Fluidized bed chemical vapor deposition device
By using annularly distributed fluidized bed and modular heating and filtration components in the fluidized bed chemical vapor deposition device, the equipment production capacity limitation and temperature gradient problems are solved, and efficient and safe large-scale silicon carbon material production is achieved.
Patent Information
- Application Number
- CN202510531134.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-04-25
- Publication Date
- 2025-07-11
AI Technical Summary
The existing fluidized bed chemical vapor deposition equipment has production capacity limitations, temperature gradient problems caused by equipment amplification, fluidized dead zones and safety hazards in the production of silicon carbon materials, and the area covers a large area, making it difficult to meet the large-scale mass production needs of the power battery industry.
Multiple fluidized beds are uniformly distributed on the support frame in an annular shape, and are independently inserted into the heating chamber of the heating assembly. Accurate transportation is achieved through the loading and unloading assembly. Combined with modular heating and filtering assembly, parameters are independently regulated to avoid radial temperature gradients and fluidized dead zones, and reduce the risk of mechanical reliability.
Significantly increase single batch production capacity, reduce the area of production site, ensure material uniformity and product quality, reduce maintenance costs, reduce safety hazards, and improve production continuity and stability.
Smart Images
Figure CN120291052A_ABST
Abstract
Description
Technical Field
[0001] The present invention belongs to the technical field of fluidized bed equipment, and more specifically, relates to a fluidized bed chemical vapor deposition device. Background Art
[0002] The fluidized bed chemical vapor deposition technology is widely used in the field of material preparation, especially playing an important role in the production of silicon-carbon materials. At present, the fluidized bed chemical vapor deposition equipment applied to silicon-carbon production on the market has many bottlenecks in actual use and production capacity improvement.
[0003] The prior art mostly adopts a vertical fluidized bed reactor, in which powder materials enter the chamber from the upper part of the reactor through a pneumatic conveying system, and after silane is mixed with the carrier gas, it is evenly distributed through the bottom annular gap structure, so that the materials form a particulate fluidization state.
[0004] However, the single-batch production capacity of current commercial equipment is generally limited to less than 20 kg, which is difficult to meet the increasing large-scale mass production demand of the power battery industry for silicon-carbon materials. When trying to improve the production capacity through the scheme of running multiple devices simultaneously, it will lead to a significant increase in the actual floor area of the production site, resulting in low production capacity per unit area. And when trying to carry out enlarged design on the equipment, a series of thorny problems are also faced. First, limited by actual conditions, the height of the equipment cannot be increased infinitely, and the production capacity has to be improved by expanding the diameter of the fluidized bed reaction zone. However, this will cause a radial temperature gradient inside the cylindrical chamber of the reactor, seriously affecting the uniformity of the finished materials and reducing the product quality. Second, after a single device is enlarged, the amount of materials increases significantly, and the doubling of the material processing volume puts higher requirements on the hydrodynamic design. The traditional annular gap gas inlet method is prone to fluidization dead zones or channeling phenomena in large-scale fluidized beds, while adopting complex stirring or multi-stage gas distribution structures will face problems of mechanical reliability and maintenance costs. In addition, after the equipment is enlarged, the process parameter system needs to be re-optimized, including key indicators such as temperature field distribution, gas flow rate, and material residence time. This process not only requires a large amount of test costs, but also may bring safety hazards due to too high local silane concentration. Summary of the Invention
[0005] The purpose of the present invention is to provide a fluidized bed chemical vapor deposition device, aiming to solve the problems of safety hazards and increased costs caused by the method of relying on increasing the diameter of the fluidized bed reaction zone to improve the production capacity.
[0006] To achieve the above object, the technical solution adopted by the present invention is: In the first aspect, a fluidized bed chemical vapor deposition device is provided, including: A support frame having a plurality of fixed positions evenly distributed in a ring shape; The fluidization component includes a plurality of fluidized beds arranged in one-to-one correspondence with the fixed positions, and the fluidized beds are connected to the corresponding fixed positions; The heating component is provided with a plurality of heating chambers for accommodating the fluidized beds, and each fluidized bed is inserted into one of the heating chambers. The heating component is used to heat the fluidized beds; The feeding component includes a feeding bin for storing raw materials, a plurality of feeding pipes connected to the feeding bin, and feeding valves provided on the feeding pipes. The feeding bin is connected to the support frame, and each feeding pipe is connected to the corresponding fluidized bed for transporting the raw materials in the feeding bin into the fluidized bed; and The discharging component includes a discharging bin for storing materials, a plurality of discharging pipes connected to the discharging bin, and discharging valves provided on the discharging pipes. The discharging bin is connected to the support frame, and each discharging pipe is connected to the corresponding fluidized bed for transporting the materials in the fluidized bed into the discharging bin.
