Gas source control self-adaptive switching valve group for special gas holder and multi-channel gas supply system

Abstract

The invention relates to the technical field of semiconductor manufacturing, in particular to a special gas supply technology, in particular to a gas source control self-adaptive switching valve group and a multi-channel gas supply system for a special gas holder, comprising: a gas source comprising at least two gas cylinder groups, the first gas cylinder group being used for accommodating a first process gas, the second gas cylinder group being used for accommodating a second process gas, the first process gas and the second process gas are different types of process gases. The self-adaptive switching valve group is provided with three gas supply channels, one gas supply channel serves as a main gas supply channel of the current process gas, one gas supply channel serves as a standby gas supply channel of the current process gas, and the other gas supply channel serves as a switching channel of subsequent process gas. Besides, the main gas supply channel is used as a normally-used gas supply channel, the other two gas supply channels are pre-filled with gas, different gas supply channels can be rapidly switched according to production requirements, and different kinds of process gas can be alternately and continuously provided for production equipment.

Description

Technical Field

[0001] The present invention relates to the field of semiconductor manufacturing technology, especially special gas supply technology. Specifically, it relates to a gas source control adaptive switching valve group for a special gas cabinet and a multi-channel gas supply system. Background Art

[0002] ‌A special gas cabinet is a dedicated device for safely storing, distributing, or processing gases with special properties. For example, it is used to store process gases such as high-purity silane and argon for semiconductor manufacturing. At different stages of semiconductor manufacturing, different gases are required to complete various processes, such as lithography, etching, deposition, doping, etc. Each process requires different types of special gases. The special gas cabinet needs to provide corresponding gas types and supply schemes according to different process requirements to ensure that these gases can be supplied to each production link efficiently, stably, and safely.

[0003] Taking the deposition of a multi-layer silicon nitride (Si 3 N 4 ) thin film as an example, in this process, silane (SiH 4 ) and ammonia (NH 3 ) need to be used alternately to deposit a multi-layer silicon nitride (Si 3 N 4 ) thin film. However, when switching from silane to ammonia to adjust the film composition, since the standby channel is only enabled when the main channel is abnormal, production must be stopped, the main channel is closed, the residual silane gas is evacuated, the pipeline is cleaned, and then the ammonia gas source is connected and inflated. The whole process takes 15 - 30 minutes, resulting in production interruption and significant loss of production capacity. Summary of the Invention

[0004] In view of the technical problems existing in the gas supply of the special gas cabinet in the prior art, the first aspect of the present invention proposes a gas source control adaptive switching valve group for a special gas cabinet, including: A gas source, including at least two gas cylinder groups. The first gas cylinder group is used to accommodate a first process gas, and the second gas cylinder group is used to accommodate a second process gas. The first process gas and the second process gas are different types of process gases; A gas supply channel, including a first gas supply channel with an inlet end connected to a first valve, a second gas supply channel with an inlet end connected to a second valve, and a third gas supply channel with an inlet end connected to a third valve; A distribution valve, including three inlet ends and at least two exhaust ends, and any one of the inlet ends is selectively communicated with one of the exhaust ends. The first exhaust end of the distribution valve is used to connect to a production device, and the second exhaust end of the distribution valve is used to connect to an exhaust gas treatment component. The inlet end of the first valve is respectively connected to the exhaust ends of the second valve and the third valve. The second valve is connected to the first gas cylinder group, and the third valve is connected to the second gas cylinder group; A clean gas supply component, connected to the second valve and the third valve, for supplying clean gas to the first gas supply channel, the second gas supply channel, and the third gas supply channel; A controller, electrically connected to the first valve, the second valve, the third valve, and the distribution valve; Wherein, the controller is configured to control the on-off states of the first valve, the second valve, the third valve, and the distribution valve, so that the production equipment, the gas source, the clean gas supply component, and the waste gas treatment component are selectively connected to any one of the first gas supply channel, the second gas supply channel, and the third gas supply channel, and the first gas supply channel, the second gas supply channel, or the third gas supply channel is in a pre-charging state, a gas supply state, or a cleaning state; And at least one channel remains in the gas supply state and at least one channel remains in the pre-charging state, so as to switch the connection between the first gas supply channel, the second gas supply channel, or the third gas supply channel and the production equipment according to the demand, and continuously supply the first process gas or the second process gas to the production equipment.

[0005] Preferably, according to the priority of the gas required by the production equipment, the first gas supply channel, the second gas supply channel, and the third gas supply channel are assigned as the main gas supply channel, the standby gas supply channel, and the switching channel; Wherein, the main gas supply channel and the standby gas supply channel are pre-charged with the first priority gas, and the switching channel is pre-charged with the second priority gas; The main gas supply channel is connected to the production equipment to supply the first priority gas to the production equipment. When switching from the first priority gas to the second priority gas, the main gas supply channel switches from the gas supply state to the cleaning state, the switching channel switches from the pre-charging state to the gas supply state, and the standby gas supply channel remains in the pre-charging state. The second priority gas in the switching channel takes over the first priority gas in the main gas supply channel to continuously supply gas to the production equipment.

[0006] Preferably, pressure sensors are provided in the first gas supply channel, the second gas supply channel, and the third gas supply channel, and the pressure sensors are used to monitor the channel pressure in the first gas supply channel, the second gas supply channel, and the third gas supply channel P dynamic , a total pressure sensor is respectively arranged between the first gas cylinder group and the second gas cylinder group and the first valve, the second valve, and the third valve, and the total pressure sensor is used to take the gas source pressure of the first gas cylinder group and the second gas cylinder group as the total pressure P total , a static pressure sensor is arranged between the production equipment and the distribution valve, and the static pressure sensor is used to monitor the pressure at the inlet of the production equipment as the static pressure at the inlet of the downstream reaction chamber P staticThe total pressure sensor, the pressure sensor, and the static pressure sensor are electrically connected to the controller, and the controller is configured to make discrimination and decision based on the real-time monitored pressure to control the airflow stability entering the reaction chamber of the production equipment. Preferably, the controller is configured to establish a gas supply stability model according to the deviation rate η of the pressure fluctuation along the way and the fluctuation degree τ of the static pressure at the inlet of the downstream reaction chamber, and determine the gas supply stability based on this, and decide whether to switch the gas supply channel. where τ = | P static - P set | / P set; η = |1 - Δ P1 / Δ P2 | * 100%; where P set represents the pressure set value at the inlet of the downstream reaction chamber, and Δ P1 represents the deviation of the total pressure along the way, and Δ P1= | P total - P static |; Δ P2 represents the deviation along the channel, and Δ P2= | P dynamic - P static |.

[0007] Preferably, when the gas required by the production equipment is switched from the first priority gas to the second priority gas, the controller controls the conduction states of the first valve, the second valve, the third valve, and the distribution valve, so that the switching channel is connected to the production equipment to provide the second priority gas to the production equipment; and the main gas supply channel is connected to the clean gas supply component and the waste gas treatment component to clean the main gas supply channel. th Or when the deviation rate η of the pressure fluctuation along the way exceeds the preset threshold η th , it is determined that the fluctuation is abnormal, and the controller controls the switching of the main gas supply channel.

[0008] Preferably, when the gas required by the production equipment is switched from the first priority gas to the second priority gas, the controller controls the conduction states of the first valve, the second valve, the third valve, and the distribution valve, so that the switching channel is connected to the production equipment to provide the second priority gas to the production equipment; and the main gas supply channel is connected to the clean gas supply component and the waste gas treatment component to clean the main gas supply channel.

