Integrated digital power supply and control system of industrial gas ion implanter

Abstract

The invention discloses an integrated digital power supply of an industrial gas ion implanter and a control system, the integrated digital power supply comprises a low-potential power supply and a high-potential power supply, and the high-potential power supply comprises a filament power supply, an arc power supply and a lead-out power supply; the low-potential power supply comprises an acceleration power supply and a suppression power supply; the low-potential power supply and the high-potential power supply are integrated together; the integrated digital power supply provides all required energy for the ion implanter through a transformer isolation and power supply two-stage series connection mode. According to the invention, the integrated digital power supply of the 100kV gas ion implanter is coordinated and stable in operation, the strong ignition state is automatically recovered, the localization rate is improved while the high yield and stable operation are realized, and the small digital power supply and control system which is simple in structure, easy to operate and high in integration is realized.

Description

Technical Field

[0001] The invention relates to the technical field of supporting power supplies for industrial gas ion implanters, and in particular to an integrated digital power supply and control system for industrial gas ion implanters. Background Art

[0002] Ion implantation technology is a method to precisely control the surface and interface properties of materials. It has become an important research tool for modifying materials such as metal materials, ceramic materials, insulating materials, and polymer materials. Industrial gas ion implanters have outstanding application effects in improving the anti-friction, anti-fatigue, anti-corrosion, and anti-oxidation properties of material surfaces, and have broad application prospects. However, slight changes in the ion source structure, electrode material properties, gas pressure conditions, and discharge voltage of the ion implanter will lead to different discharge results. Its supporting power supply and its control system are also important parameters, which have a direct impact on the system's operating stability, dose control, energy control, and the final process yield and final effect.

[0003] The industrial gas ion implanter first supplies the required gas (commonly used are hydrogen, argon, etc.), and then heats the tungsten filament through the filament power supply to emit thermal electrons, which bombard the gas to produce plasma. The arc power supply provides an electric field to extract the electrons of the plasma. The positive gas ions are introduced into the acceleration field provided by the acceleration power supply through the electric field provided by the extraction power supply, and are accelerated to the target material to the required energy. The high-energy particles accelerated by the acceleration tube react with the target surface and also generate a large number of secondary electrons. These electrons will even return to the inside of the ion source while affecting the target reaction, causing pollution to the ion source and seriously affecting the working performance. Therefore, there is also a negative suppression power supply after the acceleration system to provide a reverse electric field to suppress the backflow and pollute the inside of the source.

[0004] The operation of industrial gas ion implanters requires multiple sets of power supplies to work together, most of which are imported power supplies. The traditional power supply uses multiple independent power supplies, and each power supply is controlled by PLC. The structure is complex, and the coordination and timeliness are not high. In addition, the supporting power supply and control system of traditional gas ion implanters have low digitalization and automation, low stability, and are easily affected by high-voltage ignition. In addition, the gas flow rate of the gas ion implanter during the plasma discharge process will affect the density and temperature of the plasma, which plays a vital role in the final process injection volume. The gas supply of the traditional gas ion implanter is a fixed value, and the gas volume required for arcing and later stable operation in the implanter source is different. Therefore, manual intervention and setting are required during operation, and the operation is complicated.

[0005] When the industrial gas ion implanter is operated for the first time at the source, or when there is sedimentation pollution in the source, high-voltage sparks often occur. Sometimes, continuous oscillation sparks occur after a large spark. During high-voltage ignition, the system operation is complicated, which is a test for both the ion source and the power supply. Traditional industrial gas ion implanters often paralyze equipment operation due to high-voltage ignition, source damage or power supply damage. Traditional protection often shuts down the output and stops operation immediately when sparks occur, and then restarts the equipment.

[0006] In view of this, this application is hereby filed. Summary of the invention

[0007] The purpose of the present invention is to provide an integrated digital power supply and control system for an industrial gas ion implanter. By designing the structure, circuit and control of the integrated digital power supply and control system of a 100kV industrial gas ion implanter used for material modification, the integrated digital power supply of the 100kV gas ion implanter can be coordinated and operated stably, and the strong ignition state can be recovered autonomously. The high yield rate and stable operation can be achieved while the localization rate is increased, and a small digital power supply and control system with a simple structure, easy operation and high integration can be realized.

[0008] The present invention is achieved through the following technical solutions:

[0009] In the first aspect, the present invention provides an integrated digital power supply for an industrial gas ion implanter, which includes a low potential power supply and a high potential power supply, and the low potential power supply and the high potential power supply are integrated together; the integrated digital power supply provides all the required energy for the ion implanter through transformer isolation and two-stage series connection of the power supply.