[0007] In a possible implementation manner, the heating component includes a plurality of heaters connected end to end to form a ring-shaped or columnar structure. Each heater is provided with the heating chamber, and two adjacent heaters are detachably connected.
[0008] In a possible implementation manner, the heating component further includes slide rails and sliders provided on opposite sides of the heater. The sliders are used to slidably connect with the slide rails of adjacent heaters to realize the up and down movement of the sliders along the corresponding slide rails.
[0009] In a possible implementation manner, the feeding component further includes a blowing mechanism communicated with the feeding pipe. The blowing mechanism is used to introduce air flow into the feeding pipe.
[0010] In a possible implementation manner, the fluidized bed chemical vapor deposition device further includes a filtering component. The filtering component includes a plurality of sedimentation tanks corresponding to the fluidized beds one by one. The sedimentation tanks are connected to the air outlets of the fluidized beds for filtering the gases discharged from the fluidized beds.
[0011] In a possible implementation manner, the filtering component further includes a cleaning mechanism connected to the sedimentation tank. The cleaning mechanism includes two groups of cleaning modules. One group of the cleaning modules is used to introduce air flow into the sedimentation tank to clean the material particles intercepted by the sedimentation tank; the other group of the cleaning modules is used to discharge the air flow in the sedimentation tank, and the two groups of cleaning modules operate alternately at regular intervals.
[0012] In a possible implementation, the feeding component further includes a weighing sensor disposed in the feeding bin and a controller communicatively connected to the weighing sensor, and the feeding valve is also communicatively connected to the controller.
[0013] In a possible implementation, the heating component includes a plurality of heating modules arranged in the vertical direction. Adjacent two groups of the heating modules are arranged in a fitting manner, and each heating module is provided with a plurality of heating holes. A plurality of the heating holes corresponding up and down together form the heating cavity.
[0014] In a possible implementation, the fluidized bed chemical vapor deposition device further includes a discharging component communicated with the fluidized bed. The discharging component includes a pressure detector disposed in the fluidized bed and a pressurizing device communicated with the fluidized bed. The pressurizing device is used to increase the pressure in the fluidized bed so that the materials in the fluidized bed are discharged into the blanking bin.
[0015] In a possible implementation, the fluidized bed includes a fluidization tank and a stirrer disposed in the fluidization tank, and further includes a mixing gas pipe disposed at the bottom of the fluidization tank. The mixing gas pipe is coaxially arranged with the stirrer and is used to introduce air flow into the fluidization tank.
[0016] The beneficial effects of the fluidized bed chemical vapor deposition device provided by the present invention are as follows: Compared with the prior art, a plurality of fluidized beds are evenly distributed in a ring on the support frame, realizing parallel operation of multiple reaction units, greatly improving the single-batch production capacity, promising to break through the current production capacity limit, and better meeting the large-scale mass production requirements of the power battery industry. Compared with the conventional scheme of placing multiple devices side by side and operating simultaneously, the layout of this device is compact, and multiple fluidized beds share the feeding bin and the blanking bin, significantly reducing the floor area of the production site and improving the production capacity per unit area. Inside the device, each fluidized bed is independently inserted into the heating cavity of the heating component, which helps to accurately control the temperature field of each fluidized bed, avoid the radial temperature gradient problem caused by equipment scaling, and ensure the uniformity of the finished materials and the product quality. In addition, in terms of material transportation, through the feeding component and the discharging component, the device realizes accurate transportation of raw materials for each fluidized bed and timely output of materials, while maintaining the stability of the hydrodynamic environment inside each fluidized bed, effectively avoiding fluidization dead zones or channeling phenomena, reducing the dependence on complex stirring or multi-stage gas distribution structures, and reducing the mechanical reliability risk and maintenance cost. In terms of process optimization, each fluidized bed can be independently adjusted in parameters, reducing the difficulty of overall optimization of the process parameter system due to equipment scaling, saving test costs, and also reducing the safety hazards caused by too high local silane concentration. Description of the Drawings To more clearly illustrate the technical solutions in the embodiments of the present invention, the following will briefly introduce the drawings required for the description of the embodiments or the prior art. Obviously, the drawings in the following description are only some embodiments of the present invention. For those of ordinary skill in the art, without creative efforts, other drawings can be obtained based on these drawings.
