Etching system and maintenance method and operation method thereof

Abstract

The invention discloses an etching system and a maintenance method and an operation method thereof. The system comprises a process chamber; the turbo molecular pump is suitable for extracting gas molecules in the process chamber; the pendulum valve is arranged between the process chamber and the turbo molecular pump, the pendulum valve is communicated with the process chamber and the turbo molecular pump, and the pendulum valve is suitable for controlling the pressure required by the process chamber; the pneumatic driving device is used for controlling the opening angle of the pendulum valve, and the pneumatic device comprises a pneumatic valve; the ventilation pipeline is communicated with the pneumatic valve; and the switch control valve is connected to the ventilation pipeline. And the probability of downtime of the whole etching system machine due to dry gas leakage is reduced, so that the stability of the etching system is improved.

Description

Technical Field

[0001] The embodiments of the present invention relate to the field of semiconductor manufacturing, and in particular to an etching system and a maintenance method and an operation method thereof. Background Art

[0002] In the field of semiconductor manufacturing, dry etching is a key process with extremely high environmental requirements, requiring it to be performed under high vacuum conditions. High vacuum pressure facilitates the ionization of etching gases to form plasma, enabling precise etching of thin films. One of the core components of dry etching equipment is the vacuum system, which primarily consists of a turbomolecular pump and a dry pump. The turbomolecular pump extracts gas molecules from the process chamber to create a high vacuum environment, while the dry pump assists the turbomolecular pump by exhausting the extracted gas molecules. The two work together to ensure that the process chamber reaches and maintains the required high vacuum state, providing stable conditions for the etching process.

[0003] The vacuum system of dry etching equipment plays a crucial role in the etching process. This system primarily consists of a turbomolecular pump and a dry pump. The turbomolecular pump, with its high-speed rotating blades, extracts gas molecules from the process chamber to quickly establish a high vacuum environment. To control pressure, a pendulum valve is typically installed above the turbomolecular pump. This valve controls the opening angle of the pendulum valve based on the required pressure, maintaining a constant vacuum pressure within the chamber. The pendulum valve angle is driven by a pneumatic valve mechanism in the drive motor.

[0004] Currently, during the maintenance and disassembly of a component of an etching device, clean dry gas in an air pipe connected to a pneumatic valve is easily leaked, causing the entire etching device to shut down. Summary of the Invention

[0005] The problem solved by the embodiments of the present invention is to provide an etching system and a maintenance method and an operation method thereof, thereby improving the stability of the etching system.

[0006] To solve the above problems, an embodiment of the present invention provides an etching system, including: a process chamber; a turbomolecular pump, suitable for extracting gas molecules in the process chamber; a pendulum valve, arranged between the process chamber and the turbomolecular pump, the pendulum valve is interconnected with the process chamber and the turbomolecular pump, and the pendulum valve is suitable for controlling the pressure required by the process chamber; a pneumatic drive device, used to control the opening angle of the pendulum valve, the pneumatic device includes a pneumatic valve; a ventilation line, connected to the pneumatic valve; a switch control valve, connected to the ventilation line.

[0007] Optionally, the switch control valve includes one or both of a manual switch control valve and an electric switch control valve.

[0008] Optionally, the switching control valve is a manual switching control valve, and a status identifier is further provided on the switching control valve for indicating the on / off state of the switching control valve.

[0009] Optionally, the switching control valve includes one or both of a globe valve and a ball valve.

[0010] Optionally, the connection mode between the switching control valve and the ventilation pipeline includes one or both of threaded connection and flange connection.

[0011] Optionally, the material of the ventilation pipeline includes stainless steel and polytetrafluoroethylene pipe.

[0012] Optionally, the pneumatic driving device further includes a stepping motor for precisely controlling the opening angle of the pendulum valve.

[0013] Optionally, the adjustment range of the opening angle of the pendulum valve is between 0° and 90°.

[0014] Optionally, the etching system further includes: a dry pump, which is communicated with the turbo molecular pump and is adapted to discharge the gas molecules extracted by the turbo molecular pump.

[0015] Optionally, the etching system further includes: a roughing pump valve, which is arranged between the process chamber and the dry pump.

