Scaling powder cleaning machine

Abstract

The invention belongs to the field of semiconductor wet advanced packaging, and discloses a scaling powder cleaning machine which comprises a cleaning machine body, a water storage tank is movably mounted in the cleaning machine body, a vertical rod is rotatably mounted at the top of the water storage tank, a placement table is fixedly mounted at the top of the vertical rod, and a wafer to be cleaned is placed at the top of the placement table. And a chip is arranged at the top of the wafer. The outer ring and the turbulent flow blocks are designed, the rotating speed of the outer ring is larger than that of the inner ring, so that forward and reverse water flow is formed, the impact force of the reverse water flow is larger than that of the forward water flow, part of clean water gets close to the middle area, the forward clean water tends to be blocked, and the outflow time of the clean water is prolonged; the trend that cleaning water on the placing table flows outwards under the action of rotating centrifugal force is blocked through reverse stronger water flow, and the cleaning efficiency of the soldering flux is improved and the cleaning time is shortened through forming a short soaking area and through the soaking and washing process.

Description

Technical Field

[0001] The invention belongs to the technical field of advanced semiconductor packaging, in particular to a flux cleaning machine. Background Art

[0002] Flux cleaning machines are widely used in the electronics manufacturing process. They are mainly used to remove flux from chips and substrates. The purpose of flux is to assist in soldering and achieve better soldering results during wafer soldering. However, despite its auxiliary soldering effect, if the flux is not cleaned after soldering, the residual flux will deteriorate and also cause corrosion to the wafer.

[0003] At present, general flux cleaning machines usually use high-pressure nozzles to flush wafers, and some flux cleaning machines also use ultrasonic cleaning technology for auxiliary cleaning; some cleaning nozzles on the market use three-axis rotary spraying, and some use chassis rotary cleaning, all of which are for achieving rotary cleaning methods at many angles; this application proposes an improvement to the rotary cleaning method. Generally, during the cleaning process, since the middle stage is in a rotating state, the cleaning liquid after spraying will not stay on the stage, but will flow out to the surroundings under the action of centrifugal force. However, general flux (especially deteriorated flux) has a certain viscosity and surface hardening; it makes it difficult for general flushing effects to penetrate into the interior, so that the flushing time is required to be prolonged, which in turn causes waste of the cleaning machine and low cleaning efficiency. To address this problem, the applicant has made the following improvements. Summary of the Invention

[0004] The object of the present invention is to provide a flux cleaning machine to solve the problems raised in the above background technology.

[0005] To achieve the above-mentioned objectives, the present invention provides the following technical solution: a flux cleaning machine, comprising a cleaning machine body, wherein a water tank is movably installed inside the cleaning machine body, a vertical rod is rotatably installed on the top of the water tank, a placement table is fixedly installed on the top of the vertical rod, a wafer to be cleaned is placed on the top of the placement table, the wafer is used to carry chips and can be tilted according to the central axis, an outer ring is mounted on the inside of the cleaning machine body through a bracket, and the outer ring and the placement table rotate independently, the outer surface of the outer ring is provided with teeth, and the inner surface of the outer ring is provided with uniform spoilers, a first gear is fixedly sleeved on the outer surface of the vertical rod, a first motor is fixedly installed inside the cleaning machine body, the output end of the first motor is fixedly connected to a second gear, the second gear is meshed with the teeth, and the output end of the first motor is connected to the first gear via a transmission mechanism; the cleaning machine body is provided with a limit mechanism on both sides of the water tank; the cleaning machine body is provided with a drive mechanism, and the top of the inner cavity of the cleaning machine body is provided with a plurality of spray mechanisms in different directions.

[0006] Preferably, the limiting mechanism includes a limiting groove provided inside the cleaning machine body, a limiting block fixedly connected to the water tank being movably installed inside the limiting groove, a moving plate being movably installed in the limiting block near the back of the cleaning machine body, a limiting rod being fixedly installed on the left side of the moving plate, the end of the limiting rod passing through the limiting block, a return spring located between the moving plate and the inner wall of the limiting block being elastically sleeved on the outer surface of the limiting rod, a trigger plate being fixedly installed inside the cleaning machine body, the end of the trigger plate extending to the inside of the limiting block; a first drain outlet is provided inside the water tank, a second drain outlet is provided inside the limiting block, a third drain outlet is provided on the back of the cleaning machine body, and a fourth drain outlet is provided on the surface of the trigger plate.

