Atomic gas chamber filling device and method based on hidden drying oven

Abstract

The invention discloses an atomic gas chamber filling device and method based on a hidden drying oven. Through the lifting mechanism in the device, the drying oven can heat the atomic gas chamber from bottom to top; the lifting mechanism is composed of a high-thrust electric lifting column and a set of linear sliding rails, the electric lifting column is fixed to a bottom plate in the device, and the sliding rails are connected with the oven and a side frame of the device. The stroke of the lifting mechanism is close to the height of the oven, so that a smaller stroke range can be selected and is not limited by the size of an operation space; after gas chamber filling is completed, the drying oven can be completely hidden below the device platform, the size of the whole filling device is reduced, and meanwhile the operation space of preparation personnel is increased; and in combination with temperature regulation, the quantitative and uniform filling process of alkali metal atoms is realized. According to the atomic gas chamber filling device, the stability and the operation convenience of the filling device are improved while the atomic gas chamber is quantitatively and uniformly filled.

Description

Technical Field

[0001] The present invention relates to the technical field of quantum sensor device preparation, and in particular to an atomic gas chamber filling device and method based on a hidden oven. Background Art

[0002] The alkali metal atom gas cell is a core component of quantum instruments, and its filling process and technology directly impact its performance. The preparation of the atomic gas cell generally includes vacuum pumping and filling equipment, heating equipment, and temperature controllers. The heating equipment is particularly crucial for the filling of alkali metal atoms, affecting the vacuum level of the filling line and the amount of alkali metal atoms filled.

[0003] In traditional filling devices, the heating method is from top to bottom. The lifting mechanism and support frame that assist the operation of the heating equipment are both set above the device operating table. At the same time, in order to reserve operating space for the preparation personnel, the vertical distance between the heating equipment and the operating table is relatively far, and the lifting mechanism selected has a large stroke. The overall height of the filling device is relatively high, resulting in poor operating stability of the heating equipment. Summary of the Invention

[0004] In view of the deficiencies in the prior art, the present invention provides an atomic gas chamber filling device and method based on a hidden oven.

[0005] An atomic gas chamber filling device based on a hidden oven, comprising:

[0006] Vacuum pump set, used to evacuate the inflation pipeline;

[0007] an air filling pipeline comprising at least one air inlet valve and at least one vacuum valve, and an atomic gas chamber connected to the air inlet valve and the vacuum valve;

[0008] A lifting mechanism comprising an electric lifting column, a slider, a slider connecting plate, and a guide rail. The bottom of the electric lifting column is fixed to a mounting plate inside the filling device, and the top is fixed to the bottom of the oven. The electric lifting column can drive the oven up and down within a travel range.

[0009] An oven, the oven opening is upward, and a heating tube is provided inside the oven, the heating tube is connected to a temperature controller, and is used to heat the gas filling pipeline and the atomic gas chamber;

[0010] A temperature controller capable of adjusting the temperature in the oven;

[0011] A push-pull hanging sliding cover, which can be pushed and pulled in directions parallel and perpendicular to the operating table and finally hung on the side of the device, is used to open and close the vertical operation channel of the oven;

[0012] Among them, when the height of the electric lifting column is the initial height, the oven is completely hidden below the filling device operating table; when the height of the electric lifting column is the sum of the initial height and the stroke, the bottom of the oven is located above the filling device operating table.

[0013] A method for filling an atomic gas chamber based on a hidden oven, using the above-mentioned device, comprises the following steps:

[0014] Step 1. Connect several atomic gas chambers and alkali metal containers to the gas filling pipeline by welding;

[0015] Step 2. Open the push-pull hanging sliding cover, start the lifting mechanism to raise the oven to the highest position, buckle the oven cover on the oven to keep it warm, and start the heating belt and oven to heat the inflation pipeline. At the same time, the vacuum pump group evacuates the entire inflation pipeline;

[0016] Step 3. After the vacuum operation is completed, the oven cover is removed and the lifting mechanism is activated to lower the oven below the operating table of the filling device. The externally heated alkali metal container releases alkali metal atomic vapor into the filling pipeline and several atomic gas chambers;

[0017] Step 4. Activate the lifting mechanism again to raise the oven to its highest position, close the oven cover, and activate the temperature controller to adjust the temperature inside the oven so that the alkali metal atoms are quantitatively and evenly filled into the atomic gas chamber.