[0016] Optionally, the etching system further includes: a gas source device, which is adapted to output clean and dry gas to the ventilation pipeline.

[0017] Correspondingly, an embodiment of the present invention further provides a maintenance method for an etching system, including: providing the etching system provided by the present invention; closing the switching control valve; after closing the switching control valve, disassembling and maintaining the pendulum valve.

[0018] Optionally, the switching control valve is closed manually or electrically.

[0019] Correspondingly, an embodiment of the present invention further provides an operation method for an etching system, including: providing the etching system provided by the present invention; synchronously starting the turbo molecular pump, the pneumatic driving device and the pendulum valve, the turbo molecular pump extracts the gas molecules in the process chamber to reduce the pressure of the process chamber, and the pneumatic driving device controls the opening angle of the pendulum valve through a pneumatic valve so that the turbo molecular pump reduces the pressure of the process chamber to the optimal process value.

[0020] Optionally, the etching system further includes: a dry pump connected to the turbomolecular pump; a roughing pump valve disposed between the process chamber and the dry pump; before synchronously starting the turbomolecular pump, the pneumatic driving device and the pendulum valve, the operation method further includes: starting the dry pump and the roughing pump valve, the roughing pump valve preliminarily evacuating the process chamber, and the dry pump discharging the gas preliminarily evacuated by the roughing pump valve; during the synchronous start of the turbomolecular pump, the pneumatic driving device and the pendulum valve, it further includes: closing the roughing pump valve, and the dry pump keeps running.

[0021] Optionally, the gas molecules in the process chamber extracted by the turbomolecular pump are discharged through the dry pump.

[0022] Compared with the prior art, the technical solution of the embodiment of the present invention has the following advantages:

[0023] The embodiment of the present invention provides an etching system. A pendulum valve is disposed between a process chamber and a turbomolecular pump. The pendulum valve is interconnected with the process chamber and the turbomolecular pump, and the pendulum valve is adapted to control the pressure required by the process chamber. A pneumatic driving device is used to control the opening angle of the pendulum valve. The pneumatic device includes a pneumatic valve, a ventilation pipeline is connected to the pneumatic valve, and a switch control valve is connected to the ventilation pipeline. By providing a switch control valve on the ventilation pipeline, before maintaining and disassembling a certain component of the etching system, by closing the switch control valve, the dry gas in the ventilation pipeline is sealed in the ventilation pipeline. Correspondingly, when maintaining and disassembling a certain component of the etching system, the risk of dry gas leakage from the ventilation pipeline can be reduced, and further, the probability of the entire etching system machine crashing due to dry gas leakage can be reduced, thereby improving the stability of the etching system. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] Figure 1 is a schematic diagram corresponding to an embodiment of the etching system of the present invention;

[0025] Figure 2 shows a flowchart of an embodiment of the maintenance method of the etching system;

[0026] Figure 3 shows a flowchart of an embodiment of the operation method of the etching system. DETAILED DESCRIPTION

[0027] As can be seen from the background art, during the maintenance and disassembly of a certain component of the etching equipment at present, it is easy to cause the leakage of the clean and dry gas in the air pipe connected to the pneumatic valve, resulting in the downtime of the entire etching equipment.

[0028] To solve the technical problems, an embodiment of the present invention provides an etching system, including: a process chamber; a turbomolecular pump adapted to extract gas molecules in the process chamber; a pendulum valve disposed between the process chamber and the turbomolecular pump, the pendulum valve being in communication with the process chamber and the turbomolecular pump, and the pendulum valve being adapted to control the pressure required in the process chamber; a pneumatic driving device for controlling the opening angle of the pendulum valve, the pneumatic device including a pneumatic valve; a ventilation pipeline communicated with the pneumatic valve; and a switch control valve connected to the ventilation pipeline.

