Load lock chamber and semiconductor device

Abstract

The embodiment of the invention provides a load locking chamber and semiconductor equipment. The load locking chamber comprises a cavity provided with at least one inflation port and a first cavity, and the at least one inflation port is communicated with the first cavity; the first cover body covers the first cavity and is connected with the cavity, the first cover body and the inner wall of the cavity jointly form a first annular air channel and a first annular gap, the first annular air channel is communicated with the first cavity, and the first annular gap is communicated with the first cavity. The first annular air channel and the first annular gap are arranged in the first direction and communicate with each other, the first annular air channel is provided with a first communicating port communicating with the inflation port, and the first annular gap comprises a first width section and a second width section which communicate with each other. And the width of the first width section of the first annular gap is different from that of the second width section of the first annular gap.

Description

Technical Field

[0001] The present application relates to the technical field of semiconductor equipment, and in particular to a load lock chamber and a semiconductor equipment. Background Art

[0002] When the load lock chamber switches between the atmospheric environment and the low-pressure environment (usually close to a vacuum environment), the uniformity of the inflation gas flow rate must be ensured to avoid causing the workpiece (such as a wafer) to shake or move. To achieve this goal, the load lock chamber usually needs to be equipped with a diffuser to improve the uniformity of the inflation gas flow rate. However, sometimes due to the structure or limitations of the load lock chamber, it may not be possible to configure a diffuser, resulting in uneven inflation gas flow rate, causing the workpiece to shake or move, affecting the transmission accuracy of the workpiece. Summary of the invention

[0003] Embodiments of the present application provide a load lock chamber and a semiconductor device capable of improving the uniformity of an inflation gas flow rate.

[0004] In a first aspect, an embodiment of the present application provides a load lock chamber, comprising:

[0005] A cavity body, provided with a first inflation port and a first chamber, wherein the at least one inflation port is in communication with the first chamber;

[0006] The first cover body covers the first chamber and is connected to the chamber, the first cover body and the inner wall of the chamber together form a first annular airway and a first annular gap, the first annular airway is connected to the first chamber, the first annular airway and the first annular gap are arranged and connected along a first direction, the first annular gap includes a first width segment and a second width segment that are connected, and the width of the first width segment of the first annular gap is different from the width of the second width segment of the first annular gap.

[0007] Since the width of the first width segment of the first annular gap is different from the width of the second width segment of the first annular gap, the width of the first annular gap is non-uniform, which is beneficial to adjusting the flow velocity of the gas in the first annular gap and reducing the flow velocity difference of the gas at different positions in the first annular gap, thereby improving the uniformity of the gas flow velocity, which is beneficial to reducing the generation of eddy currents, thereby helping to reduce the jitter and movement of the workpiece in the first chamber, and improving the transmission accuracy of the workpiece in the first chamber.

[0008] According to the first aspect, in a possible implementation of the present application, the first annular airway has a first connecting port connected to the at least one inflation port, and a first width section of the first annular gap is arranged on a side of the first annular gap close to the first connecting port, and a width of the first width section of the first annular gap is greater than a width of a second width section of the first annular gap.

[0009] Since the width of the first width section of the first annular gap is greater than the width of the second width section, the width of the first annular gap is non-uniform, and the first width section of the first annular gap with a larger width is set at a position of the first annular gap close to at least one charging port, which is conducive to slowing down the flow rate of the gas just entering the first annular gap, reducing the flow rate difference between the first width section and the second width section away from the first width section, improving the uniformity of the gas flow rate, and helping to reduce the generation of eddy currents, thereby helping to reduce the shaking and movement of the workpiece in the first chamber, and improving the transmission accuracy of the workpiece in the first chamber. Since the eddy current in the first chamber is reduced, it is conducive to reducing the attachment of polluted particles to the workpiece in the first chamber, thereby improving the cleanliness of the workpiece in the first chamber.

[0010] According to the first aspect, in a possible implementation of the present application, a first annular groove is provided on the inner wall of the cavity at one end close to the first cover body, and the inner wall of the first annular groove and the first cover body together form the first annular airway.

[0011] According to the first aspect, in a possible implementation of the present application, the cavity also includes a second chamber connected to the at least one inflation port, and the load lock chamber also includes a second cover body, the second cover body covers the second chamber and is connected to the cavity, the second cover body and the inner wall of the cavity jointly form a second annular airway and a second annular gap, the at least one inflation port, the second annular airway, the second annular gap and the second chamber are connected to each other, the second annular airway and the second annular gap are arranged along the first direction, the second annular gap includes a first width segment and a second width segment that are connected, and the width of the first width segment of the second annular gap is different from the width of the second width segment of the second annular gap.

[0012] Since the width of the first width section of the second annular gap is different from the width of the second width section of the second annular gap, the width of the second annular gap is non-uniform, which is beneficial to adjusting the flow velocity of the gas in the second annular gap and reducing the flow velocity difference of the gas at different positions in the second annular gap, thereby improving the uniformity of the gas flow velocity, which is beneficial to reducing the generation of eddy currents, thereby helping to reduce the jitter and movement of the workpiece in the second chamber, and improving the transmission accuracy of the workpiece in the second chamber.

[0013] The load lock chamber includes a first chamber and a second chamber, which increases the number of workpieces that can be processed and is beneficial to improving the processing efficiency of the load lock chamber.

[0014] According to the first aspect, in a possible implementation of the present application, the second annular airway has a second connecting port connected to the first inflation port, and the first width section of the second annular gap is arranged on a side of the second annular gap close to the second connecting port, and the width of the first width section of the second annular gap is greater than the width of the second width section of the second annular gap.

[0015] Since the width of the first width section of the second annular gap is greater than the width of the second width section of the second annular gap, the width of the second annular gap is non-uniform, and the first width section with a larger width is arranged at a position of the second annular gap close to the at least one charging port, which is conducive to slowing down the flow rate of the gas just entering the second annular gap, reducing the flow rate difference between the first width section and the second width section away from the first width section, improving the uniformity of the flow rate of the gas filled into the second chamber, and helping to reduce the generation of eddy currents, thereby helping to reduce the shaking and movement of the workpiece in the second chamber, and improving the transmission accuracy of the workpiece in the second chamber. Since the eddy current in the second chamber is reduced, it is conducive to reducing the adhesion of polluted particles to the workpiece in the second chamber, thereby improving the cleanliness of the workpiece in the second chamber.