[0010] Further, the high potential power supply includes a 20A filament power supply, a 200V adjustable arc power supply and a 2kV adjustable extraction power supply;

[0011] The low potential power supply includes a 100kV adjustable accelerating power supply and a 2kV adjustable suppressing power supply.

[0012] Furthermore, the ground potential of the 100kV adjustable accelerating power supply is used as the ground potential of the entire system, the 2kV adjustable suppression power supply is a negative potential, i.e. -2kV, and the 20A filament power supply, 200V adjustable arc power supply, and 2kV adjustable extraction power supply are connected in series at the positive end of the 100kV adjustable accelerating power supply, i.e., the filament power supply is above 100kV and up to 127kV, the adjustable arc power supply is 100.2kV, and the adjustable extraction power supply is 102kV.

[0013] Furthermore, the high potential power supply includes a shared isolation transformer, a soft start unit, a rectifier and an energy storage unit, the input end of the isolation transformer is connected to any two phases of the three-phase bus, the output end of the isolation transformer is connected to the soft start unit, the soft start unit is connected to the rectifier, and the rectifier is connected to the energy storage unit;

[0014] The 20A filament power supply, 200V adjustable arc power supply and 2kV adjustable extraction power supply share the energy in the energy storage unit; the 20A filament power supply and the 200V adjustable arc power supply are each subjected to voltage regulation and inversion through a half-bridge, and then pass through a transformer with a corresponding transformation ratio and are rectified and filtered for output; the 2kV adjustable extraction power supply is subjected to voltage regulation through a buck circuit, and then passes through a transformer and is rectified for output after being inverted through a half-bridge.

[0015] Further, the low potential power supply includes a shared three-phase Vienna rectifier circuit;

[0016] The 100kV adjustable accelerating power source passes through the three-phase Vienna rectifier circuit and then is sent to the high-voltage transformer after full-bridge inversion. The voltage from the high-voltage transformer is then boosted twice through the voltage doubling rectifier circuit.

[0017] The positive output of the 2kV adjustable suppression power supply is connected to the ground potential and the negative terminal of the high voltage output, and at the same time shares the three-phase Vienna rectifier circuit of the high voltage power supply;

[0018] Among them, the 100kV adjustable acceleration power supply and the 2kV adjustable suppression power supply can share the power supply control, and the power supply control is also reduced from two to one.

[0019] In a second aspect, the present invention further provides a control system for an integrated digital power supply of an industrial gas ion implanter, the control system comprising:

[0020] The high potential control subsystem is used to receive the first master control value sent by the master control subsystem, the first master control value includes the filament control value, the arc control value, the lead control value and the gas flow control value; receive the first alarm signal and the first operating state sent by the low potential control subsystem; and control the high potential output according to the first master control value and the first operating state;

[0021] The low potential control subsystem is used to receive the second master control value sent by the master control subsystem, the second master control value includes a high voltage control value, a suppression control value and an injection dosage control value; receive the second alarm signal and the second operating state sent by the high potential control subsystem, and control the low potential output according to the second master control value and the second operating state of the high potential filament power supply, arc power supply and extraction power supply;

[0022] As a safe on-site system, the main control subsystem is connected to the high-potential control subsystem and the low-potential control subsystem through optical fiber. It is responsible for human-machine interaction, high and low potential power supply control, and emergency control.

[0023] Further, controlling the high potential output according to the first master control value and the operating state includes:

[0024] When the operating states sent by the low-potential control subsystem to the high-potential control subsystem are all normal, the high-potential control subsystem controls the filament power supply output current, arc power supply output voltage, lead-out power supply output voltage and gas flow value according to the first master control value;

[0025] When the dose accumulation of the low-potential control subsystem is completed or there is an abnormality and protection is sent to high potential, the high-potential control subsystem will reject the first master control value and gradually shut down the high-potential power supply in the order of first turning off the filament power supply, then the arc power supply, and then the lead-out power supply.

[0026] Further, controlling the low potential output according to the second master control value and the second operating state of the high potential filament power supply, the arc power supply and the extraction power supply includes:

[0027] When the operating states sent by the high-potential control subsystem to the low-potential control subsystem are all normal, the low-potential control subsystem controls the output voltage of the acceleration power supply according to the second master control value, and suppresses the output voltage of the power supply and the injection dose;

[0028] When the high-potential control subsystem is abnormal and the protection is sent to high potential, the high-potential control subsystem will reject the second master control value and quickly turn off the acceleration power supply first and then the inhibition sequence to gradually shut down the low-potential power supply. This approach can avoid the high-potential power supply from having a greater risk of overshoot due to load dumping when the high-potential power supply is abnormal.

