Method, system, device and medium for generating electron beam by outputting cosine waveform high-voltage pulse

Abstract

The present invention relates to a method, system, device, and medium for generating an electron beam by outputting a cosine-wave high-voltage pulse. The method comprises the following steps: selecting a DC high-voltage power supply and a sinusoidal AC high-voltage power supply and connecting them in series to obtain a high-voltage composite power supply; maintaining the output amplitudes of the DC high-voltage power supply and the sinusoidal AC high-voltage power supply constant, adjusting the fundamental frequency of the sinusoidal AC high-voltage power supply according to the required pulse width, and intercepting the output of the high-voltage composite power supply through a preset time chopping window to obtain a cosine-wave high-voltage pulse; applying the intercepted cosine-wave high-voltage pulse to the electron gun end of an electron cooling device to generate a cosine-wave pulse electron bunch with a variable pulse width, thereby cooling the ion bunch to be cooled in a storage ring. The present invention can be widely applied to the field of ion beam cooling technology.

Description

Technical Field

[0001] The present invention belongs to the technical field of ion beam cooling, and in particular relates to a method, system, device and medium for generating an electron beam by outputting a cosine waveform high-voltage pulse. Background Art

[0002] The electronic cooling device enables the heavy ion storage ring to cool and accumulate "high-temperature" heavy ions. The heavy ion storage ring accelerates all ions from hydrogen to uranium to high energy, providing high-quality "low-temperature" heavy ion beams for various scientific research.

[0003] Different ion types are injected into heavy ion storage rings, resulting in different ion beam energies and ion bunch lengths. Typically, low-energy electron cooling uses a DC electron beam, while high-energy electron cooling uses a pulsed electron beam train (chain) of equal amplitude, width, and uniform distribution. Ion bunches in heavy ion storage rings exhibit a typical Gaussian distribution, with ions at the center and at the edges experiencing the same electron cooling effect. However, the ion temperature at the center is relatively low, while that at the edges is relatively high. Under the same conditions, the strength of the cooling effect is proportional to the electron beam density, resulting in a shorter cooling time for ions at the center and a longer cooling time for ions at the edges.

[0004] The use of a longitudinal hollow electron beam can change this situation, applying stronger electron cooling to ions at the edges of the bunch and weaker cooling to ions in the center, thereby controlling the longitudinal distribution of the ion bunch. The extraction voltage and current of the electron gun in an electron cooling device exhibit a linear relationship within a certain range: higher extraction voltages produce higher electron beam currents. Using a cosine-shaped extraction voltage can produce a longitudinal hollow electron beam with low electron density at the center and high electron density at the edges.

[0005] However, as the cooling process progresses, the width of the ion bunch decreases. If electron bunches of the same intensity are to be used to cool ion bunches of different widths, it is necessary to generate electron bunches of different widths but the same intensity. At the same time, the width of the electron bunches must be switched during the cooling process to achieve staged cooling, for example, using a wider electron bunch at the beginning, a shorter electron bunch in the middle, and an even shorter electron bunch at the end. How to effectively control the width of the electron bunches and improve cooling efficiency remains an important direction for the development of electron cooling technology for this full ion spectrum bunch in heavy ion storage rings. Summary of the Invention

[0006] In response to the above problems, the purpose of the present invention is to provide a method, system, equipment and medium for outputting cosine waveform high-voltage pulses to generate electron beams, which can output cosine waveform high-voltage pulses with a high-voltage pulse frequency corresponding to the cyclotron frequency of the ion beam, a constant amplitude and a variable pulse width, thereby generating electron beams of different widths but the same intensity.

[0007] To achieve the above object, the present invention adopts the following technical solutions:

[0008] In a first aspect, the present invention provides a method for generating an electron beam by outputting a cosine waveform high-voltage pulse, comprising the following steps:

[0009] A DC high-voltage power supply and a sinusoidal AC high-voltage power supply are selected and connected in series to obtain a high-voltage composite power supply;

[0010] Maintaining the output amplitudes of the DC high-voltage power supply and the sinusoidal AC high-voltage power supply unchanged, adjusting the fundamental frequency of the sinusoidal AC high-voltage power supply according to the required pulse width, and cutting the output of the high-voltage composite power supply through a preset time chopping window to obtain a cosine waveform high-voltage pulse;

[0011] The intercepted cosine waveform high-voltage pulse is applied to the electron gun end of the electron cooling device to draw out a cosine waveform pulse electron bunch with variable pulse width to cool the ion bunch to be cooled in the storage ring.

