Evaporation coating machine with light source multi-angle adjusting function

Abstract

The application discloses an evaporation coating machine with light source multi-angle adjusting function, and relates to the technical field of evaporation coating machines.The evaporation coating machine comprises a coating cabin, a motor one, a workpiece carrier, a substrate, a lifting assembly, an ion beam light source, an electron gun, an adjusting assembly, a scraping assembly and a stabilizing assembly.When there are only a small amount of substrates on the workpiece carrier, the lifting assembly can be driven to drive the ion beam light source and the electron gun to ascend, and the distance between the two and the workpiece carrier will become shorter.At this time, the adjusting assembly can be driven to adjust the inclination angle of the ion beam light source according to the number of substrates on the workpiece carrier.The ion beam with relatively strong energy intensity will be more focused to the substrates, so that the coating efficiency is improved.When the ion beam light source is driven to rotate by the adjusting assembly, the scraping assembly can clean the sidewall of the ion beam light source, and the stabilizing assembly can fix the ion beam light source when the lifting assembly is lowered to the lowest position, so that the ion beam light source is prevented from shaking on the lifting assembly.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of evaporation coating machine, and particularly relates to an evaporation coating machine with a light source multi-angle adjusting function. BACKGROUND

[0002] As one of the core processes of modern precision manufacturing, the evaporation coating technology is widely applied in the fields of optical devices, semiconductors and display panels. The electron beam evaporation optical vacuum coating machine generates an ion beam to bombard the surface of a substrate (workpiece) through an ion beam light source, so as to provide energy to promote the migration of film layer atoms, improve the density of the film layer, improve the adhesion, control the stress, and remove the impurities on the surface of the substrate. Then, the electron beam is focused and bombarded on the coating material in the crucible (or target material), so that the coating material locally obtains extremely high temperature and is melted, evaporated (sublimated), and generates vapor atoms / molecules. The vapor atoms / molecules fly in a straight line in the vacuum environment, and finally deposit on the surface of the relatively low-temperature substrate to form a thin film.

[0003] Since the position of the existing ion beam light source is in a fixed state, the intensity of the ion beam generated by the ion beam light source is also a fixed value when the ion beam reaches the substrate at any position on the workpiece carrier. Therefore, the time required for coating the workpiece carrier with or without the substrate is constant, and a large amount of energy and coating material will be wasted when a small amount of substrate is coated.

[0004] Therefore, the present application provides an evaporation coating machine with a light source multi-angle adjusting function. SUMMARY

[0005] The present application aims to provide an evaporation coating machine with a light source multi-angle adjusting function to solve the problems in the prior art.

[0006] In order to achieve the above object, the present application provides the following technical scheme: an evaporation coating machine with light source multi-angle adjusting function, the evaporation coating machine comprises a coating cabin, a motor one, a workpiece carrier, a substrate, a lifting assembly, an ion beam light source, an electron gun, an adjusting assembly, a scraping assembly and a stabilizing assembly; the motor one is installed on the top of the coating cabin, the workpiece carrier is rotationally connected with the top of the coating cabin through a rotating shaft, the substrate is installed on the workpiece carrier, the lifting assembly is located below the coating cabin and is slidingly connected with the inner wall of the coating cabin, the ion beam light source and the electron gun are installed on the lifting assembly, the adjusting assembly is arranged below the ion beam light source and is connected with the ion beam light source, and the adjusting assembly is rotationally connected with the base, the scraping assembly is rotationally connected with the base and rotates with the adjusting assembly, and the stabilizing assembly is arranged at the bottom of the coating cabin and is fixedly connected with the coating cabin; when there are only a small number of substrates on the workpiece carrier, the substrates can be placed around the workpiece carrier, at this time, in order to improve the coating efficiency, the lifting assembly can be driven to drive the ion beam light source and the electron gun to rise, at this time, the distance between the two and the workpiece carrier will become shorter, the radiation range of the ion beam light source will become smaller but the intensity will be enhanced, at this time, the adjusting assembly can be driven to adjust the inclination angle of the ion beam light source according to the number of substrates on the workpiece carrier, and the ion beam light source is driven to rotate in the opposite direction of the workpiece carrier, at this time, the ion beam with high energy intensity will be more focused on the substrate, thereby the coating efficiency when the number of substrates is small can be improved, while the adjusting assembly drives the ion beam light source to rotate, the scraping assembly can clean the side wall of the ion beam light source, preventing the film layer from accumulating on the outside and affecting the heat dissipation function, and the stabilizing assembly can fix the ion beam light source when the lifting assembly is lowered to the lowest position, preventing the ion beam light source from shaking on the lifting assembly.

[0007] Preferably, the lifting assembly comprises a base, a sliding block and a hydraulic push rod; the sliding block is fixedly connected with the two sides of the base, the inner wall of the coating cabin is provided with a sliding groove for the sliding block to slide, the hydraulic push rod is fixedly connected below the coating cabin, the output end of the hydraulic push rod is fixedly connected with the bottom of the base, and the ion beam light source and the electron gun are arranged on the base; by starting the hydraulic push rod, the base can be driven to move up and down along the side wall of the coating cabin through the sliding block, when the substrates on the workpiece carrier are full, the hydraulic push rod can be started to drive the base to be lowered to the lowest position, and when the number of substrates on the workpiece carrier is small, the height of the base can be appropriately raised by the hydraulic push rod to shorten the distance between the ion beam light source and the substrate.

