Airlock

Abstract

The airlock comprises an airlock barrier part, a gas buffer cavity, a gas inlet pipeline and a gas outlet pipeline, the airlock barrier part comprises a gas outlet channel, and the gas outlet channel comprises a first gas outlet and a second gas outlet which are oppositely arranged; the gas buffer cavity comprises a first static pressure cavity, a high-resistance cavity and a second static pressure cavity, the first static pressure cavity is provided with a first channel extending along at least part of the circumferential direction of the airlock barrier part, and the second static pressure cavity is provided with a second channel extending along at least part of the circumferential direction of the airlock barrier part; the high-resistance cavity is communicated between the first static pressure cavity and the second static pressure cavity, and the gas capacity of the high-resistance cavity is smaller than that of any one of the first static pressure cavity and the second static pressure cavity; the air inlet pipeline is communicated with the first static pressure cavity; the air outlet pipeline communicates between the second static pressure cavity and the air outlet channel and is arranged around at least part of the air lock barrier part in the circumferential direction. The performance of the airlock is improved, and the airlock is simple in structure.

Description

Technical Field

[0001] The present application belongs to the field of photolithography technology, and in particular relates to an air lock. Background Art

[0002] An air lock can be used to isolate two adjacent spaces, preventing gases in the two spaces from crosstalking. It also allows light to propagate through its outlet. However, conventional air locks struggle to achieve both uniform flow and structural simplicity. Summary of the Invention

[0003] The purpose of this application is to at least solve the problem of the inability to balance the uniformity of the flow field within the airlock with the simplicity of the airlock structure. This purpose is achieved through the following technical solutions:

[0004] A first aspect of the present application provides an air lock comprising:

[0005] An air lock barrier portion, the air lock barrier portion comprising an air outlet channel, the air outlet channel comprising a first air outlet and a second air outlet arranged opposite to each other;

[0006] a gas buffer chamber comprising a first static pressure chamber, a high-resistance chamber, and a second static pressure chamber, wherein the first static pressure chamber has a first channel extending at least partially along the circumference of the gas lock barrier portion, and the second static pressure chamber has a second channel extending at least partially along the circumference of the gas lock barrier portion, the high-resistance chamber communicating between the first and second static pressure chambers, and the gas capacity of the high-resistance chamber being smaller than the gas capacity of either the first or second static pressure chambers;

[0007] an air inlet pipeline, connected to the first static pressure chamber, for allowing gas to enter the first static pressure chamber;

[0008] An air outlet pipeline is connected between the second static pressure chamber and the air outlet channel, and is arranged around at least a portion of the circumference of the air lock barrier portion.

[0009] The air lock provided in the present application includes an air lock barrier portion, a gas buffer chamber, an air inlet pipe and an air outlet pipe. The air lock barrier portion includes an air outlet channel. The air outlet channel includes a first air outlet and a second air outlet that are relatively arranged. The first air outlet and the second air outlet are respectively used to supply gas to the outside of the air outlet channel. The gas buffer chamber is used to provide a uniform flow field for the air lock barrier portion. The gas buffer chamber includes a first static pressure chamber, a high-resistance chamber and a second static pressure chamber. The first static pressure chamber, the high-resistance chamber and the second static pressure chamber work together to form a uniform flow field. Specifically, the first static pressure chamber has a first channel that extends at least partially along the circumference of the air lock barrier portion. The gas enters the first static pressure chamber through the air inlet pipe and is dispersed along the extension direction of the first static pressure chamber to form a relatively uniform primary flow field around the air lock barrier portion. The gas in the first static pressure chamber then continues to diffuse into the high-resistance chamber. The gas volume of the high-resistance chamber is smaller than that of the first static pressure chamber, resulting in a greater flow resistance in the high-resistance chamber. This allows for uniformity of air pressure and airflow as the gas enters the high-resistance chamber from the first static pressure chamber. The gas then continues from the high-resistance chamber into the second static pressure chamber. The gas volume of the second static pressure chamber is greater than that of the high-resistance chamber. The second static pressure chamber has a second channel extending at least partially along the circumference of the outlet channel. Gas enters the second static pressure chamber through the high-resistance chamber and disperses along the extension of the second static pressure chamber, forming a relatively uniform secondary flow field around the airlock barrier. The uniformity of the secondary flow field is greater than that of the primary flow field. The airflow in the secondary flow field enters the outlet channel through an outlet conduit, which is positioned around at least a portion of the circumference of the airlock barrier to ensure uniformity of the gas after entering the airlock barrier. In the air lock, the gas pressure and airflow are homogenized through the gas buffer chamber, thereby improving the gas outlet uniformity of the air lock barrier part and improving the performance of the air lock. The air lock has a simple, compact structure and a small size. BRIEF DESCRIPTION OF THE DRAWINGS

