Cleaning device, processing device and method for cleaning and processing pot-shaped hollow bodies, in particular transport container for semiconductor wafers or lithographic masks

Abstract

The invention relates to a cleaning device (44) for cleaning pot-shaped hollow bodies (12), the cleaning device (44) comprising at least one side wall (46) delimiting a cleaning space (50), which side wall (46) forms at least one device opening (48) through which a hollow body (12) closed by a lid (30) can be introduced into the cleaning space (50) by means of a gripping and moving device (18) in order to clean an outer surface (32) of the hollow body, the cleaning device (44) comprises at least one supply device (52) for supplying a cleaning fluid to the hollow body outer surface (32) of the hollow body (12) closed by the lid (30), the device opening (48) being configured such that the gripping and moving device (18) at least partially protrudes into the cleaning space (50) at least when the cleaning fluid is supplied or terminates flush with the device opening (48). The invention further relates to a treatment device (42) having such a cleaning device (44), and to a method for cleaning pot-shaped hollow bodies using such a treatment device (42).

Description

[0001] The present invention relates to a cleaning device for cleaning a hollow can-shaped body, in particular to a transport container for semiconductor wafers or lithography masks. Furthermore, the present invention relates to a processing device and a method for processing a hollow can-shaped body, in particular to a transport container for semiconductor wafers or lithography masks.

[0002] Today, the manufacture of highly integrated electronic circuits and other sensitive semiconductor components takes place in factories where so-called semiconductor wafers are subjected to a large number of processing steps. A large part of these processing steps takes place in clean rooms, where great efforts are made to remain free of contaminants, in particular free of particles. Such complex processing is necessary because particles in contact with the semiconductor material of the semiconductor wafer in particular affect the material properties of the semiconductor wafer, resulting in defects, unusability and the need to scrap entire production batches.

[0003] Since maintaining cleanliness becomes increasingly important as the integration density of semiconductor circuits increases and the cost of maintaining cleanliness grows exponentially as the size of the clean room increases, semiconductor wafers are not transported from one processing station to the next in an "open" state. Instead, special transport containers (so-called FOUPs, front-opening unified pod) are used. They are considered box-shaped transport containers into which a large number of semiconductor wafers can be placed. FOUPs are usually closed by a removable lid. Without the lid, FOUPs have a can-shaped basic shape with a rectangular base. When the FOUPs are closed by the lid, the semiconductor wafers placed therein can be transported from one clean room to another without being affected by the outside world. When the FOUPs reach the processing station, they are opened, the semiconductor wafers are taken out and processed accordingly. After the processing is completed, the semiconductor wafers are transported back to the FOUPs and then conveyed to the next processing station.

[0004] Since contamination of the semiconductor wafers can lead to long production interruptions, the FOUPs need to be cleaned regularly. The FOUPs are particularly contaminated by wafer wear debris when the semiconductor wafers are inserted and removed.

[0005] The same applies to transport containers for lithography masks, such as transport containers for extreme ultraviolet (EUV) lithography masks ("extreme ultraviolet radiation"). EUV lithography masks are used for the manufacture of very small integrated circuits. Lithography masks, like semiconductors, also need to be transported and the situation is similar. When FOUPs are mentioned below, the relevant descriptions also apply to transport containers for lithography masks.

[0006] For example, devices for cleaning FOUPs are known from US Patent US 5,238,703 A, International Patent WO 2005 / 001888 A2, German Patent DE 102020 129 469 A1, and European Patent EP 1 899 084 B1.

[0007] When using these devices, both the inner and outer surfaces of the FOUPs are cleaned. Generally, the outer surface of the FOUPs is much more contaminated than the inner surface. Therefore, during the cleaning process, the cleaning fluid accumulates particles from both the outer and inner surfaces. In this way, particles may be transferred from the outer surface to the inner surface. However, a satisfactory cleaning effect can only be obtained when the number of particles is below a certain value. Due to the presence of particles from the outer surface, the cleaning process must continue for a relatively long time to remove a sufficient number of particles. This is disadvantageous. On the one hand, the amount of cleaning fluid required is relatively large; on the other hand, the FOUPs cannot be used for transporting semiconductor wafers during the cleaning process, thus increasing the production cost of semiconductor wafers.

[0008] In the aforementioned DE 10 2020 129 469 A1, the outer and inner surfaces can be cleaned in the same cleaning device. The first cleaning head is used to clean the inner surface, and the second cleaning head is used to clean the outer surface. Here, the lid is separated from the rest of the FOUP, and the FOUP is placed on the support wall of the cleaning device such that the FOUP is sealed with the support wall. The first cleaning head extends into the internal space of the FOUP. The second cleaning head is U-shaped and is rotatably supported on the side wall of the cleaning device around a rotation axis. The cleaning fluid for cleaning the inner surface can be guided in a determined manner, but this is not the case for the cleaning fluid for cleaning the outer surface. To prevent the uncontrolled distribution of the cleaning fluid for cleaning the outer surface, a cover is provided, which surrounds the FOUP and the second cleaning head when the FOUP is placed on the support wall. The cover and the mechanism for opening and closing the cover require high equipment costs. As mentioned before, the outer surface of the FOUP is usually more contaminated than the inner surface. However, since the FOUP is mostly closed by the lid, the requirements for cleaning the inner surface are much higher than those for cleaning the outer surface. To this extent, the equipment costs for cleaning the outer surface of the FOUP are disproportionate to the requirements in some applications. Therefore, in some applications, the cleaning of the outer surface is omitted. However, this increases the risk of producing batches of defective and unusable semiconductor wafers, so omitting the cleaning of the outer surface is not the best option either.

