Photoresist production method and system for improving photoresist uniformity

Abstract

The invention provides a photoresist production method and system for improving photoresist uniformity, and the method comprises the steps: obtaining spin-coating rotation speed interval time sequence information and temperature and humidity interval time sequence information of a preset glue solution formula, and configuring photoresist production control boundary conditions in combination with the spin-coating rotation speed interval time sequence information and the temperature and humidity interval time sequence information; counting a thickness uniformity coefficient and a surface roughness uniformity coefficient; and if the thickness uniformity coefficient meets a thickness uniformity threshold value and the surface roughness uniformity coefficient meets a roughness uniformity threshold value, initializing a target photoresist production line through the spin-coating rotation speed interval time sequence information and the temperature and humidity interval time sequence information to execute photoresist preparation. According to the invention, the technical problem that the thickness uniformity and the surface roughness uniformity of the photoresist are deviated due to micro disturbance of equipment control of different photoresist production lines in the existing photoresist production control is solved, and the technical effect of improving the thickness uniformity and the surface roughness uniformity of the photoresist is achieved.

Description

Technical Field

[0001] The present invention relates to the field of semiconductor technology, and particularly to a method and system for producing photoresist to improve the uniformity of photoresist. Background Art

[0002] In the existing production of photoresist, more attention is paid to the determination of photoresist control parameters, such as the setting of key parameters such as spin coating speed, temperature, and humidity. However, in the actual production environment, due to factors such as equipment differences, service life, and calibration accuracy in different photoresist production lines, there will be minor disturbances in equipment control. Even with the same control parameter settings, there will be deviations in the thickness uniformity and surface roughness uniformity of the final photoresist products. Summary of the Invention

[0003] In view of the technical problem that in the existing production control of photoresist, there are minor disturbances in the equipment control of different photoresist production lines, resulting in deviations in the thickness uniformity and surface roughness uniformity of photoresist, the present invention provides a method and system for producing photoresist to improve the uniformity of photoresist to solve this problem.

[0004] The technical solution of the present invention to solve the above technical problems is as follows: In a first aspect, the present invention provides a method for producing photoresist to improve the uniformity of photoresist, including: obtaining the time series information of the spin coating speed interval and the time series information of the temperature and humidity interval of a preset photoresist formulation; retrieving the production log of a preset time zone of a target photoresist production line, and statistically calculating the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold; according to the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold, combining the time series information of the spin coating speed interval and the time series information of the temperature and humidity interval, configuring the production control boundary conditions of the photoresist; statistically calculating the thickness uniformity coefficient and the surface roughness uniformity coefficient of a historical sample set of photoresist production that meets the production control boundary conditions of the photoresist and the preset photoresist formulation; when the thickness uniformity coefficient meets the thickness uniformity threshold and the surface roughness uniformity coefficient meets the roughness uniformity threshold, initializing the target photoresist production line to perform photoresist preparation through the time series information of the spin coating speed interval and the time series information of the temperature and humidity interval.

[0005] In a second aspect, the present invention provides a photoresist production system for improving the uniformity of photoresist, comprising: an information acquisition module for obtaining the spin coating speed interval time series information and the temperature and humidity interval time series information of a preset photoresist formulation; a production log analysis module for retrieving the production logs of a target photoresist production line in a preset time zone and statistically analyzing the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold; a boundary condition configuration module for configuring the photoresist production control boundary conditions according to the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold, in combination with the spin coating speed interval time series information and the temperature and humidity interval time series information; a sample set statistics module for statistically analyzing the thickness uniformity coefficient and the surface roughness uniformity coefficient of a photoresist production historical sample set that meets the photoresist production control boundary conditions and the preset photoresist formulation; and a production initialization module for initializing the target photoresist production line to perform photoresist preparation through the spin coating speed interval time series information and the temperature and humidity interval time series information when the thickness uniformity coefficient meets the thickness uniformity threshold and the surface roughness uniformity coefficient meets the roughness uniformity threshold.

[0006] The beneficial effects of the present invention are as follows: Obtain the spin coating speed interval time series information and the temperature and humidity interval time series information of the preset photoresist formulation as subsequent control strategies and provide basic parameters for subsequent analysis; retrieve the production logs of the target photoresist production line in the preset time zone and statistically analyze the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold to reflect the actual fluctuations of equipment control; configure the photoresist production control boundary conditions according to the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold, in combination with the spin coating speed interval time series information and the temperature and humidity interval time series information, to make the control more precise; statistically analyze the thickness uniformity coefficient and the surface roughness uniformity coefficient of the photoresist production historical sample set that meets the photoresist production control boundary conditions and the preset photoresist formulation to evaluate the thickness uniformity and surface roughness uniformity performance of the photoresist samples produced under these conditions and verify the effectiveness of the control strategy. When the thickness uniformity coefficient meets the thickness uniformity threshold and the surface roughness uniformity coefficient meets the roughness uniformity threshold, initialize the target photoresist production line to perform photoresist preparation through the spin coating speed interval time series information and the temperature and humidity interval time series information. On the basis of verifying the effectiveness of the control strategy, apply the optimized control parameters to actual production and control the production process according to the spin coating speed interval time series information and the temperature and humidity interval time series information to ensure the production of high-uniformity photoresist.

[0007] Through the above technical solutions, the present application can optimize and control parameters according to the actual disturbance characteristics of different production lines, effectively solve the problem of uniformity deviation caused by the neglect of minor equipment disturbances in the prior art, and improve the thickness uniformity and surface roughness uniformity of photoresist. Description of the Drawings

[0008] Figure 1 Schematic flow chart of a photoresist production method for improving the uniformity of photoresist provided by the present invention; Figure 2 Schematic structural diagram of a photoresist production system for improving the uniformity of photoresist provided by the present invention.

[0009] In the drawings, the components represented by the reference numerals are as follows: Information acquisition module 11, production log analysis module 12, boundary condition configuration module 13, sample set statistics module 14, production initialization module 15. Detailed implementation manners

[0010] Next, the technical solutions in the embodiments of the present invention will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative efforts fall within the protection scope of the present invention.

[0011] In the description of the present invention, the terms "first" and "second" are only used for descriptive purposes, and cannot be construed as indicating or implying relative importance or implicitly specifying the quantity of the indicated technical features. Thus, the features defined with "first" and "second" may explicitly or implicitly include one or more of the described features. In the description of the present invention, "a plurality" means two or more, unless otherwise specifically defined.

[0012] In the description of the present invention, the term "for example" is used to mean "serving as an example, illustration, or explanation". Any embodiment described as "for example" in the present invention is not necessarily construed as being more preferred or having more advantages than other embodiments. In order for any person skilled in the art to implement and use the present invention, the following description is given. In the following description, details are set forth for purposes of explanation. It should be understood that those skilled in the art can recognize that the present invention can be implemented without using these specific details. In other instances, well-known structures and processes are not elaborated in detail to avoid obscuring the description of the present invention with unnecessary details. Therefore, the present invention is not intended to be limited to the embodiments shown, but is consistent with the broadest scope that conforms to the principles and features disclosed in the present invention.

