A light control integrated system of a vacuum evaporation machine

Abstract

The application provides a light control integrated system of a vacuum evaporation machine, which comprises a first rotating mechanism, adopts a three-stage rotating cooperative control architecture, drives the revolution of a carrier through the first rotating mechanism, independently controls the rotation of a crystal wafer mechanism through a second rotating part, and adjusts and controls a light control structure through a third rotating mechanism, so that multi-degree-of-freedom motion decoupling is realized, and mechanical interference is effectively avoided; a polycrystal wafer rotation detection mechanism is configured, the rotation positioning of the crystal wafer mechanism is driven through an intermediate rotating shaft, the crystal wafer mechanism can be automatically switched to an unused crystal wafer for detection, the continuous working period is significantly prolonged, and the frequency of shutdown maintenance is reduced; the optical monitoring function is innovatively integrated, through the cooperative design of the rotating light control structure and the probe outer cylinder, the refractive index / transmittance parameters of the film coating can be detected in real time, a multi-dimensional process monitoring system is formed in combination with the thickness data of the crystal wafer, and the film layer quality control precision is improved by more than 40%.

Description

Technical Field

[0001] This invention relates to the field of vacuum evaporation deposition technology, and more specifically, to an integrated light control system for a vacuum evaporation deposition machine. Background Technology

[0002] With the rapid development of the semiconductor, optical thin film and precision electronic device industries, higher requirements have been put forward for the control of film thickness and the monitoring of optical properties in vacuum evaporation processes. Traditional vacuum evaporation equipment mostly adopts a fixed crystal oscillator detection system, which has the following technical bottlenecks: (1) A single crystal oscillator exposed to the evaporation source for a long time is prone to cumulative film error, requiring frequent shutdowns for replacement; (2) Existing rotary detection mechanisms and carrier movements pose a risk of mechanical interference; (3) It is impossible to achieve synchronous online monitoring of film thickness and optical property parameters; (4) The detection probe is easily contaminated by the coating material, resulting in a decrease in measurement accuracy.

[0003] In the prior art, CN218465922U discloses a vapor deposition machine for extending the life of crystal oscillators. Multiple shielding parts of the vapor deposition machine for extending the life of crystal oscillators are evenly arranged around the rotation axis of the shielding plate, and the hollowed-out parts are arranged between adjacent shielding parts. The hollowed-out parts have hollowed-out channels. The hollowed-out channels and the plane swept by the rotating shielding parts are all blocked between the deposition source and the crystal oscillator, solving the problem of relative positional offset of the deposition pot. CN213812124U provides a probe structure at the top of the chamber of a vacuum vapor deposition machine, which, from top to bottom, includes: a cylinder, a coupling, a second hollow sleeve, an electrode fixing component, a probe crystal oscillator fixing component, and a cap. The coupling is fixed to the cylinder and a first rod body, and a first hollow sleeve is fitted outside the coupling. The upper end of the hollow sleeve is fixed to the cylinder housing, and the lower end is fixed to the second hollow sleeve. The electrode fixing component is fixed to the lower end of the second hollow sleeve, and the probe crystal oscillator fixing component is fixed to the lower part of the first rod. Six probes and crystal oscillators are evenly distributed and fixed inside the probe crystal oscillator fixing component. The cap is fitted over the probe crystal oscillator fixing component and is connected and fixed to the electrode fixing component. The bottom of the cap has a first through hole. Each time the cylinder rotates 60°, it drives the coupling, the first rod, and the probe crystal oscillator fixing component to rotate 60° synchronously. This ensures that the position of the first through hole of the cap corresponds when replacing a probe and crystal oscillator, thus solving the rotation problem. The current problem to be solved is how to develop an innovative detection system with high integration, multiple detection parameters, and continuous online monitoring capability. Summary of the Invention

[0004] In view of this, to solve the above problems, this invention proposes a photoelectric control integrated system for a vacuum evaporation machine, including a first rotating mechanism, a second rotating component housed within the internal cavity of the first rotating mechanism, an intermediate rotating shaft connected to the rotation axis of the second rotating component, a probe outer cylinder fitted over the intermediate rotating shaft, and the probe outer cylinder extending upward to connect with a third rotating mechanism. A three-level rotating collaborative control architecture is adopted, where the first rotating mechanism drives the carrier's revolution, the second rotating component independently controls the rotation of the crystal oscillator mechanism, and the third rotating mechanism regulates the photoelectric control structure, achieving multi-degree-of-freedom motion decoupling and effectively avoiding mechanical interference. A multi-crystal oscillator rotation detection mechanism is configured, with the intermediate rotating shaft driving the rotation and positioning of the crystal oscillator mechanism. It can automatically switch to unused crystal oscillators for testing, significantly extending the continuous working cycle and reducing downtime for maintenance. Its innovative integrated optical monitoring function, through the coordinated design of a rotating optical control structure and the probe outer cylinder, enables real-time detection of coating refractive index / transmittance parameters. Combined with crystal oscillator thickness data, it forms a multi-dimensional process monitoring system, improving film quality control accuracy by over 40%. The nested rotating structure design places the crystal oscillator mechanism at the fourth through-hole of the carrier, resulting in higher film thickness detection accuracy. The modular support component design and coaxial arrangement of the rotating shaft system ensure structural rigidity while achieving a compact layout, increasing the effective working space utilization of the equipment by over 25%, making it particularly suitable for coating processing of high-precision micro-devices.

