Component diagnosis system

Abstract

The embodiment of the invention discloses a component diagnosis system, and relates to the technical field of plasma component diagnosis. The plasma flow reactor is used for generating plasma in response to nanosecond pulse power supply excitation, and the plasma comprises a neutral component and an ion component; the differential chamber is used for responding to a first instruction to control the deflection electrode to be opened, so that a pump group consisting of a mechanical pump and a molecular pump controls the air pressure in the differential chamber, and neutral components are converted into molecular beams by utilizing the pressure difference between the plasma flow reactor and the differential chamber; the ionization chamber is used for converting the molecular beam into an ion beam by ionizing the molecular beam; the flight time mass spectrum is used for performing mass spectrum detection on the ion beam according to the flight time of the ion beam in the electric field; and the data acquisition unit is used for analyzing the mass spectrum signal to generate component diagnosis data of the neutral component. Therefore, the components of the plasma can be diagnosed more comprehensively.

Description

Technical Field

[0001] The present application relates to the technical field of plasma component diagnosis, and in particular to a component diagnosis system. Background Art

[0002] Plasma has important applications in fields such as energy, aviation, and chemical engineering. Plasma can facilitate various chemical reactions. For example, in aerospace engines, plasma can be used in ignition and combustion processes, improving combustion efficiency and stability. To understand how plasma facilitates these chemical reactions, comprehensive compositional diagnostics of both neutral and ionic components of the plasma are often required.

[0003] Current component diagnostic methods are limited in their scope: gas chromatography can only diagnose a subset of stable components, and laser diagnostics can only diagnose small molecules. Molecular beam mass spectrometry's application in traditional chemistry, such as combustion, has demonstrated its ability to comprehensively diagnose ions, free radicals, and intermediates in complex systems. Therefore, it holds great promise for plasma component diagnostics.

[0004] However, due to the large number of ion components in the plasma, especially under highly diluted experimental conditions, the concentration of diluent gas ions may be very high. These ion components enter the molecular beam together with neutral components, which may cause problems such as mass spectrometry signal saturation and reduced resolution, affecting the quality of component experimental data.

[0005] Therefore, how to selectively and accurately diagnose the neutral components and ion components of plasma has become a technical problem that needs to be solved urgently. Summary of the Invention

[0006] Based on the above problems, the present application provides a component diagnosis system that can selectively and accurately perform component diagnosis on the neutral components and ion components of plasma.

[0007] The embodiments of this application disclose the following technical solutions:

[0008] The present application discloses a component diagnosis system, which comprises: a plasma flow reactor, a sampling nozzle, a differential chamber, a nickel funnel, an ionization chamber, a time-of-flight mass spectrometer, and a data acquisition unit;

[0009] Wherein, one end of the sampling nozzle is connected to the output end of the plasma flow reactor, and the other end of the sampling nozzle is connected to the differential chamber; one end of the nickel funnel is connected to the differential chamber, and the other end of the nickel funnel is connected to the ionization chamber; the differential chamber includes a deflection electrode;

[0010] The plasma flow reactor is used to generate plasma in response to nanosecond pulse power excitation, wherein the plasma includes neutral components and ion components;

[0011] The differential chamber is used to, after obtaining the plasma generated by the plasma flow reactor through the sampling nozzle and introducing the plasma into the differential chamber, control the deflection electrode to be turned on in response to a first instruction, so that a pump group consisting of a mechanical pump and a molecular pump controls the gas pressure in the differential chamber, and utilizes the pressure difference between the plasma flow reactor and the differential chamber to convert the neutral components into molecular beams;

[0012] The ionization chamber is used to, after obtaining the molecular beam through the nickel funnel and introducing the molecular beam into the ionization chamber, ionize the molecular beam to convert the molecular beam into an ion beam;

[0013] The time-of-flight mass spectrometer is used to perform mass spectrometry detection on the ion beam according to the flight time of the ion beam in the electric field to obtain a mass spectrum signal;

[0014] The data acquisition unit is used to generate component diagnostic data by analyzing the mass spectrometry signal.

