Chemical vapor deposition furnace and chemical vapor deposition device

Abstract

The invention relates to a chemical vapor deposition furnace and a chemical vapor deposition device, and belongs to the technical field of chemical vapor deposition equipment. The chemical vapor deposition furnace comprises a deposition furnace body, a deposition chamber is formed in the deposition furnace body, and a stirring mechanism is installed in the deposition chamber; according to the whole chemical vapor deposition device, hot air is adopted as a power source, the stirring mechanism arranged in the deposition chamber can be pushed to operate, and meanwhile raw materials in the discharging hopper can be driven to be evenly discharged through the arranged transmission box when the stirring mechanism operates; and the operation energy consumption of the whole chemical vapor deposition device is greatly reduced.

Description

Technical Field

[0001] The invention relates to a chemical vapor deposition furnace and a chemical vapor deposition device, belonging to the technical field of chemical vapor deposition equipment. Background Art

[0002] Chemical vapor deposition (CVD) is a material preparation technology that forms a solid thin film on a substrate surface through a gas-phase chemical reaction. Its basic principle is that a gaseous precursor undergoes a chemical reaction under high temperature or energy excitation, generating a solid product that is deposited on the substrate, while the by-products are carried away by the gas flow. Chemical reaction types include thermal decomposition, redox, and hydrolysis. A related art provides a chemical vapor deposition furnace, comprising: a furnace body, a material feed port, a material discharge port, an air inlet, an air outlet, and a stirring structure disposed inside the furnace body; the chemical vapor deposition furnace further comprises a driving device disposed outside the furnace body, the driving device comprising a driving device for driving the furnace body to rotate itself, and a driving device for driving the stirring structure disposed inside the furnace body to rotate; When using this chemical vapor deposition furnace, after the material enters the furnace body, it can move repeatedly in the furnace cavity driven by the furnace body and the stirring structure. The dynamic material is evenly contacted with the carbon source gas, and the cracked carbon is evenly deposited on the surface of the material, thereby achieving uniform carbon coating; The chemical vapor deposition furnace has a simple structural design and is easy to use. However, it also has obvious problems and defects. For example, the unloading of the raw material bin and the rotation of the stirring structure are respectively performed by two separate drive devices, which results in high energy consumption for the operation of the entire chemical vapor deposition furnace. In addition, in order to ensure that the flow rate of raw material unloading is consistent with the flow rate of hot air transported by the stirring structure, a controller is required to coordinate the operation steps of the drive device for unloading the raw material bin and the drive device for driving the stirring structure, resulting in excessively high installation costs for the entire chemical vapor deposition furnace. Summary of the Invention In order to solve the above technical problems, the present invention provides a chemical vapor deposition furnace and a chemical vapor deposition device, which solve the problems of high energy consumption and high installation cost of the chemical vapor deposition furnace in the above background technology. The technical solution adopted by the present invention to solve its technical problem is: A chemical vapor deposition furnace, comprising: The deposition furnace body forms a deposition chamber inside the deposition furnace body. The deposition chamber is equipped with a stirring mechanism that uses the transported hot air as a power source to rotate, which can not only stir and mix the raw materials and the hot air to improve the efficiency of the chemical vapor deposition reaction; but also can transport and discharge the finished product after the chemical vapor deposition reaction from the interior of the deposition chamber; The stirring mechanism includes a turbine, a rotating shaft, a long spiral stirring frame and a short spiral stirring frame. A rotating shaft is provided at the axis center of the turbine and is rotatably installed inside the deposition chamber. The short spiral stirring frame and the long spiral stirring frame are installed in a linearly staggered distribution on the part of the rotating shaft located inside the deposition chamber.

[0003] Preferably, the upper end of one side of the deposition furnace body is connected to a discharge pipe, and a discharge hopper is installed on the upper end of the discharge pipe; a transmission box is provided inside the deposition chamber, and one end of the rotating shaft passes through the transmission box. At the same time, a discharge shaft is provided at the upper end of the transmission box, and the top end of the discharge shaft is rotatably installed on the inner wall of the upper end of the discharge hopper. A stirring rod is provided on the part of the discharge shaft located inside the discharge hopper, and a discharge screw conveyor paddle is installed on the part of the discharge shaft located inside the discharge pipe.