[0005] A photoelectric control integrated system for a vacuum evaporation coating machine includes a first rotating mechanism. The upper part of the first rotating mechanism passes through the housing of the vacuum evaporation coating machine and is connected to an external driver. The lower part of the first rotating mechanism is connected to a support assembly. The support assembly includes an upper support ring and a lower support ring. The upper support ring is connected to the lower support ring via a support connection assembly. The lower support ring is used to support a carrier for coating. The system is characterized in that a second rotating component is fitted inside the internal cavity of the first rotating mechanism, and the internal cavity of the first rotating mechanism does not interfere with the second rotating component. The rotation axis of the second rotating component is connected to an intermediate rotating shaft. A fourth through hole is provided in the center of the carrier to be coated. A crystal oscillator mechanism is connected to the bottom end of the intermediate rotating shaft. The crystal oscillator mechanism is placed within the cavity formed by the fourth through hole and is not interfering with the fourth through hole. Interference is formed. The crystal oscillator mechanism is provided with multiple crystal oscillators. The lower part of the crystal oscillator mechanism is provided with a probe cap. The probe cap is provided with a second through hole. The crystal oscillator mechanism is rotated by a first rotating component, which drives the crystal oscillators to rotate, so that the position of one of the crystal oscillators is perfectly matched with the second through hole. The coating amount at the crystal oscillator is used to detect the coating thickness of the vacuum evaporation machine in the current state. The probe outer cylinder is sleeved on the intermediate rotating shaft. The probe outer cylinder is a hollow structure and does not interfere with the intermediate rotating shaft. The bottom of the probe outer cylinder is flush with the probe cap. The probe outer cylinder extends upward to connect with a third rotating mechanism. The lower part of the probe outer cylinder is connected to a light control structure for detecting the refractive index or transmittance of the coating on the light control structure. The third rotating mechanism is used to rotate the light control structure.

[0006] In some embodiments, a light control structure is fitted around the bottom outer ring of the probe outer cylinder. The light control structure includes a raised glass block and a glass sheet. The raised glass block is pressed onto the upper part of the glass sheet near the inner ring. A glass support plate is provided at the lower part of the glass sheet. A light control housing is fitted around the outer ring of the glass support plate. The light control housing is a hollow structure and extends upward to lock with the top large flange. The body of the glass support plate has a fifth through hole. A light transmission and reflection measuring device is installed inside the hollow housing and the light receiving head of the light transmission and reflection measuring device is matched with the position of the fifth through hole. The raised glass block drives the glass sheet to rotate, so that the uncoated glass sheet is matched with the position of the fifth through hole. When the bottom of the glass sheet is coated, the external light beam is shone to the position matched with the fifth through hole by the light transmission and reflection measuring device and reflected back to detect the refractive index or light transmittance.

[0007] Furthermore, the glass sheet has an annular structure and a notch, and the lower part of the protruding glass pressing block is provided with an arc-shaped column. The arc-shaped column is integrally formed with the outer wall of the protruding glass pressing block, and the arc-shaped column abuts against one side wall of the notch of the glass sheet. The protruding glass pressing block drives the glass sheet to rotate.

[0008] In some embodiments, a plurality of second partitions are provided between the probe outer cylinder and the probe outer cylinder, and the plurality of second partitions are arranged in parallel at intervals to prevent the probe outer cylinder from moving left and right when rotating.

[0009] Furthermore, the light transmission and reflection measuring device includes a light channel, which is locked by a second partition, and the input end of the external light of the light channel is connected and fixed to the top large flange.

[0010] Furthermore, multiple suspension rods are inserted between the multiple second partitions, and a heating device is connected to the bottom of the suspension rods. The heating device includes a heating plate and a coil cover plate wrapped around the heating plate. The heating device is located on the upper part of the glass sheet.

[0011] Furthermore, the heating device is provided with a ceramic structure, and the ceramic structure is provided with a seventh through hole, which is used to communicate with the light channel.

[0012] Furthermore, the heating device is covered with an insulation cover, which has an open lower section and is used to insulate the heating device.

[0013] In some embodiments, the glass support plate extends inward to the connection between the protruding glass block and the glass sheet, forming a downwardly recessed structure to allow the protruding glass block to rotate the glass sheet.

[0014] In some embodiments, the glass carrier plate is covered with an anti-collision sleeve, the anti-collision sleeve with its opening facing upwards wrapping around the glass carrier plate, and the anti-collision sleeve has a fifth through hole and a hole corresponding to the second through hole, for receiving coating material to the corresponding position.

[0015] In some embodiments, the crystal oscillator mechanism includes a crystal oscillator fixing seat and a crystal oscillator three-jaw fixing plate. The body of the crystal oscillator fixing seat is provided with a first through hole corresponding to a plurality of crystal oscillators. The first through hole serves as a channel for detecting the film material. A fixing seat connecting rod is provided in the middle of the upper surface of the crystal oscillator fixing seat for locking with an intermediate rotating shaft, so that the intermediate rotating shaft rotates and drives the crystal oscillator fixing seat to rotate. A crystal oscillator three-jaw fixing plate is also sleeved at the fixing seat connecting rod and located on the upper part of the crystal oscillator fixing seat. The crystal oscillator three-jaw fixing plate is used to fix a plurality of crystal oscillators.

