A Kr enrichment and separation equipment control method and system

Abstract

The present invention relates to the technical field of gas purification, and in particular to a control method and system for Kr enrichment and separation equipment. The method includes predicting and obtaining a predicted pretreatment impurity removal index of a gas to be treated when executing preset impurity removal parameters, processing the predicted pretreatment impurity removal index, and obtaining a predicted pretreatment evaluation index; adjusting the pretreatment impurity removal equipment according to the preset impurity removal parameters, passing the gas to be treated into the pretreatment impurity removal equipment, and obtaining a primary gas and primary gas parameters; obtaining a primary enrichment parameter, adjusting the primary enrichment equipment according to the primary enrichment parameter, and performing primary enrichment on the primary gas to obtain a secondary gas and secondary gas parameters; calculating and obtaining a secondary enrichment parameter according to a secondary enrichment difficulty coefficient, adjusting the secondary enrichment equipment according to the secondary enrichment parameter, and performing secondary enrichment on the secondary gas to obtain a separated gas; and separating and processing the separated gas through a chromatographic column to achieve Kr separation. This method can achieve the technical effect of significantly improving the Kr enrichment efficiency and enrichment effect.

Description

Technical Field

[0001] The present invention relates to the technical field of gas purification, and in particular to a control method and system for Kr enrichment and separation equipment. Background Art

[0002] The concentration change of krypton (Kr) in radioactive emissions from nuclear power plants is a key indicator for assessing reactor safety, and its radioactivity detection accuracy directly impacts leak warning and dose estimation. However, xenon (Xe) in nuclear power plant radioactive emissions has similar physical properties to krypton and contains impurities such as water vapor, carbon dioxide, oxygen, and nitrogen. Therefore, Kr needs to be enriched and separated through multiple steps. Existing Kr enrichment processes often rely on experienced technicians to set and adjust various parameters in the Kr enrichment and separation process. This method of controlling the Kr enrichment and separation process is heavily dependent on the operator's skill level and lacks scientificity and the ability to dynamically adjust parameters in real time. This can easily lead to technical issues such as low Kr enrichment and separation efficiency and poor results. Summary of the Invention

[0003] The present invention aims to solve the technical problems of low Kr enrichment and separation efficiency and poor enrichment and separation effect in the prior art, and provides a Kr enrichment and separation equipment control method and system to solve the problems.

[0004] The technical solution of the present invention to solve the above technical problems is as follows:

[0005] In a first aspect, the present invention provides a Kr enrichment and separation equipment control method, comprising: based on parameters of a gas to be treated and historical pretreatment impurity removal data, predicting a predicted pretreatment impurity removal index of the gas to be treated when a preset impurity removal parameter is executed; processing the predicted pretreatment impurity removal index according to a predefined pretreatment impurity removal evaluation rule to obtain a predicted pretreatment evaluation index; if the predicted pretreatment evaluation index is greater than or equal to an index threshold, adjusting the pretreatment impurity removal equipment according to the preset impurity removal parameter, passing the gas to be treated into the pretreatment impurity removal equipment to obtain a primary gas, and performing testing to obtain the primary gas parameters; The first-level gas parameters are processed by a first-level enrichment parameter optimizer to obtain first-level enrichment parameters, the first-level enrichment equipment is adjusted according to the first-level enrichment parameters, the first-level gas is enriched to obtain second-level gas, and the gas is tested to obtain second-level gas parameters; a second-level enrichment difficulty assessment is performed according to the second-level gas parameters to obtain a second-level enrichment difficulty coefficient; the second-level enrichment parameters are calculated according to the second-level enrichment difficulty coefficient, the second-level enrichment equipment is adjusted according to the second-level enrichment parameters, the second-level enrichment is enriched to obtain separated gas; and the separated gas is separated and processed by a chromatographic column to achieve Kr separation.

[0006] Optionally, based on the parameters of the gas to be processed and historical pretreatment impurity removal data, a predicted pretreatment impurity removal index of the gas to be processed when the preset impurity removal parameters are executed is predicted, and according to a predefined pretreatment impurity removal evaluation rule, the predicted pretreatment impurity removal index is processed to obtain a predicted pretreatment evaluation index, including:

[0007] Acquire historical pretreatment impurity removal data, calculate historical pretreatment evaluation indexes, and obtain a historical pretreatment evaluation index set, wherein the historical pretreatment impurity removal data includes historical to-be-processed gas parameters, historical preset impurity removal parameters, and historical pretreatment impurity removal indicators;

[0008] Based on historical pre-processing and impurity removal data, a pre-processing and impurity removal indicator predictor is trained;

[0009] According to the parameters of the gas to be treated and the preset impurity removal parameters, the predicted pretreatment impurity removal index is predicted by a pre-trained pretreatment impurity removal index predictor, and the predicted pretreatment evaluation index is calculated according to the predefined pretreatment impurity removal evaluation rules.

[0010] Optionally, if the predicted pretreatment evaluation index is greater than or equal to the index threshold, the pretreatment impurity removal equipment is adjusted according to the preset impurity removal parameters, the gas to be treated is passed into the pretreatment impurity removal equipment to obtain primary gas, and the gas is tested to obtain primary gas parameters, including:

[0011] According to a predefined pre-impurity removal evaluation rule, a plurality of historical pre-processing impurity removal indicators are processed to obtain a plurality of historical pre-processing evaluation indexes to form a historical pre-processing evaluation index set, wherein any one of the historical pre-processing evaluation indexes in the historical pre-processing evaluation index set has a pre-processing impurity removal qualified flag;

[0012] Performing mean processing on the historical preprocessing evaluation index set to obtain the index threshold.

[0013] Optionally, if the predicted pretreatment evaluation index is greater than or equal to the index threshold, the pretreatment impurity removal equipment is adjusted according to the preset impurity removal parameters, the gas to be treated is passed into the pretreatment impurity removal equipment to obtain the first-level gas, and the gas is tested to obtain the first-level gas parameters. It also includes, if the predicted pretreatment evaluation index is less than the index threshold, adjusting and optimizing the preset impurity removal parameters, calculating the predicted pretreatment evaluation index, until the obtained predicted pretreatment evaluation index is greater than or equal to the index threshold. The specific steps are: randomly generating multiple alternative preset impurity removal parameters; according to the multiple alternative preset impurity removal parameters and the parameters of the gas to be treated, predicting and obtaining multiple predicted pretreatment impurity removal indices through the pretreatment impurity removal index predictor , further calculate and obtain multiple alternative pretreatment evaluation indexes; from the multiple alternative pretreatment evaluation indexes, select the alternative pretreatment evaluation index with the largest value as the better predicted pretreatment evaluation index; when the better predicted pretreatment evaluation index is greater than or equal to the index threshold, set the alternative preset impurity removal parameter corresponding to the better predicted pretreatment evaluation index as the preset impurity removal parameter; when the better predicted pretreatment evaluation index is less than the index threshold, repeat the above steps until the better predicted pretreatment evaluation index is greater than or equal to the index threshold; adjust the pretreatment impurity removal equipment according to the preset impurity removal parameters, pass the gas to be treated into the pretreatment impurity removal equipment to obtain the first-level gas, and perform detection to obtain the first-level gas parameters.

[0014] Optionally, the first-level gas parameters are processed by a first-level enrichment parameter optimizer to obtain first-level enrichment parameters, the first-level enrichment equipment is adjusted according to the first-level enrichment parameters, the first-level gas is subjected to first-level enrichment to obtain second-level gas, and detection is performed to obtain second-level gas parameters, including: obtaining the first-level gas parameters of the first-level gas after pretreatment and impurity removal; calling a trained first-level enrichment parameter generator, inputting the first-level gas parameters, and outputting the obtained first-level enrichment parameters; adjusting the first-level enrichment equipment according to the first-level enrichment parameters, performing first-level enrichment to obtain second-level gas; and detecting the second-level gas to obtain second-level gas parameters.

[0015] Among them, the construction process of the first-level enrichment parameter generator includes: collecting multiple first-level gas parameters and multiple first-level enrichment parameters for first-level enrichment within a historical time to obtain a first-level enrichment historical parameter set; collecting first-level enrichment effect parameters corresponding to multiple first-level enrichment historical parameters to obtain a first-level enrichment historical effect parameter set; using the first-level enrichment historical parameter set and the first-level enrichment historical effect parameter set to supervise the first-level enrichment parameter generator, and calling the first-level enrichment parameter generator after the test converges.

[0016] Optionally, according to the secondary enrichment difficulty coefficient, the secondary enrichment parameters are calculated, the secondary enrichment equipment is adjusted according to the secondary enrichment parameters, the secondary gas is subjected to secondary enrichment, and separated gas is obtained, including: when the secondary enrichment difficulty coefficient is less than the preset secondary enrichment difficulty coefficient threshold, the secondary enrichment equipment is adjusted using energy-saving parameters, secondary enrichment is performed, and separated gas is obtained; when the secondary enrichment difficulty coefficient is greater than or equal to the preset secondary enrichment difficulty coefficient threshold, the secondary enrichment equipment is adjusted using step enhancement parameters, secondary enrichment is performed, and separated gas is obtained; wherein the step enhancement parameters are divided using an enhancement parameter classifier.