[0004] Preferably, a main bevel gear is provided on the portion of the rotating shaft located inside the transmission box, and a secondary bevel gear is installed on the portion of the blanking shaft located inside the transmission box, and the outer side of the secondary bevel gear is meshed with the outer side of the main bevel gear.

[0005] Preferably, a chemical vapor deposition device includes the above-mentioned chemical vapor deposition furnace, and the chemical vapor deposition device includes: a gas collecting box, a deposition furnace body, a finished product bin and a tail gas absorption tank, wherein one end of the gas collecting box is connected to the first air inlet pipe and the second air inlet pipe respectively at the upper and lower ends; the other end of the gas collecting box is connected to the interior of the deposition furnace body through an air supply pipe; the lower end of one side of the deposition furnace body is connected to the finished product bin, and a discharge pipe is installed at the bottom of the finished product bin; in addition, one end of the deposition furnace body is connected to the interior of the tail gas absorption tank through the tail gas pipe, the interior of the tail gas absorption tank is filled with alkaline neutralization liquid, and one side of the tail gas absorption tank is connected to the clean air pipe.

[0006] Preferably, a diffuser is installed inside the air collecting box, and the expanded position of one end of the diffuser is connected to the first air intake pipe and the second air intake pipe respectively; the narrow position of the other end of the diffuser is connected to the air supply pipe, and a turbine is installed at the position where the diffuser and the air supply pipe are connected.

[0007] Compared with the prior art, the present invention has the following beneficial effects: Compared with the existing chemical vapor deposition furnace, the chemical vapor deposition device has the following advantages: The invention provides a stirring mechanism inside the deposition furnace body, the stirring mechanism including a turbine, a rotating shaft, a long spiral stirring rack and a short spiral stirring rack. The rotating shaft is provided at the axis center of the turbine and is rotatably mounted inside the deposition chamber. The short spiral stirring rack and the long spiral stirring rack are linearly staggered and arranged on the portion of the rotating shaft located inside the deposition chamber. The stirring mechanism arranged inside the deposition chamber uses the transported hot air as a power source to rotate, which can not only stir and mix the raw materials and the hot air, thereby improving the efficiency of the chemical vapor deposition reaction, but also can transport and discharge the finished products after the chemical vapor deposition reaction from the deposition chamber. At the same time, a transmission box is provided inside the deposition chamber, one end of the rotating shaft passes through the transmission box, and a discharge shaft is provided at the upper end of the transmission box, and the top end of the discharge shaft is rotatably installed on the inner wall of the upper end of the discharge hopper, and a stirring rod is provided on the part of the discharge shaft located inside the discharge hopper, and a discharge screw conveyor is installed on the part of the discharge shaft located inside the discharge pipe; in this way, when hot air is sent into the deposition chamber to drive the rotating shaft of the stirring mechanism to rotate, the rotating shaft will drive the discharge shaft to rotate through the transmission box, and when the discharge shaft rotates, it will drive the stirring rod and the discharge screw conveyor installed on the discharge shaft to rotate at the same time, the rotating stirring rod is used to stir and disperse the raw materials, and the rotating discharge screw conveyor pushes the raw materials dispersed in the discharge hopper to the inside of the deposition chamber in an orderly manner, and stirs and mixes them with the incoming hot air to realize chemical vapor deposition reaction; Therefore, the entire chemical vapor deposition device uses hot air as a power source, which can not only drive the stirring mechanism set inside the deposition chamber to operate, but also can drive the raw materials inside the hopper to be uniformly discharged through the transmission box when the stirring mechanism is running; by controlling the output flow rate of the hot air, the discharge flow rate of the discharge pipe can be controlled, so as to ensure that the incoming hot air and the raw materials entering the deposition chamber are always in coordination. When the hot air flow rate is large, the flow rate of the incoming raw materials is large, thus realizing the automatic control operation of the raw material discharge; It not only greatly reduces the operating energy consumption of the entire chemical vapor deposition device, but also reduces the installation cost. BRIEF DESCRIPTION OF THE DRAWINGS

[0008] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on the structures shown in these drawings without paying any creative work.

[0009] Figure 1 Schematic diagram of the structure of the chemical vapor deposition device of the present invention.

[0010] Figure 2 Schematic diagram of the internal structure of the chemical vapor deposition device of the present invention.