[0015] Optionally, the ionization chamber includes an electron gun;

[0016] The ionization chamber is specifically used to, after obtaining the molecular beam through the nickel funnel and introducing the molecular beam into the ionization chamber, control the electron gun to turn on so that the molecular beam collides with the electron beam emitted by the electron gun, ionize the molecular beam, and convert the molecular beam into an ion beam.

[0017] Optionally, the differential chamber is further used to, after obtaining the plasma generated by the plasma flow reactor through the sampling nozzle and introducing the plasma into the differential chamber, control the deflection electrode to be closed in response to a second instruction, so that a pump group consisting of a mechanical pump and a molecular pump controls the gas pressure in the differential chamber, and utilizes the pressure difference between the plasma flow reactor and the differential chamber to convert the ion components and the neutral components into molecular beams;

[0018] The ionization chamber is further configured to, after acquiring the molecular beam through the nickel funnel and introducing the molecular beam into the ionization chamber, control the electron gun to be closed so that the ion components in the molecular beam enter the time-of-flight mass spectrometer;

[0019] The time-of-flight mass spectrometer is further used to perform mass spectrometry detection on the ion components according to the flight time of the ion components in the electric field to obtain mass spectrometry signals.

[0020] Optionally, the component diagnosis system further comprises: a dye laser; wherein the output end of the dye laser is connected to the ionization chamber;

[0021] The ionization chamber is specifically used to, after obtaining the molecular beam through the nickel funnel and introducing the molecular beam into the ionization chamber, and after introducing the laser generated by the dye condenser into the ionization chamber, use the laser generated by the dye laser to perform resonance enhanced multiphoton ionization on the neutral components in the molecular beam to convert the molecular beam into an ion beam.

[0022] Optionally, the component diagnosis system further comprises: a tubular heating furnace; wherein the tubular heating furnace wraps the plasma flow reactor;

[0023] The plasma flow reactor is specifically used to generate plasma under variable temperature conditions in response to nanosecond pulse power excitation, wherein the tubular heating furnace is used to provide the variable temperature conditions for the plasma flow reactor.

[0024] Optionally, the ionization chamber includes an ion extractor, and the time-of-flight mass spectrometer includes a microchannel plate detector;

[0025] The ionization chamber is further used to accelerate and focus the ion beam through the ion extractor, and send the processed ion beam into the time-of-flight mass spectrometer;

[0026] The time-of-flight mass spectrometer is specifically used to perform mass spectrometry detection on the processed ion beam according to the flight time of the processed ion beam from the ion extractor to the microchannel plate detector to obtain a mass spectrometry signal.

[0027] Optionally, the time-of-flight mass spectrometer includes a reflective electrode;

[0028] The reflection electrode is used to reflect the ion beam on the flight path to the microchannel plate detector.

[0029] Optionally, the component diagnosis system further comprises: a nanosecond pulse power supply and an electromagnetic shielding measure, wherein the electromagnetic shielding measure is a Faraday cage and / or an electromagnetic shielding cloth; wherein the electromagnetic shielding measure wraps the nanosecond pulse power supply and the data acquisition unit;

[0030] The nanosecond pulse power supply is used to provide nanosecond pulse power excitation for the plasma flow reactor;

[0031] The electromagnetic shielding measures are used to reduce the electromagnetic interference generated by the nanosecond pulse power supply.

[0032] Optionally, the first pressure value in the plasma flow reactor is greater than the second pressure value in the differential chamber, greater than the third pressure value in the ionization chamber, and greater than the fourth pressure value in the time-of-flight mass spectrometer.

[0033] Optionally, the diameter of the sampling nozzle is 300 microns, and the diameter of the nickel funnel is 2 millimeters.