[0010] Various other advantages and benefits will become apparent to those skilled in the art upon reading the detailed description of the preferred embodiment below. The accompanying drawings are for illustration purposes only and are not to be considered as limiting the present application. The same reference numerals are used throughout the drawings to represent the same components. In the drawings:

[0011] Figure 1 This is a schematic structural diagram of the first air lock provided in an embodiment of the present application;

[0012] Figure 2 is a partial cross-sectional view of the first air lock provided in an embodiment of the present application;

[0013] Figure 3 This is a schematic diagram of the second air lock structure provided in an embodiment of the present application;

[0014] Figure 4is a partial cross-sectional view of a second type of air lock provided in an embodiment of the present application;

[0015] Figure 5 is a partial cross-sectional view of a third type of air lock provided in an embodiment of the present application;

[0016] Figure 6 is a partial cross-sectional view of a fourth high-resistance chamber in an airlock provided in an embodiment of the present application;

[0017] Figure 7 yes Figure 2 Magnified view of the middle P region.

[0018] The reference numerals are as follows:

[0019] 1. Air lock; 11. Air lock barrier; 111. Air outlet channel; 1111. First air outlet; 1112. Second air outlet; 12. Gas buffer chamber; 121. First static pressure chamber; 1211. First channel; 122. High-resistance chamber; 1221. First gap; 1222. First plane; 1223. Second plane; 1224. Second gap; 1225. First bending surface; 1226. Second bending surface; 1227. Through hole; 123. Second static pressure chamber; 1231. Second channel; 13. Air inlet pipe; 14. Air outlet pipe; x, first direction; y, second direction. DETAILED DESCRIPTION

[0020] Exemplary embodiments of the present disclosure will be described in more detail below with reference to the accompanying drawings. Although exemplary embodiments of the present disclosure are shown in the accompanying drawings, it should be understood that the present disclosure can be implemented in various forms and should not be limited by the embodiments described herein. Rather, these embodiments are provided to enable a more thorough understanding of the present disclosure and to fully convey the scope of the present disclosure to those skilled in the art.

[0021] It should be understood that the terms used herein are for the purpose of describing specific example embodiments only and are not intended to be limiting. Unless the context clearly indicates otherwise, the singular forms "one", "an" and "said" as used herein may also be meant to include plural forms. The terms "comprise", "include", "contain" and "have" are inclusive and therefore specify the presence of stated features, steps, operations, elements and / or parts, but do not exclude the presence or addition of one or more other features, steps, operations, elements, parts, and / or combinations thereof. The method steps, processes, and operations described herein are not to be construed as necessarily requiring them to be performed in the specific order described or illustrated, unless the order of execution is clearly indicated. It should also be understood that additional or alternative steps may be used.

[0022] Although the terms first, second, third, etc. can be used in the text to describe multiple elements, components, regions, layers and / or sections, these elements, components, regions, layers and / or sections should not be limited by these terms. These terms can only be used to distinguish an element, component, region, layer or section from another region, layer or section. Unless the context clearly indicates otherwise, terms such as "first", "second" and other numerical terms do not imply order or sequence when used in the text. Therefore, the first element, component, region, layer or section discussed below can be referred to as the second element, component, region, layer or section without departing from the teaching of the example embodiments.

[0023] For ease of description, spatially relative terms may be used herein to describe the relationship of one element or feature relative to another element or feature as shown in the figures, such as "inside," "outside," "inside," "outside," "below," "beneath," "above," and the like. Such spatially relative terms are intended to include different orientations of the device in use or operation in addition to the orientation depicted in the figures. For example, if the device in the figures is flipped, an element described as "below" or "below" another element or feature would then be oriented as "above" or "above" another element or feature. Thus, the example term "below" can include both above and below orientations. The device may be otherwise oriented (rotated 90 degrees or in other orientations) and the spatially relative descriptors used herein are interpreted accordingly.

[0024] An airlock can be used to isolate two adjacent spaces, preventing crosstalk between the gases in the two spaces. At the same time, the airlock allows light to propagate through the air outlet. For example, in photolithography, extreme ultraviolet (EUV) lithography is a lithography technology for nodes 7nm and below. It uses 13.5nm wavelength EUV light. Because air and many other refractive optical materials strongly absorb 13.5nm wavelength EUV radiation, the interior of the EUV lithography machine needs to be set to a near-vacuum environment (with minimal gas). Due to the transmission requirements of the EUV beam, the vacuum chambers of the EUV lithography machine are interconnected. Typically, an airlock is set between the vacuum chambers. By supplying clean airflow from the airlock to the two adjacent vacuum chambers, the two vacuum environments with different requirements can be isolated.

