Mask plate carrying device and photoetching machine

Abstract

The invention discloses a mask plate carrying device and a photoetching machine. The device comprises a mask plate clamping assembly which is suitable for clamping a mask plate; the control assembly is connected with the mask plate clamping assembly and is suitable for controlling the mask plate clamping assembly to clamp the mask plate; the inclination sensing assembly is located on the horizontal plane provided by at least one of the mask plate fixing assembly and the control assembly and suitable for detecting the inclination state of the mask plate carrying device and sending a detection result to the control assembly, and the control assembly outputs a corresponding inclination state indication signal according to the detection result. By adopting the scheme, the gradient of the mask plate carrying device can be detected, so that the influence on the normal operation time of a photoetching machine and the product yield is reduced.

Description

Technical Field

[0001] The present invention relates to the field of semiconductor technology, and particularly to a mask plate handling device and a lithography machine. Background Art

[0002] In the semiconductor field, a mask plate is the "negative film" of the pattern in the lithography process. Using a lithography machine, the pattern designed on the mask plate can be transferred to a substrate material, such as a silicon wafer, a glass substrate, etc., by exposure. The mask plate is the key connecting industrial design and process manufacturing. Usually, there is only one mask plate for each product layer in a chip factory, and it is expensive.

[0003] In practical applications, a mask plate handling device is usually provided on a lithography machine. The mask plate handling device can be used to transfer the mask plate into the lithography machine and move it multiple times inside the lithography machine. Since there is a situation of part fatigue in the mask plate handling device, deformation is likely to occur. The deformed mask plate handling device will cause the mask plate to tilt during the transfer process, and even cause the mask plate to be lost during the transfer process, resulting in the downtime of the machine tool.

[0004] However, the existing solutions for detecting the inclination of the mask plate handling device will affect the normal running time of the lithography machine and the product yield. Summary of the Invention

[0005] The problem to be solved by the present invention is: how to detect the inclination of the mask plate handling device to reduce the impact on the normal running time of the lithography machine and the product yield.

[0006] To solve the above problem, an embodiment of the present invention provides a mask plate handling device, which includes:

[0007] A mask plate clamping assembly adapted to clamp the mask plate;

[0008] A control assembly connected to the mask plate clamping assembly and adapted to control the mask plate clamping assembly to clamp the mask plate;

[0009] And an inclination sensing assembly located on at least one horizontal plane provided by the mask plate fixing assembly and the control assembly, adapted to detect the inclination state of the mask plate handling device and send the detection result to the control assembly, and the control assembly outputs a corresponding inclination state indication signal according to the detection result.

[0010] In a possible embodiment, the inclination sensing assembly is adapted to detect the inclination of the mask plate handling device in real time and output an electrical signal representing the inclination of the mask plate handling device to the control assembly.

[0011] In a possible embodiment, the inclination sensing assembly includes:

[0012] A first electronic level is located on a horizontal plane provided by at least one of the mask plate fixing assembly and the control assembly, and is adapted to detect the inclination state of the mask plate handling device in a first direction;

[0013] And a second electronic level is located on a horizontal plane provided by at least one of the mask plate fixing assembly and the control assembly, and is adapted to detect the inclination state of the mask plate handling device in a second direction;

[0014] The first direction is perpendicular to the second direction.

[0015] In a possible embodiment, both the first electronic level and the second electronic level are located on the horizontal plane provided by the mask plate fixing assembly.

[0016] In a possible embodiment, both the first electronic level and the second electronic level are located on the horizontal plane provided by the control assembly.

[0017] In a possible embodiment, the second electronic level is located on the horizontal plane provided by the mask plate fixing assembly, and the first electronic level is located on the horizontal plane provided by the control assembly.

[0018] In a possible embodiment, the control assembly includes: a housing, and at least a control device located inside the housing.

[0019] In a possible embodiment, the housing is adapted to provide a first horizontal plane for fixing the inclination sensing assembly.

[0020] In a possible embodiment, the mask plate clamping assembly includes:

[0021] A mask plate support member adapted to fix the mask plate in the first direction;

[0022] A mask plate protection member located outside the mask plate support member and adapted to protect the mask plate on the mask plate support member;

[0023] And a mask plate abutting member adapted to abut against the mask plate on the mask plate support member to fix the mask plate in the second direction.