[0029] Furthermore, the master control subsystem can be placed at a long distance, away from the high voltage and radiation environment of the implanter; at the same time, the master control subsystem also has the function of emergency forced shutdown of the ion implanter power supply and even emergency power supply to the power supply equipment.

[0030] Furthermore, the control system is provided with an ignition protection mechanism, which includes:

[0031] The low potential control subsystem calculates the voltage and current slopes of acceleration and suppression by detecting the acceleration voltage and current and the suppression voltage and current of the ion source;

[0032] And based on the empirical value, the voltage and current conditions at the same time are analyzed to determine whether there is sparking, short circuit or other abnormalities inside the ion source of the particle implanter, and immediately notify the high-voltage control subsystem;

[0033] If sparks occur inside the ion source of the particle implanter, the low-potential control subsystem calculates the output voltage drop value according to the calculated voltage and current according to the proportional coefficient, quickly reduces the output voltage of the acceleration power supply to the calculated voltage value, and then adjusts the high-voltage output rising speed according to the drop value and the drop ratio to gradually increase it to the set value;

[0034] At the same time, the high-voltage control subsystem receives the ignition notification from the low-voltage control subsystem, and adjusts the gas supply proportionally according to the accelerated current slope to temporarily reduce the plasma concentration inside the ion source, so that the high-voltage rising speed matches the plasma concentration in the ion source to avoid secondary ignition.

[0035] Compared with the prior art, the present invention has the following advantages and beneficial effects:

[0036] 1. The integrated digital power supply and control system of the industrial gas ion implanter of the present invention realizes the coordinated and stable operation of the integrated digital power supply of the 100kV industrial gas ion implanter used for material modification, realizes the autonomous recovery of the strong ignition state, realizes high yield and stable operation while improving the localization rate, and realizes a small digital power supply and control system with simple structure, easy operation and high integration.

[0037] 2. The integrated digital power supply and control system of the industrial gas ion implanter of the present invention also proposes an ignition protection mechanism, which can effectively reduce secondary ignition, avoid multiple ignitions, protect the equipment, and at the same time reduce the impact of ignition inside the entire source, thereby enhancing stability. BRIEF DESCRIPTION OF THE DRAWINGS

[0038] The drawings described herein are used to provide a further understanding of the embodiments of the present invention, constitute a part of this application, and do not constitute a limitation of the embodiments of the present invention. In the drawings:

[0039] Figure 1 It is a structural block diagram of the integrated digital power supply of the industrial gas ion implanter of the present invention;

[0040] Figure 2 This is a power supply schematic diagram of the industrial gas ion implanter of the present invention;

[0041] Figure 3 This is a control system architecture diagram of the industrial gas ion implanter of the present invention;

[0042] Figure 4 It is a flow chart of the ignition protection mechanism of the present invention. DETAILED DESCRIPTION

[0043] Hereinafter, the term "include" or "may include" used in various embodiments of the present invention indicates the presence of the invented function, operation or element, and does not limit the addition of one or more functions, operations or elements. In addition, as used in various embodiments of the present invention, the terms "include", "have" and their cognates are intended only to indicate specific features, numbers, steps, operations, elements, components or combinations of the foregoing items, and should not be understood as first excluding the presence of one or more other features, numbers, steps, operations, elements, components or combinations of the foregoing items or the possibility of adding one or more features, numbers, steps, operations, elements, components or combinations of the foregoing items.

[0044] In various embodiments of the present invention, the expression "or" or "at least one of A or / and B" includes any combination or all combinations of the words listed at the same time. For example, the expression "A or B" or "at least one of A or / and B" may include A, may include B, or may include both A and B.

[0045] The expressions (such as "first", "second", etc.) used in various embodiments of the present invention may modify the various constituent elements in various embodiments, but may not limit the corresponding constituent elements. For example, the above expressions do not limit the order and / or importance of the elements. The above expressions are only used for the purpose of distinguishing an element from other elements. For example, the first user device and the second user device indicate different user devices, although both are user devices. For example, without departing from the scope of various embodiments of the present invention, the first element may be referred to as the second element, and similarly, the second element may also be referred to as the first element.

[0046] It should be noted that if it is described that one component element is “connected” to another component element, the first component element may be directly connected to the second component element, and a third component element may be “connected” between the first component element and the second component element. Conversely, when one component element is “directly connected” to another component element, it can be understood that there is no third component element between the first component element and the second component element.