[0013] Embodiment 1, as Figure 1 shown, the embodiment of the present invention provides a photoresist production method for improving the uniformity of photoresist, including: S100: Obtain the timing information of the spin coating speed range and the timing information of the temperature and humidity range of the preset photoresist formulation.

[0014] Specifically, obtain the process parameter timing information corresponding to a specific photoresist formulation, including specifically the spin coating speed range timing information and the temperature and humidity range timing information.

[0015] Among them, the spin coating speed range timing information refers to the value range of the spin coating speed parameter in different time periods during the photoresist production process. The spin coating speed, as a control parameter during the photoresist coating process, affects the thickness distribution and uniformity of the photoresist film layer. By determining the speed range in each time period, it can provide a basic control basis for the subsequent production process. The temperature and humidity range timing information refers to the value range of the environmental temperature and humidity parameters in different time periods during the photoresist production process. The temperature and humidity conditions have an impact on the rheological and curing characteristics of the photoresist, and thus affect the uniformity of the final photoresist film layer.

[0016] Although the uniformity of the photoresist is also affected by the viscosity of the liquid resist, since the viscosity of the liquid resist is mainly determined by factors such as the formulation, speed, temperature, and humidity, under the premise that the preset liquid resist formulation has been determined, only the spin coating speed range timing information and the temperature and humidity range timing information need to be obtained, without separately considering the liquid resist viscosity parameter.

[0017] The obtained spin coating speed range timing information and temperature and humidity range timing information will be used as the basic data for configuring the production control boundary conditions of the photoresist subsequently, providing the necessary parameter basis for improving the uniformity of the photoresist.

[0018] S200: Retrieve the production logs of the preset time zone of the target photoresist production line, and count the spin coating speed control perturbation threshold and the temperature and humidity control perturbation threshold.

[0019] Specifically, first, retrieve the production log data of the target photoresist production line within the preset time zone. Among them, the preset time zone can be a specific time period such as one day, one week, or one month, which is determined according to the actual production situation. The production logs contain the records of the preset values and actual monitored values of various parameters during the production process, and these records reflect the parameter fluctuations of the production line during actual operation. Subsequently, through statistical analysis of the production logs, determine the spin coating speed control perturbation threshold and the temperature and humidity control perturbation threshold. These perturbation thresholds represent the deviation degree of the control parameters in the actual operation of the target production line, reflecting the accuracy and stability of the equipment control.

[0020] Traditional photoresist production methods ignore the differences in equipment control accuracy between different production lines and only rely on standardized parameter settings for production, resulting in different degrees of uniformity deviation on different production lines.

[0021] By statistically analyzing the control disturbance thresholds of each parameter, the actual control ability of the target production line can be objectively reflected, providing a basis for subsequent parameter optimization, and thus improving the scenario adaptability of photoresist uniformity. The obtained spin coating speed control disturbance threshold and temperature and humidity control disturbance threshold will be used to adjust the control boundary conditions of photoresist production, making the control strategy more in line with the characteristics of the actual production environment and improving the control accuracy and product uniformity.

[0022] S300: According to the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold, combined with the spin coating speed interval time series information and the temperature and humidity interval time series information, configure the control boundary conditions of photoresist production.

[0023] Specifically, first, according to the obtained spin coating speed control disturbance threshold and temperature and humidity control disturbance threshold, the obtained spin coating speed interval time series information and temperature and humidity interval time series information are corrected and updated, so as to adjust the parameter interval under ideal conditions according to the control accuracy of the actual equipment, and form an updated interval considering actual disturbances. The updated interval time series information includes the spin coating speed updated intervals and temperature and humidity updated intervals of multiple time zones. The time zone division reflects the different requirements for parameter control in different stages of photoresist production. For example, the requirements for spin coating speed and temperature and humidity may vary in the initial, middle, and late stages of coating. Subsequently, based on the updated intervals of each time zone, the complete control boundary conditions of photoresist production are generated by means of boundary enumeration and combination. These boundary conditions comprehensively consider the control requirements of different time zones and different parameters, constituting a multi-dimensional control boundary space.

[0024] By constructing control boundary conditions considering time series characteristics and disturbance characteristics, the photoresist production process can be more precisely guided, adapting to the equipment characteristics of different production lines, and thus improving the uniformity of photoresist. The generated control boundary conditions of photoresist production will be used to screen historical production samples and evaluate the uniformity index.

[0025] S400: Statistically analyze the thickness uniformity coefficient and surface roughness uniformity coefficient of the photoresist production historical sample set that meets the photoresist production control boundary conditions and the preset glue solution formula.

[0026] Specifically, first, a sample set that simultaneously meets the configured production control boundary conditions of the photoresist and the preset photoresist formulation is screened from the historical production database to obtain a historical sample set of photoresist production, which represents the historical production records under similar production conditions. Subsequently, statistical analysis is performed on the screened historical sample set of photoresist production to calculate its thickness uniformity coefficient and surface roughness uniformity coefficient. Among them, the thickness uniformity coefficient refers to an index indicating the consistency of the thickness distribution of the photoresist film layer on the wafer surface, and can be characterized by statistical quantities such as standard deviation and coefficient of variation; the surface roughness uniformity coefficient reflects the degree of uniformity of the microscopic topography of the photoresist film layer surface and can be characterized by the distribution characteristics of surface roughness parameters.

[0027] Thickness uniformity and surface roughness uniformity are two key indicators for evaluating the quality of photoresist. Among them, thickness uniformity directly affects the resolution and overlay accuracy of subsequent lithography processes; surface roughness uniformity affects the light scattering characteristics of the photoresist, thereby affecting the accuracy of pattern transfer. By statistically analyzing these two uniformity indicators, the quality level of the photoresist in the historical sample set of photoresist production can be evaluated.

[0028] By analyzing the uniformity indicators of historical samples, the effectiveness of the control strategy can be evaluated before actual production, reducing the trial-and-error cost and improving production efficiency. The obtained thickness uniformity coefficient and surface roughness uniformity coefficient will be compared with the preset thresholds to determine whether the control strategy meets the uniformity requirements, providing a basis for subsequent production decisions.

[0029] S500: If the thickness uniformity coefficient meets the thickness uniformity threshold and the surface roughness uniformity coefficient meets the roughness uniformity threshold, initialize the target photoresist production line to prepare the photoresist through the spin coating speed interval timing information and the temperature and humidity interval timing information.

[0030] Specifically, first, compare the statistically obtained thickness uniformity coefficient with the preset thickness uniformity threshold, and at the same time compare the surface roughness uniformity coefficient with the preset roughness uniformity threshold. These two thresholds represent the minimum requirements for photoresist uniformity and are the criteria for judging whether the control strategy is acceptable. Only when the thickness uniformity coefficient meets the thickness uniformity threshold and the surface roughness uniformity coefficient meets the roughness uniformity threshold will the subsequent photoresist preparation operation be performed. This conditional judgment mechanism effectively prevents control strategies that do not meet the uniformity requirements from being applied to actual production, reducing production risks.