[0008] Preferably, the adjusting assembly comprises a cone, a connecting rod, a ball, a counterweight, a rotating ring, a pushing rod, a surrounding table, a gear slot, an electric push rod, a pulley, a mounting table, a motor two, a gear; the cone is fixedly connected below the ion beam light source, the connecting rod is fixedly connected below the cone, the ball is fixedly connected in the middle of the connecting rod, and the ball is rotationally connected with the center of the base, the counterweight is fixedly connected below the connecting rod, the rotating ring is rotationally connected with the base, the pushing rod is fixedly connected inside the rotating ring, the surrounding table is fixedly connected outside the rotating ring, the gear slot is equidistantly arranged outside the surrounding table, the electric push rod is provided with four groups, and is fixedly connected with the base, the pulley is installed at the top of the output end of the electric push rod, the mounting table is fixedly connected on the output end of one of the electric push rods, the motor two is fixedly connected on the mounting table, and the gear is fixedly connected with the output end of the motor two; when the number of substrates on the workpiece carrier is small, the substrates can be gradually arranged outward from the inner circle of the workpiece carrier, at this time, the hydraulic push rod is started to push the base to rise, the distance between the ion beam light source and the workpiece carrier is shortened, then the electric push rod is started to push the motor two and the rotating ring to rise to a suitable height at the same time, the pushing rod will rise linearly with the rotating ring, in the process of rising, the pushing rod will pass through the cone below the ion beam light source, push the ion beam light source to rotate around the ball center to occur angular deviation, after the ion beam light source is inclined to a suitable angle, the motor two can be started, because the gear at the output end of the motor two is engaged with the gear slot on the surrounding table, therefore the motor two will drive the surrounding table and the rotating ring to rotate through the gear, and then drive the pushing rod to rotate around the ball, in the process of rotating, the pushing rod will push the ion beam light source to maintain the inclined angle, and rotate around the ball in the opposite direction of the workpiece carrier, at this time, the rotating ion beam light source will more accurately focus the ion beam on the substrate.

[0009] Preferably, the mounting table bottom is further fixedly connected with a reinforcing rod, and the reinforcing rod is slidingly connected with the base; when the electric push rod pushes the motor two to rise, the reinforcing rod will also gradually emerge from the base to rise, in the process of driving the surrounding table to rotate by the gear driven by the motor two, the reinforcing rod can improve the stability of the gear rotating driven by the motor output shaft, and prevent the gear from disengaging from the gear slot due to excessive torsion when driving the surrounding table to rotate.

[0010] Preferably, the scraping assembly includes a rotating rail, a telescopic rod, a support rod, an arc-shaped seat, an arc-shaped support rod, an elastic element one, a brush body, an extension plate one, an extension plate two, and an elastic element two. The rotating rail is rotatably connected to the base. There are four sets of telescopic rods; the bottom end of the telescopic rod is fixedly connected to the rotating rail. One end of the support rod is fixedly connected to the outer shell of the telescopic rod, and the other end is fixedly connected to the rotating ring. The bottom of the arc-shaped seat is fixedly connected to the rotating rail. The arc-shaped support rod is telescopically connected to the arc-shaped seat. The elastic element one is disposed between the arc-shaped support rod and the arc-shaped seat. The brush body is rotatably connected to the end of the arc-shaped support rod. The extension plate one is fixedly connected to the arc-shaped support rod. The extension plate two is fixedly connected to the brush body. One end of the elastic element two is fixedly connected to the extension plate one. The other end is fixedly connected to the extension plate 2. The arc of the arc seat and the arc support rod is the same as the arc of the full circle of the path, and its center is the same as the center of the sphere. During the rotation of the rotating ring, the rotating rail will rotate synchronously through the support rod and the telescopic rod, thereby driving the arc seat, the arc support rod and the brush body to rotate synchronously. The brush body will simultaneously clean the outer wall of the ion beam light source, preventing the film layer from accumulating on the outer wall of the ion beam light source and affecting its heat dissipation effect. When the push rod pushes the ion beam light source to tilt, the brush body will be pushed by the elastic element 1, generating a pushing force on the ion beam light source. This is equivalent to being clamped between the push rod and the brush body during the rotation of the ion beam light source, thereby improving the stability of the ion beam light source during the rotation of the sphere.

[0011] Preferably, a retaining ring is fixedly connected to the bottom of the rotating rail. The rotating rail is rotatably connected to the base through the retaining ring, which ensures that the rotating rail will not detach from the base and improves the stability when the rotating rail and the base rotate.

[0012] Preferably, the brush body and the push rod are positioned on both sides of the ion beam light source with the center of the ion beam light source as the reference point. The contact points between the brush body and the side wall of the ion beam light source and the center point of the ion beam light source are on the same plane. This arrangement ensures that the center of the arc of the arc seat and the arc support rod and the center of the sphere are on the same plane. When the push rod rises and pushes the ion beam light source to tilt, the ion beam light source smoothly pushes the arc support rod to tighten into the arc seat without interference.

