Photoetching machine for semiconductor production and manufacturing

Abstract

The invention provides a photoetching machine for semiconductor production and manufacturing, and relates to the field of semiconductor manufacturing, and the photoetching machine comprises a processing main body, a control main body, an operation groove, an observation glass window, a key panel, a protection plate, a stop sliding block, a protection limiting mechanism and a taking stop mechanism; the control body is fixedly connected to the left end face of the machining body. The operation groove is formed in the front end face of the control body. The observation glass window is fixedly connected to the front end face of the machining body. The key panel is fixedly connected to the interior of the operation groove; the protection plate rotates on the front end face of the machining body. The stop sliding block is connected into the control body in a sliding mode. The protection limiting mechanism is arranged in the protection plate; and the taking and stopping mechanism is arranged in the control main body. The protection plate is ensured to be closed through the protection limiting mechanism, and the chip taking safety is ensured through the taking stopping mechanism. The problems that operators take semiconductors by mistake, and extreme ultraviolet rays hurt the operators are solved.

Description

Technical Field

[0001] The present invention relates to the technical field of semiconductor manufacturing, and particularly relates to a lithography machine for semiconductor production and manufacturing. Background Art

[0002] Semiconductors are the core materials of electronic devices. When manufacturing semiconductors, they need to be cut, cleaned, coated, and then lithographed so that the circuit pattern is projected onto the silicon wafer of the semiconductor. When lithographing the semiconductor, a lithography machine is required. The semiconductor is placed inside the lithography machine, and the lithography machine generates extreme ultraviolet rays at the nanometer level. The extreme ultraviolet rays are used for lithography processing of the semiconductor. After the processing is completed, the staff takes out the semiconductor.

[0003] According to CN201811098888.1, the present invention relates to the technical field of lithography. It relates to an automatic lithography machine. The key points of the solution are: the automatic lithography machine includes a frame. The wafer loading device on the frame is used to send the wafers in the first cassette into the loading station; the wafer picking manipulator is used to send the wafers into the wafer calibration device; the wafer calibration device is used to calibrate the wafers sent by the wafer picking manipulator; the wafer loading manipulator is used to send the calibrated wafers into the double-station rotating wafer carrier device; the double-station rotating wafer carrier device is used to send the wafers sent by the wafer loading manipulator into the lithography station and take out the wafers after lithography processing from the lithography station; the lithography device is used to perform lithography processing on the wafers located at the lithography station on the double-station rotating wafer carrier device; the wafer unloading manipulator is used to send the wafers after lithography processing on the double-station rotating wafer carrier device into the wafer unloading device; the wafer unloading device is used to send the wafer receiving position in the second cassette to the unloading station to receive the wafers sent by the wafer unloading manipulator.

[0004] However, generally, the lithography machine is protected by a guard plate structure. When the staff takes and places the semiconductor, they need to open the guard plate first. Since extreme ultraviolet rays are harmful to people, when the staff makes a mistake in taking the semiconductor and does not close the lithography machine, the extreme ultraviolet rays process the semiconductor. When the staff opens the guard plate, the extreme ultraviolet rays are easily affected by the outside and cause harm to the staff. Summary of the Invention

[0005] In view of this, the present invention provides a lithography machine for semiconductor production and manufacturing, which avoids the problem that the extreme ultraviolet rays inside the lithography machine harm the staff, and ensures the safety of the staff when taking and placing semiconductor chips.

[0006] The present invention provides the purpose and efficacy of a lithography machine for semiconductor production and manufacturing, specifically including: a processing main body, a control main body, an operation groove, an observation glass window, a button panel, control buttons, a stop button, a protective guard plate, a stop slider, a protective limit mechanism, and a taking and stopping mechanism; the control main body is fixedly connected to the left end face of the processing main body; the operation groove is opened at the middle position of the front end face of the control main body; there are a total of three groups of observation glass windows, and two of the observation glass windows are fixedly connected to the middle position of the front end face of the processing main body; the button panel is fixedly connected inside the operation groove; there are a total of multiple groups of control buttons, and multiple groups of control buttons are respectively arranged on the left side of the front end face of the button panel; the stop button is arranged on the right side of the front end face of the button panel, and the stop button is in an arc rectangular structure; the protective guard plate rotates on the upper side of the front end face of the processing main body, and the other observation glass window is fixedly connected to the middle position of the protective guard plate; the stop slider is slidably connected to the right side inside the control main body; the protective limit mechanism is arranged on the right side inside the protective guard plate; the taking and stopping mechanism is arranged on the right side inside the control main body.

