Plasma cleaning assembly for pvd coating process and cleaning method of plasma cleaning assembly

By designing plasma cleaning components of the flip mechanism and the moving mechanism, the problem of uneven cleaning of substrates in the prior art is solved, and uniform cleaning of both sides of substrates is achieved, cleaning efficiency and quality is improved, and the operation process is simplified.

CN120210718APending Publication Date: 2025-06-27RISHENGCHANG NANOMATERIAL TECHNOLOGY (SUZHOU) CO LTD
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Patent Information

Application Number
CN202510406955.5
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-04-02
Publication Date
2025-06-27

AI Technical Summary

Technical Problem

The existing plasma cleaning device has poor cleaning effect on the substrate. Single-sided cleaning results in a long cleaning cycle, which increases production time and cost, and affects the coating quality.

Method used

A plasma cleaning assembly including a flip mechanism and a moving mechanism is designed. The main rotary rod is driven by a motor to rotate, and the bevel gear and the flip assembly are rotated, so as to achieve uniform flip and clean the substrate, and the operation process is simplified through the gear transmission system.

Benefits of technology

The uniform cleaning of both sides of the substrate is achieved, cleaning efficiency and quality is improved, the operation process is simplified, production costs are reduced, and the adhesion and quality of the coating is improved.

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Abstract

The invention belongs to the technical field of material surface treatment equipment, and discloses a plasma cleaning assembly for a pvd coating process and a cleaning method thereof.The plasma cleaning assembly comprises a base, a box is fixedly installed at the top of the base, a controller is fixedly installed at the top of the box, and a plasma nozzle is fixedly installed on the inner wall of the top of the box; a moving plate is slidably mounted on the inner wall of the base, a moving mechanism is arranged at the top of the base, and a turnover mechanism is arranged at the top of the moving plate; the overturning mechanism is arranged, a motor drives a main rotating rod to rotate, then three first bevel gears are driven to rotate, the first bevel gears are meshed with second bevel gears in three sets of overturning assemblies, each auxiliary rotating rod and a rectangular block on the auxiliary rotating rod are driven to rotate, and therefore uniform overturning and cleaning of substrates can be achieved through rotation of the rectangular blocks; by means of the design, it is ensured that the two faces of the substrate can be fully cleaned, and the cleaning efficiency and the cleaning quality are improved.
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Description

Technical Field

[0001] The present invention belongs to the technical field of material surface treatment equipment, and specifically relates to a plasma cleaning component for PVD coating process and its cleaning method. Background Art

[0002] PVD (Physical Vapor Deposition) technology is a thin film preparation technology that deposits materials onto the surface of a substrate through physical processes in a vacuum or low-pressure gas discharge environment. It converts the target material into gaseous atoms or molecules through evaporation or sputtering, and forms a solid thin film on the surface of the substrate.

[0003] Plasma is an ionized gas composed of electrons, ions, free radicals, etc., with the characteristics of high energy and high activity. By applying an electric field or magnetic field, gas molecules or atoms are ionized to form plasma. The high-energy particles in the plasma can undergo chemical reactions or physical bombardment with the material surface, thereby removing pollutants and impurities on the material surface and improving the surface properties of the material.

[0004] In the PVD coating process, the plasma cleaning component plays a crucial role. Its main function is to use the reactive particles in the plasma to chemically react with the material surface to remove pollutants and impurities on the material surface, such as grease, dust, oxides, etc., improve the coating quality and adhesion, and reduce defects and defective product rates during the coating process.

[0005] However, the plasma cleaning device in the prior art has poor cleaning effect on the substrate. That is, the cleaning method is usually carried out one side at a time. This means that only one side of the substrate can be cleaned each time, and then the substrate needs to be manually or automatically flipped to clean the other side. This cleaning method not only takes time but also increases the operation complexity. The one-side-at-a-time cleaning method means that a longer cleaning cycle is required to complete the cleaning of the entire substrate, which not only increases the production time cost but also may affect the overall production efficiency and production capacity, thus affecting the subsequent coating quality. Therefore, it needs to be improved and optimized. Summary of the Invention

[0006] To solve the problems raised in the above background art, the present invention provides a plasma cleaning component for PVD coating process and its cleaning method.

