Soaking equipment for processing solid-state capacitor

Abstract

The invention relates to soaking equipment, in particular to soaking equipment for processing a solid-state capacitor. The invention aims to provide the soaking equipment for processing the solid-state capacitor, which has a good cleaning effect on the solid-state capacitor, can prevent the capacitor from falling off and is convenient to collect. The soaking equipment for processing the solid-state capacitor comprises a bottom plate, a liquid discharging frame body and a cleaning frame body, the top of the bottom plate is connected with the liquid discharging frame body, and the top of the liquid discharging frame body is connected with the cleaning frame body. According to the capacitor cleaning device, in the cleaning process, cleaning liquid can be stirred through the stirring frame to impact a capacitor, the capacitor can be brushed, the achieved cleaning effect is better, meanwhile, in the cleaning process, the capacitor can be limited by rotating the pressing plate, the capacitor is located at the position of the containing frame all the time, the capacitor is prevented from falling off, and the capacitor is more convenient to take out.

Description

Technical Field

[0001] The invention relates to a soaking device, in particular to a soaking device for processing solid capacitors. Background Art

[0002] After the solid aluminum electrolytic capacitor is produced, it is necessary to immerse and clean the capacitor to remove oil and other impurities on the surface of the capacitor.

[0003] After searching, the patent with authorized patent publication number CN112354947A discloses an immersion device for solid capacitor processing; it includes: a cleaning tank; a conveyor belt, which is inclined and arranged inside the cleaning tank and moves in a wandering manner; a circulation tank, which is used to collect the parts that have been immersed; wherein, the cleaning tank is provided with a discharge port, and a placement net is fixedly installed inside the circulation tank, and the placement net is arranged below the discharge port; the discharge port is used to discharge the parts conveyed by the conveyor belt; a drive assembly, which is used to drive the conveyor belt to move in a wandering manner.

[0004] The above patent has the following deficiencies:

[0005] 1. The cleaning liquid is only transported to impact the solid capacitor for cleaning. The impact of the cleaning liquid on the solid capacitor is small, and the cleaning effect is poor.

[0006] 2. It is difficult to fix the capacitors when the capacitors are transported by conveyor belts, which may easily cause the capacitors to fall off. After the capacitors fall off, it is troublesome to collect them and the operation is inconvenient. Summary of the invention

[0007] In view of this, the present invention provides a soaking device for processing solid capacitors, which has good cleaning effect on solid capacitors, can prevent capacitors from falling, and is easy to collect.

[0008] The technical scheme is: a soaking device for processing solid capacitors, including a bottom plate, a drainage frame, and a cleaning frame. The top of the bottom plate is connected to the drainage frame, and the top of the drainage frame is connected to the cleaning frame. It also includes a filter frame, a ball valve, a hand wheel, a drainage plate, a drainage pipe, a placement frame, a shell, a limit mechanism and a cleaning mechanism. The lower part of the drainage frame is provided with a filter frame to filter impurities in the cleaning liquid. The bottom of the drainage frame is provided with two liquid outlets, and a valve is provided at the liquid outlet of the drainage frame. The lower part of the cleaning frame is connected with a drainage plate, and two drainage pipes are connected to both sides of the drainage plate. The drainage pipes are rotatably connected with ball valves, and hand wheels are connected between the ball valves in the two drainage pipes on both sides. The hand wheel is rotated to drive the ball valve to rotate and control the drainage and closing state of the drainage pipe. A placement frame is slidably connected to one side of the upper part of the cleaning frame, and a shell is connected to one side of the cleaning frame. A limit mechanism for limiting the solid capacitor is provided on the cleaning frame, and a cleaning mechanism for cleaning the solid electric device is provided on the shell.

[0009] Furthermore, the limiting mechanism includes a sliding frame, a wedge block, an extrusion frame, a first elastic member and a rotating pressure plate. The sliding frame is slidably connected to one side of the cleaning frame close to the placement frame, and wedge blocks are connected to both sides of the sliding frame. The placement frame moves through the wedge blocks to squeeze the sliding frame downward, and the extrusion frame is connected to the sliding frame. The extrusion frame is located in the cleaning frame and is slidably connected to the cleaning frame. The bottom of the extrusion frame is rotatably connected to a rotating pressure plate at even intervals. The downward movement of the sliding frame drives the extrusion frame downward, thereby driving the rotating pressure plate to move downward and press the solid-state capacitor. A first elastic member is connected between the sliding frame and the cleaning frame to reset the sliding frame through elasticity.