[0012] Furthermore, the selection of the DC high-voltage power supply and the sinusoidal AC high-voltage power supply refers to selecting a DC high-voltage power supply and a sinusoidal AC high-voltage power supply with the same peak voltage, and the two are superimposed in series to produce a high-voltage composite power supply with a minimum value of zero and a maximum value of twice the peak voltage.

[0013] Furthermore, the fundamental frequency of the sine wave AC high voltage power supply is adjusted according to the required pulse width, which means that the fundamental frequency of the sine wave AC high voltage power supply is adjusted by 2 n-1 Frequency doubling changes the frequency of its waveform.

[0014] Furthermore, the time chopping window Δt is set according to the cyclotron frequency of the ion beam.

[0015] Furthermore, the voltage waveform function applied to the electron gun end of the electron cooling device is for:

[0016]

[0017] Where, is the DC voltage; is the amplitude value of the sinusoidal AC high voltage; It is the phase of the sinusoidal AC high voltage; It is the initial phase of sinusoidal AC high voltage.

[0018] In a second aspect, the present invention provides a system for outputting a cosine waveform high-voltage pulse to generate an electron beam, comprising:

[0019] DC high-voltage power supply, sinusoidal AC high-voltage power supply, control module and pulse output module;

[0020] Selecting the DC high-voltage power supply and the sinusoidal AC high-voltage power supply and connecting them in series to obtain a high-voltage composite power supply;

[0021] The control module is used to adjust the fundamental frequency of the sinusoidal AC high-voltage power supply according to the required pulse width while maintaining the output amplitudes of the DC high-voltage power supply and the sinusoidal AC high-voltage power supply unchanged, and to intercept the output of the high-voltage composite power supply through a preset time chopping window to obtain a cosine waveform high-voltage pulse;

[0022] The pulse output module is used to apply the intercepted cosine waveform high-voltage pulse to the electron gun end of the electron cooling device, draw out a cosine waveform pulse electron bunch with variable pulse width, and cool the ion bunch to be cooled in the storage ring.

[0023] Furthermore, the selection of the DC high-voltage power supply and the sinusoidal AC high-voltage power supply refers to selecting a DC high-voltage power supply and a sinusoidal AC high-voltage power supply with the same peak voltage, and the two are superimposed in series to produce a high-voltage composite power supply with a minimum value of zero and a maximum value of twice the peak voltage.

[0024] Furthermore, the fundamental frequency of the sine wave AC high voltage power supply is adjusted according to the required pulse width, which means that the fundamental frequency of the sine wave AC high voltage power supply is adjusted by 2 n-1 Frequency doubling changes the frequency of its waveform.

[0025] In a third aspect, the present invention provides a computer-readable storage medium storing one or more programs, wherein the one or more programs include instructions that, when executed by a computing device, enable the computing device to execute the method of outputting a cosine waveform high-voltage pulse to generate an electron beam.

[0026] In a fourth aspect, the present invention provides a computing device comprising: one or more processors and a memory, wherein the memory stores one or more programs and is configured to be executed by the one or more processors, and the one or more programs include instructions for executing the method of outputting a cosine waveform high-voltage pulse to generate an electron beam.

[0027] The present invention has the following advantages due to the adoption of the above technical solution:

[0028] 1. The present invention employs a DC high-voltage power supply superimposed on a sinusoidal AC high-voltage power supply. This power supply generates a cosine-shaped high-voltage pulse at a time corresponding to the ion beam. This pulse is applied to the electron gun of the ion cooling device, generating the desired cosine-shaped high-voltage pulse with a constant amplitude and variable pulse width, corresponding to the cyclotron frequency of the ion beam. This combination reduces the power consumption of both the DC high-voltage power supply and the sinusoidal high-frequency high-voltage power supply, improving safety, reducing costs, and enhancing cooling efficiency.