[0007] Preferably, the driving mechanism includes a fixed block fixedly installed on the right side of the water tank, a moving block movably installed inside the cleaning machine body, the moving block and the fixed block are connected by a connecting rod, a second motor is fixedly installed on the back of the cleaning machine body, the output end of the second motor is fixedly connected to a rotating rod inside the cleaning machine body, the other end of the rotating rod passes through the moving block, and the outer surface of the rotating rod is provided with two sections of threaded grooves in opposite directions.

[0008] Preferably, the spray mechanism includes a linear module fixedly installed inside the cleaning machine body, a robotic arm is installed on the side of the linear module for lifting, a water spray module is fixedly installed on the bottom end of the robotic arm, and the water spray module can be adjusted from 0 to 180 degrees according to the process angle. A number of flushing heads are provided at the bottom end of the water spray module, and the flushing heads can perform directional xyz-axis cleaning operations, and the bilateral flushing heads can realize cleaning on both sides of the gap between chips. A limiting mechanism located inside the linear module is fixedly installed on the side of the robotic arm.

[0009] Preferably, there are five groups of spray mechanisms, which are distributed in different directions to surround the wafer at 360 degrees, and the spray mechanisms are distributed at positions on different circumferences from the inside to the outside.

[0010] Preferably, both sides of the top of the water tank are connected to a concave box located at the bottom end of the outer ring through vertical water pipes, and the inner diameter width of the concave box is greater than the length of the gap between the outer ring and the placement table.

[0011] Preferably, the limit distance by which the moving plate is compressed to the left is equal to the moving distance by which the trigger plate moves inward after contacting the moving plate until the first drain outlet is aligned with the fourth drain outlet.

[0012] Preferably, there is a gap between the outer ring and the placement table, the gap length is three centimeters, and the spoiler portion is in contact with the surface of the placement table.

[0013] Preferably, the transmission mechanism includes a transmission gear 1 and a transmission gear 2 rotatably mounted on the top of the water tank, the transmission gear 2 is engaged with the first gear, the transmission gear 1 is engaged with the transmission gear 2, but not with the first gear; the transmission gear 1 and the second gear are connected by a transmission belt.

[0014] Preferably, a plurality of guide grooves are provided on the surface of the placement table, and the guide grooves are communicated with the gap between the outer ring and the placement table; and a sealing door is provided on the left side of the cleaning machine body.

[0015] Preferably, the bottom of the device comprises a bottom spray device, which can perform bottom cleaning operations by moving along the x-axis.

[0016] The beneficial effects of the present invention are as follows:

[0017] 1. The present invention designs an outer ring and a spoiler block, and utilizes the outer ring speed being greater than the inner ring speed, thereby forming forward and reverse water flows. The impact force of the reverse water flow is greater than the impact force of the forward water flow, so that part of the clean water will move closer to the central area and form a blocking trend for the forward clean water, thereby prolonging the outflow time of the clean water; during rotation, after the clean water sprayed by the spray mechanism falls on the wafer, it flows to the surroundings under the action of the rotating centrifugal force of the placement table. At this time, the counter-rotating spoiler block will contact part of the clean water, thereby driving the clean water to rotate in the opposite direction, thereby forming water ripples and water flow directions opposite to the clean water flowing on the surface of the placement table. The stronger reverse water flow is used to block the trend of the clean water on the placement table to flow outward due to the rotating centrifugal force. By forming a short immersion area and through the immersion and rinsing process, the cleaning efficiency of the flux is improved and the cleaning time is shortened.

[0018] 2. The present invention cooperates with the operation of the driving mechanism. When the water tank and the limit block move inward to the limit state, the waste water in the water tank is automatically triggered to drain according to the moved position by utilizing the cooperation between the trigger plate and the moving plate, as well as the cooperation between the first drain port, the second drain port, the third drain port and the fourth drain port. When the movement operation is performed, it can play a blocking role to prevent the waste water from flowing into the interior of the cleaning machine body during the movement operation.