[0024] In a possible embodiment, the mask plate protection member is adapted to provide a second horizontal plane for fixing the inclination sensing assembly.

[0025] In a possible embodiment, both the first electronic level and the second electronic level are inductive electronic levels.

[0026] In a possible embodiment, the number of at least one of the first electronic level and the second electronic level is more than two.

[0027] In a possible embodiment, the control component is further adapted to compare the inclination of the mask plate handling device with a critical inclination, and when the inclination of the mask plate handling device approaches or is equal to the critical angle, an alarm signal is output.

[0028] In a possible embodiment, the inclination sensing component is fixed on the horizontal plane provided by the mask plate fixing component and the control component by screws.

[0029] In a possible embodiment, the inclination state indication signal includes: the inclination information of the mask plate handling device.

[0030] An embodiment of the present invention further provides a lithography machine, and the lithography machine includes the mask plate handling device of any one of the above.

[0031] Compared with the prior art, the technical solution of the embodiment of the present invention has the following advantages:

[0032] Applying the solution of the present invention, by arranging an inclination sensing component on the horizontal plane provided by at least one of the mask plate fixing component and the control component, the inclination state of the mask plate handling device is automatically detected by the inclination sensing component, and the detection result is sent to the control component, so that the control component outputs a corresponding inclination state indication signal according to the detection result. Thus, the user can know the inclination state of the mask plate handling device in real time, and can adjust the inclination angle of the mask plate handling device in advance to avoid the situation that the mask plate is lost and the machine is forced to stop, thereby reducing the normal operation time of the lithography machine and the impact on the product output. BRIEF DESCRIPTION OF THE DRAWINGS

[0033] Figure 1 is a side view of a storage library and a mask plate handling device;

[0034] Figure 2 Figure 1 The top view of the mask plate handling device in;

[0035] Figure 3 is a top view of a mask plate handling device in an embodiment of the present invention;

[0036] Figure 4 is a top view of another mask plate handling device in an embodiment of the present invention;

[0037] Figure 5 is a top view of yet another mask plate handling device in an embodiment of the present invention;

[0038] Figure 6 It is a top view of another reticle handling device in an embodiment of the present invention;

[0039] Figure 7 It is a schematic diagram of the position of the reticle on the reticle handling device in an embodiment of the present invention. Detailed implementation manners

[0040] Figure 1 It is a side view of the storage repository 10 and the reticle handling device 20. Figure 2 is Figure 1 the top view of the reticle handling device 20 in

[0041] Referring to Figure 1 and Figure 2 In practical applications, a plurality of storage racks 101 are provided in the storage repository 10. Each storage rack 101 usually has multiple layers of storage spaces, and the reticles 102 can be placed in the storage spaces of the storage racks 101. Inside the lithography machine, a reticle handling device 20 is usually provided. The reticle handling device 20 can grab the reticle 102 from the storage space of the storage rack 101 and transfer the grabbed reticle 102 into the lithography machine. Subsequently, the reticle handling device 20 needs to be used for multiple transfers inside the lithography machine before product production can be carried out.

[0042] Specifically, the reticle handling device 20 can grab the reticle 102 from the storage space of the storage rack 101 and transfer the grabbed reticle 102 to the reticle loading port (Reticle Load Port) of the lithography machine. Then the reticle handling device 20 grabs the reticle 102 from the reticle loading port and transfers it to the interferometric reference and inspection system (IRIS) of the lithography machine. The IRIS aligns the pattern on the reticle 102 with the wafer. The aligned reticle is then transferred to the turret by the reticle handling device 20. The turret transfers the aligned reticle to the stage. The stage makes precise alignment according to the pattern on the reticle 102 and the alignment marks on the wafer. The wafer on the stage is exposed after being aligned with the reticle 102. After the exposure is completed, the reticle 102 is taken off the stage by the turret. The reticle handling device 20 grabs the exposed wafer from the turret and transfers it to the reticle unloading port (Load Port). The reticle handling device 20 grabs the reticle 102 from the reticle unloading port and stores it in the storage space of the storage rack 101.

[0043] In practical applications, the mask plate handling device 20 will deform due to fatigue of its own parts. The deformed mask plate handling device will cause the mask plate to tilt during transfer, and may even cause the mask plate to be lost during transfer, resulting in the downtime of the machine tool. Therefore, it is necessary to detect the inclination of the mask plate handling device 201 to reduce the occurrence of machine tool downtime.