[0009] The object of an embodiment of the present invention is to provide a cleaning device and a processing device that solve the above-mentioned drawbacks in a simple and low-cost manner, and in particular can clean the outer surface of a hollow body at a relatively low equipment cost. In addition, a basic object of an embodiment of the present invention is to provide a corresponding method for cleaning the outer surface of a hollow body.

[0010] This object is solved by the features defined in claims 1, 12, and 16. Advantageous embodiments are the subject matter of the dependent claims.

[0011] An embodiment of the present invention relates to a cleaning device for cleaning a can-shaped hollow body, in particular a transport container for semiconductor wafers or lithography masks, wherein:

[0012] The hollow body has a hollow body wall, which:

[0013] a) forms a hollow body opening that can be or has been closed by a lid;

[0014] b) forms the outer surface of the hollow body;

[0015] The cleaning device:

[0016] a) includes at least one side wall defining a cleaning space, wherein:

[0017] b) the side wall forms at least one device opening through which a lid-closed hollow body can be introduced into the cleaning space by means of a gripping and moving device in order to clean the outer surface of the hollow body;

[0018] c) includes at least one supply device for supplying a cleaning fluid to the outer surface of the lid-closed hollow body;

[0019] The device opening is configured such that the gripping and moving device extends at least partially into the cleaning space or terminates flush with the device opening, at least when supplying the cleaning fluid; and / or

[0020] A placement device is provided in the cleaning space on which the gripping and moving device can place the lid-closed hollow body in order to supply the cleaning fluid.

[0021] An important aspect of the cleaning device according to this solution is that the outer surface of the hollow body can be cleaned when the hollow body is closed by a lid. To this extent, it is not necessary to separate the lid from the rest of the hollow body for this purpose, thus saving time accordingly. In addition, the outer surface of the hollow body can be cleaned when the gripping and moving device is connected to the hollow body. Therefore, it is not necessary to place it in a defined position. When cleaning the outer surface of the hollow body, the gripping and moving device can translate and / or rotate the hollow body within a certain range so that the cleaning fluid used can also reach hard-to-reach parts.

[0022] If required, the cleaning device can be equipped with a placement device on which a hollow body enclosed by a lid can be placed. After placement, the connection between the hollow body and the grasping and moving device can be released. When supplying cleaning fluid to the outer surface of the hollow body, the grasping and moving device can move other hollow bodies. Especially when the cleaning process in the cleaning device takes a long time, the grasping and moving device can perform other tasks, thus making more efficient use.

[0023] As the cleaning fluid, for example, nitrogen or compressed air can be used, and particularly preferably, extremely clean dry air, also known as XCDA, can be used. However, water can also be used.

[0024] According to another embodiment, the supply device can include a plurality of discharge nozzles facing or leading to the cleaning space. Using the discharge nozzles can impart a specific flow direction to the cleaning fluid, thereby ensuring that the entire outer surface of the hollow body comes into contact with the cleaning fluid. Thus, effective and thorough cleaning of the outer surface of the hollow body is achieved.

[0025] In a further improved embodiment, the discharge nozzles arranged in the side wall can include through holes or be formed by through holes. This can reduce the required structural space. In addition, the through holes can be distributed over the entire side wall so that the cleaning fluid can be evenly introduced into the cleaning space.

[0026] In a further improved embodiment:

[0027] The supply device can be provided with through holes in the side wall;

[0028] The discharge nozzles are fixed to the side wall, in fluid communication with the through holes, and lead to the cleaning space.

[0029] In this embodiment, the discharge nozzles are arranged in the cleaning space and in fluid communication with the through holes. Therefore, the cleaning fluid first flows through the through holes and then through the discharge nozzles. The discharge nozzles can be arranged relatively close to the hollow body. Thus, the cleaning fluid can be very specifically guided to specific parts of the outer surface of the hollow body, such as those parts that experience has shown to be more contaminated and / or more difficult to reach than other parts. This also contributes to thorough cleaning of the outer surface of the hollow body.

[0030] In another embodiment, the supply device can include a plurality of supply channels communicating with the discharge nozzles, and the cleaning fluid can be transported to the discharge nozzles through these supply channels. In principle, each discharge nozzle can be connected to its own supply channel, but this requires relatively high equipment costs. In this embodiment, the supply channels can be connected to a plurality of discharge nozzles, thereby reducing equipment costs.

[0031] The features of a further improved embodiment may lie in that the supply channel is fixed to the side wall and communicates with the through hole. Since the side wall is required anyway to define the cleaning space, in this embodiment, the side wall can also be used to accommodate the supply channel. This can eliminate the need for additional fixing or accommodating structures for the supply channel, thereby reducing the structural space and equipment costs.

[0032] According to another embodiment, the supply device may have a plurality of first discharge nozzles for supplying a first cleaning fluid to the cleaning space and a plurality of second discharge nozzles for supplying a second cleaning fluid to the cleaning space. In this embodiment, for example, the outer surface of the hollow body can be first cleaned with the first cleaning fluid (especially water), and then cleaned with the second cleaning fluid (especially air). The air also has a drying effect, thereby improving the cleaning effect. However, depending on the different hollow bodies to be cleaned, only the first cleaning fluid or only the second cleaning fluid can also be used without modifying the cleaning device for this purpose.

[0033] In another embodiment, it may be appropriate for the cleaning device to have a plurality of guide plates arranged in or cooperating with the cleaning space for guiding the cleaning fluid within the cleaning space. As described with respect to the discharge nozzles, a specific flow direction can also be imparted to the cleaning fluid within the cleaning space by the guide plates. By means of the guide plates, it can also be ensured that the cleaning fluid reaches the entire outer surface of the hollow body and / or flows more towards the parts that are usually more contaminated or more difficult to reach.