[0019] 3. The operation of the second motor of the present invention will drive the rotating rod to rotate. Since the surface of the rotating rod is provided with two sections of threaded grooves in opposite directions, the two moving blocks are driven to move relative to or opposite to each other, thereby pushing the water tank to move left and right. When the water tank moves to the left, it will be convenient for the staff to replace the wafer and chip. When it moves to the right to the extreme position, it will trigger the automatic drainage mechanism to perform drainage operations. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1 It is a schematic diagram of the overall structure of the present invention;

[0021] Figure 2 It is a schematic diagram of the partial internal structure of the present invention;

[0022] Figure 3 For the present invention Figure 2 A in the middle is an enlarged structural diagram;

[0023] Figure 4 Schematic diagram of the internal structure of the present invention;

[0024] Figure 5 Schematic diagram of the structure of the spoiler block of the present invention;

[0025] Figure 6 This is a schematic diagram of the guide trough structure of the present invention;

[0026] Figure 7 Schematic diagram of the transmission belt structure of the present invention;

[0027] Figure 8 This is a schematic diagram of the outer ring structure of the present invention;

[0028] Figure 9 This is a schematic diagram of the disassembled structure of the trigger plate, limit block and moving plate of the present invention.

[0029] Figure: 1. Cleaning machine body; 2. Water tank; 3. Vertical rod; 4. Placement table; 5. Wafer; 6. Chip; 7. Outer ring; 8. Gear; 9. Spoiler; 10. First gear; 11. First motor; 12. Second gear; 13. Transmission gear 1; 14. Transmission gear 2; 15. Transmission belt; 16. Fixed block; 17. Moving block; 18. Connecting rod; 19. Rotating rod; 20. Second motor; 21 , concave box; 22. Vertical water pipe; 23. Limiting groove; 24. Limiting block; 25. First drain outlet; 26. Second drain outlet; 27. Third drain outlet; 28. Moving plate; 29. Limiting rod; 30. Return spring; 31. Trigger plate; 32. Fourth drain outlet; 33. Linear module; 34. Robotic arm; 35. Limiting mechanism; 36. Water spray module; 37. Flushing head; 38. Diversion groove; 39. Sealing door. DETAILED DESCRIPTION

[0030] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0031] like Figures 1 to 9As shown, an embodiment of the present invention provides a flux cleaning machine, including a cleaning machine body 1, a water tank 2 is movably installed inside the cleaning machine body 1, a vertical rod 3 is rotatably installed on the top of the water tank 2, a placement table 4 is fixedly installed on the top of the vertical rod 3, a wafer 5 to be cleaned is placed on the top of the placement table 4, a chip 6 is set on the top of the wafer 5, the wafer 5 is used to carry the chip 6, and the tilt angle can be adjusted according to the central axis, the inner part of the cleaning machine body 1 is installed with an outer ring 7 located on the periphery of the placement table 4 through a bracket, the outer ring 7 and the placement table 4 rotate independently, and the outer surface of the outer ring 7 It is provided with teeth 8, the inner surface of the outer ring 7 is provided with uniform spoiler blocks 9, the outer surface of the vertical rod 3 is fixedly sleeved with a first gear 10, the inside of the cleaning machine body 1 is fixedly installed with a first motor 11, the output end of the first motor 11 is fixedly connected to the second gear 12, the second gear 12 is meshed with the teeth 8, and the output end of the first motor 11 is connected to the first gear 10 through a transmission mechanism; the inside of the cleaning machine body 1 is provided with a limiting mechanism located on both sides of the water tank 2; the inside of the cleaning machine body 1 is provided with a driving mechanism, and the top of the inner cavity of the cleaning machine body 1 is provided with several spray mechanisms in different directions.

[0032] After the staff places the Wafer 5 to be cleaned on the placement table 4 at an appropriate position, the staff starts the spray mechanism and sprays water through the spray mechanism to flush the flux near the placement table 4 and the Wafer 5. At the same time, the first motor 11 is started. Due to the operation of the first motor 11, the second gear 12 will be driven to rotate, thereby driving the outer ring 7 to rotate through the teeth 8, and then driving the spoiler 9 to rotate together; at the same time, the placement table 4 is driven to rotate through the transmission mechanism, and the rotation direction of the placement table 4 is opposite to that of the outer ring 7, and the speed of the outer ring 7 is greater than the speed of the placement table 4; during rotation, the cleaning agent sprayed by the spray mechanism After the clean water falls onto Wafer 5, it flows around under the action of the rotating centrifugal force of the placement table 4. At this time, the counter-rotating spoiler block 9 will contact part of the clean water, thereby driving the clean water to rotate in the opposite direction, thereby forming water ripples and water flow directions opposite to the clean water flowing on the surface of the placement table 4. Through the stronger reverse water flow, the tendency of the clean water on the placement table 4 to flow outward due to the rotating centrifugal force is blocked, thereby extending the time for the clean water to flow on the placement table 4 due to the rotating centrifugal force, forming a short immersion area, and through the immersion and rinsing process, the cleaning efficiency of the flux is improved and the cleaning time is shortened.

