Calculation method, system and equipment for magneto-rheological polishing angle and medium

Abstract

The invention discloses a magneto-rheological polishing angle calculation method, system and device and a medium. According to the method, a polishing angle population of a magneto-rheological removal function is constructed, and the polishing angle population comprises a plurality of polishing angles generated randomly; a magneto-rheological removal function is calculated, and according to each polishing angle in the polishing angle population, the residual surface shape error and the correction capability spectrum of the to-be-machined element are machined; based on the residual surface shape error and the line correction capability spectrum of each polishing angle, performing crossover variation on the polishing angle population to obtain a next generation population, and performing loop iteration until a preset iteration condition is met to obtain an optimal polishing angle; and for each polishing angle in the polishing angle population in iteration, executing the following steps: calculating a residual surface shape error corresponding to the to-be-processed element processed by the magneto-rheological removal function according to the polishing angle, and obtaining a residual surface shape error root mean square of the corresponding polishing angle according to the residual surface shape error, and the modification capacity of the magnetorheological polishing technology can be improved by adjusting the removal function polishing angle.

Description

Technical Field

[0001] The present application relates to the technical field of precision manufacturing of optical components, and in particular to a method, system, device and medium for calculating a magnetorheological polishing angle. Background Art

[0002] The continuous phase plate (CPP) in the diffractive optical element has a continuous and smooth phase feature, which can suppress high-order diffraction effects and improve the anti-laser damage threshold. It has now become a core device for wavefront modulation and beam shaping in high-power laser systems. Especially in typical application scenarios such as inertial confinement fusion (ICF), CPP needs to achieve flat-top distribution, steep boundaries and no sidelobe suppression characteristics of the laser focus through nanometer-level surface accuracy.

[0003] In the existing technology, when magnetorheological finishing (MRF) is used to process CPP with multi-scale phase structure, a single removal function is difficult to match the multi-scale phase distribution characteristics of the CPP surface, resulting in slow convergence of low-frequency errors, which seriously restricts the processing efficiency. Therefore, the single shaping capability of the removal function in magnetorheological finishing technology restricts the improvement of the manufacturing accuracy and efficiency of continuous phase components, and becomes the main bottleneck of the current CPP process optimization. Summary of the invention

[0004] The following is a summary of the subject matter described in detail herein. This summary is not intended to limit the scope of the claims.

[0005] The main purpose of the embodiments of the present disclosure is to propose a method, system, device and storage medium for calculating the magnetorheological polishing angle, which can improve the shaping ability of the magnetorheological polishing technology by adjusting the polishing angle of the removal function and improve the processing accuracy of optical parts.

[0006] A first aspect of an embodiment of the present application provides a method for calculating a magnetorheological polishing angle, which is used in a central controller. The method includes: Constructing a polishing angle population of a magnetorheological removal function, wherein the polishing angle population includes a plurality of randomly generated polishing angles, and the magnetorheological removal function is obtained by processing a component to be processed using a magnetorheological polishing technology; Calculating the residual surface error and the polishing ability spectrum of the component to be processed by the magnetorheological removal function according to each polishing angle in the polishing angle population; Based on the residual surface error and the training ability spectrum of each polishing angle, the polishing angle population is cross-mutated to obtain the next generation population, and iterates cyclically until the preset iteration conditions are met to obtain the optimal polishing angle; For each polishing angle in the polishing angle population in the iteration, executing: calculating the residual surface error corresponding to the component to be processed by the magnetorheological removal function according to the polishing angle, and obtaining the residual surface error root mean square of the corresponding polishing angle according to the residual surface error.

[0007] In some embodiments of the present application, the step of calculating the residual surface error of the component to be processed by the magnetorheological removal function according to each polishing angle in the polishing angle population includes: Obtaining the initial surface shape of the component to be processed by the magnetorheological removal function according to the polishing angle; The residual surface shape error is obtained by calculation according to the initial surface shape and a preset ideal surface shape.

[0008] In some embodiments of the present application, the calculation of the magnetorheological removal function according to each polishing angle in the polishing angle population to process the residual surface error and the polishing ability spectrum of the component to be processed includes: Obtaining a first removal function after the magnetorheological removal function is rotated by the polishing angle; Performing a two-dimensional Fourier transform on the first removal function to obtain a corresponding frequency spectrum; The frequency band amplitude of the frequency spectrum within a preset spatial frequency range is intercepted to obtain the training ability spectrum of the first removal function.

[0009] In some embodiments of the present application, the polishing angle population is cross-mutated based on the residual surface error and the training ability spectrum of each polishing angle to obtain the next generation population, including: Calculate the corresponding residual surface error root mean square according to the residual surface error of each polishing angle; Determining excellent individuals in the polishing angle population according to the residual surface shape error root mean square and the practice ability spectrum; The polishing angle population is cross-mutated according to the excellent individuals to obtain the next generation population.

[0010] In some embodiments of the present application, the preset iteration condition includes: the current iteration number is greater than or equal to the preset maximum iteration number, or the root mean square of the residual surface error of the magnetorheological removal function corresponding to the polishing angle is less than or equal to a preset minimum threshold.

[0011] In some embodiments of the present application, the calculation formula of the residual surface error includes: ; ; ; in, is the preset ideal surface shape, is the residence time of magnetorheological polishing, Indicates the magnetorheological polishing angle is The removal function when is the removal matrix of the removal function, is the residual surface error.

[0012] In some embodiments of the present application, the calculation formula for intercepting the frequency band amplitude of the spectrum within a preset spatial frequency range to obtain the training power spectrum of the first removal function includes: ; ; ; in, The magnetorheological polishing angle is The removal function when is the residence time of magnetorheological polishing, for The frequency amplitude after two-dimensional Fourier transform is The polishing angle representing the removal function is The ability to modify shapes when for The amplitude of .

[0013] To achieve the above object, a second aspect of an embodiment of the present invention provides a system for calculating a magnetorheological polishing angle, the system comprising: A construction module, used to construct a polishing angle population of a magnetorheological removal function, wherein the polishing angle population includes a plurality of randomly generated polishing angles, and the magnetorheological removal function is obtained by processing a component to be processed using a magnetorheological polishing technology; A calculation module, used for calculating the residual surface error and the polishing ability spectrum of the component to be processed by the magnetorheological removal function according to each polishing angle in the polishing angle population; An iteration module, for performing crossover mutation on the polishing angle population based on the residual surface error and the training ability spectrum of each polishing angle to obtain the next generation population, and performing cyclic iteration until a preset iteration condition is met to obtain the optimal polishing angle; For each polishing angle in the polishing angle population in the iteration, executing: calculating the residual surface error corresponding to the component to be processed by the magnetorheological removal function according to the polishing angle, and obtaining the residual surface error root mean square of the corresponding polishing angle according to the residual surface error.