[0016] Furthermore, the second through-hole is a funnel-shaped opening that is narrower at the top and wider at the bottom, which helps to collect the membrane material better and speeds up the detection process.

[0017] In some embodiments, a water-cooling shaft is connected to the upper part of the probe cap, and an outer probe cylinder is sleeved on the water-cooling shaft. A water-cooling jacket is provided in the inner ring of the water-cooling shaft. The water-cooling jacket is an annular hollow cavity. The water inlet of the water-cooling jacket is connected to a water inlet pipe, and the water outlet of the water-cooling jacket is connected to a water outlet pipe. The water inlet and water outlet are symmetrically arranged. The input end of the water inlet pipe is connected to cooling water. The cooling water enters the water-cooling jacket from the water inlet pipe and exits from the water outlet pipe, forming a circulating cooling water path to cool the crystal oscillator mechanism and form a directional thermal radiation shield for the crystal oscillator mechanism.

[0018] Furthermore, both the inlet pipe and the outlet pipe pass through the interlayer and are connected to an external adapter, which is sleeved with the outer cylinder of the probe.

[0019] Furthermore, the water-cooled shaft has a third through hole at its center for connecting with the intermediate rotating shaft, and a first receiving chamber is provided near the crystal oscillator mechanism of the water-cooled shaft for accommodating the crystal oscillator mechanism and the probe cap.

[0020] Furthermore, the water-cooling jacket is located above the crystal oscillator mechanism, resulting in better cooling performance.

[0021] Furthermore, the top of the water-cooled shaft is locked with a protective sleeve for an intermediate rotating shaft. The protective sleeve is fitted onto the intermediate rotating shaft without interfering with it, and the protective sleeve is locked to the bottom of the external adapter.

[0022] Furthermore, an interlayer is provided between the intermediate rotating shaft protective sleeve and the probe outer cylinder, and multiple first partitions are longitudinally spaced at the interlayer. The first partitions are sleeved with the intermediate rotating shaft but do not interfere with it, in order to prevent the intermediate rotating shaft from radially shifting.

[0023] Furthermore, the upper part of the crystal oscillator three-jaw fixing plate is provided with a crystal oscillator detection device mounting block. The crystal oscillator detection device mounting block is provided with a sixth through hole. The position of the sixth through hole matches the position of the first through hole. The detection end of the crystal oscillator detection device is connected to the sixth through hole. The external connection end of the crystal oscillator detection device passes through the interlayer between the intermediate rotating shaft protective sleeve and the intermediate rotating shaft and connects to the external crystal oscillator detection mechanism.

[0024] In some embodiments, the second rotating component is a rotary cylinder. The rotating shaft of the second rotating component is connected to the input end of a clamping coupling. The output end of the clamping coupling is connected to the intermediate transmission shaft of the probe. The intermediate transmission shaft is connected to the first bearing fixing block through a first bearing. The outer ring of the first bearing is engaged with the bearing fixing block, and the inner ring of the first bearing is engaged with the connecting nut of the intermediate transmission shaft. The transmission shaft drives the first bearing to rotate within the outer ring of the bearing fixing block. The first bearing prevents the intermediate transmission shaft from moving up and down.

[0025] Furthermore, a top dust cover is provided at the connection between the second rotating component and the intermediate rotating shaft. The top dust cover covers the connection and extends downward to the support base. The top of the top dust cover is locked to the housing of the second rotating component through a first connecting plate.

[0026] Furthermore, the bottom of the support base is connected to the top flange, which is connected to the top of the vapor deposition machine, for connecting the entire rotating device to the top of the vapor deposition machine.

[0027] In some embodiments, the first rotating mechanism includes a magnetic fluid and a first rotating shaft. The first rotating shaft is a hollow cavity and is sleeved with the second rotating component without interfering with it. The first rotating shaft is connected to a rotating gear. The magnetic fluid is sleeved with a shaft in the middle. The upper end of the magnetic fluid shaft is placed outside the housing of the vacuum evaporation machine, and the lower end of the magnetic fluid shaft is placed inside the internal cavity. The rotating gear meshes with a second gear connected to the lower end of the magnetic fluid shaft. A second synchronous pulley is provided at the upper end of the magnetic fluid shaft. The second synchronous pulley is connected to a synchronous pulley on an external driver via a synchronous belt. The motor drives the synchronous pulley to rotate, which in turn drives the second synchronous pulley to rotate. The second synchronous pulley drives the second gear to rotate, thereby causing the rotating gear to rotate and driving the first rotating shaft to rotate, forming a multi-stage transmission system. This ensures the smooth rotation of the first rotating shaft. The multi-stage transmission combination of the magnetic fluid shaft and the synchronous pulley ensures vacuum sealing while transmitting stable power, solving the problem that the connection between the traditional first rotating shaft and the drive system is prone to leakage or power loss due to insufficient vacuum sealing.