[0031] After meeting the conditions, initialize the target photoresist production line using the obtained spin coating speed interval timing information and temperature and humidity interval timing information, and perform photoresist preparation work. The initialization process includes sending the parameter interval information of each time zone to the production line control system and setting the change rules of the control parameters to guide the subsequent actual production process.

[0032] By statistically analyzing and considering the control disturbance thresholds of the target photoresist production line, the problem that traditional methods only focus on parameter determination and ignore minor equipment control disturbances is solved. By introducing a uniformity evaluation mechanism based on historical data, pre-verification of the control strategy is achieved, improving the success rate and product quality of different photoresist production lines, effectively overcoming the uniformity fluctuation problem caused by equipment control deviations of different production lines, and providing more reliable process guarantees for photoresist preparation.

[0033] Furthermore, retrieve the production logs of the preset time zones of the target photoresist production line, and statistically analyze the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold, including: S210: The production logs of the preset time zones include several sets of corresponding spin coating speed preset values and spin coating speed monitoring values, several sets of corresponding temperature preset values and temperature monitoring values, and several sets of corresponding humidity preset values and humidity monitoring values; S220: Statistically analyze the spin coating speed deviation concentration value of the spin coating speed preset value and the spin coating speed monitoring value, and set it as the spin coating speed control disturbance threshold; S230: Statistically analyze the temperature deviation concentration value of the temperature preset value and the temperature monitoring value, and set it as the temperature control disturbance threshold; S240: Statistically analyze the humidity deviation concentration value of the humidity preset value and the humidity monitoring value, and set it as the humidity control disturbance threshold; S250: Add the temperature control disturbance threshold and the humidity control disturbance threshold to the temperature and humidity control disturbance threshold.

[0034] In a feasible implementation manner, first, the data structure of the production logs of the preset time zones is clarified. The production logs of the preset time zones record the corresponding relationship between the preset values and the actual monitoring values of the parameters during the photoresist production process, specifically including: the one-to-one corresponding data groups of the spin coating speed preset values and the spin coating speed monitoring values, the one-to-one corresponding data groups of the temperature preset values and the temperature monitoring values, and the one-to-one corresponding data groups of the humidity preset values and the humidity monitoring values. These data reflect the actual deviation situations of the control parameters during the production process.

[0035] Subsequently, deviation analysis is carried out for three types of parameters respectively. By comparing the difference between the preset value and the monitored value of the spin coating speed, the concentrated value of the spin coating speed deviation is statistically obtained and set as the control disturbance threshold of the spin coating speed. Among them, the concentrated value of the spin coating speed deviation can adopt statistical quantities such as the median, mode or specific percentile to exclude the influence of outliers and reflect the typical level of the spin coating speed deviation. Similarly, the concentrated values of the temperature parameter and the humidity parameter are statistically obtained respectively and set as the corresponding control disturbance thresholds, obtaining the temperature control disturbance threshold and the humidity control disturbance threshold. Then, the obtained temperature control disturbance threshold and humidity control disturbance threshold are integrated into the temperature and humidity control disturbance threshold, providing a comprehensive description of the disturbance characteristics for the subsequent configuration of the control boundary conditions.

[0036] Through the quantitative analysis of the actual production data, the disturbance characteristics of the target photoresist production line in terms of parameter control are accurately characterized, laying a data foundation for the subsequent optimization of the photoresist production control strategy.

[0037] Furthermore, according to the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold, combined with the spin coating speed interval time series information and the temperature and humidity interval time series information, the photoresist production control boundary conditions are configured, including: S310: According to the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold, update the interval boundaries of the spin coating speed interval time series information and the temperature and humidity interval time series information to obtain the updated spin coating speed interval time series information and the updated temperature and humidity interval time series information; S320: The updated spin coating speed interval time series information includes the spin coating speed updated interval in the first time zone until the spin coating speed updated interval in the Nth time zone; S330: The updated temperature and humidity interval time series information includes the temperature updated interval in the first time zone until the temperature updated interval in the Mth time zone, and the humidity updated interval in the first time zone until the humidity updated interval in the Qth time zone; S340: Based on the spin coating speed updated interval in the first time zone until the spin coating speed updated interval in the Nth time zone, the temperature updated interval in the first time zone until the temperature updated interval in the Mth time zone, and the humidity updated interval in the first time zone until the humidity updated interval in the Qth time zone, perform boundary enumeration combination with the time zone as the composition unit to generate the photoresist production control boundary conditions.

[0038] In a feasible implementation, first, based on the obtained spin coating speed control disturbance threshold and temperature and humidity control disturbance threshold, the interval boundaries of the initially acquired spin coating speed interval time series information and temperature and humidity interval time series information are updated. This update process is a parameter boundary correction mechanism. By taking the control disturbance threshold into account in the setting of the parameter interval, the parameter interval better conforms to the control characteristics of the actual production environment. For example, if the control disturbance threshold of a certain parameter is X, the theoretical control interval [A, B] of this parameter can be updated to [A + X, B - X] to ensure that in the actual control process, even in the presence of disturbances, the final parameter value can still be maintained within the ideal interval. Through this update mechanism, the spin coating speed updated interval time series information and temperature and humidity updated interval time series information are obtained.

[0039] Among them, the spin coating speed updated interval time series information includes the spin coating speed updated interval from the first time zone to the Nth time zone, reflecting the different requirements for the spin coating speed parameter in different time zones. For example, at the initial stage of photoresist spin coating, a higher speed may be required to ensure the spreading of the glue solution, while at the later stage, a lower speed may be required to control the thickness. This time zone division reflects the dynamic characteristics of the photoresist production process. Similarly, the temperature and humidity updated interval time series information includes the temperature updated interval from the first time zone to the Mth time zone and the humidity updated interval from the first time zone to the Qth time zone. It should be noted that the time zone divisions (M and Q) of the temperature and humidity parameters may be different from the time zone division (N) of the spin coating speed to adapt to the control characteristics of different parameters.

[0040] After that, based on the updated interval information of each time zone above, boundary enumeration combinations are performed with the time zone as the component unit to generate the complete photoresist production control boundary conditions. Boundary enumeration combination means that in each time zone, the upper and lower boundary values are respectively selected from the updated intervals of the spin coating speed, temperature, and humidity, and the boundary values of each time zone are connected in the time zone order to form a series of possible boundary condition combinations. For example, for the ith time zone, if the spin coating speed updated interval is , the temperature updated interval is , and the humidity updated interval is , then the boundary combinations of this time zone include all possible combinations of the upper and lower boundaries of each parameter. By performing similar boundary combinations on all time zones and connecting the combination results of each time zone, the complete photoresist production control boundary conditions are finally generated. Through enumeration combination, a set of boundary conditions covering all possible control strategies can be obtained, providing a comprehensive control basis for subsequent photoresist production.