[0033] By designing the outer ring 7 and the spoiler block 9, the outer ring speed is greater than the inner ring speed, thereby forming forward and reverse water flows, and the impact force of the reverse water flow is greater than the impact force of the forward water flow. Therefore, part of the clean water will move closer to the central area, and form a blocking trend for the forward clean water, thereby prolonging the outflow time of the clean water; during rotation, after the clean water sprayed by the spray mechanism falls on the Wafer5, under the action of the rotating centrifugal force of the placement table 4, the clean water flows to the surroundings. At this time, the counter-rotating spoiler block 9 will contact part of the clean water, thereby driving the clean water to rotate in the opposite direction, thereby forming water ripples and water flow directions opposite to the clean water flowing on the surface of the placement table 4, and through the stronger reverse water flow, the tendency of the clean water on the placement table 4 to flow outward due to the rotating centrifugal force is blocked. By forming a short immersion area and through the immersion and rinsing process, the cleaning efficiency of the flux is improved and the cleaning time is shortened.

[0034] Among them, the limiting mechanism includes a limiting groove 23 opened inside the cleaning machine body 1, and a limiting block 24 fixedly connected to the water tank 2 is movably installed inside the limiting groove 23. A moving plate 28 is movably installed in the limiting block 24 near the back of the cleaning machine body 1, and a limiting rod 29 is fixedly installed on the left side of the moving plate 28. The end of the limiting rod 29 passes through the limiting block 24, and the outer surface of the limiting rod 29 is elastically sleeved with a return spring 30 located between the moving plate 28 and the inner wall of the limiting block 24. A trigger plate 31 is fixedly installed inside the cleaning machine body 1, and the end of the trigger plate 31 extends to the inside of the limiting block 24; a first drain outlet 25 is opened inside the water tank 2, a second drain outlet 26 is opened inside the limiting block 24, a third drain outlet 27 is opened on the back of the cleaning machine body 1, and a fourth drain outlet 32 is opened on the surface of the trigger plate 31.

[0035] When drainage is required, the driving mechanism is operated, so that the water tank 2 and the limit block 24 move toward the trigger plate 31 together, so that the trigger plate 31 contacts the moving plate 28, and then squeezes the moving plate 28. At this time, the moving plate 28 moves inward. When it moves to the limit, the fourth drain port 32 on the surface of the trigger plate 31 will be aligned with the first drain port 25, the second drain port 26 and the third drain port 27, thereby discharging the waste water inside the water tank 2. When the driving mechanism runs in the reverse direction, the trigger plate 31 will be disengaged from the moving plate 28. At this time, the moving plate 28 is reset under the elastic recovery action of the reset spring 30, and the first drain port 25 is blocked by the moving plate 28 to prevent waste water from flowing into the interior of the cleaning machine body 1 during the moving operation.

[0036] By cooperating with the operation of the driving mechanism, when the water tank 2 and the limit block 24 move inward to the extreme state, by utilizing the cooperation between the trigger plate 31 and the moving plate 28, as well as the cooperation between the first drain outlet 25, the second drain outlet 26, the third drain outlet 27 and the fourth drain outlet 32, the waste water in the water tank 2 is automatically triggered to drain according to the moving position, and when the movement operation is performed, it can play a blocking role to prevent the waste water from flowing into the interior of the cleaning machine body 1 during the movement operation.

[0037] Among them, the driving mechanism includes a fixed block 16 fixedly installed on the right side of the water tank 2, a moving block 17 is movably installed inside the cleaning machine body 1, and the moving block 17 and the fixed block 16 are connected by a connecting rod 18. A second motor 20 is fixedly installed on the back of the cleaning machine body 1, and the output end of the second motor 20 is fixedly connected to a rotating rod 19 inside the cleaning machine body 1. The other end of the rotating rod 19 passes through the moving block 17, and the outer surface of the rotating rod 19 is provided with two sections of threaded grooves in opposite directions.