[0047] The terms used in various embodiments of the present invention are only used for the purpose of describing specific embodiments and are not intended to limit various embodiments of the present invention. As used herein, the singular form is intended to also include the plural form, unless the context clearly indicates otherwise. Unless otherwise limited, all terms used here (including technical terms and scientific terms) have the same meaning as the meaning generally understood by those of ordinary skill in the art to which the various embodiments of the present invention belong. The terms (such as the terms defined in the dictionary generally used) will be interpreted as having the same meaning as the contextual meaning in the relevant technical field and will not be interpreted as having an idealized meaning or an overly formal meaning, unless clearly defined in various embodiments of the present invention.

[0048] In order to make the objectives, technical solutions and advantages of the present invention more clearly understood, the present invention is further described in detail below in conjunction with embodiments and drawings. The exemplary embodiments of the present invention and their description are only used to explain the present invention and are not intended to limit the present invention.

[0049] Example 1

[0050] like Figure 1 As shown, the present invention proposes an integrated digital power supply for an industrial gas ion implanter, namely Figure 1 Power supply for gas ion implanter.

[0051] The integrated digital power supply includes a low potential power supply and a high potential power supply, wherein the high potential power supply includes a filament power supply, an arc power supply and an extraction power supply; the low potential power supply includes an acceleration power supply and a suppression power supply; all the above low potential power supplies and high potential power supplies are integrated together, and all the required energy is provided to the ion implanter through transformer isolation and two-stage series connection of the power supply.

[0052] In this embodiment, the high potential power supply includes a 20A filament power supply, a 200V adjustable arc power supply and a 2kV adjustable extraction power supply; the low potential power supply includes a 100kV adjustable acceleration power supply and a 2kV adjustable suppression power supply.

[0053] In this embodiment, the ground potential of the 100kV adjustable accelerating power supply is used as the ground potential of the entire system, the 2kV adjustable suppression power supply is a negative potential, i.e. -2kV, and the 20A filament power supply, the 200V adjustable arc power supply, and the 2kV adjustable extraction power supply are connected in series to the positive end of the 100kV adjustable accelerating power supply, i.e., the filament power supply is above 100kV and up to 127kV, the adjustable arc power supply is 100.2kV, and the adjustable extraction power supply is 102kV.

[0054] The input of the filament power supply, arc power supply and extraction power supply at high potential is isolated by a high voltage isolation transformer and the potential is placed above the acceleration potential. The output energy of all power supplies can achieve a control accuracy of 1‰.

[0055] like Figure 2 As shown, Figure 2 for Figure 1The main circuit part of the power supply of the gas ion implanter, that is, the power supply principle of the industrial gas ion implanter. Among them, T1~T7 are isolation transformers; SS is a soft start circuit (i.e., soft start unit) to prevent the energy storage capacitors C1 and C2 from charging too quickly when closing the switch; BR1~BR5 are rectifier bridge circuits to convert industrial frequency AC input into DC; HB1~HB4 are half-bridge inverter circuits to convert DC into high-frequency AC; L1 and C3, L2 and C4, L3 and C5, L4 and C6, L5 and C7, L6 and C11 are LC filter circuits, and R2, R3 and C9 form a crowbar spark protection circuit. The filament, arc and input part of the lead-out power supply at high potential share an isolation transformer, a soft start unit, a rectifier and an energy storage unit, that is, the high potential power supply includes a shared isolation transformer, a soft start unit, a rectifier and an energy storage unit, the input end of the isolation transformer is connected to any two phases of the three-phase bus, the output end of the isolation transformer is connected to the soft start unit, the soft start unit is connected to the rectifier, and the rectifier is connected to the energy storage unit;

[0056] The AC input provides AC power for the high-potential filament power supply, arc power supply, and extraction power supply through a high-voltage isolation transformer. The input AC power is filtered by a rectifier bridge to provide the front-stage DC power for the arc power supply and filament power supply. The filament power supply controls the output pulse through IGBT and diode, and the output pulse passes through the transformer to finally generate a filament current of 20A. The 200V arc power supply consists of an auxiliary arc power supply and a main output. The auxiliary arc starting circuit provides sufficient voltage at the moment when the arc pulse is turned on so that the source can start the arc more easily. After the arc starts, the auxiliary arc starting circuit exits, and the required arc current energy is provided by the main output. The front stage of the main output realizes voltage regulation through a full-bridge IGBT. The extraction power supply is a DC output with a maximum current of 20mA, that is, the output requirements can be achieved by using a small-power IGBT. The extraction power supply structure is mainly an ACDC-DCDC structure. The power of the acceleration power supply at the ground potential is the largest. The three-phase bus input of the acceleration and suppression power supply at a low potential is passed through the same three-phase Vienna circuit to improve the power factor. The front stage ACDC of the 100kV acceleration power supply uses a three-phase Vienna circuit to achieve a high power factor of the AC-DC rectifier circuit. Through the DC capacitor voltage in the three-phase Vienna circuit, the reactive power is circulated between the load and the capacitor, reducing the impact of the power supply on the power grid and realizing the utilization of energy. The voltage from the three-phase Vienna circuit is then sent to the transformer through the IGBT full-bridge inverter to increase the voltage to 8kV, and this voltage is then increased to 100kV through the voltage doubler rectifier. In order to make the voltage doubler rectifier part small in size and with sufficient voltage resistance, this part of the circuit is placed in an insulating oil barrel. The latter stage achieves 100kV output through a transformer and voltage doubler output. The structural principle of the suppression power supply is the same as that of the lead-out power supply.