[0009] Preferably, the first gas cylinder group includes a first gas cylinder and a second gas cylinder, and both the first gas cylinder and the second gas cylinder are used to contain the first priority gas; The second gas cylinder group includes a third gas cylinder, and the third gas cylinder is used to contain the second priority gas.

[0010] Preferably, the second gas cylinder group further includes a fourth gas cylinder for containing a third-priority gas, and the fourth gas cylinder is located inside or outside the special gas cabinet.

[0011] Preferably, a gas detection component is provided on the exhaust gas pipeline between the distribution valve and the exhaust gas treatment component, and the gas detection component is used to detect the type of gas in the exhaust gas pipeline.

[0012] A second aspect of the present invention proposes a technical solution, a multi-channel gas supply system, including: The above-mentioned gas source control adaptive switching valve group for the special gas cabinet; A production device connected to the first exhaust end of the distribution valve; An exhaust gas treatment component connected to the second exhaust end of the distribution valve; Wherein, the production device is connected to the first exhaust end of the distribution valve through a gas transmission pipeline, and the first process gas and the second process gas are alternately and continuously provided to the production device by the first gas supply channel, the second gas supply channel or the third gas supply channel.

[0013] Preferably, the production device includes at least two production units, the gas transmission pipeline is connected to each production unit, and the gas transmission pipeline is provided with a fifth valve corresponding to each production unit, and the fifth valve is used to control the connection state between the production unit and the gas transmission pipeline.

[0014] Preferably, the distribution valve further includes a third exhaust end, the gas transmission pipeline includes a first gas transmission pipeline and a second gas transmission pipeline, the first end of the first gas transmission pipeline is connected to a plurality of production units, the second end is connected to the first exhaust end, and the first end of the second gas transmission pipeline is connected to a plurality of production units, and the second end is connected to the third exhaust end.

[0015] Compared with the prior art, the significant advantages of the gas source control adaptive switching valve group and the multi-channel gas supply system for the special gas cabinet proposed by the present invention are as follows: Compared with the prior art, the significant advantages of the gas source control adaptive switching valve group and the multi-channel gas supply system for the special gas cabinet proposed by the present invention are as follows: In the gas source control adaptive switching valve group and the multi-channel gas supply system for the special gas cabinet proposed by the present invention, the switching valve group is provided with three gas supply channels, one gas supply channel is used as the main gas supply channel for the current process gas, one gas supply channel is used as the standby gas supply channel for the current process gas, and the remaining one gas supply channel is used as the switching channel for the subsequent process gas. And except for the main gas supply channel which is used as the normal gas supply channel, the other two gas supply channels are pre-filled with gas, and different gas supply channels can be quickly switched according to production needs to continuously provide different types of process gas for the production device alternately; The standby channel and the switching channel proposed in the present invention are physically isolated from the main channel after precharging, avoiding reverse penetration of residual gas during the main gas supply process and ensuring the pipeline cleanliness; and when switching, the precharged channel is directly enabled without the traditional evacuation - cleaning process, which can not only avoid downtime but also eliminate cross - contamination of residual gas caused by incomplete cleaning. Pre - fill multiple target gases through the switching channel, which can support complex process sequences, such as multi - step deposition - etching cycles, without downtime for adjusting the gas source configuration. At the same time, it can predict the gas demand in the next stage based on process data and pre - fill the target gas in the switching channel in advance to achieve "zero - perception" switching, especially seamless connection when switching from etching gas to deposition gas. The multi - channel designed in the present invention has scalability. By increasing the number of switching channels or upgrading the valve structure, it can be expanded to more than four channels, compatible with the future growth demand for the types of process gases in the special gas cabinet. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] The drawings are not intended to be drawn to scale. In the drawings, each identical or nearly identical component shown in each figure may be denoted by the same reference numeral. For clarity, not every component is labeled in each figure. Now, embodiments of various aspects of the present invention will be described by way of example and with reference to the drawings.

[0017] Figure 1 is a schematic structural diagram of the gas source control adaptive switching valve group for the special gas cabinet shown in the present invention.

[0018] Figure 2 is a schematic diagram of the first gas supply channel providing the first - priority gas to the production equipment shown in the present invention.

[0019] Figure 3 is a schematic diagram of the first gas supply channel being in a clean state and the second gas supply channel providing the first - priority gas to the production equipment shown in the present invention.

[0020] Figure 4 is a schematic diagram of the third gas supply channel providing the second - priority gas to the production equipment shown in the present invention.

[0021] Figure 5 is a schematic diagram of the first gas supply channel providing the second - priority gas to the production equipment shown in the present invention.

[0022] Figure 6 is a schematic diagram of the second gas cylinder group having the third gas cylinder and the fourth gas cylinder shown in the present invention.

[0023] Figure 7 is a schematic diagram of the first gas supply channel providing the first - priority gas to multiple production units shown in the present invention.

[0024] Figure 8 It is a schematic diagram of multiple production units shown in the present invention in different gas supply states.

[0025] Figure 9 It is a schematic structural diagram of the gas transmission pipeline shown in the present invention.

[0026] Explanation of reference numerals: 100, gas source; 110, weighing component; 120, first gas cylinder group; 130, second gas cylinder group; 200, gas supply channel; 201, first gas supply channel; 202, second gas supply channel; 203, third gas supply channel; 210, second valve; 220, third valve; 230, first valve; 241, first flow valve; 242, second flow valve; 243, third flow valve; 250, pressure sensor; 251, total pressure sensor; 300, distribution valve; 400, clean gas supply component; 500, production equipment; 510, gas transmission pipeline; 511, first gas transmission pipeline; 512, second gas transmission pipeline; 520, static pressure sensor; 530, fifth valve; 600, waste gas treatment component; 610, waste gas pipeline; 620, gas detection component. Detailed implementation manners

[0027] In order to better understand the technical content of the present invention, specific embodiments are hereby given and described in conjunction with the accompanying drawings as follows.

[0028] {Embodiment 1} Combined with Figure 1 As shown, the gas source control adaptive switching valve group of the special gas cabinet according to the embodiment of the present invention includes a gas source 100, a gas supply channel 200, a distribution valve 300, a clean gas supply component 400, and a controller.

[0029] The gas source 100 is used to supply special gases required for the production process to the production equipment 500.

[0030] In the embodiment of the present invention, the gas source 100 includes at least two gas cylinder groups: a first gas cylinder group 120 and a second gas cylinder group 130. Both the first gas cylinder group 120 and the second gas cylinder group 130 are configured with one or more gas cylinders (special gas cylinders), and each gas cylinder is used to contain special gases.

[0031] As an alternative embodiment, some or all of the gas cylinders in the first gas cylinder group 120 and the second gas cylinder group 130 are arranged in the special gas cabinet, and are especially limited in position by a fixing mechanism and installed and fixed at the bottom of the special gas cabinet. In a preferred embodiment, in order to facilitate the replacement of the gas cylinders, a slide rail capable of moving in the front-back direction is further arranged at the bottom of the special gas cabinet. The fixing mechanism for fixing the gas cylinders is integrally installed above the slide rail and can slide back and forth as a whole to carry the gas cylinders into and out of the special gas cabinet for gas cylinder replacement operation.

