A worktable of an ion beam etching machine

Abstract

The application discloses a workbench of an ion beam etching machine, which comprises a vacuum cavity, a motion module, a scanning trolley and a vacuum pumping assembly; the vacuum cavity is connected with the vacuum pumping assembly to form a high-vacuum environment inside the vacuum cavity; the scanning trolley is arranged in the vacuum cavity and is used for carrying a workpiece to perform film plating; the motion module is arranged outside a lateral portion of the vacuum cavity and penetrates through a lateral wall of the vacuum cavity, is connected with the scanning trolley and drives the scanning trolley to reciprocate in the vacuum cavity; an ion beam inlet is arranged at the top of the vacuum cavity, a correction plate is arranged below the ion beam inlet, the scanning trolley reciprocates below the correction plate, an ion beam is injected onto the workpiece of the scanning trolley after sequentially flowing through the ion beam inlet and a slot of the correction plate, and the slot width of the correction plate is adjustable to realize ion beam flow amount adjustment. The application has the characteristics of compact structure, simple operation, stable operation and high automation degree, and significantly improves the quality of workpiece film plating.

Description

TECHNICAL FIELD

[0001] The application belongs to the technical field of ion beam etching equipment, and particularly relates to a worktable of an ion beam etching machine. BACKGROUND

[0002] In the ion etching process, the ion beam cannot form a completely uniform beam due to the influence of flatness and perpendicularity. In addition, the inner side of the workpiece is less disturbed, which easily causes the film thickness of the inner side of the workpiece to be greater than that of the outer side, thereby affecting the product yield. In order to improve the film uniformity of the workpiece, a worktable is arranged in the ion etching equipment to adjust the etching angle of the workpiece. Meanwhile, when facing a complex workpiece, the etching range needs to be selectively controlled by adjusting the inclination angle of the worktable. It can be seen that the worktable is a key component of the ion beam etching equipment.

[0003] At present, in order to achieve the purpose of controlling the beam and selectively etching the workpiece, a deflection magnetic field or electric field can be added below the ion source. Meanwhile, in order to improve the etching effect of the side of the complex workpiece, a rotating motor mechanism can be used to drive the worktable to turn. However, the above two methods not only have high cost, but also cannot simultaneously adjust the beam of different regions according to the actual film thickness on the workpiece by using the deflection magnetic field or electric field to realize the beam control. SUMMARY

[0004] The technical problem to be solved by the application is to solve the problems of ion beam control and etching of the side of the workpiece, and to provide a worktable of an ion beam etching machine which is compact in structure, simple in operation, stable in running and high in automation.

[0005] To achieve the above-mentioned purpose, the application can adopt the following technical solutions:

[0006] A worktable of an ion beam etching machine comprises a vacuum cavity, a motion module, a scanning trolley and a vacuum pumping assembly. The vacuum cavity is connected with the vacuum pumping assembly to form a high-vacuum environment inside the vacuum cavity. The scanning trolley is arranged in the vacuum cavity to carry a workpiece for film coating. The motion module is arranged outside the vacuum cavity and penetrates through the side wall of the vacuum cavity, and is connected with the scanning trolley to drive the scanning trolley to reciprocate in the vacuum cavity. An ion beam inlet is arranged at the top of the vacuum cavity, and a correction plate is arranged below the ion beam inlet. The scanning trolley reciprocates below the correction plate. The ion beam flows through the ion beam inlet and the slot of the correction plate in sequence and then is injected onto the workpiece of the scanning trolley. The slot width of the correction plate is adjustable to adjust the ion beam flow amount.

[0007] As a further improvement of the application, the scanning trolley comprises a top plate and a base, the top plate is used to carry the workpiece, the two sides of the top plate are connected with the base through adjusting plates respectively, the adjusting plates are used to adjust the included angle between the top plate and the base, and then adjust the film coating angle of the workpiece; the base is provided with a pulley on the side, the vacuum cavity is provided with a sliding rail matched with the pulley at the bottom, and the base is connected with a motion module; under the driving of the motion module, the base drives the top plate and the workpiece to reciprocate along the sliding rail.

[0008] As a further improvement of the application, the adjusting plate is provided with an arc-shaped groove, the arc-shaped groove is matched with the fastener on the side of the top plate, so as to realize the adjustment of the inclination angle of the top plate.