[0044] Due to the high integration and long installation and disassembly time of the lithography machine, the inclination of the mask plate handling device 201 is usually detected only during machine installation or machine tool downtime. The specific detection method is as follows:

[0045] Place the standard mask plate on the mask plate handling device 201, and place bubble levels along the X direction and Y direction of the mask plate handling device 201 respectively. At the same time, place bubble levels along the X direction and Y direction of the storage rack 101 in the storage repository 10 respectively. Based on the position of the bubble in the bubble level on the storage rack 101, manually observe the position of the bubble in the bubble level on the mask plate handling device 201.

[0046] If the position of the bubble in the bubble level in the X direction on the storage rack 101 is the same as or close to the position of the bubble in the bubble level in the X direction on the mask plate handling device 201, and the position of the bubble in the bubble level in the Y direction on the storage rack 101 is the same as or close to the position of the bubble in the bubble level in the Y direction on the mask plate handling device 201, it indicates that the mask plate handling device 201 is not tilted or the inclination meets the handling requirements. Otherwise, it is considered that the inclination of the mask plate handling device 201 does not meet the handling requirements. When the inclination of the mask plate handling device 201 does not meet the handling requirements, the staff can adjust the position of the mask plate handling device 201 until the inclination of the mask plate handling device 201 meets the handling requirements.

[0047] However, the above method for detecting the inclination of the mask plate handling device 201 cannot detect the inclination of the mask plate handling device 201 in real time, which will cause the machine tool to be down passively, affecting the normal operation time (uptime) of the machine tool and the product output.

[0048] To solve this problem, the present invention provides a mask plate handling device, which is provided with an inclination sensing component. By using this inclination sensing component, the user can know the inclination state of the mask plate handling device in real time, which is convenient for adjusting the state of the mask plate handling device in advance, thereby avoiding affecting the normal operation time of the lithography machine and the product output due to the passive downtime of the machine tool.

[0049] To make the above objects, features, and advantages of the present invention more obvious and understandable, the following detailed description will be given to the specific embodiments of the present invention with reference to the accompanying drawings.

[0050] An embodiment of the present invention provides a mask plate handling device, which may include: a mask plate clamping assembly, a control assembly, and an inclination sensing assembly. Among them:

[0051] The mask plate clamping assembly is adapted to clamp the mask plate.

[0052] The control assembly is connected to the mask plate fixing assembly and is adapted to control the mask plate clamping assembly to clamp the mask plate;

[0053] The inclination sensing assembly is located on a horizontal plane provided by at least one of the mask plate fixing assembly and the control assembly, and is adapted to detect the inclination state of the mask plate handling device and send the detection result to the control assembly, and the control assembly outputs a corresponding inclination state indication signal according to the detection result.

[0054] In a specific implementation, the inclination sensing assembly can automatically detect the inclination state of the mask plate handling device and output the detection result to the control assembly, and then the control assembly outputs a corresponding inclination state indication signal according to the detection result. The entire inclination detection process does not require manual participation, thereby reducing the workload of manual labor, improving the detection efficiency, and reducing the operation time of the machine affected by detecting the inclination state of the mask plate handling device, and improving the product output.

[0055] In a specific implementation, the inclination sensing assembly can detect the inclination state of the mask plate handling device at a preset time interval and output the detection result to the control assembly. For example, the inclination sensing assembly can detect the inclination state of the mask plate handling device every 5 s and output the detection result.

[0056] In an embodiment of the present invention, the inclination sensing assembly is adapted to detect the inclination of the mask plate handling device in real time and output an electrical signal representing the inclination of the mask plate handling device to the control assembly. Thereby, the user can know the inclination of the mask plate handling device in real time, which is beneficial to timely adjust the inclination of the mask plate handling device, minimize the occurrence of the machine being passive downtime, and thus can maximize the machine operation time and product output.

[0057] In a specific implementation, the inclination sensing assembly can be implemented by a variety of devices, which is not limited here.

[0058] In an embodiment of the present invention, the inclination sensing assembly can be implemented by an electronic level. The electronic level mainly includes a sensor, a microprocessor, etc. The sensor can use the optoelectronic principle, take the calm liquid surface as the horizontal plane, measure the direction and angle value of the object deviating from the horizontal plane, and then the microprocessor processes it through the attitude solution algorithm to finally obtain the inclination angle of the object.

