Conversion method of bevel edge in integrated circuit layout, medium, product and equipment

Abstract

The invention provides a method for converting a bevel edge in an integrated circuit layout, a medium, a product and equipment. The method comprises the following steps: acquiring a to-be-converted bevel edge which is in a non-parallel relationship with a first coordinate direction and a second coordinate direction in an integrated circuit layout; the to-be-converted bevel edge is converted into a plurality of line segment combinations, each line segment combination comprises a first conversion edge parallel to the first coordinate direction and a second conversion edge parallel to the second coordinate direction, and the end points of the two conversion edges are connected; and sequentially connecting the plurality of line segment combinations along the extension direction of the to-be-converted bevel edge so as to finish conversion of the to-be-converted bevel edge. Through the method, on one hand, special processing on the bevel edge in the subsequent correction process can be avoided, so that the execution of the subsequent correction operation is facilitated, the optical proximity effect correction efficiency is improved, on the other hand, the difference between the converted result and the original bevel edge can be reduced through the combination of the multiple line segments, and the accuracy of subsequent correction is ensured.

Description

Technical Field

[0001] The present invention relates to the field of semiconductor manufacturing, and particularly to a method, medium, product, and device for converting bevel edges in an integrated circuit layout. Background Art

[0002] Optical Proximity Correction (OPC) is a lithography resolution enhancement technology that pre-compensates the mask pattern so that the wafer pattern can meet the design requirements as much as possible. In the actual integrated circuit layout design, the graphic information is embodied in the form of polygons. These polygons are mainly composed of horizontal and vertical edges, and there will also be a few bevel edges at other angles, such as 45-degree angles or 60-degree angles, etc. During the optical proximity correction process, special processing is required for the interruption of non-horizontal or vertical long edges and the placement of evaluation points, which is not convenient and fast enough. Summary of the Invention

[0003] In view of the above problems, the present invention provides a method, medium, product, and device for converting bevel edges in an integrated circuit layout that overcomes or at least partially solves the above problems.

[0004] One object of the present invention is to convert the bevel edge to facilitate the execution of subsequent correction operations;

[0005] Another further object of the present invention is to reduce the difference between the converted result and the original bevel edge.

[0006] Specifically, the present invention provides a method for converting bevel edges in an integrated circuit layout, including:

[0007] Obtaining a bevel edge to be converted in the integrated circuit layout that is non-parallel to both the first coordinate direction and the second coordinate direction;

[0008] Converting the bevel edge to be converted into a plurality of line segment combinations, where the line segment combinations include a first conversion edge parallel to the first coordinate direction and a second conversion edge parallel to the second coordinate direction, and the endpoints of the two conversion edges are connected;

[0009] Sequentially connecting the plurality of line segment combinations along the extension direction of the bevel edge to be converted, thereby completing the conversion of the bevel edge to be converted.

[0010] Optionally, the step of generating the line segment combination includes:

[0011] Selecting a conversion direction from the first coordinate direction and the second coordinate direction;

[0012] Obtaining a preset conversion step length corresponding to the bevel edge to be converted in the conversion direction, where the conversion step length is the length of the line segment obtained by projecting the bevel edge to be converted in the conversion direction;

[0013] Convert the hypotenuse to be converted according to the conversion direction and conversion step size to obtain the first converted side;

[0014] Calculate the second converted side through the first converted side, and connect the endpoints of the first converted side and the second converted side.

[0015] Optionally, the step of connecting multiple line segment combinations in sequence along the extension direction of the hypotenuse to be converted includes:

[0016] Determine the center points of all the converted sides in each line segment combination;

[0017] Connect multiple line segment combinations in sequence along the extension direction of the hypotenuse to be converted, so that the center points of all the converted sides are located on the hypotenuse to be converted.

[0018] Optionally, after the step of connecting multiple line segment combinations in sequence along the extension direction of the hypotenuse to be converted, it further includes:

[0019] Judge whether the hypotenuse to be converted can be completely converted according to the conversion step size;

[0020] If not, adjust the positions of multiple line segment combinations on the hypotenuse to be converted so that the first and last ends of the hypotenuse to be converted are evenly divided by the center points.

[0021] Optionally, the step of adjusting the positions of multiple line segment combinations on the hypotenuse to be converted so that the first and last ends of the hypotenuse to be converted are evenly divided by the center points includes:

[0022] Respectively obtain two center points close to the first and last ends on the hypotenuse to be converted as the target center points;

[0023] Move the positions of multiple line segment combinations as a whole, so that the distances from the two target center points to the endpoints of the first and last ends of the hypotenuse to be converted are equal.