[0016] According to the first aspect, in a possible implementation of the present application, the cavity further includes a main body and a first partition contained in the inner cavity of the main body, the first chamber and the second chamber are separated by the first partition, the first partition, the first cover and the inner wall of the main body together form the first annular airway and the first annular gap, the first partition, the second cover and the inner wall of the main body together form the second annular airway and the second annular gap. The first chamber and the second chamber are separated by the first partition, which facilitates the manufacture of the cavity.

[0017] According to the first aspect, in a possible implementation of the present application, the first chamber and the second chamber are arranged along a second direction different from the first direction, the cavity further includes a third chamber and a second partition, the second partition is accommodated in the main body, the second partition is connected to the inner wall of the main body and the first partition, the third chamber is separated from the first chamber by the second partition, the third chamber and the first chamber are arranged along the first direction, and the third chamber is connected to the at least one inflation port. The third chamber is separated from the first chamber by the second partition, which increases the number of chambers and facilitates the manufacture of the chambers.

[0018] According to the first aspect, in a possible implementation of the present application, the first partition, the second partition, and the inner wall of the main body jointly form a third annular airway and a third annular gap, the first chamber, the third annular airway, the third annular gap, and the third chamber are arranged along a first direction, the third annular gap includes a first width segment and a second width segment that are connected, the third annular gap includes a first width segment and a second width segment that are connected, and the width of the first width segment of the third annular gap is different from the width of the second width segment of the third annular gap.

[0019] Since the width of the first width segment of the third annular gap is different from the width of the second width segment of the third annular gap, the width of the third annular gap is non-uniform, which is beneficial to adjusting the flow velocity of the gas in the third annular gap and reducing the difference in gas flow velocity at different positions in the third annular gap, thereby improving the uniformity of the gas flow velocity, and is beneficial to reducing the generation of eddy currents, thereby helping to reduce the jitter and movement of the workpiece in the third chamber, and improving the transmission accuracy of the workpiece in the third chamber.

[0020] According to the first aspect, in a possible implementation of the present application, the first width segment of the third annular gap is arranged on a side of the third annular gap close to the at least one inflation port, and the width of the first width segment of the third annular gap is greater than the width of the second width segment of the third annular gap.

[0021] Since the width of the first width section of the third annular gap is greater than the width of the second width section, the width of the third annular gap is non-uniform, and the first width section with a larger width is set at a position of the third annular gap close to at least one charging port, which is conducive to slowing down the flow rate of the gas just entering the third annular gap, reducing the flow rate difference between the first width section of the third annular gap and the second width section away from the first width section, improving the uniformity of the flow rate of the gas filled into the third chamber, and helping to reduce the generation of eddy currents, thereby helping to reduce the shaking and movement of the workpiece in the third chamber, and improving the transmission accuracy of the workpiece in the third chamber. Since the eddy current in the third chamber is reduced, it is conducive to reducing the attachment of polluted particles to the workpiece in the third chamber, thereby improving the cleanliness of the workpiece in the third chamber.

[0022] According to the first aspect, in a possible implementation of the present application, the cavity also includes a fourth chamber and a third partition, the third partition is connected to the inner wall of the main body, the third partition is connected to the first partition, the second chamber and the fourth chamber are separated by the third partition, the second chamber and the fourth chamber are arranged along the first direction, the third chamber and the fourth chamber are arranged along the second direction, and the fourth chamber is connected to the at least one inflation port.

[0023] The load lock chamber includes a first chamber, a second chamber, a third chamber and a fourth chamber, so that the load lock chamber has a double-layer four-chamber structure, which is beneficial to reducing the length of the load lock chamber while increasing the number of chambers.

[0024] According to the first aspect, in a possible implementation of the present application, the third partition, the first partition and the inner wall of the main body together form a fourth annular airway and a fourth annular gap, the second chamber, the fourth annular airway, the fourth annular gap and the fourth chamber are arranged along the first direction, the fourth annular airway is connected to the at least one inflation port, the fourth annular gap includes a first width segment and a second width segment that are connected, the first width segment of the fourth annular gap is located on a side of the fourth annular gap close to the at least one inflation port, and the width of the first width segment of the fourth annular gap is greater than the width of the second width segment of the fourth annular gap.

[0025] Since the width of the first width section of the fourth annular gap is greater than the width of the second width section, the width of the fourth annular gap is non-uniform, and the first width section with a larger width is arranged at a position of the fourth annular gap close to at least one charging port, which is conducive to slowing down the flow rate of the gas just entering the fourth annular gap, reducing the flow rate difference between the first width section and the second width section away from the first width section, improving the uniformity of the flow rate of the gas filled into the fourth chamber, and helping to reduce the generation of eddy currents, thereby helping to reduce the shaking and movement of the workpiece in the fourth chamber, and improving the transmission accuracy of the workpiece in the fourth chamber. Since the eddy current in the fourth chamber is reduced, it is conducive to reducing the attachment of polluted particles to the workpiece in the fourth chamber, thereby improving the cleanliness of the workpiece in the fourth chamber.

[0026] According to the first aspect, in a possible implementation of the present application, the load lock chamber further comprises a processing component disposed in the cavity, and the processing component comprises a preheating disk and / or a cooling disk. The preheating disk can preheat the workpiece in the chamber to a required temperature. The cooling disk can cool the workpiece in the chamber.

[0027] According to the first aspect, in a possible implementation of the present application, the load lock chamber further comprises a first exhaust port provided on the cavity, the first exhaust port being in communication with the first chamber, and the first exhaust port being used to be connected to an exhaust device.