[0017] Figure 1 It is a schematic structural diagram of a fluidized bed chemical vapor deposition device provided by an embodiment of the present invention; Figure 2 It is a schematic structural diagram of a fluidized bed chemical vapor deposition device provided by an embodiment of the present invention; Figure 3 It is a front view structural schematic diagram of a fluidized bed chemical vapor deposition device provided by an embodiment of the present invention.
[0018] In the figure: 1, support frame; 2, feeding assembly; 201, feeding bin; 202, feeding pipe; 3, discharging assembly; 301, discharging bin; 302, discharging pipe; 4, heating assembly; 401, heater; 402, slide rail; 5, fluidizing assembly; 501, fluidized bed; 5011, fluidizing tank; 5012, stirrer; 5013, mixing gas pipe; 6, filtering assembly; 601, settler; 602, cleaning pipe. Detailed implementation manners
[0019] In order to make the technical problems, technical solutions and beneficial effects to be solved by the present invention more clearly understood, the present invention will be further described in detail below with reference to the drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention and are not used to limit the present invention.
[0020] In the claims, the description and the above-mentioned drawings of the present invention, unless otherwise clearly defined, when using terms such as "first", "second" or "third", etc., are for distinguishing different objects, rather than for describing a specific order. Unless otherwise specified, the remaining orientation terms, such as "vertical", "clockwise", "counterclockwise", etc., indicating the orientation or position relationship are based on the orientation and position relationship shown in the drawings, and are only for facilitating the description of the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation or be constructed and operated in a specific orientation, so it should not be construed as limiting the specific protection scope of the present invention. In the claims, the description and the above-mentioned drawings of the present invention, unless otherwise clearly defined, when using the terms "fixed connection" or "fixedly connected", should be understood in a broad sense, that is, any connection method without displacement relationship and relative rotation relationship between the two, that is, including non-detachable fixed connection, detachable fixed connection, being integrated as one, and being fixed connected through other devices or elements. In the claims, the description and the above-mentioned drawings of the present invention, when using the terms "comprising", "having" and their variants, are intended to mean "including but not limited to".
[0021] Please refer to Figures 1 to 3 , and now the fluidized bed chemical vapor deposition device provided by the present invention will be described. The fluidized bed chemical vapor deposition device includes a support frame 1, a fluidization component 5, a heating component 4, a feeding component 2 and a discharging component 3. The support frame 1 has a plurality of fixed positions evenly distributed in a ring shape; the fluidization component 5 includes a plurality of fluidized beds 501 corresponding to the fixed positions one by one, and the fluidized beds 501 are connected to the corresponding fixed positions; the heating component 4 is provided with a plurality of heating cavities for accommodating the fluidized beds 501, and each fluidized bed 501 is inserted into one of the heating cavities, and the heating component 4 is used for heating the fluidized beds 501; the feeding component 2 includes a feeding bin 201 for storing raw materials, a plurality of feeding pipes 202 connected to the feeding bin 201 and feeding valves provided on the feeding pipes 202. The feeding bin 201 is connected to the support frame 1, and each feeding pipe 202 is connected to the corresponding fluidized bed 501 for transporting the raw materials in the feeding bin 201 into the fluidized bed 501; the discharging component 3 includes a discharging bin 301 for storing materials, a plurality of discharging pipes 302 connected to the discharging bin 301 and discharging valves provided on the discharging pipes 302. The discharging bin 301 is connected to the support frame 1, and each discharging pipe 302 is connected to the corresponding fluidized bed 501 for transporting the materials in the fluidized bed 501 into the discharging bin 301.