[0029] In the etching system provided by the embodiment of the present invention, the pendulum valve is disposed between the process chamber and the turbomolecular pump. The pendulum valve is in communication with the process chamber and the turbomolecular pump, and the pendulum valve is adapted to control the pressure required in the process chamber. The pneumatic driving device is used to control the opening angle of the pendulum valve. The pneumatic device includes a pneumatic valve. The ventilation pipeline is communicated with the pneumatic valve, and the switch control valve is connected to the ventilation pipeline. By providing the switch control valve on the ventilation pipeline, before a certain component of the etching system is maintained and disassembled, by closing the switch control valve, the dry gas in the ventilation pipeline is sealed in the ventilation pipeline. Correspondingly, when a certain component of the etching system is maintained and disassembled, the risk of dry gas leakage from the ventilation pipeline can be reduced, and further, the probability of the entire etching system machine crashing due to dry gas leakage can be reduced, thereby improving the stability of the etching system.

[0030] To make the above objects, features, and advantages of the embodiments of the present invention more obvious and understandable, the following detailed description of the specific embodiments of the present invention will be given with reference to the accompanying drawings.

[0031] Figure 1 It is a schematic diagram corresponding to an embodiment of the etching system of the present invention.

[0032] The etching system includes: a process chamber 100; a turbomolecular pump 101 adapted to extract gas molecules in the process chamber 100; a pendulum valve 102 disposed between the process chamber 100 and the turbomolecular pump 101, the pendulum valve 102 being in communication with the process chamber 100 and the turbomolecular pump 101, and the pendulum valve 102 being adapted to control the pressure required in the process chamber 100; a pneumatic driving device 103 for controlling the opening angle of the pendulum valve 102, the pneumatic device including a pneumatic valve; a ventilation pipeline 120 communicated with the pneumatic valve; and a switch control valve 112 connected to the ventilation pipeline 120.

[0033] Specifically, a switch control valve 112 is provided on the vent pipe 120. Before maintaining and disassembling a certain component of the etching system, by closing the switch control valve 112, the dry gas in the vent pipe 120 is sealed in the vent pipe 120. Correspondingly, when maintaining and disassembling a certain component of the etching system, the risk of dry gas leakage from the vent pipe 120 can be reduced, thereby reducing the probability of the entire etching system machine crashing due to dry gas leakage, and improving the stability of the etching system.

[0034] It should be noted that high vacuum pressure is one of the necessary factors in the etching process. The process chamber 100 is used to accommodate the wafer to be etched, so that the wafer to be etched is in a high vacuum pressure to meet the requirements of the etching process.

[0035] In this embodiment, the turbomolecular pump 101 is adapted to extract gas molecules from the process chamber 100, so that the pressure in the process chamber 100 gradually decreases, thereby generating a high vacuum pressure in the process chamber 100.

[0036] Specifically, the pendulum valve 102 can precisely control the pressure in the process chamber 100. This precise pressure control is crucial for the etching process because different etching processes require different pressure conditions to ensure the accuracy and quality of etching. The pendulum valve 102 is designed with a good sealing structure, which can maintain good sealing performance, help prevent gas leakage, ensure the pressure stability in the process chamber 100, and improve the reliability of the etching process.

[0037] It should be noted that the pendulum valve 102 is interconnected with the process chamber 100 and the turbomolecular pump 101. By controlling the opening angle of the pendulum valve 102, the channel size of gas molecules flowing from the process chamber 100 to the turbomolecular pump 101 can be changed, thereby precisely controlling the pressure in the process chamber 100.

[0038] It should also be noted that by adjusting the opening angle of the pendulum valve 102, the flow resistance of gas molecules can be changed, thereby adjusting the gas flow rate entering the turbomolecular pump 101. The adjustment of the gas flow rate in combination with the pumping speed of the turbomolecular pump 101 can achieve precise control of the pressure in the process chamber 100 and ensure the stable progress of the etching process.

[0039] Specifically, the pneumatic drive device 103 controls the opening angle of the pendulum valve 102 through a pneumatic valve to ensure that the pressure in the process chamber 100 is stable within the required range. For example, in semiconductor manufacturing, different etching processes may require different pressure conditions, and the pneumatic drive device 103 can flexibly adjust the opening angle of the pendulum valve 102 to meet these requirements.