[0028] In a second aspect, an embodiment of the present application provides a semiconductor device, comprising a processing chamber, a transfer chamber, and the load lock chamber according to the first aspect, wherein the transfer chamber is connected between the processing chamber and the load lock chamber. BRIEF DESCRIPTION OF THE DRAWINGS

[0029] Figure 1 is a schematic structural diagram of a semiconductor device provided in one embodiment of the present application;

[0030] Figure 2 is a three-dimensional assembly schematic diagram of a load lock chamber provided in one embodiment of the present application;

[0031] Figure 3 is along Figure 2 The cross-sectional view obtained along line II shown;

[0032] Figure 4 yes Figure 2 A top view of the load lock chamber is shown;

[0033] Figure 5a yes Figure 2 A bottom view of the load lock chamber is shown;

[0034] Figure 5b is along Figure 5a A cross-sectional view obtained along line II-II;

[0035] Figure 6a yes Figure 3 An enlarged schematic diagram of region A;

[0036] Figure 6b is a plan view of the first annular gap;

[0037] Figure 6c yes Figure 6a An enlarged schematic diagram of region C;

[0038] Figure 7 yes Figure 3 An enlarged schematic diagram of region B;

[0039] Figure 8 yes Figure 6a An enlarged schematic diagram of region D;

[0040] Fig. 9 is a cross-sectional view of a load lock chamber provided in accordance with one embodiment of the present application.

[0041] Description of reference numerals:

[0042] 10- cavity; 12- main body; 14- partition member;

[0043] 100-front end module; 101-chamber; 103-inflation port; 105-exhaust port; 122-first part; 124-second part; 126-second part

[0044] Two raised parts; 142 - first separator; 144 - second separator; 146 - third separator;

[0045] 1000-semiconductor device; 1010-film transfer port; 1011-first chamber; 1012-second chamber; 1013-third chamber; 1014-fourth chamber; 1031-first gas charging port; 1033-second gas charging port; 1422-base; 1424-first protrusion; 1442-first connection portion; 1444-second connection portion;

[0046] 200-Load lock chamber;

[0047] 30-cover; 31-first cover; 32-second cover; 33-third cover; 34-fourth cover;

[0048] 300-Transmission room;

[0049] 50-gate valve;

[0050] 61-first annular airway; 62-first annular gap; 63-second annular airway; 64-second annular gap; 65-third annular airway; 66-third annular gap; 67-fourth annular airway; 68-fourth annular gap;

[0051] 600-air extraction device; 611-first communication port; 621-first width section; 623-second width section; 631-second communication port; 641-first width section; 643-second width section; 661-first width section; 663-second width section; 681-first width section; 683-second width section;

[0052] 500-processing room;

[0053] 70-processing components;

[0054] 80-support frame;

[0055] 800-artifacts. DETAILED DESCRIPTION

[0056] See also Figure 1 , Figure 1 A semiconductor device 1000 includes a front-end module 100 , a loadlock chamber 200 , a transfer chamber 300 , and a plurality of processing chambers 500 .

[0057] The front-end module 100 can interact with other external facilities or parts of equipment. The front-end module 100 has a front-end robot, which is used to send the workpiece 800 into the load lock chamber 200 .

[0058] The load lock chamber 200 is coupled to the transfer chamber 300, and the load lock chamber 200 is coupled to a plurality of processing chambers 500. It is understood that the number of processing chambers 500 may also be one or two. A vacuum valve is provided between the transfer chamber 300 and the processing chamber 500. The load lock chamber 200 is used to receive an unprocessed (inbound) workpiece 800 to be transferred from the front-end module 100 to the processing chamber 500, and a workpiece 800 processed by the processing chamber 500 to be transferred back to the front-end module 100 from the transfer chamber 300. The workpiece 800 enters the transfer chamber 300 after the processing in the load lock chamber 200 is completed. In this embodiment, the workpiece 800 is a wafer. It is understood that the workpiece 800 may also be other types of workpieces. The load lock chamber 200 is connected to an inflator. The inflator is used to inflate the load lock chamber 200 to change the environment in the load lock chamber 200, for example, switching the load lock chamber 200 from a vacuum environment to an atmospheric environment. The load lock chamber 200 is connected to a gas extraction device, which is used to extract gas in the load lock chamber 200 to change the environment in the load lock chamber 200, for example, to switch the load lock chamber 200 from an atmospheric environment to a vacuum environment. The gas filling device can be an air pump, and the gas extraction device can be a vacuum pump. It can be understood that in some embodiments, the gas filling device and the gas extraction device can be provided on the same device.

[0059] The transfer chamber 300 is usually provided with a transfer robot (not shown) for transferring the workpiece 800 between the transfer chamber 300 and the processing chamber 500. In this embodiment, the front-end module 100 is usually in an atmospheric pressure environment, and the transfer chamber 300 and the processing chamber 500 are usually maintained in a vacuum environment.

[0060] It is understandable that in some embodiments, the front end module 100, the inflation device and the exhaust device may be omitted.

[0061] See also Figure 2 , Figure 2 The load lock chamber 200 includes a chamber 10 , a plurality of covers 30 , and a plurality of gate valves 50 .

[0062] Please combine Figure 2 and Figure 3 , Figure 3 is along Figure 2 As shown in the cross-sectional view obtained along line II, the cavity 10 is provided with a plurality of chambers 101 and at least one inflation port 103. Each cover 30 is sealingly covered on a chamber 101 to seal the chamber 101. The inflation port 103 is connected to an inflation device through a pipeline. Figure 2 and Figure 3 The load lock chamber shown as an example is a symmetrical structure or a symmetrical integrated structure. It should be understood that the present application does not limit the load lock chamber to a symmetrical structure.

[0063] The plurality of chambers 101 are used to carry and process the workpiece 800. Each chamber 101 is provided with a set of film transfer ports 1010. Each set of film transfer ports 1010 includes two film transfer ports 1010. One of the film transfer ports 1010 in each set of film transfer ports 1010 is coupled to the front-end module 100 to receive the unprocessed workpiece 800 transferred from the front-end module 100, or to transfer the workpiece 800 processed by the processing chamber 500 in the chamber 101 from the chamber 101 to the front-end module 100. Another film transfer port 1010 in each set of film transfer ports 1010 is coupled to the transfer chamber 300 to transfer the unprocessed workpiece 800 from the chamber 101 to the transfer chamber 300, or to receive the workpiece 800 processed by the processing chamber 500 transferred from the transfer chamber 300. Each gate valve 50 is provided on the chamber body 10 corresponding to one film transfer port 1010, and is used to control the opening and closing of the corresponding film transfer port 1010. When the film transfer port 1010 is opened, the workpiece 800 can enter the chamber 101 or exit from the chamber 101 through the film transfer port 1010. The gate valve 50 is an atmospheric gate valve. It can be understood that the gate valve 50 can also be a gate valve, a sliding door, a rotating door, etc., and the present application does not limit the structure of the gate valve 50.