[0022] Compared with the prior art, in the fluidized bed chemical vapor deposition device provided by the present invention, a plurality of fluidized beds 501 are evenly distributed in a ring on the support frame 1, enabling multiple reaction units to operate in parallel, greatly improving the single-batch production capacity, expected to break through the current production capacity limitations, and better meeting the large-scale mass production requirements of the power battery industry. Compared with the conventional solution of placing multiple devices side by side and operating simultaneously, the layout of this device is compact, and multiple fluidized beds 501 share the feeding bin 201 and the discharging bin 301, significantly reducing the floor area of the production site and increasing the production capacity per unit area. Inside the device, each fluidized bed 501 is independently inserted into the heating cavity of the heating component 4, which helps to accurately control the temperature field of each fluidized bed 501, avoid the radial temperature gradient problem caused by equipment scaling, and ensure the uniformity of the finished product material and product quality. In addition, in terms of material transportation, through the feeding component 2 and the discharging component 3, the device realizes the accurate transportation of raw materials for each fluidized bed 501 and the timely output of materials, while maintaining the stability of the hydrodynamic environment inside each fluidized bed 501, effectively avoiding fluidization dead zones or channeling phenomena, reducing the dependence on complex stirring or multi-stage gas distribution structures, and reducing the mechanical reliability risk and maintenance cost. In terms of process optimization, each fluidized bed 501 can be independently adjusted in parameters, reducing the difficulty of overall optimization of the process parameter system due to equipment scaling, saving test costs, and also reducing the safety hazards caused by excessive local silane concentration.
[0023] As a specific implementation manner of the heating component 4, the heating component 4 is provided with a relief hole, and the relief hole is located in the middle part of a plurality of heating cavities. The electrical pipeline and the gas pipeline of the fluidized bed 501 are both arranged in the relief hole. The electrical pipeline and the gas pipeline of the fluidized bed 501 can be orderly arranged in the relief hole. On the one hand, it realizes the rationalization of the internal layout of the equipment, greatly reduces the occupied space of the pipelines, effectively avoids the safety hazards and maintenance problems caused by the intricate pipelines, and significantly improves the overall compactness of the equipment. On the other hand, this layout optimization provides great convenience for the layout of explosion-proof facilities in the factory building. The installation and layout of explosion-proof facilities such as explosion-proof walls are more flexible, further enhancing the safety of the production environment, reducing the losses that may be caused by explosion accidents, and helping enterprises to build a more efficient and safe production system.
[0024] It should be noted that Figure 1 the feeding pipe 202 and the discharging pipe 302 in the attached
[0025] In some embodiments, please refer to Figures 1 to 3 , the heating component 4 includes a plurality of heaters 401 connected end to end to form a ring-shaped or columnar structure. Each heater 401 is provided with a heating cavity, and two adjacent heaters 401 are detachably connected.
[0026] A plurality of heaters 401 are connected end to end to form a ring-shaped or columnar structure, which perfectly adapts to the fluidized beds 501 distributed in a ring shape on the support frame 1. This not only ensures that each fluidized bed 501 can be evenly heated, effectively solves the problem of radial temperature gradient that occurs during the scale-up of traditional equipment, guarantees the quality of the finished product materials, but also the overall ring-shaped or columnar layout further optimizes the spatial structure of the equipment, significantly improving the production efficiency per unit space. The detachable connection design between the heaters 401 greatly facilitates the maintenance and replacement of individual heaters 401. When a certain heater 401 fails, there is no need to replace the entire heating assembly 4, reducing the equipment maintenance cost and downtime, and enhancing the continuity and stability of production. In addition, this design also provides great flexibility for the upgrade and transformation of the equipment. When dealing with different production requirements, the heating performance of the heating assembly 4 can be easily optimized by adjusting or replacing some heaters 401, thereby reducing the equipment upgrade cost, extending the service life of the equipment, and providing strong support for the enterprise to maintain competitiveness in the complex and changeable market environment. Optionally, the heating assembly 4 further includes a heat insulation layer wrapped around the heater 401.
[0027] Optionally, the detachable connection between two adjacent heaters 401 is achieved by clamping or screwing. For example, a connecting piece is introduced as a connecting component and is clamped or screwed to the adjacent heaters 401. Of course, a connecting clamp can also be provided around the plurality of heaters 401 to achieve detachable connection.
[0028] Optionally, the heater 401 at the bottom is connected to the support surface to improve the stability of the entire heater 401.
