Patterned solar cell module and preparation method and device thereof

Abstract

The invention provides a patterned solar cell module and a preparation method and device thereof. The preparation method at least comprises the following steps: S1, dividing a pattern area and a semiconductor coating area on the surface of a bottom electrode provided with a P1 wire slot in a penetrating manner; s2, the pattern area is coated with nano-particle turbid liquid, and a discontinuous lyophobic part of the island-shaped nano lattice structure is formed after drying; s3, the semiconductor coating area is coated with a semiconductor solution, a semiconductor film layer is formed after drying, the semiconductor film layer forms a P2 wire groove in the pattern area, and a patterned semiconductor layer is obtained; s4, a top electrode is arranged on the surface of the patterned semiconductor layer, and the top electrode and the bottom electrode are communicated with each other through the P2 wire duct; s5, at least arranging a P3 wire duct for the top electrode in a penetrating manner to form a battery pack connected in series at intervals; wherein the surface of the discontinuous lyophobic part and the surface of the semiconductor film layer have adaptability difference. According to the preparation method provided by the invention, a P2 wire slot setting procedure is not needed, the equipment cost is reduced, and the production efficiency is improved.

Description

Technical Field

[0001] The present invention belongs to the technical field of solar cells and relates to a solar cell assembly, and in particular to a patterned solar cell assembly and a preparation method and device thereof. Background Art

[0002] Currently, for large-scale solar cell modules, technicians generally use a slot-coating method to apply semiconductor liquid films. While this method can ensure uniformity across the entire surface of the ultra-thin film, due to the self-leveling properties of the film and the limitations of the coating knife's ability to control the liquid flow, it currently cannot achieve patterned semiconductor film coverage.

[0003] At present, for solar cell modules with a size of 1cm×1cm or more, three laser lines P1, P2, and P3 are mostly used to form a series cell structure. Among them, laser P1 cuts the bottom electrode, laser P2 cuts the semiconductor layer, leaving space for the top and bottom electrodes to contact each other, and laser P3 cuts the top electrode, thereby achieving a bow-shaped series cell structure. The advantages of this structure are: forming a series structure, reducing the lateral transmission distance of a single cell, and alleviating the efficiency drop caused by increased internal resistance. However, the disadvantage of this structure is that the area covered by the laser P1, P2, and P3 lines is an ineffective power generation area, which will have an adverse effect on the photoelectric conversion efficiency of the unit area component.

[0004] To address this issue, an improved technique is currently available: Laser P1 or Laser P3 is used to perform curved etching, while Laser P2 is used to perform intermittent etching within the concave portion of the curved portion. This method can reduce some of the ineffective power generation area, thereby increasing the overall power generation per unit area of the component. However, the manufacturing process still requires a full coating of the semiconductor solution and etching of the pattern with Laser P2, resulting in high equipment costs and requiring further improvement in production efficiency. Summary of the Invention

[0005] In response to the shortcomings of the existing technology, the purpose of the present invention is to provide a patterned solar cell module and its preparation method and device, which does not require full coating of semiconductor solution, realizes patterning of the semiconductor film layer while omitting the P2 wire groove setting process, thereby reducing equipment costs and improving production efficiency.

[0006] In order to achieve the purpose of the invention, the present invention adopts the following technical solutions:

[0007] In a first aspect, the present invention provides a method for preparing a patterned solar cell assembly, comprising at least the following steps:

[0008] S1. Dividing the surface of the bottom electrode through which the P1 line groove is provided into a pattern area and a semiconductor coating area, wherein the P1 line groove is located in the semiconductor coating area;

[0009] S2, applying a nanoparticle suspension to the pattern area to form a discontinuous lyophobic portion of an island-like nano-lattice structure after drying;

[0010] S3, coating the semiconductor solution on the semiconductor coating area, forming a semiconductor film layer after drying, and forming a P2 line groove in the pattern area of the semiconductor film layer, that is, obtaining a patterned semiconductor layer;

[0011] S4, disposing a top electrode on the surface of the patterned semiconductor layer, and the top electrode and the bottom electrode are electrically connected to each other through the P2 line groove;

[0012] S5. Provide P3 wire slots through at least the top electrode to form a battery pack connected in series at intervals.