[0040] In this embodiment, the pneumatic valve is connected to the ventilation pipeline 120, converting the gas pressure energy in the ventilation pipeline 120 into mechanical energy, thereby driving the movement of the valve plate of the pendulum valve 102 to adjust the opening angle of the pendulum valve 102.

[0041] As an example, the pneumatic driving device 103 is integrated with an automated control system to achieve remote control and automated operation of the pendulum valve 102, which not only improves production efficiency but also reduces manual intervention and the risk of incorrect operation.

[0042] In this embodiment, the pneumatic driving device 103 further includes a stepper motor for precisely controlling the opening angle of the pendulum valve 102.

[0043] Although the pneumatic valve can already control the opening angle of the pendulum valve 102, the stepper motor can further precisely control the opening angle of the pendulum valve 102 by receiving pulse signals to precisely control the rotation angle of the motor. After the pneumatic valve adjusts the opening angle of the pendulum valve 102 to a predetermined value, the stepper motor then precisely fine-tunes the opening angle of the pendulum valve 102, enabling the high vacuum pressure generated in the process chamber 100 to meet the process requirements.

[0044] In this embodiment, the adjustment range of the opening angle of the pendulum valve 102 is between 0° and 90°.

[0045] Specifically, the adjustment range of the opening angle of the pendulum valve 102 is between 0° and 90°, covering the entire angle adjustment range of the pendulum valve 102, thereby ensuring flexible adjustment of the pressure in the process chamber 100.

[0046] It should be noted that the ventilation pipeline 120 is used to convey clean and dry gas to the pneumatic driving device 103, enabling the pneumatic valve in the pneumatic driving device 103 to convert the gas pressure energy in the ventilation pipeline 120 into mechanical energy, thereby driving the movement of the valve plate of the pendulum valve 102 to adjust the opening angle of the pendulum valve 102.

[0047] As an example, the materials of the ventilation pipeline 120 include stainless steel and polytetrafluoroethylene pipes.

[0048] Specifically, the stainless steel material has good corrosion resistance and mechanical strength, being suitable for conveying a large amount of clean and dry gas. At the same time, the polytetrafluoroethylene material has excellent chemical stability and a low friction coefficient, which can reduce the resistance and adsorption of gas in the pipeline, enabling the pneumatic valve in the pneumatic driving device 103 to obtain continuous and stable gas pressure.

[0049] It should be noted that a switch control valve 112 is provided on the vent pipe 120. Before performing maintenance and disassembly on a certain component of the etching system, by closing the switch control valve 112, the dry gas in the vent pipe 120 is sealed in the vent pipe 120. Correspondingly, when performing maintenance and disassembly on a certain component of the etching system, the risk of dry gas leakage from the vent pipe 120 can be reduced, thereby reducing the probability of the entire etching system machine crashing due to dry gas leakage, and thus improving the stability of the etching system.

[0050] As an example, the switch control valve 112 includes one or both of a manual switch control valve 112 and an electric switch control valve 112.

[0051] Specifically, before performing maintenance and disassembly on a certain component of the etching system, by closing the switch control valve 112, the switch control valve 112 functions to seal the dry and clean gas on the vent pipe 120 in the vent pipe 120. For this purpose, the switch control valve 112 includes a manual switch control valve 112 or an electric switch control valve 112.

[0052] In this embodiment, the switch control valve 112 is a manual switch control valve 112, and a status indicator is further provided on the switch control valve 112 for indicating the on / off state of the switch control valve 112.

[0053] It should be noted that a status indicator is also provided on the switch control valve 112, which is convenient for the operator to quickly identify the on / off state of the switch control valve 112, improving the accuracy and safety of the operation.

[0054] In this embodiment, the switch control valve 112 includes one or both of a globe valve and a ball valve.

[0055] Specifically, both the globe valve and the ball valve can be used as switch valves. The globe valve has high tightness and can effectively prevent gas leakage, ensuring the airtightness of the system. The interior of the ball valve is smooth, with little resistance when gas passes through, which can ensure the stability of gas flow and reduce the loss of gas pressure.

[0056] In this embodiment, the connection mode between the switch control valve 112 and the vent pipe 120 includes one or both of threaded connection and flange connection.

