Feeding device of chemical vapor deposition furnace

Abstract

The invention relates to a chemical vapor deposition furnace feeding device which comprises a conveying arm, the conveying arm comprises an arm body used for horizontally stretching into or withdrawing from a chemical vapor deposition furnace in a non-contact mode, and the arm body is horizontally arranged on the axial rear side of a furnace opening of the chemical vapor deposition furnace. A supporting surface for supporting a wafer carrying boat is formed on the upper side of the front part of the arm body, and the shape of the supporting surface is matched with the shape of the bottom surface of the wafer carrying boat; the posture adjusting mechanism is used for adjusting the posture of the arm body, and the posture adjusting mechanism is connected with the arm body; the driving mechanism is used for driving the arm body to horizontally extend into or retreat from the chemical vapor deposition furnace, and the driving mechanism is connected with the posture adjusting mechanism. By designing the automatic conveying arm and a matched mechanism thereof, friction particle pollution is thoroughly eliminated, the operation safety is remarkably improved, meanwhile, the production efficiency is improved, and the labor cost is reduced.

Description

Technical Field

[0001] The present invention belongs to the technical field of semiconductor processing, and particularly relates to a feeding device for a chemical vapor deposition furnace. Background Art

[0002] In the field of semiconductor manufacturing, chemical vapor deposition (CVD) furnaces are widely used for depositing thin films on the surface of wafers. In the prior art, wafers are usually carried by a carrier boat and are fed into the furnace chamber by manually holding a feeding arm. The specific operation process is as follows: The operator manually controls the front end of the feeding arm to support on the sliding seat inside the furnace, and pushes the carrier boat along the sliding seat track to the process area. After completion, it is withdrawn in the same way.

[0003] However, this traditional method has the following significant defects:

[0004] 1. High risk of particle contamination: During the forward and backward movement of the feeding arm, particles are generated due to repeated friction between its front end and the furnace wall or the sliding seat. These particles are easily deposited on the surface of the wafer. Especially in a high-temperature process environment, the adhesion of particles is aggravated, seriously affecting the uniformity of the thin film on the wafer surface and the yield of devices.

[0005] 2. Prominent safety hazards:

[0006] Scalding risk: The CVD furnace is in a high-temperature state for a long time (usually >500 °C). After the feeding arm contacts the furnace body, it quickly heats up. The operator needs to adjust the position of the feeding arm at a close distance, and is extremely likely to be scalded due to contact with high-temperature components or thermal radiation.

[0007] Wafer damage: The stability of manual operation is poor, and the feeding arm is prone to jitter or deviation, resulting in the collision of the carrier boat with the inner wall of the furnace chamber, causing chipping at the edge of the wafer or scratching on the surface, indirectly increasing the production cost.

[0008] 3. Efficiency and labor cost issues:

[0009] Complicated operation: Manual pushing requires repeated adjustment of the angle and force of the feeding arm. Especially when carrying a carrier boat full of multiple wafers, the operation is time-consuming and depends on the experience of skilled workers.

[0010] Limited production capacity: The single feeding cycle is long, and limited by the physical strength and operation accuracy of workers, it is difficult to achieve continuous operation, restricting the improvement of the overall efficiency of the production line. Summary of the Invention

[0011] Based on this, in view of the above technical problems, a feeding device for a chemical vapor deposition furnace is provided.

[0012] To solve the above technical problems, the present invention adopts the following technical solutions:

[0013] A feeding device for a chemical vapor deposition furnace, characterized in that it includes a conveying arm, and the conveying arm includes:

[0014] An arm body for non-contact horizontal insertion into or withdrawal from a chemical vapor deposition furnace. The arm body is horizontally arranged at the axial rear side of the furnace mouth of the chemical vapor deposition furnace. The upper side of the front part of the arm body forms a support surface for supporting a wafer carrier boat, and the shape of the support surface is adapted to the shape of the bottom surface of the wafer carrier boat.