[0024] Optionally, the step of selecting the conversion direction corresponding to the hypotenuse to be converted from the first coordinate direction and the second coordinate direction includes:

[0025] Project the hypotenuse to be converted onto the first coordinate direction and the second coordinate direction respectively, and select the one with the longer projection length in the projection results as the conversion direction.

[0026] Optionally, after the step of projecting the hypotenuse to be converted onto the first coordinate direction and the second coordinate direction respectively, it further includes:

[0027] When the projection results show that the projection lengths of the hypotenuse to be converted in the first coordinate direction and the second coordinate direction are the same, arbitrarily select one coordinate direction from the first coordinate direction and the second coordinate direction as the conversion direction.

[0028] According to another aspect of the present invention, there is also provided a computer-readable storage medium, on which a computer program is stored, and when the computer program is executed by a processor, the steps of the method for converting the hypotenuse in the integrated circuit layout of any one of the above are implemented.

[0029] According to still another aspect of the present invention, there is also provided a computer program product, which includes a computer program, and when the computer program is executed by a processor, the steps of the method for converting the hypotenuse in the integrated circuit layout of any one of the above are implemented.

[0030] According to yet another aspect of the present invention, there is also provided a computer device, including a memory, a processor, and a machine-executable program stored on the memory and running on the processor, and when the processor executes the machine-executable program, the steps of the method for converting the hypotenuse in the integrated circuit layout of any one of the above are implemented.

[0031] In the method for converting the hypotenuse in the integrated circuit layout of the present invention, first, a hypotenuse to be converted that is non-parallel to both the first coordinate direction and the second coordinate direction in the integrated circuit layout is obtained; subsequently, the hypotenuse to be converted is converted into a plurality of line segment combinations, and the line segment combinations include a first conversion side parallel to the first coordinate direction and a second conversion side parallel to the second coordinate direction, and the endpoints of the two conversion sides are connected; then, the plurality of line segment combinations are connected in sequence along the extending direction of the hypotenuse to be converted, thereby completing the conversion of the hypotenuse to be converted. By this method, the hypotenuse to be converted is converted into a line segment combination parallel to multiple coordinate directions. On the one hand, it can avoid special processing of the hypotenuse in the subsequent correction process, so as to facilitate the execution of the subsequent correction operation, thereby improving the optical proximity effect correction efficiency. On the other hand, it can reduce the difference between the converted result and the original hypotenuse, thereby ensuring the accuracy of the subsequent correction.

[0032] Those skilled in the art will become more clear about the above and other objects, advantages, and features of the present invention according to the following detailed description of the specific embodiments of the present invention in conjunction with the accompanying drawings. Description of the Drawings

[0033] Hereinafter, some specific embodiments of the present invention will be described in detail with reference to the accompanying drawings in an exemplary but non-limiting manner. The same reference numerals in the drawings denote the same or similar components or parts. Those skilled in the art should understand that these drawings are not necessarily drawn to scale. In the drawings:

[0034] Figure 1 is a schematic diagram of the hypotenuse in the integrated circuit layout according to an embodiment of the present invention;

[0035] Figure 2 is a schematic flowchart of the method for converting the hypotenuse in the integrated circuit layout according to an embodiment of the present invention;

[0036] Figure 3It is a schematic flowchart of the conversion method of the bevel edge in the integrated circuit layout according to another embodiment of the present invention;

[0037] Figure 4 It is a schematic diagram of the conversion direction of the bevel edge to be converted in an embodiment of the present invention;

[0038] Figure 5 It is a schematic diagram of the conversion step of the bevel edge to be converted in an embodiment of the present invention;

[0039] Figure 6 It is a schematic diagram of the center point of the conversion edge in an embodiment of the present invention;

[0040] Figure 7 It is a schematic diagram of the result that the first and last ends of the bevel edge to be converted are evenly divided by the center point in the conversion method of the bevel edge in the integrated circuit layout according to an embodiment of the present invention;

[0041] Figure 8 It is a schematic diagram of the bevel edge conversion process in the conversion method of the bevel edge in the integrated circuit layout according to an embodiment of the present invention;

[0042] Figure 9 It is a schematic diagram of a computer program product according to an embodiment of the present invention;

[0043] Figure 10 It is a schematic diagram of a computer-readable storage medium according to an embodiment of the present invention; and

[0044] Figure 11 It is a schematic diagram of a computer device according to an embodiment of the present invention. Detailed implementation manners

[0045] Those skilled in the art should understand that the embodiments described below are only a part of the embodiments of the present invention, rather than all the embodiments of the present invention. This part of the embodiments is intended to explain the technical principles of the present invention, rather than to limit the protection scope of the present invention. Based on the embodiments provided by the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts should still fall within the protection scope of the present invention.