[0011] Figure 3 This is a schematic diagram of the internal structure of the transmission box of the chemical vapor deposition device of the present invention.

[0012] Figure 4 It is a structural schematic diagram of the stirring mechanism of the chemical vapor deposition device of the present invention.

[0013] In the figure: 1-first air inlet pipe, 2-second air inlet pipe, 3-gas collecting box, 4-air supply pipe, 5-deposition furnace body, 6-discharge pipe, 7-discharge hopper, 8-finished product warehouse, 9-discharge pipe, 10-exhaust pipe, 11-exhaust absorption tank, 12-clean air pipe, 13-diffuser, 14-turbine, 15-rotating shaft, 16-transmission box, 17-discharge shaft, 18-discharge screw conveyor, 19-stirring rod, 20-deposition chamber, 21-long spiral stirring frame, 22-short spiral stirring frame, 23-alkaline neutralization liquid, 24-main bevel gear, 25-secondary bevel gear. DETAILED DESCRIPTION

[0014] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0015] See also Figure 1-4 , the present invention provides a technical solution: A chemical vapor deposition furnace, comprising: A deposition furnace body 5 is configured to mix hot air with raw materials to achieve chemical deposition. A deposition chamber 20 is formed within the deposition furnace body 5, and a stirring mechanism is installed within the deposition chamber 20. The stirring mechanism, located within the deposition chamber 20, utilizes the delivered hot air as a power source to rotate, thereby stirring and mixing the raw materials and hot air, thereby improving the efficiency of the chemical vapor deposition reaction. Furthermore, the finished product after the chemical vapor deposition reaction is transported and discharged from the deposition chamber 20. The stirring mechanism includes a turbine 14, a rotating shaft 15, a long spiral stirring frame 21 and a short spiral stirring frame 22. The rotating shaft 15 is provided at the axis of the turbine 14 and is rotatably mounted inside the deposition chamber 20. The short spiral stirring frame 22 and the long spiral stirring frame 21 are linearly staggered and arranged on the portion of the rotating shaft 15 located inside the deposition chamber 20. In an embodiment of the present invention, when hot air is transported to the interior of the deposition furnace body 5, the hot air flow generates turbulent force, which can drive the turbine 14 to rotate. When the turbine 14 rotates, it drives the rotating shaft 15 installed at the axial center position of the turbine 14 to rotate. When the rotating shaft 15 rotates, it drives the long spiral stirring rack 21 and the short spiral stirring rack 22 installed on the rotating shaft 15 in a staggered distribution to rotate spirally at the same time. The rotating short spiral stirring rack 22 cooperates with the long spiral stirring rack 21 to stir and mix the raw materials and the hot air along the spiral motion direction to achieve chemical vapor deposition reaction, and at the same time can realize spiral conveying operation of the raw materials after the deposition reaction. See also Figure 1-3 In one embodiment of the present invention, the upper end of one side of the deposition furnace body 5 is connected to the discharge pipe 6, and the upper end of the discharge pipe 6 is installed with a discharge hopper 7; a transmission box 16 is provided inside the deposition chamber 20, and one end of the rotating shaft 15 passes through the transmission box 16. At the same time, a discharge shaft 17 is provided at the upper end of the transmission box 16. The top end of the discharge shaft 17 is rotatably mounted on the inner wall of the upper end of the discharge hopper 7. A stirring rod 19 is provided on the portion of the discharge shaft 17 located inside the discharge hopper 7, and a discharge screw conveyor 18 is installed on the portion of the discharge shaft 17 located inside the discharge pipe 6; In an embodiment of the present invention, the raw materials for the reaction are temporarily stored in the discharge hopper 7. When hot air is sent into the deposition chamber 20 to drive the rotating shaft 15 of the stirring mechanism to rotate, the rotating shaft 15 drives the discharge shaft 17 to rotate through the transmission box 16. When the discharge shaft 17 rotates, the stirring rod 19 and the discharge screw conveyor 18 installed on the discharge shaft 17 are driven to rotate at the same time. The rotating stirring rod 19 is used to stir and disperse the raw materials, and the rotating discharge screw conveyor 18 pushes the raw materials dispersed in the discharge hopper 7 into the deposition chamber 20 in an orderly manner, and stirs and mixes them with the incoming hot air to achieve a chemical vapor deposition reaction. By controlling the output flow rate of the hot air, the discharge flow rate of the discharge pipe 6 can be controlled, so that the hot air introduced and the raw materials entering the deposition chamber 20 are always in harmony. When the hot air flow rate is large, the flow rate of the incoming raw materials is large, thus realizing the automatic control operation of the raw material discharge; See also Figure 3 Specifically, a main bevel gear 24 is provided on the portion of the rotating shaft 15 located inside the transmission box 16, and a secondary bevel gear 25 is installed on the portion of the blanking shaft 17 located inside the