[0015] An attitude adjustment mechanism for adjusting the attitude of the arm body. The attitude adjustment mechanism is connected to the arm body.

[0016] A driving mechanism for driving the arm body to horizontally insert into or withdraw from the chemical vapor deposition furnace. The driving mechanism is connected to the attitude adjustment mechanism.

[0017] By designing an automated transfer arm and its supporting mechanisms, the present invention proposes a systematic improvement for the defects of the traditional manual feeding process. The specific beneficial effects include:

[0018] 1. Completely eliminate frictional particle contamination:

[0019] The arm body of the transfer arm is automatically driven by the driving mechanism, and after the attitude of the arm body is adjusted by the attitude adjustment mechanism, it can ensure that the arm body horizontally inserts into / withdraws from the chemical vapor deposition furnace without contact. The arm body will not contact the furnace wall or the slide, and can completely avoid the generation of frictional particulate matter, fundamentally solving the problem of wafer surface contamination and improving the yield of thin film deposition.

[0020] 2. Significantly improve operation safety:

[0021] Avoid the risk of scalding: The operator only needs to place the boat carrying the wafer on the arm body, without the need to operate the high-temperature furnace body closely, realizing fully automated feeding throughout the process, and completely eliminating the hidden danger of manual scalding.

[0022] Prevent wafer damage: After the attitude of the arm body is adjusted by the attitude adjustment mechanism, the driving mechanism can ensure that the carrier boat remains horizontal and stable during transportation, avoiding wafer collision damage caused by jitter or deviation.

[0023] 3. High efficiency and low labor cost:

[0024] The driving mechanism can programmatically control the insertion / withdrawal speed and stroke of the transfer arm, support the continuous transportation of multiple batches of wafer carrier boats, significantly shorten the single process cycle, improve the production line efficiency, and does not require manual pushing, greatly saving labor costs. Brief Description of the Drawings

[0025] Figure 1 is a three-dimensional structural schematic diagram of the present invention;

[0026] Figure 2 is a structural schematic diagram of the transfer arm in Embodiment 1 of the present invention;

[0027] Figure 3 Structural schematic of the attitude adjustment mechanism according to Embodiment 1 of the present invention Figure 1 ;

[0028] Figure 4 Structural schematic of the attitude adjustment mechanism according to Embodiment 1 of the present invention Figure 2 ;

[0029] Figure 5 Structural schematic of the attitude adjustment mechanism according to Embodiment 1 of the present invention Figure 3 ;

[0030] Figure 6 Structural schematic diagram of the first left - right swing adjustment plate of the attitude adjustment mechanism according to Embodiment 1 of the present invention;

[0031] Figure 7 Structural schematic diagram of the first up - down swing adjustment plate of the attitude adjustment mechanism according to Embodiment 1 of the present invention;

[0032] Figure 8 Structural schematic diagram of the conveying arm according to Embodiment 2 of the present invention;

[0033] Figure 9 Structural schematic diagram of the furnace door sealing buffer mechanism and the attitude adjustment mechanism according to Embodiment 2 of the present invention;

[0034] Figure 10 Structural schematic diagram of the furnace door of the furnace door sealing buffer mechanism according to Embodiment 2 of the present invention;

[0035] Figure 11 Three - dimensional structural schematic diagram of the attitude adjustment mechanism according to Embodiment 2 of the present invention. Detailed implementation manners

[0036] The following will describe the embodiments of the present invention with reference to the accompanying drawings of the specification. It should be noted that the embodiments involved in this specification are not exhaustive and do not represent the only embodiments of the present invention. The following corresponding embodiments are only for clearly explaining the inventive content of the present invention, rather than limiting its embodiments. For those of ordinary skill in the art, different forms of changes and modifications can be made on the basis of the description of this embodiment. Any changes or modifications that belong to the technical concept and inventive content of the present invention and are obvious are also within the protection scope of the present invention.

[0037] As Figure 1 shown, the embodiment of the present application provides a chemical vapor deposition furnace feeding device, including a plurality of conveying arms 1100.