[0038] Start the second motor 20. The operation of the second motor 20 will drive the rotating rod 19 to rotate. Since the surface of the rotating rod 19 is provided with two sections of threaded grooves in opposite directions, the two moving blocks 17 are driven to move relative to or opposite to each other, thereby pushing the water tank 2 to move left and right. When the water tank 2 moves to the left, it will be convenient for the staff to replace the wafer 5 and the chip 6. When it moves to the right to the extreme position, the automatic drainage mechanism will be triggered to perform drainage operations.

[0039] Among them, the spray mechanism includes a linear module 33 fixedly installed inside the cleaning machine body 1, a robotic arm 34 is installed on the side of the linear module 33 for lifting, and a water spray module 36 is fixedly installed at the bottom end of the robotic arm 34. The water spray module 36 can be adjusted from 0 to 180 degrees according to the process angle. A number of flushing heads 37 are provided at the bottom end of the water spray module 36. The flushing head 37 can perform directional xyz-axis cleaning operations, and the bilateral flushing head 37 can realize cleaning on both sides of the gap between the chips 6. A limiting mechanism 35 located inside the linear module 33 is fixedly installed on the side of the robotic arm 34.

[0040] The top sides of the water tank 2 are connected to a concave box 21 at the bottom end of the outer ring 7 through vertical water pipes 22 , and the inner diameter of the concave box 21 is greater than the gap length between the outer ring 7 and the placement table 4 .

[0041] Due to the design of the concave box 21, the water tank 2 is used as a support to lift and push the third drain outlet 27, so that after the cleaning operation, the clean water flows into the interior of the concave box 21 through the gap between the outer ring 7 and the placement table 4, and then flows into the interior of the water tank 2 through the vertical water pipe 22, and finally the discharge operation is carried out.

[0042] The limit distance that the moving plate 28 is compressed to the left is equal to the distance that the trigger plate 31 moves inward after contacting the moving plate 28 until the first drain outlet 25 is aligned with the fourth drain outlet 32 .

[0043] Since the distance values are equal, when the limit block 24 moves to the extreme position, the trigger plate 31 and the moving plate 28 cooperate with each other, so that the fourth drain port 32 on the surface of the trigger plate 31 will be aligned with the first drain port 25, the second drain port 26 and the third drain port 27, thereby discharging the wastewater inside the water tank 2.

[0044] There is a gap between the outer ring 7 and the placement platform 4 , the gap length is three centimeters, and the spoiler 9 is partially in contact with the surface of the placement platform 4 .

[0045] Due to the existence of the gap, the clean water sprayed by the spray mechanism will flow downward through the gap continuously, thereby avoiding serious accumulation of cleaning liquid on the surface and facilitating the subsequent drying operation.

[0046] Among them, the transmission mechanism includes a transmission gear 13 and a transmission gear 2 14 rotatably mounted on the top of the water tank 2, the transmission gear 2 14 is engaged with the first gear 10, the transmission gear 13 is engaged with the transmission gear 2 14, but is not engaged with the first gear 10; the transmission gear 13 and the second gear 12 are connected by a transmission belt 15.

[0047] When the first motor 11 is started, the operation of the first motor 11 will drive the transmission gear 1 13 to rotate through the transmission belt 15, and then the transmission gear 1 13 will mesh with the transmission gear 2 14, thereby driving the transmission gear 2 14 to rotate in the opposite direction, and then the meshing relationship between the transmission gear 2 14 and the first gear 10 will drive the first gear 10 to achieve reverse rotation with the outer ring 7.

[0048] Due to the cooperation between transmission gear 1 13, transmission gear 2 14 and the first gear 10, the effect of the small gear driving the large gear is constructed, so that the outer ring 7 and the placement table 4 achieve a speed difference effect, and the rotation directions are opposite, which is conducive to achieving the trend of reverse water waves.

[0049] Among them, a plurality of guide grooves 38 are provided on the surface of the placement table 4, and the guide grooves 38 are connected to the gap between the outer ring 7 and the placement table 4; a sealing door 39 is provided on the left side of the cleaning machine body 1.