[0028] The beneficial effects of this invention: This invention proposes a photoelectric control integrated system for a vacuum evaporation machine, including a first rotating mechanism. A second rotating component is housed within the internal cavity of the first rotating mechanism. The rotating shaft of the second rotating component is connected to an intermediate rotating shaft. The intermediate rotating shaft is fitted with a probe outer cylinder, which extends upwards to connect with a third rotating mechanism. A three-level rotating collaborative control architecture is adopted. The first rotating mechanism drives the carrier's revolution, the second rotating component independently controls the rotation of the crystal oscillator mechanism, and the third rotating mechanism regulates the photoelectric control structure, achieving multi-degree-of-freedom motion decoupling and effectively avoiding mechanical interference. A multi-crystal oscillator rotation detection mechanism is configured, driving the rotation and positioning of the crystal oscillator mechanism through the intermediate rotating shaft, enabling automatic... The system automatically switches to unused crystal oscillators for testing, significantly extending continuous working cycles and reducing downtime for maintenance. It innovatively integrates optical monitoring functions, using a rotating optical control structure and probe outer cylinder in synergy to detect coating refractive index / transmittance parameters in real time. Combined with crystal oscillator thickness data, it forms a multi-dimensional process monitoring system, improving film quality control accuracy by over 40%. The nested rotating structure design places the crystal oscillator mechanism at the fourth through-hole of the carrier, resulting in even higher film thickness detection accuracy. The modular support component design and coaxial arrangement of the rotating shaft system ensure structural rigidity while achieving a compact layout, increasing the effective working space utilization of the equipment by over 25%, making it particularly suitable for coating high-precision micro-devices. Attached Figure Description

[0029] Figure 1 This is an assembly diagram of the photoelectric control integrated system of the vacuum evaporation machine of the present invention.

[0030] Figure 2 This is a cross-sectional view of the photocontrol integrated system of the vacuum evaporation deposition machine of the present invention. Figure 1 .

[0031] Figure 3 This is a cross-sectional view of the photocontrol integrated system of the vacuum evaporation deposition machine of the present invention. Figure 2 .

[0032] Figure 4 This is a cross-sectional view of the photocontrol integrated system of the vacuum evaporation deposition machine of the present invention. Figure 3 .

[0033] Figure 5 This is a cross-sectional view of the photocontrol integrated system of the vacuum evaporation deposition machine of the present invention. Figure 4 .

[0034] Figure 6 This is a cross-sectional view of the photocontrol integrated system of the vacuum evaporation deposition machine of the present invention. Figure 5 .

[0035] Figure 7 This is a cross-sectional view of the photocontrol integrated system of the vacuum evaporation deposition machine of the present invention. Figure 6 .

[0036] Figure 8 This is a structural diagram of the light control structure of the light control integrated system of the vacuum evaporation machine of the present invention.

[0037] Explanation of main component symbols

[0038] First rotating mechanism 100, magnetohydrodynamic fluid 101, second gear 102, first rotating shaft 103, rotating gear 104, upper support ring 107, lower support ring 108, carrier 109, fourth through hole 110, second synchronous pulley 111, second rotating component 200, clamping coupling 210, first bearing fixing block 211, first bearing 212, intermediate rotating shaft 220, crystal oscillator mechanism 230, crystal oscillator fixing seat 231, first through hole 232, fixing seat connecting rod 233, crystal oscillator three-jaw fixing plate 234, crystal oscillator 235, probe cap 236, second through hole 237, water-cooled shaft 240, third through hole 241, water-cooled jacket 242, external adapter 245, probe 250 Outer cylinder, 260 Third rotating mechanism, 261 Light control structure, 2611 Boss glass pressing block, 2612 Glass sheet, 2613 Notch, 2614 Arc-shaped column, 2615 Glass bearing plate, 2616 Fifth through hole, 2617 Light control shell, 2619 Light channel, 2620 Second partition, 2621 Hanging rod, 2622 Heating plate, 2623 Coil cover, 2624 Ceramic structure, 2625 Insulation cover, 2626 Anti-stick plate sleeve, 246 Intermediate rotating shaft protective sleeve, 247 First partition, 248 Crystal oscillator detection device mounting block, 249 Sixth through hole, 270 Top dust cover, 271 Support base, 272 First connecting plate, 273 Top large flange.

[0039] The following detailed description, in conjunction with the accompanying drawings, will further illustrate the present invention. Detailed Implementation

[0040] Example:

[0041] like Figure 1-2As shown, a photoelectric control integrated system for a vacuum evaporation coating machine includes a first rotating mechanism 100. The upper part of the first rotating mechanism 100 passes through the housing of the vacuum evaporation coating machine and is connected to an external driver. The lower part of the first rotating mechanism 100 is connected to a support assembly. The support assembly includes an upper support ring 107 and a lower support ring 108. The upper support ring 107 is connected to the lower support ring 108 via a support connection assembly. The lower support ring 108 is used to support a carrier 109 for receiving the coating. A second rotating component 200 is fitted inside the internal cavity of the first rotating mechanism 100. The internal cavity of the first rotating mechanism 100 and the second rotating component 200 do not interfere with each other. The rotation axis of the second rotating component 200 is connected to an intermediate rotating shaft 220. The carrier 109 to be coated has a fourth through hole 110 in the center. The bottom end of the intermediate rotating shaft 220 is connected to a crystal oscillator mechanism 230. The crystal oscillator mechanism 230 is placed in the cavity formed by the fourth through hole 110 and does not interfere with the fourth through hole 110. The crystal oscillator mechanism 230 is provided with multiple crystal oscillators 235. The lower part of the crystal oscillator mechanism 230 is provided with a probe cap 236. The probe cap 236 is provided with a second through hole 237. The crystal oscillator mechanism 230 is rotated by the first rotating component, which drives the crystal oscillators 235 to rotate, so that the position of one of the crystal oscillators 235 is completely matched with the position of the second through hole 237. The coating thickness of the vacuum evaporation machine in the current state is detected by the coating amount at the crystal oscillator 235.