[0013] Preferably, the stabilizing component includes a pointed cone, a circular plate, an abutment post, a groove, and guide strips. The pointed cone is fixedly connected to the bottom of the counterweight, the circular plate is fixedly connected to the bottom of the coating chamber, the abutment post is fixedly connected to the center of the circular plate, the groove is opened at the center of the abutment post and the groove matches the shape of the lower part of the pointed cone, and four sets of guide strips are arranged around the center of the circular plate and are fixedly connected to the circular plate. When the substrate is covered on the workpiece carrier, the hydraulic push rod can be driven to lower the base, and the electric push rod can be driven to retract to lower the rotating ring to the lowest state. At this time, the ion beam light source will maintain a vertical angle under the gravity of the counterweight. After the base is lowered, the pointed cone below the ion beam light source will be guided by the guide strips and inserted into the groove on the abutment post. At this time, the ion beam light source will be limited to a position by the abutment post and cannot tilt, thus improving the stability of its working process.

[0014] Compared with the prior art, the beneficial effects of the present invention are:

[0015] 1. When the number of substrates on the workpiece carrier is small, the substrates can be arranged to gradually expand outward from the inner circle of the workpiece carrier. The hydraulic push rod is activated to push the base upward, shortening the distance between the ion beam light source and the workpiece carrier. Then, the electric push rod can be activated to push the motor and the rotating ring to rise simultaneously to a suitable height. The tilt angle of the ion beam light source is adjusted. Then, the motor is activated to drive the push rod to rotate around the sphere. During the rotation, the push rod will push the ion beam light source to maintain the tilt angle and rotate around the sphere in the opposite direction to the workpiece carrier. At this time, the rotating ion beam light source will more accurately focus the ion beam onto the substrate. Moreover, since the base is raised and the distance between the ion beam light source and the substrate is closer, the energy of the ion beam generated by the ion beam light source will be more concentrated and the intensity will be higher, thereby accelerating the coating efficiency of the substrate.

[0016] 2. During the rotation of the rotating ring, the rotating rail will rotate synchronously via the support rod and telescopic rod, thereby causing the arc-shaped seat, arc-shaped support rod, and brush body to rotate synchronously. Under the thrust of the elastic element, the arc-shaped support rod will push the brush body to always be in contact with the outer wall of the ion beam light source. When the push rod pushes the ion beam light source to tilt and rotate around the sphere, the brush body will simultaneously clean the outer wall of the ion beam light source, preventing the film layer from accumulating on the outer wall of the ion beam light source and affecting its heat dissipation effect. When the push rod pushes the ion beam light source to tilt, the brush body will be subjected to the thrust of the elastic element, generating a pushing force against the ion beam light source. This is equivalent to the ion beam light source being clamped between the push rod and the brush body during rotation, thereby improving the stability of the ion beam light source during rotation around the sphere.

[0017] 3. When the substrate is fully distributed on the workpiece carrier, the present invention can drive the hydraulic push rod to lower the base and drive the electric push rod to retract so that the rotating ring is lowered to the lowest state. At this time, the ion beam light source will maintain a vertical angle under the gravity of the counterweight. After the base is lowered, the pointed cone below the ion beam light source will be guided by the guide strip and inserted into the groove on the abutment post. At this time, the ion beam light source will be limited to a certain position by the abutment post and will not tilt, thus improving the stability of its working process. Attached Figure Description

[0018] Figure 1 is a three-dimensional structural diagram of the overall appearance of the present invention;

[0019] Figure 2 is an enlarged view of the workpiece carrier of the present invention;

[0020] Figure 3 is an enlarged view of the base of the present invention;

[0021] Figure 4 is a three-dimensional structural diagram of the lifting component of the present invention;

[0022] Figure 5 is a cross-sectional view of the base of the present invention;

[0023] Figure 6 is a three-dimensional structural diagram of the adjustment component and the stabilizing component of the present invention;

[0024] Figure 7 is a three-dimensional structural diagram of the sphere of the present invention;

[0025] Figure 8 is a three-dimensional structural diagram of the scraping component of the present invention;

[0026] Figure 9 is a cross-sectional view of the arc-shaped seat of the present invention.

[0027] In the diagram: 1. Coating chamber; 11. Motor 1; 12. Workpiece carrier; 13. Substrate; 2. Lifting assembly; 21. Base; 22. Slider; 23. Hydraulic push rod; 3. Ion beam light source; 4. Electron gun; 5. Adjustment assembly; 51. Cone; 52. Connecting rod; 53. Sphere; 54. Counterweight; 55. Rotating ring; 56. Push rod; 57. Surrounding platform; 58. Gear; 59. Electric push rod; 510. Pulley; 511. Mounting platform; 5111. Reinforcing rod; 512. Motor 2; 513. Gear; 6. Scraping assembly; 61. Rotating rail; 611. Snap ring; 62. Telescopic rod; 63. Support rod; 64. Arc-shaped seat; 65. Arc-shaped support rod; 66. Elastic component one; 67. Brush body; 68. Extension plate one; 69. Extension plate two; 610. Elastic component two; 7. Stabilizing component; 71. Cone; 72. Circular plate; 73. Abutment post; 74. Groove; 75. Guide strip. Detailed Implementation