[0041] Furthermore, the thickness uniformity coefficient and surface roughness uniformity coefficient of the photoresist production historical sample set that meet the photoresist production control boundary conditions and the preset glue solution formula are statistically analyzed, including: S410: Extract the first photoresist production control boundary condition of the photoresist production control boundary conditions, where the first photoresist production control boundary condition includes spin coating speed boundary value timing information, temperature boundary value timing information, and humidity boundary value timing information; S420: Conduct a weight distribution of the influence of spin coating speed, temperature, and humidity on the photoresist thickness uniformity to obtain the first spin coating speed weight, the first temperature weight, and the first humidity weight. Combine the spin coating speed boundary value timing information, the temperature boundary value timing information, and the humidity boundary value timing information to construct a first index constraint; S430: Conduct a weight distribution of the influence of spin coating speed, temperature, and humidity on the photoresist surface roughness uniformity to obtain the second spin coating speed weight, the second temperature weight, and the second humidity weight. Combine the spin coating speed boundary value timing information, the temperature boundary value timing information, and the humidity boundary value timing information to construct a second index constraint; S440: Retrieve the first thickness uniformity coefficient of the first photoresist production historical sample set that satisfies the first index constraint and the preset glue solution formula; S450: Retrieve the first surface roughness uniformity coefficient of the second photoresist production historical sample set that satisfies the second index constraint and the preset glue solution formula; S460: Add the first thickness uniformity coefficient and the first surface roughness uniformity coefficient to the thickness uniformity coefficient and the surface roughness uniformity coefficient.

[0042] In a preferred embodiment, first, extract any one of the generated photoresist production control boundary conditions as the first photoresist production control boundary condition. This first photoresist production control boundary condition consists of three parts: spin coating speed boundary value timing information, temperature boundary value timing information, and humidity boundary value timing information, which completely describes the parameter control situation during the photoresist production process.

[0043] Then, for the indicator of photoresist thickness uniformity, a weight analysis of the three key parameters of spin coating speed, temperature, and humidity is performed to obtain the first spin coating speed weight, the first temperature weight, and the first humidity weight respectively. These weights reflect the relative influence degree of each parameter on the photoresist thickness uniformity. Subsequently, these weights are combined with the timing information of the spin coating speed boundary value, the temperature boundary value, and the humidity boundary value to construct the first index constraint. This first index constraint is used as a condition for historical sample screening to identify samples with a high degree of relevance to the target control strategy. Similarly, for the indicator of photoresist surface roughness uniformity, the second spin coating speed weight, the second temperature weight, and the second humidity weight are obtained respectively. These weights may be different from the first spin coating speed weight, the first temperature weight, and the first humidity weight obtained, reflecting the influence differences of different parameters on different uniformity indicators. Subsequently, a second index constraint is constructed based on these weights for sample screening related to surface roughness uniformity.

[0044] Next, based on the first index constraint and the preset photoresist formulation, a sample set that meets the first index constraint and the preset photoresist formulation is retrieved from the historical database, which is the first photoresist production historical sample set. Then, the average value of the photoresist thickness uniformity of all samples in the first photoresist production historical sample set is calculated as the first thickness uniformity coefficient of this first photoresist production historical sample set. This first thickness uniformity coefficient reflects the performance of historical samples that meet specific control conditions in terms of thickness uniformity. Similarly, based on the second index constraint and the preset photoresist formulation conditions, the second photoresist production historical sample set is retrieved, and its first surface roughness uniformity coefficient is calculated. After that, the first thickness uniformity coefficient and the first surface roughness uniformity coefficient are added to the overall thickness uniformity coefficient and surface roughness uniformity coefficient. These coefficients will be compared with the preset thresholds in the follow-up to evaluate the effectiveness of the control strategy.

[0045] Furthermore, a weight distribution of the spin coating speed, temperature, and humidity on the photoresist thickness uniformity is carried out to obtain the first spin coating speed weight, the first temperature weight, and the first humidity weight, including: S421: Collect a number of clusters of quality inspection record data with the spin coating speed, the temperature, and the humidity as variables and meeting the preset photoresist formulation. Among them, any quality inspection record data in any one of the number of clusters of quality inspection record data includes a production control parameter monitoring data set and photoresist thickness uniformity detection data; S422: Traverse the number of clusters of quality inspection record data, compare the production control parameter monitoring data sets pairwise to obtain a number of clusters of production control parameter monitoring data deviations, and compare the photoresist thickness uniformity detection data pairwise to obtain a number of clusters of photoresist thickness uniformity deviations; S423: Perform grey relational analysis on the monitored data deviations of the corresponding clusters of production control parameters and the deviations of the thickness uniformity of the corresponding clusters of photoresist respectively to obtain a number of spin coating speed correlation degrees, a number of temperature correlation degrees, and a number of humidity correlation degrees; S424: Conduct correlation degree proportion statistics based on the number of spin coating speed correlation degrees, the number of temperature correlation degrees, and the number of humidity correlation degrees to obtain the first spin coating speed weight, the first temperature weight, and the first humidity weight.

[0046] In a preferred embodiment, first, collect a number of clusters of quality inspection record data with spin coating speed, temperature, and humidity as variables and meeting the preset glue solution formula. Each cluster of quality inspection record data contains multiple quality inspection record data. Each quality inspection record data consists of two parts, namely, the monitored data set of production control parameters (recording the actual values of spin coating speed, temperature, and humidity) and the photoresist thickness uniformity detection data (recording the thickness uniformity of the photoresist produced under the corresponding conditions). Then, conduct a systematic comparison and analysis of the number of clusters of quality inspection record data. Specifically, within each cluster, compare the monitored data sets of production control parameters pairwise, calculate the differences of each parameter between different records to obtain the monitored data deviations of the number of clusters of production control parameters; at the same time, compare the photoresist thickness uniformity detection data pairwise, calculate the differences of thickness uniformity between different records to obtain the deviations of the number of clusters of photoresist thickness uniformity. This pairwise comparison method can effectively capture the relationship between parameter changes and uniformity changes.

[0047] Next, perform grey relational analysis on the obtained corresponding monitored data deviations of the number of clusters of production control parameters and the deviations of the number of clusters of photoresist thickness uniformity. Grey relational analysis is a method that can evaluate the degree of association between variables when the data is incomplete. Through this analysis, calculate the correlation degrees between the three parameters of spin coating speed, temperature, and humidity and the photoresist thickness uniformity respectively to obtain a number of spin coating speed correlation degrees, a number of temperature correlation degrees, and a number of humidity correlation degrees. These correlation degree values reflect the influence degree of each parameter change on the thickness uniformity change. After that, conduct correlation degree proportion statistics based on the obtained correlation degree data, calculate the proportion of the correlation degree of each parameter in the total correlation degree, so as to obtain the first spin coating speed weight, the first temperature weight, and the first humidity weight. Specifically, the correlation degree proportion statistics method is: calculate the sum of all correlation degrees of a specific parameter (such as spin coating speed), and divide it by the sum of all correlation degrees of all parameters (spin coating speed, temperature, and humidity) to obtain the weight of this parameter. This weight distribution method can objectively reflect the relative influence degree of each parameter on the thickness uniformity.

[0048] Through the above steps, the evaluation of the influence degree of each control parameter is realized, providing data support for constructing a more accurate control strategy.