[0009] As a further improvement of the application, the motion module comprises a driving motor and a chain wheel transmission assembly, the chain wheel transmission assembly is connected with the driving motor and the base respectively, under the driving of the driving motor, the chain wheel transmission assembly drives the scanning trolley to reciprocate along the sliding rail.

[0010] As a further improvement of the application, the chain wheel transmission assembly comprises a driving gear, a first driven gear and a second driven gear, the driving gear and the first driven gear are arranged at the two ends of the side wall of the vacuum cavity respectively, the second driven gear is arranged on the side of the base, the driving gear is connected with the output end of the driving motor and the first driven gear through a chain respectively, and the first driven gear is connected with the second driven gear through a chain; the driving motor drives the driving gear to rotate forward or reverse, and then drives the first driven gear and the second driven gear to rotate forward or reverse, so as to realize the reciprocating movement of the scanning trolley along the sliding rail.

[0011] As a further improvement of the application, the side of the vacuum cavity is provided with a cavity door, the workpiece enters or exits the vacuum cavity through the cavity door.

[0012] As a further improvement of the application, the inside top of the vacuum cavity is provided with a mounting bracket, the mounting bracket is opposite to the ion beam inlet, and the mounting bracket is used to mount a correction plate.

[0013] As a further improvement of the application, the vacuum assembly comprises a vacuum pipeline, the vacuum pipeline is arranged at the bottom of the vacuum cavity and connected with an external mechanical pump, so as to realize the vacuumization of the vacuum cavity to 20±2Pa.

[0014] As a further improvement of the application, the vacuum assembly further comprises a molecular pump, the molecular pump is connected with the bottom of the vacuum cavity; after the mechanical pump completes the vacuumization, the molecular pump continues to vacuumize the vacuum cavity.

[0015] As a further improvement of the application, a plug valve is arranged between the molecular pump and the vacuum cavity.

[0016] As a further improvement of the present application, the vacuum cavity side wall is provided with a circulating cooling waterway.

[0017] Compared with the prior art, the present application has the advantages that:

[0018] 1、The worktable of the ion beam etching machine, by setting the scanning trolley in the vacuum cavity, using the scanning trolley to carry the workpiece for coating; At the same time, the motion module is also arranged through the side of the vacuum cavity, and connected with the scanning trolley, using the motion module to drive the scanning trolley to reciprocate in the vacuum cavity, that is, the workpiece is realized to move freely in the vacuum cavity, and the coating thickness of the workpiece surface is realized to be accurately controlled; Further, the correction plate is arranged below the ion beam inlet at the top of the vacuum cavity, by adjusting the width of the correction plate slot, the ion beam flow amount is realized to be adjusted, the purpose of controlling the uniformity of the beam is achieved, and the workpiece coating quality is improved.

[0019] 2、The worktable of the ion beam etching machine, by setting the adjusting plate with the arc-shaped slot between the top plate of the scanning trolley and the base, by changing the installation position of the top plate in the arc-shaped slot, the top plate is realized to be inclined; For the workpiece with special requirements, the effect of etching the side surface of the workpiece is achieved by inclining the scanning trolley. BRIEF DESCRIPTION OF DRAWINGS

[0020] Figure 1 It is a three-dimensional structure principle schematic view of the worktable of the ion beam etching machine in the embodiment of the present application;

[0021] Figure 2 It is a three-dimensional structure principle schematic view of the worktable of the ion beam etching machine in the embodiment of the present application;

[0022] Figure 3 It is a three-dimensional structure principle schematic view of the worktable of the ion beam etching machine in the embodiment of the present application;

[0023] Figure 4 It is a three-dimensional structure principle schematic view of the worktable of the ion beam etching machine in the embodiment of the present application;

[0024] Figure 5 It is a three-dimensional structure principle schematic view of the worktable of the ion beam etching machine in the embodiment of the present application;

[0025] Legend: 1, vacuum cavity; 2, movement module; 3, driving motor; 4, molecular pump; 5, vacuum pipeline; 6, plug valve; 7, cavity door; 8, scanning trolley; 9, pulley; 10, slide rail; 11, driving gear; 12, first driven gear; 13, second driven gear; 14, correction plate; 15, adjusting plate; 16, ion beam inlet; 17, notch; 18, top plate; 19, base; 20, arc-shaped groove; 21, mounting bracket. DETAILED DESCRIPTION

[0026] The application will be further described below in conjunction with the accompanying drawings and specific preferred embodiments, but the protection scope of the application is not limited by this.