[0018] Step 5. After the atomic gas chamber is heated, remove the oven cover, activate the lifting mechanism to lower the oven below the filling device operating table, and close the push-pull hanging slide cover;

[0019] Step 6. Remove the atomic gas chamber from the inflation pipeline to complete the filling of the alkali metal atomic gas chamber.

[0020] The technical advantages of this invention are as follows: Compared with existing technologies, the filling device uses a lifting mechanism to achieve an upward lift of the oven from bottom to top. The oven can be completely hidden below the device operating table, eliminating the need for a large number of supporting frames, reducing the height of the entire filling device and increasing the operating space for the preparation personnel. Furthermore, the lifting mechanism's travel is close to the oven's height, resulting in a small lifting stroke. Only one set of linear slides is required to improve the oven's operational stability. A temperature controller is used to regulate the temperature of each atomic gas chamber, achieving uniform and quantitative filling of alkali metal atoms.

[0021] This device integrates a vacuum pump group, a gas charging pipeline, a lifting oven, and a multi-speed temperature controller, realizing an efficient and quality-controlled charging process, and providing equipment and technical support for the research on the preparation of high-performance quantum instruments. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] Figure 1 This is a schematic diagram of the alkali metal atom gas chamber in the present invention under a heated state;

[0023] Figure 2 Schematic diagram of the oven and lifting mechanism in the present invention;

[0024] Figure 3 Schematic diagram comparing the lifting mechanism of the filling device of the present invention when it is in the lowest position and the highest position; DETAILED DESCRIPTION

[0025] The present invention will be further described below with reference to the embodiments and drawings, but the scope of protection of the present invention should not be limited thereto.

[0026] like Figure 1 As shown, an atomic gas chamber filling device based on a hidden oven according to an embodiment of the present application includes a vacuum pump group, a gas filling pipeline, an alkali metal container 6, a lifting mechanism 8, an oven 9 and a temperature controller.

[0027] Before the alkali metal atom gas chamber is filled, the oven 9 is completely below the operating platform of the filling device.

[0028] In some embodiments, the vacuum pump group includes a molecular pump 1 , an ion pump 4 and a dry pump 11 , and the molecular pump 1 , the ion pump 4 and the dry pump 11 can be used to sequentially evacuate the gas pipeline including the atomic gas chamber 7 .

[0029] In some embodiments, the inflation circuit includes a first air inlet valve 2 , a second air inlet valve 3 , a third air inlet valve 13 , an atomic gas chamber 7 , a first vacuum valve 10 , a second vacuum valve 12 , a third vacuum valve 15 and a digital vacuum gauge 14 .

[0030] Furthermore, the first air inlet valve 2, the second air inlet valve 3 and the third air inlet valve 13 are always in a connected state, and are used to control the filling of the inert gas. The first vacuum valve 10 is located in the pipeline between the vacuum pump group and the atomic gas chamber 7, and is used to control the connection or disconnection of the vacuum pump group with the atomic gas chamber 7 and the alkali metal container 6. The second vacuum valve 12 is used to control the connection or disconnection of the dry pump 11 with the inflation pipeline. The third vacuum valve 15 is located in the pipeline between the molecular pump 1 and the digital vacuum gauge 14, and is used to control the connection or disconnection of the digital vacuum gauge 14 with the inflation pipeline. The digital vacuum gauge 14 is used to monitor the vacuum degree in the inflation pipeline. The vacuum pump group and the inflation pipeline are connected via a vacuum joint.

[0031] Furthermore, the alkali metal container 6 is used to store unopened alkali metal. After being externally heated, the alkali metal container 6 can release alkali metal atomic vapor into the inflation pipeline.

[0032] Furthermore, the oven 9 is located in the pipeline between the first vacuum valve 10 and the alkali metal container 6 . When the atomic gas cells 7 need to be heated, the oven 9 is driven by the lifting mechanism 8 to rise to the highest position and cover all the atomic gas cells 7 .

[0033] like Figure 2 As shown, in the embodiment of the present application, the lifting mechanism 8 includes an electric lifting column 8a, a slider 8b, a slider connecting plate 8c, and a guide rail 8d.

[0034] The oven 9 opens upwards, has a height of H1, and is flanked by two symmetrical slots aligned with the oven's direction of movement. These slots accommodate the horizontal gas lines on either side of the atomic gas chamber 7. The heating tubes within the oven 9 are connected to a temperature controller, which heats some of the gas lines and all of the atomic gas chambers 7. The temperature controller regulates the oven's temperature within a range of 25°C to 300°C.