[0025] Research has found that to ensure the performance of an airlock, its internal flow field must be as uniform as possible, minimizing turbulence to prevent gas from one vacuum chamber from passing through the turbulent flow and entering another chamber. Airlocks in related art struggle to achieve both flow field uniformity and structural simplicity. Therefore, the present application provides an airlock with a simple structure and excellent flow field uniformity.

[0026] like Figure 1 and Figure 2 As shown, the present application provides an airlock 1, which includes an airlock barrier portion 11, a gas buffer chamber 12, an air inlet pipeline 13, and an air outlet pipeline 14. The airlock barrier portion 11 includes an air outlet channel 111, which includes a first air outlet 1111 and a second air outlet 1112 arranged opposite each other. The gas buffer chamber 12 includes a first static pressure chamber 121, a high-resistance chamber 122, and a second static pressure chamber 123. The first static pressure chamber 121 has a first channel 1211 extending at least partially along the circumference of the airlock barrier portion 11. The second static pressure chamber 123 has a second channel 1231 extending at least partially along the circumference of the airlock barrier portion 11. The high-resistance chamber 122 communicates between the first static pressure chamber 121 and the second static pressure chamber 123. The gas capacity of the high-resistance chamber 122 is smaller than the gas capacity of either the first static pressure chamber 121 or the second static pressure chamber 123. The air inlet pipe 13 is connected to the first static pressure chamber 121 for allowing gas to enter the first static pressure chamber 121. The air outlet pipe 14 is connected between the second static pressure chamber 123 and the air outlet channel 111 and is arranged around at least a portion of the circumference of the air lock barrier portion 11.

[0027] The airlock 1 provided in the present application includes an airlock barrier portion 11, a gas buffer chamber 12, an air inlet pipeline 13, and an air outlet pipeline 14. The airlock barrier portion 11 includes an air outlet channel 111, which includes a first air outlet 1111 and a second air outlet 1112 arranged opposite each other. The first air outlet 1111 and the second air outlet 1112 are respectively used to supply gas to the outside of the air outlet channel 111. The gas buffer chamber 12 is used to provide a uniform flow field for the airlock barrier portion 11. The gas buffer chamber 12 includes a first static pressure chamber 121, a high-resistance chamber 122, and a second static pressure chamber 123. The first static pressure chamber 121, the high-resistance chamber 122, and the second static pressure chamber 123 work together to form a uniform flow field. Specifically, the first static pressure chamber 121 has a first channel 1211 extending at least partially along the circumference of the airlock barrier portion 11. Gas enters the first static pressure chamber 121 through the air inlet line 13 and disperses along the extension direction of the first static pressure chamber 121, thereby forming a relatively uniform primary flow field around the airlock barrier portion 11. The gas in the first static pressure chamber 121 then continues to diffuse into the high-resistance chamber 122. The gas volume of the high-resistance chamber 122 is smaller than that of the first static pressure chamber 121, resulting in a greater flow resistance in the high-resistance chamber 122. This allows for uniform pressure and airflow when the gas enters the high-resistance chamber 122 from the first static pressure chamber 121. The gas then continues from high-resistance chamber 122 into second static pressure chamber 123. The gas capacity of second static pressure chamber 123 is greater than that of high-resistance chamber 122. Second static pressure chamber 123 has a second channel 1231 extending along at least a portion of the circumference of outlet channel 111. Gas enters second static pressure chamber 123 through high-resistance chamber 122 and is dispersed along the extension direction of second static pressure chamber 123, forming a relatively uniform secondary flow field around airlock barrier portion 11. The uniformity of the secondary flow field is greater than that of the primary flow field. The airflow within the secondary flow field enters outlet channel 111 through outlet conduit 14, which is disposed around at least a portion of the circumference of airlock barrier portion 11 to ensure uniformity of the gas after entering airlock barrier portion 11. In the air lock 1, the gas pressure and air flow are homogenized through the gas buffer chamber 12, thereby improving the gas outlet uniformity of the air lock barrier part 11 and improving the performance of the air lock 1. The air lock 1 has a simple, compact structure and a small size.

[0028] The air lock provided in the present application has a simple structure, thereby reducing the risk of gas leakage during the flow process.