[0029] 2. The present invention adopts a method of superimposing a DC high-voltage power supply and a sinusoidal AC high-voltage power supply. The DC component in the output cosine waveform high-voltage pulse keeps the electron gun in a normally open state. The cosine waveform electron bunch realizes the phase space distribution matching of ion beams with multiple energies and multiple ion bunch lengths, and efficiently cools the heavy ion beam.

[0030] Therefore, the present invention can be widely applied in the field of ion beam technology. BRIEF DESCRIPTION OF THE DRAWINGS

[0031] Various other advantages and benefits will become apparent to those skilled in the art upon reading the detailed description of the preferred embodiment below. The accompanying drawings are for illustration purposes only and are not to be considered as limiting the present invention. Throughout the drawings, the same reference numerals are used to denote the same components. In the drawings:

[0032] Figure 1 Schematic diagram of the output waveform of the sinusoidal AC high voltage power supply;

[0033] Figure 2 A flow chart of a method for generating an electron beam by outputting a cosine waveform high-voltage pulse provided in an embodiment of the present invention;

[0034] Figure 3a The DC high voltage U provided in the embodiment of the present invention dc Schematic diagram of the relationship with time t;

[0035] Figure 3b The sine wave AC high voltage U provided in the embodiment of the present invention ac Schematic diagram of the relationship with time t;

[0036] Figure 3c A schematic diagram showing the relationship between DC high voltage superimposed on sinusoidal AC high voltage and time t provided in an embodiment of the present invention;

[0037] Figure 4 A schematic diagram of a cosine wave high-voltage output waveform with equal pulse amplitudes and different pulse widths provided in an embodiment of the present invention;

[0038] Figure 5Schematic diagram of a cosine waveform pulse high voltage output waveform cut off according to the electron beam frequency 1 / 2n provided in an embodiment of the present invention. DETAILED DESCRIPTION

[0039] To make the objectives, technical solutions, and advantages of the embodiments of the present invention more clear, the technical solutions of the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings of the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the described embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field are within the scope of protection of the present invention.

[0040] It should be noted that the terms used herein are only for describing specific embodiments and are not intended to limit the exemplary embodiments according to the present invention. As used herein, unless the context clearly indicates otherwise, the singular form is intended to include the plural form. In addition, it should be understood that when the terms "comprise" and / or "include" are used in this specification, they indicate the presence of features, steps, operations, devices, components and / or combinations thereof.

[0041] Currently, there are two methods for cooling the ion beam in the storage ring:

[0042] One approach involves using multiple DC high-voltage power supplies to achieve cooling of multiple bunches at varying intervals. However, this approach requires multiple DC high-voltage power supplies, which is costly and difficult to synchronize. Furthermore, while the DC electron beam continuously acts on the ion beam as it interacts with the ion beam in the heavy ion storage ring, improving beam quality, the strong cooling force exerted on the beam can cause beam instability.

[0043] The second is to use a high-frequency sinusoidal AC high-voltage power supply to modulate the DC electron beam into a pulsed electron beam with a quasi-sinusoidal distribution. Figure 1 As shown, since the quasi-sinusoidal high-voltage output waveform crosses zero within a cooling cycle, in the range 0 to π, the output high-voltage waveform p1 applies a positive bias voltage to the electron-cooled electron gun, generating an electron beam. In the range π to 2π, the output high-voltage waveform n1 applies a negative bias voltage to the electron-cooled electron gun, resulting in no electron beam generation. This quasi-sinusoidal high-voltage output waveform structure results in low electron cooling efficiency. Furthermore, the requirement to generate a high-frequency, high-voltage sine wave capable of generating an electron beam places high demands on the power supply technology and increases costs.

[0044] Based on this, some embodiments of the present invention provide a method for generating an electron beam by outputting a cosine waveform high-voltage pulse. This method first superimposes a DC high-voltage power supply with a sinusoidal AC high-voltage power supply having the same peak voltage, then adjusts the fundamental frequency of the sinusoidal AC high-voltage power supply to output a cosine waveform high-voltage pulse with a frequency corresponding to the cyclotron frequency of the ion beam, a constant amplitude, and a variable pulse width. This pulse is then applied to the electron gun end of an electron cooling device to generate electron beams of varying widths but identical intensities. This combination of the present invention reduces the power of the DC high-voltage power supply and the sinusoidal AC high-voltage power supply, improves safety, reduces costs, and simultaneously improves cooling efficiency.