[0013] The pattern area is divided into several intervals, the P2 line groove includes several P2 sub-grooves distributed at intervals, and the P2 sub-grooves are formed with the help of the discontinuous lyophobic portion; there is a difference in adaptability between the discontinuous lyophobic portion and the surface energy of the semiconductor film layer.

[0014] The preparation method provided by the present invention utilizes the difference in surface energy adaptability between the discontinuous lyophobic portion and the semiconductor film layer to inhibit the semiconductor solution from extending into the pattern area, thereby realizing the patterning of the semiconductor film layer and increasing the effective area of unit power generation. At the same time, with the help of the patterning of the semiconductor film layer, the P2 wire groove setting process is omitted, thereby reducing equipment costs, reducing production cycle, and improving production efficiency.

[0015] In addition, the present invention adopts the idea of surface energy regulation to prepare P2 wire grooves, which effectively replaces traditional laser etching and has significant advantages in process simplification, cost control and performance improvement. Its innovation lies in breaking through the traditional path dependence of laser etching and introducing the discontinuous liquid-repellent part of the island-like nano-lattice structure into the semiconductor film layer to achieve patterning of the film layer. After all, in the preparation process of solar cell modules, laser etching (such as P1, P2, and P3 wire groove etching) is a mature technical means. Those skilled in the art usually solve the wire groove preparation problem from the perspective of "physical etching", but it is difficult to break the inertia of thinking and turn to the chemical / physical combination path of "surface energy regulation". The present invention provides a new technical idea for the preparation of P2 wire grooves.

[0016] As a preferred technical solution of the first aspect of the present invention, the surfaces of the discontinuous lyophobic portion and the semiconductor film layer can satisfy the following conditions:

[0017] The discontinuous lyophobic portion and the adjacent region of the semiconductor film layer can repel each other to form the distinguished pattern region and the semiconductor coating region.

[0018] And / or, setting the contact angle of the semiconductor solution in the discontinuous lyophobic portion to θ1, and setting the contact angle of the semiconductor solution in the semiconductor coating area to θ2, then satisfying: θ1>θ2, that is, the present invention increases the contact angle between the semiconductor solution and the discontinuous lyophobic portion, thereby worsening its wettability in the pattern area, thereby effectively inhibiting the semiconductor solution from extending into the pattern area, and omitting the P2 line groove setting process with the help of patterning of the semiconductor film layer.

[0019] Wherein, the contact angle θ1 satisfies: 70°≤θ1≤90°, for example, it can be θ1=70°, 71°, 72°, 73°, 74°, 75°, 76°, 77°, 78°, 79°, 80°, 81°, 82°, 83°, 84°, 85°, 86°, 87°, 88°, 89° or 90°, but is not limited to the listed values, and other unlisted values within the numerical range are also applicable.

[0020] And / or, the contact angle θ2 satisfies: θ2≤20°, for example, it can be θ2=1°, 2°, 3°, 4°, 5°, 6°, 7°, 8°, 9°, 10°, 11°, 12°, 13°, 14°, 15°, 16°, 17°, 18°, 19° or 20°, but is not limited to the listed values, and other unlisted values within the numerical range are also applicable.

[0021] In this invention, a larger contact angle indicates poorer wettability of the semiconductor solution at the corresponding interface. By rationally limiting the contact angle ranges of the semiconductor solution in the patterned area and the semiconductor coating area, the present invention effectively defines the semiconductor solution's extended area, reserving space for the formation of the P2 trench.

[0022] As a preferred technical solution of the first aspect of the present invention, the P1 wire trough is linear, the P3 wire trough is bent, and the bent portion of the P3 wire trough is filled in the space between the adjacent P2 sub-troughs.

[0023] Alternatively, the P1 wire trough is bent, the P3 wire trough is straight, and the bent portion of the P1 wire trough is filled in the space between the adjacent P2 sub-troughs.

[0024] The present invention uses spaced P2 sub-grooves to form P2 wire grooves, and uses the bent parts of bent P1 wire grooves or bent P3 wire grooves to fill the spacers between adjacent P2 sub-grooves, thereby reducing a portion of the ineffective power generation area, thereby saving the effective power generation area, and thus increasing the power generation power per unit area of the battery assembly.

[0025] In addition, the top electrode is connected to the bottom electrode through the spaced P2 sub-grooves. The limited space of the P2 sub-grooves can meet the requirements of the battery assembly, will not adversely affect the current transmission between the series-connected batteries, and will not increase the internal resistance of the battery assembly.