[0007] Further, the protective limit mechanism includes: a lithography screen and a lithography keyboard; the lithography screen is fixedly connected to the upper side of the front end face of the control main body, and the lithography screen is connected to the control unit inside the control main body through a transmission line; the lithography keyboard slides inside the groove of the control main body, and the lithography keyboard is connected to the control unit inside the control main body through a transmission line.

[0008] Further, the protective limit mechanism also includes: a protective rotating shaft and a protective torsion spring; the protective rotating shaft is rotatably connected to the upper side inside the front end face of the processing main body, and the protective rotating shaft is fixedly connected to the left side of the protective guard plate; the protective torsion spring is fixedly connected to the upper side inside the front end face of the processing main body, and the protective rotating shaft is elastically connected to the protective torsion spring.

[0009] Further, the protective limit mechanism also includes: a switch handle and a switch connecting block; the switch handle is slidably connected to the inside of the front end face of the protective guard plate, and the switch handle slides on the right side of the front end face of the protective guard plate; there are a total of two groups of switch connecting blocks, and the two groups of switch connecting blocks are respectively fixedly connected to the rear side of the inner end face of the switch handle, and the two groups of switch connecting blocks respectively slide inside the right side of the protective guard plate.

[0010] Further, the protective limit mechanism also includes: a switch jack and a switch plug; the switch jack is opened on the right side of the front end face of the processing main body; the switch plug is slidably connected to the inside of the right end face of the protective guard plate, the switch plug is fixedly connected to the two groups of switch connecting blocks, and the switch jack and the switch plug are plugged and connected.

[0011] Further, the protective limit mechanism also includes: a switch spring; the switch spring is fixedly connected to the right side inside the protective guard plate, and the switch spring is elastically connected to the switch plug.

[0012] Furthermore, the taking and stopping mechanism includes: a protective belt pulley, a stopping transmission belt, and a stopping belt pulley; the protective belt pulley is coaxially and fixedly connected to the lower side of the protective rotating shaft, and the protective belt pulley rotates inside the front end face of the processing main body; the stopping belt pulley is rotatably connected to the middle position inside the control main body; the stopping transmission belt is drivingly connected to the outer end faces of the protective belt pulley and the stopping belt pulley.

[0013] Furthermore, the taking and stopping mechanism further includes: a stopping gear and a stopping rack; the stopping gear is coaxially and fixedly connected to the upper side of the stopping belt pulley, the stopping gear is rotatably connected to the middle position inside the control main body; the stopping rack is fixedly connected to the right end face of the stopping slider, the stopping rack slides in the middle position inside the control main body, and the stopping gear and the stopping rack are engaged to jointly form a gear-rack transmission mechanism.

[0014] Furthermore, the taking and stopping mechanism further includes: a pressing sliding arm and a pressing spring; the pressing sliding arm is slidably connected to the inside of the front end face of the stopping slider, the pressing sliding arm slides inside the control main body, and the left side of the pressing sliding arm slides on the front end face of the stopping button; the pressing spring is fixedly connected to the inside of the stopping slider, and the pressing sliding arm and the pressing spring are elastically connected. Beneficial Effects

[0015] By adopting the protective limiting mechanism, the present invention realizes that the elastic force of the protective torsion spring drives the protective guard plate to rotate to a closed state. When the protective guard plate is in the closed state, the switch bolt is inserted into the switch jack, thereby fixing the position of the protective guard plate, ensuring that the protective guard plate is stably closed to protect the components inside the lithography machine, and avoiding the leakage of extreme ultraviolet rays when the lithography machine is running due to the non-closure of the protective guard plate, which may harm the staff.