[0034] In a further improved embodiment, the guide plates can be adjusted by a drive unit. Since the guide plates can be adjusted, the flow of the cleaning fluid can be adapted to hollow bodies of different shapes. In addition, the flow of the cleaning fluid within the cleaning space can be made to have a certain dynamic nature by means of the guide plates, thereby also improving the cleaning effect.

[0035] In another embodiment, the cleaning device has a closing unit through which the device opening can be at least partially closed. In particular, when applying the cleaning fluid to the outer surface of the hollow body, the device opening is closed.

[0036] The closing unit can prevent or limit the uncontrolled discharge of the cleaning fluid, especially when gaseous fluids such as nitrogen or compressed air are used. The closing unit can be formed in the form of a cover for closing the device opening. Here, the cover can be constructed such that when the cleaning fluid is supplied and the gripping and moving device extends into the cleaning space, it also closes the device opening at least to a large extent. For example, the cover can have a plurality of movable parts that can move to a position very close to the gripping and moving device when the hollow body fixed to the gripping and moving device extends into the cleaning space. If the cleaning device has a placement device on which the hollow body can be placed, then when the cleaning fluid is applied to the outer surface of the hollow body, the gripping and moving device can be separated from the hollow body. Then the closing unit can close the entire device opening.

[0037] In another embodiment, the cleaning device has at least one discharge opening communicating with the cleaning space through which the cleaning fluid or the first cleaning fluid and the second cleaning fluid can be discharged from the cleaning space. This can create a controllable flow in the cleaning space without generating significant turbulence and without forming dead zones on the outer surface of the hollow body where the cleaning fluid cannot act or acts insufficiently. In addition, the cleaning fluid with particles can be discharged from the cleaning device in a controlled manner so that these particles do not accumulate again on the outer surface of the hollow body.

[0038] One embodiment of the present invention relates to a processing device for processing a hollow body in the shape of a can, in particular for a transport container for semiconductor wafers or lithography masks, the processing device comprising:

[0039] A boundary wall surrounding the internal space;

[0040] A gripping and moving device arranged in the internal space for moving the hollow body within the internal space;

[0041] A wall opening formed by the boundary wall through which the internal space can be accessed;

[0042] At least one processing unit for processing the hollow body; and

[0043] A cleaning device according to any one of the foregoing embodiments, wherein:

[0044] During the supply of the cleaning fluid, the hollow body enclosed by the lid is connected to the gripping and moving device and, through the gripping and moving device:

[0045] a) is introduced into the cleaning space;

[0046] b) is removed from the cleaning space;

[0047] c) is held within the cleaning space during the supply of the cleaning fluid.

[0048] The technical effects and advantages achievable by the processing device of this solution correspond to the effects and advantages discussed for this cleaning device. Generally speaking, it must be pointed out that the outer surface of the hollow body can be cleaned without separating the lid from the rest of the hollow body, thus saving time accordingly. In addition, when the grasping and moving device is connected to the hollow body ("dynamic cleaning"), the outer surface of the hollow body can be cleaned. Therefore, there is no need to place it in a definite position. When cleaning the outer surface of the hollow body, the grasping and moving device can move the hollow body within a certain range, such as pivoting and / or rotating, so that the cleaning fluid used can also reach hard-to-reach parts.

[0049] If necessary, the cleaning device can be equipped with a placement device on which the hollow body enclosed with the lid can be placed. After placement, the connection between the hollow body and the grasping and moving device can be released. When supplying the cleaning fluid to the outer surface of the hollow body, the grasping and moving device can move other hollow bodies. Especially when the cleaning process in the cleaning device takes a long time, the grasping and moving device can perform other tasks, thus being utilized more effectively.

[0050] In another embodiment, it can be stipulated that the grasping and moving device has a lid unit for at least partially covering the device opening during the supply of the cleaning fluid. For example, the lid unit can have extendable or foldable plates that can cover the device opening when applying the cleaning fluid to the outer surface of the hollow body. This can prevent the uncontrolled discharge of the cleaning fluid from the cleaning space. In particular, it can reduce the possibility that the particles released from the outer surface of the hollow body enter the internal space and accumulate again on the outer surface or the inner surface of the hollow body.

[0051] In a further improved embodiment, it can be stipulated that the processing device has a drainage channel for discharging the cleaning fluid or the first cleaning fluid and the second cleaning fluid, and this drainage channel communicates with a discharge opening. In this embodiment, the cleaning fluid with the particles released from the outer surface of the hollow body is discharged from the processing device so that these particles do not accumulate again on the outer surface or the inner surface of the hollow body.

[0052] According to a further improved embodiment, a particle measuring device can be arranged in the drainage channel for determining the number of particles in the discharged cleaning fluid, the discharged first cleaning fluid and / or the discharged second cleaning fluid. The particle measuring device can determine the number of particles contained in the discharged cleaning fluid, thereby indicating the progress of the cleaning process. Generally, as the cleaning time increases, the number of particles decreases. A limit value regarding the number of particles can be defined. Once it is below this limit value, the cleaning process of the outer surface of the hollow body can be terminated. Thus, a specific cleaning degree of the outer surface of the hollow body can be determined, and an overly long cleaning process can be avoided.

[0053] Another embodiment provides that the cleaning device includes a temperature control unit for controlling the temperature of the cleaning fluid applied to the outer surface of the hollow body. The temperature control unit can be integrated into the supply device so that the cleaning fluid is heated or cooled accordingly during its entry into the cleaning space. Due to the temperature change, the hollow body and the particles adhering to the outer surface of the hollow body will expand and contract. However, since the linear expansion coefficient of the particles is usually different from that of the hollow body, relative movement will occur between the particles and the outer surface of the hollow body, which helps the particles to fall off from the outer surface of the hollow body, thus promoting the cleaning process.