[0038] The plurality of conveying arms 1100 are arranged at intervals up and down and respectively correspond to different chemical vapor deposition furnaces 2 on the cabinet 4.

[0039] The transfer arm 1100 includes an arm body 1110, an attitude adjustment mechanism 1120, and a drive mechanism 1130.

[0040] Embodiment 1

[0041] The arm body 1110 is used to horizontally extend into or withdraw from the chemical vapor deposition furnace 2 without contact. It is horizontally arranged at the axial rear side of the furnace opening of the chemical vapor deposition furnace 2. The upper side of the front part of the arm body 1110 forms a support surface for supporting the wafer carrier boat 3. The shape of the support surface is adapted to the bottom surface shape of the wafer carrier boat 3. See Figure 2 .

[0042] In this embodiment, the arm body 1110 horizontally extends forward into the chemical vapor deposition furnace 2 from the initial position. The withdrawal action includes descending and horizontally moving backward. The purpose of descending is to place the wafer carrier boat 3 on the processing rack inside the chemical vapor deposition furnace 2. After horizontally moving backward to below the initial position, it then rises to the initial position.

[0043] Among them, as Figure 2 shown, the arm body 1110 includes a thick part 1111 and a sheet part 1112.

[0044] The material of the thick part 1111 is silicon carbide. In order to improve the strength, it is designed as a hollow tube. The lower side part of the front end pipe orifice extends forward to form the sheet part 1112. The vertical cross-sectional shape of the sheet part 1112 is arc-shaped. The above support surface is the upper surface of the sheet part 1112, which can be adapted to the wafer carrier boat with an arc-shaped vertical cross-section of the bottom surface.

[0045] The attitude adjustment mechanism 1120 is used to adjust the attitude of the arm body 1110, and it is connected to the thick part 1111 of the arm.

[0046] In this embodiment, as Figure 3 and Figure 5 shown, the attitude adjustment mechanism 1120 includes a first base 1121, a lifting module 1122, a first support plate 1123, a first up-and-down swing adjustment plate 1124, an up-and-down swing adjustment bolt 1125, a first left-and-right swing adjustment plate 1126, a left-and-right swing adjustment knob 1127, and a locking knob 1128.

[0047] The first base 1121 includes a horizontal plate body 1121a and a vertical plate body 1121b. The horizontal plate body 1121a is fixed to the vertical plate body 1121b by bolts. The vertical plate body 1121b faces the left and right directions and is fixed to the drive mechanism 1130.

[0048] As Figure 4As shown, there are two first blocks 1121c arranged at intervals in the front and rear on the horizontal plate body 1121a. Threaded connections of the two first blocks 1121c are provided with first left - right adjustment bolts 1121d in the left - right direction, which are used to push and pull the lifting module 1122 left and right, so that it can translate left and right on the horizontal plate body 1121a.

[0049] The lifting module 1122 uses an electric cylinder. As Figure 3 shown, it specifically includes a lower support base 1122a, a top plate 1122b, a lead screw 1122c, a plurality of guide rods 1122d, and a motor 1122e.

[0050] As Figure 4 shown, the lower support base 1122a is arranged on the upper surface of the horizontal plate body 1121a. It is threadedly connected to the first left - right adjustment bolt 1121d and can translate left and right on the horizontal plate body 1121a under the push and pull of the first left - right adjustment bolt 1121d. It has a plurality of locking through - holes 1122f in the up - down direction. Correspondingly, the horizontal plate body 1121a has locking waist - shaped holes 1121e corresponding to the locking through - holes 1122f. Refer to Figure 5 , and the left - right position of the lower support base 1122a can be locked through the locking through - holes 1122f, the locking waist - shaped holes 1121e, and bolts.

[0051] As Figure 3 shown, the top plate 1122b is located above the lower support base 1122a. A lead screw 1122c and a plurality of guide rods 1122d are arranged between the two. Among them, both ends of the lead screw 1122c are rotatably connected to the top plate 1122b and the lower support base 1122a.