[0050] Due to the design of the guide groove 38, it can drain part of the water flow, ensuring that part of the water can be discharged normally under the reverse push of the spoiler block 9, avoiding excessive accumulation of cleaning water.

[0051] The bottom of the device contains a bottom spray device, which can perform bottom cleaning operations through x-axis movement.

[0052] Working principle and usage process:

[0053] After the staff places the Wafer 5 to be cleaned on the placement table 4 at an appropriate position, the staff starts the spray mechanism and sprays water through the spray mechanism to flush the flux near the placement table 4 and the Wafer 5. At the same time, the first motor 11 is started. Due to the operation of the first motor 11, the second gear 12 will be driven to rotate, thereby driving the outer ring 7 to rotate through the teeth 8, and then driving the spoiler 9 to rotate together; at the same time, the placement table 4 is driven to rotate through the transmission mechanism, and the rotation direction of the placement table 4 is opposite to that of the outer ring 7, and the speed of the outer ring 7 is greater than the speed of the placement table 4; during rotation, the cleaning agent sprayed by the spray mechanism After the clean water falls onto the wafer 5, it flows around under the action of the rotating centrifugal force of the placement table 4. At this time, the counter-rotating spoiler block 9 will contact part of the clean water, thereby driving the clean water to rotate in the opposite direction, thereby forming water ripples and water flow directions opposite to the clean water flowing on the surface of the placement table 4. The stronger reverse water flow blocks the tendency of the clean water on the placement table 4 to flow outward due to the rotating centrifugal force, thereby extending the time for the clean water to flow on the placement table 4 due to the rotating centrifugal force, forming a short immersion area, and through the immersion and rinsing process, improving the cleaning efficiency of the flux and shortening the cleaning time;

[0054] When drainage is required, the driving mechanism is operated, so that the water tank 2 and the limit block 24 move toward the trigger plate 31 together, so that the trigger plate 31 contacts the moving plate 28, and then squeezes the moving plate 28. At this time, the moving plate 28 moves inward. When it moves to the limit, the fourth drain port 32 on the surface of the trigger plate 31 will be aligned with the first drain port 25, the second drain port 26 and the third drain port 27, thereby discharging the waste water inside the water tank 2. When the driving mechanism runs in the reverse direction, the trigger plate 31 will be disengaged from the moving plate 28. At this time, the moving plate 28 is reset under the elastic recovery action of the reset spring 30, and the first drain port 25 is blocked by the moving plate 28 to prevent waste water from flowing into the interior of the cleaning machine body 1 during the moving operation.

[0055] It should be noted that, in this document, relational terms such as first and second, etc., are used only to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any actual relationship or order between these entities or operations. Moreover, the terms "comprises," "comprising," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that includes a list of elements includes not only those elements but also other elements not explicitly listed, or elements inherent to such process, method, article, or apparatus.

[0056] While embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions, and variations may be made to these embodiments without departing from the principles and spirit of the invention, and that the scope of the invention is defined by the appended claims and their equivalents.

Claims

1. A flux cleaning machine, comprising a cleaning machine body (1), characterized in that: A water tank (2) is movably installed inside the cleaning machine body (1), a vertical rod (3) is rotatably installed on the top of the water tank (2), a placement table (4) is fixedly installed on the top of the vertical rod (3), a wafer (5) to be cleaned is placed on the top of the placement table (4), a chip (6) is provided on the top of the wafer (5), the wafer (5) is used to carry the chip (6), and the tilt angle can be adjusted according to the central axis, the inside of the cleaning machine body (1) is installed with an outer ring (7) located on the periphery of the placement table (4) through a bracket, the outer ring (7) and the placement table (4) rotate independently, the outer surface of the outer ring (7) is provided with teeth (8), the outer ring The inner surface of the cleaning machine body (7) is provided with a uniform spoiler (9), the outer surface of the vertical rod (3) is fixedly sleeved with a first gear (10), the interior of the cleaning machine body (1) is fixedly installed with a first motor (11), the output end of the first motor (11) is fixedly connected to the second gear (12), the second gear (12) is meshed with the teeth (8), and the output end of the first motor (11) is connected to the first gear (10) through a transmission mechanism; the interior of the cleaning machine body (1) is provided with a limiting mechanism located on both sides of the water tank (2); the interior of the cleaning machine body (1) is provided with a driving mechanism, and the top of the inner cavity of the cleaning machine body (1) is provided with a plurality of spray mechanisms in different directions.