[0042] like Figure 6-8As shown, the probe outer cylinder 250 has a light control structure fitted around its bottom outer ring. The light control structure includes a raised glass block 2611 and a glass plate 2612. The raised glass block 2611 is pressed onto the upper part of the glass plate 2612 near the inner ring. A glass support plate 2615 is provided at the lower part of the glass plate 2612. A light control housing 2617 is fitted around the outer ring of the glass support plate 2615. The light control housing 2617 is a hollow structure and extends upwards to lock with the top large flange 273. The body of the glass support plate 2615 has a fifth through hole 2616. A light transmission and reflection measuring device is inserted inside the hollow housing, and the light receiving head of the light transmission and reflection measuring device is aligned with the fifth through hole 2616. The raised glass block 2611 drives the glass sheet 2612 to rotate, so that the uncoated glass sheet 2612 matches the position of the fifth through hole 2616. After the bottom of the glass sheet 2612 is coated, an external light beam is shone onto the position matching the fifth through hole 2616 through a light transmission and reflection measuring device and reflected back to detect the refractive index or light transmittance. The glass sheet 2612 has a ring structure and a notch 2613. The lower part of the raised glass block 2611 is provided with an arc-shaped column 2614. The arc-shaped column 2614 is integrally formed with the outer wall of the raised glass block 2611. The arc-shaped column 2614 abuts against one side wall of the notch 2613 of the glass sheet 2612. The raised glass block 2611 drives the glass sheet 2612 to rotate. The probe 2612 rotates. Multiple second partitions 2620 are provided between the probe outer cylinder 250 and the probe outer cylinder 250. These second partitions 2620 are spaced parallel to each other to prevent the probe outer cylinder 250 from moving left and right during rotation. The light transmission and reflection measuring device includes a light channel 2619, which is locked by the second partitions 2620. The input end of the external light of the light channel 2619 is connected and fixed to the top large flange 273. Multiple hanging rods 2621 are inserted between the second partitions 2620. A heating device is connected to the bottom of each hanging rod 2621. The heating device includes a heating plate 2622 and a coil cover 2623 wrapped around the heating plate 2622. The heating device, located on top of the glass plate 2612, has a ceramic structure 2624 with a seventh through hole for communication with the light channel 2619. An insulation cover 2625, open at the bottom, is fitted over the heating device to insulate it. The glass support plate 2615 extends inward to the junction of the protruding glass pressure block 2611 and the glass plate 2612, forming a downwardly recessed structure to prevent the glass plate 2612 from rotating due to the protruding glass pressure block 2611. An anti-collision sleeve 2626, with its opening facing upward, completely covers the glass support plate 2615.The anti-coating sleeve 2626 has a fifth through hole 2616 and a corresponding hole at the position of the second through hole 237, for receiving the coating material to the corresponding position.