[0064] See also Figure 4 , Figure 4 yes Figure 2 A top view of the load lock chamber is shown. The gas charging port 103 is provided on the chamber 10, and is used to charge the multiple chambers 101, so as to switch the corresponding chambers 101 from a vacuum environment to an atmospheric environment. In this embodiment, the number of the gas charging ports 103 is two, and the gas charging ports 103 are provided on the top surface of the chamber 10. It can be understood that the number of the gas charging ports 103 can also be one or more.

[0065] Please refer to Figure 5a and Figure 5b , Figure 5a yes Figure 2 Bottom view of the load lock chamber shown, Figure 5b is along Figure 5a The cross-sectional view obtained by the line II-II of the cavity 10 is also provided with at least one exhaust port 105 for extracting gas from the multiple chambers 101 to switch the chamber 101 from the atmospheric environment to the vacuum environment. In the present embodiment, the number of the exhaust ports 105 is two, and the exhaust ports 105 are provided on the bottom surface of the cavity 10. The exhaust port 105 is connected to the exhaust device through a pipeline. It can be understood that the number of the exhaust ports 105 can also be one or more.

[0066] Please refer again to the combination Figure 2 and Figure 3, the plurality of chambers 101 include a first chamber 1011, a second chamber 1012, a third chamber 1013, and a fourth chamber 1014. The plurality of covers 30 include a first cover 31, a second cover 32, a third cover 33, and a fourth cover 34. The first cover 31 is sealedly covered on the first chamber 1011, the second cover 32 is sealedly covered on the second chamber 1012, the third cover 33 is sealedly covered on the third chamber 1013, and the fourth cover 34 is sealedly covered on the fourth chamber 1014. The first cover 31 and the second cover 32 are located on the side where the top surface of the chamber 10 is located, and the third cover 33 and the fourth cover 34 are located on the side where the bottom surface of the chamber 10 is located. It can be understood that the third cover 33 and the fourth cover 34 can be omitted.

[0067] In this embodiment, the first chamber 1011 and the third chamber 1013 are arranged along the first direction, the first chamber 1011 and the second chamber 1012 are arranged along the second direction, the second chamber 1012 and the fourth chamber 1014 are arranged along the first direction, and the third chamber 1013 and the fourth chamber 1014 are arranged along the second direction. The first direction can be Figure 3 The X direction shown, the second direction can be Figure 3 The Y direction is shown. Figure 2 , Figure 3 and Figure 4 The number of the inflation ports 103 is two, and the two inflation ports 103 include a first inflation port 1031 and a second inflation port 1033. The first inflation port 1031 is connected to the first chamber 1011 and the second chamber 1012 (such as Figure 3 The second charging port 1033 is connected to the third chamber 1013 and the fourth chamber 1014. There are two exhaust ports 105, and the first exhaust port 105 is connected to the first chamber 1011 and the second chamber 1012 (as shown in FIG. Figure 5b As shown), the second exhaust port 105 is connected to the third chamber 1013 and the fourth chamber 1014. In this way, the first chamber 1011 and the second chamber 1012 can be inflated through the same inflation port 103, and the first chamber 1011 and the second chamber 1012 can be exhausted through the same exhaust port 105. The third chamber 1013 and the fourth chamber 1014 can be inflated through the same inflation port 103, and the third chamber 1013 and the fourth chamber 1014 can be exhausted through the same exhaust port 105.

[0068] It can be understood that in some possible implementations of the present application, the first inflation port 1031 of the two inflation ports 103 is connected to the first chamber 1011 and the third chamber 1013, and the second inflation port 1033 is connected to the second chamber 1012 and the fourth chamber 1014; one of the two exhaust ports 105 is connected to the first chamber 1011 and the third chamber 1013, and the other of the two exhaust ports 105 is connected to the second chamber 1012 and the fourth chamber 1014. It can be understood that each chamber 101 can be equipped with a corresponding inflation port 103 to improve the inflation efficiency of the inflation device for each chamber 101; each chamber 101 can be equipped with a corresponding exhaust port 105 to improve the exhaust efficiency of the exhaust device for each chamber 101.

[0069] In this embodiment, the cavity 10 includes a body 12 and a partition member 14 received in the body 12. The partition member 14 includes a first partition 142, a second partition 144 and a third partition 146. The first partition 142 partitions the body 12 into a first portion 122 and a second portion 124 along the second direction.

[0070] The first inflation port 1031 and the second inflation port 1033 are both provided on the main body 12 and the first partition 142, and the air extraction port 105 is provided on the main body 12 and the first partition 142. The second partition 144 is received in the first portion 122, and the second partition 144 is connected to the main body 12 and the first partition 142, so as to divide the first portion 122 into a first chamber 1011 and a third chamber 1013. The second partition 144 is located between the first cover 31 and the third cover 33 in the first direction. The third partition 146 is received in the second portion 124, and the third partition 146 is connected to the main body 12 and the first partition 142, so as to divide the second portion 124 into a second chamber 1012 and a fourth chamber 1014. The third partition 146 is located between the second cover 32 and the fourth cover 34 in the first direction. It can be understood that the present application does not limit the positions of each inflation port 103 and each air extraction port 105.

[0071] In this embodiment, the first partition 142 includes a base 1422 and a first protrusion 1424 protruding from the base 1422. The first protrusion 1424 is used to connect with the second partition 144 and the third partition 146. A second protrusion 126 is provided on the inner wall of the body 12 corresponding to the first protrusion 1424.

[0072] The second partition 144 and the third partition 146 each include a first connection portion 1442 and a second connection portion 1444. The second connection portion 1444 is protruded from the side of the first connection portion 1442 away from the first cover 31. The first connection portion 1442 of the second partition 144 abuts against the first protrusion 1424, and the first connection portion 1442 of the third partition 146 abuts against the second protrusion 126.