[0017] Among them, when the secondary enrichment difficulty coefficient is greater than or equal to the preset secondary enrichment difficulty coefficient threshold, the applicable step enhancement parameters are selected for secondary enrichment, including: based on the secondary enrichment difficulty coefficient threshold, multiple step enhancement parameters are configured, and the secondary enrichment efficiency of the multiple step enhancement parameters increases successively; based on the secondary enrichment difficulty coefficient threshold, a secondary enrichment difficulty coefficient range is configured with the same number as the multiple step enhancement parameters, and a corresponding relationship is established; according to the secondary enrichment difficulty coefficient of the gas after primary enrichment, the step enhancement parameters corresponding to the secondary enrichment difficulty coefficient are indexed, and secondary enrichment is performed with the said step enhancement parameters.

[0018] Among them, based on the secondary enrichment difficulty coefficient threshold, multiple step enhancement parameters are configured, and the secondary enrichment efficiencies of the multiple step enhancement parameters increase in sequence, including: based on historical secondary enrichment data, obtaining the energy-saving parameters of the secondary enrichment, and the secondary enrichment efficiencies corresponding to different secondary enrichment parameters; based on the secondary enrichment efficiency, selecting several secondary enrichment parameters from the secondary enrichment parameters and setting them as step enhancement parameters, and the secondary enrichment efficiencies of the multiple step enhancement parameters increase in sequence; among them, the secondary enrichment efficiencies under the step enhancement parameters are all greater than the secondary enrichment efficiency under the energy-saving parameters.

[0019] In a second aspect, the present invention provides a Kr enrichment and separation equipment control system, comprising:

[0020] A pretreatment impurity removal module is used to predict the predicted pretreatment impurity removal index of the gas to be treated when the preset impurity removal parameters are executed based on the parameters of the gas to be treated and historical pretreatment impurity removal data, and to process the predicted pretreatment impurity removal index according to predefined pretreatment impurity removal evaluation rules to obtain a predicted pretreatment evaluation index;

[0021] If the predicted pretreatment evaluation index is greater than or equal to the index threshold, the pretreatment impurity removal equipment is adjusted according to the preset impurity removal parameters, the gas to be treated is passed into the pretreatment impurity removal equipment to obtain the first-level gas, and the gas is tested to obtain the first-level gas parameters; if the predicted pretreatment evaluation index is less than the index threshold, the preset impurity removal parameters are adjusted and optimized until the predicted pretreatment evaluation index is greater than or equal to the index threshold;

[0022] a primary enrichment module, configured to process the primary gas parameters through a primary enrichment parameter optimizer to obtain primary enrichment parameters, adjust the primary enrichment equipment according to the primary enrichment parameters, perform primary enrichment on the primary gas to obtain secondary gas, and perform detection to obtain secondary gas parameters;

[0023] a secondary enrichment module, configured to perform a secondary enrichment difficulty assessment based on the secondary gas parameters to obtain a secondary enrichment difficulty coefficient, calculate a secondary enrichment parameter based on the secondary enrichment difficulty coefficient, adjust a secondary enrichment device based on the secondary enrichment parameter, perform secondary enrichment on the secondary gas, and obtain a separated gas;

[0024] The gas separation module is used to separate and process the separation gas through a chromatographic column to achieve Kr separation.

[0025] By implementing the present invention, it is possible to predict the pretreatment impurity removal index of the gas to be treated when the preset impurity removal parameters are executed based on the parameters of the gas to be treated and historical pretreatment impurity removal data. According to the predefined pretreatment impurity removal evaluation rules, the predicted pretreatment impurity removal index is processed to obtain the predicted pretreatment evaluation index, thereby avoiding the high cost of parameter verification experiments directly on the equipment and providing a quantitative basis for subsequent optimization of impurity removal parameters.

[0026] By implementing the present invention, it can be achieved that if the predicted pretreatment evaluation index is greater than or equal to the index threshold, the pretreatment impurity removal equipment is adjusted according to the preset impurity removal parameters, the gas to be treated is passed into the pretreatment impurity removal equipment to obtain the first-level gas, and the gas is tested to obtain the first-level gas parameters, thereby achieving efficient removal of water vapor and carbon dioxide in the gas to be treated and preventing subsequent treatment equipment from being blocked by ice.

[0027] By implementing the present invention, it is possible to process the primary gas parameters through a primary enrichment parameter optimizer to obtain the primary enrichment parameters, adjust the primary enrichment equipment according to the primary enrichment parameters, perform primary enrichment on the primary gas to obtain secondary gas, and perform detection to obtain the secondary gas parameters. This achieves targeted adjustment of the primary enrichment parameters according to the primary gas parameters, significantly improving the efficiency of the primary enrichment.

[0028] By implementing the present invention, it is possible to perform a secondary enrichment difficulty assessment based on the secondary gas parameters, obtain a secondary enrichment difficulty coefficient, and convert the krypton gas concentration and impurity residue into a calculable difficulty coefficient. This assessment method shifts the secondary enrichment parameter configuration from being experience-driven to data-driven, providing a scientific basis for precisely controlling the enrichment process.

[0029] By implementing the present invention, it is possible to calculate and obtain secondary enrichment parameters based on the secondary enrichment difficulty coefficient, adjust the secondary enrichment equipment based on the secondary enrichment parameters, perform secondary enrichment on the secondary gas, and obtain separated gas. This achieves automatic matching of energy-saving parameters or step-by-step enhancement parameters based on the enrichment difficulty, thereby achieving both energy consumption reduction and enrichment efficiency improvement.

[0030] By implementing the present invention, it is possible to separate and process the separated gas through a chromatographic column, thereby achieving Kr separation, rapid enrichment of Kr, and separation from Xe.

[0031] In summary, by implementing the present invention, the technical effect of greatly improving the Kr enrichment efficiency and enrichment effect can be achieved. BRIEF DESCRIPTION OF THE DRAWINGS

[0032] Figure 1 A schematic flow chart of a Kr enrichment and separation equipment control method provided by the present invention;

[0033] Figure 2 This is a structural schematic diagram of a Kr enrichment and separation equipment control system provided by the present invention.

[0034] In the accompanying drawings, the components represented by the reference numerals are as follows:

[0035] Pretreatment and impurity removal module 11, primary enrichment module 12, secondary enrichment module 13, gas separation module 14. DETAILED DESCRIPTION

[0036] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without making any creative efforts shall fall within the scope of protection of the present invention.

[0037] In the description of the present invention, the terms "first" and "second" are used for descriptive purposes only and should not be understood to indicate or imply relative importance or implicitly specify the number of the technical features indicated. Therefore, a feature specified as "first" or "second" may explicitly or implicitly include one or more of the specified features. In the description of the present invention, "plurality" means two or more, unless otherwise specifically defined.

[0038] In the description of the present invention, the term "for example" is used to mean "used as an example, illustration or illustration". Any embodiment of the present invention described as "for example" is not necessarily to be construed as being more preferred or advantageous than other embodiments. The following description is given to enable any person skilled in the art to implement and use the present invention. In the following description, details are listed for the purpose of explanation. It should be understood that a person of ordinary skill in the art can recognize that the present invention can be implemented without using these specific details. In other examples, well-known structures and processes are not elaborated in detail to avoid obscuring the description of the present invention with unnecessary details. Therefore, the present invention is not intended to be limited to the embodiments shown, but is consistent with the widest scope consistent with the principles and features disclosed herein.

[0039] Example 1, as Figure 1 As shown, an embodiment of the present invention provides a Kr enrichment and separation equipment control method, comprising:

[0040] S100: Based on the parameters of the gas to be processed and historical pre-processing impurity removal data, a predicted pre-processing impurity removal index of the gas to be processed when the preset impurity removal parameters are executed is predicted, and the predicted pre-processing impurity removal index is processed according to a pre-defined pre-processing impurity removal evaluation rule to obtain a predicted pre-processing evaluation index;

[0041] S200: If the predicted pretreatment evaluation index is greater than or equal to the index threshold, the pretreatment impurity removal equipment is adjusted according to the preset impurity removal parameters, the gas to be treated is passed through the pretreatment impurity removal equipment to obtain primary gas, and the gas is tested to obtain primary gas parameters;

[0042] S300: Processing the primary gas parameters by a primary enrichment parameter optimizer to obtain primary enrichment parameters, adjusting the primary enrichment equipment according to the primary enrichment parameters, performing primary enrichment on the primary gas to obtain secondary gas, and performing detection to obtain secondary gas parameters;

[0043] S400: performing a secondary enrichment difficulty assessment according to the secondary gas parameters to obtain a secondary enrichment difficulty coefficient;

[0044] S500: calculating and obtaining secondary enrichment parameters according to the secondary enrichment difficulty coefficient, adjusting the secondary enrichment equipment according to the secondary enrichment parameters, and performing secondary enrichment on the secondary gas to obtain separated gas;

[0045] S600: Separating and processing the separated gas through a chromatographic column to achieve Kr separation.