[0032] Optionally, the first gas cylinder group 120 is used to accommodate the first process gas, and the second gas cylinder group 130 is used to accommodate the second process gas. The first process gas and the second process gas are different types of process gases.

[0033] In other embodiments, according to needs, multiple gas cylinders in the second gas cylinder group 130 can also accommodate more types of gases, such as the third process gas, the fourth process gas, etc., and can be configured expandably according to actual production needs.

[0034] The aforementioned special gases include, but are not limited to, nitrogen, helium, oxygen, ozone, silane, siloxane, hexafluoride, halide, hydrocarbon, etc. These gases participate in the process in semiconductor processing processes such as magnetron sputtering, ALD, vacuum evaporation coating, ion beam coating and other processing processes.

[0035] Combined with the attached Figure 1 As shown, the gas supply channel 200 includes a first gas supply channel 201 with an inlet end connected to the first valve 230, a second gas supply channel 202 with an inlet end connected to the second valve 210, and a third gas supply channel 203 with an inlet end connected to the third valve 220.

[0036] As shown in the accompanying drawings, the first valve 230, the second valve 210, the third valve 220 and the corresponding gas supply channels are all arranged inside the special gas cabinet.

[0037] Thus, by setting three gas supply channels, one of the gas supply channels is used as the main gas supply channel for the current process gas, another gas supply channel is used as the standby gas supply channel for the current process gas, and the remaining third gas supply channel is used as the switching channel for the subsequent process gas. And except for the main gas supply channel which is used as the normally used gas supply channel, the other two gas supply channels are pre-filled with gas to achieve the purpose of quickly switching the gas supply channel.

[0038] Among them, each gas supply channel has a pre-inflation state, a gas supply state, and a cleaning state, and is in at least one of the above three states. In the pre-inflation state, the channel is pre-filled with a specific process gas to facilitate quickly providing the process gas to the production equipment 500 during switching; in the gas supply state, the two ends of the channel are respectively connected to the gas source 100 and the production equipment 500, and can continuously provide the required process gas to the production equipment 500; in the cleaning state, the two ends of the channel are respectively connected to the cleaning gas supply component 400 and the waste gas treatment component 600, and the channel is purged by filling an inert gas into the channel through the cleaning gas supply component 400, and then recovered and treated by the waste gas treatment component 600 to avoid residues in the channel.

[0039] For example, when there is a leakage / inadequate gas supply in the main gas supply channel, the standby gas supply channel can be directly switched to maintain continuous supply of the process gas to the production equipment 500, that is, the main gas supply channel is switched from the gas supply state to the cleaning state, and the original standby channel is switched from the pre-inflation state to the gas supply state. Another example is that when different types of process gases need to be switched, the subsequent process gas in the switching channel is directly used to supply the production equipment 500. At this time, the switching channel is switched from the pre-inflation state to the gas supply state, and the main gas supply channel is switched from the gas supply state to the cleaning state. This process does not interrupt production due to cleaning the gas supply channel, so as to ensure the continuity of production.

[0040] Combined with the attached Figures 1 to 9 As shown in the example, the distribution valve 300 is a multi-way intake and exhaust control valve, including three intake ends and at least two exhaust ends, and any one of the intake ends is selectively communicated with one of the exhaust ends.

[0041] Among them, the first valve 230 is a three-way solenoid valve, the second valve 210 is a four-way solenoid valve, and the third valve 220 is a four-way solenoid valve.

[0042] In the embodiment of the present invention, the distribution valve 300 adopts a multi-way reversing solenoid valve. The distribution valve 300 includes three inlets, two outlets, and three valve cores. Each valve core is used to control the connection state of one inlet. By controlling the movement of the valve cores, any one of the three inlets can be communicated with or closed to any one of the two outlets.

[0043] Combined with the attached Figure 9 As shown, the first exhaust end of the distribution valve 300 is used to connect to the production equipment 500, and the second exhaust end of the distribution valve 300 is used to connect to the waste gas treatment component 600.

[0044] The three air inlet ends of the distribution valve 300 are respectively connected to the first gas supply channel 201, the second gas supply channel 202, and the third gas supply channel 203. Through the channel selection of the distribution valve 300, any one of the first gas supply channel 201, the second gas supply channel 202, and the third gas supply channel 203 is selectively connected to the production equipment 500 and the waste gas treatment component 600.

[0045] In this way, when any one of the first gas supply channel 201, the second gas supply channel 202, and the third gas supply channel 203 is connected to the production equipment 500, the corresponding process gas can be provided to the production equipment 500 through the corresponding connected gas supply channel.

[0046] When any one of the first gas supply channel 201, the second gas supply channel 202, and the third gas supply channel 203 is connected to the waste gas treatment component 600, after the residual process gas in the connected gas supply channel is emptied, subsequent processing can be carried out.

[0047] Combined with the attached Figures 1 to 8 As shown in the example, the clean gas supply component 400 is connected to the second valve 210 and the third valve 220, and is used to supply clean gas to the first gas supply channel 201, the second gas supply channel 202, and the third gas supply channel 203.

[0048] Optionally, the clean gas includes, but is not limited to, inert gases that do not participate in the reaction, such as nitrogen, helium, etc.

[0049] Thus, when cleaning any one of the first gas supply channel 201, the second gas supply channel 202, and the third gas supply channel 203, by filling the clean gas into the gas supply channel, the residual original process gas in the gas supply channel can be quickly discharged, so that the gas supply channel enters the pre-inflation state waiting for the next process gas, and is processed by the waste gas treatment component 600.

[0050] It should be understood that in the embodiments of the present invention, the first valve 230, the second valve 210, the third valve 220, and the distribution valve 300 all adopt solenoid valves or electric switch valves, are electrically connected to the controller, and can be controlled by the controller to open / close and selectively conduct control.

[0051] Combined with Figures 1 to 8 As shown, the second valve 210 is connected to the first gas cylinder group 120, and the third valve 220 is connected to the second gas cylinder group 130.

[0052] Combined with Figure 1 As shown, the air inlet end of the first valve 230 is respectively connected to the exhaust ends of the second valve 210 and the third valve 220.

[0053] Thus, the process gas in the first gas cylinder group 120 can enter the second gas supply channel 202 through the second valve 210, or enter the first valve 230 through the second valve 210, and then enter the first gas supply channel 201 through the first valve 230.

[0054] As Figure 1 shown, the process gas in the second gas cylinder group 130 can enter the third gas supply channel 203 through the third valve 220, or enter the first valve 230 through the third valve 220, and then enter the first gas supply channel 201 through the first valve 230.

[0055] As described above, the process gas in the first gas cylinder group 120 can enter any one or both of the first gas supply channel 201 and the second gas supply channel 202; the process gas in the second gas cylinder group 130 can enter any one or both of the second gas supply channel 202 and the third gas supply channel 203.

[0056] Thus, according to production requirements, the gas source 100, the production equipment 500, the clean gas supply component 400, and the waste gas treatment component 600 are selectively connected to any one of the first gas supply channel 201, the second gas supply channel 202, and the third gas supply channel 203.

[0057] In an embodiment of the present invention, according to the priority of the gas required by the production equipment 500, the first gas supply channel 201, the second gas supply channel 202, and the third gas supply channel 203 are respectively defined and allocated as the main gas supply channel, the standby gas supply channel, and the switching channel.