[0034] Compared with the existing technology, this application has the following beneficial effects:

[0035] The embodiment of the present application provides a component diagnosis system, which includes: a plasma flow reactor, a sampling nozzle, a differential chamber, a nickel funnel, an ionization chamber, a time-of-flight mass spectrometer and a data acquisition unit; wherein one end of the sampling nozzle is connected to the output end of the plasma flow reactor, and the other end is connected to the differential chamber; one end of the nickel funnel is connected to the differential chamber, and the other end is connected to the ionization chamber; the differential chamber includes a deflection electrode; the plasma flow reactor is used to generate plasma in response to nanosecond pulse power excitation, and the plasma includes neutral components and ion components; the differential chamber is used to obtain the neutral components and ion components generated by the plasma flow reactor through the sampling nozzle. Plasma, and after introducing the plasma into the differential chamber, in response to the first instruction, the deflection electrode is controlled to open, so that the pump group composed of the mechanical pump and the molecular pump controls the air pressure in the differential chamber, and uses the pressure difference between the plasma flow reactor and the differential chamber to convert the neutral component into a molecular beam; the ionization chamber is used to obtain the molecular beam through the nickel funnel, and after the molecular beam is introduced into the ionization chamber, the molecular beam is converted into an ion beam by ionizing the molecular beam; the time-of-flight mass spectrometer is used to perform mass spectrometry detection on the ion beam according to the flight time of the ion beam in the electric field to obtain a mass spectrum signal; the data acquisition unit is used to generate component diagnostic data of the neutral component by analyzing the mass spectrum signal. Therefore, the component diagnosis system provided in the embodiment of the present application sets a deflection electrode in the differential chamber, and controls the deflection electrode to open, so that the pump group composed of the mechanical pump and the molecular pump controls the air pressure in the differential chamber, thereby realizing efficient extraction and purification of neutral components. Therefore, the component diagnosis system provided in the embodiment of the present application can selectively and accurately perform component diagnosis on the neutral components of the plasma. BRIEF DESCRIPTION OF THE DRAWINGS

[0036] In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without any creative work.

[0037] Figure 1 A schematic diagram of a component diagnosis system provided in an embodiment of the present application;

[0038] Figure 2 A schematic diagram of a component diagnosis method provided in an embodiment of the present application;

[0039] Figure 3 A schematic diagram of component detection data provided in an embodiment of the present application. DETAILED DESCRIPTION

[0040] As previously described, plasma compositional diagnosis is typically performed separately for both neutral and ion components. However, current compositional diagnostic methods (such as gas chromatography and laser diagnostics) are limited in their scope. Molecular beam mass spectrometry, which enables comprehensive component detection, can interfere with subsequent mass spectrometry detection due to the large number of ions entering the molecular beam during beam formation, affecting the resolution and accuracy of the component diagnosis.

[0041] Therefore, how to selectively and accurately diagnose the neutral components and ion components of plasma has become a technical problem that needs to be solved urgently.

[0042] After research, the inventors have proposed a component diagnosis system. The component diagnosis system provided in the embodiment of the present application sets a deflection electrode in the differential chamber, and controls the deflection electrode to be turned on so that the pump group composed of the mechanical pump and the molecular pump controls the air pressure in the differential chamber, thereby realizing efficient extraction and purification of neutral components. Furthermore, the component diagnosis system provided in the embodiment of the present application can also control the deflection electrode to be turned off so that the pump group composed of the mechanical pump and the molecular pump controls the air pressure in the differential chamber, thereby converting the ion components and neutral components into molecular beams. At this time, both the ion components and the neutral components can enter the ionization chamber. At the same time, the electron gun in the ionization chamber is controlled to be turned off. At this time, the ion components in the molecular beam can enter the time-of-flight mass spectrometer to be detected, while the neutral components in the molecular beam cannot enter the time-of-flight mass spectrometer to be detected, thereby realizing separate component diagnosis of the ion components. Therefore, the component diagnosis system provided in the embodiment of the present application can selectively and accurately perform component diagnosis on the neutral components and ion components of the plasma respectively.

[0043] In order to help those skilled in the art better understand the present invention, the following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative work are within the scope of protection of this application.