[0029] In some embodiments, please refer to Figures 1 to 3 , the heating assembly 4 further includes slide rails 402 and sliders provided on opposite sides of the heater 401. The sliders are used to slidably connect with the slide rails 402 of the adjacent heaters 401 to enable the sliders to move up and down along the corresponding slide rails 402.
[0030] The slide rail 402 extends in the vertical direction, and the slider can be connected to the slide rail 402 of the adjacent heater 401. Although the heaters 401 are closely connected, in actual maintenance, this structural design makes the disassembly process between the heaters 401 more convenient. Compared with the solution with inconvenient overall disassembly, in this embodiment, only the faulty heater 401 needs to be removed targeted, greatly reducing the maintenance difficulty. In addition, when multiple heaters 401 operate simultaneously, a single heating furnace is equipped and connected by sliders to ensure that the operation of each heater 401 is independent of each other. Even if one heater 401 fails, the other heaters 401 can still operate normally without shutting down all the furnaces, greatly improving the continuity of production, avoiding the interruption of the entire production process due to a single equipment failure, significantly reducing the economic losses caused by maintenance, and providing a strong guarantee for efficient and stable production.
[0031] Optionally, the heating assembly 4 is provided with an installation groove, and the slide rail 402 is arranged in the installation groove. When the slider is connected to the adjacent slide rail 402, it can ensure that the adjacent heaters 401 are closely arranged, avoiding gaps, and improving the overall consistency and reliability.
[0032] In some embodiments, please refer to Figures 1 to 3 , the feeding assembly 2 further includes a blowing mechanism communicated with the feeding pipe 202, and the blowing mechanism is used to introduce air flow into the feeding pipe 202.
[0033] When the raw material falls into the feeding pipe 202, the blowing mechanism quickly takes effect to provide power for the raw material transportation, ensuring that the material can reach the fluidized bed 501 quickly and stably, greatly improving the feeding efficiency and meeting the strict requirements of large-scale production for the timeliness of material supply. Particularly, after the feeding operation is completed, the feeding valve is immediately closed, but the blowing mechanism continues to operate, and the residual material in the pipeline can be completely transported to the fluidized bed 501. This design prevents the residue and accumulation of materials in the pipeline, not only effectively avoiding waste of raw materials and reducing production costs, but also preventing pipeline blockage caused by material residue, reducing the frequency of equipment maintenance, and extending the service life of the equipment. At the same time, the stable and complete material transportation process ensures the accurate addition of materials in the fluidized bed 501.
[0034] Optionally, the feeding valve is located at the connection between the feeding pipe 202 and the feeding bin 201, and the blowing mechanism is located downstream of the feeding valve.
[0035] In some embodiments, please refer to Figures 1 to 3 , the fluidized bed chemical vapor deposition device further includes a filtering assembly 6, and the filtering assembly 6 includes a plurality of settlers 601 corresponding to the fluidized bed 501 one by one. The settlers 601 are connected to the air outlet of the fluidized bed 501 and are used to filter the gas discharged from the fluidized bed 501.
[0036] The present invention further optimizes the waste gas treatment efficiency and system stability of the chemical vapor deposition process by independently arranging sedimentation chambers 601 at the gas outlets of each fluidized bed 501. Compared with the traditional single-chamber large-flow filtration solution, this distributed filtration design can accurately control the gas emission characteristics of each fluidized bed 501, effectively avoiding the problem of reduced filtration efficiency caused by gas mixing when multiple reaction units are connected in parallel. The independent operation of each sedimentation chamber 601 not only reduces the gas flow resistance but also facilitates the real-time monitoring of the exhaust state of a single fluidized bed 501 to promptly detect abnormal conditions. In addition, the modular filtration structure makes maintenance more convenient. When a single sedimentation chamber 601 is blocked or damaged, only the corresponding unit needs to be repaired without shutting down the equipment, significantly improving the continuous operation ability of the equipment. This design also optimizes the recovery and treatment efficiency of silane tail gas, reduces the waste of unreacted precursors, and simultaneously reduces the risk of product purity caused by gas cross-contamination, providing a reliable waste gas management solution for the large-scale production of highly consistent silicon-carbon materials.