[0026] As a preferred technical solution of the first aspect of the present invention, the material of the nanoparticles in the nanoparticle suspension described in step S2 includes any one or a combination of at least two of metal oxides, small molecule organic matter or high molecular polymers. Typical but non-limiting combinations include a combination of metal oxides and small molecule organic matter, a combination of small molecule organic matter and high molecular polymers, a combination of metal oxides and high molecular polymers, or a combination of metal oxides, small molecule organic matter and high molecular polymers.

[0027] Wherein, the metal oxide includes SnO2 and / or TiO2; the small molecule organic matter includes stearic acid and / or oleic acid; and the high molecular polymer includes polyethyleneimine and / or polyimide.

[0028] And / or, the size of the nanoparticles in the nanoparticle suspension in step S2 is ≤200 nm, for example, it can be 20 nm, 40 nm, 60 nm, 80 nm, 100 nm, 120 nm, 140 nm, 160 nm, 180 nm or 200 nm, but is not limited to the listed values, and other unlisted values within this numerical range are also applicable.

[0029] And / or, the solvent in the nanoparticle suspension in step S2 is a volatile solvent.

[0030] And / or, the solvent in the nanoparticle suspension in step S2 includes ethanol and / or isopropanol.

[0031] In the present invention, the solvent used in the nanoparticle suspension can be a single solvent or multiple solvents. As long as the volatility function can be guaranteed, that is, the rapid formation of the discontinuous lyophobic portion can be achieved, the solvent composition is not particularly limited.

[0032] And / or, the concentration of the nanoparticle suspension in step S2 is ≤5 mg / mL, for example, it can be 0.5 mg / mL, 1 mg / mL, 1.5 mg / mL, 2 mg / mL, 2.5 mg / mL, 3 mg / mL, 3.5 mg / mL, 4 mg / mL, 4.5 mg / mL or 5 mg / mL, but is not limited to the listed values, and other values not listed within this numerical range are also applicable.

[0033] And / or, the semiconductor solution in step S3 includes a perovskite solution.

[0034] As a preferred technical solution of the first aspect of the present invention, the coating method in step S2 includes any one of piezoelectric inkjet coating, slit coating, electrostatic spraying, ultrasonic spraying, electrofluid spraying, screen printing or vapor deposition.

[0035] And / or, the drying method in step S2 includes air knife drying.

[0036] And / or, the P1 wire groove in step S1 and the P3 wire groove in step S5 are each independently provided by laser etching.

[0037] In a second aspect, the present invention provides a patterned solar cell assembly comprising at least a stacked bottom electrode, a patterned semiconductor layer, and a top electrode; the bottom electrode is penetrated by a P1 wire groove, and the patterned semiconductor layer is filled in the P1 wire groove; the patterned area of the patterned semiconductor layer constitutes a P2 wire groove, and the bottom electrode and the top electrode are connected to each other through the P2 wire groove; at least the top electrode is penetrated by a P3 wire groove.

[0038] Among them, the pattern area of the patterned semiconductor layer is provided with a discontinuous lyophobic portion with an island-shaped nano-dot array structure, the P2 line groove includes a number of P2 sub-grooves distributed at intervals, and the P2 sub-grooves are formed with the help of the discontinuous lyophobic portion; the non-pattern area of the patterned semiconductor layer is provided with a semiconductor film layer, and there is an adaptability difference between the surface energy of the discontinuous lyophobic portion and the semiconductor film layer.

[0039] As a preferred technical solution of the second aspect of the present invention, the surfaces of the discontinuous lyophobic portion and the semiconductor film layer can satisfy the following conditions:

[0040] The discontinuous lyophobic portion and the adjacent region of the semiconductor film layer can repel each other to form the distinguished pattern area and the non-pattern area.

[0041] Specifically, the semiconductor solution required to form the semiconductor film layer meets the following conditions:

[0042] By setting the contact angle of the semiconductor solution in the discontinuous lyophobic portion to θ1 and the contact angle of the semiconductor solution in the non-patterned area to θ2, the following is satisfied: θ1>θ2, that is, the present invention increases the contact angle between the semiconductor solution and the discontinuous lyophobic portion to worsen its wettability in the patterned area, thereby effectively inhibiting the semiconductor solution from extending into the patterned area, and omitting the P2 line groove setting process with the help of patterning of the semiconductor film layer.