[0049] Furthermore, combining the spin coating speed boundary value timing information, the temperature boundary value timing information, and the humidity boundary value timing information, a first index constraint is constructed, including: S425: Configure the spin coating speed deviation threshold, temperature deviation threshold, and humidity deviation threshold through the client. S426: Construct a first calculation rule, where the first calculation rule is used to calculate the first product factor of the proportion of the first moments less than or equal to the spin coating speed deviation threshold in the spin coating speed deviation timing information between the spin coating speed timing information of the sample and the spin coating speed boundary value timing information and the first time domain step deviation. S427: Construct a second calculation rule, where the second calculation rule is used to calculate the second product factor of the proportion of the second moments less than or equal to the temperature deviation threshold in the temperature deviation timing information between the sample temperature boundary value timing information and the temperature boundary value timing information and the second time domain step deviation. S428: Construct a third calculation rule, where the third calculation rule is used to calculate the third product factor of the proportion of the third moments less than or equal to the humidity deviation threshold in the humidity deviation timing information between the sample humidity boundary value timing information and the humidity boundary value timing information and the third time domain step deviation. S429: Only when the first product factor, the second product factor, and the third product factor are all less than or equal to the product factor threshold, it is considered that the first index constraint is satisfied.

[0050] In a preferred embodiment, first, the deviation thresholds of three parameters are configured through the client, namely, the spin coating speed deviation threshold, the temperature deviation threshold, and the humidity deviation threshold. The user can adjust the deviation thresholds of each parameter according to actual production requirements and quality requirements to control the strictness of historical sample screening.

[0051] Then, a first calculation rule for the spin coating speed parameter is constructed. This rule first calculates the deviation timing information between the spin coating speed timing information of the historical sample and the spin coating speed boundary value timing information, and then calculates the proportion of the number of moments less than or equal to the spin coating speed deviation threshold in the deviation timing information to the total number of moments, which is defined as the first moment proportion. In addition, the difference degree in the time point distribution between the spin coating speed timing information of the historical sample and the spin coating speed boundary value timing information is calculated. For example, it can be characterized by statistical quantities such as the standard deviation or coefficient of variation of the time interval between the two, to obtain the first time domain step deviation. Then, the first moment proportion is multiplied by the first time domain step deviation to obtain the first product factor, which comprehensively reflects the matching degree between the historical sample and the control boundary in terms of the spin coating speed parameter.

[0052] Similarly, a second calculation rule for the temperature parameter is constructed. This rule calculates the temperature deviation time series information between the time series information of the sample temperature boundary value and the time series information of the temperature boundary value, and then counts the proportion of the number of moments less than or equal to the temperature deviation threshold in the total number of moments, which is defined as the second moment proportion. At the same time, the difference between the historical sample and the boundary value in terms of the time domain step size of the temperature parameter is calculated and defined as the second time domain step size deviation, which reflects the degree of consistency between the two in the time dimension. Then, the second moment proportion is multiplied by the second time domain step size deviation to obtain the second product factor, which is used to characterize the matching degree of the sample with the boundary value in terms of the temperature parameter. Similarly, a third calculation rule for the humidity parameter is constructed. This rule calculates the humidity deviation time series information between the time series information of the sample humidity boundary value and the time series information of the humidity boundary value, and counts the third moment proportion less than or equal to the humidity deviation threshold. Combining with the third time domain step size deviation, the third product factor is calculated to comprehensively evaluate the matching situation of the sample with the boundary value in terms of the humidity parameter.

[0053] After that, a first index constraint is set: when and only when the first product factor, the second product factor, and the third product factor are all less than or equal to a preset product factor threshold, the historical sample is considered to meet the first index constraint. This AND logic judgment condition ensures that the selected historical samples have a high similarity with the time series information of the spin coating speed boundary value, the time series information of the temperature boundary value, and the time series information of the humidity boundary value in the three key parameters of the spin coating speed, temperature, and humidity, thus improving the reliability and reference value of the historical data analysis results.

[0054] Furthermore, the embodiments of the present application further include: S600: If the thickness uniformity coefficient does not meet the thickness uniformity threshold, or the surface roughness uniformity coefficient does not meet the roughness uniformity threshold, an abnormal identification is performed on the target photoresist production line and feedback is sent to the user side.

[0055] In a preferred implementation manner, an abnormal monitoring and feedback mechanism is designed to perform timely intervention for situations that do not meet the uniformity requirements.

[0056] When the thickness uniformity coefficient does not meet the preset thickness uniformity threshold, or the surface roughness uniformity coefficient does not meet the preset roughness uniformity threshold, it is automatically recognized that the current control strategy (i.e., the time series information of the spin coating speed range and the time series information of the temperature and humidity range of the preset photoresist formulation) is insufficient to ensure the uniformity requirements of the photoresist. Furthermore, an abnormal identification is performed on the target photoresist production line, and the abnormal situation is feedback to the user side.

[0057] When it is predicted through historical data analysis that the current control strategy may lead to non-compliance with uniformity, production will not be carried out blindly. Instead, an anomaly identification mechanism is used to alert users to pay attention to and handle potential problems. Such anomaly identification usually means that the equipment control disturbance on the production line has exceeded the controllable range, and equipment maintenance, calibration or adjustment is required. Through the feedback mechanism on the user side, relevant technicians can timely learn about the production line status, take necessary equipment maintenance or parameter adjustment measures, avoid wasting raw materials and production resources, and ensure the quality controllability of the photoresist production process and the safety of equipment operation.

[0058] Further, initializing the target photoresist production line to perform photoresist preparation through the spin coating speed interval timing information and the temperature and humidity interval timing information includes: S510: Based on the spin coating speed interval timing information and the temperature and humidity interval timing information, perform uniform distribution to obtain a number of spin coating speed assignment timing information and a number of temperature and humidity assignment timing information, and construct an initial population; S520: Statistically calculate a number of initial solution thickness uniformity coefficients and a number of initial solution roughness uniformity coefficients that meet the number of spin coating speed assignment timing information, the number of temperature and humidity assignment timing information, and the preset glue solution formula; S530: Configure a first weight for the thickness uniformity coefficient and a second weight for the roughness uniformity coefficient, and calculate the number of initial solution thickness uniformity coefficients and the number of initial solution roughness uniformity coefficients to obtain an initial population fitness set, where the first weight ≥ 2 * the second weight; S540: According to the initial population fitness set and the initial population, perform a preset number of iterative optimizations to obtain the target spin coating speed time zone information and the target temperature and humidity timing information, and initialize the target photoresist production line to perform photoresist preparation.

[0059] In a preferred implementation manner, after confirming that the control boundary conditions meet the uniformity requirements, an iterative optimization method is used to further determine accurate production parameters to achieve optimized control of the photoresist production process.