[0044] See also Figure 1 , which is a schematic diagram of a component diagnosis system provided in an embodiment of the present application. Figure 1 It can be seen that the component diagnostic system includes: a nanosecond pulse power supply 1, a plasma flow reactor 2, a copper electrode 3, a tubular heating furnace 4, a sampling nozzle 5, a deflection electrode 6, a differential chamber 7, a nickel funnel 71, an ionization chamber 8, an electron gun 81, an ion extraction electrode 82, a time-of-flight mass spectrometer 9, a microchannel plate detector 91, a reflection electrode 92, a data acquisition unit 10 and a dye laser 11.

[0045] Depend on Figure 1 It can be seen that one end of the sampling nozzle 5 is connected to the output end of the plasma flow reactor 2, and the other end of the sampling nozzle 5 is connected to the differential chamber 7; one end of the nickel funnel 71 is connected to the differential chamber 7, and the other end of the nickel funnel 71 is connected to the ionization chamber 8; the differential chamber 7 includes a deflection electrode 6.

[0046] See also Figure 2 , which is a flow chart of a component diagnosis method provided in an embodiment of the present application. The method includes:

[0047] A1: The plasma flow reactor generates plasma in response to nanosecond pulse power excitation, and the plasma includes neutral components and ion components.

[0048] First, the nanosecond pulse power supply 1 generates a high-voltage (e.g., 10-50 kV) and narrow-width (nanosecond-level, e.g., 10-100 ns) pulse and applies it to the plasma flow reactor 2 through the copper electrode 3. Thus, the nanosecond pulse unit 1 provides nanosecond pulse power excitation for the plasma flow reactor 2.

[0049] Subsequently, the plasma flow reactor 2 generates a plasma comprising neutral and ion components in response to excitation from the nanosecond pulse power supply. Specifically, the plasma flow reactor 2 generates a uniformly dispersed plasma by constructing a dielectric barrier discharge (DBD) structure on a quartz flow tube and being excited by the nanosecond pulse power supply. The DBD structure typically includes two electrodes (two copper electrodes 3 in the component diagnostic system provided in the embodiment of the present application) and a dielectric layer (such as a quartz tube) between the electrodes. When the nanosecond pulse power supply 1 provides nanosecond pulse power excitation to the copper electrodes 3, a strong electric field is formed between the copper electrodes 3. This strong electric field is sufficient to ionize the gas within the plasma flow reactor 2, thereby generating a plasma comprising neutral and ion components.

[0050] It should be noted that the component diagnostic system may also include electromagnetic shielding measures. The electromagnetic shielding measures may be a Faraday cage and / or electromagnetic shielding cloth, and the electromagnetic shielding measures enclose the nanosecond pulse power supply 1 and the data acquisition unit 10, thereby reducing the electromagnetic interference generated by the nanosecond pulse unit 1 and reducing the electromagnetic interference received by the data acquisition unit 10.

[0051] It should also be noted that plasma generation depends not only on nanosecond pulse power excitation but also on the pressure conditions within the plasma flow reactor 2. Generally speaking, the pressure within the plasma flow reactor 2 needs to be controlled between 10 and 50 Torr. This pressure range ensures stable and efficient generation of a uniformly dispersed plasma. Excessively low pressure (<10 Torr) may lead to unstable discharge, while excessively high pressure (>50 Torr) may increase energy loss and reduce plasma uniformity. Therefore, by precisely controlling the pressure within the plasma flow reactor 2, plasma generation conditions can be optimized, thereby improving the performance of the entire component diagnosis system.

[0052] It should also be noted that the component diagnostic system can also include a tubular heating furnace 4. The temperature range of the tubular heating furnace 4 generally covers room temperature to 1000°C, which can cover the temperature conditions in most actual industrial scenarios. The tubular heating furnace 4 generally wraps the plasma flow reactor 2, or is located around the plasma flow reactor 2. The tubular heating furnace 4 is used to control the temperature of the plasma flow reactor 2 through one or more electric heating wires, thereby simulating various temperature conditions in actual industrial scenarios, such as the high temperature conditions of the engine combustion chamber, the variable temperature conditions in the chemical catalytic reaction, etc., and then more comprehensively studying the characteristics and mechanisms of the plasma reaction at different temperatures. Taking the tubular heating furnace 4 providing variable temperature conditions for the plasma flow reactor 2 as an example, the plasma flow reactor 2 can generate plasma under variable temperature conditions in response to nanosecond pulse power excitation.