[0014] To achieve the above-mentioned purpose, the third aspect of an embodiment of the present invention provides an electronic device, comprising: at least one control processor and a memory for communicating with the at least one control processor; the memory stores instructions that can be executed by the at least one control processor, and the instructions are executed by the at least one control processor so that the at least one control processor can execute the above-mentioned method for calculating the magnetorheological polishing angle.

[0015] To achieve the above-mentioned purpose, the fourth aspect of an embodiment of the present invention provides a computer-readable storage medium, wherein the computer-readable storage medium stores computer-executable instructions, and the computer-executable instructions are used to enable a computer to execute the above-mentioned method for calculating a magnetorheological polishing angle.

[0016] The embodiment of the present application provides a method for calculating a magnetorheological polishing angle, by constructing a polishing angle population of a magnetorheological removal function, the polishing angle population comprising a plurality of randomly generated polishing angles; calculating the residual surface shape error and the repair capability spectrum of the component to be processed according to each polishing angle in the polishing angle population by the magnetorheological removal function; cross-mutating the polishing angle population based on the residual surface shape error and the repair capability spectrum of each polishing angle to obtain the next generation population, and performing cyclic iterations until the preset iteration conditions are met to obtain the optimal polishing angle; for each polishing angle in the polishing angle population during the iteration, executing: calculating the residual surface shape error corresponding to the component to be processed according to the polishing angle processed by the magnetorheological removal function, obtaining the residual surface shape error root mean square of the corresponding polishing angle according to the residual surface shape error, and being able to improve the repair capability of the magnetorheological polishing technology by adjusting the polishing angle of the removal function.

[0017] It can be understood that the beneficial effects of the second to fourth aspects compared with the related art are the same as the beneficial effects of the first aspect compared with the related art. Please refer to the relevant description in the first aspect, and no further details will be given here. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] The above and / or additional aspects and advantages of the present application will become apparent and easily understood from the description of the embodiments in conjunction with the following drawings, in which: Figure 1 It is a schematic flow chart of a method for calculating a magnetorheological polishing angle provided in an embodiment of the present application; Figure 2 is a schematic diagram of a magnetorheological removal function provided in an embodiment of the present application; Figure 3 is a schematic diagram of a magnetorheological spiral structure provided in an embodiment of the present application; Figure 4 It is a schematic diagram of the shaping capability of the removal function at different polishing angles provided in the embodiment of the present application; Figure 5 It is a schematic diagram of magnetorheological spiral processing provided in an embodiment of the present application; Figure 6 It is a structural schematic diagram of a magnetorheological polishing angle calculation training system provided in an embodiment of the present application; Figure 7 It is a schematic diagram of the hardware structure of the electronic device provided in the embodiment of the present application. DETAILED DESCRIPTION

[0019] The embodiments of the present application are described in detail below, and examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present application, and cannot be understood as limiting the present application.

[0020] In the description of this application, if there is a description of first, second, etc., it is only for the purpose of distinguishing technical features, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features or implicitly indicating the order of the indicated technical features.

[0021] In the description of the present application, it should be understood that the descriptions involving orientation, such as the orientation or positional relationship indicated as up, down, etc., are based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present application.

[0022] In the description of this application, it should be noted that, unless otherwise clearly defined, terms such as setting, installing, connecting, etc. should be understood in a broad sense, and technicians in the relevant technical field can reasonably determine the specific meaning of the above terms in this application based on the specific content of the technical solution.

[0023] As a typical representative of diffractive optical elements, the core feature of the continuous phase plate (CPP) is that the surface is distributed with a continuous phase profile structure. Different from the scattering loss and intensity modulation problems caused by discrete steps in traditional step-type phase elements, CPP can effectively suppress high-order diffraction effects through a smooth phase structure, significantly improve the element's anti-laser damage threshold, and show unique technical advantages in the fields of laser beam shaping, wavefront compensation, and light field modulation. CPP can convert the incident wavefront into an outgoing wavefront with a specific energy distribution (such as flat-top, Gaussian or super-Gaussian distribution) by precisely controlling the phase distribution of the incident wavefront. In the inertial confinement fusion (ICF) device, in order to achieve uniform irradiation of the target pellet, the intensity distribution of the laser focus is required to have flat top, steep edges, and no side lobes, which places extremely high demands on the manufacturing accuracy of CPP. In recent years, as ICF devices have developed towards higher power and shorter pulses, the design parameters of CPP have shown a trend of miniaturization of spatial period (millimeter level) and multiplication of modulation depth (several microns to tens of microns), which poses a great challenge to the accuracy and adaptability of the manufacturing process.

[0024] Magnetorheological Finishing (MRF) has become the mainstream processing method for CPP in ICF devices due to its advantages such as high determinism (material removal accuracy reaches sub-nanometer level) and small sub-surface damage, and has formed a mature process flow. However, with the continuous improvement of ICF system's requirements for CPP performance, the limitations of traditional MRF technology have gradually emerged. At present, MRF usually uses a single size removal function for repeated iterative processing to achieve surface shape correction of CPP components. However, the CPP surface has complex phase distribution characteristics, and a single removal function is difficult to match the multi-scale phase distribution characteristics of the CPP surface, resulting in slow convergence of low-frequency errors, which seriously restricts processing efficiency. In summary, the single shaping capability of the removal function of magnetorheological polishing technology restricts the improvement of the manufacturing accuracy and efficiency of continuous phase components, and has become the main bottleneck of current CPP process optimization.

[0025] Based on this, the embodiments of the present application provide a method, system, electronic device and medium for calculating the magnetorheological polishing angle, aiming to determine the spiral polishing angle, improve the shaping ability of the magnetorheological polishing technology by using a rotational removal function, achieve the matching of the processing points of complex curved surface structures and the spiral angles, and thereby significantly improve the processing accuracy of optical parts.

[0026] The magnetorheological polishing angle calculation method, system, electronic device and medium provided in the embodiments of the present application are specifically described through the following embodiments. First, the magnetorheological polishing angle calculation method in the embodiments of the present application is described.

[0027] The embodiments of the present application can acquire and process relevant data based on artificial intelligence technology. Artificial Intelligence (AI) is the theory, method, technology and application system that uses digital computers or machines controlled by digital computers to simulate, extend and expand human intelligence, perceive the environment, acquire knowledge and use knowledge to obtain the best results.