[0043] As a preferred technical solution of the second aspect of the present invention, the P1 wire trough is linear, the P3 wire trough is bent, and the bent portion of the P3 wire trough is filled in the space between the adjacent P2 sub-troughs.

[0044] Alternatively, the P1 wire trough is bent, the P3 wire trough is straight, and the bent portion of the P1 wire trough is filled in the space between the adjacent P2 sub-troughs.

[0045] As a preferred technical solution of the second aspect of the present invention, the material of the nanoparticles in the discontinuous liquid-repellent portion includes any one or a combination of at least two of metal oxides, small molecule organic matter or high molecular polymers. Typical but non-limiting combinations include a combination of metal oxides and small molecule organic matter, a combination of small molecule organic matter and high molecular polymers, a combination of metal oxides and high molecular polymers, or a combination of metal oxides, small molecule organic matter and high molecular polymers.

[0046] Wherein, the metal oxide includes SnO2 and / or TiO2; the small molecule organic matter includes stearic acid and / or oleic acid; and the high molecular polymer includes chitosan and / or polystyrene.

[0047] And / or, the size of the nanoparticles in the discontinuous liquid-repellent portion is ≤200 nm, for example, it can be 20 nm, 40 nm, 60 nm, 80 nm, 100 nm, 120 nm, 140 nm, 160 nm, 180 nm or 200 nm, but is not limited to the listed values, and other unlisted values within the numerical range are also applicable.

[0048] And / or, the semiconductor film layer includes a perovskite film layer.

[0049] In a third aspect, the present invention provides a device for preparing a patterned solar cell assembly, comprising at least a carrier, a first coating assembly, and a second coating assembly; the carrier is used to fix a bottom electrode, the surface of the bottom electrode being divided into a pattern area and a semiconductor coating area; the first coating assembly is used to coat a nanoparticle suspension on the pattern area to form a discontinuous liquid-repellent portion of an island-like nano-dot array structure; the second coating assembly is used to coat a semiconductor solution on the semiconductor coating area to form a semiconductor film layer.

[0050] As a preferred technical solution of the third aspect of the present invention, a substrate is stacked on a surface of the bottom electrode close to the carrier, and the substrate is directly fixed to the surface of the carrier.

[0051] And / or, the first coating assembly includes a first liquid storage box and a first nozzle that are interconnected, the first liquid storage box is used to store the nanoparticle suspension, and the first nozzle is used to coat the nanoparticle suspension along a preset trajectory.

[0052] And / or, the second coating assembly includes a second liquid storage box and a second nozzle that are interconnected, the second liquid storage box is used to store the semiconductor solution, and the second nozzle is used to coat the semiconductor solution along a preset trajectory.

[0053] And / or, an air knife is provided between the first coating assembly and the second coating assembly for drying the nanoparticle suspension.

[0054] Compared with the prior art, the present invention has the following beneficial effects:

[0055] The preparation method provided by the present invention utilizes the difference in surface energy adaptability between the discontinuous lyophobic portion and the semiconductor film layer to inhibit the semiconductor solution from extending into the pattern area, thereby realizing the patterning of the semiconductor film layer and increasing the effective area of unit power generation. At the same time, with the help of the patterning of the semiconductor film layer, the P2 wire groove setting process is omitted, thereby reducing equipment costs, reducing production cycle, and improving production efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0056] Figure 1 This is a flow chart of a method for preparing a patterned solar cell module provided by the present invention;

[0057] Figure 2 is a schematic cross-sectional view of a patterned solar cell assembly provided by the present invention;

[0058] Figure 3 is a top view of the patterned solar cell assembly provided in Example 1;

[0059] Figure 4 is a top view of the patterned solar cell assembly provided in Example 2;

[0060] Figure 5 This is a schematic diagram of the preparation process of the patterned solar cell module provided by the present invention;

[0061] Figure 6 Schematic diagram of the contact angle θ1 of the perovskite solution on the discontinuous lyophobic portion in the present invention;

[0062] Figure 7 Schematic diagram of the contact angle θ2 of the perovskite solution in the semiconductor coating area in the present invention;

[0063] Figure 8 It is a partial schematic diagram of the device used to prepare the patterned solar cell module of the present invention.