[0010] Furthermore, slots are evenly spaced apart on the top of the placement frame for placing solid-state capacitors, and the number of the slots is consistent with the number of the rotating pressing plates and the positions correspond one to one.

[0011] Furthermore, the cleaning mechanism includes a motor, a rotating frame, a sliding rod, a stirring frame, a guide rail, a cleaning brush and a second elastic member. The motor is installed on the outer shell, and the rotating frame is connected to the output shaft of the motor. The rotating frame is located in the outer shell, and at least one sliding rod is slidably connected between the outer shell and the placement frame at uniform intervals. The rotating frame rotates to squeeze the sliding rod to move. A second elastic member is connected between the sliding rod and the outer shell to elastically reset the sliding frame after the sliding frame moves. Guide rails are evenly connected to the extrusion frame, and a stirring frame is slidably connected between the multiple guide rails. The stirring frame is clamped with the sliding rod so that the sliding rod drives the stirring frame to move when it slides, and stirs the cleaning liquid in the cleaning frame to impact clean the solid-state capacitor. Cleaning brushes are connected to the stirring frame at intervals, and the stirring frame drives the cleaning brush to move when it moves, so as to brush the solid-state capacitor.

[0012] Furthermore, it also includes a controlled drainage mechanism, which includes guide rods, baffles and buoyancy blocks. Two pairs of guide rods are arranged on the top of the drainage plate, and the two pairs of guide rods are located on both sides of two drainage pipes on the same side. A baffle is slidably connected between the two guide rods of the same pair, and the baffle can block the drainage pipe. A buoyancy block is connected to the top of the baffle. When there is cleaning liquid in the cleaning frame, the buoyancy block floats up so that the baffle moves up and no longer blocks the drainage pipe. When the cleaning frame discharges the cleaning liquid to the initial height of the buoyancy block, the baffle also blocks the drainage pipe again to control the discharge of the cleaning liquid.

[0013] Furthermore, it also includes a stirring mechanism, which includes a stirring plate, a movable frame and a third elastic member. The stirring plate is rotatably connected to the side of the cleaning frame close to the outer shell, and the movable frame is slidably connected to the outer shell. The bottom of the movable frame contacts the stirring plate so that the movable frame moves up and down to squeeze the stirring plate to swing. The upper part of the movable frame is located on the rotation trajectory of the extrusion frame so that the extrusion frame rotates and squeezes the movable frame to move. A third elastic member is connected between the movable frame and the outer shell to reset the movable frame after moving through elasticity.

[0014] Furthermore, it also includes a circulation mechanism, which includes a water pump and a circulating water pipe. Water pumps are connected to both sides of the cleaning frame. The circulating water pipe is installed on the water pump. The liquid inlet end of the circulating water pipe is connected to the liquid outlet end of the drainage frame. The liquid outlet end of the circulating water pipe extends into the cleaning frame, so that the cleaning liquid in the drainage frame can be injected into the cleaning frame for re-use by starting the water pump.

[0015] Furthermore, a sealing gasket is included, and the cleaning frame is connected with the sealing gasket to seal the gap between the placement frame and the liquid discharge frame.

[0016] The beneficial effects of the present invention are as follows: 1. During the cleaning process, the present invention can use a stirring frame to stir the cleaning liquid to impact the capacitor, and can also scrub the capacitor, thereby achieving a better cleaning effect. At the same time, during the cleaning process, the capacitor can be limited by a rotating pressure plate, so that the capacitor is always located in the placement frame to prevent the capacitor from falling, making it more convenient to take out.

[0017] 2. When the cleaning liquid is discharged, the present invention can block the drain pipe by setting the buoyancy block and the baffle plate when the cleaning liquid is discharged to the bottom of the placement frame, so that the cleaning liquid is no longer discharged. There is no need to inject the cleaning liquid from the bottom of the cleaning frame in the subsequent addition, so the injection time is shorter and the operation is more convenient. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 It is a schematic diagram of the three-dimensional structure of the present invention.

[0019] Figure 2 It is a partial three-dimensional structural schematic diagram of the present invention.