[0028] AI basic technologies generally include sensors, dedicated AI chips, cloud computing, distributed storage, big data processing technology, operation / interaction systems, mechatronics, etc. AI software technologies mainly include computer vision technology, robotics technology, biometrics technology, speech processing technology, natural language processing technology, and machine learning / deep learning.

[0029] The calculation method of the magnetorheological polishing angle provided in the embodiment of the present application relates to the technical field of precision manufacturing of optical components. The calculation method of the magnetorheological polishing angle provided in the embodiment of the present application can be applied to the terminal, can also be applied to the server side, and can also be software running in the terminal or the server side. In some embodiments, the terminal can be a smart phone, a tablet computer, a laptop computer, a desktop computer, etc.; the server side can be configured as an independent physical server, or a server cluster or distributed system composed of multiple physical servers, and can also be configured as a cloud server that provides basic cloud computing services such as cloud services, cloud databases, cloud computing, cloud functions, cloud storage, network services, cloud communications, middleware services, domain name services, security services, CDN, and big data and artificial intelligence platforms; the software can be an application of the calculation method of the magnetorheological polishing angle, etc., but is not limited to the above forms.

[0030] The present application can be used in many general or special computer system environments or configurations. For example: personal computers, server computers, handheld or portable devices, tablet devices, multiprocessor systems, microprocessor-based systems, set-top boxes, programmable consumer electronics, network PCs, minicomputers, mainframe computers, distributed computing environments including any of the above systems or devices, etc. The present application can be described in the general context of computer-executable instructions executed by a computer, such as program modules. Generally, program modules include routines, programs, objects, components, data structures, etc. that perform specific tasks or implement specific abstract data types. The present application can also be practiced in distributed computing environments, in which tasks are performed by remote processing devices connected through a communication network. In a distributed computing environment, program modules can be located in local and remote computer storage media including storage devices.

[0031] For this purpose, refer to Figure 1The embodiment of the present application provides a method for calculating the magnetorheological polishing angle. The method is applied to a central controller. The controller can be a server, an electronic device, or a mobile terminal, etc., which is not specifically limited here. The method includes the following steps S110 to S130.

[0032] Step S110, constructing a polishing angle population of a magnetorheological removal function, wherein the polishing angle population includes a plurality of randomly generated polishing angles, and the magnetorheological removal function is formed when a magnetorheological polishing ribbon contacts a component to be processed.

[0033] In this step, the magnetorheological polishing technology is used to process the optical element. First, the surface shape error needs to be calculated based on the actual surface shape of the optical element and the preset ideal surface shape, and then the part to be processed (the element to be processed) for magnetorheological polishing is determined based on the surface shape error. When the element to be processed is processed by magnetorheological polishing, each processing point corresponds to a magnetorheological removal function, wherein the magnetorheological removal function is formed by the contact between the magnetorheological polishing ribbon and the element to be processed.

[0034] Specifically, the magnetorheological removal function is formed by the contact between the polishing ribbon used for processing in the magnetorheological polishing technology and the component to be processed. It describes the ability of the polishing tool to remove material from the surface of the component to be processed at a specific position. It is affected by multiple process parameters, such as the speed of the polishing wheel, the pressure depth, the viscosity of the polishing liquid, the flow rate, etc. Among them, the polishing angle of the removal function is a key factor in adjusting the polishing ability.

[0035] Furthermore, the polishing angle is generated by the spiral rotation in the radial direction while the magnetorheological polishing wheel is rotating for processing. It is preferably the angle of the polishing wheel relative to the surface of the component to be processed. Different polishing angles have different material removal characteristics (peak material removal rate, material volume removal rate, half-height full width, etc.). It can be seen that the change of the polishing angle will affect the contact process between the polishing ribbon and the component to be processed, and then the polishing angle can be adjusted to adapt to the surface characteristics of the continuous phase component and improve the shaping ability of the removal function.

[0036] Furthermore, multiple polishing angles for magnetorheological polishing are randomly generated to construct a polishing angle population for magnetorheological polishing, providing data support for selecting the optimal polishing angle in subsequent iterative processes.

[0037] In some embodiments, Figure 2 As shown in the figure, the inverted D-shaped removal function of magnetorheological polishing has significant differences in the shaping ability at different polishing angles.

[0038] Step S120, calculating the magnetorheological removal function to process the residual surface error and the polishing ability spectrum of the component to be processed according to each polishing angle in the polishing angle population.

[0039] In this step, magnetorheological polishing technology is used to process the component to be processed according to each polishing angle in the polishing angle population, and the initial surface shape of the component to be processed at different polishing angles is obtained. Then, the difference between the initial surface shape corresponding to each polishing angle and the preset ideal surface shape is calculated to obtain the residual surface shape error.

[0040] Specifically, the residual surface error refers to the difference between the preset ideal surface shape and the surface shape of the component after processing. The residual surface error of the optical component indicates the degree of deviation between the processed component surface and the ideal surface, and is an important indicator to describe the processing accuracy of the optical component. During the magnetorheological polishing process, each processing point on the polishing path has its specific residual surface error value, which reflects the amount of material removal that needs to be corrected on the surface at that point. Therefore, the size of the residual surface error of the component directly determines the imaging quality and performance of the optical system.

[0041] Furthermore, after the initial surface shape of the component to be processed is obtained, the difference between the preset ideal surface shape and the initial surface shape is calculated to obtain the residual surface shape error of the component to be processed.

[0042] In some embodiments, the residual surface error of a component refers to the shape deviation error between the tested optical surface and the theoretical surface in the normal direction.

[0043] In some embodiments, Figure 3 As shown, the structural schematic diagram of processing the component to be processed by magnetorheological polishing technology includes the component to be processed (the partial area of ​​the optical component that needs to be processed), the polishing wheel used for processing, the polishing ribbon and the magnet, and the nozzle.

[0044] Specifically, after the component to be processed is processed by adjusting the polishing angle of the magnetorheological removal function, the shape information of the surface of the component to be processed is obtained by using high-precision measuring equipment, such as an interferometer, a profilometer or a three-dimensional scanner, to obtain the initial surface shape of the surface of the component to be processed, and then the difference between the actual height value and the ideal height value after processing at the corresponding polishing angle is calculated based on the initial surface shape and the pre-defined ideal surface shape, that is, the residual surface shape error.

[0045] In some embodiments, a white light interferometer is used to measure the full-aperture surface error of the component to be processed, and then the spiral processing angle is adjusted based on the surface error characteristics to improve the shaping capability.