[0064] Among them: 10-bottom electrode; 11-P1 line groove; 20-patterned perovskite layer; 21-P2 line groove; 21a-P2 sub-groove; 21b-spacer; 22-discontinuous lyophobic portion; 23-perovskite solution; 30-top electrode; 31-P3 line groove; 32-additional effective power generation area; 40-substrate; 51-first nozzle; 52-second nozzle; 53-air knife. DETAILED DESCRIPTION

[0065] The technical solution of the present invention is further described below by way of specific embodiments. It should be understood by those skilled in the art that the embodiments are merely to help understand the present invention and should not be regarded as specific limitations of the present invention.

[0066] Example 1

[0067] This embodiment provides a patterned solar cell assembly and a method for preparing the same. Figure 2 As shown, the patterned solar cell assembly includes a stacked substrate 40, a bottom electrode 10, a patterned perovskite layer 20, and a top electrode 30. The bottom electrode 10 is provided with a P1 line groove 11, and the patterned perovskite layer 20 is filled in the P1 line groove 11; the patterned area of the patterned perovskite layer 20 constitutes a P2 line groove 21, and the bottom electrode 10 and the top electrode 30 are electrically connected to each other through the P2 line groove 21; the patterned perovskite layer 20 and the top electrode 30 are provided with a P3 line groove 31.

[0068] like Figure 5 As shown, the patterned region of the patterned perovskite layer 20 is provided with a discontinuous lyophobic portion 22 of an island-like nano-lattice structure; Figure 3 As shown, the P2 line groove 21 includes a number of P2 sub-grooves 21a distributed at intervals, and the P2 sub-grooves 21a are formed with the help of the discontinuous lyophobic portion 22; the P1 line groove 11 is straight, the P3 line groove 31 is bent, and the bent portion of the P3 line groove 31 is filled in the interval 21b of the adjacent P2 sub-grooves 21a, thereby forming a number of additional effective power generation areas 32; the non-patterned area of the patterned perovskite layer 20 is provided with a perovskite film layer, and there is an adaptability difference between the surface energy of the discontinuous lyophobic portion 22 and the perovskite film layer.

[0069] like Figure 1 and Figure 5 As shown, the method for preparing the patterned solar cell assembly includes the following steps:

[0070] S1, dividing the surface of the bottom electrode 10 through which the P1 line groove 11 is set into a pattern area and a semiconductor coating area ( Figure 5 (not shown), and the P1 line slot 11 is located in the semiconductor coating area;

[0071] S2, coating the pattern area with a nanoparticle suspension to form a discontinuous lyophobic portion 22 with an island-like nano-lattice structure after drying;

[0072] S3, coating the semiconductor coating area with a perovskite solution 23, and forming a perovskite film layer after drying, and the perovskite film layer forms a P2 line groove 21 in the pattern area, that is, obtaining a patterned perovskite layer 20;

[0073] S4, disposing a top electrode 30 on the surface of the patterned perovskite layer 20, and the top electrode 30 and the bottom electrode 10 are electrically connected to each other through the P2 line groove 21;

[0074] S5 , providing P3 line slots 31 through the patterned perovskite layer 20 and the top electrode 30 to form a battery group connected in series at intervals.

[0075] Among them, the setting methods of the P1 wire groove 11 in step S1 and the P3 wire groove 31 in step S5 are both laser etching; the nanoparticle material in the nanoparticle suspension in step S2 is SnO2, the average size is 180nm, the solvent is ethanol, and the concentration is 0.95mg / mL; the coating methods in steps S2 and S3 are both piezoelectric inkjet coating; the drying in step S2 is air knife drying; the drying in step S3 is natural air drying.

[0076] As mentioned above, the pattern is divided into several intervals. The P2 line groove 21 includes several P2 sub-grooves 21a distributed at intervals, and the P2 sub-grooves 21a are formed by the non-continuous lyophobic portion 22. There is a difference in the adaptability between the surface energy of the non-continuous lyophobic portion 22 and the perovskite film layer. The contact angle of the perovskite solution 23 on the non-continuous lyophobic portion 22 is θ1 = 83° (see Figure 2). Figure 6 ), the contact angle of the perovskite solution 23 in the semiconductor coating area is θ2=6° (see Figure 7 ).