[0052] The motor 1122e is fixed on the lower surface of the top plate 1122b. Its output shaft is in transmission connection with the lead screw 1122c through a transmission belt and two transmission wheels. A moving frame 1122g is fixed on the nut seat of the lead screw 1122c. Under the drive of the motor 1122e, the moving frame 1122g can move up and down.

[0053] The first support plate 1123 is fixed on the moving frame 1122g by bolts. As Figure 3 and Figure 7 shown, its upper surface has two first rotating seats 1123a spaced left and right. The left and right sides of the first up - and - down swing adjustment plate 1124 are respectively rotatably connected to the corresponding first rotating seats 1123a up and down. The up - and - down swing adjustment bolt 1125 passes through the rear end of the first up - and - down swing adjustment plate 1124 from top to bottom and is threadedly connected to the first support plate 1123. Operating the up - and - down swing adjustment bolt 1125 can adjust the up - and - down tilt angle of the first up - and - down swing adjustment plate 1124.

[0054] As Figure 3As shown, the first left - right swing adjustment plate 1126 is located on the first up - down swing adjustment plate 1124 and is penetrated by the up - down swing adjustment bolt 1125. It can swing left and right with the up - down swing adjustment bolt 1125 as the center. As Figure 6 shown, the front part of the first left - right swing adjustment plate 1126 has a left - right swing adjustment hole 1126a. As Figure 7 shown, the rod part 1127a of the left - right swing adjustment knob 1127 passes through the front part of the first up - down swing adjustment plate 1124 from bottom to top and is rotatably connected to the first up - down swing adjustment plate 1124. The upper end face of the rod part 1127a has an eccentric column 1127c extending into the left - right swing adjustment hole 1126a. Rotating the left - right swing adjustment knob 1127 makes the eccentric column 1127c rotate, thereby driving the first left - right swing adjustment plate 1126 to swing left and right through the left - right swing adjustment hole 1126a, realizing the adjustment of the left - right deflection angle.

[0055] As Figure 3 shown, the first left - right swing adjustment plate 1126 has a hoop 1126b in the left - right direction for fixing the thick part 1111 of the arm body 1110.

[0056] Based on the above structure, the left - right horizontal position, up - down position, up - down tilt angle, and left - right deflection angle of the arm body 1110 can be adjusted.

[0057] As Figures 5 - 7 shown, the rod part 1128a of the locking knob 1128 passes through the front parts of the first up - down swing adjustment plate 1124 and the first left - right swing adjustment plate 1126 from bottom to top. The hole 1124a through which the first up - down swing adjustment plate 1124 is penetrated by the rod part 1128a is a waist - shaped through - hole in the left - right direction, avoiding interference between the locking knob 1128 and the first up - down swing adjustment plate 1124 when the first left - right swing adjustment plate 1126 swings left and right. The first left - right swing adjustment plate 1126 is threadedly connected to the rod part 1128a of the locking knob 1128.

[0058] After the attitude adjustment of the arm body 1110 is completed, the arm body 1110 is locked by the locking knob 1128. At the same time, it can also play a role in finely adjusting the up - down tilt angle of the arm body 1110.

[0059] The driving mechanism 1130 is arranged on the cabinet 4. It adopts a linear module, which can be an electric cylinder or a pneumatic cylinder, and is used to drive the arm body 1110 to horizontally extend into or withdraw from the chemical vapor deposition furnace.

[0060] Embodiment 2

[0061] The difference between this embodiment and Embodiment 1 is:

[0062] 1. After the arm body 1110 horizontally extends forward from the initial position into the target position in the chemical vapor deposition furnace 2, it remains in the furnace. After the wafer is processed, the arm body 1110 then horizontally moves backward to the initial position.