[0028] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0029] Please refer to Figures 1 to 9. This invention provides an evaporation coating machine with multi-angle light source adjustment function, and the technical solution is as follows:

[0030] Referring to Figures 1 to 3, an evaporation coating machine with multi-angle light source adjustment function is disclosed. The evaporation coating machine includes a coating chamber 1, a motor 11, a workpiece carrier 12, a substrate 13, a lifting assembly 2, an ion beam light source 3, an electron gun 4, an adjustment assembly 5, a scraping assembly 6, and a stabilizing assembly 7. The motor 11 is installed on the top of the coating chamber 1. The workpiece carrier 12 is rotatably connected to the top of the coating chamber 1 via a rotating shaft. The substrate 13 is installed on the workpiece carrier 12. The lifting assembly 2 is located below the coating chamber 1 and is slidably connected to the inner wall of the coating chamber 1. The ion beam light source 3 and the electron gun 4 are installed on the lifting assembly 2. The adjustment assembly 5 is located below the ion beam light source 3 and connected to it. The adjustment assembly 5 is rotatably connected to the base 21. The scraping assembly 6 is rotatably connected to the base 21 and rotates with the adjustment assembly 5. The stabilizing assembly 7 is located at the bottom of the coating chamber 1 and is fixedly connected to it.During the coating process on substrate 13, substrate 13 can be mounted on workpiece carrier 12. During coating, motor 11 drives workpiece carrier 12 to rotate, ensuring uniform coating. During coating, electron gun 4 generates an electron beam that focuses and bombards the coating material, causing it to evaporate and generate vapor atoms. These vapor atoms travel in a straight line in a vacuum environment and eventually deposit onto the relatively low-temperature surface of substrate 13 to form a thin film. Ion beam source 3 generates an ion beam that bombards the surface of substrate 13, providing energy to promote atomic migration and improve film adhesion. It also removes impurities from the surface of substrate 13. When workpiece carrier 12 is full of substrates 13, lifting assembly 2 can be driven to lower ion beam source 3 and electron gun 4 to the bottom. At this point, the ion beam generated by ion beam source 3 will cover the entire substrate 13 on workpiece carrier 12, completing the coating process. When there are only a few substrates 13 on workpiece carrier 12, the substrates 13 can be placed around workpiece carrier 12. In this case, because the substrates 13... When the number of substrates 13 is small, to improve coating efficiency, the lifting assembly 2 can be driven to raise the ion beam source 3 and electron gun 4. At this time, the distance between them and the workpiece carrier 12 will decrease, the radiation range of the ion beam source 3 will decrease, but the intensity will increase. The adjustment assembly 5 can then be driven to adjust the tilt angle of the ion beam source 3 according to the number of substrates 13 on the workpiece carrier 12, and drive the ion beam source 3 to rotate in the opposite direction to the workpiece carrier 12. This allows the stronger ion beam to be more focused on the substrates 13, thereby improving the coating efficiency when the number of substrates 13 is small. While the adjustment assembly 5 drives the ion beam source 3 to rotate, the scraping assembly 6 cleans the sidewalls of the ion beam source 3, preventing film buildup on its outer surface from affecting heat dissipation. The stabilizing assembly 7 fixes the ion beam source 3 when the lifting assembly 2 descends to its lowest position, preventing it from shaking on the lifting assembly 2.

[0031] Referring to Figures 1 and 4, the lifting assembly 2 includes a base 21, a slider 22, and a hydraulic push rod 23. The slider 22 is fixedly connected to both sides of the base 21. The inner wall of the coating chamber 1 has a sliding groove for the slider 22 to slide. The hydraulic push rod 23 is fixedly connected to the bottom of the coating chamber 1. The output end of the hydraulic push rod 23 is fixedly connected to the bottom of the base 21. The ion beam light source 3 and the electron gun 4 are both mounted on the base 21. By activating the hydraulic push rod 23, the base 21 can be driven to move up and down along the side wall of the coating chamber 1 via the slider 22. When the substrate 13 on the workpiece carrier 12 is full, the hydraulic push rod 23 can be activated to lower the base 21 to the lowest position. When the number of substrates 13 on the workpiece carrier 12 is small, the height of the base 21 can be appropriately raised by the hydraulic push rod 23 to shorten the distance between the ion beam light source 3 and the substrate 13.