[0057] In this embodiment, the etching system further includes: a dry pump 130, which is connected to the turbomolecular pump 101 and is adapted to discharge the gas molecules pumped out by the turbomolecular pump 101.

[0058] It should be noted that the dry pump 130 is suitable for discharging the gas molecules extracted by the turbo molecular pump 101, so that the pressure in the process chamber 100 can be quickly reduced. And in the etching process, the turbo molecular pump 101 operates continuously to maintain the high vacuum pressure in the process chamber 100. The dry pump 130, as a backing pump, ensures that the turbo molecular pump 101 operates in the best state, avoids failures caused by excessive backing pressure, and improves the stability and reliability of the entire etching system.

[0059] In this embodiment, the etching system further includes: a roughing pump valve 110 disposed between the process chamber 100 and the dry pump 130.

[0060] During the operation of the etching system, the roughing pump valve 110 starts first, and can quickly reduce the pressure in the process chamber 100 to a relatively low level, creating conditions for the start of the turbo molecular pump 101. Then the turbo molecular pump 101 starts, and further reduces the pressure in the process chamber 100 to the required high vacuum state. The turbo molecular pump 101 needs to start and operate under a relatively low initial pressure. The roughing pump valve 110 protects the turbo molecular pump 101 from damage caused by high pressure by reducing the pressure in the process chamber 100 to an appropriate range before the start of the turbo molecular pump 101, and extends its service life.

[0061] In this embodiment, the etching system further includes: a gas source device adapted to output clean and dry gas to the ventilation pipeline 120.

[0062] Specifically, the gas source device is used to output clean and dry gas to the ventilation pipeline 120, so that the clean and dry gas can enter the pneumatic drive device 103 of the etching system.

[0063] Correspondingly, an embodiment of the present invention further provides a maintenance method for an etching system. Among them, Figure 2 The flowchart of an embodiment of the maintenance method of the etching system is shown.

[0064] In the embodiment of the present invention, the maintenance method of the etching system includes the following basic steps:

[0065] Step S1: Provide the etching system provided by the present invention;

[0066] Step S2: Close the switch control valve;

[0067] After closing the switch control valve in Step S3, disassemble and maintain the pendulum valve.

[0068] Specifically, a switch control valve is provided on the vent gas pipeline. Before maintaining and disassembling a certain component of the etching system, by closing the switch control valve, the dry gas in the vent gas pipeline is enclosed in the vent gas pipeline. Correspondingly, when maintaining and disassembling a certain component (such as a pendulum valve) of the etching system, the risk of dry gas leakage from the vent gas pipeline can be reduced, thereby reducing the probability of the entire etching system machine crashing due to dry gas leakage, and improving the stability of the etching system.

[0069] To make the above objects, features, and advantages of the embodiments of the present invention more obvious and understandable, the following Figure 1 will give a detailed description of the specific embodiments of the present invention.

[0070] Perform step S1: Provide the etching system provided by the present invention.

[0071] Specifically, the specific description of the etching system will not be elaborated here. Please refer to the description of the etching system in the foregoing embodiments.

[0072] Perform step S2: Close the switch control valve.

[0073] Specifically, by closing the switch control valve, the dry gas in the vent gas pipeline is enclosed in the vent gas pipeline. Correspondingly, when maintaining and disassembling a certain component (such as a pendulum valve) of the etching system, the risk of dry gas leakage from the vent gas pipeline can be reduced, thereby reducing the probability of the entire etching system machine crashing due to dry gas leakage, and improving the stability of the etching system.

[0074] As an example, the switch control valve is closed manually or electrically.

[0075] Perform step S3: After closing the switch control valve, disassemble and maintain the pendulum valve.

[0076] In the etching system, the pendulum valve is a key component for controlling the pressure of the process chamber. The sealing performance of the pendulum valve is crucial for maintaining the pressure stability of the process chamber. After long-term use, the seal of the pendulum valve may age, wear, or be damaged, resulting in a decline in the sealing performance and problems such as leakage. By disassembling and maintaining the pendulum valve, the aged seal can be inspected and replaced to ensure good sealing performance of the pendulum valve.