[0063] 2. As Figure 8 shown, the material of the thick part 1111 is quartz, and its vertical cross-section is a solid rod in the shape of a square. The front end of the solid rod extends forward to form a sheet-like part 1112, and the vertical cross-sectional shape of the sheet-like part 1112 is an inverted trapezoid.

[0064] 3. Since the arm body 1110 needs to remain in the furnace, the transfer arm 1100 in this embodiment further has a furnace door sealing and buffering mechanism 1140. As Figure 9 shown, the sealing and buffering mechanism 1140 includes a furnace door 1141, a moving spring seat 1142, a static spring seat 1143, a first spring 1144, and a positioning pin 1145.

[0065] As Figure 10 shown, the furnace door 1141 is a vertical disc, which is adapted to the furnace opening. An eccentrically arranged perforation 1141a is provided at the lower side position of the furnace door 1141 for the rear part (thick part 1111) of the arm body 1110 to horizontally pass through.

[0066] The rear side opening of the perforation 1141a forms an annular step 1141b.

[0067] As Figure 9 shown, the furnace door 1141, the moving spring seat 1142, the first spring 1144, and the static spring seat 1143 are arranged in sequence from front to back, and all are horizontally passed through by the rear part of the arm body 1110.

[0068] The moving spring seat 1142 is in the shape of a sleeve, its front end abuts against the above-mentioned step 1141b, and its outer diameter is equal to the outer diameter of the step 1141b. The sealing performance of the connection between the moving spring seat 1142 and the perforation 1141a can be further ensured through a seal.

[0069] The static spring seat 1143 is in the shape of a ring, which is fixed to the circumferential surface of the disc formed on the rear part of the arm body 1110. The disc can prevent the leakage of gas in the furnace. By setting a seal between the static spring seat 1143 and the disc, the sealing performance can be further improved.

[0070] The first spring 1144 is circumferentially closed, and its two ends are respectively connected to the moving spring seat 1142 and the static spring seat 1143. The sealing performance of the connection is ensured through a seal.

[0071] After the arm body 1110 reaches the above-mentioned target position, the furnace door 1141 is exactly pressed by the acting force of the first spring 1144 to ensure the sealing performance of the furnace door.

[0072] The positioning pin 1145 is mainly used to position the furnace door 1141 to prevent it from rotating, and also has a buffering effect. In this embodiment, the number of positioning pins 1145 is two. The two positioning pins 1145 are both parallel to the arm body 1110, are arranged at intervals left and right, and are located at the rear side of the furnace door 1141. The positioning pin 1145 includes a static rod 1145a and a moving rod 1145b. The static rod 1145a is fixed to the connecting seat 1145c by bolts. The connecting seat 1145c is fixed to the rear part of the arm body 1110 in the form of a hoop. An axially extending sliding hole is formed on the front end face of the static rod 1145a. A second spring is arranged in the sliding hole to play a buffering role. The rear end of the moving rod 1145b is slidably arranged in the sliding hole and is keyway - engaged with the static rod 1145a to prevent the furnace door 1141 from rotating. The front end of the moving rod 1145b is connected to the rear side face of the upper part of the furnace door 1141.

[0073] 4. The structure of the attitude adjustment mechanism 1120 in this embodiment is different from that in Embodiment 1.

[0074] In this embodiment, as Figure 9 shown, the attitude adjustment mechanism 1120 includes a second base 1121, a second left - right swing adjustment plate 1122, a second support plate 1123, and a second up - down swing adjustment plate 1124.

[0075] The second base 1121 includes a back plate 1121a and an L - shaped plate 1121b. The back plate faces the left - right direction and is fixed to the driving mechanism 1130. The L - shaped plate 1121b has a vertical plate 1121b - 1 and a horizontal plate 1121b - 2.