[0020] Figure 3 It is a schematic diagram of the three-dimensional structure of the liquid discharge frame and the cleaning frame of the present invention.

[0021] Figure 4 This is a first partial cross-sectional view of the present invention.

[0022] Figure 5 It is a three-dimensional structural schematic diagram of the placement frame of the present invention.

[0023] Figure 6 This is a second partial cross-sectional view of the present invention.

[0024] Figure 7 It is a schematic diagram of the connection relationship between the fixing mechanism of the present invention and other components.

[0025] Figure 8 It is a three-dimensional structural schematic diagram of part of the fixing mechanism and the placement frame of the present invention.

[0026] Fig. 9 It is a schematic diagram of the connection relationship between the cleaning mechanism and other components of the present invention from a first perspective.

[0027] Fig.10 It is a schematic diagram of the connection relationship between the cleaning mechanism of the present invention and other components from a second perspective.

[0028] Fig.11 It is a three-dimensional structural schematic diagram of part of the cleaning mechanism and the extrusion frame of the present invention.

[0029] Fig.12 This is a schematic diagram of the connection relationship between the drainage control mechanism and other components of the present invention.

[0030] Fig.13 It is a schematic diagram of the connection relationship between the drainage control mechanism and the drainage plate of the present invention.

[0031] Fig.14 This is a schematic diagram of the connection relationship between the stirring mechanism of the present invention and other components from a first perspective.

[0032] Fig.15 This is a schematic diagram of the connection relationship between the stirring mechanism of the present invention and other components from a second perspective.

[0033] Fig.16 It is a partial three-dimensional structural schematic diagram of the stirring mechanism of the present invention.

[0034] Fig.17 It is a schematic diagram of the connection relationship between the circulation mechanism of the present invention and other components from a first perspective.

[0035] Fig.18 It is a schematic diagram of the connection relationship between the circulation mechanism of the present invention and other components from a second perspective.

[0036] Fig.19 This is a diagram showing the positional relationship between the sealing gasket and other components of the present invention.

[0037] Figure numbers: 1_bottom plate, 2_drainage frame, 21_filter frame, 3_cleaning frame, 31_drainage plate, 32_drainage pipe, 33_ball valve, 34_handwheel, 4_placing frame, 41_housing, 5_limiting mechanism, 51_sliding frame, 52_wedge block, 53_extrusion frame, 54_first elastic member, 55_rotating pressure plate, 6_cleaning mechanism, 61_motor, 62_rotating frame, 63_sliding rod, 64_stirring frame, 641_guide rail, 65_cleaning brush, 66_second elastic member, 7_drainage control mechanism, 71_guide rod, 72_baffle, 73_buoyancy block, 8_stirring mechanism, 81_stirring plate, 82_moving frame, 83_third elastic member, 9_circulation mechanism, 91_water pump, 92_circulating water pipe, 10_sealing pad. DETAILED DESCRIPTION

[0038] The present invention will be described in detail below in conjunction with the accompanying drawings.

[0039] Example 1

[0040] A soaking device for processing solid capacitors, such as Figure 1-Figure 6 As shown, it includes a bottom plate 1, a drainage frame 2, a filter frame 21, a ball valve 33, a hand wheel 34, a cleaning frame 3, a drainage plate 31, a drainage pipe 32, a placement frame 4, a shell 41, a limiting mechanism 5 and a cleaning mechanism 6. The top of the bottom plate 1 is connected to the drainage frame 2, the top of the drainage frame 2 is connected to the cleaning frame 3, the lower part of the drainage frame 2 is provided with a filter frame 21 to filter impurities in the cleaning liquid, the bottom of the drainage frame 2 is provided with two liquid outlets, the liquid outlet end of the drainage frame 2 is provided with a valve, the lower part of the cleaning frame 3 is connected to the drainage plate 31, the drainage Two drainage pipes 32 are connected to the front and rear sides of the plate 31, and ball valves 33 are rotatably connected in the drainage pipes 32. Hand wheels 34 are connected between the ball valves 33 in the two drainage pipes 32 on the front and rear sides. The hand wheels 34 are rotated to drive the ball valves 33 to rotate and control the drainage and closing states of the drainage pipes 32. A placement frame 4 is slidably connected to the upper front side of the cleaning frame 3, and a shell 41 is connected to the rear side of the cleaning frame 3. A limiting mechanism 5 for limiting the solid-state capacitor is provided on the cleaning frame 3, and a cleaning mechanism 6 for cleaning the solid-state electric device is provided on the shell 41.