[0046] It should be noted that the logic and / or steps represented in the flowchart or described in other ways herein, for example, can be considered as a definite sequence list of executable instructions for implementing logical functions, and can be specifically implemented in any computer-readable medium for use by an instruction execution system, apparatus or device (such as a computer-based system, a system including a processor, or other systems that can fetch instructions from the instruction execution system, apparatus or device and execute the instructions), or used in combination with these instruction execution systems, apparatus or devices.

[0047] In the current semiconductor manufacturing field, an integrated circuit layout is a graph that describes the circuit design and content at the physical level. The layout contains physical information such as the device type, size, relative position, and connection relationship of the integrated circuit. In the chip manufacturing process, the layout information is recorded on a photomask. The photomask forms a mask pattern on a transparent substrate with an opaque light-blocking film and projects the pattern onto a wafer through an exposure system. Ideally, the imaged pattern on the wafer should be exactly the same as the layout design on the photomask. Unfortunately, when the critical dimension of the mask pattern is smaller than the exposure wavelength, diffraction effects will cause image distortion on the wafer. If these distortions are not corrected, they may greatly change the electrical performance of the produced circuit.

[0048] For this situation, the method of optical proximity correction is generally used for correction. However, in the actual integrated circuit layout design, the graphic information is presented in the form of polygons. These polygons are mainly composed of horizontal and vertical sides, and there will be a few hypotenuse sides at other angles. Figure 1 It is a schematic diagram of the hypotenuse in an integrated circuit layout according to an embodiment of the present invention. As Figure 1 shown, on the premise that the horizontal direction is the x-axis and the vertical direction is the y-axis, the sides in the upper right corner and the lower left corner of the integrated circuit layout are hypotenuse sides, that is, convert edges. In the integrated circuit layout design, optical proximity correction is a key technology that can improve the accuracy and quality of the lithography process. However, if there are hypotenuse sides in the layout that are not parallel to the conventional coordinate directions (such as the x-axis and the y-axis), challenges will be faced in optical proximity correction. When the traditional processing method breaks and places evaluation points for non-horizontal or vertical long sides, special processing is required, and the operation is not convenient and efficient enough. The method of the present invention aims to convert these hypotenuse sides into a combination of line segments parallel to the coordinate directions, thereby improving the processing efficiency and accuracy of optical proximity correction.

[0049] To solve the above problems, the present invention proposes a method for converting hypotenuse sides in an integrated circuit layout. Figure 2 It is a schematic flowchart of the method for converting hypotenuse sides in an integrated circuit layout according to an embodiment of the present invention. As Figure 2 shown, the method for converting hypotenuse sides in this integrated circuit layout includes at least the following steps S201 to step S203.

[0050] Step S201: Obtain the hypotenuse to be converted in the integrated circuit layout that is non-parallel to both the first coordinate direction and the second coordinate direction. In some alternative embodiments, the first coordinate direction and the second coordinate direction are generally the x-axis and the y-axis in a set coordinate system. When there is a hypotenuse to be converted in the layout to be corrected that is non-parallel to both the first coordinate direction and the second coordinate direction, during the process of optical proximity correction, special processing is required for both interrupting such hypotenuses and placing evaluation points, which increases the difficulty of the correction process and thus seriously affects the correction efficiency.

[0051] Step S202: Convert the hypotenuse to be converted into a combination of multiple line segments. The line segment combination includes a first conversion side parallel to the first coordinate direction and a second conversion side parallel to the second coordinate direction, and the endpoints of the two conversion sides are connected. For the hypotenuse to be converted selected in step S201, in order to ensure the efficient execution of optical proximity correction without affecting the accuracy of the correction result, the method of the present invention chooses to convert the hypotenuse to be converted into a combination of multiple line segments, and the converted line segment combination is parallel to the coordinate direction. In subsequent optical proximity correction processing, the conventional algorithms for horizontal and vertical edges can be directly used without special processing for the hypotenuse, reducing the amount of calculation and processing time.

[0052] In addition, the present invention can control the similarity between the converted result and the original hypotenuse by adjusting the number of the line segment combination. The more the number of the line segment combination, the closer the combined shape is to the original hypotenuse, thus ensuring the accuracy of the optical proximity correction result while guaranteeing the processing efficiency.

[0053] Step S203: Connect the multiple line segment combinations in sequence along the extension direction of the hypotenuse to be converted, thereby completing the conversion of the hypotenuse to be converted. After the connection is completed, the conversion of the hypotenuse to be converted into a line segment combination parallel to the coordinate direction is achieved. In this way, when the converted layout is subjected to optical proximity correction processing, operations such as edge interruption and evaluation point placement can be carried out more conveniently, improving the efficiency of the entire optical proximity correction process. At the same time, since the converted line segment combination is very close to the original hypotenuse, the accuracy of the correction result is also guaranteed, reducing the lithography error caused by improper processing of the hypotenuse.