[0057] The acceleration power supply is then sent to the high-voltage transformer after full-bridge inversion. The voltage from the high-voltage transformer is then boosted by a voltage doubling rectifier circuit to reach 100kV. This method can reduce the voltage transformation requirements for the transformer, reduce the size of the transformer and make it easy to implement. At the same time, the stability of the high-voltage power supply is also high. The front-stage adjustment part and the vulnerable IGBT part are all before the transformer isolation, reducing the impact of high voltage. The positive output of the suppression power supply is connected to the ground potential and connected to the negative end of the high-voltage output. At the same time, the three-phase Vienna rectifier circuit of the high-voltage power supply is shared, which saves the front stage of the suppression. The circuit structure is much simpler than a single suppression power supply. The acceleration and suppression power supplies can share the power supply control, and the power supply control is reduced from two to one. The potential of the filament power supply, arc power supply and extraction power supply is above the acceleration power supply. Therefore, the three power supplies need to be connected to the power supply bus through a high-voltage isolation transformer. In order to avoid the impact current and air switch tripping of the energy storage unit (energy storage capacitor) when the three high-potential power supplies are powered on, the power supply bus after isolation through the air switch is added with a thyristor and a parallel resistor, and then rectified by the rectifier module to the energy storage capacitor. The three power supplies share the energy on the energy storage capacitor. The filament power supply and arc power supply are each regulated and inverted by a half-bridge, and then rectified and filtered by a transformer with a corresponding ratio. The extraction power supply is regulated by a buck circuit, and then rectified by a transformer after a half-bridge inversion. The output energy of all power supplies can achieve a control accuracy of 1‰.

[0058] Example 2

[0059] like Figure 3 As shown, the difference between this embodiment and embodiment 1 is that this embodiment provides an integrated digital power supply control system for an industrial gas ion implanter, and the control system includes:

[0060] The control system consists of two power sub-controls and a master control. The two sub-power controls are a high-voltage control subsystem mounted on 100kV and a low-voltage control subsystem that controls high voltage and suppression. The two control systems are mutually coordinated and locked, and the master control is responsible for the human-machine interaction of the sub-power control and vacuum control.

[0061] Since the filament power supply, arc power supply, extraction power supply and gas flow control are based on 100kV high voltage, these three power supplies and gas flow control are completed by the high-potential control subsystem, the acceleration power supply, suppression power supply and discharge rod are completed by the low-potential control subsystem, and the low-potential control subsystem also needs to complete the discharge rod control. The high and low potential control subsystems communicate through optical fiber signals. There is also a general control subsystem, which is the human-machine remote general control subsystem. The general control subsystem communicates with the high-potential control subsystem and the low-potential control subsystem through optical fiber. At the same time, the general control subsystem needs to vacuum control the power supply. The details are as follows:

[0062] The high potential control subsystem (high potential power supply control) is used to receive the first master control value sent by the general control subsystem, the first master control value includes the filament control value, the arc control value, the lead-out control value and the gas flow control value; receive the first alarm signal and the first operating status sent by the low potential control subsystem; control the high potential output according to the first master control value and the first operating status, when the operating status sent by the low potential control subsystem to the high potential control subsystem is normal, the high potential control subsystem controls the filament power supply output current, the arc power supply output voltage, the lead-out power supply output voltage and the gas flow value according to the first master control value; when the dosage accumulation of the low potential control subsystem is completed or there is an abnormality and the protection is sent to the high potential, the high potential control subsystem will reject the first master control value and gradually shut down the high potential power supply in the order of first turning off the filament power supply, then the arc power supply and then the lead-out power supply.