[0077] In this embodiment, the material and thickness of the substrate 40, the bottom electrode 10, and the top electrode 30 have no significant effect on the formation of the P2 line groove 21. As long as the wettability of the perovskite solution 23 and the relevant interface meets the above conditions, the above condition parameters are not specifically explained here.

[0078] Example 2

[0079] This embodiment provides a patterned solar cell assembly and a method for preparing the same. Figure 2 As shown, the patterned solar cell assembly includes a stacked substrate 40, a bottom electrode 10, a patterned perovskite layer 20, and a top electrode 30. The bottom electrode 10 is provided with a P1 line groove 11, and the patterned perovskite layer 20 is filled in the P1 line groove 11; the patterned area of the patterned perovskite layer 20 constitutes a P2 line groove 21, and the bottom electrode 10 and the top electrode 30 are electrically connected to each other through the P2 line groove 21; the patterned perovskite layer 20 and the top electrode 30 are provided with a P3 line groove 31.

[0080] like Figure 5As shown, the patterned region of the patterned perovskite layer 20 is provided with a discontinuous lyophobic portion 22 of an island-like nano-lattice structure; Figure 4 As shown, the P2 line groove 21 includes a number of P2 sub-grooves 21a distributed at intervals, and the P2 sub-grooves 21a are formed with the help of the discontinuous lyophobic portion 22; the P1 line groove 11 is bent, the P3 line groove 31 is straight, and the bent portion of the P1 line groove 11 is filled in the interval 21b of the adjacent P2 sub-grooves 21a, thereby forming a number of additional effective power generation areas 32; the non-patterned area of the patterned perovskite layer 20 is provided with a perovskite film layer, and there is an adaptability difference between the surface energies of the discontinuous lyophobic portion 22 and the perovskite film layer.

[0081] like Figure 1 and Figure 5 As shown, the method for preparing the patterned solar cell assembly includes the following steps:

[0082] S1, dividing the surface of the bottom electrode 10 through which the P1 line groove 11 is set into a pattern area and a semiconductor coating area ( Figure 5 (not shown), and the P1 line slot 11 is located in the semiconductor coating area;

[0083] S2, coating the pattern area with a nanoparticle suspension to form a discontinuous lyophobic portion 22 with an island-like nano-lattice structure after drying;

[0084] S3, coating the semiconductor coating area with a perovskite solution 23, and forming a perovskite film layer after drying, and the perovskite film layer forms a P2 line groove 21 in the pattern area, that is, obtaining a patterned perovskite layer 20;

[0085] S4, disposing a top electrode 30 on the surface of the patterned perovskite layer 20, and the top electrode 30 and the bottom electrode 10 are electrically connected to each other through the P2 line groove 21;

[0086] S5 , providing P3 line slots 31 through the patterned perovskite layer 20 and the top electrode 30 to form a battery group connected in series at intervals.

[0087] Among them, the setting method of the P1 wire groove 11 in step S1 and the P3 wire groove 31 in step S5 are both laser etching; the nanoparticle material in the nanoparticle suspension in step S2 is TiO2, the average size is 160nm, the solvent is isopropyl alcohol, and the concentration is 0.82mg / mL; the coating method in step S2 and step S3 is piezoelectric inkjet coating; the drying in step S2 is air knife drying; the drying in step S3 is natural air drying.

[0088] As mentioned above, the pattern area is divided into several intervals. The P2 line groove 21 includes several P2 sub-grooves 21a distributed at intervals, and the P2 sub-grooves 21a are formed by the non-continuous lyophobic portion 22. There is a difference in the adaptability between the surface energy of the non-continuous lyophobic portion 22 and the perovskite film layer. The contact angle of the perovskite solution 23 on the non-continuous lyophobic portion 22 is θ1 = 76° (see Figure 2). Figure 6 ), the contact angle of the perovskite solution 23 in the semiconductor coating area is θ2=8° (see Figure 7 ).

[0089] In this embodiment, the material and thickness of the substrate 40, the bottom electrode 10, and the top electrode 30 have no significant effect on the formation of the P2 line groove 21. As long as the wettability of the perovskite solution 23 and the relevant interface meets the above conditions, the above condition parameters are not specifically explained here.