[0077] Correspondingly, the embodiments of the present invention also provide an operating method for an etching system. Among them, Figure 3 shows a flowchart of an embodiment of the operating method of the etching system.

[0078] In the embodiments of the present invention, the operating method of the etching system includes the following basic steps:

[0079] Step S1: providing the etching system provided by the present invention;

[0080] Step S2: Synchronously start the turbomolecular pump, the pneumatic drive device and the pendulum valve, wherein the turbomolecular pump extracts gas molecules in the process chamber to reduce the pressure of the process chamber, and the pneumatic drive device controls the opening angle of the pendulum valve through the pneumatic valve, so that the turbomolecular pump reduces the pressure of the process chamber to the optimal value for the process.

[0081] Specifically, by starting the turbomolecular pump, the pneumatic drive device and the pendulum valve, the pressure of the process chamber can be brought to a high vacuum state, thereby improving the reliability and stability of the etching process.

[0082] In order to make the above-mentioned objects, features and advantages of the embodiments of the present invention more obvious and easy to understand, the following Figure 1 The specific embodiments of the present invention are described in detail.

[0083] Execute step S1: provide the etching system provided by the present invention.

[0084] Specifically, the detailed description of the etching system will not be repeated here, and please refer to the description of the etching system in the aforementioned embodiment.

[0085] In this embodiment, the etching system further includes: a dry pump connected to the turbomolecular pump; and a roughing pump valve disposed between the process chamber and the dry pump.

[0086] It should be noted that the dry pump is suitable for discharging the gas molecules extracted by the turbomolecular pump, thereby quickly reducing the pressure in the process chamber. During the etching process, the turbomolecular pump continues to operate to maintain a high vacuum pressure in the process chamber. The dry pump serves as a fore-stage pump to ensure that the turbomolecular pump operates in the best condition, avoids failures caused by excessive fore-stage pressure, and improves the stability and reliability of the entire etching system.

[0087] During the operation of the etching system, the roughing pump valve is started first, which can quickly reduce the pressure in the process chamber to a lower level, creating conditions for the start-up of the turbomolecular pump. The turbomolecular pump is then started to further reduce the pressure in the process chamber to the required high vacuum state. The turbomolecular pump needs to be at a lower initial pressure to start and operate normally. The roughing pump valve protects the turbomolecular pump from damage by high pressure by reducing the pressure in the process chamber to an appropriate range before the turbomolecular pump is started, thereby extending its service life.

[0088] Perform step S11: Before subsequently synchronously starting the turbomolecular pump, the pneumatic drive device, and the pendulum valve, the operation method further includes: starting the dry pump and the roughing pump valve, the roughing pump valve preliminarily evacuates the process chamber, and the dry pump discharges the gas preliminarily evacuated by the roughing pump valve.

[0089] Specifically, starting the roughing pump valve first can quickly reduce the pressure in the process chamber to a relatively low level, creating conditions for the start of the turbomolecular pump. Subsequently, the turbomolecular pump is started to further reduce the pressure in the process chamber to the required high-vacuum state. The turbomolecular pump needs to start and operate under a relatively low initial pressure. The roughing pump valve protects the turbomolecular pump from damage caused by high pressure and extends its service life by reducing the pressure in the process chamber to an appropriate range before the turbomolecular pump starts.

[0090] Perform step S2: Synchronously start the turbomolecular pump, the pneumatic drive device, and the pendulum valve. The turbomolecular pump extracts gas molecules in the process chamber to reduce the pressure in the process chamber. The pneumatic drive device controls the opening angle of the pendulum valve through a pneumatic valve so that the turbomolecular pump reduces the pressure in the process chamber to the optimal process value.

[0091] Specifically, by starting the turbomolecular pump, the pneumatic drive device, and the pendulum valve, and the pneumatic drive device controls the opening angle of the pendulum valve through a pneumatic valve, the pressure in the process chamber can reach the high-vacuum state, thereby improving the reliability and stability of the etching process.

[0092] In this embodiment, during the process of synchronously starting the turbomolecular pump, the pneumatic drive device, and the pendulum valve, it further includes: closing the roughing pump valve, and the dry pump keeps running.