[0054] By converting the hypotenuse to be converted into a line segment combination parallel to multiple coordinate directions (i.e., converting the hypotenuse to be converted into a stepped line segment combination), on the one hand, it can avoid special processing of the hypotenuse in the subsequent correction process, facilitating the execution of subsequent correction operations, thereby improving the optical proximity effect correction efficiency. On the other hand, it can reduce the difference between the converted result and the original hypotenuse, thus ensuring the accuracy of subsequent corrections.

[0055] In some alternative embodiments, the generation steps of the line segment combination generally may include: selecting a conversion direction from a first coordinate direction and a second coordinate direction; obtaining a preset conversion step length corresponding to the hypotenuse to be converted in the conversion direction, where the conversion step length is the length of the line segment obtained by projecting the hypotenuse to be converted in the conversion direction; converting the hypotenuse to be converted according to the conversion direction and the conversion step length to obtain a first converted side; calculating a second converted side from the first converted side, and connecting the endpoints of the first converted side and the second converted side. By this method, a line segment combination can be generated. Subsequently, by repeating this operation, the hypotenuse to be converted can be converted into a line segment combination as completely as possible.

[0056] The conversion step length generally can be preset, and the conversion step length determines the division granularity of the line segment combination. A suitable conversion step length can control the number of line segment combinations on the premise of ensuring the conversion accuracy. If the step length is too large, the number of generated line segment combinations is small, which may lead to a large difference between the converted result and the original hypotenuse; if the step length is too small, the number of line segment combinations will increase. Although it can approximate the original hypotenuse more accurately, it will increase the complexity and computational amount of subsequent processing. Those skilled in the art can set the size of the conversion step length according to the actual situation.

[0057] An alternative example is Figure 5 shown as Figure 5 a schematic diagram of the conversion step length of the hypotenuse to be converted in an embodiment of the present invention. The step length of the ladder along the conversion direction is defined as the conversion step length (step length), and the step length of the ladder perpendicular to the conversion direction can be automatically calculated and generated according to the converted side length, angle, conversion step length, etc. after determining the conversion direction and the conversion step length. For example, if the first converted side is parallel to the x-axis, then the second converted side is parallel to the y-axis. The length of the second converted side can be calculated from the slope of the hypotenuse and the length of the first converted side. Then, the endpoints of the first converted side and the second converted side are connected to form a line segment combination. The line segment combination generated through the above steps can effectively convert the hypotenuse to be converted into a line segment form parallel to the coordinate direction, avoiding the complexity of special processing of the hypotenuse in optical proximity correction processing and improving the processing efficiency. At the same time, by reasonably selecting the conversion direction and step length, it can be ensured that the difference between the converted line segment combination and the original hypotenuse is small, ensuring the accuracy of subsequent correction.

[0058] Optionally, the step of selecting the conversion direction corresponding to the hypotenuse to be converted in the first coordinate direction and the second coordinate direction generally may include: projecting the hypotenuse to be converted onto the first coordinate direction and the second coordinate direction respectively, and selecting the side with the longer projection length in the projection results as the conversion direction. When selecting the conversion direction, project the hypotenuse to be converted onto the x-axis and the y-axis respectively. Compare the lengths of these two projections, and select the direction with the longer projection length as the conversion direction. For example, if the projection length of the hypotenuse to be converted on the x-axis is 8 units and the projection length on the y-axis is 5 units, then select the x-axis as the conversion direction. An optional example is as Figure 4 shown Figure 4 is a schematic diagram of the conversion direction of the hypotenuse to be converted in an embodiment of the present invention. Project the hypotenuse onto the x-axis and the y-axis respectively, and then select the direction with the longer projection length as the conversion direction. Selecting the direction with the longer projection length as the conversion direction can make the generated line segment combination more effectively approximate the original hypotenuse. Because the longer projection direction provides more space to divide the line segment combination, thereby reducing the error between the converted line segment combination and the original hypotenuse and improving the conversion accuracy.

[0059] Optionally, after the step of projecting the hypotenuse to be converted onto the first coordinate direction and the second coordinate direction respectively, it generally may further include: in the case where the projection results show that the projection lengths of the hypotenuse to be converted in the first coordinate direction and the second coordinate direction are the same, arbitrarily select one of the first coordinate direction and the second coordinate direction as the conversion direction.