[0058] Among them, the main gas supply channel and the standby gas supply channel are filled with the first-priority gas, which can be the first process gas or the second process gas, and is configured according to the different process sequences. The switching channel is filled with the second-priority gas, and the distribution valve 300 is set to keep the main gas supply channel connected to the production equipment 500.

[0059] Furthermore, in the abnormal state of the above-mentioned first gas supply channel 201, second gas supply channel 202, and third gas supply channel 203, such as after abnormal pressure, gas cylinder replacement, or process gas switching, cleaning is performed to remove residues. Among them, after the gas supply of the first gas supply channel 201, second gas supply channel 202, and third gas supply channel 203 is cut off, they all enter the cleaning state, and the clean gas supply component 400 provides clean gas for channel evacuation and cleaning.

[0060] Thus, each gas supply channel can be in at least one of the gas supply state, the standby gas supply state, the waiting-to-switch state, or the cleaning state according to requirements.

[0061] For any one of the foregoing three gas supply channels, when the gas supply channel is in the gas supply state, one end thereof is connected to the gas source of the required gas, and the other end is connected to the production equipment 500 through the selective conduction control of the distribution valve 300, and the gas in the gas source is supplied to the production equipment 500 through the gas supply channel.

[0062] When the gas supply channel is in the standby gas supply state, one end thereof is connected to the gas source of the required gas, and the other end is connected to the distribution valve 300. At this time, the process gas in the gas supply channel is maintained at a predetermined pressure and can be switched to communicate with the production equipment 500 through the selective conduction control of the distribution valve 300 within a short time, and is switched from the standby gas supply state to the gas supply state.

[0063] When the gas supply channel is in the state to be switched, one end thereof is connected to the gas source of the subsequent required gas, and the other end is connected to the distribution valve 300. At this time, the process gas in the gas supply channel is maintained at a predetermined pressure and can be switched to communicate with the production equipment 500 through the selective conduction control of the distribution valve 300 within a short time, and is switched from the state to be switched to the gas supply state to complete the switching of the current process gas and the subsequent process gas.

[0064] Specifically, when the gas supply channel is in the clean state, one end thereof is connected to the clean gas supply component 400, and the other end is connected to the waste gas treatment component 600 through the selective conduction control of the distribution valve 300. The clean gas provided by the clean gas supply component 400 is used to discharge the residual original process gas in the gas supply channel to the waste gas treatment component 600 for treatment.

[0065] It should be understood that the clean state is short-periodic. Once the current gas supply channel is cleaned, it will be switched to the standby gas supply state or the state to be switched.

[0066] Thus, when any one of the above-mentioned first gas supply channel 201, second gas supply channel 202 and third gas supply channel 203 is in the gas supply state, and the remaining two are in the standby gas supply state, the state to be switched or the clean state, it does not affect the normal gas supply of the production equipment 500, and can still be quickly switched to achieve uninterrupted gas supply and maintain the continuity of production.

[0067] {Embodiment 2} In an embodiment of the present invention, what is not marked in the illustration is that a heating blanket is wrapped around the bottom and the body of each gas cylinder, and a heating structure is also wrapped around the pipeline structure of the gas supply channel of the present invention. Particularly preferably, a heating structure based on glass fiber is used, which combines glass fiber material and electric heating wires to form a glass fiber heating tape with high temperature resistance, insulation, and corrosion resistance. The glass fiber heating tape is wound around the pipeline structure, and the operation of the heating blanket and the glass fiber heating tape is controlled by a controller to ensure that the gas output from the gas cylinder and flowing through the pipeline structure of the gas supply channel remains in a complete gaseous state, avoiding the influence of condensation and other factors on the gas supply pressure and stability, and thus affecting production.

[0068] As an alternative embodiment, the controller controls the heating temperature of the heating blanket and the glass fiber heating tape within the range of 45 - 65 °C.

[0069] In an alternative embodiment, temperature sensors are provided in the pipeline structure of the gas supply channel, the pipeline structure of the gas cylinder outlet, and the pipeline structure before entering the production equipment inlet for real-time monitoring of the pipeline temperature value. Further, by combining the monitoring of the ambient temperature and the real-time monitoring of the pipeline temperature value, the controller can more optimally control the operating power of the heating blanket and the glass fiber heating tape.

[0070] In a further embodiment of the present invention, in combination with the attached Figures 1 to 8 As shown, a flow valve (241, 242, 243) is provided in each of the first gas supply channel 201, the second gas supply channel 202, and the third gas supply channel 203, and each flow valve is electrically connected and in communication with the controller. Thus, the controller can change the opening degree of the flow valve to control the gas flow rate and / or velocity of the first gas supply channel 201, the second gas supply channel 202, and the third gas supply channel 203.

[0071] As shown in the figure, the first gas supply channel 201 is provided with a first flow valve 241, the second gas supply channel 202 is provided with a second flow valve 242, and the third gas supply channel 203 is provided with a third flow valve 243. By controlling the opening degree of the flow valve, the gas supply flow rate and / or velocity of each gas supply channel can be controlled.

[0072] In an alternative embodiment, channel pressure sensors 250 are provided in each of the first gas supply channel 201, the second gas supply channel 202, and the third gas supply channel 203 to monitor in real time the pressure of the gas supplied in the first gas supply channel 201, the second gas supply channel 202, and the third gas supply channel 203, so as to monitor the gas supply process.

[0073] In combination with the attached Figures 1 to 8As shown, for the sake of brief and concise indication, the channel pressure sensor 250 provided in the corresponding channel is only marked by the reference numeral 250 in the third channel 203 as a schematic illustration, and is only shown but not marked in other figures. This is hereby stated for clarification.

[0074] In an alternative embodiment, a total pressure sensor 251 is respectively provided between each gas cylinder (such as cylinder A in the first gas cylinder group and cylinder B in the second gas cylinder group shown in the figure, etc.) and the corresponding first valve 230, second valve 210, and third valve 220. As an upstream total pressure sensor, it is provided close to the gas source side and is respectively used to monitor in real time the gas source pressure supplied from the gas cylinder to determine the stability of the gas source supply.

[0075] In an alternative embodiment, a static pressure sensor 520 is further provided between the production equipment 500 and the distribution valve 300. As a downstream static pressure sensor, it is provided close to the production equipment side (especially near the intake port at the front end of its reaction chamber) and is used to monitor in real time the actual gas supply pressure.

[0076] In the embodiment of the present invention, for any one gas supply channel as the main gas supply channel to the production equipment, the monitored pressure value of the total pressure sensor 251 between the gas supply channel and the gas cylinder is used as the total pressure P total and the pressure value monitored by the channel pressure sensor 250 in the gas supply channel is used as the channel pressure P dynamic and the pressure value monitored by the static pressure sensor 520 between the production equipment 500 and the distribution valve 300 is used as the static pressure at the downstream reaction chamber inlet P static wherein the pressure at the downstream reaction chamber inlet can be preset according to the process steps and debugging at P set (the set value of the equipment inlet pressure). Accordingly, the controller is configured to make a determination and decision based on the real-time monitored pressure to control the gas flow stability into the reaction chamber of the production equipment 500 and maintain the normal and stable operation of the production process.

[0077] In the embodiment of the present invention, the controller is set to judge the gas supply stable state according to the fluctuation of the static pressure at the downstream reaction chamber inlet and the pressure fluctuation along the channel, and perform switching control.