[0060] First, based on the spin coating speed interval timing information and the temperature and humidity interval timing information, uniform distribution sampling is performed to generate several groups of different parameter timing combinations, that is, several spin coating speed assignment timing information and several temperature and humidity assignment timing information, and an initial population is constructed. This uniform distribution sampling ensures that the initial population can fully cover the entire parameter space and provides diverse candidate solutions for subsequent optimization. The so-called initial population refers to a solution set composed of multiple groups of different parameter combinations, and each group of parameter combinations is regarded as an "individual". Then, each "individual" (i.e., each group of parameter combinations) in the constructed initial population is evaluated. Specifically, the thickness uniformity coefficient and the surface roughness uniformity coefficient of historical samples that satisfy several spin coating speed assignment timing information, several temperature and humidity assignment timing information, and a preset photoresist formula are statistically calculated, and are respectively denoted as several initial solution thickness uniformity coefficients and several initial solution roughness uniformity coefficients. These coefficients reflect the photoresist uniformity levels corresponding to different parameter combinations.

[0061] Next, a multi-objective optimization evaluation system is constructed. First, a first weight is configured for the thickness uniformity coefficient, and a second weight is configured for the roughness uniformity coefficient. Then, based on these weights, weighted calculations are performed on several initial solution thickness uniformity coefficients and several initial solution roughness uniformity coefficients to obtain an initial population fitness set. It should be noted that the first weight is not less than 2 times the second weight. This setting reflects the dominant position of the thickness uniformity in the evaluation of photoresist quality and ensures that the optimization process pays more attention to the improvement of the thickness uniformity. After that, based on the initial population fitness set and the initial population, iterative optimization calculations are performed for a preset number of times. In each iteration, according to the fitness evaluation results, a specific optimization algorithm (such as a genetic algorithm, a particle swarm algorithm, etc.) is used to generate new parameter combinations and re-evaluate their fitness, gradually approaching the optimal solution. After a preset number of iterations, the target spin coating speed time zone information and the target temperature and humidity timing information, that is, the optimal parameter timing combination, are obtained. Subsequently, the target photoresist production line is initialized with these optimized parameters, and photoresist preparation is performed.

[0062] Through the above steps, not only the uniformity requirements of the photoresist production process are ensured, but also the uniformity level is further improved through iterative optimization, realizing the refined control of photoresist production.

[0063] Example 2, as Figure 2 shown, based on the same inventive concept as the photoresist production method for improving photoresist uniformity provided in Example 1, the present invention embodiment also provides a photoresist production system for improving photoresist uniformity, including: An information acquisition module 11, configured to obtain the spin coating speed interval timing information and the temperature and humidity interval timing information of a preset photoresist formula; The production log analysis module 12 is used to retrieve the production logs of the target photoresist production line in a preset time zone, and to statistically calculate the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold; The boundary condition configuration module 13 is used to configure the photoresist production control boundary conditions according to the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold, in combination with the spin coating speed interval time series information and the temperature and humidity interval time series information; The sample set statistics module 14 is used to statistically calculate the thickness uniformity coefficient and the surface roughness uniformity coefficient of the photoresist production historical sample set that meets the photoresist production control boundary conditions and the preset photoresist formulation; The production initialization module 15 is used to initialize the target photoresist production line to perform photoresist preparation through the spin coating speed interval time series information and the temperature and humidity interval time series information when the thickness uniformity coefficient meets the thickness uniformity threshold and the surface roughness uniformity coefficient meets the roughness uniformity threshold.

[0064] Further, the production log analysis module 12 includes the following execution steps: The preset time zone production logs include a number of spin coating speed preset values and spin coating speed monitoring values that correspond one by one, a number of temperature preset values and temperature monitoring values that correspond one by one, and a number of humidity preset values and humidity monitoring values that correspond one by one; Statistically calculate the centralized value of the spin coating speed deviation between the spin coating speed preset value and the spin coating speed monitoring value, and set it as the spin coating speed control disturbance threshold; Statistically calculate the centralized value of the temperature deviation between the temperature preset value and the temperature monitoring value, and set it as the temperature control disturbance threshold; Statistically calculate the centralized value of the humidity deviation between the humidity preset value and the humidity monitoring value, and set it as the humidity control disturbance threshold; Add the temperature control disturbance threshold and the humidity control disturbance threshold to the temperature and humidity control disturbance threshold.

[0065] Further, the boundary condition configuration module 13 includes the following execution steps: According to the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold, perform interval boundary updates on the spin coating speed interval time series information and the temperature and humidity interval time series information to obtain spin coating speed updated interval time series information and temperature and humidity updated interval time series information; The spin coating speed updated interval time series information includes the spin coating speed updated interval in the first time zone until the spin coating speed updated interval in the Nth time zone; The temperature and humidity updated interval time series information includes the temperature updated interval in the first time zone until the temperature updated interval in the Mth time zone, and the humidity updated interval in the first time zone until the humidity updated interval in the Qth time zone; Based on the first time zone spin coating speed update range up to the Nth time zone spin coating speed update range, and the first time zone temperature update range up to the Mth time zone temperature update range, and the first time zone humidity update range up to the Qth time zone humidity update range, perform boundary enumeration combination with time zones as the composition unit to generate the photoresist production control boundary conditions.

[0066] Further, the sample set statistics module 14 includes the following execution steps: Extract the first photoresist production control boundary condition of the photoresist production control boundary conditions, where the first photoresist production control boundary condition includes spin coating speed boundary value timing information, temperature boundary value timing information, and humidity boundary value timing information; Perform a weight distribution of the influence of spin coating speed, temperature, and humidity on the photoresist thickness uniformity to obtain the first spin coating speed weight, the first temperature weight, and the first humidity weight, and combine the spin coating speed boundary value timing information, the temperature boundary value timing information, and the humidity boundary value timing information to construct the first index constraint; Perform a weight distribution of the influence of spin coating speed, temperature, and humidity on the photoresist surface roughness uniformity to obtain the second spin coating speed weight, the second temperature weight, and the second humidity weight, and combine the spin coating speed boundary value timing information, the temperature boundary value timing information, and the humidity boundary value timing information to construct the second index constraint; Retrieve the first thickness uniformity coefficient of the first photoresist production history sample set that satisfies the first index constraint and the preset glue solution formula; Retrieve the first surface roughness uniformity coefficient of the second photoresist production history sample set that satisfies the second index constraint and the preset glue solution formula; Add the first thickness uniformity coefficient and the first surface roughness uniformity coefficient to the thickness uniformity coefficient and the surface roughness uniformity coefficient.

[0067] Further, the sample set statistics module 14 also includes the following execution steps: Collect a number of clusters of quality inspection record data with the spin coating speed, the temperature, and the humidity as variables and satisfying the preset glue solution formula, where any quality inspection record data in any cluster of the number of clusters of quality inspection record data includes a production control parameter monitoring data set and photoresist thickness uniformity detection data; Traverse the number of clusters of quality inspection record data, compare the production control parameter monitoring data sets pairwise to obtain a number of clusters of production control parameter monitoring data deviations, and compare the photoresist thickness uniformity detection data pairwise to obtain a number of clusters of photoresist thickness uniformity deviations; Perform grey relational analysis on the monitoring data deviations of the corresponding clusters of production control parameters and the thickness uniformity deviations of the corresponding clusters of photoresist respectively, to obtain a number of spin coating speed correlation degrees, a number of temperature correlation degrees, and a number of humidity correlation degrees; Perform correlation ratio statistics based on the number of spin coating speed correlation degrees, the number of temperature correlation degrees, and the number of humidity correlation degrees, to obtain the first spin coating speed weight, the first temperature weight, and the first humidity weight.