[0046] Furthermore, for the non-rotationally symmetric magnetorheological polishing removal function, as Figure 4As shown, after rotating the polishing angles of 0°, 5°, 10°, and 15°, the magnetorheological polishing removal function is Fourier transformed to convert it into a spectrum form (the removal function cannot eliminate the frequency band whose spectrum is lower than the dotted line in the figure). It can be clearly seen that there are differences in the cultivation ability of the magnetorheological removal function at different polishing angles.

[0047] Therefore, the magnetorheological removal function at different spiral angles will show different shaping capabilities and change with the angle of spiral rotation. Moreover, different rotation angles can also expand the correction range of low-frequency errors to different degrees, thereby enhancing the shaping ability of the magnetorheological removal function.

[0048] Furthermore, if Figure 5 As shown, Indicates the polishing angle of all processing points on the first transverse path, including the Processing point, The processing point and processing points, etc. Indicates the polishing angle of all processing points on the second transverse path, including the Processing point, The processing point and During the entire magnetorheological polishing process of the component to be processed, along with the spiral processing, there are multiple processing points with different polishing angles, each processing point corresponds to a polishing angle, and the removal effects produced by different polishing angles are also different.

[0049] Specifically, the removal function describes the ability of the polishing tool to remove material from the surface of the processing element at a specific position. It is affected by multiple process parameters, such as the speed of the polishing wheel, the pressure depth, the viscosity of the polishing fluid, the flow rate, etc. Among them, the polishing angle of the removal function is a key factor in adjusting the polishing ability. Therefore, by adjusting the polishing angle of the removal function corresponding to each processing point, the surface shape correction ability in different directions can be enhanced.

[0050] In some embodiments, the step S120 of calculating the magnetorheological removal function to process the residual surface error of the component to be processed according to each polishing angle in the polishing angle population includes the following steps S210 to S220: Step S210, obtaining a magnetorheological removal function to obtain an initial surface shape of the component to be processed according to the polishing angle; Step S220: Calculate the residual surface shape error based on the initial surface shape and the preset ideal surface shape.

[0051] In this embodiment, the removal function describes the ability distribution of the magnetorheological polishing technology to remove material from the surface of the component to be processed under specific conditions (such as a specific polishing angle). When rotating different polishing angles, the polishing angle affects the contact mode and position of the magnetorheological polishing ribbon with the component to be processed, changing the position and degree of material removal, so the removal function will also change accordingly.

[0052] Therefore, it is necessary to select the optimal polishing angle to adjust the removal function according to the residual surface error of the component to be processed. The modified capability spectrum is a transformation or analysis method of the removal function, which is used to more intuitively represent the material removal capability under different frequency components. It can help understand the performance of the removal function at different spatial frequencies, that is, which frequency components are more likely to be removed or retained.

[0053] Specifically, in the magnetorheological polishing process, the polishing angle is an important parameter, which affects the way the magnetorheological fluid contacts the workpiece surface and the material removal mode. Different polishing angles will result in different removal function characteristics. According to the selected polishing angle, the corresponding magnetorheological removal function is obtained. The removal function describes the removal characteristics of the magnetorheological fluid on the workpiece surface material under specific conditions (such as indentation depth, polishing angle, etc.). These characteristics include but are not limited to the full width at half maximum, removal rate, and the ability to process the minimum spatial periodic structure.

[0054] After processing the component to be processed according to each polishing angle, the actual surface shape data of the component to be processed is measured. This information is usually obtained using precision measuring equipment such as interferometers.

[0055] The actual surface shape number measured is compared with the preset ideal surface shape, and the difference between the two is the residual surface shape error. Among them, the preset ideal surface shape refers to the target surface shape determined in advance based on the preset ideal surface shape, that is, the best surface shape state to be achieved. For continuous phase elements (CPP), this may involve specific energy distribution requirements, such as flat top, steep edge and no sidelobe characteristics.

[0056] In some embodiments, the calculation of the magnetorheological removal function in step S120 to process the residual surface error and the polishing ability spectrum of the component to be processed according to each polishing angle in the polishing angle population includes the following steps S310 to S330: Step S310, obtaining a first removal function after the magnetorheological removal function is rotated by a polishing angle; Step S320, performing a two-dimensional Fourier transform on the first removal function to obtain a corresponding spectrum; Step S330: intercept the frequency band amplitude of the spectrum within the preset spatial frequency range to obtain the training ability spectrum of the first removal function.

[0057] In this embodiment, the first removal function after the removal function is rotated and polished at an angle is first obtained. In magnetorheological polishing technology, the removal function describes the distribution of the ability of the polishing tool to remove the material on the surface of the component to be processed, and the removal function usually depends on the position and direction of the polishing wheel. Therefore, the first removal function corresponding to the polishing angle can be obtained by adjusting the direction of the removal function to match the angle change of the polishing wheel relative to the component to be processed during the actual processing.

[0058] Furthermore, the first removal function is converted from the spatial domain to the frequency domain through Fourier transform analysis, and then by analyzing the components of the first removal function at different frequencies, it can be decomposed into different frequency components, thereby obtaining a frequency spectrum diagram representing the amplitude of the first removal function at different frequencies, showing the intensity of each frequency component in the first removal function.

[0059] Furthermore, the frequency band amplitude of the spectrum within the preset spatial frequency range is intercepted to obtain the training ability of the first removal function, that is, the ability spectrum of the first removal function to correct the surface of the component to be processed within a specific frequency range, which reflects the effectiveness and mode of action of the removal function at these frequencies, provides a basis for judging the evaluation and optimization of the polishing angle, and ensures the best processing effect.

[0060] Specifically, the training ability is a transformation or analysis method of the removal function, which is used to more intuitively represent the material removal ability under different frequency components. It can help understand the performance of the removal function at different spatial frequencies, that is, which frequency components are more likely to be removed or retained.

[0061] In some embodiments, the frequency band amplitude of the frequency spectrum within a preset spatial frequency range is intercepted to obtain the training ability spectrum of the first removal function, including: ; ; ; in, The magnetorheological polishing angle is The removal function when is the residence time of magnetorheological polishing, for The frequency amplitude after two-dimensional Fourier transform is The polishing angle representing the removal function is The ability to modify shapes when for The amplitude of .

[0062] Step S130, based on the residual surface error and training ability spectrum of each polishing angle, cross-mutate the polishing angle population to obtain the next generation population, and perform cyclic iteration until the preset iteration conditions are met to obtain the optimal polishing angle; for each polishing angle in the polishing angle population in the iteration, execute: calculate the residual surface error corresponding to the component to be processed according to the polishing angle processed by the magnetorheological removal function, and obtain the residual surface error root mean square of the corresponding polishing angle according to the residual surface error.