[0063] The low-potential control subsystem (low-potential power supply control) is used to receive the second master control value sent by the master control subsystem, the second master control value includes a high-voltage control value, a suppression control value and an injection dose control value; receive the second alarm signal and the second operating state sent by the high-potential control subsystem, and control the low-potential output according to the second master control value and the second operating state of the high-potential filament power supply, arc power supply and lead-out power supply. When the operating states sent by the high-potential control subsystem to the low-potential control subsystem are all normal, the low-potential control subsystem controls the acceleration power supply output voltage, the suppression power supply output voltage and the injection dose according to the second master control value; when the high-potential control subsystem is abnormal and the protection is sent to a high potential, the high-potential control subsystem will reject the second master control value and quickly turn off the acceleration power supply first and then the suppression power supply in sequence to gradually shut down the low-potential power supply. This approach can avoid the high-potential power supply from generating a greater risk of overshoot due to load dumping when the high-potential power supply is abnormal.

[0064] The master control subsystem (man-machine master control) is a safe local system responsible for man-machine interaction, high and low potential power supply control and emergency control. The master control subsystem is a grounded weak current safety system, which can safely conduct man-machine interaction and interact with high and low potential control subsystems in a high voltage potential environment. Because the master control subsystem is connected to the high potential control subsystem and the low potential control subsystem through optical fiber, the master control subsystem can be placed at a long distance, away from the high voltage and radiation environment of the implanter; at the same time, the master control subsystem also has the function of emergency forced shutdown of the ion implanter power supply and even emergency power supply equipment. This connection method makes all power supplies highly coordinated and automated.

[0065] In the above technical scheme, the main functions of the high-voltage control subsystem are as follows: (1) self-checking the various states of the filament power supply, arc power supply and extraction power supply and being able to perform corresponding protection actions. (2) monitoring the voltage and current of the filament power supply and controlling the filament current to output according to the value required by the master control. (3) monitoring the voltage and current of the arc power supply and providing the stable arc voltage required by the master control through the variable parameter PID closed loop control of the arc power supply front half-bridge IGBT. (4) controlling the arc power supply chopper IGBT so that the arc power supply outputs DC or pulse voltage according to the injection dose, and the output pulse width of the arc power supply is adjustable from 100us to DC. (5) when the implanter is running, the filament power supply and arc power supply lock the separate opening time to ensure that the source is not polluted by the independently running filament and arc. (6) monitoring the extraction voltage and current and controlling the extraction power supply full-bridge IGBT and BUCK circuit to output a stable DC extraction voltage. (7) counting the injection pulses after all the power supplies of the implanter are turned on, and the count value can be set to turn off the high-voltage power supply and notify the low-voltage power supply to shut down. (8) when the implanter is running, the gas flow in the source is controlled according to the arc starting degree and dosage requirements. (9) Communicate with the main control subsystem and the low-voltage control subsystem, and lock the operating status of the high-voltage filament, arc, and lead-out power supplies according to the operating status of the low-voltage power supply and the requirements of the main control. When the main control configuration system starts to operate, the high-voltage turns on the power supply in the order of first turning on the filament power supply, then turning on the arc power supply, then turning on the gas flow, and then turning on the lead-out. When the main control shuts down the system operation or the low-voltage control system sends an alarm or dosage completion status, the high-voltage control system exits the power operation in the order of first turning on the gas flow and filament power supply, and then turning off the arc power supply and the lead-out power supply.

[0066] The main functions of the low-voltage control subsystem are: (1) self-check the various states of the acceleration power supply and the suppression power supply and perform corresponding protection actions. (2) The low-voltage control subsystem communicates with the main control subsystem and the high-voltage control subsystem through light. The low-voltage acceleration and suppression power supplies are turned on according to the requirements of the main control. At the same time, when there is any abnormal state of the high voltage, the acceleration output can be locked with the high voltage in a switching sequence to ensure that when the high-voltage power supply fails and shuts down, the acceleration power supply needs to be quickly withdrawn to avoid excessive high voltage after the load is dumped. (3) Control the IGBT of the 100kV high-voltage output and the 2kV suppression power supply to output the value set by the host computer. (4) Detect the beam current and start and stop the power supply according to the set beam current value. (5) When all power supplies stop outputting, the total output needs to control the discharge rod to rise and release the high voltage of the power supply device.