[0068] Furthermore, the sample set statistics module 14 further includes the following execution steps: Configure the spin coating speed deviation threshold, the temperature deviation threshold, and the humidity deviation threshold through the user terminal; Construct a first calculation rule, where the first calculation rule is used to statistically calculate the first product factor of the proportion of the first moment less than or equal to the spin coating speed deviation threshold in the spin coating speed deviation time series information of the sample spin coating speed time series information and the spin coating speed boundary value time series information, and the first time domain step deviation; Construct a second calculation rule, where the second calculation rule is used to statistically calculate the second product factor of the proportion of the second moment less than or equal to the temperature deviation threshold in the temperature deviation time series information of the sample temperature boundary value time series information and the temperature boundary value time series information, and the second time domain step deviation; Construct a third calculation rule, where the third calculation rule is used to statistically calculate the third product factor of the proportion of the third moment less than or equal to the humidity deviation threshold in the humidity deviation time series information of the sample humidity boundary value time series information and the humidity boundary value time series information, and the third time domain step deviation; If and only if the first product factor, the second product factor, and the third product factor are all less than or equal to the product factor threshold, it is regarded as meeting the first index constraint.

[0069] Furthermore, the embodiment of the present application further includes an abnormal identification module, which is used for: If the thickness uniformity coefficient does not meet the thickness uniformity threshold, or the surface roughness uniformity coefficient does not meet the roughness uniformity threshold, perform abnormal identification on the target photoresist production line and feedback it to the user terminal.

[0070] Furthermore, the production initialization module 15 includes the following execution steps: Perform uniform distribution based on the spin coating speed interval time series information and the temperature and humidity interval time series information to obtain a number of spin coating speed assignment time series information and a number of temperature and humidity assignment time series information, and construct an initial population; Statistically calculate a number of initial solution thickness uniformity coefficients and a number of initial solution roughness uniformity coefficients that satisfy the described several spin coating speed assignment timing information, the described several temperature and humidity assignment timing information, and the preset glue solution formula; Configure a first weight for the thickness uniformity coefficient and a second weight for the roughness uniformity coefficient, and obtain an initial population fitness set for the several initial solution thickness uniformity coefficients and the several initial solution roughness uniformity coefficients, where the first weight ≥ 2 * the second weight; According to the initial population fitness set and the initial population, perform a preset number of iterative optimizations to obtain target spin coating speed time zone information and target temperature and humidity timing information, and initialize the target photoresist production line to perform photoresist preparation.

[0071] It should be noted that in the above embodiments, the descriptions of the various embodiments have their own emphases. For parts not described in detail in a certain embodiment, reference may be made to the relevant descriptions of other embodiments.

[0072] Those skilled in the art should understand that the embodiments of the present invention can be provided as methods, systems, or computer program products. Therefore, the present invention can take the form of a complete hardware embodiment, a complete software embodiment, or an embodiment combining software and hardware aspects. Moreover, the present invention can take the form of a computer program product implemented on one or more computer-usable storage media (including but not limited to disk memories, CD-ROMs, optical memories, etc.) containing computer-usable program code.

[0073] The present invention is described with reference to the flowcharts and / or block diagrams of methods, devices (systems), and computer program products according to the embodiments of the present invention. It should be understood that each flow and / or block in the flowcharts and / or block diagrams, as well as the combination of flows and / or blocks in the flowcharts and / or block diagrams, can be implemented by computer program instructions. These computer program instructions can be provided to the processors of general-purpose computers, special-purpose computers, embedded computers, or other programmable data processing devices to generate a machine, such that the instructions executed by the processors of the computer or other programmable data processing devices generate means for implementing the functions specified in Figure 1 one or more flows and / or Figure 1 blocks or multiple blocks.

[0074] These computer program instructions can also be stored in a computer-readable memory that can direct a computer or other programmable data processing device to work in a specific manner, such that the instructions stored in the computer-readable memory generate a manufactured article including instruction means that implement the functions specified in Figure 1 one or more flows and / or Figure 1 blocks or multiple blocks.

[0075] These computer program instructions can also be loaded onto a computer or other programmable data processing apparatus, so that a series of operation steps are executed on the computer or other programmable apparatus to produce a computer-implemented process, thereby providing instructions for implementing the process Figure 1 in one process or a plurality of processes and / or blocks Figure 1 steps for the functions specified in one block or a plurality of blocks.

[0076] Although the preferred embodiments of the present invention have been described, additional changes and modifications can be made by those skilled in the art once they learn of the basic inventive concept.

[0077] Obviously, those skilled in the art can make various changes and modifications to the present invention without departing from the spirit and scope of the present invention. Thus, if these modifications and variations of the present invention fall within the scope of the present invention and its equivalent technologies, the present invention is also intended to include these modifications and variations.

Claims

1. A method for producing photoresist to improve the uniformity of photoresist, characterized in that, Including: Obtain the spin coating speed interval time series information and temperature and humidity interval time series information of the preset glue solution formula; Retrieve the production logs of the preset time zone of the target photoresist production line, and count the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold; According to the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold, combined with the spin coating speed interval time series information and the temperature and humidity interval time series information, configure the photoresist production control boundary conditions; Count the thickness uniformity coefficient and the surface roughness uniformity coefficient of the photoresist production historical sample set that meet the photoresist production control boundary conditions and the preset glue solution formula; When the thickness uniformity coefficient meets the thickness uniformity threshold and the surface roughness uniformity coefficient meets the roughness uniformity threshold, initialize the target photoresist production line to perform photoresist preparation through the spin coating speed interval time series information and the temperature and humidity interval time series information.

2. The method according to claim 1, wherein Retrieve the production logs of the preset time zone of the target photoresist production line, and count the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold, including: The production logs of the preset time zone include a number of spin coating speed preset values and spin coating speed monitoring values in one-to-one correspondence, a number of temperature preset values and temperature monitoring values in one-to-one correspondence, and a number of humidity preset values and humidity monitoring values in one-to-one correspondence; Count the spin coating speed deviation concentration value of the spin coating speed preset value and the spin coating speed monitoring value, and set it as the spin coating speed control disturbance threshold; Count the temperature deviation concentration value of the temperature preset value and the temperature monitoring value, and set it as the temperature control disturbance threshold; Count the humidity deviation concentration value of the humidity preset value and the humidity monitoring value, and set it as the humidity control disturbance threshold; Add the temperature control disturbance threshold and the humidity control disturbance threshold to the temperature and humidity control disturbance threshold.