[0016] In addition, by adopting the taking and stopping mechanism, when the lithography machine finishes processing the semiconductor chip and the staff takes the semiconductor chip and opens the protective guard plate, it drives the pressing sliding arm to slide and press the stop button. After pressing the stop button, it ensures that the lithography machine stops running, avoiding the problem that the extreme ultraviolet rays inside the lithography machine may harm the staff, and ensuring the safety of the staff when taking and placing the semiconductor chip. Description of the Drawings

[0017] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings of the embodiments will be briefly introduced below.

[0018] The drawings in the following description only relate to some embodiments of the present invention and do not limit the present invention.

[0019] In the drawings: Figure 1 It is a front view structural schematic diagram of the lithography machine according to the embodiment of the present invention.

[0020] Figure 2 It is a front view structural schematic diagram of the processing main body of an embodiment of the present invention.

[0021] Figure 3 It is a front view structural schematic diagram of the control main body of an embodiment of the present invention.

[0022] Figure 4 It is a structural schematic diagram of the internal transmission of a lithography machine in an embodiment of the present invention.

[0023] Figure 5 It is a structural schematic diagram of the connection of the protective plate in an embodiment of the present invention.

[0024] Figure 6 It is a structural schematic diagram of the inside of the protective limit mechanism in an embodiment of the present invention.

[0025] Figure 7 It is a structural schematic diagram of the transmission of the taking and stopping mechanism in an embodiment of the present invention.

[0026] Figure 8 It is a structural schematic diagram of the pressing of the pressing sliding arm in an embodiment of the present invention.

[0027] List of reference numerals 1. Processing main body; 101. Switch jack; 2. Control main body; 201. Operation groove; 3. Observation glass window; 4. Lithography screen; 5. Lithography keyboard; 6. Button panel; 601. Control button; 602. Stop button; 7. Protective rotating shaft; 701. Protective torsion spring; 702. Protective pulley; 8. Protective plate; 9. Switch handle; 10. Switch connecting block; 11. Switch bolt; 1101. Switch spring; 12. Stop drive belt; 13. Stop pulley; 1301. Stop gear; 14. Stop slider; 1401. Stop rack; 15. Pressing sliding arm; 1501. Pressing spring. Detailed implementation manners

[0028] Embodiment 1: Please refer to Figures 1 to 6 as shown in The present invention provides a photolithography machine for semiconductor manufacturing, comprising a processing body 1, a control body 2, an operation groove 201, an observation glass window 3, a key panel 6, a control button 601, a stop button 602, a protective guard plate 8, a stop slider 14 and a protective limiting mechanism; the control body 2 is fixedly connected to the left end face of the processing body 1; the operation groove 201 is opened in the middle position of the front end face of the control body 2; there are three groups of observation glass windows 3, two groups of which are fixedly connected to the middle position of the front end face of the processing body 1; the key panel 6 is fixedly connected inside the operation groove 201; there are multiple groups of control buttons 601, and the multiple groups of control buttons 601 are respectively arranged on the left side of the front end face of the key panel 6; the stop button 602 is arranged on the right side of the front end face of the key panel 6, and the stop button 602 is an arc rectangular structure; the protective guard plate 8 rotates on the upper side of the front end face of the processing body 1, and another group of observation glass windows 3 is fixedly connected to the middle position of the protective guard plate 8; the stop slider 14 is slidably connected to the right side inside the control body 2; the protective limiting mechanism is arranged on the right side inside the protective guard plate 8.

[0029] Among them, the protective limit mechanism includes: a lithography screen 4 and a lithography keyboard 5; the lithography screen 4 is fixedly connected to the upper side of the front end surface of the control body 2, and the lithography screen 4 is connected to the control unit inside the control body 2 through a transmission line; the lithography keyboard 5 slides inside the groove of the control body 2, and the lithography keyboard 5 is connected to the control unit inside the control body 2 through a transmission line. During use, the staff adjusts the settings inside the control body 2 by operating the lithography keyboard 5, and the lithography screen 4 displays the output settings and displays the operation status of the lithography machine.