[0041] like Figure 7 and Figure 8As shown, the limiting mechanism 5 includes a sliding frame 51, a wedge block 52, an extrusion frame 53, a first elastic member 54 and a rotating pressure plate 55. The cleaning frame 3 is slidably connected to the sliding frame 51 near the front side, and the left and right sides of the sliding frame 51 are connected. The placement frame 4 moves through the wedge block 52 to squeeze the sliding frame 51 downward, and the extrusion frame 53 is connected to the sliding frame 51. The extrusion frame 53 is located in the cleaning frame 3 and is slidably connected to the cleaning frame 3. The bottom of the extrusion frame 53 is rotatably connected with the rotating pressure plate 55 at uniform intervals. The downward movement of the sliding frame 51 drives the extrusion frame 53 to move downward, so as to drive the rotating pressure plate 55 to move downward and press the solid-state capacitor. A first elastic member 54 is connected between the sliding frame 51 and the cleaning frame 3 to reset the sliding frame 51 through elasticity. Card slots are evenly spaced at the top of the placement frame 4 for placing solid-state capacitors. The number of the card slots is consistent with the number of the rotating pressure plates 55 and their positions correspond one to one.

[0042] like Figure 9-11 As shown, the cleaning mechanism 6 includes a motor 61, a rotating frame 62, a sliding rod 63, an agitating frame 64, a guide rail 641, a cleaning brush 65 and a second elastic member 66. The motor 61 is installed on the right side of the housing 41. The rotating frame 62 is connected to the output shaft of the motor 61. The rotating frame 62 is located in the housing 41. Three sliding rods 63 are evenly spaced and slidably connected between the housing 41 and the placement frame 4. The rotating frame 62 rotates to squeeze the sliding rod 63 to move forward. A second elastic member 66 is connected between the sliding rod 63 and the housing 41 to slide. After the rack 51 moves forward, the sliding rack 51 is elastically moved backward to reset. The extrusion rack 53 is evenly spaced with guide rails 641, and a stirring rack 64 is slidably connected between the multiple guide rails 641. The stirring rack 64 is engaged with the sliding rod 63, so that the sliding rod 63 drives the stirring rack 64 to move when sliding, and stirs the cleaning liquid in the cleaning frame 3 to impact clean the solid-state capacitor. Cleaning brushes 65 are connected to the stirring rack 64 at intervals, and the stirring rack 64 drives the cleaning brush 65 to move when moving to scrub the solid-state capacitor.

[0043] When the solid capacitor needs to be soaked and cleaned, the device can be used. When in use, the placement frame 4 is pulled out, and then the solid capacitor is placed in the card slot of the placement frame 4. After placement, the placement frame 4 is inserted back. In the process of inserting it back, the placement frame 4 will squeeze the wedge block 52 to move downward, drive the sliding frame 51 and the squeezing frame 53 to move downward, the first elastic member 54 is compressed, and the squeezing frame 53 moves downward to drive the rotating pressing plate 55 to move downward to press the capacitor, thereby limiting the capacitor. After the placement frame 4 is inserted back, the capacitor will contact the cleaning brush 65, and then the cleaning liquid is added to the cleaning frame 3 until the cleaning liquid submerges the stirring frame 64, and then the motor 61 is started to drive the rotating frame 62 to rotate, and the rotating frame 62 cooperates with the second elastic member 66 to make the sliding rod 63 move left and right repeatedly, and the sliding rod 63 drives the stirring frame 64 to move when moving, and the stirring frame 6 4 can stir the cleaning liquid when moving, impact the capacitor, so as to flush the oil and impurities on the capacitor. At the same time, the stirring frame 64 can also drive the cleaning brush 65 to move, brush off the oil and impurities on the capacitor. In this way, the oil and impurities on the capacitor can be cleaned, and during the cleaning process, the cleaning liquid can be stirred by the stirring frame 64 to impact the capacitor, and the capacitor can also be brushed, so that the cleaning effect achieved is better. At the same time, during the cleaning process, the capacitor can be limited to prevent the capacitor from falling, which is more convenient when taking it out. When it is necessary to discharge the cleaning liquid, the ball valve 33 can be rotated to discharge the cleaning liquid into the cleaning frame 3, and the filter frame 21 can filter the impurities on the cleaning liquid. When it is necessary to discharge the cleaning liquid in the cleaning frame 3, the valve can be opened to discharge the cleaning liquid.