[0073] The first protrusion 1424 and the second protrusion 126 of the second partition 144 can cooperate with each other, so that the second partition 144 is positioned when the second partition 144 is installed on the first partition 142 and the main body 12. The first protrusion 1424 and the second protrusion 126 of the third partition 146 can cooperate with each other, so that the third partition 146 is positioned when the third partition 146 is installed on the first partition 142 and the main body 12, which facilitates the assembly of the load lock chamber 200. It can be understood that the present application does not limit the structure of the first partition 142, the second partition 144, the third partition 146, and the main body 12, nor does the present application limit the connection method of the first partition 142, the second partition 144 and the main body 12, nor does the present application limit the connection method of the first partition 142, the third partition 146 and the main body 12.

[0074] The load lock chamber 200 further includes a processing component 70 disposed in the cavity 10. In this embodiment, the processing component 70 is a preheating disk to preheat the workpiece 800 in the cavity 10 so that the temperature of the workpiece 800 is preheated to the required temperature. The number of processing components 70 can be two, and one processing component 70 is located in the third chamber 1013. The processing component 70 can also be a cooling disk, which is used to cool the cavity 10. It can be understood that in some embodiments, the processing component 70 includes a preheating disk and / or a cooling disk. It can be understood that the present application does not limit the number of processing components 70, and the number of processing components 70 can be one or more.

[0075] See also Figure 6a , Figure 6a yes Figure 3 The enlarged schematic diagram of the area A of the first cover 31 and the inner wall of the cavity 10 together form a first annular airway 61 and a first annular gap 62. The first annular airway 61 and the first annular gap 62 are arranged and connected along the first direction. The first annular airway 61 is connected to the first chamber 1011. The first annular airway 61 has a first connecting port 611 connected to the inflation port 103. Please refer to Figure 6a , Figure 6b and Figure 6c , Figure 6bis a schematic plan view of the first annular gap. The first annular gap 62 includes a first width section 621 and a second width section 623 which are connected to each other. Figure 6c yes Figure 6a The enlarged schematic diagram of region C of FIG. 6 shows that the width of the first width section 621 is different from the width of the second width section 623. That is, the first annular gap 62 is a gap of non-uniform width. In this embodiment, the first width section 621 is arranged on one side of the first annular gap 62 close to the first connecting port 611, and the first width section 621 and the first connecting port 611 are arranged in a first direction, and the width of the first width section 621 is greater than the width of the second width section 623. The width of the first annular gap 62 refers to the radial width of the first annular gap 62. Figure 6b The shape of the first annular gap 62 is only exemplary, and the first annular gap 62 may be a gap with non-uniform width.

[0076] In this embodiment, the base 1422 and the inner wall of the main body 12 are provided with a first groove, and the first groove on the inner wall of the base 1422 and the main body 12 forms a first annular groove, and the inner wall of the first annular groove and the first cover 31 together form a first annular air channel 61. The base 1422, the main body 12, and the first cover 31 together form a first annular gap 62.

[0077] The gas input from the first charging port 1031 enters the first annular gas channel 61 through the first connecting port 611. The gas entering the first annular gas channel 61 flows circumferentially, and the gas in the first annular gas channel 61 generates radial flow and up and down flow in the first direction through the first annular gap 62, thereby filling the first chamber 1011 with gas.

[0078] If the annular gap is of uniform width, when gas flows in from the inflation port, the gas flow rate in the part of the annular gap close to the inflation port will be much greater than the gas flow rate in the part of the annular gap far from the inflation port. If the gas flow rates in the annular gap differ greatly, it will easily cause eddy currents, causing the workpiece in the chamber to shake or shift, and may also cause contaminated particles in the chamber to fall onto the workpiece and contaminate the workpiece.

[0079] Since the width of the first width segment 621 is different from the width of the second width segment 623, the width of the first annular gap 62 is non-uniform, which is beneficial to adjusting the flow velocity of the gas in the first annular gap 62 and reducing the difference in flow velocity of the gas at different positions in the first annular gap 62, thereby improving the uniformity of the gas flow velocity, and helping to reduce the generation of eddy currents, thereby helping to reduce the jitter and movement of the workpiece 800 in the first chamber 1011, and improving the transmission accuracy of the workpiece 800 in the first chamber 1011. Since the width of the first width section 621 is greater than the width of the second width section 623, and the first width section 621 with a larger width is arranged at a position of the first annular gap 62 close to the first charging port 1031, it is helpful to slow down the flow rate of the gas just entering the first annular gap 62, and reduce the difference in the flow rate of the gas between the first width section 621 and the second width section 623 away from the first width section 621, thereby improving the uniformity of the gas flow rate, and helping to reduce the generation of eddy currents, thereby helping to reduce the shaking and movement of the workpiece 800 in the first chamber 1011, and improving the transmission accuracy of the workpiece 800 in the first chamber 1011. Since the eddy current in the first chamber 1011 is reduced, it is helpful to reduce the attachment of polluted particles to the workpiece 800 in the first chamber 1011, thereby improving the cleanliness of the workpiece 800 in the first chamber 1011.

[0080] See also Figure 7 , Figure 7 yes Figure 3 The enlarged schematic diagram of area B of the second cover body 32 and the inner wall of the cavity 10 jointly form a second annular airway 63 and a second annular gap 64. The second annular airway 63, the second annular gap 64 and the second chamber 1012 are connected to each other. The second annular airway 63 and the second annular gap 64 are arranged along the first direction. The second annular airway 63 has a second connecting port 631 connected to the first inflation port 1031, and the second annular gap 64 includes a first width section 641 and a second width section 643 that are connected. The width of the first width section 641 is different from the width of the second width section 643. The first width section 641 is arranged on one side of the second annular gap 64 close to the second connecting port 631. In this embodiment, the first width section 641 of the second annular gap 64 and the second connecting port 631 are arranged along the first direction, and the width of the first width section 641 is greater than the width of the second width section 643.

[0081] In this embodiment, the base 1422 and the inner wall of the main body 12 are provided with a second groove, the first groove on the inner wall of the base 1422 and the main body 12 forms a second annular groove, and the inner wall of the second annular groove and the second cover 32 together form a second annular air channel 63. The base 1422, the main body 12, and the second cover 32 together form a second annular gap 64.