[0030] Among them, the protective limiting mechanism also includes: a protective shaft 7 and a protective torsion spring 701; the protective shaft 7 is rotatably connected to the upper side of the inner front end face of the processing body 1, and the protective shaft 7 is fixedly connected to the left side of the protective guard plate 8; the protective torsion spring 701 is fixedly connected to the upper side of the inner front end face of the processing body 1, and the protective shaft 7 and the protective torsion spring 701 are elastically connected. During use, the staff moves the protective guard plate 8 to rotate and drive the protective shaft 7 to rotate, and the rotation of the protective shaft 7 drives the protective torsion spring 701 to extend and retract, and the elastic force of the protective torsion spring 701 drives the protective guard plate 8 to rotate and reset to close.

[0031] Among them, the protective limit mechanism also includes: a switch handle 9 and a switch connecting block 10; the switch handle 9 is slidably connected to the inside of the front end face of the protective guard plate 8, and the switch handle 9 slides on the right side of the front end face of the protective guard plate 8; there are two groups of switch connecting blocks 10, and the two groups of switch connecting blocks 10 are respectively fixedly connected to the rear side of the inner end face of the switch handle 9, and the two groups of switch connecting blocks 10 are respectively slid on the right side inside the protective guard plate 8. During use, the staff bends the switch handle 9 to slide, and the sliding of the switch handle 9 drives the switch connecting block 10 to slide.

[0032] Among them, the protective limit mechanism also includes: a switch socket 101 and a switch pin 11; the switch socket 101 is opened on the right side of the front end face of the processing body 1; the switch pin 11 is slidably connected inside the right end face of the protective guard plate 8, the switch pin 11 and the two sets of switch connection blocks 10 are fixedly connected, the switch socket 101 and the switch pin 11 are plug-connected, during use, the sliding of the switch connection block 10 drives the sliding of the switch pin 11, and the sliding of the switch pin 11 is inserted into the switch socket 101.

[0033] Among them, the protective limit mechanism also includes: a switch spring 1101; the switch spring 1101 is fixedly connected to the right side of the protective guard plate 8, and the switch spring 1101 and the switch pin 11 are elastically connected. During use, the switch pin 11 slides to drive the switch spring 1101 to extend and retract, and the elastic force of the switch spring 1101 drives the switch pin 11 to slide, and the switch pin 11 slides and is inserted into the switch socket 101, thereby closing and fixing the protective guard plate 8 at the front end face of the processing body 1, and protecting the components inside the lithography machine.

[0034] Specific usage and function of this embodiment: During use of the present invention, the staff adjusts the settings inside the control body 2 by operating the lithography keyboard 5, and the lithography screen 4 displays the output settings and the operation status of the lithography machine. The staff moves the protective guard plate 8 to rotate and drive the protective shaft 7 to rotate. The rotation of the protective shaft 7 drives the protective torsion spring 701 to expand and contract. The elastic force of the protective torsion spring 701 drives the protective guard plate 8 to rotate and reset to close. The staff moves the switch handle 9 to slide. The sliding of the switch handle 9 drives the switch connecting block 10 to slide. The sliding of the switch connecting block 10 drives the switch pin 11 to slide. Whether the switch pin 11 slides is inserted into the switch socket 101, the sliding of the switch pin 11 drives the switch spring 1101 to expand and contract. The elastic force of the switch spring 1101 drives the switch pin 11 to slide. The switch pin 11 slides and is inserted into the switch socket 101, thereby closing and fixing the protective guard plate 8 on the front end face of the processing body 1, protecting the components inside the lithography machine, and ensuring that the protective guard plate 8 is always in a closed state to protect the components inside the lithography machine. Embodiment 2

[0035] Based on Example 1, please refer to Figure 7 and Figure 8 As shown: The present invention provides a lithography machine for semiconductor production and manufacturing, which further includes a picking and stopping mechanism. The picking and stopping mechanism is arranged on the right side inside the control main body 2. The picking and stopping mechanism includes: a protective belt pulley 702, a stopping transmission belt 12, and a stopping belt pulley 13. The protective belt pulley 702 is coaxially and fixedly connected to the lower side of the protective rotating shaft 7. The protective belt pulley 702 rotates inside the front end face of the processing main body 1. The stopping belt pulley 13 is rotatably connected to the middle position inside the control main body 2. The stopping transmission belt 12 is drivingly connected to the outer end faces of the protective belt pulley 702 and the stopping belt pulley 13. During use, when the protective rotating shaft 7 rotates, it drives the protective belt pulley 702 to rotate. The rotation of the protective belt pulley 702 drives the stopping transmission belt 12 to transmit, and the transmission of the stopping transmission belt 12 drives the stopping belt pulley 13 to rotate.