[0046] Detecting krypton (Kr) in radioactive emissions from nuclear power plants is crucial for estimating operational doses and detecting leaks or explosions. Changes in Kr concentration can reflect reactor operational status and safety. However, radioactive emissions from nuclear power plants also contain xenon (Xe). If Xe is not completely separated, it can interfere with the radioactive signal detected by Kr (the two have similar physical properties and are easily confused). Therefore, Kr enrichment and separation are necessary.

[0047] The Kr enrichment and separation equipment described in the embodiments of the present application mainly includes four parts, namely a pretreatment and impurity removal module, a primary enrichment module, a secondary enrichment module, and a gas separation module.

[0048] The pre-treatment impurity removal module is used to remove water vapor and carbon dioxide contained in the gas to be treated to prevent the water vapor and carbon dioxide from freezing in the low temperature environment of the subsequent modules and causing blockage.

[0049] The primary enrichment module and the secondary enrichment module are based on the fact that the boiling points of oxygen and nitrogen are higher than those of krypton. They are used to remove volatile impurities such as oxygen and nitrogen and enrich krypton by adsorbing krypton at low temperature and purging the oxygen and nitrogen that escape first with inert gas during the heating process.

[0050] The gas separation module is used to separate xenon, which has a boiling point close to that of krypton, through a chromatographic column to obtain high-purity krypton, thereby achieving the enrichment and separation of krypton.

[0051] In step S100 of the embodiment of the present application, based on the parameters of the gas to be treated and the historical pretreatment impurity removal data, a predicted pretreatment impurity removal index of the gas to be treated when the preset impurity removal parameters are executed is predicted, and according to the predefined pretreatment impurity removal evaluation rules, the predicted pretreatment impurity removal index is processed to obtain a predicted pretreatment evaluation index, including:

[0052] Acquire historical pretreatment impurity removal data, calculate historical pretreatment evaluation indexes, and obtain a historical pretreatment evaluation index set, wherein the historical pretreatment impurity removal data includes historical to-be-processed gas parameters, historical preset impurity removal parameters, and historical pretreatment impurity removal indicators;

[0053] Based on historical pre-processing and impurity removal data, a pre-processing and impurity removal indicator predictor is trained;

[0054] According to the parameters of the gas to be treated and the preset impurity removal parameters, the predicted pretreatment impurity removal index is predicted by a pre-trained pretreatment impurity removal index predictor, and the predicted pretreatment evaluation index is calculated according to the predefined pretreatment impurity removal evaluation rules.

[0055] In the embodiment of the present application, the pretreatment and impurity removal is to first use pretreatment and impurity removal equipment (containing silica gel and aluminum oxide) to remove water vapor and carbon dioxide in the gas to be treated to prevent ice blockage in subsequent equipment.

[0056] In the embodiment of the present application, to achieve pre-processing and impurity removal of the gas parameters to be processed, it is first necessary to configure the pre-processing and impurity removal equipment with preset impurity removal parameters. Among them, the preset impurity removal parameters are directly related to the quality of the pre-processing and impurity removal effect. Therefore, in the embodiment of the present application, to perform pre-processing and impurity removal, it is first necessary to evaluate the preset impurity removal parameters. Since the cost of evaluating the preset parameters is too high when conducting experiments directly on the pre-processing and impurity removal equipment, the embodiment of the present application uses a pre-processing and impurity removal index predictor to evaluate the effect of impurity removal under the preset impurity removal parameters, which serves as a basis for optimizing the preset impurity removal parameters.

[0057] The pretreatment impurity removal index predictor is used to predict and obtain the predicted pretreatment impurity removal index based on preset impurity removal parameters and parameters of the gas to be processed.

[0058] Among them, the preset impurity removal parameters are pre-set parameters of the pretreatment impurity removal equipment, including gas flow rate (such as 50-150 mL / min), temperature (such as 10-25°C), gas pressure (such as 0.1-0.5 MPa), etc.

[0059] The parameters of the gas to be treated are the water vapor content (e.g. 100-10000ppm) and the carbon dioxide concentration (e.g. 100-5000ppm) in the gas to be treated.

[0060] The predicted pretreatment impurity removal index is a predicted pretreatment impurity removal index of the gas (i.e., primary gas) after pretreatment and impurity removal under the above-mentioned preset impurity removal parameters and parameters of the gas to be treated, and is used to measure the effect of pretreatment and impurity removal. The predicted pretreatment impurity removal index mainly includes the dew point value (e.g., -20°C to -80°C) and carbon dioxide concentration (e.g., 10-1000ppm) of the gas after pretreatment and impurity removal.

[0061] The parameters of the gas to be processed and the preset impurity removal parameters are input into the pretreatment impurity removal index predictor, and the predicted pretreatment impurity removal index can be output.

[0062] To evaluate the preset impurity removal parameters using the preprocessing impurity removal index predictor, you first need to prepare data for training the preprocessing impurity removal index predictor. This data consists of historical preprocessing impurity removal data, including parameters of the gas to be processed, preset impurity removal parameters, and preprocessing impurity removal indices after preprocessing impurities removal under these two conditions. This historical preprocessing impurity removal data should consist of no fewer than 1,000 items, divided into training, validation, and test sets in an 8:1:1 ratio.

[0063] According to the aforementioned prediction task type, a gradient boosting tree regression is selected to build a preprocessing and impurity removal index predictor. Its main structure includes: a shared feature layer and a dual-task output; the shared feature layer is used to process the input parameters; in the dual-task output, branch 1 is used to predict the dew point value, and branch 2 is used to predict the carbon dioxide concentration.

[0064] In constructing the preprocessing and impurity removal predictor, the number of trees was set to 200 to balance accuracy and efficiency; the tree depth was set to 5 layers to control complexity and avoid overfitting; the learning rate was set to 0.1, with a moderate step size to ensure convergence speed; the subsampling ratio was set to 0.8, randomly sampling 80% of the data to train each tree; and the feature sampling ratio was set to 0.7, randomly selecting 70% of the features to build the tree. The loss function for dew point prediction used the root mean square error (RMSE); the loss function for carbon dioxide concentration prediction used the mean absolute error (MAE).

[0065] In the training of the pre-processing impurity removal index predictor, if there is no improvement in the validation error for 10 consecutive rounds, the training is stopped; the maximum number of iterations is set to 1000 rounds; the convergence criterion is the validation set RMSE, where the dew point is ≤1.5℃ and the carbon dioxide concentration is ≤5ppm. When the convergence criterion is reached, the pre-processing impurity removal index predictor is judged to have converged, and the pre-processing impurity removal index predictor is obtained.

[0066] Input the pretreatment impurity removal index predictor into the gas parameters to be treated and the preset impurity removal parameters. For example, if the preset impurity removal parameters are a gas flow rate of 80 mL / min, a temperature of 23°C, and a gas pressure of 0.30 MPa, and the gas parameters to be treated are a water vapor content of 6000 ppm and a carbon dioxide concentration of 3000 ppm, the predicted pretreatment impurity removal index will be output as a dew point of -40°C and a carbon dioxide concentration of 300 ppm.

[0067] Furthermore, it is necessary to calculate and obtain the prediction pretreatment evaluation index according to the predefined pre-impurity removal evaluation rules.

[0068] For example, the calculation method of the prediction pretreatment evaluation index can be prediction treatment evaluation index = α × dew point score + β × carbon dioxide score. α and β are weight coefficients, which can be set to α = 0.6 and β = 0.4 (in this case, the dew point has a higher weight value and a greater impact on the score).

[0069] The dew point score can be calculated as follows: 1 point for a predicted dew point ≤ -60°C, with 0.025 points deducted for every 1°C increase in dew point, until the score reaches 0. The CO2 concentration score can be calculated as follows: 1 point for a predicted CO2 concentration ≤ 50 ppm, with 0.1 points deducted for every 100 ppm increase in CO2 concentration, until the score reaches 0. For example, if the dew point score is 0.95 and the CO2 score is 0.85, the final predicted treatment evaluation index = 0.95 × 0.6 + 0.85 × 0.4 = 0.91.

[0070] The above prediction and processing evaluation index calculation method is only an example. The weights and scoring rules in the specific implementation process can be adjusted according to actual operation requirements and equipment conditions.

[0071] In step S200 of the embodiment of the present application, if the predicted pretreatment evaluation index is greater than or equal to the index threshold, the pretreatment impurity removal equipment is adjusted according to the preset impurity removal parameters, the gas to be treated is passed into the pretreatment impurity removal equipment to obtain the primary gas, and the gas is tested to obtain the primary gas parameters, including:

[0072] According to a predefined pre-impurity removal evaluation rule, a plurality of historical pre-processing impurity removal indicators are processed to obtain a plurality of historical pre-processing evaluation indexes to form a historical pre-processing evaluation index set, wherein any one of the historical pre-processing evaluation indexes in the historical pre-processing evaluation index set has a pre-processing impurity removal qualified flag;

[0073] Performing mean processing on the historical preprocessing evaluation index set to obtain the index threshold.