[0054] According to another embodiment, the placement device can be rotatably mounted about a rotation axis and can be rotated by a drive motor. The rotational speed of the hollow body placed on the placement device can be selected to be high enough so that, due to the action of centrifugal force, the cleaning fluid residue still adhering to the outer surface of the hollow body can be thrown outwards, which is particularly useful when using water or other liquids as the cleaning fluid and helps to remove the cleaning fluid from the outer surface of the hollow body.

[0055] One embodiment of the present invention relates to a method for cleaning a can-shaped hollow body using a processing device according to any one of the foregoing embodiments, particularly for a transport container for semiconductor wafers or lithography masks, the method comprising the following steps:

[0056] Introducing the hollow body closed with a lid into the cleaning space by a grasping and moving device;

[0057] Supplying a cleaning fluid to the outer surface of the hollow body of the hollow body closed with a lid by a supply device, during the supply of the cleaning fluid:

[0058] a) The hollow body is connected to the grasping and moving device and is held in the cleaning space by the grasping and moving device; or

[0059] b) The hollow body is placed on the placement device by the grasping and moving device and then separated from the grasping and moving device.

[0060] The technical effects and advantages that can be achieved by this method correspond to the effects and advantages discussed for this cleaning device. In general, it should be noted that when the lid is fixed on the hollow body, the outer surface of the hollow body can be cleaned. In this regard, there is no need to separate the lid from the rest of the hollow body, so that time can be saved accordingly. In addition, if the gripping and moving device is connected to the hollow body ("dynamic cleaning"), the outer surface of the hollow body can be cleaned. Therefore, it is not necessary to place it in a determined position. In the process of cleaning the outer surface of the hollow body, the gripping and moving device can move the hollow body within a certain range, so that the cleaning fluid used can also reach the difficult-to-reach parts. However, according to a specific embodiment, it is still possible to place the hollow body on the placement device, especially when the gripping and moving device is used to move other hollow bodies in the processing device when cleaning the outer surface of the hollow body, it is meaningful to do so. Similarly, when the hollow body needs to rotate around its own axis at a high speed to throw off the residual cleaning fluid used, it is also appropriate to place it on the placement device.

[0061] The exemplary embodiments of the present invention will be explained in more detail below with reference to the accompanying drawings. In the drawings:

[0062] Figure 1A is a basic side view of a processing device known in the prior art,

[0063] Figure 1B is a separate basic schematic diagram of the hollow body to be processed,

[0064] Figure 2A is a greatly simplified basic side view of a treatment device according to the present solution, which has a first embodiment of the cleaning device according to the present invention,

[0065] Figure 2B is along Figure 2A The XX section plane defined in Figure 2A A separate basic schematic diagram of a first embodiment of the cleaning device is shown,

[0066] Figure 3 is a basic top view of a second embodiment of a cleaning device according to the present invention, and Figure 2B Similar to the view selected in , and

[0067] Figure 4 is a basic side view of a third embodiment of a cleaning device according to the present invention, and Figure 2A Similar to the view selected in .

[0068] Figure 1A A processing device 10 known from the prior art for processing a can-shaped hollow body 12 is shown in simplified form. Figure 1BThe hollow body 12 is shown separately. The processing device 10 includes a boundary wall 14 surrounding an internal space 16. A grasping and moving device 18 is provided in the internal space 16, by means of which the hollow body 12 to be processed can be moved in the internal space 16. In addition, a plurality of processing units 20 are provided in the internal space 16, which can be configured, for example, in the form of a cleaning device 22 and / or a suction device 24.

[0069] The boundary wall 14 forms a wall opening 26, which can be closed in a manner not shown in detail, and through which the internal space 16 can be accessed.

[0070] The processing device 10 operates in the following manner: The hollow body 12 to be processed has a hollow body wall 28, which forms a hollow body opening 29 that can be closed by a lid 30, as well as a hollow body outer surface 32 and a hollow body inner surface 34 (see Figure 1B ). The hollow body 12 is transported to the wall opening 26 and positioned in a manner not shown in detail, such that the grasping and moving device 18 can grasp the hollow body 12 using a correspondingly designed interface 36 and move it within the internal space 16. The hollow body 12 is conveyed by the grasping and moving device 18 to the cleaning device 22. In Figure 1A a lid operating unit 38 is shown, by means of which the lid 30 can be connected to the hollow body and separated from the rest of the hollow body 12. Subsequently, the lid operating unit 38 is rotated together with the lid 30 by approximately 90°, thereby closing the process chamber opening 40 of the cleaning device 22. The hollow body 12 separated from the lid 30 is placed into the cleaning device 22 through another process chamber opening not shown here. In the cleaning device 22, a cleaning liquid, in particular water, is applied to the hollow body inner surface 34 and the lid 30. Depending on the construction of the cleaning device 22, it is also possible to apply the cleaning liquid to the hollow body outer surface 32.

[0071] After the cleaning process is completed, the hollow body 12 is removed from the cleaning device 22 using the grasping and moving device 18, the lid operating unit 38 is rotated to the Figure 1A position shown, and the hollow body 12 is connected to the lid 30 again.

[0072] Now, the hollow body 12 together with the lid 30 is conveyed to the suction device 24. In this regard, the operating mode is substantially similar to the operating mode in the cleaning device 22. In particular, first the lid 30 is separated from the hollow body 12. In the suction device 24, a negative pressure is applied to the lid 30 and the hollow body 12, which causes the residual cleaning liquid used in the cleaning device 22 to evaporate.