[0043] like Figure 3As shown, the crystal oscillator mechanism 230 includes a crystal oscillator fixing seat 231 and a crystal oscillator three-jaw fixing plate 234. The body of the crystal oscillator fixing seat 231 is provided with first through holes 232 corresponding to a plurality of crystal oscillators 235. A fixing seat connecting rod 233 is provided in the middle of the upper surface of the crystal oscillator fixing seat 231 for locking with the intermediate rotating shaft 220, so that the rotation of the intermediate rotating shaft 220 drives the crystal oscillator fixing seat 231 to rotate. The crystal oscillator three-jaw fixing plate 234 is also sleeved on the fixing seat connecting rod 233 and is located in the crystal oscillator fixing seat 231. At the top, the crystal oscillator three-jaw fixing plate 234 is used to fix multiple crystal oscillators 235. The second through hole 237 is a flared opening that is narrow at the top and wide at the bottom. A water-cooling shaft 240 is connected to the upper part of the probe cap 236. A water-cooling jacket 242 is provided in the inner ring of the water-cooling shaft 240. The water-cooling jacket 242 is an annular hollow cavity. The water inlet of the water-cooling jacket 242 is connected to a water inlet pipe, and the water outlet of the water-cooling jacket 242 is connected to a water outlet pipe. The water inlet and water outlet are symmetrically arranged. The input end of the water inlet pipe is connected to cooling water, and the cooling water enters the water supply through the water inlet pipe. The cooling jacket 242 discharges water from the outlet pipe, forming a circulating cooling water path to cool the crystal oscillator mechanism 230, thus forming a directional thermal radiation shield for the crystal oscillator mechanism 230. A probe outer cylinder 250 is fitted over the water-cooled shaft 240. The bottom of the probe outer cylinder 250 is flush with the probe cap 236. The probe outer cylinder 250 extends upwards to connect with the third rotating mechanism 260. The lower part of the probe outer cylinder 250 is connected to a light control structure 261 for detecting the refractive index or transmittance of the coating on the light control structure 261. The third… The rotating mechanism 260 is used to rotate the light control structure 261. The water inlet pipe and the water outlet pipe both pass through the interlayer and are connected to the external adapter 245. The external adapter 245 is sleeved with the probe outer cylinder 250. The water-cooled shaft 240 has a third through hole 241 at its center for sleeved with the intermediate rotating shaft 220. The water-cooled shaft 240 has a first receiving chamber near the crystal oscillator mechanism 230 for receiving the crystal oscillator mechanism 230 and the probe cap 236. The water-cooled jacket 242 is located above the crystal oscillator mechanism 230, which provides better cooling.The top of the water-cooled shaft 240 is locked with an intermediate rotating shaft protective sleeve 246. The intermediate rotating shaft protective sleeve 246 is sleeved with the intermediate rotating shaft 220 without interfering with it. The intermediate rotating shaft protective sleeve 246 is locked with the bottom of the external adapter 245. An interlayer is provided between the intermediate rotating shaft protective sleeve 246 and the probe outer cylinder 250. Multiple first partitions 247 are longitudinally spaced at intervals in the interlayer. The first partitions 247 are sleeved with the intermediate rotating shaft 220 but do not interfere with it, and are used to prevent the intermediate rotating shaft from interfering with it. The moving shaft 220 is radially shifted. The upper part of the crystal oscillator three-jaw fixing plate 234 is provided with a crystal oscillator detection device mounting block 248. The crystal oscillator detection device mounting block 248 is provided with a sixth through hole 249. The position of the sixth through hole 249 matches the position of the first through hole 232. The detection end of the crystal oscillator detection device is connected to the sixth through hole 249. The external connection end of the crystal oscillator detection device passes through the interlayer between the intermediate rotating shaft protective sleeve 246 and the intermediate rotating shaft 220 and is connected to the external crystal oscillator detection mechanism.

[0044] like Figure 2 and Figure 4 As shown, the second rotating component 200 is a rotary cylinder. The rotating shaft of the second rotating component 200 is connected to the input end of the clamping coupling 210. The output end of the clamping coupling 210 is connected to the intermediate transmission shaft of the probe. The intermediate transmission shaft is connected to the first bearing fixing block 211 through the first bearing 212. The outer ring of the first bearing 212 is engaged with the bearing fixing block, and the inner ring of the first bearing 212 is engaged with the connecting nut of the intermediate transmission shaft. The transmission shaft drives the first bearing 212 to rotate within the outer ring of the bearing fixing block, thereby enabling the intermediate transmission shaft to rotate. The shaft will not move up and down. A top dust cover 270 is provided at the connection between the second rotating component 200 and the intermediate rotating shaft 220. The top dust cover 270 covers the connection. The lower part of the top dust cover 270 extends downward to the support base 271. The top of the top dust cover 270 is locked to the housing of the second rotating component 200 through a first connecting plate 272. The bottom of the support base 271 is connected to the top large flange 273. The top large flange 273 is connected to the top of the vapor deposition machine and is used to connect the entire rotating device to the top of the vapor deposition machine.

[0045] like Figure 5As shown, the first rotating mechanism 100 includes a magnetic fluid 101 and a first rotating shaft 103. The first rotating shaft 103 is a hollow cavity and is sleeved with the second rotating component 200 without interfering with it. A rotating gear 104 is connected to the first rotating shaft 103. The shaft of the magnetic fluid 101 is sleeved in the middle of the magnetic fluid 101. The upper end of the shaft of the magnetic fluid 101 is placed outside the housing of the vacuum evaporation machine, and the lower end of the shaft of the magnetic fluid 101 is placed inside the internal cavity. The rotating gear 104 meshes with a second gear 102 connected to the lower end of the shaft of the magnetic fluid 101. A second synchronizing gear is provided at the upper end of the shaft of the magnetic fluid 101. The first rotating shaft 103 is rotated by a motor driven by a motor, which in turn drives the second rotating shaft 111 to rotate. The second rotating shaft 111 drives the second gear 102 to rotate, which in turn drives the rotating gear 104 to rotate, thus rotating the first rotating shaft 103. This forms a multi-stage transmission system, ensuring the smooth rotation of the first rotating shaft 103. The multi-stage transmission between the shaft of the magnetohydrodynamic 101 and the synchronous pulley ensures vacuum sealing while transmitting stable power, solving the problem that the traditional connection between the first rotating shaft 103 and the drive system is prone to leakage or power loss due to insufficient vacuum sealing.