[0082] In this embodiment, the gas input from the first charging port 1031 enters the second annular gas channel 63 through the second connecting port 631. The gas entering the second annular gas channel 63 flows circumferentially, and the gas in the second annular gas channel 63 generates radial flow and up and down flow in the first direction through the second annular gap 64, thereby achieving the gas filling into the second chamber 1012.

[0083] Since the width of the first width section 641 is different from the width of the second width section 643, the width of the second annular gap 64 is non-uniform, which is conducive to adjusting the flow rate of the gas in the second annular gap 64 and reducing the difference in the flow rate of the gas in different positions in the second annular gap 64. Since the width of the first width section 641 is greater than the width of the second width section 643, the width of the second annular gap 64 is non-uniform, and the first width section 641 with a larger width is arranged at a position of the second annular gap 64 close to the first charging port 1031, which is conducive to slowing down the flow rate of the gas just entering the second annular gap 64, reducing the difference in the flow rate of the gas between the first width section 641 and the second width section 643 away from the first width section 641, improving the uniformity of the flow rate of the gas filled into the second chamber 1012, and reducing the generation of eddy currents, thereby reducing the shaking and movement of the workpiece 800 in the second chamber 1012, and improving the transmission accuracy of the workpiece 800 in the second chamber 1012. Since the eddy current in the second chamber 1012 is reduced, it is helpful to reduce the adhesion of polluted particles to the workpiece 800 in the second chamber 1012, thereby improving the cleanliness of the workpiece 800 in the second chamber 1012.

[0084] Please refer again Figure 6a The first partition 142, the second partition 144, and the inner wall of the main body 12 together form a third annular air channel 65 and a third annular gap 66. The first chamber 1011, the third annular air channel 65, the third annular gap 66, and the third chamber 1013 are arranged along the first direction. Figure 6a and Figure 8 , Figure 8 yes Figure 6a The enlarged schematic diagram of the area D of the third annular gap 66 shows that the third annular gap 66 includes a first width section 661 and a second width section 663 which are connected to each other, and the width of the first width section 661 is different from the width of the second width section 663. The first width section 661 of the third annular gap 66 is provided on one side of the third annular gap 66 close to the second inflation port 1033, and the width of the first width section 661 of the third annular gap 66 is greater than the width of the second width section 663 of the third annular gap 66.

[0085] In this embodiment, the first protrusion 1424 and the second protrusion 126 are provided with a third groove, and the third grooves on the first protrusion 1424 and the second protrusion 126 form a third annular groove, and the inner wall of the third annular groove and the second separator 144 together form a third annular air channel 65. The first protrusion 1424, the second protrusion 126, and the second separator 144 together form a third annular gap 66.

[0086] In this embodiment, the gas enters the third annular gas channel 65 through the second charging port 1033. The gas entering the third annular gas channel 65 flows circumferentially, and the gas in the third annular gas channel 65 flows radially and flows up and down in the first direction through the third annular gap 66, thereby filling the third chamber 1013 with gas.

[0087] Since the width of the first width section 661 is different from the width of the second width section 663, the width of the third annular gap 66 is non-uniform, which is conducive to adjusting the flow rate of the gas in the third annular gap 66 and reducing the difference in the flow rate of the gas at different positions in the third annular gap 66. Since the width of the first width section 661 of the third annular gap 66 is greater than the width of the second width section 663, the width of the third annular gap 66 is non-uniform, and the first width section 661 with a larger width is arranged at the position of the third annular gap 66 close to the second charging port 1033, which is conducive to slowing down the flow rate of the gas just entering the third annular gap 66, reducing the difference in the flow rate of the gas between the first width section 661 and the second width section 663 of the third annular gap 66 away from the first width section 661, improving the uniformity of the flow rate of the gas filled into the third chamber 1013, and reducing the generation of eddy currents, thereby reducing the shaking and movement of the workpiece 800 in the third chamber 1013, and improving the transmission accuracy of the workpiece 800 in the third chamber 1013. Since the eddy current in the third chamber 1013 is reduced, it is helpful to reduce the attachment of polluted particles to the workpiece 800 in the third chamber 1013, thereby improving the cleanliness of the workpiece 800 in the third chamber 1013.

[0088] Please refer again Figure 7The first partition 142, the third partition 146, and the inner wall of the main body 12 jointly form a fourth annular air channel 67 and a fourth annular gap 68. The second chamber 1012, the fourth annular air channel 67, the fourth annular gap 68, and the fourth chamber 1014 are arranged in a first direction. The fourth annular air channel 67 is connected to the second charging port 1033. The fourth annular gap 68 includes a first width section 681 and a second width section 683 that are connected. The width of the first width section 681 is different from the width of the second width section 683. In this embodiment, the first width section 681 of the fourth annular gap 68 is arranged on a side of the fourth annular gap 68 close to the second charging port 1033, and the width of the first width section 681 of the fourth annular gap 68 is greater than the width of the second width section 683 of the fourth annular gap 68.

[0089] In this embodiment, a fourth groove is provided on the first protrusion 1424 and the second protrusion 126, and the fourth groove on the first protrusion 1424 and the second protrusion 126 forms a fourth annular groove, and the inner wall of the fourth annular groove and the second separator 144 jointly form a fourth annular air channel 67. The first protrusion 1424, the second protrusion 126, and the second separator 144 jointly form a fourth annular gap 68.

[0090] In this embodiment, the gas enters the fourth annular gas channel 67 through the second charging port 1033. The gas entering the fourth annular gas channel 67 flows circumferentially, and the gas in the fourth annular gas channel 67 flows radially and flows up and down in the first direction through the fourth annular gap 68, thereby filling the fourth chamber 1014 with gas.