[0073] After this process is completed, the lid 30 is again connected to the hollow body 12 and moved to the wall opening 26 by the gripping and moving device 18. The cleaned hollow body 12 together with the lid 30 is sent out from the internal space 16 of the processing device 10 and continues to be transported. The hollow body 12 sent out from the internal space 16 can now be used for transporting and storing semiconductor wafers (not shown here).

[0074] Figure 2A The processing device 42 according to the present invention is shown in a basic side view. The basic structure of the processing device 42 according to the present invention is similar to the structure of the prior art processing device 10 shown, so only its main differences will be discussed below. Figure 1A The structure of the prior art processing device 10 shown, so only its main differences will be discussed below.

[0075] The processing device 42 according to the present invention is equipped with a cleaning device 441 according to the first embodiment, which is used to clean the outer surface 32 of the hollow body 12 (see Figure 1B ). The cleaning device 441 is shown separately in a basic sectional view along the X-X cross-sectional plane defined in Figure 2B , but the hollow body 12 is not shown, and no requirements are made for the integrity and scale accuracy of the drawing. The cleaning device 441 includes a side wall 46, which defines a cleaning space 50 and has a rectangular cross-section when viewed from above. Therefore, in the Figure 2A selected X-X cross-sectional plane, the side wall 46 is closed. Figure 2B The selected X-X cross-sectional plane, the side wall 46 is closed.

[0076] The side wall 46 forms at least one device opening 48, through which the hollow body 12 closed by the lid 30 can be introduced into the cleaning space 50 by means of the gripping and moving device 18 for cleaning the outer surface 32 of the hollow body. In addition, the cleaning device 441 is equipped with a supply device 52, through which a cleaning fluid can be introduced into the cleaning space 50. According to the first embodiment of the cleaning device 441, the supply device 52 includes a plurality of first discharge nozzles 54 for delivering a first cleaning fluid and a plurality of second discharge nozzles 56 for delivering a second cleaning fluid to the cleaning space 50. Therefore, two different cleaning fluids can be delivered into the cleaning space 50, where the first cleaning fluid can be, for example, water, and the second cleaning fluid can be, for example, air. Both the first discharge nozzles 54 and the second discharge nozzles 56 communicate with the side wall 46 through through-holes 58 penetrating the side wall 46, and these through-holes are in turn connected to a supply channel 60 also fixed on the side wall 46.

[0077] As Figure 2B shown, a total of four guide plates 62 are arranged in the cleaning space 50, and these guide plates can be moved by a drive unit 64. For example, the guide plates 62 can be raised, lowered and / or rotated by the drive unit 64.

[0078] The cleaning device 441 also has a bottom wall 66 in which a discharge opening 67 is arranged. The bottom wall 66 is placed on the bottom 68 of the processing device 42. The bottom 68 has a plurality of through holes 70 that lead to a drainage channel 72 arranged below (see also Figure 1A ). The cleaning device 441 is arranged such that the discharge opening 67 communicates with the through holes 70. The cleaning fluid introduced into the cleaning space 50 through the discharge nozzles 54, 56 can be discharged from the processing device 42 through the discharge opening 67, the through holes 70, and the drainage channel 72.

[0079] A particle measuring device 74 is arranged in the drainage channel 72, through which the number of particles contained in the cleaning fluid can be determined.

[0080] The cleaning device 441 operates in the following manner: As already described with respect to Figure 1A , the hollow body 12 to be processed is grasped by the grasping and moving device 18 so that the hollow body 12 can move in the inner space 16. Before the hollow body 12 is conveyed to the cleaning device 22 by the grasping and moving device 18, as Figure 2A shows, the hollow body 12 is introduced into the cleaning space 50 of the cleaning device 441 through the device opening 48. At this time, the connection between the hollow body 12 and the grasping and moving device 18 remains unchanged. The lid 30 also does not separate from the hollow body 12. It can also be seen from Figure 2A that the grasping and moving device 18 partially extends into the cleaning space 50 to ensure that the entire hollow body 12 is introduced into the cleaning space 50. Depending on the specific application, it may also be advantageous to only partially introduce the hollow body 12 into the cleaning space 50. In this case, the grasping and moving device 18 does not extend into the cleaning space 50.

[0081] From the comparison between FIG. 1 and Figure 2A , it can be seen that the grasping and moving device 18 of the processing device 42 according to the present invention is equipped with a closing unit 76, through which the device opening 48 can be at least partially closed. For example, the closing unit 76 can have extendable or foldable plates 78. These plates 78 can also be used as limiting devices that abut against the side wall 46 from above, so that the final position of the hollow body 12 in the cleaning space 50 can be defined, and collisions of the hollow body 12, especially with the bottom wall 66, can be avoided.

[0082] When reaching the position shown in Figure 2A , due to the activation of a conveying unit (not shown), the first cleaning fluid is conveyed and applied to the outer surface 32 of the hollow body through the first discharge nozzle 54, as Figure 2AAs shown by the arrow. The closing unit 76 can prevent the first cleaning fluid from entering the internal space 16 uncontrollably through the device opening 48. During the application of the first cleaning fluid onto the outer surface 32 of the hollow body, the hollow body 12 can be moved in the cleaning space 50 by the grasping and moving device 18. At this time, up-and-down movement, rotational movement, lateral movement, and / or a combination of these movements can be performed. As long as the hollow body 12 does not collide with the cleaning device 441, this movement can be largely freely selected.