[0060] In some other optional embodiments, the step of sequentially connecting multiple line segment combinations along the extending direction of the hypotenuse to be converted generally may include: determining the center points of all the conversion sides in each line segment combination; sequentially connecting multiple line segment combinations along the extending direction of the hypotenuse to be converted, so that the center points of all the conversion sides are located on the hypotenuse to be converted. An optional example is as Figure 6 shown Figure 6 is a schematic diagram of the center points of the conversion sides in an embodiment of the present invention. From Figure 6It can be seen that the midpoints of each conversion edge are located on the hypotenuse to be converted. When the central points of all conversion edges are located on the hypotenuse to be converted, the combined converted line segments can fit more closely to the original hypotenuse. Since the central points are key position points of the line segments, their accurate positioning ensures that the combined line segments are highly similar in overall shape to the original hypotenuse, reducing the error between the converted shape and the original hypotenuse. In optical proximity correction processing, many algorithms and operations are based on the edge features of the pattern. When the central points of the conversion edges are located on the hypotenuse, subsequent operations such as edge breaking and placement of evaluation points can more accurately simulate the optical characteristics of the original hypotenuse, improving the accuracy and reliability of optical proximity correction processing. At the same time, this regular connection method also makes subsequent calculations and analyses more convenient, improving the processing efficiency.

[0061] During the conversion process, due to the relationship between the length of the hypotenuse and the conversion step size, it may not be possible to complete the hypotenuse conversion entirely based on the conversion step size. Therefore, it is necessary to make a judgment and perform corresponding adjustments to ensure that the combined converted line segments can more accurately approximate the original hypotenuse, thereby improving the accuracy and effect of optical proximity correction processing. Therefore, in some alternative embodiments, after the step of sequentially connecting multiple combined line segments along the extension direction of the hypotenuse to be converted, it generally further includes: determining whether the hypotenuse to be converted can be completely converted according to the conversion step size; if not, adjusting the positions of the multiple combined line segments on the hypotenuse to be converted so that the first and last ends of the hypotenuse to be converted are evenly divided by the central points. Because if the hypotenuse cannot be completely converted according to the conversion step size, directly connecting the combined line segments may result in a large deviation between the combined converted line segments and the original hypotenuse at the first and last ends. This will affect the accuracy of subsequent optical proximity correction processing. For example, it may cause pattern distortion during the lithography process, reducing the manufacturing quality of integrated circuits.

[0062] Optionally, the step of adjusting the positions of the multiple combined line segments on the hypotenuse to be converted so that the first and last ends of the hypotenuse to be converted are evenly divided by the central points generally includes: respectively obtaining two central points near the first and last ends on the hypotenuse to be converted as target central points; moving the positions of the multiple combined line segments as a whole so that the distances from the two target central points to the endpoints of the first and last ends of the hypotenuse to be converted are equal. An alternative example is Figure 7 shown as Figure 7 a schematic diagram of the result of evenly dividing the first and last ends of the hypotenuse to be converted in the method for converting the hypotenuse in an integrated circuit layout according to an embodiment of the present invention. As can be seen from Figure 7 this, when the distances from the two target central points to the endpoints of the first and last ends of the hypotenuse to be converted are equal, the distribution of the combined converted line segments at the first and last ends of the hypotenuse is more symmetric and uniform. This can reduce the error between the combined converted line segments and the original hypotenuse, improving the accuracy of optical proximity correction processing. During the lithography process, it can make the exposed pattern closer to the designed layout, enhancing the performance and reliability of integrated circuits.

[0063] Another optional example is as follows Figure 8 shown Figure 8 is a schematic diagram of the bevel conversion process in the method for converting bevels in an integrated circuit layout according to an embodiment of the present invention. First, determine the bevel to be converted (convert edge), such as Figure 8 shown in A. The projection length of the bevel to be converted (convert edge) in the first coordinate direction (e.g., the x-axis) is called the projection length x (i.e., projection length x), and the projection length of the bevel to be converted (convert edge) in the second coordinate direction (e.g., the y-axis) is called the projection length y (i.e., projection length y). As can be seen from Figure 8 A, since the projection length x is greater than the projection length y, the x-axis is determined as the conversion direction. Subsequently, determine the conversion step length of the bevel to be converted on the x-axis (as shown by step length in Figure 8 B), and convert it into a combination of multiple line segments. Then, determine the center point of each line in the line segment combination, and connect the multiple line segment combinations in sequence along the extension direction of the bevel to be converted, so that the center points of all converted edges are located on the bevel to be converted. As can be seen from Figure 8 B, the bevel to be converted cannot be completely converted according to the conversion step length. Therefore, it is necessary to ensure that the first and last ends of the bevel to be converted can be evenly divided by the center points. The final conversion result is as shown in Figure 8 C. The bevel to be converted is converted into a stepped line segment combination, and each line segment can be parallel to the x-axis or the y-axis. In this way, when the converted layout is subjected to optical proximity correction processing, operations such as edge breaking and evaluation point placement can be more conveniently performed, improving the efficiency of the entire optical proximity correction process. At the same time, since the converted line segment combination is very close to the original bevel, the accuracy of the correction result is also ensured, reducing the lithography error caused by improper bevel processing.