[0053] A2: The sampling nozzle acquires the plasma generated by the plasma flow reactor and introduces the plasma into the differential chamber. Subsequently, step A3 or A8 is performed.

[0054] It should be noted that the diameter of the sampling nozzle 5 can be 300 μm (micrometers). This application does not impose any restrictions on the diameter of the sampling nozzle 5; it only needs to ensure the following three aspects: First, it improves sampling accuracy and selectivity, and reduces interference and contamination with the external environment. Second, it ensures a sufficient sampling volume to meet the requirements of subsequent mass spectrometry analysis. Third, it ensures that the pressure difference between the output of the plasma flow reactor 2 and the differential chamber 7 meets the conditions for ultrasonic molecular beam formation.

[0055] A3: The differential chamber responds to the first instruction and controls the deflection electrode to open, so that the pump group consisting of the mechanical pump and the molecular pump controls the gas pressure in the differential chamber, and uses the pressure difference between the plasma flow reactor and the differential chamber to convert the neutral components into molecular beams.

[0056] The on / off state of deflection electrode 6 determines whether the component diagnosis system detects neutral or ionic components. Specifically, when neutral components (such as molecules and free radicals) need to be detected, deflection electrode 6 is turned on in response to a first command. This allows the pump assembly, consisting of a mechanical pump and a molecular pump, to control the pressure within differential chamber 7. Using the pressure differential between the plasma flow reactor and the differential chamber, neutral components in the plasma are converted into molecular beams. At this point, only neutral components can enter ionization chamber 8 unimpeded.

[0057] It should be noted that the molecular beam can effectively preserve neutral components, allowing them to be subsequently detected.

[0058] It should also be noted that the pressure value in the differential chamber 7 needs to be controlled at 10 -4 Torr around.

[0059] A4: The nickel funnel captures the molecular beam and introduces it into the ionization chamber.

[0060] It should be noted that the diameter of the nickel funnel 71 may be 2 mm (millimeter). This application does not limit the diameter of the nickel funnel 71.

[0061] A5: The ionization chamber converts the molecular beam into an ion beam by ionizing the molecular beam.

[0062] The ionization chamber 8 includes an electron gun 81. When the electron gun 81 is turned on, it emits a high-speed electron beam. These electron beams collide with the molecular beam entering the ionization chamber 8, ionizing the molecular beam with electrons and converting the molecular beam into an ion beam.

[0063] Ion chamber 8 also includes an ion extractor 82. By applying an electric field, ion extractor 82 imparts additional kinetic energy to the ion beam, thereby accelerating the ion beam. This accelerated ion beam can more quickly enter time-of-flight mass spectrometer 9, improving the sensitivity and resolution of mass spectrometry analysis. Furthermore, ion extractor 82 focuses the ion beam, ensuring that it enters time-of-flight mass spectrometer 9 along a predetermined trajectory.

[0064] In one specific implementation, the output end of the dye laser 11 is connected to the ionization chamber 8. After a molecular beam is captured by a nickel funnel 71 and introduced into the ionization chamber 8, and laser light generated by the dye concentrator 11 is introduced into the ionization chamber 8, the laser light generated by the dye laser 11 is used to perform resonance-enhanced multiphoton ionization on the neutral components in the molecular beam, converting the molecular beam into an ion beam. Resonance-enhanced multiphoton ionization technology offers high sensitivity, state selectivity, and resolution, enabling the acquisition of excited-state dynamics and vibrational structural information about the components.