[0037] In some embodiments, referring to Figures 1 to 3 , the filtration assembly 6 further includes a cleaning mechanism connected to the sedimentation chamber 601. The cleaning mechanism includes two sets of cleaning modules. One set of cleaning modules is used to introduce air flow into the sedimentation chamber 601 to clean the material particles intercepted by the sedimentation chamber 601; the other set of cleaning modules is used to discharge the air flow in the sedimentation chamber 601, and the two sets of cleaning modules operate alternately at regular intervals.
[0038] In this embodiment, by setting two sets of cleaning modules that can operate alternately, the on-line self-cleaning and continuous operation of the sedimentation chamber 601 are realized, greatly improving the stability and production efficiency of the chemical vapor deposition system. This innovative design adopts a periodic air flow switching mechanism. When one set of cleaning modules performs reverse blowing and dust cleaning, the other set maintains normal exhaust. By rotating at regular intervals, it not only avoids the process interruption problem caused by the traditional single-way reverse blowing system but also ensures the continuity of waste gas treatment. This dynamic balance cleaning method can keep the sedimentation chamber 601 in the best ventilation state compared with the intermittent reverse blowing technology, reduce the pressure difference fluctuation, and effectively extend the service life of the filter element. At the same time, the two-way air flow exchange design significantly improves the cleaning effect of deep dust accumulation in the sedimentation chamber 601 through periodic air flow reverse flushing. This solution also realizes the physical isolation of waste gas emission and reverse blowing air flow, completely eliminating the risk of process gas cross-contamination, and providing a reliable tail gas treatment guarantee for continuous large-scale production while ensuring the utilization rate of silane.
[0039] Optionally, the specific alternating time can be adjusted according to the process and equipment conditions.
[0040] Optionally, the cleaning module includes one or more cleaning pipes 602.
[0041] In some embodiments, referring toFigures 1 to 3 The feeding assembly 2 also includes a weighing sensor disposed in the feeding bin 201 and a controller communicatively connected to the weighing sensor, and the feeding valve is also communicatively connected to the controller.
[0042] The weighing sensor is used to detect the weight of the loading bin 201. When the weighing sensor detects that the loading bin 201 reaches the preset weight, a stop feeding signal is generated, and the controller controls the loading valve to close according to the stop feeding signal. The present invention realizes the precise measurement and intelligent control of raw material transportation by integrating the weighing sensor with the loading bin 201 and linking it with the controller, and significantly improves the stability and consistency of the production process. The design can accurately control the raw material distribution error of each fluidized bed 501 by real-time monitoring of the weight change of the loading bin 201 and coordinating the precise regulation of each loading valve by the programmable controller, fundamentally solving the material balance problem when multiple reaction units are connected in parallel. This closed-loop control system can not only automatically compensate for the feeding deviation caused by the difference in powder fluidity, but also flexibly adjust the feed ratio of each fluidized bed 501 according to the process requirements, providing a highly controllable material distribution scheme for the production of products of different specifications. At the same time, the intelligent metering system realizes a complete material traceability function by recording the feeding data of each batch, which not only avoids human operation errors, but also provides reliable data support for process optimization, so that the consistency of product quality is systematically improved. In addition, when abnormal weight fluctuations are detected, the system can immediately trigger an alarm and automatically adjust the status of the feeding valve, effectively preventing production accidents such as blockage or empty warehouses, and greatly improving the automation level and operational reliability of the equipment.
[0043] Optionally, the blowing mechanism is communicatively connected to the controller.
[0044] It should be noted that the difference between the initial weight and the current weight is the weight of the raw material entering the fluidized bed 501 , so accurate feeding into the fluidized bed 501 can be achieved by controlling the weight of the remaining raw material in the feeding bin 201 . In some embodiments, see Figures 1 to 3 The heating assembly 4 includes a plurality of heating modules arranged in the up-and-down direction. Two adjacent groups of heating modules are arranged in close proximity to each other, and each heating module is provided with a plurality of heating holes. The corresponding plurality of heating holes in the upper and lower directions together form a heating cavity.