[0064] Figure 3 is a schematic diagram of the flow of the method for converting bevels in an integrated circuit layout according to another embodiment of the present invention. As shown in Figure 3 shown, the method for converting bevels in this integrated circuit layout at least includes the following steps S301 to step S308.

[0065] Step S301: Obtain the hypotenuse to be converted in the integrated circuit layout that is non - parallel to both the first coordinate direction and the second coordinate direction. An optional embodiment is as follows: Traverse and analyze all the edges in the layout. By judging the angles between the edges and the first coordinate direction and the second coordinate direction, filter out the edges that are neither parallel to the first coordinate direction nor parallel to the second coordinate direction, and determine them as the hypotenuses to be converted. Accurately identifying the hypotenuses to be converted is the basis for subsequent processing. These hypotenuses cannot directly use the conventional algorithm in OPC processing and need to be specially converted. Therefore, they need to be distinguished from the layout first.

[0066] Step S302: Determine the conversion direction and conversion step length of the hypotenuse to be converted. Optionally, the method for determining the conversion direction can be to project the hypotenuse to be converted onto the first coordinate direction and the second coordinate direction respectively, compare the lengths of the two projections, and select the direction with the longer projection length as the conversion direction. If the lengths of the two projections are equal, either direction can be arbitrarily selected. Selecting the appropriate conversion direction in this way can make the subsequent generated line segment combinations fit the original hypotenuse more closely, reducing the conversion error. The conversion step length is the length of the line segment obtained by projecting the hypotenuse to be converted in the selected conversion direction. The conversion step length determines the division granularity of the line segment combination. An appropriate step length can control the number of line segment combinations while ensuring the conversion accuracy, avoiding excessive computational complexity.

[0067] Step S303: Convert the hypotenuse to be converted into multiple line segment combinations according to the conversion direction and conversion step length. In some optional embodiments, the conversion method can specifically include: Starting from one end of the hypotenuse to be converted, along the conversion direction, intercept line segments in sequence according to the conversion step length to form the first conversion edge parallel to the conversion direction. Then, according to the geometric relationship of the hypotenuse, determine the second conversion edge perpendicular to the first conversion edge (parallel to the other coordinate direction) so that the endpoints of the two conversion edges are connected to form a line segment combination. Each line segment combination is similar to a stepped shape. Repeat this process until the entire hypotenuse is covered. After converting the hypotenuse into line segment combinations in this way, the subsequent OPC processing can use the conventional algorithm for line segments parallel to the coordinate direction, simplifying the processing flow and improving the processing efficiency.

[0068] Step S304: Determine the center points of all the conversion edges in each line segment combination. The center point is an important reference point for subsequent connecting line segment combinations and judging the conversion accuracy. By controlling the position of the center point, the relative position relationship between the line segment combination and the original hypotenuse can be ensured.

[0069] Optionally, the method for determining the center point can be: For the first conversion edge and the second conversion edge in each line segment combination, calculate the average value of the coordinates of their two endpoints respectively to obtain the center point coordinates of each.

[0070] Step S305, connect multiple line segment combinations in sequence along the extending direction of the hypotenuse to be converted, so that the central points of all converted edges are located on the hypotenuse to be converted. In this way, when the central points of all converted edges are located on the hypotenuse, the converted line segment combination can more accurately approximate the original hypotenuse, improving the conversion accuracy and providing a more reliable basis for subsequent OPC processing.

[0071] Step S306, determine whether the hypotenuse to be converted can be completely converted according to the conversion step length.

[0072] Step S307, in the case where the determination in Step S306 is no, adjust the positions of the multiple line segment combinations on the hypotenuse to be converted so that the head and tail ends of the hypotenuse to be converted are evenly divided by the central point. By adjusting the positions of the line segment combinations, the head and tail ends of the hypotenuse are evenly divided by the central point, which can reduce the error between the converted line segment combination and the original hypotenuse, further improving the conversion accuracy and ensuring that the OPC processing result is closer to the design requirements.

[0073] Step S308, in the case where the determination in Step S306 is yes, complete the conversion of the hypotenuse to be converted. In the case where the determination in Step S306 is yes, it means that the hypotenuse can be completely converted according to the conversion step length. At this time, the hypotenuse to be converted can be directly converted into multiple line segment combinations according to the conversion step length, thus converting the original hypotenuse into a stepped combination.