[0083] The first cleaning fluid skims over the outer surface 32 of the hollow body and carries away the particles adhering to it. The discharge nozzle 54, the closing unit 76, and the guide plate 62 cause the first cleaning fluid to form a flow towards the discharge opening 67. Therefore, the first cleaning fluid with particles is discharged from the cleaning device 441 and the processing device 42 through the discharge opening 67, the through hole 70, and the drainage channel 72. During this process, a certain volume unit of the cleaning fluid will pass through the particle measuring device 74, and through this device, the number of particles contained in the relevant volume unit can be determined. This measurement will continue with subsequent volume units. Once the determined number of particles is below a certain specific limit, the conveyance of the first cleaning fluid can be stopped. Subsequently, the second cleaning fluid can be applied onto the outer surface 32 of the hollow body through the second discharge nozzle 56. In this regard, the operation mode is similar to when using the first cleaning fluid. After stopping the conveyance of the second cleaning fluid, the hollow body 12 is taken out of the cleaning device 441 and conveyed to the cleaning device 22 and the air extraction device 24 in the manner described in Figure 1A After the processing steps are completed there, the grasping and moving device 18 is used to move the hollow body 12 to the wall opening 26, and the cleaned hollow body 12 together with the lid 30 is sent out from the internal space 16 of the cleaning device 441 and continues to be transported.

[0084] Alternatively, it is also possible to convey the hollow body 12 closed by the lid 30 to the cleaning device 441 only after the processing steps are completed in the cleaning device 22 and the air extraction device 24. Similarly, it is also possible to convey the hollow body 12 closed by the lid 30 to the cleaning device 441 both before and after the processing steps performed in the cleaning device 22 and the air extraction device 24.

[0085] Figure 3 A second embodiment of the cleaning device 442 is shown by a basic top view. The basic structure of the cleaning device 442 according to the second embodiment corresponds to the structure of the cleaning device 441 of the first embodiment, so only the differences will be discussed below. The cleaning device 441 according to the first embodiment has a closed side wall 46 with four parts, while the cleaning device 442 according to the second embodiment includes a first side wall 461 and a second side wall 462 that are parallel to each other and arranged at intervals on the bottom 68 of the processing device 42. Therefore, the device opening 48 is not only inFigure 3 extends not only within the drawing plane but also perpendicular to this plane. Thus, the hollow body 12 can be introduced into the cleaning space 50 not only from above but also from the side. The movements required for the gripping and moving device 18 for this purpose can be simplified. According to the second embodiment, the cleaning device 442 does not have a bottom wall 66.

[0086] Furthermore, the cleaning device 442 according to the second embodiment has a plurality of discharge nozzles 80 through which a cleaning fluid, such as air, can be introduced into the cleaning space 50. In the second embodiment shown, the discharge nozzles 80 of the first side wall 461 are also connected to a common supply channel 60 via through holes 58. The same applies to the discharge nozzles 80 of the second side wall 462. A temperature control unit 81 is arranged in the common supply channel 60 by means of which the temperature of the cleaning fluid can be changed.

[0087] In the cleaning device 441 according to the first embodiment, the volume flow rate through each of the discharge nozzles 54, 56 can be adjusted individually and can in particular be opened or closed earlier or later than the other discharge nozzles 54, 56. Furthermore, the cleaning device 441 according to the first embodiment can also be equipped with a temperature control unit 81 such that the temperature of the cleaning fluid can be adjusted individually during its flow to each of the discharge nozzles 54, 56. The cleaning device 442 according to the second embodiment is not provided with individual adjustment of the cleaning fluid at each of the discharge nozzles 54, 56 with respect to the above parameters. However, since a common supply channel 60 is used in the second embodiment, the equipment costs are reduced.

[0088] Figure 4 A third embodiment of a cleaning device 443 according to the invention is shown, the view of which is similar to the view Figure 2A selected. For the sake of clarity, some components of the processing device 42, in particular the gripping and moving device 18, are not shown. The cleaning device 443 according to the third embodiment largely corresponds to the cleaning devices 441, 442 according to the first and second embodiments and therefore only the main differences will be discussed below.

[0089] The cleaning device 443 according to the third embodiment is equipped with a placement device 82 on which the hollow body 12 can be placed. For this purpose, the gripping and moving device 18 introduces the hollow body 12 into the cleaning space 50 until the hollow body 12 comes into contact with the placement device 82. Subsequently, the contact between the gripping and moving device 18 and the hollow body 12 is broken.

[0090] In the embodiment of the cleaning device 443 shown, the hollow body 12 with the lid 30 is placed on the placement device 82. Of course, a hollow body wall 28 (see Figure 1B) The hollow body 12 is placed on the placement device 82. The placement device 82 is arranged near the bottom wall 66 and has a frame structure with rod-shaped or beam-shaped supports, which is designed in such a way that it obstructs the flow of the cleaning fluid as little as possible. In particular, it is ensured that the lid 30 can be well affected by the cleaning fluid. Here, the frame structure can provide at least three circular support points on which the hollow body 12 can be placed.

[0091] The placement device 82 can be fixed in the cleaning space 50. However, in the illustrated embodiment of the processing device 42, the placement device 82 is rotatably mounted in the bottom 68 of the processing device 42 and can be rotated about the rotation axis D by a drive motor 84. Due to this rotation, the hollow body 12 placed on the placement device 82 can be rotated, which can improve the supply of the cleaning fluid to the parts of the outer surface 32 of the hollow body that are difficult to reach.

[0092] In an embodiment not shown, the temperature control unit 81 (see Figure 3 ) mentioned above is provided for changing the temperature of the supplied cleaning fluid.