[0045] The present invention realizes high-precision control and uniform distribution of the temperature field in the fluidized bed 501 reactor by adopting a modular layered heating structure. This design decomposes the traditional integral heating furnace into multiple independently temperature-controllable heating modules, which form a complete heating cavity through upper and lower stacked combinations, enabling each fluidized bed 501 to obtain the ability to regulate temperature in axial zones. The seamless fitting structure of adjacent heating modules effectively reduces heat loss. Combined with the precisely aligned heating hole design, it ensures that the longitudinal temperature gradient in the heating cavity does not exceed ±2°C, solving the common axial temperature difference problem in large reactors. This modular architecture allows for implementing differential temperature control strategies for each heating zone according to the process requirements of different reaction stages. For example, maintaining a high temperature in the deposition zone and adopting a gradient temperature increase in the preheating zone significantly improves the thermal energy utilization efficiency and reaction uniformity. At the same time, the layered design greatly simplifies the equipment maintenance and upgrade process. When a single heating module is damaged, only the corresponding component needs to be replaced, reducing the maintenance cost. This structure also has excellent scalability. By increasing or decreasing the number of heating modules, it can adapt to fluidized beds 501 of different heights, providing a flexible temperature control platform for the process development of various silicon-carbon materials.
[0046] Specifically, except for the heating holes at the bottom being non-through holes, other heating holes are through holes.
[0047] In some embodiments, referring to Figures 1 to 3 , the fluidized bed chemical vapor deposition device further includes a discharging assembly connected to the fluidized bed 501. The discharging assembly includes a pressure detector disposed in the fluidized bed 501 and a pressurizing device connected to the fluidized bed 501. The pressurizing device increases the pressure in the fluidized bed 501 by supplementing nitrogen into the fluidized bed 501, so that the materials in the fluidized bed 501 are discharged into the blanking bin 301. The pressure detector detects the pressure in the fluidized bed 501. After the chemical vapor deposition operation is completed, the pressurizing device increases the pressure in the fluidized bed 501. When the pressure in the fluidized bed 501 reaches the preset pressure, the blanking valve opens, and the materials are discharged into the blanking bin 301 under the action of air pressure. Through the integrated discharging system with pressure detection and controllable pressurization, the rapid and complete discharge of the materials in the fluidized bed 501 is realized, significantly improving the production efficiency and material recovery rate. The pressure-assisted discharging mechanism effectively solves the residual problems of fine-grained materials caused by electrostatic adsorption and bridging effect, improves the discharge rate of the materials in the bed layer, avoids cross-contamination between batches caused by the materials remaining in the blanking pipe 302, and also avoids the problem of the blanking pipe 302 being blocked by materials. The system adopts a closed-loop control strategy and dynamically adjusts the pressurization parameters according to the feedback of the pressure sensor, which can not only ensure the smooth flow of materials but also prevent equipment wear or dust flying caused by overpressure. This controllable pressure discharging method is particularly suitable for handling high-adhesion powders. Combined with the negative pressure collection system of the blanking bin 301, it realizes a fully enclosed dust-free operation, improving the production safety of silicon-carbon materials while stably increasing the actual yield of each batch of products.
[0048] Optionally, the pressure detector and the pressurizing device are respectively communicatively connected to the controller.
[0049] In some embodiments, see Figures 1 to 3 The fluidized bed 501 includes a fluidizing tank 5011 and an agitator 5012 disposed in the fluidizing tank 5011 , and also includes an aeration pipe 5013 disposed at the bottom of the fluidizing tank 5011 . The aeration pipe 5013 is coaxially arranged with the agitator 5012 and is used to introduce airflow into the fluidizing tank 5011 . Through the coaxial design of the mixing tube 5013 and the agitator 5012 structure, the synergistic enhancement of gas distribution and mechanical stirring is achieved, and the gas-solid contact efficiency and reaction uniformity in the fluidized bed 501 are significantly improved. This solution forms an annular airflow channel between the agitator shaft and the mixing tube 5013, and the gas synergizes with the agitator blades when rotating and rising along the axial direction, which not only avoids the fluidization dead zone that is easy to produce in the traditional bottom gas distribution, but also overcomes the problem of excessive energy consumption caused by simple mechanical stirring. This coaxial arrangement allows the reaction gas to be evenly dispersed in a tangential swirl manner, and with the mechanical crushing effect of the agitator 5012, the contact area between the gas and the material can be increased, and the deposition efficiency is improved. The interstitial airflow channel design is particularly suitable for high-load conditions. When the material occupies a large amount of space in the fluidized tank 5011, it can still maintain a stable fluidized state, and the power consumption is effectively reduced compared to the traditional fluidized bed 501. In addition, this embodiment realizes the modular integration of the gas distribution and agitation system, greatly simplifies the bottom structure of the equipment, reduces the difficulty of maintenance, and eliminates the problem of easy clogging of the traditional porous distribution plate, providing a reliable fluid mechanics guarantee for continuous production.