[0045] Correspondingly, in some other embodiments of the present invention, a system, device and medium for outputting cosine waveform high-voltage pulses to generate electron beams are provided.

[0046] Example 1

[0047] like Figure 2 As shown, the present invention provides a method for generating an electron beam by outputting a cosine waveform high-voltage pulse, which comprises the following steps:

[0048] 1) Select a DC high-voltage power supply and a sinusoidal AC high-voltage power supply and connect them in series to obtain a high-voltage composite power supply;

[0049] 2) Maintaining the output amplitudes of the DC high-voltage power supply and the sinusoidal AC high-voltage power supply unchanged, adjusting the fundamental frequency of the sinusoidal AC high-voltage power supply according to the required pulse width, and cutting the output of the high-voltage composite power supply through a preset time chopping window to obtain a cosine waveform high-voltage pulse;

[0050] 3) The intercepted cosine waveform high-voltage pulse is applied to the electron gun end of the electron cooling device to draw out a cosine waveform pulse electron bunch with variable pulse width to cool the ion bunch to be cooled in the storage ring.

[0051] Furthermore, in the above step 1), if Figure 3a to Figure 3c As shown, the DC high-voltage power supply and the sinusoidal AC high-voltage power supply selected in this embodiment have the same peak voltage. After the two are superimposed, a high-voltage composite power supply with a minimum value of zero and a maximum value of twice the peak voltage can be generated.

[0052] Furthermore, in the above step 2), the fundamental frequency of the sinusoidal AC high voltage power supply is adjusted according to the required pulse width, which means that the fundamental frequency of the sinusoidal AC high voltage power supply is adjusted by 2 n-1 Frequency doubling changes the frequency of the waveform, which can be single, double or quadruple.

[0053] When setting the time chopping window Δt, it needs to be set according to the ion beam cyclotron frequency so that the frequency of the obtained cosine waveform high-voltage pulse corresponds to the ion beam cyclotron frequency, the amplitude remains unchanged, and the high-voltage pulse width is variable.

[0054] During implementation, the time chopping window can be realized by a controller and two high-voltage switches. This technology is well known to those skilled in the art and will not be described in detail in the present invention.

[0055] Specifically, if Figure 4 and Figure 5 As shown, if a single-frequency scheme is adopted, the waveform is chopped and extracted in each cycle to obtain a cosine waveform high-voltage pulse with equal amplitude consistent with the initial pulse width; if a double-frequency scheme is adopted, the waveform is chopped and extracted at intervals of one cycle to obtain a cosine waveform high-voltage pulse with equal amplitude of half the initial pulse width; if a quadruple-frequency scheme is adopted, the waveform is chopped and extracted at intervals of three cycles to obtain a cosine waveform high-voltage pulse with equal amplitude of one-quarter the initial pulse width; and so on.

[0056] Furthermore, in the above step 3), the voltage waveform function applied to the electron gun end of the electron cooling device is for:

[0057]

[0058] Where, is the DC voltage; is the amplitude value of the sinusoidal AC high voltage, that is, + , It is a sinusoidal AC high voltage; It is the phase of the sinusoidal AC high voltage; It is the initial phase of sinusoidal AC high voltage.

[0059] Example 2

[0060] The above-mentioned embodiment 1 provides a method for generating an electron beam by outputting a cosine waveform high-voltage pulse. Correspondingly, this embodiment provides a system for generating an electron beam by outputting a cosine waveform high-voltage pulse. The system provided by this embodiment can implement the method for generating an electron beam by outputting a cosine waveform high-voltage pulse of embodiment 1. The system can be implemented by software, hardware, or a combination of software and hardware. For example, the system can include integrated or separate functional modules or functional units to execute the corresponding steps in each method of embodiment 1. Since the system of this embodiment is basically similar to the method embodiment, the process described in this embodiment is relatively simple. For relevant matters, please refer to the partial description of embodiment 1. The embodiment of the system provided in this embodiment is merely illustrative.