3. The method according to claim 1, characterized in that, According to the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold, combined with the spin coating speed interval time series information and the temperature and humidity interval time series information, configure the photoresist production control boundary conditions, including: According to the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold, update the interval boundaries of the spin coating speed interval time series information and the temperature and humidity interval time series information to obtain the spin coating speed updated interval time series information and the temperature and humidity updated interval time series information; The spin coating speed updated interval time series information includes the spin coating speed updated interval in the first time zone until the spin coating speed updated interval in the Nth time zone; The temperature and humidity updated interval time series information includes the temperature updated interval in the first time zone until the temperature updated interval in the Mth time zone, and the humidity updated interval in the first time zone until the humidity updated interval in the Qth time zone; Based on the spin coating speed updated interval in the first time zone until the spin coating speed updated interval in the Nth time zone, the temperature updated interval in the first time zone until the temperature updated interval in the Mth time zone, and the humidity updated interval in the first time zone until the humidity updated interval in the Qth time zone, perform boundary enumeration combination with the time zone as the composition unit to generate the photoresist production control boundary conditions.

4. The method according to claim 1, characterized in that Statistically analyze the thickness uniformity coefficient and surface roughness uniformity coefficient of the photoresist production historical sample set that meets the photoresist production control boundary conditions and the preset photoresist formulation, including: Extract the first photoresist production control boundary condition of the photoresist production control boundary conditions, where the first photoresist production control boundary condition includes spin coating speed boundary value time series information, temperature boundary value time series information, and humidity boundary value time series information; Perform a weight distribution of the influence of spin coating speed, temperature, and humidity on the photoresist thickness uniformity to obtain the first spin coating speed weight, the first temperature weight, and the first humidity weight, and combine the spin coating speed boundary value time series information, the temperature boundary value time series information, and the humidity boundary value time series information to construct a first index constraint; Perform a weight distribution of the influence of spin coating speed, temperature, and humidity on the photoresist surface roughness uniformity to obtain the second spin coating speed weight, the second temperature weight, and the second humidity weight, and combine the spin coating speed boundary value time series information, the temperature boundary value time series information, and the humidity boundary value time series information to construct a second index constraint; Retrieve the first thickness uniformity coefficient of the first photoresist production historical sample set that meets the first index constraint and the preset photoresist formulation; Retrieve the first surface roughness uniformity coefficient of the second photoresist production historical sample set that meets the second index constraint and the preset photoresist formulation; Add the first thickness uniformity coefficient and the first surface roughness uniformity coefficient to the thickness uniformity coefficient and the surface roughness uniformity coefficient.

5. The method according to claim 4, characterized in that, Perform a weight distribution of the influence of spin coating speed, temperature, and humidity on the photoresist thickness uniformity to obtain the first spin coating speed weight, the first temperature weight, and the first humidity weight, including: Collect several clusters of quality inspection record data with the spin coating speed, the temperature, and the humidity as variables and meeting the preset photoresist formulation, where any quality inspection record data in any cluster of the several clusters of quality inspection record data includes a production control parameter monitoring data set and photoresist thickness uniformity detection data; Traverse the several clusters of quality inspection record data, compare the production control parameter monitoring data sets pairwise to obtain several clusters of production control parameter monitoring data deviations, and compare the photoresist thickness uniformity detection data pairwise to obtain several clusters of photoresist thickness uniformity deviations; Perform grey relational analysis on the corresponding several clusters of production control parameter monitoring data deviations and the several clusters of photoresist thickness uniformity deviations respectively to obtain several spin coating speed correlation degrees, several temperature correlation degrees, and several humidity correlation degrees; Perform a statistical analysis of the proportion of correlation degrees based on the several spin coating speed correlation degrees, the several temperature correlation degrees, and the several humidity correlation degrees to obtain the first spin coating speed weight, the first temperature weight, and the first humidity weight.

6. The method according to claim 4, wherein Combine the spin coating speed boundary value time series information, the temperature boundary value time series information, and the humidity boundary value time series information to construct a first index constraint, including: Configure the spin coating speed deviation threshold, temperature deviation threshold, and humidity deviation threshold through the client; Construct a first calculation rule, where the first calculation rule is used to calculate the first product factor, which is the product of the proportion of the first moments less than or equal to the spin coating speed deviation threshold in the spin coating speed deviation time series information of the sample spin coating speed time series information and the spin coating speed boundary value time series information, and the first time domain step deviation; Construct a second calculation rule, where the second calculation rule is used to calculate the second product factor, which is the product of the proportion of the second moments less than or equal to the temperature deviation threshold in the temperature deviation time series information of the sample temperature boundary value time series information and the temperature boundary value time series information, and the second time domain step deviation; Construct a third calculation rule, where the third calculation rule is used to calculate the third product factor, which is the product of the proportion of the third moments less than or equal to the humidity deviation threshold in the humidity deviation time series information of the sample humidity boundary value time series information and the humidity boundary value time series information, and the third time domain step deviation; When and only when the first product factor, the second product factor, and the third product factor are all less than or equal to the product factor threshold, it is considered that the first index constraint is satisfied.

7. The method according to claim 1, characterized in that, It further includes: If the thickness uniformity coefficient does not meet the thickness uniformity threshold, or the surface roughness uniformity coefficient does not meet the roughness uniformity threshold, an abnormality flag is set for the target photoresist production line and fed back to the user terminal.

8. The method according to claim 1, wherein Initializing the target photoresist production line to perform photoresist preparation through the spin coating speed interval time series information and the temperature and humidity interval time series information, including: Based on the spin coating speed interval time series information and the temperature and humidity interval time series information, perform uniform distribution to obtain a number of spin coating speed assignment time series information and a number of temperature and humidity assignment time series information, and construct an initial population; Statistically calculate the thickness uniformity coefficients and roughness uniformity coefficients of a number of initial solutions that meet the number of spin coating speed assignment time series information, the number of temperature and humidity assignment time series information, and the preset glue solution formula; Configure a first weight for the thickness uniformity coefficient and a second weight for the roughness uniformity coefficient, and calculate the initial population fitness set for the number of initial solution thickness uniformity coefficients and the number of initial solution roughness uniformity coefficients, where the first weight ≥ 2 * the second weight; According to the initial population fitness set and the initial population, perform a preset number of iterative optimizations to obtain the target spin coating speed time zone information and the target temperature and humidity time series information, and initialize the target photoresist production line to perform photoresist preparation.

9. A photoresist production system for improving the uniformity of photoresist, characterized in that, For implementing the method according to any one of claims 1-8, the system includes: An information acquisition module, configured to obtain the spin coating speed interval time series information and the temperature and humidity interval time series information of a preset glue solution formula; A production log analysis module, configured to retrieve the preset time zone production log of the target photoresist production line and statistically calculate the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold; A boundary condition configuration module, configured to configure the photoresist production control boundary conditions according to the spin coating speed control disturbance threshold and the temperature and humidity control disturbance threshold, in combination with the spin coating speed interval time series information and the temperature and humidity interval time series information; A sample set statistics module, which is used to statistically calculate the thickness uniformity coefficient and the surface roughness uniformity coefficient of a photoresist production historical sample set that meets the photoresist production control boundary conditions and the preset photoresist formulation; A production initialization module, which is used to initialize the target photoresist production line to perform photoresist preparation through the spin coating speed interval time series information and the temperature and humidity interval time series information when the thickness uniformity coefficient meets the thickness uniformity threshold and the surface roughness uniformity coefficient meets the roughness uniformity threshold.

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