[0007] To achieve the above object, the present invention provides the following technical solution: A plasma cleaning component for PVD coating process, including a base, a box body is fixedly installed on the top of the base, a controller is fixedly installed on the top of the box body, a plasma spray head is fixedly installed on the inner wall of the top of the box body, a moving plate is slidably installed on the inner wall of the base, a moving mechanism is arranged on the top of the base, and a flipping mechanism is arranged on the top of the moving plate; The flipping mechanism includes a hollow column rotatably installed on the top of the moving plate. A rotating gear disc is fixedly sleeved on the outer wall of the bottom of the hollow column. A driving component I is arranged inside the hollow column. Three identical flipping components are arranged on the outer wall of the hollow column. Each flipping component includes four secondary rotating rods rotatably installed on the outer wall of the hollow column. The inner ends of the four secondary rotating rods all extend into the hollow column. The other ends of the four secondary rotating rods are respectively fixedly installed with rectangular blocks. Rectangular grooves are respectively formed on the outer walls of the four rectangular blocks. Two clamping blocks are respectively slidably installed in the four rectangular grooves. The corresponding two clamping blocks and the corresponding rectangular grooves are elastically connected through a plurality of springs. Clamping grooves are respectively formed on the sides where the corresponding two clamping blocks are close to each other.

[0008] Preferably, the driving component I includes a motor fixedly installed on the inner wall of the bottom of the hollow column. A main rotating rod is fixedly installed on the output shaft of the motor. Three bevel gears I are fixedly sleeved on the outer wall of the main rotating rod.

[0009] Preferably, bevel gears II are respectively fixedly sleeved on the outer walls of the inner ends of the secondary rotating rods in each group of flipping components and are meshed with the corresponding bevel gears I.

[0010] Preferably, the three flipping components and the bevel gears I are arranged at equal intervals. The three flipping components are all designed to be distributed at an interval of thirty degrees with the axis of the hollow column as the center.

[0011] Preferably, the moving mechanism includes a driving component II and a moving component. The driving component includes round rods respectively rotatably installed on both sides of the top of the base. A gear I and a door panel are respectively fixedly sleeved on the outer walls of the two round rods. The two gear Is are respectively located below the two door panels.

[0012] Preferably, a rack is fixedly installed at the center of the bottom of the moving plate. The rack is slidably connected to the base.

[0013] Preferably, two gear II are rotatably installed on the top of the base. The two gear II are respectively located on both sides of the rack and are respectively meshed with the corresponding gear I.

[0014] Preferably, a plurality of tooth grooves are respectively formed on both sides of the rack. The tooth grooves on both sides of the rack are respectively meshed with the corresponding gear II.

[0015] Preferably, the sides of the two door panels close to each other are of a fitting design. One side of one door panel is convex, and one side of the other door panel is concave.

[0016] A cleaning method for a plasma cleaning component in a PVD coating process. The specific steps of the method include; S1, pretreatment: Disassembly and inspection: Disassemble the plasma cleaning component to be cleaned from the PVD coating equipment for preliminary inspection; Surface cleaning: Use a lint-free cloth or a special cleaning agent to wipe the surface of the component to remove attached dust, grease, and impurities; S2, Plasma generation and parameter setting: Equipment connection: Install the pre-treated plasma cleaning component into the plasma cleaning equipment, ensuring a tight connection to avoid gas leakage; Parameter setting: Set the parameters of the plasma cleaning equipment according to the material, contamination degree, and cleaning requirements of the component; S3, Plasma cleaning: Gas injection: Start the plasma cleaning equipment and inject the preset gas into the cleaning chamber to ensure that the gas concentration in the chamber meets the cleaning requirements; Plasma excitation: Turn on the radio frequency power supply to excite gas molecules to form plasma. The high-energy particles in the plasma react chemically or physically bombard the contaminants on the surface of the component to decompose or remove them; Cleaning monitoring: During the cleaning process, monitor the parameters of the plasma state, pressure, and temperature changes in the cleaning chamber; S4, Post-treatment and detection: Cooling and exhaust: After the cleaning is completed, turn off the radio frequency power supply and let the cleaning component cool naturally to room temperature in the cleaning chamber, and then exhaust the residual gas in the chamber; Assembly and detection: Reinstall the cleaned component into the PVD coating equipment for assembly and debugging to ensure the normal function of the component.

[0017] Compared with the prior art, the beneficial effects of the present invention are as follows: 1. By setting up a flipping mechanism in the present invention, the main rotating rod is driven to rotate by a motor, which in turn drives the rotation of three bevel gears I. These bevel gears I are meshed with the bevel gears II in the three groups of flipping components, thereby driving the rotation of each secondary rotating rod and the rectangular block thereon. Since the three groups of flipping components are distributed at intervals of 30 degrees around the axis of the hollow column, the rotation of the rectangular block can achieve uniform flipping and cleaning of the substrate. This design ensures that both sides of the substrate can be fully cleaned, improving the cleaning efficiency and quality. At the same time, the clamping block is elastically connected to the rectangular groove through a spring, which can adapt to substrates of different sizes and firmly fix them to prevent slipping or damage during the cleaning process.