[0093] Specifically, keeping the dry pump running enables the dry pump to discharge the gas molecules in the process chamber extracted by the turbomolecular pump.

[0094] As an example, the gas molecules in the process chamber extracted by the turbomolecular pump are discharged through the dry pump.

[0095] Although the present invention is disclosed as above, the present invention is not limited thereto. Any person skilled in the art can make various changes and modifications without departing from the spirit and scope of the present invention. Therefore, the protection scope of the present invention should be subject to the scope defined by the claims.

Claims

1. An etching system, characterized in that, Comprising: A process chamber; A turbomolecular pump adapted to extract gas molecules from the process chamber; A pendulum valve disposed between the process chamber and the turbomolecular pump, the pendulum valve being in communication with the process chamber and the turbomolecular pump, and the pendulum valve being adapted to control the pressure required in the process chamber; A pneumatic driving device for controlling the opening angle of the pendulum valve, the pneumatic device including a pneumatic valve; A ventilation pipeline in communication with the pneumatic valve; A switch control valve connected to the ventilation pipeline.

2. The etching system according to claim 1, wherein The switch control valve includes one or both of a manual switch control valve and an electric switch control valve.

3. The etching system according to claim 2, wherein The switch control valve is a manual switch control valve, and a status indicator is further provided on the switch control valve for indicating the on / off state of the switch control valve.

4. The etching system according to claim 1, wherein The switch control valve includes one or both of a globe valve and a ball valve.

5. The etching system according to claim 1, wherein The connection mode of the switch control valve to the ventilation pipeline includes one or both of threaded connection and flange connection.

6. The etching system according to claim 1, wherein: The material of the ventilation pipeline includes stainless steel and polytetrafluoroethylene pipes.

7. The etching system according to claim 1, wherein The pneumatic driving device further includes a stepping motor for precisely controlling the opening angle of the pendulum valve.

8. The etching system according to claim 1, wherein, The adjustment range of the opening angle of the pendulum valve is between 0° and 90°.

9. The etching system according to claim 1, wherein The etching system further includes: a dry pump in communication with the turbomolecular pump and adapted to discharge the gas molecules extracted by the turbomolecular pump.

10. The etching system according to claim 9, wherein The etching system further includes: a roughing pump valve disposed between the process chamber and the dry pump.

11. The etching system according to claim 1, wherein: The etching system further includes: a gas source device adapted to output clean and dry gas to the ventilation pipeline.

12. A maintenance method for an etching system, characterized in that, Comprising: Providing the etching system according to any one of claims 1 to 11; Closing the switch control valve; After closing the switch control valve, disassembling and maintaining the pendulum valve.

13. The maintenance method of the etching system according to claim 12, wherein: Closing the switch control valve manually or electrically.

14. A method for operating an etching system, characterized in that, Comprising: Providing the etching system according to any one of claims 1 to 11; Synchronously starting the turbomolecular pump, the pneumatic driving device and the pendulum valve, the turbomolecular pump extracting the gas molecules in the process chamber to reduce the pressure in the process chamber, and the pneumatic driving device controlling the opening angle of the pendulum valve through the pneumatic valve so that the turbomolecular pump reduces the pressure in the process chamber to the process optimum value.

15. The operating method of the etching system according to claim 14, characterized in that: The etching system further includes: A dry pump in communication with the turbomolecular pump; A roughing pump valve disposed between the process chamber and the dry pump; Before synchronously starting the turbomolecular pump, the pneumatic driving device and the pendulum valve, the operation method further includes: starting the dry pump and the roughing pump valve, the roughing pump valve preliminarily extracting gas from the process chamber, and the dry pump discharging the gas preliminarily extracted by the roughing pump valve; During the synchronous start of the turbomolecular pump, the pneumatic driving device and the pendulum valve, it further includes: closing the roughing pump valve, and the dry pump keeps running.

16. The operating method of the etching system according to claim 14, characterized in that, The gas molecules in the process chamber extracted by the turbomolecular pump are discharged through the dry pump.

Images