[0061] The system for generating an electron beam by outputting a cosine waveform high-voltage pulse provided in this embodiment includes:

[0062] DC high-voltage power supply, sinusoidal AC high-voltage power supply, control module and pulse output module.

[0063] Among them, after the DC high-voltage power supply and the sinusoidal AC high-voltage power supply are superimposed in series, a high-voltage composite power supply with a minimum value of zero and a maximum value of twice the peak voltage is generated;

[0064] The control module is used to adjust the fundamental frequency of the sinusoidal AC high-voltage power supply according to the required pulse width while maintaining the output amplitudes of the DC high-voltage power supply and the sinusoidal AC high-voltage power supply unchanged, and to intercept the output of the high-voltage composite power supply through a preset time chopping window to obtain a cosine waveform high-voltage pulse;

[0065] The pulse output module is used to apply the intercepted cosine waveform high-voltage pulse to the electron gun end of the electron cooling device, and draw out a cosine waveform pulse electron bunch with variable pulse width to cool the ion bunch to be cooled in the storage ring.

[0066] Example 3

[0067] This embodiment provides a processing device corresponding to the method of outputting cosine waveform high-voltage pulses to generate an electron beam provided in this embodiment 1. The processing device can be a processing device for a client, such as a mobile phone, laptop computer, tablet computer, desktop computer, etc., to execute the method of embodiment 1.

[0068] The processing device includes a processor, a memory, a communication interface, and a bus. The processor, memory, and communication interface are connected via the bus to facilitate communication between them. The memory stores a computer program executable on the processor. When the processor executes the computer program, it executes the method for generating an electron beam by outputting a cosine waveform high-voltage pulse, as provided in Example 1.

[0069] Preferably, the memory may be a high-speed random access memory (RAM), and may also include a non-volatile memory, such as at least one disk memory.

[0070] Preferably, the processor may be a central processing unit (CPU), a digital signal processor (DSP), or other general-purpose processors of various types, which are not limited here.

[0071] Example 4

[0072] The method of generating an electron beam by outputting a cosine waveform high-voltage pulse in this embodiment 1 can be specifically implemented as a computer program product. The computer program product may include a computer-readable storage medium carrying computer-readable program instructions for executing the method of generating an electron beam by outputting a cosine waveform high-voltage pulse as described in this embodiment 1.

[0073] Computer readable storage media can be tangible devices that hold and store instructions used by instruction execution devices. Computer readable storage media can be, for example, but not limited to, electronic storage devices, magnetic storage devices, optical storage devices, electromagnetic storage devices, semiconductor storage devices, or any combination thereof.

[0074] Those skilled in the art will appreciate that embodiments of the present invention may be provided as methods, systems, or computer program products. Thus, the present invention may take the form of an entirely hardware embodiment, an entirely software embodiment, or an embodiment combining software and hardware aspects. Furthermore, the present invention may take the form of a computer program product implemented on one or more computer-usable storage media (including but not limited to magnetic disk storage, CD-ROM, optical storage, etc.) containing computer-usable program code.

[0075] The present invention is described with reference to flowcharts and / or block diagrams of methods, devices (systems), and computer program products according to embodiments of the present invention. It should be understood that each process and / or block in the flowcharts and / or block diagrams, as well as combinations of processes and / or blocks in the flowcharts and / or block diagrams, can be implemented by computer program instructions. These computer program instructions can be provided to a processor of a general-purpose computer, a special-purpose computer, an embedded processor, or other programmable data processing device to produce a machine, so that the instructions executed by the processor of the computer or other programmable data processing device generate instructions for implementing the processes in the flowcharts and / or block diagrams. Figure 1 a process or multiple processes and / or boxes Figure 1 A device that provides the functions specified in a block or multiple blocks.

[0076] These computer program instructions may also be stored in a computer readable memory that can direct a computer or other programmable data processing device to work in a specific manner, so that the instructions stored in the computer readable memory produce an article of manufacture comprising an instruction device, which implements the process Figure 1 One or more processes and / or boxes Figure 1 The function specified in one or more boxes.

[0077] These computer program instructions can also be loaded onto a computer or other programmable data processing device so that a series of operating steps are executed on the computer or other programmable device to produce a computer-implemented process, thereby providing the instructions executed on the computer or other programmable device for implementing the process. Figure 1 a process or multiple processes and / or boxes Figure 1 A step that specifies a function in one or more boxes.