[0044] Example 2

[0045] On the basis of Example 1, Fig.12 and Fig.13 As shown, it also includes a control drainage mechanism 7, which includes a guide rod 71, a baffle 72 and a buoyancy block 73. Two pairs of guide rods 71 ​​are arranged on the top of the drainage plate 31. The two pairs of guide rods 71 ​​are located on the left and right sides of the two drainage pipes 32 on the front side. A baffle 72 is slidably connected between the two guide rods 71 ​​of the same pair. The baffle 72 can block the drainage pipe 32. The top of the baffle 72 is connected to the buoyancy block 73. When there is cleaning liquid in the cleaning frame 3, the buoyancy block 73 floats up, so that the baffle 72 moves up and no longer blocks the drainage pipe 32. When the cleaning frame 3 discharges the cleaning liquid to the initial height of the buoyancy block 73, the baffle 72 also blocks the drainage pipe 32 again to control the discharge of the cleaning liquid.

[0046] When adding cleaning liquid into the cleaning frame 3, as the cleaning liquid continues to increase, after the cleaning liquid immerses the buoyancy block 73, as the cleaning liquid increases, the buoyancy block 73 moves up, and the upward movement of the buoyancy block 73 drives the baffle plate 72 to move up. After the baffle plate 72 moves up, it no longer blocks the two drainage pipes 32 on the front side. When it is necessary to drain the liquid, the hand wheel 34 on the front side can be turned to drive the two ball valves 33 on the front side to rotate, so that the ball valve 33 no longer blocks the drainage pipe 32. At this time, the cleaning liquid in the cleaning frame 3 will be discharged through the two drainage pipes 32 on the front side. As the cleaning liquid is discharged, the buoyancy block 73 will move down, and the buoyancy block 73 is always in contact with the cleaning liquid The buoyancy block 73 moves downward to drive the baffle plate 72 downward. When the baffle plate 72 moves downward to block the two drainage pipes 32 on the front side, the cleaning liquid is no longer discharged and the buoyancy block 73 no longer moves downward. At this time, the horizontal surface of the cleaning liquid is also below the placement frame 4, and the placement frame 4 can be taken out to perform the capacitor removal operation. In this way, after cleaning, there is no need to discharge all the cleaning liquid in the cleaning frame 3, which saves time for adding cleaning liquid. When all the cleaning liquid needs to be discharged, the hand wheels 34 on the front and rear sides are twisted to rotate together to drive all the ball valves 33 to no longer block the drainage pipes 32, so that all the cleaning liquid can be discharged.

[0047] Example 3

[0048] On the basis of Example 2, Figure 14-16 As shown, it also includes a stirring mechanism 8, which includes a stirring plate 81, a movable frame 82 and a third elastic member 83. The stirring plate 81 is rotatably connected to the rear side of the cleaning frame 3, and the movable frame 82 is slidably connected to the outer shell 41. The bottom of the movable frame 82 is in contact with the stirring plate 81, so that the movable frame 82 reciprocates up and down to squeeze the stirring plate 81 to swing. The upper part of the movable frame 82 is located on the rotation trajectory of the extrusion frame 53, so that the extrusion frame 53 rotates to squeeze the movable frame 82 to move. The third elastic member 83 is connected between the movable frame 82 and the outer shell 41 to reset the movable frame 82 after moving through elasticity.

[0049] When rotating, the rotating frame 62 cooperates with the third elastic member 83 to squeeze the stirring plate 81 to move up and down repeatedly. When the stirring plate 81 moves downward, it squeezes the stirring plate 81 to swing. When the stirring plate 81 moves upward, it no longer squeezes the stirring plate 81. At this time, under the action of the gravity of the water flow, the stirring plate 81 is reset. This is repeated, which can drive the stirring plate 81 to repeatedly swing and stir the cleaning liquid, thereby increasing the flow rate of the cleaning liquid, increasing the impact force of the cleaning liquid on the capacitor, and improving the cleaning effect.