[0035] The bottom of the electric lifting column 8a is fixed to the mounting plate inside the filling device, and its top is fixed to the bottom of the oven 9. The electric lifting column 8a has an initial height of H, a stroke of S, and a maximum rise height of H + S. The stroke S is determined by the height H1 of the oven 9, satisfying S ≥ H1.

[0036] The slider connecting plate 8c is fixedly connected to the slider 8b and the side surface of the oven 9 respectively. The length of the slider 8b along the sliding direction is L1.

[0037] The guide rail 8d is fixed on the vertically placed profile, and the length L of the guide rail 8d satisfies: L≥L1+S.

[0038] When the height of the electric lifting column is H, the oven can be completely hidden below the operating table of the filling device; when the height of the electric lifting column is H+S, the bottom of the oven is located above the operating table of the filling device;

[0039] like Figure 3 As shown, the top cover of the filling device is a split-type structure. A sliding cover 16, designed to be pushed and pulled, hangs directly above the oven 9. This cover 16 can be pushed and pulled outward in directions parallel and perpendicular to the operating table, ultimately hanging from the side of the device, opening and closing the vertical operating path of the oven 9. When heating is not required, the cover 16 is closed, and the oven 9 can be hidden beneath the filling device operating table, leaving only the glass pipes for inflation directly above it, significantly increasing operating space. When heating the atomic gas chamber 7 is required, the cover 16 is opened and hung outside the device. The operating path of the oven 9 is opened, and the electric lifting column 8a is powered on. The electric lifting column 8a drives the oven 9 upward, which in turn drives the slider connecting plate 8c and slider 8b upward along the guide rail 8d. The electric lifting column 8a stops when it reaches its maximum travel S.

[0040] An atomic gas chamber filling method based on a hidden oven according to an embodiment of the present application includes the following steps:

[0041] (1) Connect several atomic gas chambers 7 and alkali metal containers 6 to the gas filling pipeline by welding. At this time, the alkali metal in the alkali metal container 6 is in an unsealed state.

[0042] (2) Before filling the alkali metal atomic gas chamber, the gas filling pipeline needs to be evacuated first; the sliding cover 16 is opened, the lifting mechanism 8 is started to make the oven 9 rise to the highest position and the oven cover 5 is buckled on the oven 9, the heating belt and the temperature controller of the oven 9 are turned on, and the gas filling pipeline and the atomic gas chamber 7 are heated to facilitate the vacuum operation.

[0043] (3) Open the first vacuum valve 10, the second vacuum valve 12 and the third vacuum valve 15, and the molecular pump 1, the ion pump 4 and the other valves are all closed. At this time, the dry pump 11, the atomic gas chamber 7 and the alkali metal container 6 are in a connected state; start the dry pump 11, and after the inflation pipeline reaches a predetermined vacuum degree, close the dry pump 11 and the second vacuum valve 12; start the molecular pump 1, and after the inflation pipeline reaches a predetermined vacuum degree, close the molecular pump 1; start the ion pump 4, and after the inflation pipeline 2 reaches a predetermined vacuum degree, close the ion pump 4, the first vacuum valve 10 and the power supply of the temperature controller of the heating belt and the oven 9.

[0044] (4) After completing the vacuum operation on the gas filling pipeline, remove the oven cover 5, start the lifting mechanism 8 to lower the oven 9 to below the filling device platform; externally heat the alkali metal container 6, and release the alkali metal vapor into the gas filling pipeline between the first vacuum valve 10 and the alkali metal container 6 and all the atomic gas chambers 7.

[0045] (5) Start the lifting mechanism 8 to raise the oven 9 to the highest position and buckle the oven cover 5 on the oven 9. Start the temperature controller to adjust the temperature of the oven 9 so that the alkali metal atoms are quantitatively and evenly filled into the atomic gas chamber.

[0046] (6) Remove the oven cover 5, lower the oven 9 to below the filling device platform through the lifting mechanism 8, close the sliding cover 16, and remove all the atomic gas chambers 7 by hot melting to complete the filling process of the alkali metal atomic gas chambers.

[0047] The device of the embodiment of the present application integrates a vacuum pump group, a lifting mechanism, a hidden oven, and a multi-speed temperature controller. It adopts a bottom-up heating method. The oven and the lifting mechanism can be hidden inside the device. The volume of the device is significantly reduced, the oven operates stably, and combined with the temperature controller, it can efficiently complete the filling process of the alkali metal atomic gas chamber.