[0029] In the above embodiment, the circumference of the air-locked barrier portion 11 is the circumference of the air outlet channel 111 , and the circumference of the air-locked barrier portion 11 surrounds the arrangement direction of the first air outlet 1111 and the second air outlet 1112 .

[0030] In the above embodiment, the first gas outlet 1111 and the second gas outlet 1112 are respectively located in different chambers, so that gas can be supplied to different chambers respectively, that is, gas is blown out from the gas outlet channel 111 to two different chambers respectively, thereby isolating the gas atmosphere of the two chambers.

[0031] In one possible implementation, Figure 1 and Figure 3 As shown, the air lock barrier portion 11 is circular or rectangular along the circumference around the arrangement direction of the first air outlet 1111 and the second air outlet 1112 .

[0032] In the above embodiment, the shape of the airlock barrier portion 11 along the circumference around the first and second air outlets 1111, 1112 is configured as a regular shape, such as a circle or rectangle. This not only helps to improve the regularity of the shape of the gas buffer chamber 12, thereby providing a uniform airflow within the airlock barrier portion 11, but also facilitates manufacturing, helps reduce the volume, and improves the compactness of the structure. In one feasible embodiment, within the gas buffer chamber 12, the capacity of the first static pressure chamber 121 is greater than the capacity of the second static pressure chamber 123.

[0033] In one possible implementation, Figures 1 to 4 As shown, at least a portion of the first channel 1211 is arranged in parallel with at least a portion of the second channel 1231.

[0034] In the above embodiment, at least a portion of the first channel 1211 and at least a portion of the second channel 1231 are arranged parallel to each other, thereby reducing the distance difference of the gas flowing from the first channel 1211 to the second channel 1231, thereby improving the uniformity of the gas in the first channel 1211 to the second channel 1231 during transmission, thereby improving the uniformity of the air pressure and airflow of the gas entering the airlock barrier part 11, improving the isolation effect of the airlock 1, and reducing the probability of turbulence generation.

[0035] In one possible implementation, Figure 1 and Figure 2 As shown, the circumference of the air lock barrier portion 11 is circular, and the first static pressure chamber 121, the high resistance chamber 122 and the second static pressure chamber 123 are all arranged around the circumference of the air outlet channel.

[0036] In the above embodiment, the first static pressure chamber 121, the high-resistance chamber 122 and the second static pressure chamber 123 are all arranged circumferentially around the air outlet channel. On the one hand, the uniformity of the circumferential distribution of the first static pressure chamber 121, the high-resistance chamber 122 and the second static pressure chamber 123 along the air outlet channel can be improved, thereby helping to improve the uniformity of the air supply to the air outlet channel 111; on the other hand, the gas capacity of the first static pressure chamber 121, the high-resistance chamber 122 and the second static pressure chamber 123 can be increased, thereby increasing the air supply to the air outlet channel 111, which helps to further improve the isolation effect of the air lock 1.

[0037] In one possible implementation, Figure 1 and Figure 2 As shown, the first static pressure chamber 121 , the high-resistance chamber 122 and the second static pressure chamber 123 are all annular structures surrounding the circumference of the air outlet channel 111 .

[0038] In the above embodiment, when the circumference of the airlock barrier portion 11 is circular, the first channel 1211 and the second channel 1231 may both extend in the circumferential direction. Specifically, the first channel 1211 and the second channel 1231 may both extend around the circumference of the airlock barrier portion 11, thereby increasing the extension length of the first channel 1211 and the second channel 1231 and thereby increasing the gas capacity of the first channel 1211 and the second channel 1231. With the increased gas capacity of the first channel 1211 and the second channel 1231, the gas supply volume of the gas buffer chamber 12 to the airlock barrier portion 11 is increased, and the gas output volume of the airlock barrier portion 11 is increased, thereby further improving the isolation effect of the airlock barrier portion 11. At the same time, the first static pressure chamber 121, the high-resistance chamber 122 and the second static pressure chamber 123 are all circular ring structures surrounding the air outlet channel 111, so that the distance between each chamber in the first static pressure chamber 121, the high-resistance chamber 122 and the second static pressure chamber 123 and the air outlet channel 111 is the same, which can further improve the uniformity of the airflow.

[0039] Alternatively, when the circumference of the airlock barrier portion 11 is circular, the first channel 1211 and the second channel 1231 may both extend in the circumferential direction, and the first channel 1211 and / or the second channel 1231 may include multiple sub-sections (not shown in the figure), with the multiple sub-sections evenly distributed around the circumference. Specifically, the first channel 1211 may extend one full circumference, and the second channel 1231 may extend less than half of the circumference. For example, the second channel 1231 may include two spaced-apart sub-sections, the two sub-sections being of the same shape and size and symmetrically arranged about the center of the airlock barrier portion 11, to improve the uniformity of the gas supply from the gas buffer chamber 12 to the airlock barrier portion 11.