transmission box 16, and the outer side of the secondary bevel gear 25 is meshed with the outer side of the main bevel gear 24; In the embodiment of the present invention, when the rotating shaft 15 rotates, it drives the main bevel gear 24 installed on the rotating shaft 15 to rotate. When the main bevel gear 24 rotates, it drives the sub-bevel gear 25 to rotate, thereby rotating the discharge shaft 17 provided at the axial center position of the sub-bevel gear 25, so as to rotate the stirring rod 19 and the discharge screw conveying paddle 18 installed on the discharge shaft 17. The rotating stirring rod 19 is used to stir and disperse the raw materials, and the rotating discharge screw conveying paddle 18 pushes the raw materials dispersed in the discharge hopper 7 into the deposition chamber 20 in an orderly manner, and stirs and mixes them with the incoming hot air to achieve a chemical vapor deposition reaction. See also Figure 1-4 In one embodiment of the present invention, a chemical vapor deposition device including the above-mentioned chemical vapor deposition furnace includes: Gas collecting box 3, deposition furnace body 5, finished product bin 8 and tail gas absorption tank 11. One end of the gas collecting box 3 is connected to the first air inlet pipe 1 and the second air inlet pipe 2 respectively; the other end of the gas collecting box 3 is connected to the interior of the deposition furnace body 5 through the air supply pipe 4; the lower end of one side of the deposition furnace body 5 is connected to the finished product bin 8, and the bottom end of the finished product bin 8 is installed with a discharge pipe 9; in addition, one end of the deposition furnace body 5 is connected to the interior of the tail gas absorption tank 11 through the tail gas pipe 10. The tail gas absorption tank 11 is filled with alkaline neutralizing liquid 23, and one side of the tail gas absorption tank 11 is connected to the clean air pipe 12. In the embodiment of the present invention, hot air of different temperatures is introduced into the air collecting box 3 at different stages through the first air inlet pipe 1 and the second air inlet pipe 2. After passing through the air collecting box 3, the hot air enters the deposition furnace body 5 through the air supply pipe 4. Inside the deposition furnace body 5, the hot air and the raw materials are stirred and mixed by the stirring mechanism to achieve a chemical vapor deposition reaction. Finally, the finished product enters the finished product bin 8 and is discharged from the discharge pipe 9 connected to the bottom end of the finished product bin 8. The exhaust gas generated during the chemical vapor deposition reaction is directed through the tail gas pipe 10 to the inside of the tail gas absorption tank 11, where it undergoes an acid-base neutralization reaction with the alkaline neutralizing liquid 23 filled in the tail gas absorption tank 11 to purify the exhaust gas. The purified air is then discharged through the connected clean air pipe 12. See also Figure 2 Specifically, a diffuser 13 is installed inside the air collecting box 3. The expanded position of one end of the diffuser 13 is connected to the first intake pipe 1 and the second intake pipe 2 respectively; the narrow position of the other end of the diffuser 13 is connected to the air supply pipe 4. A turbine 14 is installed at the position where the diffuser 13 and the air supply pipe 4 are connected. In the embodiment of the present invention, by installing a diffuser 13 inside the air collecting box 3, the incoming flowing air can be pressurized, thereby increasing the turbulent force caused by the hot air on the turbine 14, accelerating the rotation of the turbine 14 and driving the rotation shaft 15 provided at the axis center of the turbine 14 to rotate; The workflow of this embodiment is: Open the first air inlet pipe 1 and introduce hot protective gas into the deposition furnace body 5 through the air supply pipe 4 to perform gas exchange and heat the interior of the deposition furnace body 5. At this time, the interior of the lower hopper 7 is temporarily unsealed for feeding. When the temperature reaches 750-950°C, the second air inlet pipe 2 is opened to introduce the carbon source gas into the deposition furnace body 5. As the carbon source gas enters, the stirring mechanism is driven to stir the carbon source gas and the raw material evenly inside the deposition furnace body 5 and react. After the reaction gas box has been in operation for 36 hours, close the second air inlet pipe 2 and open the first air inlet pipe 1, introduce inert protective gas to drive the stirring mechanism to continue to operate, and push the finished product out; The exhaust gas generated during the chemical vapor deposition reaction is directed through the tail gas pipe 10 to the inside of the tail gas absorption tank 11, where it undergoes an acid-base neutralization reaction with the alkaline neutralizing liquid 23 filled in the tail gas absorption tank 11 to purify the exhaust gas. The purified air is then discharged through the connected clean air pipe 12. While embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions, and variations may be made to these embodiments without departing from the principles and spirit of the invention, and that the scope of the invention is defined by the appended claims and their equivalents.