[0067] Specifically, the control system is a fully isolated suspended power supply digital control system. The analog control has high real-time performance, but the analog controller is an analog device and hard-wired method. This method is susceptible to component aging and temperature drift, and this makes it difficult to modify or upgrade the design, and it is difficult to perform some algorithms. Digital control can implement complex algorithms to achieve the desired effect. Due to the characteristics of the source load of the ion implanter, high-voltage sparks are easily generated under high voltage conditions. When high-voltage sparks occur, the interference generated is very strong. Even a PLC that is recognized to be stable will be killed or even damaged by this high-voltage spark if the isolation is not done well. The digital control system of the power supply is even deeper in such an environment. Therefore, all signals output by the control core of the power supply are amplified and output through isolation, and the core small signal is in a suspended state.

[0068] As a further implementation, the control system is provided with an ignition protection mechanism. The control system can judge the ignition situation. The software adjusts and reduces the output high voltage of the acceleration power supply according to the severity of the ignition, and modifies the high voltage rising speed to match the high voltage rising speed with the plasma concentration in the source to avoid secondary ignition.

[0069] like Figure 4 As shown in FIG. 1 , the ignition protection mechanism specifically includes:

[0070] The low potential control subsystem calculates the voltage and current slopes of acceleration and suppression by detecting the acceleration voltage and current and the suppression voltage and current of the ion source;

[0071] And based on the empirical value, the voltage and current conditions at the same time are analyzed to determine whether there is sparking, short circuit or other abnormalities inside the ion source of the particle implanter, and immediately notify the high-voltage control subsystem;

[0072] If sparks occur inside the ion source of the particle implanter, the low-potential control subsystem calculates the output voltage drop value according to the calculated voltage and current according to the proportional coefficient, quickly reduces the output voltage of the acceleration power supply to the calculated voltage value, and then adjusts the high-voltage output rising speed according to the drop value and the drop ratio to gradually increase it to the set value;

[0073] At the same time, the high-voltage control subsystem receives the ignition notification from the low-voltage control subsystem, and adjusts the gas supply proportionally according to the accelerated current slope to temporarily reduce the plasma concentration inside the ion source, so that the high-voltage rising speed matches the plasma concentration in the ion source to avoid secondary ignition.

[0074] In the above technical solution, the high voltage part is the part that is prone to sparking inside the ion source. The traditional high voltage output method is prone to continuous sparking after a spark occurs, and continuous sparking is easy to damage the equipment. This invention adopts an ignition protection mechanism, which can effectively reduce secondary ignition, avoid multiple ignitions, protect the equipment, and at the same time reduce the impact of ignition inside the entire source, and enhance stability.

[0075] In the ion implanter system of the present invention, the supporting power supply of the ion implanter (i.e., the integrated digital power supply) and its control system directly affect the final process yield and final effect. By utilizing the present invention, the power supply system structure of the ion implanter can be made simpler, digitalized, intelligent and stable in operation, and the energy and current of the ion beam can be accurately controlled.

[0076] The specific implementation methods described above further illustrate the objectives, technical solutions and beneficial effects of the present invention in detail. It should be understood that the above description is only a specific implementation method of the present invention and is not intended to limit the scope of protection of the present invention. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the scope of protection of the present invention.

Claims

1. An integrated digital power supply for industrial gas ion implanters, characterized in that: The integrated digital power supply comprises a low potential power supply and a high potential power supply, which are integrated together; the integrated digital power supply provides all the energy required for the ion implanter through transformer isolation and two-stage series connection of power supplies.

2. The integrated digital power supply for industrial gas ion implanter according to claim 1, characterized in that: The high potential power supply includes a 20A filament power supply, a 200V adjustable arc power supply and a 2kV adjustable extraction power supply; The low potential power supply includes a 100 kV adjustable acceleration power supply and a 2 kV adjustable suppression power supply.

3. The integrated digital power supply for industrial gas ion implanter according to claim 2, characterized in that: The ground potential of the 100kV adjustable accelerating power supply is used as the ground potential of the entire system, the 2kV adjustable suppression power supply is a negative potential, i.e. -2kV, and the 20A filament power supply, 200V adjustable arc power supply, and 2kV adjustable extraction power supply are connected in series to the positive end of the 100kV adjustable accelerating power supply, i.e., the filament power supply is above 100kV and up to 127kV, the adjustable arc power supply is 100.2kV, and the adjustable extraction power supply is 102kV.

4. The integrated digital power supply for industrial gas ion implanter according to claim 2, characterized in that: The high potential power supply includes a shared isolation transformer, a soft start unit, a rectifier and an energy storage unit, the input end of the isolation transformer is connected to any two phases of the three-phase bus, the output end of the isolation transformer is connected to the soft start unit, the soft start unit is connected to the rectifier, and the rectifier is connected to the energy storage unit; The 20A filament power supply, the 200V adjustable arc power supply and the 2kV adjustable extraction power supply share the energy in the energy storage unit; the 20A filament power supply and the 200V adjustable arc power supply are each subjected to voltage regulation and inversion through a half-bridge, and then pass through a transformer with a corresponding transformation ratio and are rectified and filtered for output; the 2kV adjustable extraction power supply is subjected to voltage regulation through a buck circuit, and then passes through a transformer after half-bridge inversion and is rectified for output.