[0076] The vertical plate 1121b - 1 faces the left - right direction. A sliding seat is provided on its back surface, which is in up - down sliding cooperation with the slide rail on the back plate 1121a, so that the up - down position of the L - shaped plate 1121b on the back plate 1121a can be adjusted. A plurality of up - down position locking waist - shaped holes 1121b - 3 are provided on the vertical plate 1121b - 1. The up - down position locking waist - shaped holes 1121b - 3 are in the up - down direction. Locking screw holes corresponding to the positions of the up - down position locking waist - shaped holes 1121b - 3 are provided on the back plate 1121a. After the L - shaped plate 1121b is adjusted to the desired up - down position, the position can be locked through the up - down position locking waist - shaped holes 1121b - 3, the locking screw holes, and bolts.

[0077] The horizontal plate 1121b - 2 is integrally formed on the vertical plate 1121b - 1.

[0078] The second left - right swing adjustment plate 1122 is located on the horizontal plate 1121b - 2, and the two are horizontally rotatably connected through a central axis 1122a located at the center. See Figure 11, so that the horizontal left - right deflection angle of the second left - right swing adjustment plate 1122 can be adjusted. There are four left - right swing angle locking waist - shaped holes 1121b - 4 on the horizontal plate 1121b - 2. The four left - right swing angle locking waist - shaped holes 1121b - 4 are arranged on the same circumference with the central axis 1122a as the center, and are all in an arc shape centered on the central axis 1122a. The second left - right swing adjustment plate 1122 has locking screw holes corresponding to the positions of the left - right swing angle locking waist - shaped holes 1121b - 4. After the horizontal deflection angle of the second left - right swing adjustment plate 1122 is adjusted to the desired angle, it is locked through the left - right swing angle locking waist - shaped holes 1121b - 4, the locking screw holes and bolts.

[0079] As Figure 9 shown, the second left - right swing adjustment plate 1122 has a second block 1122b. A left - right second left - right adjustment bolt 1122c is threadedly connected to the second block 1122b, which is used to push and pull the second support plate 1123 left - right, so that it can translate left - right on the second left - right swing adjustment plate 1122.

[0080] The second support plate 1123 is located on the second left - right swing adjustment plate 1122 and is in left - right horizontal sliding fit with the track on the second left - right swing adjustment plate 1122. Thus, the left - right horizontal position of the second support plate 1123 on the second left - right swing adjustment plate 1122 can be adjusted. Similarly, the position of the second support plate 1123 can be locked by the locking waist - shaped holes, locking bolts and bolts.

[0081] The upper surface of the second support plate 1123 has an n - shaped frame. The left - right side plates of the frame form two second rotating seats 1123a spaced left - right. One of the side plates is threadedly connected to the second left - right adjustment bolt 1122c.

[0082] As Figure 9 shown, the vertical cross - section of the second up - down swing adjustment plate 1124 is in a u - shape. The left and right sides of its front part are respectively connected to the corresponding second rotating seats 1123a through shafts 1123b for up - down rotation. The rear part of the upper surface of the second support plate 1123 has two vertical screw rods 1123b spaced left - right. The left and right sides of the rear part of the second up - down swing adjustment plate 1124 have ears 1124a. The ears 1124a are vertically penetrated by the corresponding vertical screw rods 1123b and are locked by two upper and lower locking nuts provided on the vertical screw rods 1123b. By adjusting the positions of the two locking nuts on the vertical screw rods 1123b, the up - down tilt angle of the second up - down swing adjustment plate 1124 can be adjusted.

[0083] The upper side of the second up - down swing adjustment plate 1124 has a fixing plate 1125 that is mirror - image to it. The two are fixed by bolts to clamp - fix the rear part of the arm body 1110.

[0084] As can be seen from the above, a feeding device for a chemical vapor deposition furnace provided by an embodiment of the present application systematically improves the defects of the traditional manual feeding process by designing an automated conveying arm and its supporting mechanisms. The specific beneficial effects include:

[0085] 1. Thoroughly eliminate frictional particle contamination:

[0086] The arm body of the conveying arm is automatically driven by a driving mechanism. After the attitude of the arm body is adjusted by the attitude adjustment mechanism, it can be ensured that the arm body horizontally extends into / withdraws from the chemical vapor deposition furnace without contact. The arm body will not contact the furnace wall or the sliding seat, completely avoiding the generation of frictional particulate matter, fundamentally solving the problem of wafer surface contamination, and improving the yield of thin film deposition.