[0032] Referring to Figures 3 and 5 to 7, the adjustment assembly 5 includes a cone 51, a connecting rod 52, a sphere 53, a counterweight 54, a rotating ring 55, a pushing rod 56, a surrounding platform 57, a toothed groove 58, an electric push rod 59, a pulley 510, a mounting platform 511, a motor 512, and a gear 513. The cone 51 is fixedly connected below the ion beam light source 3, the connecting rod 52 is fixedly connected below the cone 51, the sphere 53 is fixedly connected to the middle of the connecting rod 52 and is rotatably connected to the center of the base 21, the counterweight 54 is fixedly connected below the connecting rod 52, the rotating ring 55 is rotatably connected to the base 21, the pushing rod 56 is fixedly connected to the inner side of the rotating ring 55, the surrounding platform 57 is fixedly connected to the outer side of the rotating ring 55, the toothed groove 58 is equidistantly spaced around the outer side of the surrounding platform 57, and the electric push rod 59... There are four sets in total, all of which are fixedly connected to the base 21. The pulley 510 is installed on the top of the output end of the electric actuator 59. The mounting platform 511 is fixedly connected to the output end of one set of electric actuators 59. The second motor 512 is fixedly connected to the mounting platform 511. The gear 513 is fixedly connected to the output end of the second motor 512.When the number of substrates 13 on the workpiece carrier 12 is small, the substrates 13 can be gradually arranged around the inner circle of the workpiece carrier 12 and expanded outwards. At this time, the hydraulic push rod 23 is activated to push the base 21 upwards, shortening the distance between the ion beam light source 3 and the workpiece carrier 12. Then, the electric push rod 59 is activated to push the motor 512 and the rotating ring 55 to rise simultaneously to a suitable height. The push rod 56 will follow the rotating ring 55 and rise linearly. During the upward process, the push rod 56 will pass through the cone 51 below the ion beam light source 3, pushing the ion beam light source 3 to rotate around the center of the sphere 53, causing an angular shift. The height at which the electric push rod 59 pushes the rotating ring 55 and the push rod 56 can be controlled according to the distance from the annularly distributed substrates 13 on the workpiece carrier 12 to the center of the workpiece carrier 12, thereby adjusting the tilt angle of the ion beam light source 3. The electric push rod 59 pushes the rotating ring 55 and the push rod 56. The higher the height, the greater the angle at which the push rod 56 tilts the ion beam light source 3. Once it reaches the required position, the second motor 512 can be started. Since the gear 513 at the output end of the second motor 512 meshes with the tooth groove 58 on the surrounding platform 57, the second motor 512 will drive the surrounding platform 57 and the rotating ring 55 to rotate through the gear 513 (at this time, the bottom surface of the surrounding platform 57 will rotate along the pulley 510). This will drive the push rod 56 to rotate around the sphere 53. During the rotation, the push rod 56 will push the ion beam light source 3 to maintain the tilt angle and rotate around the sphere 53 in the opposite direction to the workpiece carrier 12. At this time, the rotating ion beam light source 3 will more accurately focus the ion beam onto the substrate 13. Moreover, since the base 21 is rising, the ion beam light source 3 is closer to the substrate 13. Therefore, the energy of the ion beam generated by the ion beam light source 3 will be more concentrated and the intensity will be higher, which can accelerate the coating efficiency of the substrate 13. ;

[0033] Referring to Figure 5, a reinforcing rod 5111 is also fixedly connected to the bottom of the mounting platform 511. The reinforcing rod 5111 is slidably connected to the base 21. When the electric push rod 59 pushes the second motor 512 to rise, the reinforcing rod 5111 will also gradually protrude from the base 21 and rise accordingly. During the process of the second motor 512 driving the gear 513 to rotate around the platform 57, the reinforcing rod 5111 can improve the stability of the rotation of the gear 513 driven by the motor output shaft, and prevent the excessive torque when the gear 513 rotates around the platform 57 from causing the mounting platform 511 to shift and causing the gear 513 to disengage from the tooth groove 58.

[0034] Referring to Figures 8 and 9, the scraping assembly 6 includes a rotating rail 61, a telescopic rod 62, a support rod 63, an arc-shaped seat 64, an arc-shaped support rod 65, an elastic element 66, a brush body 67, an extension plate 68, an extension plate 69, and an elastic element 610. The rotating rail 61 is rotatably connected to the base 21. Four sets of telescopic rods 62 are provided. The bottom end of the telescopic rod 62 is fixedly connected to the rotating rail 61. One end of the support rod 63 is fixedly connected to the outer shell of the telescopic rod 62, and the other end is fixedly connected to the rotating ring 55. The bottom of the arc-shaped seat 64 is fixedly connected to the rotating rail 61. The arc-shaped support rod 65 is telescopically connected to the arc-shaped seat 64. The elastic element 66 is disposed between the arc-shaped support rod 65 and the arc-shaped seat 64. The brush body 67 is rotatably connected to the end of the arc-shaped support rod 65. Made of flexible, high-purity graphite or ceramic fiber material, this type of material has high stability and extremely low wear rate in a vacuum environment. Extension plate 1 68 is fixedly connected to arc-shaped support rod 65, extension plate 2 69 is fixedly connected to brush body 67, elastic element 2 610 is fixedly connected at one end to extension plate 1 68 and at the other end to extension plate 2 69, the arc of arc seat 64 and arc-shaped support rod 65 is the same as the arc of the full circle of the path, and its center is the same as the center of sphere 53;When the electric actuator 59 pushes the rotating ring 55 upward, the rotating ring 55 will drive the outer shell of the telescopic rod 62 to rise through the support rod 63. The rotating rail 61 does not rise with it. During the rotation of the rotating ring 55, the rotating rail 61 will rotate synchronously through the support rod 63 and the telescopic rod 62, thereby driving the arc-shaped seat 64, the arc-shaped support rod 65, and the brush body 67 to rotate synchronously. Under the thrust of the elastic element 66, the arc-shaped support rod 65 will push the brush body 67 to always be in contact with the outer wall of the ion beam source 3. When the electric actuator 59 pushes the rotating ring 55 and the push rod 56 upward, causing the ion beam source 3 to tilt at an angle, the ion beam source 3 will push the arc-shaped support rod 65 through the brush body 67 to overcome the thrust of the elastic element 66 and gradually retract into the arc-shaped seat 64. Under the push of the elastic element 610, it can be ensured that the brush body 67 is always in contact with the ion beam source 3 when it is tilted. The brush body 67 is tightly attached to the outer wall of the ion beam source 3. Therefore, when the push rod 56 pushes the ion beam source 3 to tilt and rotate, the brush body 67 will simultaneously clean the outer wall of the ion beam source 3, preventing the film layer from accumulating on the outer wall of the ion beam source 3 and affecting its heat dissipation. Furthermore, when the push rod 56 pushes the ion beam source 3 to tilt, the brush body 67 will be pushed by the elastic element 66, generating a pushing force on the ion beam source 3. This is equivalent to the ion beam source 3 being clamped between the push rod 56 and the brush body 67 during rotation. The brush body 67 applies a pushing force to the ion beam source 3 in the direction of the push rod 56. Combined with the gravity of the counterweight 54 below the ion beam source 3, this keeps the ion beam source 3 and the push rod 56 in close contact, thereby improving the stability of the ion beam source 3 during rotation around the sphere 53.