[0063] In this step, the corresponding residual surface error root mean square is calculated according to the residual surface error and the practice ability spectrum of each polishing angle, and then based on the residual surface error root mean square and the practice ability spectrum of each polishing angle, the polishing angle population is cross-mutated to obtain the next generation population, and cyclic iteration is performed until the preset iteration conditions are met to obtain the optimal polishing angle.

[0064] Specifically, according to the training ability spectrum of each polishing angle, combined with the residual surface shape error corresponding to the magnetorheological removal function, the removal function is selected in the population iteration to determine the excellent individual. For each polishing angle, the polishing effect at the polishing angle is evaluated in combination with its corresponding training ability spectrum and residual surface shape error. Preferably, based on the training ability spectrum of each polishing angle, according to the surface shape error characteristics (minimum spatial period, modulation depth, etc.) of the component to be processed, the optimal polishing angle is selected to adjust the removal function.

[0065] Furthermore, it is determined whether the excellent individuals of the current population meet the preset iteration conditions. If not, the magnetorheological polishing population is cross-mutated to obtain the next generation population, and it is iterated repeatedly until the preset iteration conditions are met to obtain the optimal individual, that is, the optimal polishing angle, wherein the preset iteration conditions include: the current iteration number is greater than or equal to the preset maximum iteration number, or the root mean square of the residual surface error of the magnetorheological removal function corresponding to the polishing angle is less than or equal to the preset minimum threshold.

[0066] In some embodiments, firstly, according to the shaping capability spectrum of each polishing angle of the current polishing angle population and the residual surface error of the component, a more appropriate removal function is selected, and its corresponding polishing angle is determined to construct an initial population and perform genetic calculation to optimize the polishing angle.

[0067] Furthermore, by simulating the surface shape after polishing, the root mean square value of the residual surface error is calculated as the criterion for evaluating the pros and cons of the current polishing angle, so as to systematically evaluate the influence of different spiral polishing angles on the final processing, and provide a scientific basis for optimizing the magnetorheological polishing process parameters, which not only helps to improve the processing accuracy, but also enhances the stability and controllability of the process.

[0068] Specifically, the surface shape difference between the etched surface shape of the component simulation result and the preset ideal surface shape is calculated at each polishing angle to obtain the residual surface shape error, and then the corresponding residual error root mean square is calculated based on the residual surface shape error. The optimal polishing angle is determined based on the residual error root mean square, so as to achieve more precise control of the magnetorheological polishing process, thereby improving processing accuracy and efficiency.

[0069] In some embodiments, the magnetorheological removal function for any processing point on the path of the magnetorheological polishing element is defined as: ,in, represents the horizontal coordinate of the magnetorheological polishing processing point in the plane coordinate system, represents the ordinate of the magnetorheological polishing processing point in the plane coordinate system. When the spiral rotation angle is When the magnetorheological removal function of the magnetorheological polishing processing point becomes: ; Furthermore, the surface shape of the magnetorheological polishing processing point can be expressed as: ; Among them, the material removal of magnetorheological machining satisfies the removal function and residence time Two-dimensional convolution, that is: ; Furthermore, the shaping ability of the removal function can be expressed as: ; in, ; To remove the function The two-dimensional Fourier transform of for Frequency amplitude after 2D Fourier transform.

[0070] In some embodiments, two individuals are randomly selected from the current polishing angle population, and part of the gene information is exchanged in a certain way (such as single-point crossover, multi-point crossover or uniform crossover) to generate new individuals. Some polishing angles in the newly generated individuals are slightly adjusted to increase population diversity and avoid falling into a local optimal solution. Through the above crossover and mutation operations, a new polishing angle population is generated, and then according to the preset iteration conditions, it is determined whether the current polishing angle population has excellent individuals that meet the conditions, and whether to continue the cyclic iteration.

[0071] Furthermore, if the current polishing angle population has an excellent individual that meets the conditions, the iteration is terminated to obtain the optimal individual, that is, the optimal polishing angle. Otherwise, the crossover mutation operation is repeated. Each iteration will generate a new generation of population based on the results of the previous generation, and for each polishing angle in the current population, in the actual or simulated magnetorheological polishing process, after adjusting the removal function of the corresponding polishing angle, the root mean square of the residual surface error of the surface of the component to be processed is calculated to evaluate the performance of each generation of population and redetermine its iterative results.

[0072] In some embodiments, the smaller the root mean square value of the residual surface error is, the higher the adaptability is, which can effectively find the optimal polishing angle in a complex optimization space and improve the effect of magnetorheological polishing.

[0073] In some embodiments, a removal vector is defined Indicates that the removal function is located at the magnetorheological polishing processing point When , the material removal capacity of all surface error control points is , then the removal efficiency at any surface error control point is: ; in, Represents the removal function for different polishing angles at different locations.

[0074] Furthermore, when the surface error control point is outside the removal function, Define the removal matrix for: ; Furthermore, the material removal of the surface error is the sum of the product of the unit material removal of each surface error control point and the dwell time. Therefore, the process of solving the dwell time becomes the inverse problem of solving the large sparse matrix equations below, namely: ; Furthermore, the theoretical residual machining error of magnetorheological spiral polishing is shown as follows: ; in, To preset the ideal face shape, is the dwell time, To remove the matrix, is the residual surface error.

[0075] Furthermore, the calculation formula of the residual surface error corresponding to any polishing angle is: ; ; ; in, To preset the ideal face shape, is the residence time of magnetorheological polishing, Indicates the magnetorheological polishing angle is The removal function when is the removal matrix of the removal function, is the residual surface error.

[0076] In some embodiments, in step S130, based on the residual surface error and the training ability spectrum of each polishing angle, the polishing angle population is cross-mutated to obtain the next generation population, including the following steps S410 to S430: Step S410, calculating the corresponding residual surface shape error root mean square according to the residual surface shape error of each polishing angle; Step S420, determining excellent individuals in the polishing angle population according to the residual surface shape error root mean square and the training ability spectrum; Step S430: cross-mutate the polishing angle population according to the excellent individuals to obtain the next generation population.

[0077] In this embodiment, for each polishing angle, the residual surface error is calculated according to the difference between the actual measured component surface shape and the preset ideal surface shape, and then the residual surface error root mean square (RMS) is calculated based on its corresponding residual surface error distribution.

[0078] Furthermore, according to the residual surface error RMS and cultivation ability spectrum of each polishing angle, the best performing individual (i.e., the polishing angle configuration with the lowest RMS value) is selected from the current population to perform crossover mutation on the polishing angle population according to the excellent individuals to obtain the next generation population.