[0050] like Figure 1 , Fig.17 and Fig.18As shown, a circulation mechanism 9 is also included, and the circulation mechanism 9 includes a water pump 91 and a circulating water pipe 92. The water pumps 91 are connected to the left and right sides of the cleaning frame 3. The circulating water pipe 92 is installed on the water pump 91. The liquid inlet end of the circulating water pipe 92 is connected to the liquid outlet end of the discharge frame 2. The circulating water pipe 92 and the liquid outlet end of the discharge frame 2 are detachably connected. The liquid outlet end of the circulating water pipe 92 extends into the cleaning frame 3, so that the cleaning liquid in the discharge frame 2 is injected into the cleaning frame 3 by starting the water pump 91 and put into use again.

[0051] When the circulating water pipe 92 is installed at the liquid outlet end of the discharge frame 2, the valve can be kept in a continuously open state. When cleaning liquid needs to be added to the cleaning frame 3, the water pump 91 can be started to inject the cleaning liquid in the discharge frame 2 into the cleaning frame 3 through the circulating water pipe 92. In this way, the cleaning liquid can be recycled. When the cleaning liquid in the discharge frame 2 has been used for too long, the circulating water pipe 92 can be removed from the liquid outlet end of the discharge frame 2, and then the valve can be opened to discharge all the cleaning liquid in the discharge frame 2.

[0052] like Fig.19 As shown, a sealing gasket 10 is also included. The cleaning frame 3 is connected with the sealing gasket 10 to seal the gap between the placement frame 4 and the drainage frame 2.

[0053] After being placed in the placement frame 4 , the sealing gasket 10 can seal the gap between the placement frame 4 and the liquid discharge frame 2 to prevent the cleaning liquid from overflowing.

[0054] The above is only a specific embodiment of the present invention, but the protection scope of the present invention is not limited thereto. Any person skilled in the art can easily think of changes or substitutions within the technical scope disclosed by the present invention, which should be included in the protection scope of the present invention. Therefore, the protection scope of the present invention should be based on the protection scope of the claims.

Claims

1. An immersion device for processing solid capacitors, comprising a bottom plate (1), a drainage frame (2), and a cleaning frame (3), wherein the top of the bottom plate (1) is connected to the drainage frame (2), and the top of the drainage frame (2) is connected to the cleaning frame (3), characterized in that: The cleaning device also comprises a filter frame (21), a ball valve (33), a hand wheel (34), a drain plate (31), a drain pipe (32), a placement frame (4), a housing (41), a limit mechanism (5) and a cleaning mechanism (6). The lower part of the drain frame (2) is provided with a filter frame (21) to filter impurities in the cleaning liquid. The bottom of the drain frame (2) is provided with two liquid outlets. The liquid outlets of the drain frame (2) are provided with valves. The lower part of the cleaning frame (3) is connected with a drain plate (31). Both sides of the drain plate (31) are connected with two drain pipes (32). The drain pipes ( A ball valve (33) is rotatably connected in each of the two drain pipes (32), and a hand wheel (34) is connected between the ball valves (33) in the two drain pipes (32) on both sides. The hand wheel (34) is rotated to drive the ball valve (33) to rotate and control the drain and sealing state of the drain pipe (32). A placement frame (4) is slidably connected to one side of the upper part of the cleaning frame (3), and a shell (41) is connected to one side of the cleaning frame (3). A limiting mechanism (5) for limiting the position of the solid-state capacitor is provided on the cleaning frame (3), and a cleaning mechanism (6) for cleaning the solid-state electric device is provided on the shell (41).

2. The immersion equipment for solid capacitor processing according to claim 1, characterized in that: The limiting mechanism (5) comprises a sliding frame (51), a wedge block (52), a pressing frame (53), a first elastic member (54) and a rotating pressing plate (55); a side of the cleaning frame (3) close to the placing frame (4) is slidably connected to the sliding frame (51); both sides of the sliding frame (51) are connected to wedge blocks (52); the placing frame (4) moves through the wedge blocks (52) to press the sliding frame (51) downward; the sliding frame (51) is connected to the pressing frame (53); the pressing frame (53) is located in the cleaning frame (3) and is slidably connected to the cleaning frame (3); the bottom of the pressing frame (53) is evenly spaced and rotatably connected to the rotating pressing plate (55); the sliding frame (51) moves downward to drive the pressing frame (53) to move downward, so as to drive the rotating pressing plate (55) to move downward and press the solid capacitor; the first elastic member (54) is connected between the sliding frame (51) and the cleaning frame (3) to reset the sliding frame (51) through elasticity.