[0074] By using this method to convert the hypotenuse to be converted into line segment combinations parallel to multiple coordinate directions (that is, converting the hypotenuse to be converted into a stepped line segment combination), on the one hand, it can avoid special processing of the hypotenuse during subsequent correction processes, facilitating the execution of subsequent correction operations, thereby improving the optical proximity effect correction efficiency. On the other hand, multiple line segment combinations can reduce the difference between the converted result and the original hypotenuse, thus ensuring the accuracy of subsequent corrections.

[0075] The method for converting the hypotenuse in the integrated circuit layout provided by the present invention makes the subsequent processing of the converted layout graphics more convenient. Horizontal or vertical edges can be completely controlled to be placed on the grid points of the GDS file, greatly reducing the geometric dimension error. In the optical proximity correction process, horizontal or vertical edges are more friendly to the placement of evaluation points compared to hypotenuses, and can ensure unified settings.

[0076] The flowchart provided in this embodiment is not intended to indicate that the operations of the method will be executed in any specific order, or that all operations of the method are included in every case. In addition, the method may include additional operations. Within the scope of the technical concept provided by the method in this embodiment, additional changes can be made to the above method.

[0077] It should be understood that in some embodiments, each part can be implemented by hardware, software, firmware, or a combination thereof. In the above embodiments, multiple steps or methods can be implemented by software or firmware stored in a memory and executed by a suitable instruction execution system.

[0078] This embodiment also provides a computer program product 10, a computer-readable storage medium 20, and a computer device 30. Figure 9 is a schematic diagram of a computer program product 10 according to an embodiment of the present invention, Figure 10 is a schematic diagram of a computer-readable storage medium 20 according to an embodiment of the present invention, Figure 11 is a schematic diagram of a computer device 30 according to an embodiment of the present invention. The computer program product 10 includes a computer program 11, and when the computer program 11 is executed by a processor 32, it implements the steps of the method for converting the hypotenuse in the integrated circuit layout of any one of the above. The computer-readable storage medium 20 stores the above computer program 11, and when the computer program 11 is executed by a processor 32, it implements the steps of the method for converting the hypotenuse in the integrated circuit layout of any one of the above embodiments. The computer device 30 may include a memory 31, a processor 32, and a computer program 11 stored on the memory 31 and running on the processor 32.

[0079] The computer program 11 for performing the operations of the present invention may be assembly instructions, instruction set architecture (ISA) instructions, machine instructions, machine-related instructions, microcode, firmware instructions, state setting data, configuration data of an integrated circuit, or source code or object code written in any combination of one or more programming languages and procedural programming languages. The computer program 11 may be executed entirely on the user's computer, partially on the user's computer, executed as a stand-alone software package, partially on the user's computer and partially on a remote computer, or entirely on a remote computer or server. In the latter case, the remote computer may be connected to the user's computer through any type of network, including a local area network (LAN) or a wide area network (WAN), or may be connected to an external computer (e.g., using the Internet through an Internet service provider). In some embodiments, in order to perform aspects of the present invention, an electronic circuit, including, for example, a programmable logic circuit, a field-programmable gate array (FPGA), or a programmable logic array (PLA), may execute computer-readable program instructions by utilizing the state information of the computer-readable program instructions to personalize the electronic circuit.

[0080] For the description of this embodiment, the computer program product 10 is a related product containing the computer program 11. For the description of this embodiment, the computer-readable storage medium 20 is a tangible device capable of retaining and storing the computer program 11, which may be any device that can contain, store, communicate, propagate, or transmit the program 11 for use by or in connection with an instruction execution system, apparatus, or device. More specific examples (non-exhaustive list) of the computer-readable storage medium 20 include the following: portable computer disks, hard disks, random access memory (RAM), read-only memory (ROM), erasable programmable read-only memory (EPROM or flash memory), static random access memory (SRAM), portable compact disc read-only memory (CD-ROM), digital versatile disc (DVD), memory stick, floppy disk, mechanically encoded device, and any suitable combination of the above.

[0081] The computer device 30 can be, for example, a server, a desktop computer, a laptop computer, a tablet computer, or a smart phone. In some examples, the computer device 30 can be a cloud computing node. The computer device 30 can be described in the general context of computer system executable instructions, such as program modules, executed by a computer system. Generally, program modules can include routines, programs, object programs, components, logic, data structures, etc. that perform particular tasks or implement particular abstract data types. The computer device 30 can be implemented in a distributed cloud computing environment where tasks are performed by remote processing devices linked through a communication network. In a distributed cloud computing environment, program modules can be located on local or remote computing system storage media including storage devices.