[0065] A6: Time-of-flight mass spectrometry performs mass spectrometry on the ion beam based on the flight time of the ion beam in the electric field to obtain a mass spectrometry signal.

[0066] The basic principle of time-of-flight mass spectrometry 9 is that ion beams of different masses have different flight speeds in an electric field, and therefore arrive at the microchannel plate (MCP) detector 91 at different times. By measuring the flight time of the ion beam from the ion extractor 82 to the MCP detector 91, the mass-to-charge ratio (m / z) of the ion beam can be calculated, thereby enabling mass spectrometry detection and obtaining a mass spectrometry signal.

[0067] It should be noted that when the ion beam reaches the microchannel plate detector 91 and collides with the microchannel plate detector 91, the ion beam will excite a large number of secondary electrons, which will be further multiplied and amplified by the microchannel plate detector 91 to obtain a mass spectrometry signal with higher resolution.

[0068] The time-of-flight mass spectrometer 9 includes a reflector 92. The reflector 92 can reflect the ion beam along its flight path toward the microchannel plate detector 91. Thus, compared to a scenario where the ion beam directly travels from the ion extractor 82 to the microchannel plate detector 91, the inclusion of the reflector 92 can effectively extend the ion beam's flight path and duration, thereby improving the resolution of the mass spectrometer.

[0069] A7: The data acquisition unit generates component diagnostic data by analyzing mass spectrometry signals.

[0070] A8: The differential chamber responds to the second instruction, controls the deflection electrode to close, so that the pump group consisting of the mechanical pump and the molecular pump controls the gas pressure in the differential chamber, and uses the pressure difference between the plasma flow reactor and the differential chamber to convert the ion components and neutral components into molecular beams.

[0071] When ion components need to be detected, the second command is followed by deflection electrode 6 being closed, allowing the pump assembly consisting of a mechanical pump and a molecular pump to control the pressure within differential chamber 7. The pressure difference between the plasma flow reactor and the differential chamber is then used to convert the ion components and neutral components in the plasma into molecular beams. At this point, both ion components and neutral components can enter ionization chamber 8.

[0072] A9: The nickel funnel captures the molecular beam and introduces it into the ionization chamber.

[0073] A10: The ionization chamber is closed by controlling the electron gun to allow the ion components in the molecular beam to enter the time-of-flight mass spectrometer.

[0074] After the ionization chamber 8 obtains the molecular beam through the nickel funnel 71 and introduces the molecular beam into the ionization chamber 8, the electron gun 81 is controlled to be closed, so that the ion components in the molecular beam can enter the time-of-flight mass spectrometer 9 through the ion extraction stage 82 for detection, while the neutral components in the molecular beam cannot enter the time-of-flight mass spectrometer 9 for detection.

[0075] A11: Time-of-flight mass spectrometry performs mass spectrometry on the ion components based on their flight time in the electric field to obtain mass spectrometry signals. Subsequently, step A7 is performed.

[0076] It should be noted that the differential chamber 7 controls the air pressure value through the "mechanical pump, molecular pump" pump group, the ionization chamber 8 controls the air pressure value through the "mechanical pump, Roots pump, molecular pump" pump group, and the time-of-flight mass spectrometer 9 controls the air pressure value through the "dry vortex pump, molecular pump" pump group. In addition, the first air pressure value in the plasma flow reactor 2, the second air pressure value in the differential chamber 7, the third air pressure value in the ionization chamber 8, and the fourth air pressure value in the time-of-flight mass spectrometer 9, the pressure values decrease step by step. For example, the selection range of the first air pressure value is 10~50 Torr, and the second air pressure value can be 10 -4 Torr, the third pressure value can be 10 -7 Torr, the fourth pressure value can be 10 -8 Torr.

[0077] It should also be noted that electromagnetic shielding measures may also be provided outside the plasma flow reactor 2 to avoid electromagnetic interference.