[0074] The pre-impurity removal evaluation rule is the rule described in S100. By directly using the rule, multiple historical pre-impurity removal indicators (i.e., historical pre-impurity removal indicators) in the aforementioned multiple historical pre-impurity removal data can be calculated to obtain multiple historical pre-impurity removal evaluation indexes.

[0075] Furthermore, based on a preset pretreatment impurity removal qualification standard (set according to actual pretreatment impurity removal quality requirements, such as a standard where the dew point after treatment is ≤-40°C and the CO2 concentration is ≤1000ppm), multiple historical pretreatment evaluation indices are screened to select pretreatment evaluation indices whose corresponding pretreatment impurity removal indicators meet the aforementioned pretreatment impurity removal qualification standard, thereby obtaining a set of historical pretreatment evaluation indices. In the set of historical pretreatment evaluation indices thus obtained, the pretreatment impurity removal indicators corresponding to each pretreatment evaluation index meet the aforementioned pretreatment impurity removal qualification standard, that is, any historical pretreatment evaluation index in the set of historical pretreatment evaluation indices has a pretreatment impurity removal qualification mark.

[0076] Furthermore, the index threshold value may be obtained by calculating an average value (eg, 0.8) of the historical preprocessing evaluation indexes with a preprocessing impurity removal qualified mark in the historical preprocessing evaluation index set.

[0077] In step S200 of the embodiment of the present application, if the predicted pretreatment evaluation index is greater than or equal to the index threshold, the pretreatment impurity removal equipment is adjusted according to the preset impurity removal parameters, the gas to be treated is passed into the pretreatment impurity removal equipment to obtain the primary gas, and the gas is tested to obtain the primary gas parameters. The method also includes, if the predicted pretreatment evaluation index is less than the index threshold, adjusting and optimizing the preset impurity removal parameters, calculating the predicted pretreatment evaluation index, until the obtained predicted pretreatment evaluation index is greater than or equal to the index threshold, and the specific steps are as follows:

[0078] Randomly generate multiple alternative preset impurity removal parameters;

[0079] According to multiple candidate preset impurity removal parameters and parameters of the gas to be treated, a pretreatment impurity removal index predictor is used to predict multiple predicted pretreatment impurity removal indices, and multiple candidate pretreatment evaluation indices are further calculated;

[0080] Selecting the candidate preprocessing evaluation index with the largest value from the plurality of candidate preprocessing evaluation indexes as the better prediction preprocessing evaluation index;

[0081] When the better prediction preprocessing evaluation index is greater than or equal to the index threshold, the alternative preset impurity removal parameter corresponding to the better prediction preprocessing evaluation index is set as the preset impurity removal parameter;

[0082] When the better prediction preprocessing evaluation index is less than the index threshold, repeat the above steps until the better prediction preprocessing evaluation index is greater than or equal to the index threshold;

[0083] The pretreatment impurity removal equipment is adjusted according to the preset impurity removal parameters, the gas to be treated is passed into the pretreatment impurity removal equipment to obtain the first-level gas, and the gas is tested to obtain the first-level gas parameters.

[0084] In the embodiment of the present application, if the predicted pretreatment evaluation index is less than the index threshold, it means that the preset impurity removal parameters cannot meet the impurity removal requirements of the gas to be treated, and the preset impurity removal parameters need to be adjusted and optimized.

[0085] First, multiple candidate preset impurity removal parameters need to be randomly generated. These candidate preset impurity removal parameters should be generated within a reasonable parameter range. This reasonable parameter range refers to the reasonable parameter setting range explored by those skilled in the art (i.e., users) during the use of the pretreatment impurity removal equipment. For example, the reasonable parameter range for the gas flow rate parameter can be set to 50-150 mL / min; the temperature parameter can be set to 10-25°C; the gas pressure parameter can be set to 0.1-0.5 MPa, and so on.

[0086] Next, multiple groups (e.g., 50 groups) of different parameter combinations are randomly generated, which are the alternative preset impurity removal parameters, for example: combination 1, flow rate 100 mL / min, temperature 25°C, pressure 0.3 MPa; combination 2, flow rate 130 mL / min, temperature 22°C, pressure 0.4 MPa, and so on.

[0087] Then, the multiple sets (e.g., 50 sets) of candidate pretreatment evaluation indices are simultaneously input into a pretreatment impurity removal index predictor along with the gas parameters to be treated (water vapor content, carbon dioxide concentration). The predicted pretreatment impurity removal index corresponding to each set of parameters, such as (dew point value -58°C, carbon dioxide concentration 60 ppm), is output as a plurality of predicted pretreatment impurity removal indices. Based on these multiple predicted pretreatment impurity removal indices and the pretreatment impurity removal evaluation rules defined in the preceding steps, a plurality of candidate pretreatment evaluation indices are calculated. Further calculations are performed to obtain a plurality of candidate pretreatment evaluation indices, such as 0.93, 0.80, and so on.

[0088] Finally, the one with the largest value from the multiple candidate preprocessing evaluation indexes is selected as the better prediction preprocessing evaluation index. For example, if the maximum candidate preprocessing evaluation index is 0.93 and the index threshold is 0.90, 0.93 is selected as the better prediction preprocessing evaluation index, and the candidate preset impurity removal parameter corresponding to the better prediction preprocessing evaluation index is set as the preset impurity removal parameter;

[0089] If the maximum alternative preprocessing evaluation index is 0.88 and the index threshold is 0.90, it is necessary to continue to randomly generate multiple alternative preset impurity removal parameters, repeat the process of calculating to obtain multiple predicted preprocessing impurity removal indicators, calculating to obtain multiple alternative preprocessing evaluation indices, selecting a better predicted preprocessing evaluation index and comparing it with the index threshold, until the better predicted preprocessing evaluation index is greater than or equal to the index threshold, and set the alternative preset impurity removal parameter corresponding to the better predicted preprocessing evaluation index whose predicted preprocessing evaluation index is greater than or equal to the index threshold as the preset impurity removal parameter.

[0090] The pretreatment and impurity removal equipment is adjusted according to preset impurity removal parameters, and the gas to be treated is passed through the pretreatment and impurity removal equipment to obtain primary gas. This gas is then tested to determine the primary gas parameters. The primary gas parameters primarily include krypton gas concentration and impurity gas concentrations, with the impurity gas concentrations primarily representing oxygen and nitrogen concentrations. Methods for testing these primary gas parameters are well known in the art and will not be further described here.

[0091] In step S300 of the embodiment of the present application, the primary gas parameters are processed by a primary enrichment parameter optimizer to obtain primary enrichment parameters, the primary enrichment equipment is adjusted according to the primary enrichment parameters, the primary gas is subjected to primary enrichment to obtain secondary gas, and detection is performed to obtain secondary gas parameters, including:

[0092] Obtaining primary gas parameters of the primary gas after pretreatment and impurity removal;

[0093] Call the trained first-level enrichment parameter generator, input the first-level gas parameters, and then output the first-level enrichment parameters;

[0094] Adjusting the first-stage enrichment equipment according to the first-stage enrichment parameters to perform first-stage enrichment to obtain the second-stage gas;

[0095] The secondary gas is detected to obtain the secondary gas parameters.

[0096] In the embodiment of the present application, the primary enrichment is performed by using a primary enrichment device to adsorb krypton gas and some impurities such as oxygen and nitrogen at an adsorption temperature (such as -105°C to -95°C) using activated carbon, and then the temperature is raised to a decomposition temperature (such as -10°C to 10°C). Compared with krypton, oxygen and nitrogen are more volatile due to their lower boiling points (oxygen -183°C, nitrogen -195.8°C, krypton -153.4°C), and are preferentially desorbed from the surface of the activated carbon. Krypton gas has a higher boiling point and is stronger and requires higher energy to decompose. At this time, a certain amount of helium (such as 20-50 mL / min) is used for purging to remove the desorbed oxygen and nitrogen impurities, while retaining the krypton gas in the activated carbon. Finally, the high-concentration krypton gas is released by further heating to achieve preliminary purification of the krypton gas, that is, the primary enrichment.

[0097] In order to further improve the enrichment efficiency of krypton gas in the first-level enrichment, in the embodiment of the present application, the first-level gas parameters of the first-level gas after pretreatment and impurity removal are called to generate the first-level enrichment parameters that are most suitable for the first-level gas, so as to maximize the first-level enrichment efficiency.

[0098] Among them, the primary enrichment parameters include adsorption temperature, desorption temperature, helium purge flow rate and other core parameters in the primary enrichment process.

[0099] In step S300 of the embodiment of the present application, the process of building the primary enrichment parameter generator includes:

[0100] Collect multiple first-level gas parameters and multiple first-level enrichment parameters for first-level enrichment within a historical period to obtain a first-level enrichment historical parameter set;

[0101] Collecting first-level enrichment effect parameters corresponding to multiple first-level enrichment historical parameters to obtain a first-level enrichment effect parameter set;

[0102] The first-level enrichment history parameter set and the first-level enrichment effect parameter set are used to perform supervised training on a first-level enrichment parameter generator, and the first-level enrichment parameter generator is called after test convergence.