Claims

1. Chemical vapor deposition furnace, characterized by include: A deposition furnace body (5) is provided, wherein a deposition chamber (20) is formed inside the deposition furnace body (5), and a stirring mechanism is installed inside the deposition chamber (20) which uses the transported hot air as a power source to rotate, thereby stirring and mixing the raw materials and the hot air, thereby improving the efficiency of the chemical vapor deposition reaction; and at the same time, the finished product after the chemical vapor deposition reaction is transported and discharged from the interior of the deposition chamber (20); The stirring mechanism comprises a turbine (14), a rotating shaft (15), a long spiral stirring frame (21) and a short spiral stirring frame (22). The rotating shaft (15) is provided at the axis center of the turbine (14). The rotating shaft (15) is rotatably installed inside the deposition chamber (20). The short spiral stirring frame (22) and the long spiral stirring frame (21) are installed in a linearly staggered distribution on the portion of the rotating shaft (15) located inside the deposition chamber (20).

2. The chemical vapor deposition furnace according to claim 1, wherein: The upper end of one side of the deposition furnace body (5) is connected to the discharge pipe (6), and the upper end of the discharge pipe (6) is installed with a discharge hopper (7); a transmission box (16) is provided inside the deposition chamber (20), one end of the rotating shaft (15) passes through the transmission box (16), and the upper end of the transmission box (16) is provided with a discharge shaft (17), the top end of the discharge shaft (17) is rotatably installed on the inner wall of the upper end of the discharge hopper (7), a stirring rod (19) is provided on the portion of the discharge shaft (17) located inside the discharge hopper (7), and a discharge screw conveyor paddle (18) is installed on the portion of the discharge shaft (17) located inside the discharge pipe (6).

3. The chemical vapor deposition furnace according to claim 2, wherein: A main bevel gear (24) is provided on the portion of the rotating shaft (15) located inside the transmission box (16), and a secondary bevel gear (25) is installed on the portion of the blanking shaft (17) located inside the transmission box (16), and the outer side of the secondary bevel gear (25) is meshed with the outer side of the main bevel gear (24).

4. A chemical vapor deposition device comprising a chemical vapor deposition furnace as claimed in any one of claims 1 to 3, characterized in that include: An air collecting box (3), a deposition furnace body (5), a finished product bin (8), and an exhaust gas absorption tank (11); one end of the air collecting box (3) is connected to a first air inlet pipe (1) and a second air inlet pipe (2) at the top and bottom, respectively; the other end of the air collecting box (3) is connected to the interior of the deposition furnace body (5) through an air supply pipe (4); the lower end of one side of the deposition furnace body (5) is connected to the finished product bin (8), and a discharge pipe (9) is installed at the bottom end of the finished product bin (8); In addition, one end of the deposition furnace body (5) is connected to the interior of the tail gas absorption tank (11) through the tail gas pipe (10), the tail gas absorption tank (11) is filled with alkaline neutralization liquid (23), and one side of the tail gas absorption tank (11) is connected to the clean gas pipe (12).

5. The chemical vapor deposition apparatus according to claim 4, wherein: A diffuser pipe (13) is installed inside the air collecting box (3), and the diffuser pipe (13) is connected to the first air intake pipe (1) and the second air intake pipe (2) at the expanded position at one end; the diffuser pipe (13) is connected to the air supply pipe (4) at the narrow position at the other end, and a turbine (14) is installed at the position where the diffuser pipe (13) is connected to the air supply pipe (4).

Images