[0035] Referring to Figure 8, a retaining ring 611 is also fixedly connected to the bottom of the rotating rail 61. The rotating rail 61 is rotatably connected to the base 21 through the retaining ring 611, which can ensure that the rotating rail 61 will not detach from the base 21 and improve the stability when the rotating rail 61 and the base 21 rotate.

[0036] Referring to Figure 8, the brush body 67 and the push rod 56 are positioned on both sides of the ion beam source 3 with the center of the ion beam source 3 as the reference point. The contact points between the brush body 67 and the side wall of the ion beam source 3 and the center point of the ion beam source 3 are on the same plane. This arrangement ensures that the center of the arc of the arc seat 64 and the arc support rod 65 is on the same plane as the center of the sphere 53. When the push rod 56 rises and pushes the ion beam source 3 to tilt, the ion beam source 3 can smoothly push the arc support rod 65 to tighten inside the arc seat 64 without interference.

[0037] Referring to Figures 1 and 6, the stabilizing component 7 includes a pointed cone 71, a circular plate 72, an abutment post 73, a groove 74, and guide strips 75. The pointed cone 71 is fixedly connected to the bottom of the counterweight 54, the circular plate 72 is fixedly connected to the bottom of the coating chamber 1, the abutment post 73 is fixedly connected to the center of the circular plate 72, the groove 74 is opened at the center of the abutment post 73, and the shape of the groove 74 matches the lower part of the pointed cone 71. Four sets of guide strips 75 are arranged around the center of the circular plate 72, and the guide strips 75 are fixedly connected to the circular plate 72. When the substrate 13 is fully distributed on the workpiece carrier 12, the hydraulic push rod 23 can be driven to lower the base 21, and the electric push rod 59 can be driven to retract to lower the rotating ring 55 to the lowest state. At this time, the ion beam light source 3 will maintain a vertical angle under the gravity of the counterweight 54, and after the base 21 lowers, the ion beam light source 3... The lower cone 71 is guided by the guide bar 75 and inserted into the groove 74 on the abutment post 73. At this time, the ion beam light source 3 is fixed in position by the abutment post 73 and cannot tilt, which improves the stability of its working process.

[0038] Working principle: During the coating process on substrate 13, substrate 13 can be mounted on workpiece carrier 12. During the coating process, motor 11 will drive workpiece carrier 12 to rotate to ensure the uniformity of coating. During the coating process, electron gun 4 will generate an electron beam to focus and bombard the coating material, causing it to evaporate and generate vapor atoms. These vapors fly in a straight line in a vacuum environment and eventually deposit on the relatively low temperature surface of substrate 13 to form a thin film. Ion beam light source 3 will generate an ion beam to bombard the surface of substrate 13, providing energy to promote the migration of film atoms and improve the adhesion of the film. At the same time, it can also remove impurities from the surface of substrate 13.