[0046] The beneficial effects of this invention are as follows: This invention proposes a photoelectric control integrated system for a vacuum evaporation machine, including a first rotating mechanism 100. A second rotating component 200 is housed within the internal cavity of the first rotating mechanism 100. The rotating shaft of the second rotating component 200 is connected to an intermediate rotating shaft 220. A probe outer cylinder 250 is fitted over the intermediate rotating shaft 220. The probe outer cylinder 250 extends upwards to connect with a third rotating mechanism 260. A three-level rotating collaborative control architecture is adopted. The first rotating mechanism 100 drives the carrier to revolve, the second rotating component independently controls the rotation of the crystal oscillator mechanism, and the third rotating mechanism 260 regulates the photoelectric control structure 261, achieving multi-degree-of-freedom motion decoupling and effectively avoiding mechanical interference. A multi-crystal oscillator rotation detection mechanism is configured, driving the crystal oscillator mechanism through the intermediate rotating shaft 220. The rotating positioning of the structure 230 can automatically switch to the unused crystal oscillator 235 for testing, significantly extending the continuous working cycle and reducing the frequency of downtime maintenance. The innovative integrated optical monitoring function, through the collaborative design of the rotating optical control structure 261 and the probe outer cylinder 250, can detect the coating refractive index / transmittance parameters in real time. Combined with the crystal oscillator thickness data, a multi-dimensional process monitoring system is formed, which improves the film quality control accuracy by more than 40%. The nested rotating structure design places the crystal oscillator mechanism 230 at the fourth through hole 110 of the carrier 109, resulting in higher film thickness detection accuracy. The modular support component design and the coaxial arrangement of the rotating axis system ensure structural rigidity while achieving a compact layout, increasing the effective working space utilization of the equipment by more than 25%, making it particularly suitable for coating processing of high-precision micro-devices.

[0047] The embodiments described above are merely illustrative of several implementations of the present invention, and while the descriptions are specific and detailed, they should not be construed as limiting the scope of the present invention. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of the present invention, and these modifications and improvements all fall within the scope of protection of the present invention. Therefore, the scope of protection of this patent should be determined by the appended claims.

Claims

1. A photoelectric control integrated system for a vacuum evaporation coating machine, comprising a first rotating mechanism (100), the upper part of which passes through the housing of the vacuum evaporation coating machine and is connected to an external driver, and the lower part of which is connected to a support assembly, the support assembly comprising an upper support ring (107) and a lower support ring (108), the upper support ring (107) being connected to the lower support ring (108) via a support connection assembly, the lower support ring (108) being used to support a carrier (109) for receiving the coating, characterized in that, The first rotating mechanism (100) has a second rotating component (200) housed in its internal cavity. The internal cavity of the first rotating mechanism (100) and the second rotating component (200) do not interfere with each other. The rotating shaft of the second rotating component (200) is connected to an intermediate rotating shaft (220). A top dust cover (270) is provided at the connection between the second rotating component (200) and the intermediate rotating shaft (220). The lower part of the top dust cover (270) extends downward to a support base (271). The bottom of the support base (271) is connected to a top flange (273). The top flange (273) is connected to the top of the vapor deposition machine and is used to mount the entire rotating component. The rotating device is connected to the top of the vapor deposition machine. The carrier (109) to be coated has a fourth through hole (110) in the center. The bottom end of the intermediate rotating shaft (220) is connected to a crystal oscillator mechanism (230). The crystal oscillator mechanism (230) is placed in the cavity formed by the fourth through hole (110) and does not interfere with the fourth through hole (110). The crystal oscillator mechanism (230) is provided with multiple crystal oscillators (235). The lower part of the crystal oscillator mechanism (230) is provided with a probe cap (236). The probe cap (236) is provided with a second through hole (237). The crystal oscillator mechanism (230) is rotated by the first rotating component to drive the crystal oscillators (235). The rotation causes one of the crystal oscillators (235) to be perfectly aligned with the second through hole (237). The coating thickness of the vacuum evaporation machine in the current state is detected by the amount of coating at the crystal oscillator (235). The intermediate rotating shaft (220) is fitted with a probe outer cylinder (250). The probe outer cylinder (250) is hollow and does not interfere with the intermediate rotating shaft (220). The bottom of the probe outer cylinder (250) is flush with the probe cap (236). The probe outer cylinder (250) extends upward to connect with the third rotating mechanism (260). The lower part of the probe outer cylinder (250) is connected to a light control structure (261) for detection. The refractive index or transmittance of the coating on the light control structure (261) is specified. The third rotating mechanism (260) is used to rotate the light control structure (261). Multiple second partitions (2620) are provided between the probe outer cylinder (250) and the probe outer cylinder (250). The multiple second partitions (2620) are arranged in parallel at intervals to prevent the probe outer cylinder (250) from moving left and right when rotating. The light transmission and reflection measuring device includes a light channel (2619). The light channel (2619) is locked by the second partitions (2620). The input end of the external light of the light channel (2619) is connected and fixed to the top large flange (273).

2. The photoelectric control integrated system for the vacuum evaporation machine as described in claim 1, characterized in that: The probe outer cylinder (250) has a light control structure fitted around its bottom outer ring. The light control structure includes a raised glass block (2611) and a glass plate (2612). The raised glass block (2611) is pressed onto the upper part of the glass plate (2612) near the inner ring. A glass support plate (2615) is provided at the lower part of the glass plate (2612). A light control shell (2617) is fitted around the outer ring of the glass support plate (2615). The light control shell (2617) is a hollow structure and extends upward to lock with the top large flange (273). The main body of the carrier plate (2615) is provided with a fifth through hole (2616). A light transmission and reflection measuring device is installed inside the hollow shell and the light receiving head of the light transmission and reflection measuring device is matched with the position of the fifth through hole (2616). The protruding glass pressing block (2611) drives the glass plate (2612) to rotate, so that the uncoated glass plate (2612) is matched with the position of the fifth through hole (2616). After the bottom of the glass plate (2612) is coated, the external light beam is shone to the position matched with the fifth through hole (2616) by the light transmission and reflection measuring device and reflected back to detect the refractive index or light transmittance.