[0040] In another feasible embodiment, when the circumference of the airlock barrier portion 11 is circular, the first static pressure chamber 121, the high-resistance chamber 122, and the second static pressure chamber 123 may all be polygonal ring structures surrounding the circumference of the air outlet channel 111. For example, they may be quadrilaterals, hexagons, etc.

[0041] In one possible implementation, Figure 3 and Figure 4 As shown, the circumference of the air lock barrier portion 11 is a rectangle, the rectangle includes two opposite long sides and two opposite short sides, at least one of the first static pressure chamber 121, the high resistance chamber 122, and the second static pressure chamber 123 is arranged on the long side of the rectangle and extends along the direction of the long side, or;

[0042] At least one of the first static pressure chamber 121, the high-resistance chamber 122, and the second static pressure chamber 123 extends from one of the long sides around one of the short sides to the other long side. The first static pressure chamber 121 is one or two interconnected ones. The two first static pressure chambers 121 form a ring around the air lock barrier part 11.

[0043] In one possible implementation, Figure 3 and Figure 4 As shown, the airlock barrier portion 11 has a circumferential rectangular shape, comprising two opposing long sides and two opposing short sides. The high-resistance chamber 122 and the second static pressure chamber 123 are respectively disposed on the long sides of the rectangle and both extend along the long sides. The first static pressure chamber 121 extends from one long side, around one short side, to the other long side. There is one first static pressure chamber 121 or two interconnected first static pressure chambers 121, which together form a ring surrounding the airlock barrier portion 11. This embodiment can save space to a certain extent, and the high-resistance chamber 122 and the second static pressure chamber 123 are respectively disposed on the long sides of the rectangle, which can better utilize the space on the long sides and increase the gas supply.

[0044] In the above embodiment, the number of the high-resistance chamber 122 and the number of the second static pressure chamber 123 are two respectively. The sizes of the two high-resistance chambers 122 and the sizes of the two second static pressure chambers 123 may be different.

[0045] In a feasible embodiment, the circumference of the airlock barrier portion 11 is a rectangle, and the first static pressure chamber 121, the high-resistance chamber 122, and the second static pressure chamber 123 can respectively extend along part of the side edges of the rectangle, that is, the number of the first static pressure chamber 121 can be one, and it extends from one of the long sides around a short side to the other long side. The number of the high-resistance chamber 122 is one, and it extends from one of the long sides around a short side to the other long side. The number of the high-resistance chamber 122 is one, and it extends from one of the long sides around a short side to the other long side. Specifically, the second static pressure chamber 123, the high-resistance chamber 122, and the first static pressure chamber 121 can be nested in sequence in a direction away from the airlock barrier portion 11.

[0046] This embodiment can simplify the structure of the airlock 1 and make the volume of the airlock 1 smaller.

[0047] In one feasible embodiment, the circumference of the airlock barrier portion 11 is rectangular, and the first static pressure chamber 121, the high-resistance chamber 122, and the second static pressure chamber 123 can all extend along the sides of the rectangle. The first static pressure chamber 121, the high-resistance chamber 122, and the second static pressure chamber 123 can extend along the circumference of the airlock barrier portion 11. That is, the first static pressure chamber 121, the high-resistance chamber 122, and the second static pressure chamber 123 can each be an annular structure extending along the sides of the rectangle. Specifically, the second static pressure chamber 123, the high-resistance chamber 122, and the first static pressure chamber 121 can be nested in sequence in a direction away from the airlock barrier portion 11.

[0048] This embodiment can increase the gas capacity of the first channel 1211 and the second channel 1231. After the gas capacity of the first channel 1211 and the second channel 1231 is increased, the gas supply volume of the gas buffer chamber 12 to the air lock barrier portion 11 is increased, and the gas output volume of the air lock barrier portion 11 is increased, thereby further improving the isolation effect of the air lock barrier portion 11.

[0049] In one possible implementation, Figure 1 As shown, the air lock barrier portion 11 includes two frustums arranged opposite to each other, or as shown in FIG. Figure 3 As shown, the air lock barrier portion 11 is in the shape of a rectangular platform.

[0050] In the above embodiment, when the air lock barrier portion 11 is in the shape of a rectangular platform, the structure is simple and the preparation is convenient.

[0051] In the airlock 1 , the high-resistance chamber 122 must have a large flow resistance to achieve uniform air pressure and airflow.