[0039] By activating the hydraulic push rod 23, the base 21 can be driven to move up and down along the side wall of the coating chamber 1 via the slider 22. When the substrate 13 on the workpiece carrier 12 is full, the hydraulic push rod 23 can be activated to drive the base 21 to the lowest position. When the number of substrates 13 on the workpiece carrier 12 is small, the height of the base 21 can be appropriately raised by the hydraulic push rod 23 to shorten the distance between the ion beam light source 3 and the substrate 13. When the number of substrates 13 on the workpiece carrier 12 is small, the substrates 13 can be gradually arranged around the inner circle of the workpiece carrier 12 and gradually expanded outwards. At this time, the hydraulic push rod 23 is activated to push the base 21 upwards, shortening the distance between the ion beam light source 3 and the workpiece carrier 12. Then, the electric push rod 59 can be activated to push the motor 512 and the rotating ring 55 to rise simultaneously to a suitable height. The push rod 56 will follow the rotating ring 55 and rise linearly. During the upward process, the push rod 56 will pass through the cone 51 below the ion beam light source 3, pushing the ion beam light source 3 to rotate around the center of the sphere 53 and undergo angular displacement. The tilt angle of the ion beam light source 3 can be adjusted according to the distance from the circularly distributed substrates 13 on the workpiece carrier 12 to the center of the workpiece carrier 12. The higher the electric push rod 59 pushes the rotating ring 55 and the push rod 56, the more the push rod 56 pushes the ion beam light source 3. The greater the tilt angle, the more accurately the motor 512 can be activated once the desired position is reached. Since the gear 513 at the output end of the motor 512 meshes with the toothed groove 58 on the surrounding platform 57, the motor 512 will drive the surrounding platform 57 and the rotating ring 55 to rotate through the gear 513, thereby driving the push rod 56 to rotate around the sphere 53. During the rotation, the push rod 56 will push the ion beam light source 3 to maintain the tilt angle and rotate around the sphere 53 in the opposite direction to the workpiece carrier 12. At this time, the rotating ion beam light source 3 will more accurately and precisely direct the ion beam towards the substrate 13. Moreover, since the base 21 is rising and the ion beam light source 3 is closer to the substrate 13, the energy of the ion beam generated by the ion beam light source 3 will be more concentrated and the intensity will be higher, thereby accelerating the coating efficiency of the substrate 13.

[0040] When the electric actuator 59 pushes the rotating ring 55 upward, the rotating ring 55 will drive the outer shell of the telescopic rod 62 to rise through the support rod 63. The rotating rail 61 does not rise with it. During the rotation of the rotating ring 55, the rotating rail 61 will rotate synchronously through the support rod 63 and the telescopic rod 62, thereby driving the arc-shaped seat 64, the arc-shaped support rod 65, and the brush body 67 to rotate synchronously. Under the thrust of the elastic element 66, the arc-shaped support rod 65 will push the brush body 67 to always be in contact with the outer wall of the ion beam source 3. When the electric actuator 59 pushes the rotating ring 55 and the push rod 56 upward, causing the ion beam source 3 to tilt at an angle, the ion beam source 3 will push the arc-shaped support rod 65 through the brush body 67 to overcome the thrust of the elastic element 66 and gradually retract into the arc-shaped seat 64. Under the push of the elastic element 610, it can be ensured that the brush body 67 is always in contact with the ion beam source 3 when it is tilted. The brush body 67 is tightly attached to the outer wall of the ion beam source 3. Therefore, when the push rod 56 pushes the ion beam source 3 to tilt and rotate, the brush body 67 will simultaneously clean the outer wall of the ion beam source 3, preventing the film layer from accumulating on the outer wall of the ion beam source 3 and affecting its heat dissipation effect. When the push rod 56 pushes the ion beam source 3 to tilt, the brush body 67 will be pushed by the elastic element 66, generating a pushing force on the ion beam source 3. This is equivalent to the ion beam source 3 being clamped between the push rod 56 and the brush body 67 during the rotation process, thereby improving the stability of the ion beam source 3 during the rotation process around the sphere 53.

[0041] When the substrate 13 is fully distributed on the workpiece carrier 12, the hydraulic push rod 23 can be driven to lower the base 21, and the electric push rod 59 can be driven to retract, causing the rotating ring 55 to descend to its lowest state. At this time, the ion beam light source...

[0042] 3. Under the gravity of the counterweight 54, it will maintain a vertical angle. After the base 21 descends, the pointed cone 71 below the ion beam light source 3 will be guided by the guide strip 75 and inserted into the groove 74 on the abutment post 73. At this time, the ion beam light source 3 will be limited in position by the abutment post 73 and will not tilt, thus improving the stability of its working process.

[0043] It will be apparent to those skilled in the art that the present invention is not limited to the details of the exemplary embodiments described above, and that the invention can be implemented in other specific forms without departing from its spirit or essential characteristics. Therefore, the embodiments should be considered in all respects as exemplary and non-limiting, and the scope of the invention is defined by the appended claims rather than the foregoing description. Thus, all variations falling within the meaning and scope of equivalents of the claims are intended to be included within the present invention. No reference numerals in the claims should be construed as limiting the scope of the claims.