3. The photoelectric control integrated system for the vacuum evaporation deposition machine as described in claim 2, characterized in that: The glass sheet (2612) has a ring structure and a notch (2613). The lower part of the raised glass block (2611) is provided with an arc-shaped column (2614). The arc-shaped column (2614) is integrally formed with the outer wall of the raised glass block (2611). The arc-shaped column (2614) abuts against one side wall of the notch (2613) of the glass sheet (2612). The raised glass block (2611) drives the glass sheet (2612) to rotate.

4. The photoelectric control integrated system for the vacuum evaporation deposition machine as described in claim 3, characterized in that: Multiple hanging rods (2621) are inserted between multiple second partitions (2620). A heating device is connected to the bottom of the hanging rods (2621). The heating device includes a heating plate (2622) and a coil cover plate (2623) wrapped around the heating plate (2622). The heating device is located on the upper part of the glass plate (2612).

5. The photoelectric control integrated system for the vacuum evaporation deposition machine as described in claim 2, characterized in that: The glass carrier plate (2615) is covered with an anti-collision sleeve (2626). The anti-collision sleeve (2626) has an upward opening and covers the glass carrier plate (2615). The anti-collision sleeve (2626) has a fifth through hole (2616) and a hole corresponding to the second through hole (237) for receiving the coating material to the corresponding position.

6. The photoelectric control integrated system for the vacuum evaporation deposition machine as described in claim 1, characterized in that: The crystal oscillator mechanism (230) includes a crystal oscillator fixing seat (231) and a crystal oscillator three-jaw fixing plate (234). The crystal oscillator fixing seat (231) has a first through hole (232) corresponding to a plurality of crystal oscillators (235). The first through hole (232) serves as a channel for testing the film material. A fixing seat connecting rod (233) is provided in the middle of the upper surface of the crystal oscillator fixing seat (231) for locking with the intermediate rotating shaft (220), so that the intermediate rotating shaft (220) rotates and drives the crystal oscillator fixing seat (231) to rotate. The crystal oscillator three-jaw fixing plate (234) is also sleeved on the fixing seat connecting rod (233) and located on the upper part of the crystal oscillator fixing seat (231). The crystal oscillator three-jaw fixing plate (234) is used to fix a plurality of crystal oscillators (235).

7. The photoelectric control integrated system for the vacuum evaporation deposition machine as described in claim 6, characterized in that: The upper part of the probe cap (236) is connected to a water-cooled shaft (240), and the probe outer cylinder (250) is sleeved on the water-cooled shaft (240). The water-cooled shaft (240) is provided with a water-cooled jacket (242) in the inner ring. The water-cooled jacket (242) is an annular hollow cavity. The water inlet of the water-cooled jacket (242) is connected to the water inlet pipe, and the water outlet of the water-cooled jacket (242) is connected to the water outlet pipe. The water inlet and the water outlet are symmetrically arranged. The input end of the water inlet pipe is connected to cooling water. The cooling water enters the water-cooled jacket (242) from the water inlet pipe and is discharged from the water outlet pipe to form a circulating cooling water path to cool the crystal oscillator mechanism (230) and form a directional thermal radiation shield for the crystal oscillator mechanism (230).

8. The photoelectric control integrated system for the vacuum evaporation machine as described in claim 7, characterized in that: Both the inlet and outlet pipes pass through the interlayer and connect to the external adapter (245). The external adapter (245) is sleeved with the probe outer cylinder (250). The water-cooled shaft (240) has a third through hole (241) at its center for sleeved connection with the intermediate rotating shaft (220). The water-cooled shaft (240) has a first receiving chamber near the crystal oscillator mechanism (230) for receiving the crystal oscillator mechanism (230) and the probe cap (236). The top of the water-cooled shaft (240) is locked with an intermediate rotating shaft protective sleeve. 246), the intermediate rotating shaft protective sleeve (246) is sleeved with the intermediate rotating shaft (220) without interfering, the intermediate rotating shaft protective sleeve (246) is locked to the bottom of the external adapter (245), an interlayer is provided between the intermediate rotating shaft protective sleeve (246) and the probe outer cylinder (250), and a plurality of first partitions (247) are longitudinally spaced at the interlayer. The first partitions (247) are sleeved with the intermediate rotating shaft (220) but do not interfere, and are used to prevent the intermediate rotating shaft (220) from radially shifting.

9. The photoelectric control integrated system for the vacuum evaporation machine as described in claim 8, characterized in that: The upper part of the crystal oscillator three-jaw fixing plate (234) is provided with a crystal oscillator detection device mounting block (248). The crystal oscillator detection device mounting block (248) is provided with a sixth through hole (249). The position of the sixth through hole (249) matches the position of the first through hole (232). The detection end of the crystal oscillator detection device is connected to the sixth through hole (249). The external connection end of the crystal oscillator detection device passes through the interlayer between the intermediate rotating shaft protective sleeve (246) and the intermediate rotating shaft (220) and connects to the external crystal oscillator detection mechanism.

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