[0018] 2. By providing a moving mechanism, the present invention realizes the linkage between the door panel and the moving plate through a gear transmission system. When the door panel is rotated and opened, it drives the first gear to rotate. Then, through the meshing relationship between the second gear and the rack, the moving plate and the flipping mechanism on its top are automatically slid out of the box body. This design not only simplifies the operation process but also improves work efficiency, enabling the staff to easily access and operate the flipping mechanism while opening the door panel, thereby installing or removing the substrate. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] Figure 1 is a schematic structural view of the present invention; Figure 2 is an exploded structural view of the second driving component of the present invention; Figure 3 is a schematic structural view of the combination of two door panels of the present invention; Figure 4 is a partial front structural view of the present invention; Figure 5 is a schematic structural view of the moving component of the present invention; Figure 6 is a schematic structural view of the flipping mechanism of the present invention; Figure 7 is a partial exploded structural view of the flipping mechanism of the present invention; Figure 8 is a schematic structural view of the first driving component of the present invention; Figure 9 is an exploded structural view of the first driving component of the present invention; Figure 10 is a partial exploded structural view of the flipping component of the present invention.

[0020] In the figure: 1, base; 2, box body; 3, controller; 301, plasma spray head; 4, moving plate; 401, rack; 5, hollow column; 501, rotating gear disk; 6, motor; 601, main rotating rod; 602, first bevel gear; 7, secondary rotating rod; 701, second bevel gear; 8, rectangular block; 801, rectangular groove; 9, clamping block; 901, spring; 902, clamping groove; 10, round rod; 1001, first gear; 1002, door panel; 11, second gear. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0021] Next, the technical solutions in the embodiments of the present invention will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

[0022] As Figures 1 to 10As shown in the figure, the present invention provides a plasma cleaning component for a PVD coating process, including a base 1, a box body 2 is fixedly installed on the top of the base 1, a controller 3 is fixedly installed on the top of the box body 2, a plasma spray head 301 is fixedly installed on the inner wall of the top of the box body 2, a moving plate 4 is slidably installed on the inner wall of the base 1, a moving mechanism is arranged on the top of the base 1, and a flipping mechanism is arranged on the top of the moving plate 4; The flipping mechanism includes a hollow column 5 rotatably installed on the top of the moving plate 4. A rotating gear disc 501 is fixedly sleeved on the outer wall of the bottom of the hollow column 5. A first driving component is arranged inside the hollow column 5. Three identical flipping components are arranged on the outer wall of the hollow column 5. The flipping component includes four sub-rotating rods 7 rotatably installed on the outer wall of the hollow column 5. The inner ends of the four sub-rotating rods 7 all extend into the hollow column 5. The other ends of the four sub-rotating rods 7 are respectively fixedly installed with rectangular blocks 8. Rectangular grooves 801 are respectively formed on the outer walls of the four rectangular blocks 8. Two clamping blocks 9 are respectively slidably installed inside the four rectangular grooves 801. The corresponding two clamping blocks 9 and the corresponding rectangular grooves 801 are elastically connected through a plurality of springs 901. Clamping grooves 902 are respectively formed on the mutually approaching sides of the corresponding two clamping blocks 9. The first driving component includes a motor 6 fixedly installed on the inner wall of the bottom of the hollow column 5. A main rotating rod 601 is fixedly installed on the output shaft of the motor 6. Three bevel gears one 602 are fixedly sleeved on the outer wall of the main rotating rod 601. Bevel gears two 701 are respectively fixedly sleeved on the outer walls of the inner ends of the sub-rotating rods 7 in each flipping component and are meshed with the corresponding bevel gears one 602. The three flipping components and the bevel gear one 602 are arranged at equal distances. The three flipping components are all designed to be distributed at intervals of thirty degrees with the axis of the hollow column 5 as the center.