[0027] In the description of the application, it should be understood that the orientation or positional relationship indicated by the terms "side", "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like are based on the orientation or positional relationship shown in the drawings, and are only for the purpose of facilitating the description of the application and simplifying the description, and therefore cannot be understood as indicating or implying that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as limiting the application.

[0028] In addition, the terms "first" and "second" are only for the purpose of description, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the technical features referred to, so that the features with "first" and "second" can explicitly or implicitly include one or more of the features, and in the description of the application, the meaning of "multiple" is two or more, unless otherwise explicitly and specifically limited.

[0029] EMBODIMENT

[0030] As Figure 1 , Figure 3 and Figure 4As shown, the workbench of the ion beam etching machine of the present application comprises a vacuum cavity 1, a motion module 2, a scanning trolley 8 and a vacuum pumping assembly. The vacuum cavity 1 is connected with the vacuum pumping assembly to realize the formation of a high-vacuum environment inside the vacuum cavity 1. The scanning trolley 8 is arranged in the vacuum cavity 1 to carry the workpiece for coating. The motion module 2 is arranged outside the vacuum cavity 1 and penetrates through the side wall of the vacuum cavity 1, and is connected with the scanning trolley 8 to drive the scanning trolley 8 to reciprocate in the vacuum cavity 1. The top of the vacuum cavity 1 is provided with an ion beam inlet 16, and a correction plate 14 is arranged below the ion beam inlet 16. The scanning trolley 8 reciprocates below the correction plate 14, and the ion beam is injected onto the workpiece of the scanning trolley 8 after sequentially flowing through the ion beam inlet 16 and the slot 17 of the correction plate 14. In order to cope with the situation that the ion beam flow is not uniform, resulting in the film thickness inside the workpiece being much higher than the film thickness outside, the width of the slot 17 of the correction plate 14 is adjustable to realize the adjustment of the ion beam flow amount. After testing the process, according to the actual situation, the installation position of the correction plate 14 in the vacuum cavity 1 is adjusted to adjust the area of the slot 17. The beam flow corresponding to the film thickness area on the workpiece is blocked by the correction plate 14 to reduce the corresponding beam flow amount, so as to achieve the purpose of controlling the beam flow and improve the uniformity of coating.

[0031] In this embodiment, the scanning trolley 8 is arranged in the vacuum cavity 1 to carry the workpiece for coating. At the same time, the motion module 2 is arranged through the side of the vacuum cavity 1 and connected with the scanning trolley 8 to drive the scanning trolley 8 to reciprocate in the vacuum cavity 1, so as to realize the free movement of the workpiece in the vacuum cavity 1 and accurately control the coating thickness of the workpiece surface. Further, the correction plate 14 is arranged below the ion beam inlet 16 at the top of the vacuum cavity 1. By adjusting the width of the slot 17 of the correction plate 14, the ion beam flow amount is adjusted to achieve the purpose of controlling the uniformity of the beam flow and improve the quality of the workpiece coating.

[0032] As shown in the Figure 5 scanning trolley 8 comprises a top plate 18 and a base 19. The top plate 18 is used to carry the workpiece, and the two sides of the top plate 18 are connected with the base 19 through the adjusting plate 15. The adjusting plate 15 is used to adjust the included angle between the top plate 18 and the base 19, so as to adjust the coating angle of the workpiece. The base 19 is provided with a pulley 9 on the side, and the vacuum cavity 1 is provided with a sliding rail 10 matched with the pulley 9 at the bottom. The base 19 is connected with the motion module 2. Under the driving of the motion module 2, the base 19 drives the top plate 18 and the workpiece to reciprocate along the sliding rail 10.

[0033] Further, the adjusting plate 15 is provided with an arc-shaped groove 20 which cooperates with the fastening screw on the side of the top plate 18 to realize the adjustment of the inclination angle of the top plate 18.