[0103] In the embodiment of the present application, the first-level enrichment parameter generator is used to provide the first-level enrichment parameters with the best first-level enrichment effect according to the first-level gas parameters, that is, by inputting the first-level gas parameters, the first-level enrichment parameters can be output.

[0104] To achieve the above effect, it is first necessary to collect the data used to train the first-level enrichment parameter generator, that is, the first-level enrichment historical parameter set. The first-level enrichment historical parameter set should include multiple first-level gas parameters of the first-level gas that has been enriched in a historical period (such as within 3 years); and multiple first-level enrichment parameters for the aforementioned multiple first-level gas parameters; and the first-level enrichment effect parameters obtained by gas detection after enriching the multiple first-level gases under the aforementioned multiple first-level enrichment parameter conditions. Collect no less than 1,000 sets of first-level enrichment historical parameters as the first-level enrichment historical parameter set, and collect the first-level enrichment effect parameter set corresponding to the first-level enrichment historical parameter set. Divide the data of the above-mentioned first-level enrichment historical parameter set and the first-level enrichment effect parameter set into training set, validation set, and test set in a ratio of 8:1:1 as the training data for the first-level enrichment parameter generator.

[0105] The primary enrichment performance parameters primarily include krypton recovery rate (e.g., 95%) and residual impurities (i.e., the total residual nitrogen and oxygen content, e.g., 500 ppm). During the primary enrichment process, krypton gas in the gas after primary enrichment will be lost due to factors such as activated carbon adsorption and evaporation during the purge process. The krypton recovery rate is an indicator measuring the extent of this loss: krypton recovery rate = krypton content in the gas after primary enrichment / krypton content in the gas before primary enrichment * 100%.

[0106] In the construction of the first-level enrichment parameter generator, since it is necessary to deal with the nonlinear mapping relationship between the first-level gas parameters (krypton concentration, oxygen concentration, nitrogen concentration) and the first-level enrichment effect parameters (krypton recovery rate, impurity residue), gradient boosting tree regression can be selected to build the first-level enrichment parameter generator.

[0107] In constructing the first-level enrichment parameter generator, the number of trees was set to 300 to balance accuracy and computational efficiency. The maximum depth of each tree was set to 5 layers to control model complexity and avoid overfitting. The learning rate was set to 0.1 to ensure convergence stability. The subsampling ratio was set to 0.8, randomly selecting 80% of the samples for training each time to enhance model generalization. The feature sampling ratio was set to 0.7, randomly selecting 70% of the features each time to reduce the impact of feature correlation. The root mean square error (RMSE) was used as the loss function.

[0108] In the training of the first-level enrichment parameter generator, the maximum number of iterations was set to 1000, and the training was terminated early if the validation set loss did not decrease for 10 consecutive rounds. The convergence criteria were that the krypton recovery rate prediction error was ≤2% (e.g., the prediction was 96%, and the actual was 94%-98%); when the impurity residue prediction error was ≤10% (e.g., the prediction was 4500ppm, and the actual was 4050-4950ppm), the convergence was judged and the first-level enrichment parameter generator was obtained.

[0109] Input the primary gas parameters (such as krypton 25ppm, oxygen 3500ppm, nitrogen 6000ppm) into the primary enrichment parameter generator, and the primary enrichment parameters (such as adsorption temperature: -103℃, desorption temperature: -5℃, helium purge flow: 35mL / min) will be output.

[0110] Finally, according to the first-level enrichment parameters of the first-level enrichment parameter generator, the first-level enrichment equipment is adjusted to perform first-level enrichment to obtain the second-level gas; and then the second-level gas is detected to obtain the second-level gas parameters.

[0111] Among them, the secondary gas parameters are the krypton concentration (unit: ppm) and the residual impurities in the secondary gas. The residual impurities are the total residual amounts of nitrogen and oxygen, such as 500 ppm.

[0112] In step S400 of the embodiment of the present application, a secondary enrichment difficulty assessment is performed based on the secondary gas parameters to obtain a secondary enrichment difficulty coefficient in order to quantify the difficulty of further enriching the secondary gas and configure the secondary enrichment parameters based on this.

[0113] In the embodiments of this application, secondary enrichment is based on a secondary enrichment device. Using the extremely low temperature conditions of a liquid nitrogen environment (below -196°C), krypton gas from the secondary gas after primary enrichment is introduced into the secondary enrichment device for secondary adsorption concentration. During this process, krypton gas is deeply adsorbed due to stronger interactions between its molecules and the adsorbent in the secondary enrichment device (e.g., van der Waals forces), while oxygen and nitrogen adsorb less. When the temperature is raised to 0°C, oxygen and nitrogen preferentially desorb from the adsorbent surface as gases due to their lower adsorption energies and lower boiling points. At this point, helium is introduced to purge the gas, removing the previously desorbed oxygen and nitrogen impurities while temporarily retaining the krypton gas in the adsorbent. Ultimately, by controlling the conditions, high-purity krypton gas is desorbed, achieving secondary enrichment.

[0114] In the embodiment of the present application, the secondary enrichment difficulty coefficient can be calculated as follows: secondary enrichment difficulty coefficient = krypton concentration weight × krypton concentration difficulty + impurity residue weight × impurity residue difficulty. The krypton concentration difficulty is the ratio of the ideal krypton concentration to the actual concentration (e.g., if the ideal krypton concentration is 1000ppm and the actual krypton concentration is 200ppm, the difficulty is 5); the impurity residue difficulty is the ratio of the actual impurity residue to the ideal residue (e.g., if the ideal impurity residue is 100ppm and the actual impurity residue is 500ppm, the difficulty is 5).

[0115] In terms of weight setting, the krypton gas concentration weight can be 0.6, and the impurity residue weight can be 0.4 (because the impurity residue has a greater impact on subsequent processes).

[0116] For example, when the krypton concentration is 200ppm and the impurity residue is 500ppm, the krypton concentration difficulty = 1000ppm / 200ppm = 5; the impurity residue difficulty = 500ppm / 100ppm = 5; the secondary enrichment difficulty coefficient = 0.6*5+0.4*5=5.

[0117] In step S500 of the embodiment of the present application, the secondary enrichment parameters are calculated based on the secondary enrichment difficulty coefficient, the secondary enrichment equipment is adjusted based on the secondary enrichment parameters, and the secondary gas is secondary enriched to obtain the separated gas, including:

[0118] When the secondary enrichment difficulty coefficient is less than a preset secondary enrichment difficulty coefficient threshold, the secondary enrichment equipment is adjusted using energy-saving parameters to perform secondary enrichment to obtain separated gas;

[0119] When the secondary enrichment difficulty coefficient is greater than or equal to the preset secondary enrichment difficulty coefficient threshold, the secondary enrichment equipment is adjusted using the applicable step enhancement parameters to perform secondary enrichment and obtain separated gas; wherein the step enhancement parameters are divided using an enhancement parameter classifier.

[0120] In the embodiment of the present application, in order to comprehensively consider the energy-saving effect and enrichment efficiency in the secondary enrichment process, different enrichment strategies are adopted for secondary gases with different difficulty coefficients. Specifically, by setting an enrichment difficulty threshold, when the secondary enrichment difficulty coefficient of the secondary gas is less than the preset secondary enrichment difficulty coefficient threshold, the energy-saving parameters are applied to adjust the secondary enrichment equipment, and secondary enrichment is performed; when the secondary enrichment difficulty coefficient is greater than or equal to the preset secondary enrichment difficulty coefficient threshold, the step-enhancement parameters are selected to adjust the secondary enrichment equipment, and secondary enrichment is performed to obtain separated gas;

[0121] The energy-saving parameters and step-enhancement parameters are used to adjust the secondary enrichment equipment, namely the secondary enrichment parameters. Specific parameters include liquid nitrogen temperature (°C), adsorption time (min), helium flow rate (mL / min), etc.

[0122] Among them, the energy-saving parameter is a secondary enrichment parameter with low energy consumption while ensuring the secondary enrichment efficiency.

[0123] A specific acquisition method can be to collect secondary enrichment parameters and secondary gas parameters in multiple secondary enrichment processes during the secondary enrichment process in historical time, as well as the secondary enrichment efficiency and secondary enrichment energy consumption (power consumption, kWh) of enriching the secondary gas under the corresponding secondary enrichment parameters, to obtain multiple groups (no less than 1000 groups) of historical energy-saving parameters.

[0124] Next, parameter combinations with an enrichment efficiency lower than a preset enrichment efficiency value (e.g., 5) from the historical energy-saving parameters are eliminated to obtain a set of candidate energy-saving parameters. This step is used to eliminate candidate energy-saving parameters with excessively low secondary enrichment efficiencies, thereby balancing energy-saving effects and secondary enrichment efficiency. The preset enrichment efficiency value can be determined based on actual energy-saving needs.

[0125] Among them, the aforementioned secondary enrichment efficiency can be measured based on the impurity removal rate and krypton concentration multiple.

[0126] Impurity removal rate = (1-residual impurity amount after secondary enrichment / residual impurity amount after primary enrichment) * 100%. For example, if the residual impurity amount after primary enrichment is 500ppm, the residual impurity amount after secondary enrichment needs to be reduced to 100ppm, so the impurity removal rate is (1-100 / 500) × 100% = 80%).