[0079] Specifically, by randomly selecting two excellent individuals, exchanging some of their features (such as different polishing angles or indentation depth settings), generating new individuals, and applying small random changes to the newly generated individuals (such as fine-tuning a certain polishing angle), more possibilities can be explored in the search space, increasing the diversity of the population, and preventing premature convergence to the local optimal solution, thereby forming the next generation of population until the preset termination conditions are met (such as reaching a predetermined number of iterations or finding a sufficiently low residual surface error root mean square).

[0080] Furthermore, by evaluating the processing effect under each polishing angle configuration (i.e. calculating the RMS of the residual surface error), and selecting excellent individuals for genetic operations (crossover and mutation) based on this, the polishing angle parameters are gradually optimized, aiming to reduce the residual surface error and improve the processing accuracy of the continuous phase element (CPP). This not only ensures that the optimal polishing angle can be effectively evaluated and selected during the iterative optimization process, but also provides effective technical support for the realization of high-quality optical component manufacturing, improves the controllability and flexibility of the processing process, achieves the best magnetorheological polishing effect, and significantly improves the surface quality of the workpiece.

[0081] In some embodiments, several initial polishing angles are first defined, their variation ranges and constraints are determined, and an initial population (angle) of the genetic algorithm is established. Then, based on the linear equation method, the initial population is brought in to calculate the root mean square (RMS) of the surface shape error after magnetorheological polishing correction.

[0082] Furthermore, the residual surface root mean square of the component to be processed is calculated. If the current iteration number gen is greater than or equal to the maximum iteration number max_gen, or when the residual error accuracy tor of the component to be processed is less than or equal to the minimum threshold min_tor, the genetic iteration is terminated. Otherwise, the genetically excellent individuals are selected according to the residual surface root mean square, the population is crossover and mutation operations are performed, the number of iterations is increased, and the step "Based on the linear equation method, the initial population is brought in to calculate the surface error root mean square (RMS) after magnetorheological polishing correction, and the residual surface shape (the surface shape error is obtained by subtracting the preset ideal surface shape)" is returned to continue iterative calculation, and finally the optimal polishing angle combination is obtained, so as to improve its shaping ability by adjusting the polishing angle of the removal function, so as to adapt to the complex surface shape distribution of the continuous phase component surface and achieve higher processing accuracy.

[0083] In some embodiments, a polishing angle population of a magnetorheological removal function is constructed, the polishing angle population includes a plurality of randomly generated polishing angles, and the magnetorheological removal function is formed by the contact between a magnetorheological polishing ribbon and the element to be processed; the magnetorheological removal function is calculated to process the residual surface error and the cultivation capability spectrum of the element to be processed according to each polishing angle in the polishing angle population; based on the residual surface error and the cultivation capability spectrum of each polishing angle, the polishing angle population is cross-mutated to obtain the next generation population, and it is iterated cyclically until the preset iteration conditions are met to obtain the optimal polishing angle; for each polishing angle in the polishing angle population in the iteration, the following is executed: the residual surface error corresponding to the element to be processed according to the polishing angle processed by the magnetorheological removal function is calculated, and the residual surface error root mean square of the corresponding polishing angle is obtained according to the residual surface error, and the shaping capability of the magnetorheological polishing technology can be improved by adjusting the polishing angle of the removal function.

[0084] like Figure 6As shown, some embodiments of the present application provide a system for calculating a magnetorheological polishing angle, the system comprising a construction module 610, a calculation module 620, and an iteration module 630, specifically: A construction module 610 is used to construct a polishing angle population of a magnetorheological removal function, wherein the polishing angle population includes a plurality of randomly generated polishing angles, and the magnetorheological removal function is formed when a magnetorheological polishing ribbon contacts a component to be processed; A calculation module 620, for calculating a residual surface shape error and a polishing ability spectrum of a component to be processed by a magnetorheological removal function according to each polishing angle in the polishing angle population; Iteration module 630, for performing crossover mutation on the polishing angle population based on the residual surface error and the training ability spectrum of each polishing angle to obtain the next generation population, and performing cyclic iteration until a preset iteration condition is met to obtain the optimal polishing angle; For each polishing angle in the polishing angle population in the iteration, the following is performed: calculating the residual surface error corresponding to the component to be processed by the magnetorheological removal function according to the polishing angle, and obtaining the residual surface error root mean square of the corresponding polishing angle according to the residual surface error.

[0085] In some implementations, the calculation module 620 may include: obtaining the magnetorheological removal function to obtain an initial surface shape of the component to be processed according to the polishing angle.

[0086] In some implementations, the calculation module 620 may include: calculating a residual surface shape error according to an initial surface shape and a preset ideal surface shape.

[0087] In some implementations, the calculation module 620 may include: obtaining a first removal function after the magnetorheological removal function is rotated by a polishing angle.

[0088] In some implementations, the calculation module 620 may include: performing a two-dimensional Fourier transform on the first removal function to obtain a corresponding frequency spectrum.

[0089] In some implementations, the calculation module 620 may include: intercepting the frequency band amplitude of the spectrum within a preset spatial frequency range to obtain the training power spectrum of the first removal function.

[0090] In some implementations, the iteration module 630 may include: calculating a corresponding residual surface error root mean square according to the residual surface error at each polishing angle.

[0091] In some implementations, the iteration module 630 may include: determining excellent individuals in the polishing angle population according to the residual surface shape error root mean square and the training ability spectrum.

[0092] In some implementations, the iteration module 630 may include: performing crossover mutation on the polishing angle population according to excellent individuals to obtain a next generation population.

[0093] In some embodiments, the iteration module 630 may include: the current iteration number is greater than or equal to a preset maximum iteration number, or the root mean square of the residual surface error of the magnetorheological removal function corresponding to the polishing angle is less than or equal to a preset minimum threshold.

[0094] In some implementations, the iteration module 630 may include: ; ; ; in, To preset the ideal face shape, is the residence time of magnetorheological polishing, Indicates the magnetorheological polishing angle is The removal function when is the removal matrix of the removal function, is the residual surface error.

[0095] In some implementations, the iteration module 630 may include: ; ; ; in, The magnetorheological polishing angle is The removal function when is the residence time of magnetorheological polishing, for The frequency amplitude after two-dimensional Fourier transform is The polishing angle representing the removal function is The ability to modify shapes when for The amplitude of .

[0096] It should be noted that the magnetorheological polishing angle calculation system provided in this embodiment and the above-mentioned magnetorheological polishing angle calculation method are based on the same inventive concept. Therefore, the relevant content of the above-mentioned magnetorheological polishing angle calculation method is also applicable to the content of the magnetorheological polishing angle calculation system. Therefore, it will not be repeated here.