[0087] 2. Significantly improve operation safety:

[0088] Avoid the risk of scalding: The operator only needs to place the boat carrying the wafer on the arm body, without the need to operate the high-temperature furnace body at close range, realizing fully automated feeding throughout the process, and completely eliminating the hidden danger of manual scalding.

[0089] Prevent wafer damage: After the attitude of the arm body is adjusted by the attitude adjustment mechanism, the driving mechanism can ensure that the carrier boat remains horizontal and stable during transportation, avoiding wafer collision damage caused by jitter or deviation.

[0090] 3. High efficiency and low labor cost:

[0091] The driving mechanism can programmatically control the extension / withdrawal speed and stroke of the conveying arm, support the continuous transportation of multiple batches of wafer carrier boats, significantly shorten the single process cycle, improve the production line efficiency, and does not require manual pushing, greatly saving labor costs.

[0092] Obviously, those of ordinary skill in the art in this technical field should recognize that the above embodiments are only used to illustrate the present invention, rather than to limit the present invention. As long as it is within the scope of the spirit of the present invention, changes and modifications to the above embodiments will fall within the scope of the claims of the present invention.

Claims

1. A feeding device for a chemical vapor deposition furnace, characterized in that Comprising a conveying arm, the conveying arm includes: An arm body for horizontally extending into or out of a chemical vapor deposition furnace without contact. The arm body is horizontally arranged at the axial rear side of the furnace opening of the chemical vapor deposition furnace. A support surface for supporting a wafer carrier boat is formed on the upper side of the front part of the arm body, and the shape of the support surface is adapted to the bottom surface shape of the wafer carrier boat; An attitude adjustment mechanism for adjusting the attitude of the arm body, the attitude adjustment mechanism being connected to the arm body; A driving mechanism for driving the arm body to horizontally extend into or out of the chemical vapor deposition furnace, the driving mechanism being connected to the attitude adjustment mechanism.

2. The chemical vapor deposition furnace feeding device according to claim 1, wherein The arm body includes a thick part and a sheet-like part. The thick part is connected to the attitude adjustment mechanism. The rear end of the sheet-like part is connected to the front end of the thick part. The vertical cross-sectional shape of the sheet-like part is the same as the vertical cross-sectional shape of the bottom surface of the wafer carrier boat, and the support surface is the upper surface of the sheet-like part.

3. The chemical vapor deposition furnace feeding device according to claim 2, wherein The thick part is a solid rod or a hollow tube, and the front end of the thick part extends forward to form the sheet-like part.

4. A chemical vapor deposition furnace feeding device according to claim 2, characterized in that, The vertical cross-sectional shape of the sheet-like part is arc-shaped or inverted trapezoidal.

5. A chemical vapor deposition furnace feeding device according to claim 1, characterized in that, The conveying arm further includes a furnace door sealing and buffering mechanism. The furnace door sealing and buffering mechanism includes a furnace door, a moving spring seat, a static spring seat, a first spring, and a positioning pin. The furnace door is adapted to the furnace opening. The furnace door, the moving spring seat, the first spring, and the static spring seat are arranged in sequence from front to back and are all penetrated by the rear part of the arm body. The moving spring seat abuts against the rear side of the furnace door. The static spring seat is fixed to the rear part of the arm body. The two ends of the first spring are respectively connected to the moving spring seat and the static spring seat. The positioning pin is parallel to the arm body and is located at the rear side of the furnace door. The positioning pin includes a static rod and a moving rod. The static rod is fixed to the rear part of the arm body through a connecting seat, and a sliding hole extending axially backward is formed on the front end surface of the static rod. A second spring is arranged in the sliding hole. The rear end of the moving rod is slidably arranged in the sliding hole and is keyway-matched with the static rod, and its front end is connected to the furnace door.