[0059] In an embodiment of the present invention, the inclination sensing assembly may include: a first electronic level and a second electronic level. Wherein:

[0060] The first electronic level is located on a horizontal plane provided by at least one of the mask plate fixing assembly and the control assembly, and is adapted to detect the inclination state of the mask plate handling device in the first direction;

[0061] The second electronic level is located on a horizontal plane provided by at least one of the mask plate fixing assembly and the control assembly, and is adapted to detect the inclination state of the mask plate handling device in the second direction;

[0062] The first direction is perpendicular to the second direction.

[0063] At this time, the inclination sensing assembly is realized by two vertically placed electronic levels. Thus, the inclination of the mask plate handling device in the first direction and the second direction can be detected. Therefore, based on the inclination detection results of the mask plate handling device in the first direction and the second direction, the inclination angle of the mask plate handling device can be obtained, which is beneficial to adjusting the mask plate handling device in the first direction and the second direction to reduce the inclination.

[0064] Next, in combination with the specific structure of the mask plate handling device, the positions of the first electronic level and the second electronic level will be described:

[0065] Figure 3 It is a schematic structural diagram of a mask plate handling device 30 in an embodiment of the present invention. Referring to Figure 3 , the mask plate handling device 30 may include: a mask plate clamping assembly 31, a control assembly 32, and an inclination sensing assembly 33. Wherein:

[0066] The mask plate clamping assembly 31 may include: a mask plate support 311, a mask plate protector 312, and a mask plate abutting member 313. The mask plate support 311 is adapted to fix the mask plate in the first direction A. The mask plate protector 312 is located outside the mask plate support 311 and is adapted to protect the mask plate on the mask plate support 311. The mask plate abutting member 313 is adapted to abut against the mask plate on the mask plate support 311 to fix the mask plate in the second direction B.

[0067] In a specific implementation, the mask plate support 311 may include: a first support portion 311a and a second support portion 311b. Both the first support portion 311a and the second support portion 311b extend along the second direction B.

[0068] Specifically, the first support portion 311a has a first shielding portion protruding longitudinally and a first edge connected to the bottom of the first shielding portion and protruding along the first direction A. The second support portion 311b has a second shielding portion protruding longitudinally and a second edge connected to the bottom of the second shielding portion and protruding along the first direction A. The first edge and the second edge are arranged opposite to each other along the first direction. One end of the mask plate is located on the first edge and is provided with longitudinal support by the first edge. The other end of the mask plate is located on the second edge and is provided with longitudinal support by the second edge. One end of the mask plate located on the first edge is simultaneously shielded in the first direction by the first shielding portion, and one end of the mask plate located on the second edge is simultaneously shielded in the second direction by the second shielding portion, so that it can be fixed in the first direction under the action of the first shielding portion and the second shielding portion.

[0069] A third shielding portion is further provided at the free end of the first support portion 311a along the second direction, and a fourth shielding portion is further provided at the free end of the second support portion 311b along the second direction. The third shielding portion and the fourth shielding portion can block the movement of the mask plate along the second direction.

[0070] In a specific implementation, the mask plate protection member 312 may include: a first protection portion 312a and a second protection portion 312b. The first protection portion 312a and the second protection portion 312b both extend along the second direction B. The first protection portion 312a is located outside the first support portion 311a along the first direction A and has a longitudinal height. The second protection portion 312b is located outside the second support portion 311b along the first direction A and has a longitudinal height. The longitudinal heights of the first protection portion 312a and the second protection portion 312b are higher than the longitudinal heights of the first support portion 311a and the second support portion 311b, so that the movement of the mask plate in the first direction A can be further blocked, and the mask plate can be prevented from falling off when it moves outside the first support portion 311a or the second support portion 311b.

[0071] In a specific implementation, one end of the first protection portion 312a and the second protection portion 312b extending longitudinally can provide a second horizontal plane, which is on the same side as the mask plate. The second horizontal plane has the same inclination as the mask plate handling device.

[0072] In a specific implementation, the mask plate abutting member 313 can be telescopically extended along the second direction under the control of the control component 32. When the mask plate is located on the first support portion 311a and the second support portion 311b, the control component 32 can control the mask plate abutting member 313 to extend and abut against the mask plate, so that the mask plate can be closely abutted against the third shielding portion of the first support portion 311a and the fourth shielding portion of the second support portion 311b, and the mask plate can be fixed in the second direction B.