[0093] In the illustrated embodiment of the processing device 42, the support points are formed by fixing devices 88 constructed as suction cups 86, which are used to fix the hollow body 12 when the cleaning fluid acts on the hollow body 12. The fixing devices 88 can also be in other forms, such as in the form of clips. Thus, fixing arms or similar components that can act on the hollow body 12 from above or from the side can ensure the fixation of the hollow body 12 when the cleaning fluid acts on the hollow body 12 (not shown).

[0094] As mentioned above, the placement device 82 can be rotated about the rotation axis D by the motor 84. To prevent the hollow body 12 from sliding on the placement device 82 during rotation due to imbalance or other reasons, limit rods 96 are provided, which contact or almost contact the hollow body wall 28 when the hollow body 12 is placed on the placement device 82. The limit rods 96 can also be in the form of a basket and connected to a net not shown here.

[0095] Furthermore, the cleaning device 443 according to the third embodiment has a closing unit 90 through which the cleaning space 50 can be closed, especially when the hollow body 12 is introduced into the cleaning space 50 and is to be affected by the cleaning fluid. The closing unit 90 shown here has a closing body 92, which is rotatably fixed to the side wall 46 of the cleaning device 443 by fixing devices 94 not shown in detail. The fixing devices 94 can include hinges. In addition, positioning devices not shown can be provided, by means of which the closing unit 90 can be moved to open and close the device opening 48.

[0096] When the closing unit 90 is in the open position (not shown), the grasping and moving device 18 introduces the hollow body 12 into the cleaning space 50 and places it on the placement device 82. Subsequently, the fixing device 88 is activated and the grasping and moving device 18 is separated from the hollow body 12. Once the grasping and moving device 18 has left the cleaning device 443, the closing unit 90 can be switched to the closed position, as Figure 4 shown. Now, the cleaning fluid can be applied to the outer surface 32 of the hollow body. As previously described, the first cleaning fluid, such as water, can be introduced into the cleaning space 50 through the first discharge nozzle 54, and the second cleaning fluid, such as air, can be introduced through the second discharge nozzle 56. Before or during the delivery of the second cleaning fluid, the hollow body 12 can be rotated rapidly together with the placement device 82 so that the residue of the water is thrown off from the outer surface 32 of the hollow body. The stop lever can prevent the hollow body 12 from sliding during rotation.

[0097] After cleaning the outer surface 32 of the hollow body is completed, the closing unit 90 is switched to the open position. The hollow body 12 is removed from the cleaning space 50 using the grasping and moving device 18 and further processed.

[0098] An embodiment of the closing unit 90 is not shown, in which the closing unit can be switched to the closed position even if the grasping and moving device 18 is still connected to the hollow body 12 (see Figure 2A ). For this purpose, the closing body 92 can have a corresponding cutout and can be pushed closer to the grasping and moving device 18.

[0099] The closing unit 90 ensures that at least a part of the cleaning fluid does not flow out of the cleaning space 50 of the cleaning device 443 through the device opening 48 uncontrollably.

[0100] Although the temperature of the supplied cleaning fluid can be changed in all embodiments of the cleaning device 44 shown, only in the Figure 4 embodiment shown is it possible to rotate the hollow body 12 about its own axis to throw off the residue of the cleaning fluid on the outer surface 32 of the hollow body. Although the hollow body 12 can also be rotated about its own axis by the grasping and moving device 18 when it is connected to the grasping and moving device 18, the achievable rotational speed is too low to significantly remove the residue of the cleaning fluid on the outer surface 32 of the hollow body.

[0101] List of reference numerals

[0102] 10 Processing device in the prior art

[0103] 12 Hollow body

[0104] 14 Boundary wall

[0105] 16 Internal space

[0106] 18 Gripping and moving device

[0107] 20 Processing unit

[0108] 22 Cleaning device

[0109] 24 Exhaust device

[0110] 26 Wall opening

[0111] 28 Hollow body wall

[0112] 29 Hollow body opening

[0113] 30 Lid

[0114] 32 Outer surface of the hollow body

[0115] 34 Inner surface of the hollow body

[0116] 36 Interface

[0117] 38 Lid operating unit

[0118] 40 Process chamber opening

[0119] 42 Processing device

[0120] 44 Cleaning device

[0121] 441 Cleaning device

[0122] 442 Cleaning device

[0123] 443 Cleaning device

[0124] 46 Side wall

[0125] 461 First side wall

[0126] 462 Second side wall

[0127] 48 Device opening

[0128] 50 Cleaning space

[0129] 52 Supply device

[0130] 54 First discharge nozzle

[0131] 56 Second discharge nozzle

[0132] 58 Through hole

[0133] 60 Supply channel

[0134] 62 Guide plate

[0135] 64 Driving unit

[0136] 66 Bottom wall

[0137] 67 Discharge opening

[0138] 68 Bottom

[0139] 70 Through hole

[0140] 72 Drainage channel

[0141] 74 Particle measuring device

[0142] 76 Sealing unit

[0143] 78 Plate

[0144] 80 Discharge nozzle

[0145] 81 Temperature control unit

[0146] 82 Placement device

[0147] 84 Driving motor

[0148] 86 Suction cup

[0149] 88 Fixing device

[0150] 90 Sealing unit

[0151] 92 Sealing body

[0152] 94 Fixing device

[0153] 96 Limit rod

[0154] D Rotating shaft

Claims

1. A cleaning device (44) for cleaning a hollow, cylindrical body (12), in particular for cleaning a transport container for semiconductor wafers or lithography masks, wherein: - the hollow body (12) has a hollow body wall (28) which: o forms a hollow body opening (29) which can be or has been closed by a lid (30); o forms an outer hollow body surface (32), where; - the cleaning device (44): o comprises at least one side wall (46) defining a cleaning space (50), where; o the side wall (46) forms at least one device opening (48) through which the hollow body (12) closed by the lid (30) can be introduced into the cleaning space (50) by means of a gripping and moving device (18) in order to clean the outer hollow body surface (32); o comprises at least one supply device (52) for supplying a cleaning fluid to the outer hollow body surface (32) of the hollow body (12) closed by the lid (30), where; - the device opening (48) is configured such that the gripping and moving device (18) projects at least partially into the cleaning space (50) at least when supplying the cleaning fluid, or terminates flush with the device opening (48); and / or - a placement device (82) is arranged in the cleaning space (50) on which the gripping and moving device (18) can place the hollow body (12) closed by the lid (30) in order to supply the cleaning fluid.