[0078] In an alternative embodiment, the aforementioned fluctuation of the static pressure at the downstream reaction chamber inlet includes the fluctuation degree τ of the static pressure at the downstream reaction chamber inlet (τ = | P static - P set | / P set) and the change rate of the static pressure at the downstream reaction chamber inlet dP / dt .

[0079] The pressure fluctuation along the aforesaid channel includes the deviation rate η of the pressure fluctuation along the supply path from the gas cylinder (such as gas cylinder A or B) via the gas supply channels (201, 202 or 203) to the production equipment 500, and η = |1 - Δ P1 / Δ P2 | × 100%.

[0080] Wherein, Δ P1 represents the deviation of the total pressure along the path, and |Δ P1= | P total - P static |; and Δ P2 represents the deviation along the channel, and |Δ P2 = | P dynamic - P static |.

[0081] Thus, a gas supply stability model is established based on the deviation rate η of the pressure fluctuation along the path and the fluctuation degree τ of the static pressure at the inlet of the downstream reaction chamber, and the gas supply stability is determined accordingly to decide whether to switch the gas supply channel.

[0082] As an optional control strategy, when the fluctuation degree τ of the static pressure at the inlet of the downstream reaction chamber exceeds the preset range τ th or the deviation rate η of the pressure fluctuation along the path exceeds the preset threshold η th , the controller determines that the fluctuation is abnormal and controls the switching of the main gas supply channel to avoid quality defects caused by unstable gas supply. In this example, the system configuration values of the preset threshold η th and the pressure deviation range P th are both required to be less than 0.5%.

[0083] In another embodiment, the controller can also be set to determine that the fluctuation is abnormal and control the switching of the main gas supply channel according to the change rate of the static pressure at the inlet of the downstream reaction chamber dP / dt exceeding the preset value or the deviation rate η of the pressure fluctuation along the path exceeding the preset threshold η th , so as to avoid quality defects caused by unstable gas supply.

[0084] As an example, for the change rate of the static pressure at the inlet of the downstream reaction chamber dP / dt , through the sliding window method, based on the past N data points including the current sampling point (such as N= 20, corresponding to a 1 s time window, the pressure change rate is calculated with a sampling frequency f of 50 ms). In particular, it is optional to assign higher weights to more adjacent sampling data to more accurately reflect the changing trend of the parameters.

[0085] Thus, on the one hand, the stability of the gas supply process and the normal progress of the production process are ensured by switching the gas supply channels. On the other hand, alarm prompts are issued, such as audible and visual alarms or remote alarm messages, to prompt the user to promptly check for leaks, blockages, changes in the temperature of the gas path along the way, changes in the ambient temperature, etc. in the gas supply channels with fluctuations and early warnings, so as to reduce abnormalities such as pressure fluctuations caused by leaks and incomplete gasification of the gas in the pipeline.

[0086] It should be understood that in this example, the controller makes discrimination and control decisions based on the pressure monitored in real time, and controls the selective conduction of the first valve 230, the second valve 210, the third valve 220, and the distribution valve 300 to cut off the current gas supply channel and switch the gas supply channel.

[0087] For example, taking the main gas supply channel as an example, when the first gas supply channel 201 (main gas supply channel) is in the main gas supply state, and it is monitored that the fluctuation degree τ of the static pressure at the inlet of the downstream reaction chamber exceeds the preset range τ th or the deviation rate η of the pressure fluctuation along the way exceeds the preset threshold η th , it is determined that the fluctuation is abnormal, and then the control is switched to the second gas supply channel 202 (standby gas supply channel) to supply gas to the production equipment 500.

[0088] It should be understood that when the first gas supply channel 201 (main gas supply channel) is in the main gas supply state, the second gas supply channel 202 (standby gas supply channel) has been pre-inflated to facilitate gas supply switching.

[0089] It should be understood that during the pre-inflation process of a certain gas supply channel, the pressure value monitored by the corresponding channel pressure sensor 250 is referred to, and when the pressure value in the pre-inflated gas supply channel reaches within the range of the equipment inlet pressure setting value P set ± 0.5%, the pre-inflation is completed.

[0090] At the same time, for the cut-off gas supply channel, the controller controls the selective conduction states of the first valve 230, the second valve 210, the third valve 220, and the distribution valve 300, so that the cut-off gas supply channel is connected to the clean gas supply component 400 and the waste gas treatment component 600 to clean the main gas supply channel.

[0091] As a preferred embodiment, a weighing component 110 is provided at the bottom of the gas cylinder. The weight of the gas cylinder can be monitored through the weighing component 110. Before the gas in the gas cylinder is exhausted, a reminder and warning of the remaining gas volume can be given in advance. The controller controls the switching to a new gas cylinder and the supply of gas through the gas supply channel, and can further prompt the user to replace the gas cylinder.

[0092] In another embodiment, the controller can also be based on the total pressure monitored by the total pressure sensor 251 corresponding to each gas cylinder P total When it is lower than the designed output value of the gas cylinder, a reminder and warning of the remaining gas volume are given. The controller controls the switching to a new gas cylinder and the supply of gas through the gas supply channel, and can further prompt the user to replace the gas cylinder.

[0093] {Embodiment 3} In this embodiment, we will combine the attached Figures 1 to 9 As shown, the gas supply switching will be described in more detail.

[0094] Combined with Figure 2 As shown, the first-priority gas required by the current production equipment 500 is process gas A, and the second-priority gas is process gas B. Among them, the first gas cylinder group 120 stores process gas A, the second gas cylinder group 130 stores process gas B, the first gas supply channel 201 is used as the main gas supply channel, the second gas supply channel 202 is used as the standby gas supply channel, and the third gas supply channel 203 is used as the switching channel.

[0095] Optionally, process gas A and process gas B are different gases. For example, process gas A is silane (SiH 4 ), and process gas B is ammonia (NH 3 ). By alternately supplying silane (SiH 4 ), and ammonia (NH 3 ) into the process chamber of the production equipment, a multi-layer silicon nitride (Si 3 N 4 ) thin film is deposited.

[0096] Specifically, the first valve 230 has a total of three interfaces: interface 1, interface 2, and interface 3. Among them, interface 1 and interface 3 are used as inlets, and interface 2 is used as an outlet. Both inlets can form independent channels with the outlet. It can be understood that both interface 1 and interface 3 of the first valve 230 have two connection states, namely being conductive or non-conductive with interface 2, and both interface 1 and interface 3 can only be in one of the above two states.

[0097] Specifically, the second valve 210 has four interfaces, namely, interface 1, interface 2, interface 3 and interface 4, wherein interface 1 and interface 4 are used as inlets, and interface 2 and interface 3 are used as outlets, and each inlet can be connected to any outlet to form an independent channel. It can be understood that interface 1 and interface 4 of the second valve 210 have three connection states, namely, being connected to interface 2 or being connected to interface 3 or not being connected, and interface 1 and interface 4 can only be in one of the above three states.

[0098] Specifically, the third valve 220 also has four interfaces, namely, interface 1, interface 2, interface 3 and interface 4, wherein interface 2 and interface 3 are used as outlets, interface 1 and interface 4 are used as inlets, and each inlet can be connected to any outlet to form an independent channel. It can be understood that interface 1 and interface 4 of the third valve 220 have three connection states, namely, being connected to interface 2 or being connected to interface 3 or not being connected, and interface 1 and interface 4 can only be in one of the above three states.