[0073] Specifically, the mask plate contact member 313 can be an elastic member, such as a spring.

[0074] In a specific implementation, the control component 32 can include: a housing 321, and a control device located within the housing 321. The housing 321 can have a closed or semi-closed cavity, and the control device is at least placed within this cavity. One end of the first support portion 311a, the second support portion 311b, the first protective portion 312a, and the second protective portion 312b is connected to and fixed on the housing 321. The mask plate contact member 313 can extend from one side of the housing 321 and expand and contract under the control of the control device.

[0075] In a specific implementation, the control device located within the housing 321 can include: a driving member for the mask plate contact member 313, and other sensors. Among them, the driving member for the mask plate contact member 313 can be an air pipe. The other sensors can include an anti-collision sensor, and this anti-collision sensor can prevent the mask plate handling device from colliding with other components by detecting torque.

[0076] In a specific implementation, the control device located outside the housing 321 can include: a handling controller. The control device located within the housing 321 can be connected to the handling controller, so as to send the detection result to the handling controller or receive the control instruction sent by the handling controller.

[0077] In a specific implementation, on the same side of the housing 321 as the mask plate, a first horizontal plane can be provided. The first horizontal plane has the same inclination as the mask plate handling device.

[0078] In a specific implementation, the inclination sensing component can be placed on the horizontal plane provided by at least one of the mask plate fixing component 31 and the control component 32.

[0079] In an embodiment of the present invention, in the inclination sensing component, the first electronic level and the second electronic level can both be arranged on the horizontal plane provided by the mask plate fixing component 31.

[0080] Specifically, referring to Figure 3 , the width of the second horizontal plane provided by the first protective portion 312a and the second protective portion 312b is greater than the length and width of the first electronic level 331 and the second electronic level 332. At this time, the first electronic level 331 can be fixed on the second horizontal plane provided by the first protective portion 312a, and the second electronic level 332 can be fixed on the second horizontal plane provided by the second protective portion 312b.

[0081] In another embodiment of the present invention, in the inclination sensing component, the first electronic level and the second electronic level can both be arranged on the first horizontal plane provided by the control component 32.

[0082] Specifically, referring to Figure 4 , the width of the first horizontal plane provided by the control component 32 is greater than the length and width of the first electronic level 331 and the second electronic level 332. At this time, the first electronic level 331 and the second electronic level 332 can both be fixed on the first horizontal plane.

[0083] In another embodiment of the present invention, in the inclination sensing component, referring to Figure 5 , the first electronic level 331 can be arranged on the first horizontal plane provided by the control component 32, while the second electronic level 332 is arranged on the second horizontal plane provided by the mask plate fixing component 312.

[0084] Specifically, the width of the first horizontal plane provided by the control component 32 is greater than the length and width of the first electronic level 331, and the width of the second horizontal plane provided by the first protective part 312a and the second protective part 312b is less than the length of the second electronic level 332 but greater than or equal to the width of the second electronic level 332. Thus, the first electronic level 331 can be arranged on the first horizontal plane provided by the control component 32, and the second electronic level 332 can be arranged on the second horizontal plane provided by the mask plate fixing component 312.

[0085] In a specific implementation, the number of at least one of the first electronic level and the second electronic level is more than two. For example, the number of the first electronic levels can be set to more than two, or the number of the second electronic levels can be set to more than two, or the numbers of both the first electronic level and the second electronic level can be set to more than two. When there are multiple first electronic levels or multiple second electronic levels, the multiple first electronic levels can be symmetrically distributed on the mask plate handling device, and the multiple second electronic levels can be symmetrically distributed on the mask plate handling device.

[0086] For example, referring to Figure 6 , two second electronic levels can be set, namely the second electronic level 332a and the second electronic level 332b, and only one first electronic level 331 is set. Among them, the second electronic level 332a can be arranged on the second horizontal plane provided by the first protective part 312a, and the second electronic level 332b can be arranged on the second horizontal plane provided by the second protective part 312b. Thus, the inclination of the mask plate handling device in the second direction can be determined based on the detection results of both the second electronic level 332a and the second electronic level 332b, thereby further improving the detection accuracy and avoiding the inclination of the mask plate handling device caused by a single second electronic level.