[0078] See also Figure 3 , which is a schematic diagram of component detection data provided in an embodiment of the present application. Figure 3 The ion spectrum (a) and neutral species spectrum (b) of the plasma-assisted CH₃OCH₃ / O₂ / Ar (concentration ratio of 3:9:88) oxidation system provided in an example of this application are shown. The spectra demonstrate that the deflection electrodes effectively remove ionic species from the molecular beam, resulting in no interference from ionic signals in the neutral species spectrum. For example, the absence of argon ion signals in (b) and the successful observation of multiple ion products in the ion spectrum (a) demonstrate the absence of argon ion signals.

[0079] In summary, the component diagnosis system provided in the embodiment of the present application sets a deflection electrode in the differential chamber, and controls the deflection electrode to be turned on so that the pump group composed of the mechanical pump and the molecular pump controls the air pressure in the differential chamber, thereby realizing efficient extraction and purification of neutral components. Furthermore, the component diagnosis system provided in the embodiment of the present application can also control the deflection electrode to be turned off so that the pump group composed of the mechanical pump and the molecular pump controls the air pressure in the differential chamber, thereby converting the ion components and the neutral components into molecular beams. At this time, both the ion components and the neutral components can enter the ionization chamber. At the same time, the electron gun in the ionization chamber is controlled to be turned off. At this time, the ion components in the molecular beam can enter the time-of-flight mass spectrometer to be detected, while the neutral components in the molecular beam cannot enter the time-of-flight mass spectrometer to be detected, thereby realizing separate component diagnosis of the ion components. Therefore, the component diagnosis system provided in the embodiment of the present application can selectively and accurately perform component diagnosis on the neutral components and ion components of the plasma respectively.

[0080] It should be noted that the various embodiments in this specification are described in a progressive manner, and the same or similar parts between the various embodiments can be referred to each other, and each embodiment focuses on the differences from other embodiments. In particular, for the device and system embodiments, since they are basically similar to the method embodiments, the description is relatively simple, and the relevant parts can be referred to the partial description of the method embodiments. The device and system embodiments described above are merely schematic, wherein the units described as separate components may or may not be physically separated, and the components indicated as units may or may not be physical units, that is, they may be located in one place, or they may be distributed on multiple network units. Some or all of the modules can be selected according to actual needs to achieve the purpose of the scheme of this embodiment. A person of ordinary skill in the art can understand and implement it without expending creative work.

[0081] The above is merely one specific embodiment of the present application, but the scope of protection of the present application is not limited thereto. Any changes or substitutions that can be easily conceived by a person skilled in the art within the technical scope disclosed in this application should be included in the scope of protection of the present application. Therefore, the scope of protection of the present application should be based on the scope of protection of the claims.

Claims

1. A component diagnosis system, characterized in that: The component diagnosis system includes: a plasma flow reactor, a sampling nozzle, a differential chamber, a nickel funnel, an ionization chamber, a time-of-flight mass spectrometer and a data acquisition unit; Wherein, one end of the sampling nozzle is connected to the output end of the plasma flow reactor, and the other end of the sampling nozzle is connected to the differential chamber; one end of the nickel funnel is connected to the differential chamber, and the other end of the nickel funnel is connected to the ionization chamber; the differential chamber includes a deflection electrode; The plasma flow reactor is used to generate plasma in response to nanosecond pulse power excitation, wherein the plasma includes neutral components and ion components; The differential chamber is used to, after obtaining the plasma generated by the plasma flow reactor through the sampling nozzle and introducing the plasma into the differential chamber, control the deflection electrode to be turned on in response to a first instruction, so that a pump group consisting of a mechanical pump and a molecular pump controls the gas pressure in the differential chamber, and utilizes the pressure difference between the plasma flow reactor and the differential chamber to convert the neutral components into molecular beams; The ionization chamber is used to, after obtaining the molecular beam through the nickel funnel and introducing the molecular beam into the ionization chamber, ionize the molecular beam to convert the molecular beam into an ion beam; The time-of-flight mass spectrometer is used to perform mass spectrometry detection on the ion beam according to the flight time of the ion beam in the electric field to obtain a mass spectrum signal; The data acquisition unit is used to generate component diagnostic data by analyzing the mass spectrometry signal.