[0078] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention and not to limit it. Although the present invention has been described in detail with reference to the above embodiments, ordinary technicians in the field should understand that the specific implementation methods of the present invention can still be modified or replaced by equivalents. Any modification or equivalent replacement that does not depart from the spirit and scope of the present invention should be covered by the scope of protection of the claims of the present invention.

Claims

1. A method for generating an electron beam by outputting a cosine waveform high voltage pulse, characterized in that: The following steps are involved: A DC high-voltage power supply and a sinusoidal AC high-voltage power supply are selected and connected in series to obtain a high-voltage composite power supply; Maintaining the output amplitudes of the DC high-voltage power supply and the sinusoidal AC high-voltage power supply unchanged, adjusting the fundamental frequency of the sinusoidal AC high-voltage power supply according to the required pulse width, and cutting the output of the high-voltage composite power supply through a preset time chopping window to obtain a cosine waveform high-voltage pulse; Applying the intercepted cosine waveform high-voltage pulse to the electron gun end of the electron cooling device to draw out a cosine waveform pulse electron bunch with variable pulse width to cool the ion bunch to be cooled in the storage ring; The selection of the DC high-voltage power supply and the sinusoidal AC high-voltage power supply refers to selecting a DC high-voltage power supply and a sinusoidal AC high-voltage power supply with the same peak voltage, and superimposing the two in series to produce a high-voltage composite power supply with a minimum value of zero and a maximum value of twice the peak voltage; The fundamental frequency of the sine wave AC high voltage power supply is adjusted according to the required pulse width, which means that the fundamental frequency of the sine wave AC high voltage power supply is adjusted by 2 n-1 Frequency doubling changes the frequency of its waveform.

2. The method for generating an electron beam by outputting a cosine waveform high voltage pulse according to claim 1, wherein: The time chopping window Δt is set according to the cyclotron frequency of the ion beam.

3. The method for generating an electron beam by outputting a cosine waveform high voltage pulse according to claim 1, wherein: The voltage waveform function applied to the electron gun end of the electron cooling device is for: Where, is the DC voltage; is the amplitude value of the sinusoidal AC high voltage; It is the phase of the sinusoidal AC high voltage; It is the initial phase of sinusoidal AC high voltage.

4. A system for generating an electron beam by outputting a cosine waveform high voltage pulse, characterized in that: include: DC high-voltage power supply, sinusoidal AC high-voltage power supply, control module and pulse output module; Selecting the DC high-voltage power supply and the sinusoidal AC high-voltage power supply and connecting them in series to obtain a high-voltage composite power supply; The control module is used to adjust the fundamental frequency of the sinusoidal AC high-voltage power supply according to the required pulse width while maintaining the output amplitudes of the DC high-voltage power supply and the sinusoidal AC high-voltage power supply unchanged, and to intercept the output of the high-voltage composite power supply through a preset time chopping window to obtain a cosine waveform high-voltage pulse; The pulse output module is used to apply the intercepted cosine waveform high-voltage pulse to the electron gun end of the electron cooling device, to draw out a cosine waveform pulse electron bunch with variable pulse width, and to cool the ion bunch to be cooled in the storage ring; The selection of the DC high-voltage power supply and the sinusoidal AC high-voltage power supply refers to selecting a DC high-voltage power supply and a sinusoidal AC high-voltage power supply with the same peak voltage, and superimposing the two in series to produce a high-voltage composite power supply with a minimum value of zero and a maximum value of twice the peak voltage; The fundamental frequency of the sine wave AC high voltage power supply is adjusted according to the required pulse width, which means that the fundamental frequency of the sine wave AC high voltage power supply is adjusted by 2 n-1 Frequency doubling changes the frequency of its waveform.

5. A computer-readable storage medium storing one or more programs, characterized in that: The one or more programs include instructions that, when executed by a computing device, cause the computing device to perform any one of the methods of claims 1 to 3 .

6. A computing device, characterized in that include: One or more processors and a memory, wherein the memory stores one or more programs and is configured to be executed by the one or more processors, wherein the one or more programs include instructions for executing any one of the methods according to claims 1 to 3.

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