[0087] In a specific implementation, the first electronic level and the second electronic level can be capacitive electronic levels. The electrolyte in the sealed cavity of the capacitive electronic level flows under the action of gravity. When the mask plate handling device tilts, it will change the charge distribution on the two sides of the capacitive plates. Thus, the tilt angle can be calculated by detecting the capacitance difference.

[0088] In an embodiment of the present invention, to improve the detection accuracy, the first electronic level and the second electronic level can be inductive electronic levels. In the inductive electronic level, the change in the magnetic flux of the induction coil caused by the displacement of the suspended metal pendulum when tilted can be used to output an electrical signal proportional to the angle.

[0089] Compared with the capacitive electronic level, the inductive electronic level has higher accuracy and can reach 0.01 mm / m.

[0090] In a specific implementation, the tilt sensing assembly is fixed to the horizontal plane provided by the mask plate fixing assembly and the control assembly by screws, thereby improving the reliability of the fixation. For example, referring to Figure 3 , the first electronic level 331 can be fixed to the first horizontal plane by screws.

[0091] In other embodiments, the tilt sensing assembly can also be fixed to the horizontal plane provided by the mask plate fixing assembly and the control assembly in other ways.

[0092] In a specific implementation, the first electronic level and the second electronic level can send the detection results to the control assembly, specifically to the handling controller of the control assembly. The handling controller can output a tilt state indication signal based on the detection results. The tilt state indication signal can carry the tilt information of the mask plate handling device, and this tilt information can specifically be the tilt angle value.

[0093] In an embodiment of the present invention, the control assembly is further adapted to compare the tilt of the mask plate handling device with a critical tilt. When the tilt of the mask plate handling device approaches or equals the critical angle, an alarm signal is output. Among them, this critical tilt is usually less than the tilt angle at which the mask plate is lost. Thus, before the mask plate is lost, the tilt of the mask plate handling device can be timely fed back, which is conducive to timely adjusting the tilt of the mask plate handling device. Among them, when it is said that the tilt of the mask plate handling device approaches the critical angle, it means that the tilt of the mask plate handling device is less than the critical angle and the difference from the critical angle is within a preset range, and this preset range can be set according to actual needs.

[0094] In a specific implementation, the alarm signal can be an audio signal, that is, the alarm is carried out in an audio manner, or the alarm signal can also be a visual signal, that is, the alarm is carried out in a manner of an image or a graph. Through this alarm signal, when the inclination of the mask plate handling device approaches or is equal to the inclination, an alarm signal can be output, so that the user can timely know the inclination state of the mask plate handling device, and thus take measures in time to prevent the loss of the mask plate and the downtime of the machine.

[0095] In a specific implementation, on the other side of the control component housing opposite to the first horizontal plane, an adjustment screw for adjusting the inclination of the mask plate handling device can be provided. By adjusting the tightening degree of the adjustment screw, the inclination of the mask plate handling device can be adjusted.

[0096] In a specific implementation, the mask plate handling device may further include a driving component for driving the mask plate clamping component to move. The driving component can be connected to the control component, so that it can move to different positions under the control of the control component. For example, referring to Figure 7 , the driving component can drive the mask plate clamping component to move to the storage library to pick up the mask plate 40 that needs to be transported into the lithography machine, and under the control of the control component, make multiple transfers inside the lithography machine.

[0097] As can be seen from the above, in the solution of the present invention, by providing an inclination sensing component on at least one of the horizontal planes provided in the mask plate fixing component and the control component, the inclination state of the mask plate handling device can be monitored in advance, so that the downtime of the machine and the loss of high-value mask plates can be avoided.

[0098] An embodiment of the present invention further provides a lithography machine, which may include the above-mentioned mask plate handling device.

[0099] By using the above lithography machine, since the inclination state of the mask plate handling device can be monitored in real time, the influence on the running time and product output of the lithography machine can be retrieved.