2. The component diagnosis system according to claim 1, characterized in that: The ionization chamber includes an electron gun; The ionization chamber is specifically used to, after obtaining the molecular beam through the nickel funnel and introducing the molecular beam into the ionization chamber, control the electron gun to turn on so that the molecular beam collides with the electron beam emitted by the electron gun, ionize the molecular beam, and convert the molecular beam into an ion beam.

3. The component diagnosis system according to claim 2, characterized in that: The differential chamber is further configured to, after obtaining plasma generated by the plasma flow reactor through the sampling nozzle and introducing the plasma into the differential chamber, control the deflection electrode to be closed in response to a second instruction, so that a pump group consisting of a mechanical pump and a molecular pump controls the gas pressure in the differential chamber, and utilizes the pressure difference between the plasma flow reactor and the differential chamber to convert the ion component and the neutral component into a molecular beam; The ionization chamber is further configured to, after acquiring the molecular beam through the nickel funnel and introducing the molecular beam into the ionization chamber, control the electron gun to be closed so that the ion components in the molecular beam enter the time-of-flight mass spectrometer; The time-of-flight mass spectrometer is further used to perform mass spectrometry detection on the ion components according to the flight time of the ion components in the electric field to obtain mass spectrometry signals.

4. The component diagnosis system according to claim 1, characterized in that The component diagnosis system further comprises: a dye laser; wherein the output end of the dye laser is in communication with the ionization chamber; The ionization chamber is specifically used to, after obtaining the molecular beam through the nickel funnel and introducing the molecular beam into the ionization chamber, and after introducing the laser generated by the dye condenser into the ionization chamber, use the laser generated by the dye laser to perform resonance enhanced multiphoton ionization on the neutral components in the molecular beam to convert the molecular beam into an ion beam.

5. The component diagnosis system according to claim 1, characterized in that: The component diagnosis system further comprises: a tubular heating furnace; wherein the tubular heating furnace wraps the plasma flow reactor; The plasma flow reactor is specifically used to generate plasma under variable temperature conditions in response to nanosecond pulse power excitation, wherein the tubular heating furnace is used to provide the variable temperature conditions for the plasma flow reactor.

6. The component diagnosis system according to claim 1, characterized in that: The ionization chamber includes an ion extractor, and the time-of-flight mass spectrometer includes a microchannel plate detector; The ionization chamber is further used to accelerate and focus the ion beam through the ion extractor, and send the processed ion beam into the time-of-flight mass spectrometer; The time-of-flight mass spectrometer is specifically used to perform mass spectrometry detection on the processed ion beam according to the flight time of the processed ion beam from the ion extractor to the microchannel plate detector to obtain a mass spectrometry signal.

7. The component diagnosis system according to claim 6, characterized in that: The time-of-flight mass spectrometer includes a reflector electrode; The reflection electrode is used to reflect the ion beam on the flight path to the microchannel plate detector.

8. The component diagnosis system according to claim 1, characterized in that: The component diagnosis system further includes: a nanosecond pulse power supply and an electromagnetic shielding measure, wherein the electromagnetic shielding measure is a Faraday cage and / or an electromagnetic shielding cloth; wherein the electromagnetic shielding measure wraps the nanosecond pulse power supply and the data acquisition unit; The nanosecond pulse power supply is used to provide nanosecond pulse power excitation for the plasma flow reactor; The electromagnetic shielding measures are used to reduce the electromagnetic interference generated by the nanosecond pulse power supply.

9. The component diagnosis system according to claim 1, characterized in that: The first pressure value in the plasma flow reactor is greater than the second pressure value in the differential chamber, greater than the third pressure value in the ionization chamber, and greater than the fourth pressure value in the time-of-flight mass spectrometer.

10. The component diagnosis system according to any one of claims 1 to 9, characterized in that: The diameter of the sampling nozzle is 300 μm, and the diameter of the nickel funnel is 2 mm.

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