[0090] Example 3

[0091] This embodiment provides an apparatus for preparing a patterned solar cell module, comprising a carrier, a first coating assembly, and a second coating assembly. The carrier is used to secure a substrate 40, and a bottom electrode 10 is provided on the surface of the substrate 40. The surface of the bottom electrode 10 is divided into a pattern region and a semiconductor coating region. The first coating assembly is used to apply a nanoparticle suspension to the pattern region to form a discontinuous lyophobic portion 22 of an island-like nanolattice structure. The second coating assembly is used to apply a perovskite solution 23 to the semiconductor coating region to form a perovskite film layer.

[0092] like Figure 8 As shown, the first coating component includes a first liquid storage box (not shown in the figure) and a first nozzle 51 that are interconnected. The first liquid storage box is used to store the nanoparticle suspension, and the first nozzle 51 is used to coat the nanoparticle suspension along a preset trajectory; the second coating component includes a second liquid storage box (not shown in the figure) and a second nozzle 52 that are interconnected. The second liquid storage box is used to store the perovskite solution 23, and the second nozzle 52 is used to coat the perovskite solution 23 along a preset trajectory; an air knife 53 is provided between the first coating component and the second coating component for drying the nanoparticle suspension.

[0093] It can be seen that the preparation method provided by the present invention utilizes the difference in surface energy adaptability between the discontinuous lyophobic portion and the semiconductor film layer to inhibit the extension of the semiconductor solution to the pattern area, thereby realizing the patterning of the semiconductor film layer and increasing the effective area of unit power generation. At the same time, with the help of the patterning of the semiconductor film layer, the P2 wire groove setting process is omitted, the equipment cost is reduced, the production cycle is reduced, and the production efficiency is improved.

[0094] The above description is only a specific embodiment of the present invention, but the protection scope of the present invention is not limited thereto. Those skilled in the art should understand that any changes or substitutions that can be easily thought of by those skilled in the art within the technical scope disclosed by the present invention fall within the protection scope and disclosure scope of the present invention.

Claims

1. A method for preparing a patterned solar cell module, characterized in that: The preparation method comprises at least the following steps: S1. Dividing the surface of the bottom electrode through which the P1 line groove is provided into a pattern area and a semiconductor coating area, wherein the P1 line groove is located in the semiconductor coating area; S2, applying a nanoparticle suspension to the pattern area to form a discontinuous lyophobic portion of an island-like nano-lattice structure after drying; S3, coating the semiconductor solution on the semiconductor coating area, forming a semiconductor film layer after drying, and forming a P2 line groove in the pattern area of the semiconductor film layer, that is, obtaining a patterned semiconductor layer; S4, disposing a top electrode on the surface of the patterned semiconductor layer, and the top electrode and the bottom electrode are electrically connected to each other through the P2 line groove; S5. Provide P3 wire slots through at least the top electrode to form a battery pack connected in series at intervals; The pattern area is divided into several intervals, the P2 line groove includes several P2 sub-grooves distributed at intervals, and the P2 sub-grooves are formed with the help of the discontinuous lyophobic portion; there is a difference in adaptability between the discontinuous lyophobic portion and the surface energy of the semiconductor film layer.

2. The method for preparing a patterned solar cell assembly according to claim 1, wherein: The surfaces of the discontinuous lyophobic portion and the semiconductor film layer can satisfy the following conditions: The discontinuous lyophobic portion and the adjacent area of the semiconductor film layer can repel each other to form the distinguished pattern area and the semiconductor coating area; And / or, setting the contact angle of the semiconductor solution in the discontinuous lyophobic portion to θ1 and setting the contact angle of the semiconductor solution in the semiconductor coating region to θ2, then: θ1>θ2; Wherein, the contact angle θ1 satisfies: 70°≤θ1≤90°; And / or, the contact angle θ2 satisfies: θ2≤20°.

3. The method for preparing a patterned solar cell assembly according to claim 1 or 2, characterized in that: The P1 wire trough is straight, the P3 wire trough is bent, and the bent portion of the P3 wire trough is filled in the space between the adjacent P2 sub-troughs; Alternatively, the P1 wire trough is bent, the P3 wire trough is straight, and the bent portion of the P1 wire trough is filled in the space between the adjacent P2 sub-troughs.