[0091] Since the width of the first width section 681 is different from the width of the second width section 683, the width of the fourth annular gap 68 is non-uniform, which is conducive to adjusting the flow rate of the gas in the fourth annular gap 68 and reducing the difference in the flow rate of the gas at different positions in the fourth annular gap 68. Since the width of the first width section 681 of the fourth annular gap 68 is greater than the width of the second width section 683, the width of the fourth annular gap 68 is non-uniform, and the first width section 681 with a larger width is arranged at the position of the fourth annular gap 68 close to the second charging port 1033, which is conducive to slowing down the flow rate of the gas just entering the fourth annular gap 68, reducing the difference in the flow rate of the gas between the first width section 681 and the second width section 683 away from the first width section 681, improving the uniformity of the flow rate of the gas filled into the fourth chamber 1014, and reducing the generation of eddy currents, thereby reducing the shaking and movement of the workpiece 800 in the fourth chamber 1014, and improving the transmission accuracy of the workpiece 800 in the fourth chamber 1014. Since the eddy current in the fourth chamber 1014 is reduced, it is helpful to reduce the attachment of polluted particles to the workpiece 800 in the fourth chamber 1014, thereby improving the cleanliness of the workpiece 800 in the fourth chamber 1014.

[0092] It can be understood that the first annular groove can be formed on the first cover 31 , the second annular groove can be formed on the second cover 32 , the third annular groove can be formed on the second partition 144 , and the fourth annular groove can be formed on the third partition 146 .

[0093] In some possible embodiments of the present application, the first chamber 1011 and the second chamber 1012 are isolated from each other, and the first chamber 1011 and the fourth chamber 1014 are isolated from each other to avoid cross infection between the first chamber 1011 and the second chamber 1012, and to avoid cross infection between the first chamber 1011 and the fourth chamber 1014. The third chamber 1013 and the second chamber 1012 are isolated from each other, and the third chamber and the fourth chamber 1014 are isolated from each other to avoid cross infection between the third chamber 1013 and the second chamber 1012, and to avoid cross infection between the third chamber 1013 and the fourth chamber 1014. The first chamber 1011 is in communication with the third chamber 1013, and the first chamber 1011 is in communication with the first inflation port 1031. The first inflation port 1031 is connected to the inflation device through a pipeline to inflate the first chamber 1011 and the third chamber 1013. The third chamber 1013 is connected to the air extraction port 105 through a pipeline, and the first air extraction port 105 is connected to the air extraction device 600 to extract air from the first chamber 1011 and the third chamber 1013. The second chamber 1012 is connected to the fourth chamber 1014, and the second chamber 1012 is connected to the second inflation port 1033. The second inflation port 1033 is used to connect to the inflation device through a pipeline to inflate the second chamber 1012 and the fourth chamber 1014. The second air extraction port 105 is connected to the air extraction device 600 through a pipeline to extract air from the second chamber 1012 and the fourth chamber 1014. The main body 12 is divided into a first part 122 and a second part 124 which are isolated from each other by a first partition 142. The first part 122 is divided into a first chamber 1011 and a third chamber 1013 which are connected to each other by a second partition 144. The second part 124 is divided into a second chamber 1012 and a fourth chamber 1014 which are connected to each other by a third partition 146. The first part 122 and the second part 124 can be operated independently, for example, to inflate or exhaust air. The first chamber 1011 and the third chamber 1013 in the first part 122 can be inflated at the same time, and the first chamber 1011 and the third chamber 1013 in the first part 122 can be exhausted at the same time. The second chamber 1012 and the fourth chamber 1014 in the second part 124 can be inflated at the same time, and the second chamber 1012 and the fourth chamber 1014 in the second part 124 can be evacuated at the same time. In this way, while the number of chambers 101 is increased, the number of inflation pipes and exhaust pipes is reduced, which is conducive to simplifying the structure of the semiconductor device 1000.

[0094] In some possible embodiments of the present application, each of the first chamber 1011, the second chamber 1012, the third chamber 1013, and the fourth chamber 1014 is correspondingly provided with at least one inflation port and at least one exhaust port, so that the multiple chambers 101 are environmentally independent of each other to avoid cross infection, which is beneficial to improving the cleanliness of the workpiece 800.

[0095] In some possible implementations of the present application, a plurality of chambers 101 may share the same inflation port 103 , and a plurality of chambers 101 may share the same exhaust port 105 .

[0096] In some embodiments of the present application, the number of chambers 101 in the load lock chamber 200 may be one, that is, the load lock chamber 200 is a single chamber, see Fig. 9 The load lock chamber 200 includes a cavity 10 and a first cover 31. The cavity 10 is provided with a gas charging port 103 and a first cavity 1011. The gas charging port 103 and the first cavity 1011 are in communication with each other. The first cover 31 covers the first cavity 1011 and is connected to the cavity 10. The first cover 31 and the inner wall of the cavity 10 together form a first annular airway 61 and a first annular gap 62. The first annular airway 61 is in communication with the first cavity 1011. The first annular airway 61 and the first annular gap 62 are arranged and communicated along a first direction. The first annular airway 61 has a first connecting port 611 in communication with the gas charging port 103. The first annular gap 62 includes a first width section 621 and a second width section 623 in communication. The width of the first width section 621 is different from the width of the second width section 623.

[0097] The first width section 621 is arranged on one side of the first annular gap 62 close to the first connecting opening 611, and the first width section 621 of the first annular gap 62 and the first connecting opening 611 are arranged in a first direction. The width of the first width section 621 of the first annular gap 62 is greater than the width of the second width section 623 of the first annular gap 62.

[0098] During inflation, the gas can flow in a circumferential direction through the first annular air channel 61, and the gas flowing in the first annular air channel 61 can flow in a radial direction and in a first direction through the first annular gap 62. Fig. 9 The gas flow is exemplarily indicated by arrows.

[0099] The load lock chamber 200 is further provided with a support frame 80 in the first chamber 101 for supporting a workpiece 800 .

[0100] It should be understood that expressions such as "including" and "may include" that may be used in the present application indicate the existence of the disclosed functions, operations, or constituent elements, and do not limit one or more additional functions, operations, and constituent elements. In the present application, terms such as "including" and / or "having" may be interpreted as indicating specific characteristics, numbers, operations, constituent elements, components, or combinations thereof, but may not be interpreted as excluding the existence or possibility of adding one or more other characteristics, numbers, operations, constituent elements, components, or combinations thereof.

[0101] In addition, in the present application, the expression "and / or" includes any and all combinations of the associated listed words. For example, the expression "A and / or B" may include A, may include B, or may include both A and B.