[0127] The krypton concentration factor is the ratio of the krypton concentration in the secondary enriched gas (separated gas) to the krypton concentration in the secondary gas. Specifically, krypton concentration factor = krypton concentration in the secondary enriched gas / krypton concentration in the secondary gas. For example, if the krypton concentration in the secondary gas is 100 ppm (volume ratio), and the krypton concentration in the secondary enriched gas is increased to 1000 ppm, the krypton concentration factor is 1000 ppm / 100 ppm = 10 times.

[0128] The secondary enrichment efficiency can be calculated by multiplying the impurity removal rate by the krypton concentration factor. For example, secondary enrichment efficiency = impurity removal rate 80% (0.8) × concentration factor 10 = 8. This value can be used as a relative efficiency indicator; a larger value indicates a better overall effect.

[0129] Furthermore, in the aforementioned energy-saving parameter candidate set, the parameters with the same secondary enrichment parameters in each group of energy-saving parameter candidate parameters are classified as the same family parameters, and the average energy consumption of each family parameter in each family is calculated (for example, if there are three families of parameters, the average energy consumption is 120kWh, 180kWh, and 140kWh respectively).

[0130] Next, the secondary enrichment parameters (such as liquid nitrogen temperature -196°C, adsorption time 30min, helium flow rate 15mL / min) corresponding to a family of parameters with the lowest average energy consumption (such as 120kWh) are used as energy-saving parameters, and the minimum value (such as 6.0) of the enrichment difficulty coefficient corresponding to each group of energy-saving parameter alternative parameters in the family of parameters (obtained by calculating the secondary gas parameters in the energy-saving parameter alternative parameters) is used as the secondary enrichment difficulty coefficient threshold. The maximum value of the secondary enrichment efficiency corresponding to each group of energy-saving parameter alternative parameters in the family of parameters is set as the step enhancement parameter efficiency threshold (such as 5.0). That is, when selecting the step enhancement parameter, the lowest value of the secondary enrichment efficiency of the alternative parameter for secondary enrichment in the historical time should not be lower than this value.

[0131] The step enhancement parameter is a secondary enrichment parameter configured for a secondary gas whose secondary enrichment difficulty coefficient is greater than the secondary enrichment difficulty coefficient threshold. The enrichment efficiency under the step enhancement parameter is greater than the energy-saving parameter.

[0132] In step S500 of the embodiment of the present application, when the secondary enrichment difficulty coefficient is greater than or equal to the preset secondary enrichment difficulty coefficient threshold, the step enhancement parameters are selected for secondary enrichment, including:

[0133] Based on the secondary enrichment difficulty coefficient threshold, multiple step enhancement parameters are configured, and the secondary enrichment efficiency of multiple step enhancement parameters increases in sequence;

[0134] Based on the secondary enrichment difficulty coefficient threshold, configure the secondary enrichment difficulty coefficient range equal to the number of step enhancement parameters and establish a corresponding relationship;

[0135] According to the secondary enrichment difficulty coefficient of the gas after primary enrichment, the step enhancement parameter corresponding to the secondary enrichment difficulty coefficient is indexed, and the secondary enrichment is performed with the step enhancement parameter.

[0136] In step S500 of the embodiment of the present application, multiple step enhancement parameters are configured based on the secondary enrichment difficulty coefficient threshold, and the secondary enrichment efficiency of the multiple step enhancement parameters increases in sequence, including:

[0137] Based on historical secondary enrichment data, the energy-saving parameters of secondary enrichment and the secondary enrichment efficiency corresponding to different secondary enrichment parameters are obtained;

[0138] Based on the secondary enrichment efficiency, several secondary enrichment parameters are selected from the secondary enrichment parameters and set as step enhancement parameters. The secondary enrichment efficiencies of multiple step enhancement parameters increase successively; among them, the secondary enrichment efficiencies under the step enhancement parameters are all greater than the secondary enrichment efficiency under the energy-saving parameters.

[0139] In an embodiment of the present application, when the secondary enrichment difficulty coefficient is greater than or equal to the preset secondary enrichment difficulty coefficient threshold, it is necessary to perform step-by-step enhancement of the secondary enrichment parameters. To achieve step-by-step enhancement of the secondary enrichment parameters, it is first necessary to configure multiple step-by-step enhancement parameters based on the secondary enrichment difficulty coefficient threshold. The secondary enrichment difficulty coefficient threshold (such as 6.0) has been obtained through the above steps and will not be repeated here.

[0140] Next, multiple step-by-step enhancement parameters need to be configured based on the secondary enrichment difficulty threshold. During the secondary enrichment process over a historical period, the secondary enrichment parameters and secondary gas parameters are collected from multiple secondary enrichment processes, along with the corresponding secondary enrichment efficiency of the secondary gas parameters under the secondary enrichment parameters, to obtain multiple sets (no less than 1,000 sets) of historical step-by-step enhancement parameters.

[0141] Furthermore, historical step enhancement parameters whose secondary enrichment efficiencies are lower than the step enhancement parameter efficiency threshold (such as 5.0) and whose secondary enrichment difficulty coefficients calculated based on the secondary gas parameters are lower than the secondary enrichment difficulty coefficient threshold (such as 6.0) are eliminated from multiple groups of historical step enhancement parameters, and the remaining historical step enhancement parameters with the same secondary enrichment parameters are divided into parameters of the same family. The average secondary enrichment efficiency of the parameters of the same family in each family is calculated (such as 7.0, 7.5, 8.0, etc.) as the efficiency label of the secondary enrichment parameter. According to the efficiency label, the secondary enrichment parameters in the remaining historical step enhancement parameters are arranged from small to large, and multiple step enhancement parameters are evenly extracted at certain intervals of secondary enrichment efficiency (for example, secondary enrichment parameters with efficiency labels of 7.0, 8.0, and 9.0 are extracted) to obtain multiple step enhancement parameters.

[0142] Next, it is necessary to configure a secondary enrichment difficulty coefficient range with the same number of multiple step enhancement parameters based on the secondary enrichment difficulty coefficient threshold, and establish a corresponding relationship. Specifically, multiple step enhancement parameters are obtained according to the above method, and the applicable secondary enrichment difficulty coefficient range is assigned to the step enhancement parameters. For example, when the secondary enrichment difficulty coefficient is 6.0-8.0, a step enhancement parameter with an efficiency label of 7.0 can be configured for it; when the secondary enrichment difficulty coefficient is 8.0-9.0, a step enhancement parameter with an efficiency label of 8.0 can be configured for it; when the secondary enrichment difficulty coefficient is >9.0, a step enhancement parameter with an efficiency label of 9.0 can be configured for it, and so on.

[0143] Finally, according to the secondary enrichment difficulty coefficient of the gas after primary enrichment (such as 6.5), the step enhancement parameter corresponding to the secondary enrichment difficulty coefficient (such as the step enhancement parameter with an efficiency label of 7.0) is indexed, and secondary enrichment is performed with the step enhancement parameter to obtain separated gas.

[0144] In step S600 of the embodiment of the present application, the separated gas needs to be separated and processed by a chromatographic column to achieve krypton gas separation.

[0145] The diameter of a krypton molecule is approximately 3.9Å, and the diameter of a xenon molecule is approximately 4.4Å. The pore size of the 5Å molecular sieve filled in the chromatographic column is approximately 5Å. Since the krypton molecule is smaller, it can pass through the molecular sieve pores faster, while the xenon molecule is easily "stuck" because its size is close to the pore size, and stays in the chromatographic column longer, thereby achieving elution order separation. The method of separating krypton and xenon using a chromatographic column is an existing technology and will not be repeated here.

[0146] Example 2, as Figure 2 As shown, based on the same inventive concept as the control method for a Kr enrichment and separation device provided in Example 1, an embodiment of the present invention further provides a Kr enrichment and separation device control system, comprising:

[0147] The pretreatment impurity removal module 11 is used to predict the predicted pretreatment impurity removal index of the gas to be treated when the preset impurity removal parameters are executed based on the parameters of the gas to be treated and the historical pretreatment impurity removal data, process the predicted pretreatment impurity removal index according to the predefined pretreatment impurity removal evaluation rules, and obtain a predicted pretreatment evaluation index; if the predicted pretreatment evaluation index is greater than or equal to the index threshold, adjust the pretreatment impurity removal equipment according to the preset impurity removal parameters, pass the gas to be treated into the pretreatment impurity removal equipment to obtain the first-level gas, and perform testing to obtain the first-level gas parameters; if the predicted pretreatment evaluation index is less than the index threshold, adjust and optimize the preset impurity removal parameters until the predicted pretreatment evaluation index is greater than or equal to the index threshold;

[0148] a primary enrichment module 12, configured to process the primary gas parameters through a primary enrichment parameter optimizer to obtain primary enrichment parameters, adjust the primary enrichment equipment according to the primary enrichment parameters, perform primary enrichment on the primary gas to obtain secondary gas, and perform detection to obtain secondary gas parameters;

[0149] A secondary enrichment module 13 performs a secondary enrichment difficulty assessment based on the secondary gas parameters to obtain a secondary enrichment difficulty coefficient, calculates a secondary enrichment parameter based on the secondary enrichment difficulty coefficient, adjusts a secondary enrichment device based on the secondary enrichment parameter, and performs secondary enrichment on the secondary gas to obtain a separated gas.