[0023] Adopting the above scheme: By setting the flipping component, when the moving plate 4 returns to its original position, the motor 6 is started, and its output shaft drives the main rotating rod 601 to rotate; the three bevel gears one 602 on the main rotating rod 601 rotate accordingly and are respectively meshed with the bevel gears two 701 in the three flipping components; ensuring that each flipping component can independently and synchronously receive the power from the motor 6. The rotation of the bevel gear two 701 drives the sub-rotating rod 7 and the rectangular block 8 thereon to rotate; since the three flipping components are distributed at intervals of thirty degrees with the axis of the hollow column 5 as the center, the rotation of the rectangular block 8 will realize the uniform flipping and cleaning of the substrate; by slidingly installing two clamping blocks 9 respectively inside the four rectangular grooves 801 on the outer wall of the rectangular block 8; the clamping blocks 9 are elastically connected to the rectangular grooves 801 through springs 901, ensuring the stability and adaptability of the clamping force. When the substrate is inserted into the rectangular groove 801, it will squeeze the clamping blocks 9 on both sides, causing the springs 901 to compress; once the substrate is in place, the resilience of the springs 901 will push the clamping blocks 9 towards the substrate and firmly fix the substrate through the clamping grooves 902.

[0024] AsFigures 1 to 5 As shown in Figures 1 to 5 , the moving mechanism includes a second driving component and a moving component. The second driving component includes round rods 10 rotatably installed on both sides of the top of the base 1 respectively. On the outer walls of the two round rods 10, a first gear 1001 and a door panel 1002 are respectively fixedly sleeved. The two first gears 1001 are respectively located below the two door panels 1002. One side of the two door panels 1002 close to each other is designed for fitting. One side of one door panel 1002 is convex, and one side of the other door panel 1002 is concave. A rack 401 is fixedly installed at the center of the bottom of the moving plate 4. The rack 401 is slidably connected to the base 1. Two second gears 11 are rotatably installed on the top of the base 1. The two second gears 11 are respectively located on both sides of the rack 401 and are respectively meshed with the corresponding first gears 1001. A plurality of tooth grooves are respectively formed on both sides of the rack 401. The tooth grooves on both sides of the rack 401 are respectively meshed with the corresponding second gears 11.

[0025] Adopting the above scheme: When it is necessary to open or close the door panel 1002, the second driving component starts to work. The operator can rotate to open the door panel 1002, so that the round rod 10 rotates on the top of the base 1. The rotation of the round rod 10 drives the synchronous rotation of the first gear 1001 and the door panel 1002 fixedly sleeved on its outer wall. Since one side of the two door panels 1002 close to each other is designed for fitting, that is, one side of one door panel 1002 is convex and one side of the other door panel 1002 is concave, the two door panels 1002 can be closely attached when closed, forming an effective seal to prevent the plasma or other harmful substances generated during the cleaning process from leaking to the outside of the box body 2, ensuring the operation environment and the safety of the staff. At the same time, as the door panel 1002 rotates, the first gear 1001 also starts to rotate and meshes with the corresponding second gear 11. The rotation of the second gear 11 further drives the part meshed with the tooth grooves on both sides of the rack 401, so that the rack 401 slides on the base 1. Since a plurality of tooth grooves are respectively formed on both sides of the rack 401, these tooth grooves form a stable meshing relationship with the corresponding second gears 11, ensuring the smoothness and accuracy of the rack 401 during the sliding process. The sliding of the rack 401 drives the moving plate 4 on its top to move together, so that the flipping mechanism inside can automatically slide out while the door panel 1002 is opened, which not only saves time but also is convenient.

[0026] A cleaning method for a plasma cleaning component used in a PVD coating process, the specific steps of the method include; S1, pretreatment: Disassembly and inspection: Disassemble the plasma cleaning component to be cleaned from the PVD coating equipment and conduct a preliminary inspection to confirm the integrity and damage of the component; Surface cleaning: Use lint-free cloth or special cleaning agent to wipe the surface of the component, removing the attached dust, grease and impurities to ensure the surface of the component is clean and free of dirt; S2, Plasma generation and parameter setting: Equipment connection: Install the pre-treated plasma cleaning component into the plasma cleaning equipment, ensuring a tight connection to avoid gas leakage; Parameter setting: According to the material, pollution degree and cleaning requirements of the component, set the parameters of the plasma cleaning equipment, including gas type, gas flow rate, radio frequency power, cleaning time, etc.; S3, Plasma cleaning: Gas injection: Start the plasma cleaning equipment and inject the preset gas such as argon, oxygen, etc. into the cleaning chamber to ensure that the gas concentration in the chamber meets the cleaning requirements; Plasma excitation: Turn on the radio frequency power supply to excite gas molecules to form plasma. The high-energy particles in the plasma react chemically or physically bombard the contaminants on the surface of the component, decomposing or removing them; Cleaning monitoring: During the cleaning process, monitor the plasma state, pressure and temperature change parameters in the cleaning chamber to ensure the stability and reliability of the cleaning effect; S4, Post-treatment and detection: Cooling and exhaust: After the cleaning is completed, turn off the radio frequency power supply, let the cleaning component cool naturally to room temperature in the cleaning chamber, and then exhaust the residual gas in the chamber; Assembly and detection: Reinstall the cleaned component into the PVD coating equipment for assembly and debugging to ensure the normal function of the component; Use special detection instruments to detect the cleaning effect, such as surface roughness, cleanliness, etc., to ensure that the cleaning quality meets the production requirements.