3. The immersion equipment for solid capacitor processing according to claim 2, characterized in that: The top of the placement frame (4) is evenly spaced with slots for placing solid capacitors, and the number of the slots is consistent with the number of the rotating pressing plates (55) and the positions correspond one to one.

4. The immersion equipment for processing solid capacitors according to claim 3, characterized in that: The cleaning mechanism (6) comprises a motor (61), a rotating frame (62), a sliding rod (63), an agitating frame (64), a guide rail (641), a cleaning brush (65) and a second elastic member (66). The motor (61) is mounted on the housing (41). The output shaft of the motor (61) is connected to the rotating frame (62). The rotating frame (62) is located in the housing (41). At least one sliding rod (63) is evenly spaced and slidably connected between the housing (41) and the placement frame (4). The rotating frame (62) rotates to squeeze the sliding rod (63) to move. The second elastic member (66) is connected between the sliding rod (63) and the housing (41). 66), so that the sliding frame (51) is reset by elasticity after the sliding frame (51) moves, the extrusion frame (53) is evenly spaced with guide rails (641), a stirring frame (64) is slidably connected between the multiple guide rails (641), the stirring frame (64) is clamped with the sliding rod (63), so that the sliding rod (63) drives the stirring frame (64) to move when sliding, and stirs the cleaning liquid in the cleaning frame (3) to impact clean the solid capacitor, and the stirring frame (64) is spaced with cleaning brushes (65), and the stirring frame (64) drives the cleaning brush (65) to move when moving, so as to brush the solid capacitor.

5. The immersion equipment for processing solid capacitors according to claim 4, characterized in that: The invention also comprises a control drainage mechanism (7), which comprises a guide rod (71), a baffle (72) and a buoyancy block (73). Two pairs of guide rods (71) are arranged on the top of the drainage plate (31). The two pairs of guide rods (71) are located on both sides of two drainage pipes (32) on the same side. A baffle (72) is slidably connected between the two guide rods (71) of the same pair. The baffle (72) can block the drainage pipe (32). The top of the baffle (72) is connected with a buoyancy block (73). When the cleaning frame (3) contains cleaning liquid, the buoyancy block (73) floats up so that the baffle (72) moves up and no longer blocks the drainage pipe (32). When the cleaning frame (3) discharges the cleaning liquid to the initial height of the buoyancy block (73), the baffle (72) blocks the drainage pipe (32) again to control the discharge of the cleaning liquid.

6. The immersion equipment for solid capacitor processing according to claim 5, characterized in that: The cleaning frame (3) further comprises a stirring mechanism (8), the stirring mechanism (8) comprising a stirring plate (81), a movable frame (82) and a third elastic member (83); a side of the cleaning frame (3) close to the outer shell (41) is rotatably connected with the stirring plate (81); the outer shell (41) is slidably connected with the movable frame (82); the bottom of the movable frame (82) contacts the stirring plate (81) so that the movable frame (82) reciprocates up and down to squeeze the stirring plate (81) to swing; the upper part of the movable frame (82) is located on the rotation track of the squeezing frame (53) so that the squeezing frame (53) rotates to squeeze the movable frame (82) to move; and a third elastic member (83) is connected between the movable frame (82) and the outer shell (41) so that the movable frame (82) is reset after moving through elasticity.

7. The immersion equipment for processing solid capacitors according to claim 6, characterized in that: The cleaning frame (3) further comprises a circulation mechanism (9), the circulation mechanism (9) comprising a water pump (91) and a circulation water pipe (92), both sides of the cleaning frame (3) are connected to the water pump (91), the circulation water pipe (92) is installed on the water pump (91), the liquid inlet end of the circulation water pipe (92) is connected to the liquid outlet end of the liquid discharge frame (2), and the liquid outlet end of the circulation water pipe (92) extends into the cleaning frame (3), so that the cleaning liquid in the liquid discharge frame (2) is injected into the cleaning frame (3) for use again by starting the water pump (91).

8. The immersion equipment for processing solid capacitors according to claim 7, characterized in that: It also includes a sealing gasket (10), which is connected to the cleaning frame (3) to seal the gap between the placement frame (4) and the liquid discharge frame (2).

Images