5. The integrated digital power supply for industrial gas ion implanter according to claim 2, characterized in that: The low potential power supply includes a shared three-phase Vienna rectifier circuit; The 100kV adjustable accelerating power source passes through the three-phase Vienna rectifier circuit and then is sent to the high-voltage transformer after full-bridge inversion. The voltage from the high-voltage transformer is then boosted twice through the voltage doubling rectifier circuit. The positive output of the 2kV adjustable suppression power supply is connected to the ground potential and the negative terminal of the high voltage output, and at the same time shares the three-phase Vienna rectifier circuit of the high voltage power supply; Among them, the 100kV adjustable acceleration power supply and the 2kV adjustable suppression power supply can be controlled by a common power supply.

6. The integrated digital power supply control system of an industrial gas ion implanter according to any one of claims 1 to 5, characterized in that: The control system includes: The high potential control subsystem is used to receive the first master control value sent by the master control subsystem, wherein the first master control value includes a filament control value, an arc control value, an extraction control value and a gas flow control value; receive the first alarm signal and the first operating state sent by the low potential control subsystem; and control the high potential output according to the first master control value and the first operating state; The low potential control subsystem is used to receive the second master control value sent by the master control subsystem, wherein the second master control value includes a high voltage control value, a suppression control value and an injection dosage control value; receive the second alarm signal and the second operating state sent by the high potential control subsystem, and control the low potential output according to the second master control value and the second operating state of the high potential filament power supply, arc power supply and extraction power supply; As a safe on-site system, the main control subsystem is connected to the high-potential control subsystem and the low-potential control subsystem through optical fiber. It is responsible for human-machine interaction, high and low potential power supply control, and emergency control.

7. The control system according to claim 6, characterized in that: Controlling the high potential output according to the first master control value and the operating state includes: When the operating states sent by the low-potential control subsystem to the high-potential control subsystem are all normal, the high-potential control subsystem controls the filament power supply output current, arc power supply output voltage, lead-out power supply output voltage and gas flow value according to the first master control value; When the dose accumulation of the low-potential control subsystem is completed or there is an abnormality and protection is sent to high potential, the high-potential control subsystem will reject the first master control value and gradually shut down the high-potential power supply in the order of first turning off the filament power supply, then the arc power supply, and then the lead-out power supply.

8. The control system according to claim 6, characterized in that: Controlling the low potential output according to the second master control value and the second operating state of the high potential filament power supply, the arc power supply and the extraction power supply includes: When the operating states sent by the high-potential control subsystem to the low-potential control subsystem are all normal, the low-potential control subsystem controls the output voltage of the acceleration power supply according to the second master control value, and suppresses the output voltage of the power supply and the injection dose; When the high-potential control subsystem is abnormal and the protection is sent to a high potential, the high-potential control subsystem will reject the second master control value and turn off the acceleration power supply first and then the inhibition power supply in sequence to gradually turn off the low-potential power supply.

9. The control system according to claim 6, characterized in that: The general control subsystem can be placed at a long distance, away from the high voltage and radiation environment of the implanter; meanwhile, the general control subsystem also has the function of emergency forced shutdown of the ion implanter power supply.

10. The control system according to claim 6, characterized in that: The control system is provided with an ignition protection mechanism, which includes: The low potential control subsystem calculates the voltage and current slopes of acceleration and suppression by detecting the acceleration voltage and current and the suppression voltage and current of the ion source; And based on the empirical value, the voltage and current conditions at the same time are analyzed to determine whether there is sparking, short circuit or other abnormalities inside the ion source of the particle implanter, and immediately notify the high-voltage control subsystem; If sparks occur inside the ion source of the particle implanter, the low-potential control subsystem calculates the output voltage drop value according to the calculated voltage and current according to the proportional coefficient, reduces the output voltage of the acceleration power supply to the calculated voltage value, and then adjusts the high-voltage output rising speed according to the drop ratio to gradually increase it to the set value; At the same time, the high-voltage control subsystem receives the ignition notification from the low-voltage control subsystem, and adjusts the gas supply proportionally according to the accelerated current slope to temporarily reduce the plasma concentration inside the ion source, so that the high-voltage rising speed matches the plasma concentration in the ion source to avoid secondary ignition.

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