[0099] Specifically, the distribution valve 300 has five interfaces, namely, interface 1, interface 2, interface 3, interface 4 and interface 5, wherein interface 4 and interface 5 are used as outlets, and interface 1, interface 2 and interface 3 are used as inlets, and each inlet can be connected to any outlet to form an independent channel. It should be understood that interface 1, interface 2 and interface 3 of the distribution valve 300 have three states, namely, being connected to interface 4 or being connected to interface 5 or not being connected, and interface 1, interface 2 and interface 3 can only be in one of the above three states.

[0100] Combination Figure 2As shown, the gas path connection state where the first gas supply channel 201 serves as the main gas supply channel and is in the gas supply state, and the second gas supply channel 202 serves as the standby channel and is in the standby gas supply state (pre-inflation): The first gas cylinder group 120 supplies gas to the second valve 210 through the first gas cylinder channel 121. The interface 1 and interface 2 of the second valve 210 are conducted, and the interface 1 and interface 3 are conducted. The gas cylinders in the first gas cylinder group 120 fill process gas A into the first gas supply channel 201 and the second gas supply channel 202. By controlling the interface 1 of the distribution valve 300 to switch to conduct with interface 5 and the interface 2 to switch to conduct with interface 5, the original clean gas in the first gas supply channel 201 and the second gas supply channel 202 is discharged. Then, control the interface 1 of the distribution valve 300 to switch to conduct with interface 4 and the interface 2 to switch to closed. At this time, the second gas supply channel 202 completes pre-inflation. The first gas supply channel 201 and the second gas supply channel 202 are both connected to the first gas cylinder channel 121. The pressures of the first gas supply channel 201 and the second gas supply channel 202 are the same. The first gas supply channel 201 is connected to the gas transmission pipeline 510 of the production equipment 500 to supply process gas A to the production equipment 500. At this time, the first gas supply channel 201 is in the gas supply state, and the second gas supply channel 202 is in the standby gas supply state.

[0101] Specifically, the main gas supply path is: the first gas cylinder group 120 - the first gas cylinder channel 121 - interface 1 of the second valve 210 - interface 3 - interface 1 of the first valve 230 - interface 2 - the first gas supply channel 201 - interface 1 of the distribution valve 300 - interface 4 - the production equipment 500; Specifically, the standby gas supply path is: the first gas cylinder group 120 - the first gas cylinder channel 121 - interface 1 of the second valve 210 - interface 2 - the second gas supply channel 202 - interface 2 of the distribution valve 300.

[0102] Combined with Figure 2 As shown, the gas path connection state where the third gas supply channel 203 serves as the switching channel and is in the state of waiting to be switched: The second gas cylinder group 130 supplies gas to the third valve 220 through the second gas cylinder channel 131. The interface 4 and interface 3 of the third valve 220 are conducted, and process gas B enters the third gas supply channel 203. By controlling the interface 3 of the distribution valve 300 to switch to conduct with interface 5, the original clean gas in the third gas supply channel 203 is discharged. Then, control the interface 3 of the distribution valve 300 to switch to closed, so that the third gas supply channel 203 is filled with process gas B, and the third gas supply channel 203 is in the switching state.

[0103] Specifically, the gas supply path of the switching channel is: the second gas cylinder channel 131 - the second gas cylinder channel 131 - interface 4 of the third valve 220 - interface 3 - the third gas supply channel 203 - interface 3 of the distribution valve 300.

[0104] Combined withFigure 3 As shown in the figure, in combination with the foregoing judgment of abnormal pressure fluctuations, if the first gas supply channel 201 is used as the main gas supply and abnormal pressure fluctuations occur, the controller controls the actions of multiple valves to cut off the gas supply of the first gas supply channel 201, switch to the cleaning state, and switch to the second gas cylinder group 130 as the main gas supply channel.

[0105] Specifically, when the pressure of the first gas supply channel 201 is abnormal, the interface 1 of the distribution valve 300 is switched to communicate with the interface 5 and the interface 2 is switched to communicate with the interface 4 at the first time, and the process gas A is supplied to the production equipment 500 through the second gas supply channel 202, and the switching time is less than 0.5 s; then the interface 4 of the third valve 220 is communicated with the interface 2, and the interface 3 of the first valve 230 is communicated with the interface 2. The cleaning gas supply component 400 supplies cleaning gas to the first gas supply channel 201 through the cleaning gas delivery channel 410 in sequence through the third valve 220 and the first valve 230, and enters the waste gas pipeline 610 from the interface 1 and the interface 5 of the distribution valve 300 and is finally discharged to the waste gas treatment component 600 for treatment. At this time, the first gas supply channel 201 can be repaired or replaced.

[0106] Furthermore, when the gas required by the production equipment 500 is switched from the first priority gas to the second priority gas, the controller controls the conduction states of the first valve 230, the second valve 210, the third valve 220 and the distribution valve 300 to connect the switching channel with the production equipment 500 and supply the second priority gas to the production equipment 500; and the main gas supply channel is connected with the cleaning gas supply component 400 and the waste gas treatment component 600 to clean the main gas supply channel.

[0107] Combined with Figure 4 As shown in the figure, when the production equipment 500 needs to be switched from the process gas A to the process gas B, the interface 2 of the distribution valve 300 is controlled to close, and the interface 3 is switched to communicate with the interface 4. The third gas supply channel 203 is connected with the gas transmission pipeline 510 of the production equipment 500 to supply the process gas B to the production equipment 500, and the switching time is less than 0.5 s. At the same time, the first gas supply channel 201 is cleaned. The cleaning path is that the interface 4 of the second valve 210 is communicated with the interface 3, the interface 1 of the first valve 230 is communicated with the interface 2, and the interface 1 of the distribution valve 300 is communicated with the interface 5 to clean the first gas supply channel 201.

[0108] Combined with Figure 5As shown, after the first gas supply channel 201 is cleaned, the interface 4 of the third valve 220 is connected to the interface 2, and the interface 3 of the first valve 230 is connected to the interface 2, to supply process gas B into the first gas supply channel 201. Then, the interface 1 and the interface 5 of the distribution valve 300 are opened first to discharge the cleaning gas in the first gas supply channel 201. Then, the interface 1 of the distribution valve 300 is controlled to be switched to be connected to the interface 4, and the interface 3 is switched to be closed, to supply process gas B to the production equipment 500 through the first gas supply channel 201. At this time, the third gas supply channel 203 is in a standby state, and the second gas supply channel 202 is in a switching state.

[0109] Combined with Figure 1 As shown, optionally, the first gas cylinder group 120 includes a first gas cylinder and a second gas cylinder, and both the first gas cylinder and the second gas cylinder are used to contain the first-priority gas. A first electromagnetic valve 122 is provided at the gas outlet end of each gas cylinder, and the connection state between the gas cylinder and the gas pipeline can be controlled by controlling the first electromagnetic valve 122.

[0110] By setting the redundancy of the two gas cylinders in this way, it can be ensured that before the gas in the first gas cylinder is exhausted, the second gas cylinder is switched to continuously supply process gas A.

[0111] In an optional embodiment, the second gas cylinder group 130 includes a third gas cylinder, and the third gas cylinder is used to contain the second-priority gas, such as process gas B.