[0097] In order to achieve this, the system constructs a polishing angle population of the magnetorheological removal function, which includes a plurality of randomly generated polishing angles; calculates the residual surface shape error and the cultivation capability spectrum of the component to be processed according to each polishing angle in the polishing angle population by the magnetorheological removal function; cross-mutates the polishing angle population based on the residual surface shape error and the cultivation capability spectrum of each polishing angle to obtain the next generation population, and performs cyclic iteration until the preset iteration conditions are met to obtain the optimal polishing angle; for each polishing angle in the polishing angle population during the iteration, executes: calculates the residual surface shape error corresponding to the component to be processed according to the polishing angle processed by the magnetorheological removal function, and obtains the residual surface shape error root mean square of the corresponding polishing angle according to the residual surface shape error. In this way, the shaping capability of the magnetorheological polishing technology can be improved by adjusting the polishing angle of the removal function.

[0098] An embodiment of the present application also provides an electronic device, which includes a memory and a processor. The memory stores a computer program, and the processor implements the above-mentioned method for calculating the magnetorheological polishing angle when executing the computer program.

[0099] like Figure 7 , Figure 7 A schematic diagram of the hardware structure of an electronic device provided in an embodiment of the present application, wherein the electronic device includes: At least one battery; at least one memory; at least one processor; at least one program; The program is stored in the memory, and the processor executes at least one program to implement the above-mentioned method for calculating the magnetorheological polishing angle in the present disclosure.

[0100] The electronic device may be any intelligent terminal including a mobile phone, a tablet computer, a personal digital assistant (PDA), a vehicle-mounted computer, etc.

[0101] The electronic device according to the embodiment of the present application is described in detail below.

[0102] The processor 1600 may be implemented by a general-purpose central processing unit (CPU), a microprocessor, an application-specific integrated circuit (ASIC), or one or more integrated circuits, and is used to execute relevant programs to implement the technical solutions provided in the embodiments of the present disclosure; The memory 1700 can be implemented in the form of a read-only memory (ROM), a static storage device, a dynamic storage device, or a random access memory (RAM). The memory 1700 can store an operating system and other application programs. When the technical solution provided in the embodiment of this specification is implemented by software or firmware, the relevant program code is stored in the memory 1700, and the processor 1600 calls and executes a method for calculating a magnetorheological polishing angle in the embodiment of the present disclosure.

[0103] Input / output interface 1800, used to implement information input and output; Communication interface 1900, used to realize communication interaction between the device and other devices, which can be realized through wired mode (such as USB, network cable, etc.) or wireless mode (such as mobile network, WIFI, Bluetooth, etc.); Bus 2000 , which transmits information between various components of the device (e.g., processor 1600 , memory 1700 , input / output interface 1800 , and communication interface 1900 ); The processor 1600 , the memory 1700 , the input / output interface 1800 , and the communication interface 1900 are connected to each other in communication within the device via the bus 2000 .

[0104] The embodiment of the present disclosure also provides a storage medium, which is a computer-readable storage medium. The computer-readable storage medium stores computer-executable instructions, and the computer-executable instructions are used to enable a computer to execute the above-mentioned method for calculating the magnetorheological polishing angle.

[0105] The memory, as a non-transient computer-readable storage medium, can be used to store non-transient software programs and non-transient computer executable programs. In addition, the memory may include a high-speed random access memory, and may also include a non-transient memory, such as at least one disk storage device, a flash memory device, or other non-transient solid-state storage device. In some embodiments, the memory may optionally include a memory remotely disposed relative to the processor, and these remote memories may be connected to the processor via a network. Examples of the above-mentioned network include, but are not limited to, the Internet, an intranet, a local area network, a mobile communication network, and combinations thereof.

[0106] The embodiments described in the embodiments of the present disclosure are intended to more clearly illustrate the technical solutions of the embodiments of the present disclosure and do not constitute a limitation on the technical solutions provided by the embodiments of the present disclosure. Those skilled in the art will appreciate that with the evolution of technology and the emergence of new application scenarios, the technical solutions provided by the embodiments of the present disclosure are also applicable to similar technical problems.

[0107] Those skilled in the art will appreciate that the technical solutions shown in the figures do not limit the embodiments of the present disclosure and may include more or fewer steps than shown in the figures, or a combination of certain steps, or different steps.

[0108] The device embodiments described above are merely illustrative, and the units described as separate components may or may not be physically separated, that is, they may be located in one place or distributed on multiple network units. Some or all of the modules may be selected according to actual needs to achieve the purpose of the solution of this embodiment.

[0109] Those skilled in the art will appreciate that all or some of the steps in the methods disclosed above, and the functional modules / units in the systems and devices may be implemented as software, firmware, hardware, or a suitable combination thereof.

[0110] The terms "first", "second", "third", "fourth", etc. (if any) in the specification of the present application and the above-mentioned drawings are used to distinguish similar objects, and are not necessarily used to describe a specific order or sequence. It should be understood that the data used in this way can be interchangeable where appropriate, so that the embodiments of the present application described herein can be implemented in an order other than those illustrated or described herein. In addition, the terms "including" and "having" and any of their variations are intended to cover non-exclusive inclusions, for example, a process, method, system, product or device comprising a series of steps or units is not necessarily limited to those steps or units clearly listed, but may include other steps or units that are not clearly listed or inherent to these processes, methods, products or devices.

[0111] It should be understood that in the present application, "at least one (item)" means one or more, and "plurality" means two or more. "And / or" is used to describe the association relationship of associated objects, indicating that three relationships may exist. For example, "A and / or B" can mean: only A exists, only B exists, and A and B exist at the same time, where A and B can be singular or plural. The character " / " generally indicates that the objects associated before and after are in an "or" relationship. "At least one of the following" or similar expressions refers to any combination of these items, including any combination of single or plural items. For example, at least one of a, b or c can mean: a, b, c, "a and b", "a and c", "b and c", or "a and b and c", where a, b, c can be single or multiple.

[0112] In the several embodiments provided in the present application, it should be understood that the disclosed devices and methods can be implemented in other ways. For example, the device embodiments described above are only schematic. For example, the division of units is only a logical function division. There may be other division methods in actual implementation, such as multiple units or components can be combined or integrated into another system, or some features can be ignored or not executed. Another point is that the mutual coupling or direct coupling or communication connection shown or discussed can be through some interfaces, indirect coupling or communication connection of devices or units, which can be electrical, mechanical or other forms.