6. The chemical vapor deposition furnace feeding device according to claim 1, wherein, The posture adjustment mechanism includes a first base having a horizontal plate body, a lifting module disposed on the upper surface of the horizontal plate body, a first support plate driven by the lifting module, a first upper and lower swing adjustment plate, an upper and lower swing adjustment bolt, a first left and right swing adjustment plate, and a left and right swing adjustment knob. The first base is fixed to the driving mechanism. The horizontal plate body is provided with a first left and right adjustment bolt for pushing and pulling the lifting module left and right to make it translate left and right on the horizontal plate body. The upper surface of the first support plate has two first rotating seats spaced left and right. The left and right sides of the first upper and lower swing adjustment plate are respectively connected to the corresponding first rotating seats for upper and lower rotation. The upper and lower swing adjustment bolt passes through the rear end of the first upper and lower swing adjustment plate from top to bottom and is threadedly connected to the first support plate. The first left and right swing adjustment plate is located on the first upper and lower swing adjustment plate and is passed through by the upper and lower swing adjustment bolt. The front part of the first left and right swing adjustment plate has a left and right swing adjustment hole. The rod portion of the left and right swing adjustment knob passes through the front part of the first upper and lower swing adjustment plate from bottom to top and is rotatably connected to the first upper and lower swing adjustment plate. The upper end surface thereof has an eccentric column extending into the left and right swing adjustment hole. The rear part of the arm body is fixed to the first left and right swing adjustment plate.

7. The chemical vapor deposition furnace feeding device according to claim 6, characterized in that, The posture adjustment mechanism further includes a locking knob. The rod portion of the locking knob passes through the front parts of the first upper and lower swing adjustment plate and the first left and right swing adjustment plate in sequence from bottom to top. The hole in the first upper and lower swing adjustment plate through which the rod portion of the locking knob passes is a waist-shaped through hole in the left and right direction. The first left and right swing adjustment plate is threadedly connected to the rod portion of the locking knob.

8. A chemical vapor deposition furnace feeding device according to claim 1, characterized in that, The attitude adjustment mechanism includes a second base, a second left-right swing adjustment plate, a second support plate, and a second up-down swing adjustment plate. The second base includes a back plate fixed to the driving mechanism and an L-shaped plate. The back plate faces the left-right direction. The L-shaped plate has a vertical plate and a horizontal plate. The vertical plate faces the left-right direction and is in vertical sliding cooperation with the back plate. The vertical plate and the back plate are provided with corresponding upper and lower position locking waist-shaped holes and locking screw holes. The upper and lower position locking waist-shaped holes are in the up-down direction. The horizontal plate is fixed to the vertical plate. The second left-right swing adjustment plate is located on the horizontal plate, and the two are horizontally rotatably connected through a central axis at the center. The second left-right swing adjustment plate and the horizontal plate are provided with corresponding left-right swing angle locking waist-shaped holes and locking screw holes. The left-right swing angle locking waist-shaped holes are in an arc centered on the central axis. The second left-right swing adjustment plate is provided with a second left-right adjustment bolt for pushing and pulling the second support plate left and right to make it translate left and right on the second left-right swing adjustment plate. The second support plate is located on the second left-right swing adjustment plate, and the two are in left-right horizontal sliding cooperation. The upper surface of the second support plate has two second rotating seats spaced left and right. The front left and right sides of the second up-down swing adjustment plate are respectively connected to the corresponding second rotating seats for up-down rotation. The rear part of the upper surface of the second support plate has two vertical screws spaced left and right. The rear left and right sides of the second up-down swing adjustment plate have ears, and the ears are vertically penetrated by the corresponding vertical screws and locked by two upper and lower locking nuts provided on the vertical screws. The rear part of the arm body is fixed to the second up-down swing adjustment plate.

9. The chemical vapor deposition furnace feeding device according to claim 1, characterized in that, The driving mechanism adopts a linear module.

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