[0150] The gas separation module 14 separates and processes the separated gas through a chromatographic column to achieve Kr separation.

[0151] Furthermore, the pre-processing and impurity removal module 11 includes the following execution steps:

[0152] Acquire historical pretreatment impurity removal data, calculate historical pretreatment evaluation indexes, and obtain a historical pretreatment evaluation index set, wherein the historical pretreatment impurity removal data includes historical to-be-processed gas parameters, historical preset impurity removal parameters, and historical pretreatment impurity removal indicators;

[0153] Based on historical pre-processing and impurity removal data, a pre-processing and impurity removal indicator predictor is trained;

[0154] According to the parameters of the gas to be treated and the preset impurity removal parameters, the predicted pretreatment impurity removal index is predicted by a pre-trained pretreatment impurity removal index predictor, and the predicted pretreatment evaluation index is calculated according to the predefined pretreatment impurity removal evaluation rules.

[0155] According to a predefined pre-impurity removal evaluation rule, a plurality of historical pre-processing impurity removal indicators are processed to obtain a plurality of historical pre-processing evaluation indexes to form a historical pre-processing evaluation index set, wherein any one of the historical pre-processing evaluation indexes in the historical pre-processing evaluation index set has a pre-processing impurity removal qualified flag;

[0156] Performing mean processing on the historical preprocessing evaluation index set to obtain the index threshold.

[0157] Randomly generate multiple alternative preset impurity removal parameters;

[0158] According to multiple candidate preset impurity removal parameters and parameters of the gas to be treated, a pretreatment impurity removal index predictor is used to predict multiple predicted pretreatment impurity removal indices, and multiple candidate pretreatment evaluation indices are further calculated;

[0159] Selecting the candidate preprocessing evaluation index with the largest value from the plurality of candidate preprocessing evaluation indexes as the better prediction preprocessing evaluation index;

[0160] When the better prediction preprocessing evaluation index is greater than or equal to the index threshold, the alternative preset impurity removal parameter corresponding to the better prediction preprocessing evaluation index is set as the preset impurity removal parameter;

[0161] When the better prediction preprocessing evaluation index is less than the index threshold, repeat the above steps until the better prediction preprocessing evaluation index is greater than or equal to the index threshold;

[0162] The pretreatment impurity removal equipment is adjusted according to the preset impurity removal parameters, the gas to be treated is passed into the pretreatment impurity removal equipment to obtain the first-level gas, and the gas is tested to obtain the first-level gas parameters.

[0163] Furthermore, the primary enrichment module 12 includes the following steps:

[0164] Obtaining primary gas parameters of the primary gas after pretreatment and impurity removal;

[0165] Call the trained first-level enrichment parameter generator, input the first-level gas parameters, and then output the first-level enrichment parameters;

[0166] Adjusting the first-stage enrichment equipment according to the first-stage enrichment parameters to perform first-stage enrichment to obtain the second-stage gas;

[0167] The secondary gas is detected to obtain the secondary gas parameters.

[0168] Furthermore, the secondary enrichment module 13 includes the following steps:

[0169] Collect multiple first-level gas parameters and multiple first-level enrichment parameters for first-level enrichment within a historical period to obtain a first-level enrichment historical parameter set;

[0170] Collecting first-level enrichment effect parameters corresponding to multiple first-level enrichment historical parameters to obtain a first-level enrichment historical effect parameter set;

[0171] The first-level enrichment parameter generator is supervised and trained using the first-level enrichment history parameter set and the first-level enrichment history effect parameter set, and the first-level enrichment parameter generator is called after test convergence.

[0172] When the secondary enrichment difficulty coefficient is less than a preset secondary enrichment difficulty coefficient threshold, the secondary enrichment equipment is adjusted using energy-saving parameters to perform secondary enrichment to obtain separated gas;

[0173] When the secondary enrichment difficulty coefficient is greater than or equal to the preset secondary enrichment difficulty coefficient threshold, the secondary enrichment equipment is adjusted using the applicable step enhancement parameters to perform secondary enrichment and obtain separated gas; wherein the step enhancement parameters are divided using an enhancement parameter classifier.

[0174] Based on the secondary enrichment difficulty coefficient threshold, multiple step enhancement parameters are configured, and the secondary enrichment efficiency of multiple step enhancement parameters increases in sequence;

[0175] Based on the secondary enrichment difficulty coefficient threshold, configure the secondary enrichment difficulty coefficient range equal to the number of step enhancement parameters and establish a corresponding relationship;

[0176] According to the secondary enrichment difficulty coefficient of the gas after primary enrichment, the step enhancement parameter corresponding to the secondary enrichment difficulty coefficient is indexed, and the secondary enrichment is performed with the step enhancement parameter.

[0177] Based on historical secondary enrichment data, the energy-saving parameters of secondary enrichment and the secondary enrichment efficiency corresponding to different secondary enrichment parameters are obtained;

[0178] Based on the secondary enrichment efficiency, several secondary enrichment parameters are selected from the secondary enrichment parameters and set as step enhancement parameters. The secondary enrichment efficiencies of multiple step enhancement parameters increase successively; among them, the secondary enrichment efficiencies under the step enhancement parameters are all greater than the secondary enrichment efficiency under the energy-saving parameters.

[0179] It should be noted that, in the above embodiments, the description of each embodiment has its own focus. For parts that are not described in detail in a certain embodiment, reference can be made to the relevant description of other embodiments.

[0180] Those skilled in the art will appreciate that embodiments of the present invention may be provided as methods, systems, or computer program products. Thus, the present invention may take the form of an entirely hardware embodiment, an entirely software embodiment, or an embodiment combining software and hardware aspects. Furthermore, the present invention may take the form of a computer program product implemented on one or more computer-usable storage media (including but not limited to magnetic disk storage, CD-ROM, optical storage, etc.) containing computer-usable program code.

[0181] The present invention is described with reference to flowcharts and / or block diagrams of methods, devices (systems), and computer program products according to embodiments of the present invention. It should be understood that each process and / or block in the flowcharts and / or block diagrams, as well as combinations of processes and / or blocks in the flowcharts and / or block diagrams, can be implemented by computer program instructions. These computer program instructions can be provided to a processor of a general-purpose computer, a special-purpose computer, an embedded computer, or other programmable data processing device to produce a machine, so that the instructions executed by the processor of the computer or other programmable data processing device generate instructions for implementing the processes in the flowcharts and / or block diagrams. Figure 1 a process or multiple processes and / or boxes Figure 1 A device that provides the functions specified in a block or multiple blocks.

[0182] These computer program instructions may also be stored in a computer readable memory that can direct a computer or other programmable data processing device to work in a specific manner, so that the instructions stored in the computer readable memory produce an article of manufacture comprising an instruction device, which implements the process Figure 1 a process or multiple processes and / or boxes Figure 1 The function specified in one or more boxes.

[0183] These computer program instructions can also be loaded onto a computer or other programmable data processing device so that a series of operational steps are executed on the computer or other programmable device to produce a computer-implemented process, thereby providing the instructions executed on the computer or other programmable device for implementing the process. Figure 1 a process or multiple processes and / or boxes Figure 1 A step that specifies a function in one or more boxes.

[0184] Although preferred embodiments of the present invention have been described, additional changes and modifications to these embodiments may occur to those skilled in the art once the basic inventive concepts become known.

[0185] Obviously, those skilled in the art can make various changes and modifications to the present invention without departing from the spirit and scope of the present invention. Thus, if these modifications and variations of the present invention fall within the scope of the present invention and its equivalents, the present invention is also intended to include these modifications and variations.

Claims

1. A Kr enrichment and separation equipment control method, characterized in that: Applied to Kr enrichment and separation equipment, including: Based on the parameters of the gas to be processed and historical pretreatment impurity removal data, a predicted pretreatment impurity removal index of the gas to be processed when the preset impurity removal parameters are executed is predicted, and according to predefined pretreatment impurity removal evaluation rules, the predicted pretreatment impurity removal index is processed to obtain a predicted pretreatment evaluation index; If the predicted pretreatment evaluation index is greater than or equal to the index threshold, the pretreatment impurity removal equipment is adjusted according to the preset impurity removal parameters, the gas to be treated is passed through the pretreatment impurity removal equipment to obtain primary gas, and the gas is tested to obtain primary gas parameters; Processing the primary gas parameters by a primary enrichment parameter optimizer to obtain primary enrichment parameters, adjusting the primary enrichment equipment according to the primary enrichment parameters, performing primary enrichment on the primary gas to obtain secondary gas, and performing detection to obtain secondary gas parameters; performing a secondary enrichment difficulty assessment according to the secondary gas parameters to obtain a secondary enrichment difficulty coefficient; Calculating and obtaining secondary enrichment parameters according to the secondary enrichment difficulty coefficient, adjusting the secondary enrichment equipment according to the secondary enrichment parameters, and performing secondary enrichment on the secondary gas to obtain separated gas; The separated gas is separated and processed by a chromatographic column to achieve Kr separation.