[0113] The units described as separate components may or may not be physically separated, and the components shown as units may or may not be physical units, that is, they may be located in one place or distributed on multiple network units. Some or all of the units may be selected according to actual needs to achieve the purpose of the solution of this embodiment.

[0114] In addition, each functional unit in each embodiment of the present application may be integrated into one processing unit, or each unit may exist physically separately, or two or more units may be integrated into one unit. The above-mentioned integrated unit may be implemented in the form of hardware or in the form of software functional units.

[0115] If the integrated unit is implemented in the form of a software functional unit and sold or used as an independent product, it can be stored in a computer-readable storage medium. Based on this understanding, the technical solution of the present application is essentially or the part that contributes to the prior art or all or part of the technical solution can be embodied in the form of a software product, and the computer software product is stored in a storage medium, including multiple instructions to enable an electronic device (which can be a personal computer, server, or network device, etc.) to perform all or part of the steps of each embodiment method of the present application. The aforementioned storage medium includes: U disk, mobile hard disk, read-only memory (Read-Only Memory, ROM), random access memory (Random Access Memory, RAM), disk or optical disk and other media that can store programs.

[0116] The above is a specific description of the preferred implementation of the embodiments of the present application, but the embodiments of the present application are not limited to the above-mentioned implementation methods. Technical personnel familiar with the field can also make various equivalent modifications or substitutions without violating the spirit of the embodiments of the present application. These equivalent modifications or substitutions are all included in the scope defined by the claims of the embodiments of the present application.

[0117] The embodiments of the present application are described in detail above in conjunction with the accompanying drawings, but the present application is not limited to the above embodiments. Various changes can be made within the knowledge scope of ordinary technicians in the relevant technical field without departing from the purpose of the present application.

Claims

1. A method for calculating a magnetorheological polishing angle, characterized in that: The method comprises: Constructing a polishing angle population of a magnetorheological removal function, wherein the polishing angle population includes a plurality of randomly generated polishing angles, and the magnetorheological removal function is formed when a magnetorheological polishing ribbon contacts a component to be processed; Calculating the residual surface error and the polishing ability spectrum of the component to be processed by the magnetorheological removal function according to each polishing angle in the polishing angle population; Based on the residual surface error and the training ability spectrum of each polishing angle, the polishing angle population is cross-mutated to obtain the next generation population, and iterates cyclically until the preset iteration conditions are met to obtain the optimal polishing angle; For each polishing angle in the polishing angle population in the iteration, executing: calculating the residual surface error corresponding to the component to be processed by the magnetorheological removal function according to the polishing angle, and obtaining the residual surface error root mean square of the corresponding polishing angle according to the residual surface error.

2. The method for calculating the magnetorheological polishing angle according to claim 1, characterized in that: The step of calculating the residual surface shape error of the component to be processed by the magnetorheological removal function according to each polishing angle in the polishing angle population includes: Obtaining the initial surface shape of the component to be processed by the magnetorheological removal function according to the polishing angle; The residual surface shape error is obtained by calculation according to the initial surface shape and a preset ideal surface shape.

3. The method for calculating the magnetorheological polishing angle according to claim 2, characterized in that: The step of calculating the residual surface shape error and the polishing ability spectrum of the magnetorheological removal function for processing the component to be processed according to each polishing angle in the polishing angle population includes: Obtaining a first removal function after the magnetorheological removal function is rotated by the polishing angle; Performing a two-dimensional Fourier transform on the first removal function to obtain a corresponding frequency spectrum; The frequency band amplitude of the frequency spectrum within a preset spatial frequency range is intercepted to obtain the training ability spectrum of the first removal function.

4. The method for calculating the magnetorheological polishing angle according to claim 1, characterized in that: The polishing angle population is cross-mutated based on the residual surface error and the training ability spectrum of each polishing angle to obtain the next generation population, including: Calculate the corresponding residual surface error root mean square according to the residual surface error of each polishing angle; Determining excellent individuals in the polishing angle population according to the residual surface shape error root mean square and the practice ability spectrum; The polishing angle population is cross-mutated according to the excellent individuals to obtain the next generation population.

5. The method for calculating the magnetorheological polishing angle according to claim 4, characterized in that: The preset iteration condition includes: the current iteration number is greater than or equal to the preset maximum iteration number, or the root mean square of the residual surface error of the magnetorheological removal function corresponding to the polishing angle is less than or equal to the preset minimum threshold.

6. The method for calculating the magnetorheological polishing angle according to claim 2, characterized in that: The calculation formula of the residual surface error includes: ； ； ； in, is the preset ideal surface shape, is the residence time of magnetorheological polishing, Indicates the magnetorheological polishing angle is The removal function when is the removal matrix of the removal function, is the residual surface error.

7. The method for calculating the magnetorheological polishing angle according to claim 3, characterized in that: The calculation formula for intercepting the frequency band amplitude of the spectrum within the preset spatial frequency range to obtain the training ability spectrum of the first removal function includes: ； ； ； in, The magnetorheological polishing angle is The removal function when is the residence time of magnetorheological polishing, for The frequency amplitude after two-dimensional Fourier transform is The polishing angle representing the removal function is The ability to modify shapes when for The amplitude of .

8. A system for calculating magnetorheological polishing angle, characterized in that: The system comprises: A construction module, used to construct a polishing angle population of a magnetorheological removal function, wherein the polishing angle population includes a plurality of randomly generated polishing angles, and the magnetorheological removal function is formed when a magnetorheological polishing ribbon contacts a component to be processed; A calculation module, used for calculating the residual surface error and the polishing ability spectrum of the component to be processed by the magnetorheological removal function according to each polishing angle in the polishing angle population; An iteration module, for performing crossover mutation on the polishing angle population based on the residual surface error and the training ability spectrum of each polishing angle to obtain the next generation population, and performing cyclic iteration until a preset iteration condition is met to obtain the optimal polishing angle; For each polishing angle in the polishing angle population in the iteration, executing: calculating the residual surface error corresponding to the component to be processed by the magnetorheological removal function according to the polishing angle, and obtaining the residual surface error root mean square of the corresponding polishing angle according to the residual surface error.

9. An electronic device, characterized in that: It includes at least one control processor and a memory for communicating with the at least one control processor; the memory stores instructions that can be executed by the at least one control processor, and the instructions are executed by the at least one control processor so that the at least one control processor can execute a method for calculating a magnetorheological polishing angle as described in any one of claims 1 to 7.

10. A computer-readable storage medium, characterized in that: The computer-readable storage medium stores computer-executable instructions, and the computer-executable instructions are used to enable a computer to execute the method for calculating a magnetorheological polishing angle according to any one of claims 1 to 7.

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