[0052] In one possible implementation, Figure 4As shown, the high-resistance chamber 122 includes a first gap 1221 . The first gap 1221 is located between a first plane 1222 and a second plane 1223 that are parallel to each other. The first gap 1221 is connected to the first channel 1211 and the second channel 1231 .

[0053] In the above embodiment, the first gap 1221 is connected to the first channel 1211 and the second channel 1231. The first gap 1221 has a large flow resistance. The gas in the first channel 1211 can achieve uniform air pressure and airflow after passing through the first gap 1221 and then enters the second channel 1231.

[0054] The high-resistance chamber 122 adopts the design of the first gap 1221 so that the high-resistance chamber 122 may only include two parallel flat sidewalls, which helps to simplify the structure of the airlock 1 and simplify the manufacturing process.

[0055] In another possible embodiment, Figure 5 As shown, the high-resistance chamber 122 includes a second gap 1224 , which is located between the first bending surface 1225 and the second bending surface 1226 . The first bending surface 1225 is parallel to the second bending surface 1226 , and the second gap 1224 is connected to the first channel 1211 and the second channel 1231 .

[0056] In the above embodiment, the second gap 1224 is connected to the first channel 1211 and the second channel 1231. The second gap 1224 has a large flow resistance. The gas in the first channel 1211 can achieve uniform air pressure and airflow after passing through the second gap 1224 and then enter the second channel 1231.

[0057] The high-resistance chamber 122 is designed with the second slit 1224 to allow the airflow to flow in a curved direction during the flow, thereby helping to increase the flow distance of the airflow and thus homogenize the airflow.

[0058] In another possible embodiment, Figure 6 As shown, Figure 6 1 is a schematic cross-sectional view of the high-resistance chamber 122 perpendicular to the extending direction of at least part of the through holes 1227 . The high-resistance chamber 122 includes a plurality of through holes 1227 extending from the first static pressure chamber 121 to the second static pressure chamber 123 .

[0059] In the above embodiment, the high-resistance chamber 122 includes a plurality of through holes 1227, each of which is connected to the first channel 1211 and the second channel 1231. The gas in the first channel 1211 is dispersed into each through hole 1227. In the process of entering the through hole 1227, the through hole 1227 can provide flow resistance for the gas, thereby homogenizing the gas, and then enter the second channel 1231.

[0060] In the above embodiment, the plurality of through holes 1227 are dispersedly disposed and evenly arranged, which helps to further enhance the homogenization effect.

[0061] Specifically, when the circumference of the airlock barrier portion 11 is rectangular, the first channel 1211 and the second channel 1231 may both extend along the sides of the rectangle. The first channel 1211 may extend around the circumference of the airlock barrier portion 11, that is, the first channel 1211 may be a square ring structure extending along the side of the rectangle. The second channel 1231 may include two spaced-apart sections, each extending along the long side of the rectangle, with the two sections located on either side of the airlock barrier portion 11. In this case, the number of high-resistance chambers 122 may be two, with one high-resistance chamber 122 located between one section and the first channel 1211, and the other high-resistance chamber 122 located between the other section and the first channel 1211. The two high-resistance chambers 122 may each include a first slit 1221, and the positions of the two high-resistance chambers 122 along the arrangement direction of the first air outlet 1111 and the second air outlet 1112 may be different. Alternatively, the two high-resistance chambers 122 may each include a second slit 1224, and the first bending surface 1225 in the two high-resistance structures may have different bending times. Alternatively, the two high-resistance chambers 122 may each include a plurality of through holes 1227, and the diameter and number of the through holes 1227 in the two high-resistance chambers 122 may be different.

[0062] In one possible implementation, Figure 1 and Figure 3 As shown, the number of the air intake pipes 13 may be one or more. When there are more than one air intake pipes 13 , the multiple air intake pipes 13 are evenly and symmetrically distributed along the extension direction of the first channel 1211 .

[0063] The air inlet line 13 is used to provide clean working gas to the gas buffer chamber 12. The working gas can be hydrogen, argon or nitrogen. Before entering the air inlet line 13, the gas needs to undergo gas pretreatment, which includes gas purification, particle filtration, flow control and temperature control.