[0027] The working principle and usage process of the present invention: First, rotate the outer door panel 1002 outward to open it. This door panel 1002 drives the corresponding round rod 10 to rotate. The round rod 10 drives the gear one 1001 at its bottom to rotate. The gear one 1001 meshes with the corresponding gear two 11, thereby driving the gear two 11 to rotate. By the meshing of the gear two 11 and the rack 401, the rack 401 is driven to move horizontally outward on the top of the base 1. The movement of the rack 401 drives the moving plate 4 at its top and the gear two 11 meshing with the other side of the rack 401 to rotate, thereby driving another round rod 10 and the door panel 1002 to rotate and open outward through another gear one 1001. When the two door panels 1002 are fully opened, the moving plate 4 also moves out of the box body 2. Since there are protrusions on the inner side of the moving plate 4, the moving plate 4 will not completely move out of the box body 2, but it can expose the flipping mechanism on the top of the moving plate 4; Align the substrate to be cleaned with any one of the rectangular slots 801 and slide the substrate in. Since the outer sides of the two clamping blocks 9 inside the rectangular slot 801 are inclined, when the substrate is slid in, it can squeeze the clamping blocks 9 on both sides to compress the spring 901. When the substrate completely enters the clamping slot 902, the spring 901 rebounds, enabling the substrate to be fixed within the rectangular block 8 by the two clamping blocks 9. Insert the substrates to be cleaned into other rectangular slots 801 respectively. After all the substrates on the same side are fully inserted, the rotary gear disk 501 can be rotated to rotate the hollow column 5, so that the rectangular block 8 located at the rear side rotates to the front side, facilitating the staff to install the substrates. After all the substrates to be cleaned are installed, close the two door panels 1002, and drive the moving plate 4 to move towards the inside of the box body 2 until it returns to the initial closed state. Then, the plasma spray head 301 and the motor 6 can be started through the controller 3 to clean the substrates inside the box body 2. Drive the main rotating rod 601 to rotate through the motor 6, drive the three first bevel gears 602 to rotate through the main rotating rod 601, and drive each second bevel gear 701 and the auxiliary rotating rod 7 to rotate through the meshing of the second bevel gear 701 and the first bevel gear 602. Each auxiliary rotating rod 7 drives the rectangular block 8 to rotate, so as to clean both sides of the substrate.

[0028] It should be noted that in this article, relational terms such as first and second are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any actual relationship or order between these entities or operations. Moreover, the term "comprising", "including" or any other variant thereof is intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements not only includes those elements, but also includes other elements not expressly listed, or also includes elements inherent to such process, method, article or device.

[0029] Although the embodiments of the present invention have been shown and described, for those of ordinary skill in the art, it can be understood that various changes, modifications, substitutions and variations can be made to these embodiments without departing from the principles and spirit of the present invention. The scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A plasma cleaning component for a PVD coating process, comprising a base (1), a box (2) fixedly mounted on the top of the base (1), a controller (3) fixedly mounted on the top of the box (2), and a plasma nozzle (301) fixedly mounted on the top inner wall of the box (2), characterized in that: A movable plate (4) is slidably mounted on the inner wall of the base (1), a movable mechanism is provided on the top of the base (1), and a flipping mechanism is provided on the top of the movable plate (4); The flip mechanism comprises a hollow column (5) rotatably mounted on the top of the movable plate (4), a rotating toothed disc (501) being fixedly sleeved on the outer wall of the bottom of the hollow column (5), a driving component 1 being arranged inside the hollow column (5), and three groups of identical flip components being arranged on the outer wall of the hollow column (5), the flip components comprising four auxiliary rotating rods (7) rotatably mounted on the outer wall of the hollow column (5), the inward ends of the four auxiliary rotating rods (7) extending into the hollow column (5), the other ends of the four auxiliary rotating rods (7) being respectively fixedly mounted with rectangular blocks (8), the outer walls of the four rectangular blocks (8) being respectively provided with rectangular grooves (801), the insides of the four rectangular grooves (801) being respectively slidably mounted with two clamping blocks (9), the corresponding two clamping blocks (9) being directly elastically connected to the corresponding rectangular grooves (801) by a plurality of springs (901), and the corresponding two clamping blocks (9) being respectively provided with clamping grooves (902) on the sides close to each other.