[0112] It can be understood that the third gas cylinders can also be in a group of two to form a redundant design.

[0113] Further, combined with Figure 6 As shown, if the gas required by the current production equipment 500 is more than two types, the second gas cylinder group 130 further includes a fourth gas cylinder or more gas cylinders, and the fourth gas cylinder and other gas cylinders are used to contain the third-priority gas or lower-priority gas, and the fourth gas cylinder can be optionally located inside or outside the special gas cabinet.

[0114] In this way, according to the priority order of the required gas, controlling the states of the first gas supply channel 201, the second gas supply channel 202, and the third gas supply channel 203 at different production times can always keep the current priority gas in a "one in use and one in standby" state, and the next priority gas in a "to be switched" state.

[0115] In the above embodiment, a gas detection component 620 is provided on the exhaust gas pipeline 610 between the distribution valve 300 and the exhaust gas treatment component 600, and the gas detection component 620 is used to detect the type of gas in the exhaust gas pipeline 610.

[0116] Specifically, when cleaning a certain gas supply channel, by detecting the gas in the exhaust gas pipeline 610, it can be judged whether the current gas supply channel is cleaned.

[0117]

Multi-channel gas supply system

[0118] The production equipment 500 is connected to the first exhaust end of the distribution valve 300, and the waste gas treatment component 600 is connected to the second exhaust end of the distribution valve 300; wherein, the production equipment 500 is connected to the first exhaust end of the distribution valve 300 through a gas transmission pipeline 510.

[0119] The gas source control adaptive switching valve group for the special gas cabinet sets three gas supply channels, with one gas supply channel as the main gas supply channel for the current process gas, one gas supply channel as the standby gas supply channel for the current process gas, and the remaining one gas supply channel as the switching channel for the subsequent process gas. And except for the main gas supply channel being used as the normally used gas supply channel, the other two gas supply channels are pre-filled with gas to achieve the purpose of quickly switching the gas supply channel.

[0120] In this way, the first process gas and the second process gas can be alternately and continuously supplied to the production equipment 500 through the first gas supply channel 201, the second gas supply channel 202, or the third gas supply channel 203, meeting the production requirements of alternately using silane (SiH 4 ), and ammonia (NH 3 ), to deposit and form a multi-layer silicon nitride (Si 3 N 4 ) thin film.

[0121] For example, when the main gas supply channel leaks, the standby gas supply channel can be directly switched to continuously supply process gas to the production equipment 500. Another example is that when the process gas needs to be switched, the subsequent process gas in the switching channel can be directly used to supply the production equipment 500 to ensure the continuity of production.

[0122] Furthermore, the production equipment 500 includes at least two production units. The gas transmission pipeline 510 is connected to each production unit, and the gas transmission pipeline 510 is provided with a fifth valve 530 corresponding to each production unit. The fifth valve 530 is used to control the connection state between the production unit and the gas transmission pipeline 510.

[0123] In this way, each production unit can flexibly adjust the gas supply state. For example, different process gases required by each production unit can be supplied, or the process gases can be supplied in coordination with different switching times of different production units.

[0124] Combined with Figures 7 to 9As shown, optionally, the production equipment 500 includes a first production unit 501, a second production unit 502, and a third production unit 503. The distribution valve 300 further includes a third exhaust end. The gas transmission pipeline 510 includes a first gas transmission pipeline 511 and a second gas transmission pipeline 512. The first end of the first gas transmission pipeline 511 is connected to multiple production units, and the second end is connected to the first exhaust end. The first end of the second gas transmission pipeline 512 is connected to multiple production units, and the second end is connected to the third exhaust end.

[0125] It should be understood that multiple production units all carry out production in a specific process sequence. Ideally, the timing for switching process gases is the same. However, there is a situation where a certain production unit has a slow production due to unexpected factors, affecting the production progress of this production unit and delaying the timing for switching its process gas.

[0126] To solve the problem of asynchronous switching of process gases, as Figure 7 shown, the first production unit 501, the second production unit 502, and the third production unit 503 are all supplied with gas through the first gas transmission pipeline 511. The first gas supply channel 201 supplies process gas A to the three production units. The second gas supply channel 202 is a standby channel for process gas A. If at this time the first production unit 501 and the second production unit 502 need to switch from process gas A to process gas B, while the third production unit 503 still needs to retain process gas A. At this time, combined with Figure 8 shown, the 1-5 interfaces of the distribution valve 300 are conducted to discharge the original process gas A. The 3-4 interfaces of the distribution valve 300 are conducted to supply process gas B to the first production unit 501 and the second production unit 502 through the third gas supply channel 203 and the second gas transmission pipeline 512. The 2-6 interfaces of the distribution valve 300 are conducted to still supply process gas A to the third production unit 503 through the second gas supply channel 202 until the third production unit 503 reaches the process gas switching time.

[0127] Combined with the above embodiments, the adaptive switching valve group proposed in this application sets three gas supply channels. One gas supply channel is used as the main gas supply channel for the current process gas, one gas supply channel is used as the standby gas supply channel for the current process gas, and the remaining one gas supply channel is used as the switching channel for the subsequent process gas. And except for the main gas supply channel which is used as the normally used gas supply channel, the other two gas supply channels are pre-filled with gas, and different gas supply channels can be quickly switched according to production needs to alternately provide different types of process gases for the production equipment; The standby channel and switching channel proposed in this application are physically isolated from the main channel after precharging, avoiding the reverse penetration of residual gas during the main gas supply process, ensuring the pipeline cleanliness. When switching, the precharged channel can be directly enabled without the traditional evacuation - cleaning process, which can not only avoid downtime but also eliminate the trace gas cross - contamination caused by incomplete cleaning, so as to improve production capacity. By pre - filling multiple target gases through the switching channel, it can support complex process sequences, such as multi - step deposition - etching cycles, without the need to stop the machine to adjust the gas source configuration. At the same time, it can predict the gas demand in the next stage based on historical process data and pre - charge the target gas in the switching channel in advance to achieve "zero - perception" switching. Especially, seamless connection can be achieved when switching from etching gas to deposition gas. The multi - channel setting in this application has scalability. By increasing the number of switching channels or upgrading the valve structure, it can be expanded to more than four channels to be compatible with the growing demand for future process gas types.

[0128] Although the present invention has been disclosed above with preferred embodiments, it is not intended to limit the present invention. Those with ordinary knowledge in the technical field to which the present invention pertains can make various changes and modifications without departing from the spirit and scope of the present invention. Therefore, the protection scope of the present invention shall be subject to what is defined by the claims.