[0064] In the above embodiment, when there are multiple air intake pipes 13, the multiple air intake pipes 13 are evenly and symmetrically distributed along the extension direction of the first channel 1211, thereby improving the uniformity of gas intake and the uniformity of gas supply to the air lock barrier portion 11, thereby further improving the performance of the air lock 1. Among them, even distribution means that the spacing between adjacent air intake pipes 13 is the same, and symmetrical distribution means symmetrical distribution along the symmetry axis of the air lock barrier portion 11. In a feasible embodiment, as Figure 3 and Figure 4 As shown, the air outlet pipe 14 is an annular structure extending circumferentially around the air outlet channel 111, or as shown in FIG. Figure 1 and Figure 2As shown, there are multiple air outlet pipes 14 , and the multiple air outlet pipes 14 are symmetrically distributed along the circumference of the air outlet channel 111 .

[0065] In the above embodiment, when the air outlet pipe 14 is a ring structure arranged circumferentially around the air outlet channel 111, the air outlet range can be expanded and the air outlet volume can be increased.

[0066] In the above embodiment, when there are multiple gas outlet pipes 14 and the multiple gas outlet pipes 14 are symmetrically distributed along the circumference of the gas outlet channel 111 , the gas buffer chamber 12 can uniformly supply gas to the gas outlet channel 111 .

[0067] Specifically, the positions of different air outlet pipes 14 along the arrangement direction of the first air outlet 1111 and the second air outlet 1112 may be different.

[0068] The air outlet pipe 14 may be in the shape of a circular hole.

[0069] When the circumference of the air lock barrier portion 11 is circular, the first channel 1211 and the second channel 1231 may both extend in the circumferential direction. Specifically, the first channel 1211 and the second channel 1231 may both be arranged to extend around the circumference of the air lock barrier portion 11 so as to achieve circumferential distribution of the airflow. At this time, the air outlet duct 14 may include a plurality of air outlet ducts 14 distributed at intervals along the circumference of the air lock barrier portion 11, each air outlet duct 14 including a side wall and an air outlet formed by the side wall. The cross section of the air outlet duct 14 may be circular or other shapes. Alternatively, the air outlet duct 14 may be an annular structure extending around the circumference of the air lock barrier portion 11, and the annular structure may have an air outlet gap extending around the circumference of the air lock barrier portion 11.

[0070] When the circumference of the airlock barrier portion 11 is rectangular, the first channel 1211 and the second channel 1231 can both extend along the side of the rectangle. The first channel 1211 can extend along the circumference of the airlock barrier portion 11, that is, the first channel 1211 can be a square ring structure extending along the side of the rectangle. The second channel 1231 may include two spaced-apart sections, each section extending along the long side of the rectangle, and the two sections located on both sides of the airlock barrier portion 11. In this case, the air outlet duct 14 may include multiple air outlet pipes evenly distributed along each long side, or there may be two air outlet ducts 14, each air outlet duct 14 including an air outlet slit, each air outlet slit extending along one long side.

[0071] In one possible implementation, Figure 2 and Figure 7As shown, each air outlet pipe 14 includes a first end close to the second static pressure chamber 123 and a second end close to the air lock barrier part 11, the arrangement direction of the first air outlet 1111 and the second air outlet 1112 is the first direction x, the connection direction of the first end and the second end is the second direction y, and the angle a between the first direction x and the second direction y can have any angle, specifically 90°, 60° or 30°, etc.

[0072] During the photolithography process, in order to reduce the loss of laser during transmission, the photolithography light is transmitted from the light source cavity to the photolithography machine cavity in a vacuum environment, thereby reducing the loss of the photolithography light during transmission. Since the light source cavity and the photolithography machine cavity need to be connected through an air lock, in order to prevent the contamination in the light source cavity from being transmitted to the photolithography machine cavity, an air lock is provided between the light source cavity and the photolithography machine cavity. One of the two frustums is connected to the light source cavity and the other is connected to the photolithography machine cavity. The air outlet pipe 14 is located at the junction of the two frustums, or the air outlet pipe 14 is connected to the frustum located in the light source cavity, and blows gas to the side away from the photolithography machine cavity, so as to effectively prevent the contamination in the light source cavity from being transmitted to the photolithography machine cavity.

[0073] In one possible implementation, Figure 4 As shown, the number of the air intake pipeline 13 is one, and the width b of the portion of the first static pressure chamber 121 close to the air intake pipeline 13 is smaller than the width B of the portion away from the air intake pipeline 13 .

[0074] In the above embodiment, when the number of the air intake pipe 13 is one, in order to improve the uniformity of the circumferential distribution of the airflow in the first static pressure chamber 121, the width b of the portion of the first static pressure chamber 121 close to the air intake pipe 13 is set to be smaller, and the width B of the portion of the first static pressure chamber 121 away from the air intake pipe 13 is set to be larger, so that the gas can enter the first static pressure chamber 121 from the air intake pipe 13 and diffuse in the direction away from the air intake pipe 13.