2. The plasma cleaning assembly for PVD coating process according to claim 1, characterized in that: The driving assembly 1 comprises a motor (6) fixedly mounted on the inner wall of the bottom of the hollow column (5), a main rotating rod (601) being fixedly mounted on the output shaft of the motor (6), and three bevel gears 1 (602) being fixedly sleeved on the outer wall of the main rotating rod (601).

3. The plasma cleaning assembly for PVD coating process according to claim 2, characterized in that: The auxiliary rotating rod (7) in each set of the turning assembly is located on the outer wall of one end of the hollow column (5) and is respectively fixedly sleeved with a bevel gear 2 (701) and meshes with the corresponding bevel gear 1 (602).

4. The plasma cleaning assembly for PVD coating process according to claim 1, characterized in that: The three groups of flipping components and the bevel gear 1 (602) are arranged at equal distances, and the three groups of flipping components are designed to be distributed at intervals of thirty degrees with the axis of the hollow column (5) as the center.

5. The plasma cleaning assembly for PVD coating process according to claim 1, characterized in that: The moving mechanism comprises a second driving assembly and a moving assembly, wherein the driving assembly comprises round rods (10) rotatably mounted on two sides of the top of the base (1), respectively, and a gear one (1001) and a door panel (1002) are fixedly sleeved on the outer walls of the two round rods (10), respectively, and the two gears one (1001) are respectively located below the two door panels (1002).

6. The plasma cleaning assembly for PVD coating process according to claim 5, characterized in that: A rack (401) is fixedly mounted at the bottom center of the movable plate (4), and the rack (401) is slidably connected to the base (1).

7. The plasma cleaning assembly for PVD coating process according to claim 6, characterized in that: Two gears 2 (11) are rotatably mounted on the top of the base (1), and the two gears 2 (11) are respectively located on both sides of the rack (401) and are respectively meshed with the corresponding gear 1 (1001).

8. The plasma cleaning assembly for PVD coating process according to claim 7, characterized in that: A plurality of tooth grooves are respectively provided on both sides of the rack (401), and the tooth grooves on both sides of the rack (401) are respectively meshed with corresponding gear 2 (11).

9. The plasma cleaning assembly for PVD coating process according to claim 5, characterized in that: The sides of the two door panels (1002) that are close to each other are of a chimeric design, with one side of one door panel (1002) being convex and one side of the other door panel (1002) being concave.

10. A method for cleaning a plasma cleaning component for a PVD coating process, applied to a plasma cleaning component for a PVD coating process as claimed in any one of claims 1 to 9, characterized in that: The specific steps of the method include: S1, preprocessing: Disassembly and inspection: Disassemble the plasma-cleaned components to be cleaned from the PVD coating equipment and conduct a preliminary inspection; Surface cleaning: Use a dust-free cloth or special cleaning agent to wipe the surface of the component to remove attached dust, grease and impurities; S2, plasma generation and parameter setting: Equipment connection: Install the pre-treated plasma cleaning components into the plasma cleaning equipment, ensuring tight connections to avoid gas leakage; Parameter setting: Set the parameters of the plasma cleaning equipment according to the material, contamination level and cleaning requirements of the components; S3, plasma cleaning: Gas injection: Start the plasma cleaning equipment and inject the preset gas into the cleaning chamber to ensure that the gas concentration in the chamber meets the cleaning requirements; Plasma excitation: Turn on the RF power supply to excite gas molecules to form plasma. The high-energy particles in the plasma react chemically or physically bombard the pollutants on the surface of the components to decompose or remove them. Cleaning monitoring: During the cleaning process, the plasma state, pressure in the cleaning chamber and temperature change parameters are monitored; S4, post-processing and detection: Cooling and exhaust: After cleaning, turn off the RF power supply, let the cleaning components cool naturally to room temperature in the cleaning chamber, and then exhaust the residual gas in the chamber; Assembly and testing: Reinstall the cleaned components into the PVD coating equipment for assembly and debugging to ensure that the components function normally.