Claims

1. An adaptive switching valve group for gas source control of a special gas cabinet, characterized in that: include: A gas source (100) comprises at least two gas cylinder groups, wherein the first gas cylinder group (120) is used to contain a first process gas, and the second gas cylinder group (130) is used to contain a second process gas, wherein the first process gas and the second process gas are different types of process gases; An air supply channel (200) comprising a first air supply channel (201) whose air inlet end is connected to a first valve (230), a second air supply channel (202) whose air inlet end is connected to a second valve (210), and a third air supply channel (203) whose air inlet end is connected to a third valve (220); A distribution valve (300) comprising three air inlet ends and at least two air outlet ends, wherein any one of the air inlet ends is selectively connected to one of the air outlet ends, the first air outlet end of the distribution valve (300) is used to connect to a production device (500), the second air outlet end of the distribution valve (300) is used to connect to an exhaust gas treatment component (600), the air inlet end of the first valve (230) is respectively connected to the air outlet ends of the second valve (210) and the third valve (220), the second valve (210) is connected to the first gas cylinder group (120), and the third valve (220) is connected to the second gas cylinder group (130); a cleaning gas supply component (400), connected to the second valve (210) and the third valve (220), and used for supplying cleaning gas to the first gas supply channel (201), the second gas supply channel (202), and the third gas supply channel (203); a controller electrically connected to the first valve (230), the second valve (210), the third valve (220) and the distribution valve (300); The controller is configured to control the conduction states of the first valve (230), the second valve (210), the third valve (220) and the distribution valve (300), so that the production equipment (500), the gas source (100), the clean gas supply component (400) and the waste gas treatment component (600) are selectively connected to any one of the first gas supply channel (201), the second gas supply channel (202) and the third gas supply channel (203), so that the first gas supply channel (201), the second gas supply channel (202) or the third gas supply channel (203) is in a pre-charged state, a gas supply state or a clean state; At least one channel maintains a gas supply state and at least one channel maintains a pre-charged state, so as to switch the first gas supply channel (201), the second gas supply channel (202) or the third gas supply channel (203) to be connected to the production equipment (500) according to demand, and continuously supply the first process gas or the second process gas to the production equipment (500).

2. The gas source control adaptive switching valve group for special gas cabinet according to claim 1 is characterized in that: According to the priority of the gas required by the production equipment (500), the first gas supply channel (201), the second gas supply channel (202), and the third gas supply channel (203) are allocated as a main gas supply channel, a backup gas supply channel, and a switching channel; Wherein, the main gas supply channel and the backup gas supply channel are pre-filled with the first priority gas, and the switching channel is pre-filled with the second priority gas; The main gas supply channel is connected to the production equipment (500) to provide the production equipment (500) with a first priority gas. When the first priority gas is switched to the second priority gas, the main gas supply channel is switched from a gas supply state to a cleaning state, and the switching channel is switched from a pre-filled state to a gas supply state. The backup gas supply channel maintains a pre-filled state, and the second priority gas in the switching channel replaces the first priority gas in the main gas supply channel to continuously supply gas to the production equipment (500).

3. The gas source control adaptive switching valve group for special gas cabinets according to claim 2 is characterized in that: The first air supply channel (201), the second air supply channel (202) and the third air supply channel (203) are each provided with a pressure sensor (250), and the pressure sensor (250) is used to monitor the channel pressure in the first air supply channel (201), the second air supply channel (202) and the third air supply channel (203). P dynamic A total pressure sensor (251) is provided between the first gas cylinder group (120) and the second gas cylinder group (130) and the first valve 230, the second valve 210, and the third valve 220, respectively. The total pressure sensor (251) is used to measure the gas source pressure of the first gas cylinder group (120) and the second gas cylinder group (130) as the total pressure. P total A static pressure sensor (520) is provided between the production equipment (500) and the distribution valve 300. The static pressure sensor (520) is used to monitor the pressure at the inlet of the production equipment (500) as the static pressure at the inlet of the downstream reaction chamber. P static The total pressure sensor (251), the pressure sensor (250) and the controller with the static pressure sensor (520) are electrically connected, and the controller is configured to make judgments and decisions based on the real-time monitored pressure to control the stability of the airflow entering the reaction chamber of the production equipment 500.

4. The gas source control adaptive switching valve group for special gas cabinet according to claim 3 is characterized in that: The controller is configured to establish a gas supply stability model according to the pressure fluctuation deviation rate η along the process and the fluctuation degree τ of the static pressure at the inlet of the downstream reaction chamber, and judge the gas supply stability accordingly to decide whether to switch the gas supply channel; Among them, t = | P static - P set | / P set;η=|1-Δ P1 / D P2 |*100%; in, P set represents the pressure setting value at the inlet of the downstream reaction chamber, Δ P1 Indicates the total pressure deviation along the way, Δ P1= | P total - P static |;Δ P2 Indicates the deviation along the channel, Δ P2= | P dynamic - P static |.

5. The gas source control adaptive switching valve group for special gas cabinets according to claim 4 is characterized in that: The controller determines that the fluctuation degree τ of the static pressure at the inlet of the downstream reaction chamber exceeds the preset range τ th Or the pressure fluctuation deviation rate η along the way exceeds the preset threshold η th , judge the fluctuation is abnormal, and control the switching of the main air supply channel.

6. The gas source control adaptive switching valve group for special gas cabinet according to claim 2 is characterized in that: When the gas required by the production equipment (500) is switched from the first priority gas to the second priority gas, the controller controls the conduction state of the first valve (230), the second valve (210), the third valve (220) and the distribution valve (300), so that the switching channel is connected to the production equipment (500) to provide the second priority gas to the production equipment (500); and the main gas supply channel is connected to the clean gas supply component (400) and the exhaust gas treatment component (600) to clean the main gas supply channel.

7. The gas source control adaptive switching valve group for special gas cabinet according to claim 1 is characterized in that: The first gas cylinder group (120) comprises a first gas cylinder and a second gas cylinder, wherein the first gas cylinder and the second gas cylinder are both used to contain a first priority gas; The second gas cylinder group (130) comprises a third gas cylinder, wherein the third gas cylinder is used to contain a second priority gas.

8. The gas source control adaptive switching valve group for special gas cabinets according to claim 7 is characterized in that: The second gas cylinder group (130) also includes a fourth gas cylinder, the fourth gas cylinder is used to contain a third priority gas, and the fourth gas cylinder is located inside or outside the special gas cabinet.

9. The gas source control adaptive switching valve group for special gas cabinets according to any one of claims 1 to 8, characterized in that: A gas detection component (620) is provided on the exhaust gas pipeline (610) between the distribution valve (300) and the exhaust gas treatment component (600), and the gas detection component (620) is used to detect the type of gas in the exhaust gas pipeline (610).

10. A multi-channel gas supply system for a special gas cabinet, characterized in that: include: The gas source control adaptive switching valve group for special gas cabinets according to any one of claims 1 to 7; A production device (500) connected to a first exhaust port of the distribution valve (300); An exhaust gas treatment component (600) connected to a second exhaust port of the distribution valve (300); The production equipment (500) is connected to the first exhaust end of the distribution valve (300) via a gas pipeline (510), and the first gas supply channel (201), the second gas supply channel (202) or the third gas supply channel (203) alternately and continuously supplies the first process gas and the second process gas to the production equipment (500).

11. The multi-channel gas supply system of the special gas cabinet according to claim 10, characterized in that: The production equipment (500) comprises at least two production units, the gas pipeline (510) is connected to each of the production units, and the gas pipeline (510) is provided with a fifth valve (530) corresponding to each production unit, and the fifth valve (530) is used to control the connection state between the production unit and the gas pipeline (510).

12. The multi-channel gas supply system of the special gas cabinet according to claim 10, characterized in that: The distribution valve (300) further includes a third exhaust end, and the gas supply pipeline (510) includes a first gas supply pipeline (511) and a second gas supply pipeline (512), wherein the first end of the first gas supply pipeline (511) is connected to a plurality of production units, and the second end is connected to the first exhaust end, and the first end of the second gas supply pipeline (512) is connected to a plurality of production units, and the second end is connected to the third exhaust end.

Images