[0075] Specifically, if Figure 3 and Figure 4As shown, the number of the air intake pipe 13 is 1, and the first static pressure chamber 121 includes a first part close to the air intake pipe 13 and extending along the long side of the barrier part of the air lock 1, a second part away from the air intake pipe 13 and extending along the other long side of the barrier part of the air lock 1, and a third part connected between the first part and the second part and extending along the short side. The width of the first part is smaller than the width of the second part, and the width of the third part is larger than the width of the first part. The width of the third part may be the same as the width of the second part, or the width of the third part is larger than the width of the second part, so that the gas can flow more easily from the first part to the second part, thereby facilitating the side of the gas buffer chamber 12 away from the air intake pipe 13 to lift the gas to the barrier part of the air lock 1, and helping to improve the uniformity of the air flow supply on the side of the air lock 1 buffer chamber close to the air intake pipe 13 and the side away from the air intake pipe 13, thereby helping to further improve the performance of the air lock 1. The above are merely preferred embodiments of the present application, but the scope of protection of the present application is not limited thereto. Any changes or substitutions that can be easily conceived by a person skilled in the art within the technical scope disclosed in this application should be included in the scope of protection of the present application. Therefore, the scope of protection of the present application should be based on the scope of protection of the claims.

Claims

1. An air lock, characterized in that: include: An air lock barrier portion, the air lock barrier portion comprising an air outlet channel, the air outlet channel comprising a first air outlet and a second air outlet arranged opposite to each other; a gas buffer chamber comprising a first static pressure chamber, a high-resistance chamber, and a second static pressure chamber, wherein the first static pressure chamber has a first channel extending at least partially along the circumference of the gas lock barrier portion, and the second static pressure chamber has a second channel extending at least partially along the circumference of the gas lock barrier portion, the high-resistance chamber communicating between the first and second static pressure chambers, and the gas capacity of the high-resistance chamber being smaller than the gas capacity of either the first or second static pressure chambers; an air inlet pipeline, connected to the first static pressure chamber, for allowing gas to enter the first static pressure chamber; An air outlet pipeline is connected between the second static pressure chamber and the air outlet channel, and is arranged around at least a portion of the circumference of the air lock barrier portion.

2. The air lock according to claim 1, wherein: The air lock barrier portion is circular or rectangular along a circumferential direction around the arrangement direction of the first air outlet and the second air outlet.

3. The air lock according to claim 1, wherein: At least a portion of the first channel is arranged in parallel with at least a portion of the second channel.

4. The air lock according to claim 1, wherein: The high-resistance chamber includes a first gap, the first gap is located between a first plane and a second plane that are parallel to each other, and the first gap is connected to the first channel and the second channel; or The high-resistance chamber includes a second gap, the second gap is located between the first bending surface and the second bending surface, the first bending surface is parallel to the second bending surface, and the second gap is connected to the first channel and the second channel; or The high-resistance chamber includes a plurality of through holes extending from the first static pressure chamber to the second static pressure chamber.

5. The air lock according to claim 1, wherein: The air outlet pipeline is an annular structure extending around the circumference of the air outlet channel, or there are multiple air outlet pipelines, and the multiple air outlet pipelines are symmetrically distributed along the circumference of the air outlet channel.

6. The air lock according to claim 1, wherein: The circumference of the air lock barrier portion is circular, and the first static pressure chamber, the high resistance chamber and the second static pressure chamber are all arranged around the circumference of the air outlet channel.

7. The air lock according to claim 6, characterized in that The first static pressure chamber, the high-resistance chamber, and the second static pressure chamber are all annular structures surrounding the circumference of the air outlet channel.

8. The air lock according to claim 1, wherein: The circumference of the air lock barrier portion is a rectangle, the rectangle includes two opposite long sides and two opposite short sides, and at least one of the first static pressure chamber, the high-resistance chamber, and the second static pressure chamber is arranged on the long side of the rectangle and extends along the direction of the long side; or At least one of the first static pressure chamber, the high-resistance chamber, and the second static pressure chamber extends from one of the long sides, around one of the short sides, to the other long side. The first static pressure chamber is one or two interconnected chambers, and the two first static pressure chambers enclose a ring around the air lock barrier portion.

9. The air lock according to claim 2, wherein: The air lock barrier portion includes two frustums arranged opposite to each other, or the air lock barrier portion is in the shape of a rectangular cone.

10. The air lock according to any one of claims 1 to 9, characterized in that: The number of the air intake pipeline is one, and the width of a portion of the first static pressure chamber close to the air intake pipeline is smaller than the width of a portion away from the air intake pipeline.

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