4. The method for preparing a patterned solar cell assembly according to claim 1 or 2, characterized in that: The nanoparticles in the nanoparticle suspension in step S2 are made of any one of metal oxides, small molecule organic matter, or high molecular polymers, or a combination of at least two thereof; Wherein, the metal oxide includes SnO2 and / or TiO2; and / or, the size of the nanoparticles in the nanoparticle suspension in step S2 is ≤ 200 nm; and / or, the solvent in the nanoparticle suspension in step S2 is a volatile solvent; And / or, the solvent in the nanoparticle suspension in step S2 includes ethanol and / or isopropanol; and / or, the concentration of the nanoparticle suspension in step S2 is ≤5 mg / mL; And / or, the semiconductor solution in step S3 includes a perovskite solution.

5. The method for preparing a patterned solar cell assembly according to claim 1 or 2, characterized in that: The coating method in step S2 includes any one of piezoelectric inkjet coating, slit coating, electrostatic spraying, ultrasonic spraying, electrofluid spraying, screen printing or vapor deposition; And / or, the drying method in step S2 includes air knife drying; And / or, the P1 wire groove in step S1 and the P3 wire groove in step S5 are each independently provided by laser etching.

6. A patterned solar cell assembly, characterized in that: The patterned solar cell assembly at least comprises a bottom electrode, a patterned semiconductor layer and a top electrode that are stacked; The bottom electrode is provided with a P1 line groove running through it, and the patterned semiconductor layer is filled in the P1 line groove; The patterned area of the patterned semiconductor layer forms a P2 line groove, and the bottom electrode and the top electrode are electrically connected to each other through the P2 line groove; At least the top electrode is provided with a P3 line groove; Among them, the pattern area of the patterned semiconductor layer is provided with a discontinuous lyophobic portion with an island-shaped nano-dot array structure, the P2 line groove includes a number of P2 sub-grooves distributed at intervals, and the P2 sub-grooves are formed with the help of the discontinuous lyophobic portion; the non-pattern area of the patterned semiconductor layer is provided with a semiconductor film layer, and there is an adaptability difference between the surface energy of the discontinuous lyophobic portion and the semiconductor film layer.

7. The patterned solar cell assembly according to claim 6, wherein: The surfaces of the discontinuous lyophobic portion and the semiconductor film layer can satisfy the following conditions: The discontinuous lyophobic portion and the adjacent region of the semiconductor film layer can repel each other to form the distinguished pattern area and the non-pattern area.

8. The patterned solar cell assembly according to claim 6 or 7, characterized in that: The P1 wire trough is straight, the P3 wire trough is bent, and the bent portion of the P3 wire trough is filled in the space between the adjacent P2 sub-troughs; Alternatively, the P1 wire trough is bent, the P3 wire trough is straight, and the bent portion of the P1 wire trough is filled in the space between the adjacent P2 sub-troughs.

9. The patterned solar cell assembly according to claim 6 or 7, characterized in that: The nanoparticles in the discontinuous lyophobic portion are made of any one of metal oxides, small molecule organic matter, or high molecular polymers, or a combination of at least two thereof; Wherein, the metal oxide includes SnO2 and / or TiO2; and / or, the size of the nanoparticles in the discontinuous lyophobic portion is ≤200 nm; And / or, the semiconductor film layer includes a perovskite film layer.

10. A device for preparing a patterned solar cell module, characterized in that: The device comprises at least a carrier, a first coating component and a second coating component; The carrier is used to fix the bottom electrode, and the surface of the bottom electrode is divided into a pattern area and a semiconductor coating area; The first coating component is used to coat the nanoparticle suspension on the pattern area to form a discontinuous lyophobic portion of an island-like nano-lattice structure; The second coating assembly is used to coat a semiconductor solution on the semiconductor coating area to form a semiconductor film layer.

11. The device for preparing a patterned solar cell module according to claim 10, characterized in that: A substrate is stacked on a surface of the bottom electrode close to the carrier, and the substrate is directly fixed to the surface of the carrier; And / or, the first coating assembly includes a first liquid storage box and a first nozzle that are interconnected, the first liquid storage box is used to store the nanoparticle suspension, and the first nozzle is used to coat the nanoparticle suspension along a preset trajectory; And / or, the second coating assembly includes a second liquid storage box and a second nozzle that are interconnected, the second liquid storage box is used to store the semiconductor solution, and the second nozzle is used to coat the semiconductor solution along a preset trajectory; And / or, an air knife is provided between the first coating assembly and the second coating assembly for drying the nanoparticle suspension.

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