[0048] The above-mentioned specific implementation can be partially adjusted in different ways by those skilled in the art without departing from the principles and purpose of the present invention. The scope of protection of the present invention shall be based on the claims and shall not be limited by the above-mentioned specific implementation. All implementation schemes within its scope shall be subject to the constraints of the present invention.

Claims

1. An atomic gas chamber filling device based on a hidden oven, characterized in that: include: Vacuum pump set, used to evacuate the inflation pipeline; an air filling pipeline comprising at least one air inlet valve and at least one vacuum valve, and an atomic gas chamber connected to the air inlet valve and the vacuum valve; A lifting mechanism comprising an electric lifting column, a slider, a slider connecting plate, and a guide rail. The bottom of the electric lifting column is fixed to a mounting plate inside the filling device, and the top is fixed to the bottom of the oven. The electric lifting column can drive the oven up and down within a travel range. An oven, the oven opening is upward, and a heating tube is provided inside the oven, the heating tube is connected to a temperature controller, and is used to heat the gas filling pipeline and the atomic gas chamber; A temperature controller capable of adjusting the temperature in the oven; A push-pull hanging sliding cover, which can be pushed and pulled in directions parallel and perpendicular to the operating table and finally hung on the side of the device, is used to open and close the vertical operation channel of the oven; Among them, when the height of the electric lifting column is the initial height, the oven is completely hidden below the filling device operating table; when the height of the electric lifting column is the sum of the initial height and the stroke, the bottom of the oven is located above the filling device operating table.

2. The atomic gas chamber filling device according to claim 1, characterized in that: The stroke meets the overall height of the oven.

3. The atomic gas chamber filling device according to claim 2, characterized in that: The length of the guide rail satisfies the length of the slider along the sliding direction plus the stroke.

4. The atomic gas chamber filling device according to any one of claims 1 to 3, characterized in that: The temperature adjustment range of the temperature controller is 25°C-300°C.

5. The atomic gas chamber filling device according to claim 4, characterized in that: The device also includes an alkali metal container, which is connected to the inflation pipeline by welding and is used to store unopened alkali metal and release alkali metal atomic vapor into the inflation pipeline and the atomic gas chamber after external heating.

6. The atomic gas chamber filling device according to claim 1, characterized in that: The inflation line also includes a digital vacuum gauge for monitoring the vacuum level in the inflation line.

7. The atomic gas chamber filling device according to claim 1 or 6, characterized in that: Two symmetrical slot channels are provided on both sides of the oven for accommodating the inflation pipes on both sides of the atomic gas chamber in the horizontal direction.

8. The atomic gas chamber filling device according to claim 1, characterized in that: The stroke of the electric lifting column of the lifting mechanism is close to the height of the oven, so as to improve the stability of the operation of the oven.

9. A method for filling an atomic gas chamber based on a hidden oven, using the device according to any one of claims 1 to 8, characterized in that: The method comprises the following steps: Step 1. Connect several atomic gas chambers and alkali metal containers to the gas filling pipeline by welding; Step 2. Open the push-pull hanging sliding cover, start the lifting mechanism to raise the oven to the highest position, buckle the oven cover on the oven to keep it warm, and start the heating belt and oven to heat the inflation pipeline. At the same time, the vacuum pump group evacuates the entire inflation pipeline; Step 3. After the vacuum operation is completed, the oven cover is removed and the lifting mechanism is activated to lower the oven below the operating table of the filling device. The externally heated alkali metal container releases alkali metal atomic vapor into the filling pipeline and several atomic gas chambers; Step 4. Activate the lifting mechanism again to raise the oven to its highest position, close the oven cover, and activate the temperature controller to adjust the temperature inside the oven so that the alkali metal atoms are quantitatively and evenly filled into the atomic gas chamber. Step 5. After the atomic gas chamber is heated, remove the oven cover, activate the lifting mechanism to lower the oven below the filling device operating table, and close the push-pull hanging slide cover; Step 6. Remove the atomic gas chamber from the inflation pipeline to complete the filling of the alkali metal atomic gas chamber.

10. The method according to claim 9, characterized in that The vacuum pump group described in step 2 includes a molecular pump, an ion pump and a dry pump, which are used to sequentially evacuate the gas filling pipeline including the atomic gas chamber.

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