device 4 was activated again, using high-temperature resistant ropes to pull cleaning device 2 back to its initial position in settling section 3. Inside settling section 3, the impurities and carbon nanotube residues scraped off by cleaning device 2 were collected, awaiting further processing, thus completing the entire cleaning process.

[0055] This cleaning process can be set to clean the inner wall of reaction section 1 after each reaction section 1 process ends and the material is discharged. During the cleaning process, the equipment does not need to be stopped, that is, the cleaning device 2 cleans the inner wall of reaction section 1 under high temperature.

[0056] The above description is merely a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present invention should be included within the protection scope of the present invention.

Claims

1. An automatic cleaning device for carbon nanotube reaction chamber, comprising a settling section (3), a reaction section (1) connected below the settling section (3), and a heating furnace arranged around the outer wall of the reaction section (1), characterized in that, Further comprising: a guide shaft (5) fixedly installed in the settling section (3) and the reaction section (1); a cleaning device (2) slidingly connected to the guide shaft (5) in the vertical direction; a lifting device (4) installed in the settling section (3), the lifting device (4) being connected to the cleaning device (2) through a high-temperature-resistant rope to drive the cleaning device (2) to move along the guide shaft (5); the cleaning device (2) comprises a fixed block (2-1) and a plurality of scraper units installed on the fixed block (2-1), the scraper unit comprising: a section of arm (2-3) installed on the fixed block (2-1); a force arm (2-4) rotatably connected to the section of arm (2-3) through a rotating shaft; a scraper (2-7) fixed to the force arm (2-4), the front end surface of the scraper (2-7) being tangent to the inner wall of the reaction section (1); a counterweight (2-6) suspendedly connected below the force arm (2-4); a limiting mechanism is arranged at the connection between the section of arm (2-3) and the force arm (2-4), the limiting mechanism comprising an upper limiting block (2-8) installed above the force arm (2-4) and a lower limiting block (2-9) installed below the force arm (2-4); the rotating range of the force arm (2-4) is limited by the upper limiting block (2-8) and the lower limiting block (2-9); a through hole is formed in the center of the fixed block (2-1), and the guide shaft (5) passes through the through hole of the fixed block (2-1) and is slidingly connected with the fixed block (2-1); the front end surface of the scraper (2-7) is arc-shaped, and the front end surfaces of the scrapers (2-7) of all scraper units form a circular structure; a lifting piece (2-2) is further installed on the fixed block (2-1), and the lifting device (4) is connected to the lifting piece (2-2) through a high-temperature-resistant rope.

2. The automatic cleaning device for carbon nanotube reaction chamber according to claim 1, characterized in that: a connecting lug (2-5) is installed on the force arm (2-4), and the counterweight (2-6) is suspended on the connecting lug (2-5).

3. The automatic cleaning device for carbon nanotube reaction chamber according to claim 1, characterized in that: the scraper unit is provided with six scraper units.

4. The automatic cleaning device for carbon nanotube reaction chamber according to claim 1, characterized in that: the section of arm (2-3) is provided with a U-shaped groove, and the force arm (2-4) is rotatably connected in the U-shaped groove, and the upper limiting block (2-8) and the lower limiting block (2-9) are respectively installed above and below the U-shaped groove.

5. A method for cleaning using the automatic cleaning device for carbon nanotube reaction chamber according to any one of claims 1-4, characterized in that, the following steps are performed: S1, the initial position of the cleaning device (2) is located in the settling section (3), and the cleaning device (2) waits for the carbon nanotube product in the reaction section (1) to complete the discharge, and the cleaning conditions are met; S2, the cleaning device (2) enters the working state, the lifting device (4) starts, the cleaning device (2) is released through the high-temperature-resistant rope, moves downward along the guide shaft (5), and makes the cleaning device (2) enter the reaction section (1) from the settling section (3); S3, when the cleaning device (2) enters the reaction section (1), the lifting device (4) drives the cleaning device (2) to repeatedly move in the vertical direction, the scraper (2-7) is tangent to the inner wall of the reaction section (1), the scraper (2-7) is tangent to the inner wall of the reaction section (1), the scraper (2-7) is tangent to the inner wall of the reaction section (1), the scraper (2-7) is tangent to the inner wall of the reaction section (1), the scraper (2-7) is tangent to the inner wall of the reaction section (1), the scraper (2-7) is tangent to the inner wall of the reaction section (1), the scraper (2-7) is tangent to the inner wall of the reaction section (1), the scraper (2-7) is tangent to the inner wall of the reaction section (1), the scraper (2-7) is tangent to the inner wall of the reaction section (1), the scraper (2-7) is tangent to the inner wall of the reaction section (1), the scraper (2-7) is tangent to the inner wall of the reaction section (1), the scraper (2-7) is tangent to the inner wall of the reaction section (1), the scraper (2-7) is tangent to the inner wall of the reaction section (1), the scraper (2-7) is tangent to the inner wall of the reaction section (1), the scraper (2-7) is tangent to the inner wall of the reaction section (1), the scraper (2-7) is tangent to the inner wall of the reaction section (1), the scraper (2-7) is tangent to the inner wall of the reaction section (1), the scraper (2-7) is tangent to the inner wall of the reaction section (1), the scraper (2-7) is tangent to the inner wall of the reaction section (1), the scraper (2-7) is tangent to the inner wall of the reaction section (1), the scraper (2-7) is tangent to the inner wall of the reaction section (1), the scraper (2-7) is tangent to the inner wall of the reaction section (1), the scraper (2-7) is tangent to the inner wall of the reaction section (1), the scraper (2-7) is tangent to the inner wall of the reaction section (1), the scraper (2-7) is tangent to the inner wall of the reaction section (1), the scraper (2-7) is tangent to the inner wall of the reaction section (1), the scraper (2-7) is tangent to the inner wall of the reaction section (1), the scraper (2-7) is tangent to the inner wall of the reaction section (1), the scraper (2-7) is tangent to the inner wall of the reaction section (1), the scraper (2-7) is tangent to the inner wall of the reaction section (1), the scraper (2-7) is tangent to the inner wall of the reaction section (1), the scraper (2-7) is tangent to the inner wall of the reaction section (1), the scraper (2-7) is tangent to the inner wall of the reaction section (1), the scraper (2-7) is tangent to the inner wall of the reaction section (1), the scraper (2-7) is tangent to the inner wall of the reaction section (1), the scraper (2-7) is tangent to the inner wall of the reaction section (1), the scraper (2-7) is tangent to the inner wall of the reaction section (1), the scraper (2-7) is tangent to the inner wall of the reaction section (1), the scraper (2- ​ ​ ​ ​ ​

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