[0082] The computer device 30 can include a processor 32 adapted to execute stored instructions and a memory 31 that provides temporary storage space for the operation of the instructions during operation. The processor 32 can be a single-core processor, a multi-core processor, a computing cluster, or any number of other configurations. The memory 31 can include random access memory (RAM), read-only memory, flash memory, or any other suitable storage system.

[0083] The computer device 30 can also include a network adapter / interface and an input / output (I / O) interface. The I / O interface allows data to be input and output with external devices that can be connected to the computer device. The network adapter / interface can provide communication between the computer device and a network, which is typically shown as a communication network.

[0084] At this point, those skilled in the art should recognize that although numerous exemplary embodiments of the present invention have been shown and described in detail herein, many other variations or modifications consistent with the principles of the present invention can still be directly determined or derived from the disclosure of the present invention without departing from the spirit and scope of the present invention. Therefore, the scope of the present invention should be understood and construed to cover all such other variations or modifications.

Claims

1. A method for converting a bevel in an integrated circuit layout, comprising: Acquire a hypotenuse to be converted in the integrated circuit layout that is not parallel to the first coordinate direction and the second coordinate direction; Convert the oblique edge to be converted into a plurality of line segment combinations, wherein the line segment combinations include a first conversion edge parallel to the first coordinate direction and a second conversion edge parallel to the second coordinate direction, and the endpoints of the two conversion edges are connected; The plurality of line segment combinations are sequentially connected along the extension direction of the oblique edge to be converted, thereby completing the conversion of the oblique edge to be converted.

2. The method for converting bevel edges in an integrated circuit layout according to claim 1, wherein: The step of generating the line segment combination comprises: Selecting a conversion direction between the first coordinate direction and the second coordinate direction; Obtaining a preset conversion step length corresponding to the oblique side to be converted in the conversion direction, wherein the conversion step length is a line segment length obtained by projecting the oblique side to be converted in the conversion direction; Convert the oblique edge to be converted according to the conversion direction and the conversion step length to obtain the first conversion edge; The second conversion edge is calculated by the first conversion edge, and the endpoints of the first conversion edge and the second conversion edge are connected.

3. The method for converting bevel edges in an integrated circuit layout according to claim 2, wherein: The step of sequentially connecting the plurality of line segment combinations along the extension direction of the oblique edge to be converted comprises: Determine the center points of all the converted edges in each of the line segment combinations; A plurality of line segment combinations are sequentially connected along the extension direction of the oblique edge to be converted, so that the center points of all the converted edges are located on the oblique edge to be converted.

4. The method for converting bevel edges in an integrated circuit layout according to claim 3, wherein: After the step of sequentially connecting the plurality of line segment combinations along the extension direction of the oblique edge to be converted, the following step further comprises: Determining whether the bevel to be converted can be completely converted according to the conversion step size; If not, the positions of the plurality of line segment combinations on the hypotenuse to be converted are adjusted so that both ends of the hypotenuse to be converted are evenly divided by the center point.

5. The method for converting bevel edges in an integrated circuit layout according to claim 4, wherein: The step of adjusting the positions of the plurality of line segments combined on the hypotenuse to be converted so that both ends of the hypotenuse to be converted are equally divided by the center point comprises: Respectively obtain the two center points close to the first and last ends of the bevel to be converted as target center points; The positions of the plurality of line segment combinations are moved as a whole so that the distances from the two target center points to the first and second end points of the hypotenuse to be converted are equal.

6. The method for converting bevel edges in an integrated circuit layout according to claim 2, wherein: The step of selecting the conversion direction corresponding to the oblique edge to be converted in the first coordinate direction and the second coordinate direction comprises: The oblique side to be converted is projected respectively in the first coordinate direction and the second coordinate direction, and the one with the longer projection length is selected as the conversion direction in the projection results.

7. The method for converting bevel edges in an integrated circuit layout according to claim 6, wherein: After the step of projecting the oblique side to be converted respectively to the first coordinate direction and the second coordinate direction, the step further includes: When the projection result shows that the projection lengths of the hypotenuse to be converted in the first coordinate direction and the second coordinate direction are consistent, one coordinate direction is arbitrarily selected from the first coordinate direction and the second coordinate direction as the conversion direction.

8. A computer-readable storage medium having a computer program stored thereon, wherein when the computer program is executed by a processor, the steps of the method for converting a bevel in an integrated circuit layout according to any one of claims 1 to 7 are implemented.

9. A computer program product, comprising a computer program, which, when executed by a processor, implements the steps of the method for converting a bevel edge in an integrated circuit layout according to any one of claims 1 to 7.

10. A computer device comprising a memory, a processor, and a machine executable program stored in the memory and running on the processor, wherein the processor can implement the steps of the method for converting bevel edges in an integrated circuit layout according to any one of claims 1 to 7 when executing the machine executable program.

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