[0034] In this embodiment, by setting the adjusting plate 15 with the arc-shaped slot 20 between the top plate 18 of the scanning trolley 8 and the base 19, by changing the installation position of the top plate 18 in the arc-shaped slot 20, the inclination of the top plate 8 is realized; for the workpiece with special requirements, the side wall appearance of the workpiece is adjusted by inclining the top plate 8, and the etching range is selectively controlled to cope with the side etching of the complex workpiece.

[0035] As shown in Figure 2 , the motion module 2 includes a driving motor 3 and a chain wheel transmission assembly. The chain wheel transmission assembly is connected with the driving motor 3 and the base 19 respectively. Under the driving of the driving motor 3, the chain wheel transmission assembly drives the scanning trolley 8 to move back and forth along the slide rail 10. The chain wheel transmission has the characteristics of simple structure, accurate control and stable transmission, and realizes the stable movement of the scanning trolley 8 in the vacuum cavity 10.

[0036] As shown in Figure 2 , the chain wheel transmission assembly includes a driving gear 11, a first driven gear 12 and a second driven gear 13. The driving gear 11 and the first driven gear 12 are respectively arranged at both ends of the side wall of the vacuum cavity 1, and the second driven gear 13 is arranged at the side of the base 19. The driving gear 11 is connected with the output end of the driving motor 3 and the first driven gear 12 through a chain respectively, and the first driven gear 12 is connected with the second driven gear 13 through a chain. The driving motor 3 drives the driving gear 11 to rotate forward or reverse, and then drives the first driven gear 12 and the second driven gear 13 to rotate forward or reverse, so as to realize the reciprocating movement of the scanning trolley 8 along the slide rail 10.

[0037] As shown in Figure 2 , the side of the vacuum cavity 1 is provided with a cavity door 7, and the workpiece enters or exits the vacuum cavity 1 through the cavity door 7.

[0038] As shown in Figure 3 , the inside top of the vacuum cavity 1 is provided with a mounting bracket 21, and the mounting bracket 21 is opposite to the ion beam inlet 16. The mounting bracket 21 is used for mounting the correction plate 14.

[0039] As shown in Figure 1 and Figure 2 , the vacuum pumping assembly includes a vacuum pipeline 5 with a control valve. The vacuum pipeline 5 is arranged at the bottom of the vacuum cavity 1 and connected with an external mechanical pump to form a mechanical pump vacuum pipeline, so as to realize the vacuum pumping of the vacuum cavity 1 to 20±2Pa.

[0040] As shown in Figure 1As shown, the vacuum-pumping assembly further comprises a molecular pump 4 connected to the bottom of the vacuum chamber 1; a control valve is arranged at the connection between the vacuum pipeline 5 and the molecular pump 4, forming a molecular-pump vacuum pipeline. After the mechanical pump completes the vacuum pumping, the molecular pump 4 continues to pump the vacuum chamber 1, so as to realize that the interior of the vacuum chamber 1 reaches a limit vacuum state. After the process ends, the pressure is increased by inputting nitrogen gas.

[0041] Further, the molecular pump 4 and the vacuum chamber 1 are provided with a flashboard valve 6. The flashboard valve 6 controls the on-off connection between the molecular pump 4 and the vacuum chamber 1, which is simple to operate and has high sealing reliability.

[0042] In the embodiment, a circulating cooling water pipeline is arranged on the sidewall of the vacuum chamber 1, so as to realize the cooling of the vacuum chamber 1.

[0043] Although the present application is disclosed with the preferred embodiments, it is not intended to limit the present application. Any person skilled in the art, without departing from the spirit and technical scheme of the present application, can make many possible changes and modifications to the technical scheme of the present application by using the disclosed methods and technical contents, or modify equivalent embodiments. Therefore, any simple modification, equivalent replacement, equivalent change and modification made to the above embodiments according to the technical essence of the present application, without departing from the technical scheme of the present application, still belongs to the protection scope of the technical scheme of the present application.