[0102] In the present application, expressions including ordinal numbers such as "first" and "second" may modify various elements. However, such elements are not limited by the above expressions. For example, the above expressions do not limit the order and / or importance of the elements. The above expressions are only used to distinguish one element from other elements. For example, a first user device and a second user device indicate different user devices, although the first user device and the second user device are both user devices. Similarly, without departing from the scope of the present application, a first element may be referred to as a second element, and similarly, a second element may also be referred to as a first element.

[0103] When a component is referred to as being "connected" or "accessed" to another component, it should be understood that the component is not only directly connected to or accessed to the other component, but also another component may exist between the component and the other component. On the other hand, when a component is referred to as being "directly connected" or "directly accessed" to another component, it should be understood that there is no component between them.

[0104] The above is only a specific implementation of the present application, but the protection scope of the present application is not limited thereto. Any person skilled in the art who is familiar with the present technical field can easily think of changes or substitutions within the technical scope disclosed in the present application, which should be included in the protection scope of the present application. Therefore, the protection scope of the present application should be based on the protection scope of the claims.

Claims

1. A load lock chamber, characterized in that: include: A cavity body, provided with at least one inflation port and a first chamber, wherein the at least one inflation port is in communication with the first chamber; The first cover body covers the first chamber and is connected to the chamber, the first cover body and the inner wall of the chamber together form a first annular airway and a first annular gap, the first annular airway is connected to the first chamber, the first annular airway and the first annular gap are arranged and connected along a first direction, the first annular gap includes a first width segment and a second width segment that are connected, and the width of the first width segment of the first annular gap is different from the width of the second width segment of the first annular gap.

2. The load lock chamber according to claim 1, wherein: The first annular airway has a first connecting port connected to the at least one inflation port, and the first width section of the first annular gap is arranged on a side of the first annular gap close to the first connecting port, and the width of the first width section of the first annular gap is greater than the width of the second width section of the first annular gap.

3. The load lock chamber according to claim 1, wherein: A first annular groove is provided on the inner wall of the cavity at one end close to the first cover body, and the inner wall of the first annular groove and the first cover body together form the first annular air channel.

4. The load lock chamber of claim 1, wherein: The chamber further comprises a second chamber in communication with the at least one inflation port, The load lock chamber further includes a second cover, which covers the second chamber and is connected to the chamber. The second cover and the inner wall of the chamber together form a second annular airway and a second annular gap. The at least one inflation port, the second annular airway, the second annular gap and the second chamber are connected to each other. The second annular airway and the second annular gap are arranged along the first direction. The second annular gap includes a first width segment and a second width segment which are connected to each other. The width of the first width segment of the second annular gap is different from the width of the second width segment of the second annular gap.

5. The load lock chamber of claim 4, wherein: The second annular airway has a second connecting port connected to the at least one inflation port, and the first width section of the second annular gap is arranged on a side of the second annular gap close to the second connecting port, and the width of the first width section of the second annular gap is greater than the width of the second width section of the second annular gap.

6. The load lock chamber of claim 4, wherein: The cavity also includes a main body and a first partition accommodated in the inner cavity of the main body, the first chamber and the second chamber are separated by the first partition, the first partition, the first cover body and the inner wall of the main body together form the first annular airway and the first annular gap, the first partition, the second cover body and the inner wall of the main body together form the second annular airway and the second annular gap.

7. The load lock chamber of claim 6, wherein: The first chamber and the second chamber are arranged along a second direction different from the first direction, and the cavity also includes a third chamber and a second partition, the second partition is accommodated in the main body, the second partition is connected to the inner wall of the main body and the first partition, the third chamber is separated from the first chamber by the second partition, the third chamber and the first chamber are arranged along the first direction, and the third chamber is connected to the at least one inflation port.

8. The load lock chamber of claim 7, wherein: The first partition, the second partition, and the inner wall of the main body together form a third annular airway and a third annular gap. The first chamber, the third annular airway, the third annular gap, and the third chamber are arranged along a first direction. The third annular airway is connected to the at least one inflation port. The third annular gap includes a first width segment and a second width segment that are connected to each other. The width of the first width segment of the third annular gap is different from the width of the second width segment of the third annular gap.

9. The load lock chamber of claim 8, wherein: The first width section of the third annular gap is arranged at a side of the third annular gap close to the at least one inflation port, and the width of the first width section of the third annular gap is greater than the width of the second width section of the third annular gap.

10. The load lock chamber of claim 7, wherein: The cavity also includes a fourth chamber and a third partition, the third partition is connected to the inner wall of the main body, the third partition is connected to the first partition, the second chamber and the fourth chamber are separated by the third partition, the third chamber and the fourth chamber are arranged along the second direction, and the fourth chamber is connected to the at least one inflation port.

11. The load lock chamber of claim 10, wherein: The third partition, the first partition and the inner wall of the main body together form a fourth annular airway and a fourth annular gap. The second chamber, the fourth annular airway, the fourth annular gap and the fourth chamber are arranged along the first direction. The fourth annular airway is connected to the at least one inflation port. The fourth annular gap includes a first width segment and a second width segment that are connected. The width of the first width segment of the fourth annular gap is different from the width of the second width segment of the fourth annular gap.

12. The load lock chamber of claim 11, wherein: The first width section of the fourth annular gap is arranged on a side of the fourth annular gap close to the at least one inflation port, and the width of the first width section of the fourth annular gap is greater than the width of the second width section of the fourth annular gap.

13. The load lock chamber of claim 12, wherein: The load lock chamber is a symmetrical structure.

14. The load lock chamber according to any one of claims 1 to 13, characterized in that: The load lock chamber further includes a processing component disposed within the cavity, wherein the processing component includes a preheating plate or a cooling plate.

15. The load lock chamber of claim 1, wherein: The load lock chamber further includes at least one exhaust port disposed on the cavity body, and the at least one exhaust port is in communication with the first chamber.

16. A semiconductor device, characterized in that: The invention comprises a processing chamber, a transfer chamber and a load lock chamber according to any one of claims 1 to 15, wherein the transfer chamber is coupled to the processing chamber, and the transfer chamber is coupled to the load lock chamber.

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