[0036] Among them, the picking and stopping mechanism further includes: a stopping gear 1301 and a stopping rack 1401. The stopping gear 1301 is coaxially and fixedly connected to the upper side of the stopping belt pulley 13. The stopping gear 1301 is rotatably connected to the middle position inside the control main body 2. The stopping rack 1401 is fixedly connected to the right end face of the stopping slider 14. The stopping rack 1401 slides in the middle position inside the control main body 2. The stopping gear 1301 and the stopping rack 1401 are engaged to jointly form a gear-rack transmission mechanism. During use, the rotation of the stopping belt pulley 13 drives the stopping gear 1301 to rotate. The rotation of the stopping gear 1301 drives the engaged stopping rack 1401 to slide, and the sliding of the stopping rack 1401 drives the stopping slider 14 to slide.

[0037] Among them, the picking and stopping mechanism further includes: a pressing sliding arm 15 and a pressing spring 1501. The pressing sliding arm 15 is slidably connected to the inside of the front end face of the stopping slider 14. The pressing sliding arm 15 slides inside the control main body 2. The left side of the pressing sliding arm 15 slides on the front end face of the stop button 602. The pressing spring 1501 is fixedly connected to the inside of the stopping slider 14. The pressing sliding arm 15 and the pressing spring 1501 are elastically connected. During use, the sliding of the stopping slider 14 drives the pressing sliding arm 15 and the pressing spring 1501 to slide. The sliding of the pressing sliding arm 15 presses the stop button 602 to stop the operation of the lithography machine. When the pressing sliding arm 15 presses the stop button 602, the pressing spring 1501 expands and contracts. The elastic force of the pressing spring 1501 prevents the pressing sliding arm 15 from pressing the stop button 602 with great force and causing damage.

[0038] Specific usage method and function of the second embodiment: During the use of the present invention, when the protection rotating shaft 7 rotates, it drives the protection pulley 702 to rotate. The rotation of the protection pulley 702 drives the stop transmission belt 12 to transmit. The transmission of the stop transmission belt 12 drives the stop pulley 13 to rotate. The rotation of the stop pulley 13 drives the stop gear 1301 to rotate. The rotation of the stop gear 1301 drives the engaged stop rack 1401 to slide. The sliding of the stop rack 1401 drives the stop slider 14 to slide. The sliding of the stop slider 14 drives the pressing slide arm 15 and the pressing spring 1501 to slide. The sliding of the pressing slide arm 15 presses the stop button 602, causing the lithography machine to stop running. When the pressing slide arm 15 presses the stop button 602, the pressing spring 1501 expands and contracts. The elastic force of the pressing spring 1501 prevents the pressing slide arm 15 from pressing the stop button 602 with great force and causing damage, ensuring that the lithography machine is not running when the staff opens the protection guard plate 8 to take the chip, and guaranteeing the safety of the staff when taking the chip.

Claims

1. A lithography machine for semiconductor production and manufacturing, comprising: Processing main body (1), control main body (2), operation groove (201), observation glass window (3), button panel (6), control button (601), stop button (602), protective guard plate (8), stop slider (14), protective limit mechanism and taking and stopping operation mechanism; the control main body (2) is fixedly connected to the left end face of the processing main body (1); characterized in that, the operation groove (201) is opened at the middle position of the front end face of the control main body (2); three groups of the observation glass windows (3) are provided, and two of the observation glass windows (3) are fixedly connected to the middle position of the front end face of the processing main body (1); the button panel (6) is fixedly connected inside the operation groove (201); multiple groups of the control buttons (601) are provided, and the multiple groups of control buttons (601) are respectively arranged on the left side of the front end face of the button panel (6); the stop button (602) is arranged on the right side of the front end face of the button panel (6), and the stop button (602) is in an arc rectangular structure; the protective guard plate (8) rotates on the upper side of the front end face of the processing main body (1), and the other observation glass window (3) is fixedly connected to the middle position of the protective guard plate (8); the stop slider (14) is slidably connected to the right side inside the control main body (2); the protective limit mechanism is arranged on the right side inside the protective guard plate (8); the taking and stopping operation mechanism is arranged on the right side inside the control main body (2).