2. The flux cleaning machine according to claim 1, characterized in that: The limiting mechanism comprises a limiting groove (23) provided inside the cleaning machine body (1), a limiting block (24) fixedly connected to the water storage tank (2) being movably installed inside the limiting groove (23), a moving plate (28) being movably installed in the limiting block (24) near the back of the cleaning machine body (1), a limiting rod (29) being fixedly installed on the left side of the moving plate (28), the end of the limiting rod (29) passing through the limiting block (24), and the outer surface of the limiting rod (29) being elastically sleeved with a stopper located on the moving plate (28). 8) and the inner wall of the limit block (24); a trigger plate (31) is fixedly installed inside the cleaning machine body (1), and the end of the trigger plate (31) extends to the inside of the limit block (24); a first drain port (25) is opened inside the water storage tank (2), a second drain port (26) is opened inside the limit block (24), a third drain port (27) is opened on the back of the cleaning machine body (1), and a fourth drain port (32) is opened on the surface of the trigger plate (31).

3. The flux cleaning machine according to claim 1, characterized in that: The driving mechanism comprises a fixed block (16) fixedly mounted on the right side of the water storage tank (2); a moving block (17) is movably mounted inside the cleaning machine body (1); the moving block (17) and the fixed block (16) are connected to each other by a connecting rod (18); a second motor (20) is fixedly mounted on the back of the cleaning machine body (1); the output end of the second motor (20) is fixedly connected to a rotating rod (19) inside the cleaning machine body (1); the other end of the rotating rod (19) passes through the moving block (17); and the outer surface of the rotating rod (19) is provided with two sections of thread grooves in opposite directions.

4. The flux cleaning machine according to claim 1, characterized in that: The spray mechanism includes a linear module (33) fixedly installed inside the cleaning machine body (1), a mechanical arm (34) is installed on the side of the linear module (33) for lifting, a water spray module (36) is fixedly installed at the bottom end of the mechanical arm (34), the water spray module (36) can be adjusted from 0 to 180 degrees according to the process angle, a plurality of flushing heads (37) are provided at the bottom end of the water spray module (36), the flushing heads (37) can perform directional xyz axis cleaning operations, and the bilateral flushing heads (37) can clean both sides of the gap between the chips (6), and a limiting mechanism (35) located inside the linear module (33) is fixedly installed on the side of the mechanical arm (34).

5. The flux cleaning machine according to claim 1, characterized in that: The top sides of the water storage tank (2) are connected to a concave box (21) located at the bottom end of the outer ring (7) via vertical water pipes (22), and the inner diameter of the concave box (21) is greater than the length of the gap between the outer ring (7) and the placement table (4).

6. The flux cleaning machine according to claim 2, characterized in that: The limit distance that the moving plate (28) is compressed to the left is equal to the moving distance when the trigger plate (31) contacts the moving plate (28) and moves inward until the first drain port (25) is aligned with the fourth drain port (32).

7. The flux cleaning machine according to claim 1, characterized in that: There is a gap between the outer ring (7) and the placement platform (4), the gap length is three centimeters, and the spoiler (9) is partially in contact with the surface of the placement platform (4).

8. The flux cleaning machine according to claim 1, characterized in that: The transmission mechanism comprises a transmission gear 1 (13) and a transmission gear 2 (14) rotatably mounted on the top of the water tank (2); the transmission gear 2 (14) is meshed with the first gear (10); the transmission gear 1 (13) is meshed with the transmission gear 2 (14) but not with the first gear (10); and the transmission gear 1 (13) is connected to the second gear (12) via a transmission belt (15).

9. The flux cleaning machine according to claim 1, characterized in that: The surface of the placement table (4) is provided with a plurality of guide grooves (38), and the guide grooves (38) are communicated with the gap between the outer ring (7) and the placement table (4); and a sealing door (39) is provided on the left side of the cleaning machine body (1).

10. The flux cleaning machine according to claim 1, characterized in that: The bottom of the device is equipped with a bottom spray device, which can perform bottom cleaning operations through x-axis movement.

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