[0100] Regarding each device and product described in the above embodiments, each module / unit included therein can be a software module / unit, a hardware module / unit, or can be partially a software module / unit and partially a hardware module / unit. For example, for each device and product applied to or integrated into a chip, each module / unit included therein can be implemented in the form of hardware such as circuits. Or, at least some of the modules / units can be implemented in the form of a software program that runs on a processor integrated inside the chip, and the remaining (if any) part of the modules / units can be implemented in the form of hardware such as circuits; for each device and product applied to or integrated into a chip module, each module / unit included therein can be implemented in the form of hardware such as circuits. Different modules / units can be located in the same component (such as a chip, a circuit module, etc.) or different components of the chip module. Or, at least some of the modules / units can be implemented in the form of a software program that runs on a processor integrated inside the chip module, and the remaining (if any) part of the modules / units can be implemented in the form of hardware such as circuits; for each device and product applied to or integrated into a terminal, each module / unit included therein can be implemented in the form of hardware such as circuits. Different modules / units can be located in the same component (such as a chip, a circuit module, etc.) or different components inside the terminal. Or, at least some of the modules / units can be implemented in the form of a software program that runs on a processor integrated inside the terminal, and the remaining (if any) part of the modules / units can be implemented in the form of hardware such as circuits.

[0101] Although the present invention is disclosed as above, the present invention is not limited thereto. Any person skilled in the art can make various changes and modifications without departing from the spirit and scope of the present invention. Therefore, the protection scope of the present invention should be subject to the scope defined by the claims.

Claims

1. A mask plate handling device, characterized in that, Comprising: A mask plate clamping assembly, adapted to clamp a mask plate; A control assembly, connected to the mask plate clamping assembly, adapted to control the mask plate clamping assembly to clamp the mask plate; And an inclination sensing assembly, located on a horizontal plane provided by at least one of the mask plate fixing assembly and the control assembly, adapted to detect the inclination state of the mask plate handling device and send the detection result to the control assembly, and the control assembly outputs a corresponding inclination state indication signal according to the detection result.

2. The mask plate handling device according to claim 1, wherein The inclination sensing assembly is adapted to detect the inclination of the mask plate handling device in real time and output an electrical signal characterizing the inclination of the mask plate handling device to the control assembly.

3. The mask plate handling device according to claim 2, characterized in that, The inclination sensing assembly includes: A first electronic level, located on a horizontal plane provided by at least one of the mask plate fixing assembly and the control assembly, adapted to detect the inclination state of the mask plate handling device in a first direction; And a second electronic level, located on a horizontal plane provided by at least one of the mask plate fixing assembly and the control assembly, adapted to detect the inclination state of the mask plate handling device in a second direction; The first direction is perpendicular to the second direction.

4. The mask plate handling device according to claim 3, wherein, Both the first electronic level and the second electronic level are located on the horizontal plane provided by the mask plate fixing assembly.

5. The mask plate handling device according to claim 3, characterized in that Both the first electronic level and the second electronic level are located on the horizontal plane provided by the control assembly.

6. The mask plate handling device according to claim 3, wherein The second electronic level is located on the horizontal plane provided by the mask plate fixing assembly, and the first electronic level is located on the horizontal plane provided by the control assembly.

7. The mask plate handling device according to any one of claims 3 to 6, characterized in that The control assembly includes: a housing, and at least a control device located inside the housing.

8. The mask plate handling device according to claim 7, wherein, The housing is adapted to provide a first horizontal plane for fixing the inclination sensing assembly.

9. The mask plate handling device according to any one of claims 3 to 6, characterized in that The mask plate clamping assembly includes: A mask plate support member, adapted to fix the mask plate in the first direction; A mask plate protection member, located outside the mask plate support member, adapted to protect the mask plate on the mask plate support member; And a mask plate abutting member, adapted to abut against the mask plate on the mask plate support member to fix the mask plate in the second direction.

10. The mask plate handling device according to claim 9, wherein, The mask plate protection member is adapted to provide a second horizontal plane for fixing the inclination sensing assembly.

11. The mask plate handling device according to claim 3, characterized in that, Both the first electronic level and the second electronic level are inductive electronic levels.

12. The mask plate handling device according to claim 3, wherein, The number of at least one of the first electronic level and the second electronic level is more than two.

13. The mask plate handling device according to claim 2, wherein The control assembly is further adapted to compare the inclination of the mask plate handling device with a critical inclination, and when the inclination of the mask plate handling device approaches or is equal to the critical angle, output an alarm signal.

14. The mask plate handling device according to claim 1, characterized in that, The inclination sensing assembly is fixed on the horizontal planes provided by the mask plate fixing assembly and the control assembly by screws.

15. The mask plate handling device according to claim 1, wherein, The inclination state indication signal includes: the inclination information of the mask plate handling device.

16. A lithography machine, characterized in that, Including the mask plate handling device according to any one of claims 1 to 15.

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