2. The lithography machine for semiconductor manufacturing according to claim 1, wherein: The protective limit mechanism includes: a lithography screen (4) and a lithography keyboard (5); the lithography screen (4) is fixedly connected to the upper side of the front end face of the control main body (2), and the lithography screen (4) is connected to the control unit inside the control main body (2) through a transmission line; the lithography keyboard (5) slides inside the groove of the control main body (2), and the lithography keyboard (5) is connected to the control unit inside the control main body (2) through a transmission line.

3. The lithography machine for semiconductor production and manufacturing according to claim 1, characterized in that: The protective limit mechanism further includes: a protective rotating shaft (7) and a protective torsion spring (701); the protective rotating shaft (7) is rotatably connected to the upper side inside the front end face of the processing main body (1), and the protective rotating shaft (7) is fixedly connected to the left side of the protective guard plate (8); the protective torsion spring (701) is fixedly connected to the upper side inside the front end face of the processing main body (1), and the protective rotating shaft (7) is elastically connected to the protective torsion spring (701).

4. The lithography machine for semiconductor production and manufacturing according to claim 1, wherein: The protective limit mechanism further includes: a switch handle (9) and a switch connecting block (10); the switch handle (9) is slidably connected to the inside of the front end face of the protective guard plate (8), and the switch handle (9) slides on the right side of the front end face of the protective guard plate (8); two groups of the switch connecting blocks (10) are provided, and the two groups of switch connecting blocks (10) are respectively fixedly connected to the rear side of the inner end face of the switch handle (9), and the two groups of switch connecting blocks (10) respectively slide on the right side inside the protective guard plate (8).

5. The lithography machine for semiconductor manufacturing according to claim 4, wherein: The protection and limit mechanism further includes: a switch socket (101) and a switch plug (11); the switch socket (101) is opened on the right side of the front end face of the processing main body (1); the switch plug (11) is slidably connected inside the right end face of the protection guard plate (8), the switch plug (11) is fixedly connected to two groups of switch connecting blocks (10), and the switch socket (101) and the switch plug (11) are inserted and connected.

6. The semiconductor manufacturing lithography machine according to claim 5, wherein: The protection and limit mechanism further includes: a switch spring (1101); the switch spring (1101) is fixedly connected to the right side inside the protection guard plate (8), and the switch spring (1101) is elastically connected to the switch plug (11).

7. The lithography machine for semiconductor manufacturing according to claim 1, characterized in that: The taking and stopping mechanism includes: a protection pulley (702), a stopping transmission belt (12) and a stopping pulley (13); the protection pulley (702) is coaxially and fixedly connected to the lower side of the protection rotating shaft (7), and the protection pulley (702) rotates inside the front end face of the processing main body (1); the stopping pulley (13) is rotatably connected to the middle position inside the control main body (2); the stopping transmission belt (12) is transmission-connected to the outer end faces of the protection pulley (702) and the stopping pulley (13).

8. The lithography machine for semiconductor manufacturing according to claim 7, wherein: The taking and stopping mechanism further includes: a stopping gear (1301) and a stopping rack (1401); the stopping gear (1301) is coaxially and fixedly connected to the upper side of the stopping pulley (13), and the stopping gear (1301) is rotatably connected to the middle position inside the control main body (2); the stopping rack (1401) is fixedly connected to the right end face of the stopping slider (14), the stopping rack (1401) slides in the middle position inside the control main body (2), and the stopping gear (1301) and the stopping rack (1401) are engaged to jointly form a gear-rack transmission mechanism.

9. The lithography machine for semiconductor manufacturing according to claim 1, wherein: The taking and stopping mechanism further includes: a pressing sliding arm (15) and a pressing spring (1501); the pressing sliding arm (15) is slidably connected inside the front end face of the stopping slider (14), the pressing sliding arm (15) slides inside the control main body (2), and the left side of the pressing sliding arm (15) slides on the front end face of the stopping button (602); the pressing spring (1501) is fixedly connected inside the stopping slider (14), and the pressing sliding arm (15) is elastically connected to the pressing spring (1501).

Images