Claims

1. An evaporation coating machine with multi-angle light source adjustment function, characterized in that: The evaporation coating machine includes a coating chamber (1), a motor (11), a workpiece carrier (12), a substrate (13), a lifting assembly (2), an ion beam light source (3), an electron gun (4), an adjustment assembly (5), a scraping assembly (6), and a stabilizing assembly (7). The motor (11) is installed on the top of the coating chamber (1). The workpiece carrier (12) is rotatably connected to the top of the coating chamber (1) via a rotating shaft. The substrate (13) is installed on the workpiece carrier (12). The lifting assembly (2) is located below the coating chamber (1) and is slidably connected to the inner wall of the coating chamber (1). The ion beam light source (3) and the electron gun (4) are installed on the lifting assembly (2). The adjustment assembly (5) is located below the ion beam light source (3) and is connected to it. The adjustment assembly (5) is rotatably connected to the base (21). The scraping assembly (6) is rotatably connected to the base (21) and rotates with the adjustment assembly (5). The stabilizing assembly (7) is located at the bottom of the coating chamber (1) and is fixedly connected to it. The lifting assembly (2) includes a base (21), a slider (22), and a hydraulic push rod (23); the slider (22) is fixedly connected to both sides of the base (21), the inner wall of the coating chamber (1) is provided with a sliding groove for the slider (22) to slide, the hydraulic push rod (23) is fixedly connected to the bottom of the coating chamber (1), the output end of the hydraulic push rod (23) is fixedly connected to the bottom of the base (21), and the ion beam light source (3) and the electron gun (4) are both set on the base (21); The adjustment assembly (5) includes a cone (51), a connecting rod (52), a sphere (53), a counterweight (54), a rotating ring (55), a pushing rod (56), a surrounding platform (57), a toothed groove (58), an electric push rod (59), a pulley (510), a mounting platform (511), a second motor (512), and a gear (513). The cone (51) is fixedly connected below the ion beam light source (3), the connecting rod (52) is fixedly connected below the cone (51), the sphere (53) is fixedly connected to the middle of the connecting rod (52), and the sphere (53) is rotatably connected to the center of the base (21). The counterweight (54) is fixedly connected below the connecting rod (52). The rotating ring (55) is rotatably connected to the base (21), the push rod (56) is fixedly connected to the inner side of the rotating ring (55), the surrounding platform (57) is fixedly connected to the outer side of the rotating ring (55), the tooth groove (58) is equidistantly opened around the outer side of the surrounding platform (57), the electric push rod (59) is provided in four sets, all of which are fixedly connected to the base (21), the pulley (510) is installed on the top of the output end of the electric push rod (59), the mounting platform (511) is fixedly connected to the output end of one set of electric push rods (59), the second motor (512) is fixedly connected to the mounting platform (511), and the gear (513) is fixedly connected to the output end of the second motor (512).

2. The evaporation coating machine with multi-angle light source adjustment function according to claim 1, characterized in that: The bottom of the mounting platform (511) is also fixedly connected to a reinforcing rod (5111), which is slidably connected to the base (21).

3. The evaporation coating machine with multi-angle light source adjustment function according to claim 2, characterized in that: The scraping assembly (6) includes a rotating rail (61), a telescopic rod (62), a support rod (63), an arc-shaped seat (64), an arc-shaped support rod (65), an elastic element one (66), a brush body (67), an extension plate one (68), an extension plate two (69), and an elastic element two (610). The rotating rail (61) is rotatably connected to the base (21). There are four sets of telescopic rods (62). The bottom end of the telescopic rod (62) is fixedly connected to the rotating rail (61). One end of the support rod (63) is fixedly connected to the outer shell of the telescopic rod (62), and the other end is fixedly connected to the rotating ring (55). The bottom of the arc-shaped seat (64) is fixedly connected to the rotating rail (61). The arc-shaped support rod (65) is telescopically connected to the arc-shaped seat (64). The first elastic element (66) is disposed between the arc-shaped support rod (65) and the arc-shaped seat (64). The brush body (67) is rotatably connected to the end of the arc-shaped support rod (65). The first extension plate (68) is fixedly connected to the arc-shaped support rod (65). The second extension plate (69) is fixedly connected to the brush body (67). One end of the second elastic element (610) is fixedly connected to the first extension plate (68), and the other end is fixedly connected to the second extension plate (69). The arc of the arc-shaped seat (64) and the arc-shaped support rod (65) is the same as the arc of the full circle of the path, and its center is the same as the center of the sphere (53).

4. An evaporation coating machine with multi-angle light source adjustment function according to claim 3, characterized in that: The bottom of the rotating rail (61) is also fixedly connected with a retaining ring (611), and the rotating rail (61) is rotatably connected to the base (21) through the retaining ring (611).

5. An evaporation coating machine with multi-angle light source adjustment function according to claim 4, characterized in that: The brush body (67) and the push rod (56) are set on both sides of the ion beam light source (3) with the center of the ion beam light source (3) as the reference point. The contact points between the two and the side wall of the ion beam light source (3) and the center point of the ion beam light source (3) are on the same plane.

6. An evaporation coating machine with multi-angle light source adjustment function according to claim 5, characterized in that: The stabilizing component (7) includes a cone (71), a circular plate (72), an abutment post (73), a groove (74), and a guide strip (75). The cone (71) is fixedly connected to the bottom of the counterweight (54), the circular plate (72) is fixedly connected to the bottom of the coating chamber (1), the abutment post (73) is fixedly connected to the center of the circular plate (72), the groove (74) is opened at the center of the abutment post (73), and the groove (74) matches the shape of the bottom of the cone (71). The guide strip (75) is arranged in four groups around the center of the circular plate (72), and the guide strip (75) is fixedly connected to the circular plate (72).

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