2. A Kr enrichment and separation equipment control method according to claim 1, characterized in that: Based on the parameters of the gas to be treated and historical pretreatment impurity removal data, the predicted pretreatment impurity removal index of the gas to be treated when the preset impurity removal parameters are executed is predicted. According to the predefined pretreatment impurity removal evaluation rules, the predicted pretreatment impurity removal index is processed to obtain the predicted pretreatment evaluation index, including: Acquire historical pretreatment impurity removal data, calculate historical pretreatment evaluation indexes, and obtain a historical pretreatment evaluation index set, wherein the historical pretreatment impurity removal data includes historical to-be-processed gas parameters, historical preset impurity removal parameters, and historical pretreatment impurity removal indicators; Based on historical pre-processing and impurity removal data, a pre-processing and impurity removal indicator predictor is trained; According to the parameters of the gas to be treated and the preset impurity removal parameters, the predicted pretreatment impurity removal index is predicted by a pre-trained pretreatment impurity removal index predictor, and the predicted pretreatment evaluation index is calculated according to the predefined pretreatment impurity removal evaluation rules.

3. A Kr enrichment and separation equipment control method according to claim 1, characterized in that: If the predicted pretreatment evaluation index is greater than or equal to the index threshold, the pretreatment impurity removal equipment is adjusted according to the preset impurity removal parameters, the gas to be treated is passed through the pretreatment impurity removal equipment to obtain primary gas, and the gas is tested to obtain primary gas parameters, including: According to a predefined pre-impurity removal evaluation rule, a plurality of historical pre-processing impurity removal indicators are processed to obtain a plurality of historical pre-processing evaluation indexes to form a historical pre-processing evaluation index set, wherein any one of the historical pre-processing evaluation indexes in the historical pre-processing evaluation index set has a pre-processing impurity removal qualified flag; Performing mean processing on the historical preprocessing evaluation index set to obtain the index threshold.

4. A Kr enrichment and separation equipment control method according to claim 1, characterized in that: If the predicted pretreatment evaluation index is greater than or equal to the index threshold, the pretreatment impurity removal equipment is adjusted according to the preset impurity removal parameters, the gas to be treated is passed into the pretreatment impurity removal equipment to obtain the first-level gas, and the gas is tested to obtain the first-level gas parameters. The method also includes: if the predicted pretreatment evaluation index is less than the index threshold, the preset impurity removal parameters are adjusted and optimized, and the predicted pretreatment evaluation index is calculated until the obtained predicted pretreatment evaluation index is greater than or equal to the index threshold. The specific steps are: Randomly generate multiple alternative preset impurity removal parameters; According to multiple candidate preset impurity removal parameters and parameters of the gas to be treated, a pretreatment impurity removal index predictor is used to predict multiple predicted pretreatment impurity removal indices, and multiple candidate pretreatment evaluation indices are further calculated; Selecting the candidate preprocessing evaluation index with the largest value from the plurality of candidate preprocessing evaluation indexes as the better prediction preprocessing evaluation index; When the better prediction preprocessing evaluation index is greater than or equal to the index threshold, the alternative preset impurity removal parameter corresponding to the better prediction preprocessing evaluation index is set as the preset impurity removal parameter; When the better prediction preprocessing evaluation index is less than the index threshold, repeat the above steps until the better prediction preprocessing evaluation index is greater than or equal to the index threshold; The pretreatment impurity removal equipment is adjusted according to the preset impurity removal parameters, the gas to be treated is passed into the pretreatment impurity removal equipment to obtain the first-level gas, and the gas is tested to obtain the first-level gas parameters.

5. A Kr enrichment and separation equipment control method according to claim 1, characterized in that: Processing the primary gas parameters by a primary enrichment parameter optimizer to obtain primary enrichment parameters, adjusting the primary enrichment equipment according to the primary enrichment parameters, performing primary enrichment on the primary gas to obtain secondary gas, and performing detection to obtain secondary gas parameters, including: Obtaining primary gas parameters of the primary gas after pretreatment and impurity removal; Call the trained first-level enrichment parameter generator, input the first-level gas parameters, and then output the first-level enrichment parameters; Adjusting the first-stage enrichment equipment according to the first-stage enrichment parameters to perform first-stage enrichment to obtain the second-stage gas; The secondary gas is detected to obtain the secondary gas parameters.

6. A Kr enrichment and separation equipment control method according to claim 5, characterized in that: The process of building the primary enrichment parameter generator includes: Collect multiple first-level gas parameters and multiple first-level enrichment parameters for first-level enrichment within a historical period to obtain a first-level enrichment historical parameter set; Collecting first-level enrichment effect parameters corresponding to multiple first-level enrichment historical parameters to obtain a first-level enrichment historical effect parameter set; The first-level enrichment parameter generator is supervised and trained using the first-level enrichment history parameter set and the first-level enrichment history effect parameter set, and the first-level enrichment parameter generator is called after test convergence.

7. A Kr enrichment and separation equipment control method according to claim 1, characterized in that: According to the secondary enrichment difficulty coefficient, a secondary enrichment parameter is calculated, a secondary enrichment device is adjusted according to the secondary enrichment parameter, and the secondary gas is subjected to secondary enrichment to obtain a separated gas, including: When the secondary enrichment difficulty coefficient is less than a preset secondary enrichment difficulty coefficient threshold, the secondary enrichment equipment is adjusted using energy-saving parameters to perform secondary enrichment to obtain separated gas; When the secondary enrichment difficulty coefficient is greater than or equal to the preset secondary enrichment difficulty coefficient threshold, the secondary enrichment equipment is adjusted using the applicable step enhancement parameters to perform secondary enrichment and obtain separated gas; wherein the step enhancement parameters are divided using an enhancement parameter classifier.

8. A Kr enrichment and separation equipment control method according to claim 7, characterized in that: When the secondary enrichment difficulty coefficient is greater than or equal to the preset secondary enrichment difficulty coefficient threshold, the secondary enrichment is performed using step-by-step enhancement parameters, including: Based on the secondary enrichment difficulty coefficient threshold, multiple step enhancement parameters are configured, and the secondary enrichment efficiency of multiple step enhancement parameters increases in sequence; Based on the secondary enrichment difficulty coefficient threshold, configure the secondary enrichment difficulty coefficient range equal to the number of step enhancement parameters and establish a corresponding relationship; According to the secondary enrichment difficulty coefficient of the gas after primary enrichment, the step enhancement parameter corresponding to the secondary enrichment difficulty coefficient is indexed, and the secondary enrichment is performed with the step enhancement parameter.

9. A Kr enrichment and separation equipment control method according to claim 8, characterized in that: Based on the secondary enrichment difficulty coefficient threshold, multiple step enhancement parameters are configured. The secondary enrichment efficiency of multiple step enhancement parameters increases in sequence, including: Based on historical secondary enrichment data, the energy-saving parameters of secondary enrichment and the secondary enrichment efficiency corresponding to different secondary enrichment parameters are obtained; Based on the secondary enrichment efficiency, several secondary enrichment parameters are selected from the secondary enrichment parameters and set as step enhancement parameters. The secondary enrichment efficiencies of multiple step enhancement parameters increase successively; among them, the secondary enrichment efficiencies under the step enhancement parameters are all greater than the secondary enrichment efficiency under the energy-saving parameters.

10. A Kr enrichment and separation equipment control system, characterized in that: Applied to Kr enrichment and separation equipment, including: A pretreatment impurity removal module is used to predict the predicted pretreatment impurity removal index of the gas to be treated when the preset impurity removal parameters are executed based on the parameters of the gas to be treated and historical pretreatment impurity removal data, and to process the predicted pretreatment impurity removal index according to predefined pretreatment impurity removal evaluation rules to obtain a predicted pretreatment evaluation index; If the predicted pretreatment evaluation index is greater than or equal to the index threshold, the pretreatment impurity removal equipment is adjusted according to the preset impurity removal parameters, the gas to be treated is passed into the pretreatment impurity removal equipment to obtain the first-level gas, and the gas is tested to obtain the first-level gas parameters; if the predicted pretreatment evaluation index is less than the index threshold, the preset impurity removal parameters are adjusted and optimized until the predicted pretreatment evaluation index is greater than or equal to the index threshold; a primary enrichment module, configured to process the primary gas parameters through a primary enrichment parameter optimizer to obtain primary enrichment parameters, adjust the primary enrichment equipment according to the primary enrichment parameters, perform primary enrichment on the primary gas to obtain secondary gas, and perform detection to obtain secondary gas parameters; a secondary enrichment module, performing a secondary enrichment difficulty assessment based on the secondary gas parameters to obtain a secondary enrichment difficulty coefficient, and calculating a secondary enrichment parameter based on the secondary enrichment difficulty coefficient, adjusting a secondary enrichment device based on the secondary enrichment parameter, performing secondary enrichment on the secondary gas, and obtaining a separated gas; The gas separation module separates and processes the separated gas through a chromatographic column to achieve Kr separation.

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