[0050] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present invention should be included in the protection scope of the present invention.
Claims
1. Fluidized bed chemical vapor deposition apparatus, characterized in that, Comprising: A support frame having a plurality of fixing positions evenly distributed in a ring shape; A fluidization component including a plurality of fluidized beds corresponding to the fixing positions one by one, and the fluidized beds are connected to the corresponding fixing positions; A heating component having a plurality of heating cavities for accommodating the fluidized beds, each of the fluidized beds being inserted into one of the heating cavities, and the heating component is used for heating the fluidized beds; A feeding component including a feeding bin for storing raw materials, a plurality of feeding pipes connected to the feeding bin, and feeding valves provided on the feeding pipes, the feeding bin is connected to the support frame, and each feeding pipe is connected to the corresponding fluidized bed for transporting the raw materials in the feeding bin into the fluidized bed; And A discharging component including a discharging bin for storing materials, a plurality of discharging pipes connected to the discharging bin, and discharging valves provided on the discharging pipes, the discharging bin is connected to the support frame, and each discharging pipe is connected to the corresponding fluidized bed for transporting the materials in the fluidized bed into the discharging bin.
2. The fluidized bed chemical vapor deposition device according to claim 1, wherein The heating component includes a plurality of heaters connected end to end to form a ring-shaped or columnar structure, each of the heaters is provided with the heating cavity, and two adjacent heaters are detachably connected.
3. The fluidized bed chemical vapor deposition apparatus according to claim 2, wherein, The heating component further includes slide rails and sliders provided on opposite sides of the heater, and the sliders are used for slidingly connecting with the slide rails of adjacent heaters to realize the up and down movement of the sliders along the corresponding slide rails.
4. The fluidized bed chemical vapor deposition device according to claim 1, wherein, The feeding component further includes a blowing mechanism communicated with the feeding pipe, and the blowing mechanism is used for introducing air flow into the feeding pipe.
5. The fluidized bed chemical vapor deposition apparatus according to claim 1, characterized in that, The fluidized bed chemical vapor deposition device further includes a filtering component, and the filtering component includes a plurality of settlers corresponding to the fluidized beds one by one, and the settlers are connected to the air outlets of the fluidized beds for filtering the gases discharged from the fluidized beds.
6. The fluidized bed chemical vapor deposition device according to claim 5, characterized in that, The filtering component further includes a cleaning mechanism connected to the settler, and the cleaning mechanism includes two groups of cleaning modules. One group of the cleaning modules is used for introducing air flow into the settler to clean the material particles intercepted by the settler, and the other group of the cleaning modules is used for discharging the air flow in the settler, and the two groups of cleaning modules operate alternately at regular intervals.
7. The fluidized bed chemical vapor deposition device according to claim 1, characterized in that, The feeding component further includes a weighing sensor provided on the feeding bin and a controller communicatively connected to the weighing sensor, and the feeding valve is also communicatively connected to the controller.
8. The fluidized bed chemical vapor deposition apparatus according to claim 1, characterized in that, The heating component includes a plurality of heating modules arranged in the vertical direction, two adjacent groups of heating modules are arranged in contact with each other, and each heating module is provided with a plurality of heating holes, and the vertically corresponding heating holes together form the heating cavity.
9. The fluidized bed chemical vapor deposition device according to claim 1, wherein, The fluidized bed chemical vapor deposition device further includes a discharging component communicated with the fluidized bed, and the discharging component includes a pressure detector provided in the fluidized bed and a pressurizing device communicated with the fluidized bed, and the pressurizing device is used for increasing the pressure in the fluidized bed to discharge the materials in the fluidized bed into the discharging bin.
10. The fluidized bed chemical vapor deposition apparatus according to claim 1, characterized in that, The fluidized bed includes a fluidization tank and a stirrer disposed in the fluidization tank, and further includes a gas mixing pipe disposed at the bottom of the fluidization tank. The gas mixing pipe is coaxially arranged with the stirrer and is used to introduce air flow into the fluidization tank.