2. The cleaning device (44) according to claim 1, It is characterized in that the supply device (52) comprises a plurality of discharge nozzles (54, 56, 80) facing or leading to the cleaning space (50).

3. The cleaning device (44) according to claim 2, It is characterized in that the discharge nozzles (54, 56, 80) arranged in the side wall (46) comprise or are formed by through holes (58).

4. The cleaning device (44) according to claim 2, characterized in that: - the supply device (52) has a through hole (58) arranged in the side wall (46); - the discharge nozzles (54, 56, 80) are fixed to the side wall (46), in fluid communication with the through hole (58) and leading to the cleaning space (50).

5. The cleaning device (44) according to any one of claims 2 to 4, It is characterized in that the supply device (52) comprises a plurality of supply channels (60) in communication with the discharge nozzles (54, 56, 80) through which the cleaning fluid can be conveyed to the discharge nozzles (54, 56, 80).

6. The cleaning device (44) according to claims 3 and 5 or 4 and 5, It is characterized in that the supply channels (60) are fixed to the side wall (46) and in communication with the through hole (58).

7. The cleaning device (44) according to any one of claims 2 to 6, It is characterized in that the supply device (52) has a plurality of first discharge nozzles (54) for supplying a first cleaning fluid to the cleaning space (50) and a plurality of second discharge nozzles (56) for supplying a second cleaning fluid to the cleaning space (50).

8. The cleaning device (44) according to any one of the preceding claims, It is characterized in that The cleaning device (44) has a plurality of guide plates (62) arranged in or cooperating with the cleaning space (50) for guiding the cleaning fluid within the cleaning space (50).

9. The cleaning device (44) according to claim 8, It is characterized in that The guide plate (62) is adjustable by a drive unit (64).

10. The cleaning device (44) according to any one of the preceding claims, It is characterized in that The cleaning device (44) has a closing unit (90) through which the device opening (48) can be at least partially closed.

11. The cleaning device (44) according to any one of the preceding claims, It is characterized in that The cleaning device (44) has at least one discharge opening (67) communicating with the cleaning space (50) through which the cleaning fluid or the first and second cleaning fluids can be discharged from the cleaning space (50).

12. The cleaning device (44) according to any one of the preceding claims, It is characterized in that The cleaning device (44) has a temperature control unit (81) for adjusting the temperature of the cleaning fluid applied to the outer surface (32) of the hollow body.

13. The cleaning device (44) according to any one of the preceding claims, It is characterized in that, The placement device (82) is rotatably mounted about a rotation axis (D) and can be rotated by a drive motor (84).

14. A processing device (42) for processing a tank-shaped hollow body (12), in particular for processing a transport container for semiconductor wafers or lithography masks, comprising: - a boundary wall (14) surrounding the internal space (16); - a grasping and moving device (18) arranged in the internal space (16) for moving the hollow body (12) within the internal space (16); - a wall opening (26) formed by the boundary wall (14) through which the internal space (16) can be accessed; - At least one processing unit (20) for processing a hollow body (12); and - the cleaning device (44) according to any one of the preceding claims, wherein: - during the supply of the cleaning fluid, the hollow body (12) closed by the lid (30) is connected to the grasping and moving device (18) and, by means of the grasping and moving device (18): o is introduced into the cleaning space (50); o is removed from the cleaning space (50); o is held within the cleaning space (50) by the grasping and moving device (18) during the supply of the cleaning fluid, where; - the device opening (48) is configured such that the grasping and moving device (18) at least partially extends into the cleaning space (50) or terminates flush with the device opening (48) at least during the supply of the cleaning fluid.

15. The processing device (42) according to claim 14, It is characterized in that The grasping and moving device (18) has a closing unit (76) for at least partially closing the device opening (48) during the supply of the cleaning fluid.

16. The processing device (42) according to any one of claims 14 or 15, It is characterized in that The processing device (42) has a drainage channel (72) for discharging the cleaning fluid or the first and second cleaning fluids, wherein the drainage channel (72) communicates with the discharge opening (67).

17. The processing device (42) according to claim 16, It is characterized in that A particle measuring device (74) is arranged in the drainage channel (72) for determining the number of particles in the discharged cleaning fluid, the discharged first cleaning fluid, and / or the discharged second cleaning fluid.

18. A method for cleaning a can-shaped hollow body (12) using a processing device (42) according to any one of claims 11 to 14, in particular for cleaning a transport container for semiconductor wafers or lithography masks, comprising the following steps: - introducing the hollow body (12) closed by a lid (30) into the cleaning space (50) by means of a gripping and moving device (18); - supplying a cleaning fluid to the outer hollow surface (32) of the hollow body (12) closed by the lid (30) by means of a supply device (52), wherein during the supply of the cleaning fluid: o the hollow body (12) is connected to the gripping and moving device (18) and held in the cleaning space (50) by the gripping and moving device (18); or o the hollow body (12) is placed by the gripping and moving device (18) on a placement device (82) and then separated from the gripping and moving device (18).

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