Claims

1. A worktable for an ion beam etching machine, characterized in that, The system includes a vacuum chamber (1), a motion module (2), a scanning carriage (8), and a vacuum pumping assembly. The vacuum chamber (1) is connected to the vacuum pumping assembly to create a high vacuum environment inside the vacuum chamber (1). The scanning carriage (8) is located inside the vacuum chamber (1) to carry the workpiece for coating. The motion module (2) is located on the outer side of the vacuum chamber (1) and penetrates the side wall of the vacuum chamber (1), connecting to the scanning carriage (8) to drive the scanning carriage (8) in a high vacuum environment. The vacuum chamber (1) moves back and forth inside the cavity (1); the top of the vacuum chamber (1) is provided with an ion beam inlet (16), and a correction plate (14) is provided below the ion beam inlet (16). The scanning carriage (8) moves back and forth below the correction plate (14). The ion beam flows through the ion beam inlet (16) and the slot (17) of the correction plate (14) in sequence and is injected into the workpiece of the scanning carriage (8). The width of the slot (17) of the correction plate (14) is adjustable to realize the adjustment of the ion beam flow rate.

2. The worktable of the ion beam etching machine according to claim 1, characterized in that, The scanning trolley (8) includes a top plate (18) and a base (19). The top plate (18) is used to carry the workpiece. The two sides of the top plate (18) are connected to the base (19) through adjustment plates (15). The adjustment plates (15) are used to adjust the angle between the top plate (18) and the base (19), thereby adjusting the coating angle of the workpiece. The base (19) is provided with pulleys (9) on its side. The bottom of the vacuum chamber (1) is provided with a slide rail (10) that matches the pulleys (9). The base (19) is connected to the motion module (2). Under the drive of the motion module (2), the base (19) drives the top plate (18) and the workpiece to move back and forth along the slide rail (10).

3. The worktable of the ion beam etching machine according to claim 2, characterized in that, The adjustment plate (15) is provided with an arc groove (20), which cooperates with the fasteners on the side of the top plate (18) to realize the adjustment of the tilt angle of the top plate (18).

4. The worktable of the ion beam etching machine according to claim 2, characterized in that, The motion module (2) includes a drive motor (3) and a sprocket transmission assembly. The sprocket transmission assembly is connected to the drive motor (3) and the base (19) respectively. Under the drive of the drive motor (3), the sprocket transmission assembly drives the scanning carriage (8) to move back and forth along the slide rail (10).

5. The worktable of the ion beam etching machine according to claim 4, characterized in that, The sprocket drive assembly includes a drive gear (11), a first driven gear (12), and a second driven gear (13). The drive gear (11) and the first driven gear (12) are respectively located at both ends of the side wall of the vacuum chamber (1), and the second driven gear (13) is located on the side of the base (19). The drive gear (11) is connected to the output end of the drive motor (3) and the first driven gear (12) via a chain. The first driven gear (12) is connected to the second driven gear (13) via a chain. The drive motor (3) drives the drive gear (11) to rotate forward or backward, thereby driving the first driven gear (12) and the second driven gear (13) to rotate forward or backward, so as to realize the scanning carriage (8) reciprocating along the slide rail (10).

6. The stage of the ion beam etching machine according to any one of claims 1 to 5, characterized in that, The vacuum chamber (1) is provided with a door (7) on its side, through which the workpiece enters and exits the vacuum chamber (1).

7. The stage of the ion beam etching machine according to any one of claims 1 to 5, characterized in that, The vacuum chamber (1) is provided with a mounting bracket (21) on the top of its inner side. The mounting bracket (21) is directly opposite the ion beam inlet (16) and is used to mount the correction plate (14).

8. The stage of the ion beam etching machine according to any one of claims 1 to 5, characterized in that, The vacuum assembly includes a vacuum line (5), which is located at the bottom of the vacuum chamber (1) and connected to an external mechanical pump to achieve a vacuum of 20±2Pa inside the vacuum chamber (1).

9. The worktable of the ion beam etching machine according to claim 8, characterized in that, The vacuum pumping assembly also includes a molecular pump (4), which is connected to the bottom of the vacuum chamber (1). After the mechanical pump completes the vacuuming, the molecular pump (4) continues to evacuate the vacuum chamber (1).

10. The worktable of the ion beam etching machine according to claim 9, characterized in that, A gate valve (6) is provided between the molecular pump (4) and the vacuum chamber (1).

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