Double-layer aluminized composite film based on magnetron sputtering aluminizing process and preparation and application thereof

Abstract

The application discloses a double-layer aluminum-plated composite film based on a magnetron sputtering aluminum plating process and preparation and application thereof, and belongs to the technical field of aluminum-plated composite film preparation. In the method, heating and plasma bombardment of the surface of a target are used to provide a required plasma environment for magnetron sputtering aluminum plating. When the aluminum-plated base material is in a thermal stable state, the functional coating acrylic resin can effectively reduce the film deformation problem of the aluminum-plated film caused by thermal stress in the sputtering process. The double magnetron sputtering aluminum plating on the two sides can not only ensure the thickness and uniformity of the aluminum-plated film, but also ensure the barrier property of the aluminum-plated film to water vapor and oxygen, and provide a better bonding interface for subsequent continuous film plating. After the magnetron sputtering aluminum plating treatment, the composite is carried out, so that the composite performance is accurately controlled. Finally, through double aluminum plating and double composite, the high barrier property of the aluminum-plated composite film to water vapor and oxygen is realized.

Description

Technical Field

[0001] This invention belongs to the field of aluminum-plated composite film preparation technology, specifically relating to a double-layer aluminum-plated composite film based on magnetron sputtering aluminum plating process, its preparation and application. Background Technology

[0002] All forms of aging in photovoltaic modules can be categorized as material aging. Moisture affects modules from multiple angles, including: adhesive loss, optical loss, delamination, discoloration, chemical corrosion of metal grid lines, potential-induced degradation of the photovoltaic module, and other material aging. Among these, delamination and chemical corrosion are the most serious. Moisture, mechanical stress, and ultraviolet radiation can cause adhesive loss between solar cells, encapsulation materials, glass, and other layers, leading to delamination. Moisture penetrates into the module's interior, causing poor adhesion of the release film and exacerbating this delamination. Delamination can result in ≤4% localized encapsulation / cell interface output power loss.

[0003] Besides the effects of stratification, moisture infiltration also triggers a series of chemical changes. Generally, metal corrosion occurs when metals exchange electrons with their external environment. In the presence of oxygen and moisture, metals undergo electrochemical corrosion. Furthermore, it is known that photovoltaic-grade EVA films produce acetic acid in the presence of moisture and other environmental stressors, which can lead to corrosion of metal grid lines and other components of photovoltaic modules. Corrosion of grid lines and busbars significantly reduces module power generation efficiency. Corrosion of solar cell metal grid lines and solder ribbons is considered a major cause of module performance degradation, with the primary corrosion path being moisture entering the module from the periphery. Research shows that glass backsheets can effectively capture harmful substances that catalyze moisture-driven corrosion, such as low-molecular-weight PET fragments derived from carbonyl, carboxyl, and phenolic groups.

[0004] Currently, the market standard warranty period is 25 years, with a degradation rate not exceeding 5%. In the high humidity, heat, and salt spray climate of the ocean, water vapor penetration inevitably poses a significant challenge to the service life of modules and the power generation degradation rate, thus posing a substantial economic risk to floating photovoltaic systems. Currently, stringent humidity and heat testing results in efficiency losses of 8%-10%, which are insufficient to meet requirements.

[0005] Aluminum foil is a perfect moisture barrier material, offering near-perfect water vapor barrier performance. However, aluminum foil has a fatal flaw: it easily breaks when bent, affecting its moisture barrier properties, and it is also relatively expensive. Therefore, vacuum-metallized composite films are used to replace aluminum foil. Vacuum-metallized films have good flexibility, avoiding the significant reduction in barrier performance caused by the cracking of aluminum foil when bent. However, traditional vacuum coating has several drawbacks: the aluminum layer thickness is generally controlled at 320~420 Å, with oxygen barrier values ​​of 6.0 ml / m, 24hr, 23℃, and 50%RH; and water barrier values ​​of 1.5 g / m, 24hr, 38℃, and 90%RH. Its barrier performance still lags behind that of aluminum foil. Furthermore, the phenomenon of aluminum layer transfer to the adhesive layer frequently occurs after lamination. For single-layer aluminized coatings, the waterproofness is positively correlated with the thickness of the aluminum layer. Therefore, it is best to increase the film thickness to 500 Å or more when aluminizing. However, due to process limitations, the peel strength of conventional vacuum aluminized composite films decreases significantly with increasing the thickness of the aluminum layer. The advantages and disadvantages of thick coatings, and the inherent contradiction between them, need to be resolved.

[0006] Besides the issue of coating thickness, another problem to be addressed when applying aluminum film is the transfer of the aluminum layer. This is mainly because the high temperature during steam aluminum plating causes the substrate polymer to expand and contract with temperature. After cooling, the aluminum film migrates, resulting in insufficient uniformity. Summary of the Invention

[0007] To address the aforementioned technical problems, the primary objective of this invention is to provide a method for preparing a double-layer aluminum-coated composite film based on magnetron sputtering aluminum deposition. This method provides the necessary plasma environment for magnetron sputtering aluminum deposition by heating and bombarding the target surface with plasma. When the aluminum-coated substrate is in a thermally stable state, the film deformation caused by thermal stress during sputtering is effectively reduced. By performing two magnetron sputtering aluminum deposition processes on both sides, not only is the thickness and uniformity of the aluminum-coated film guaranteed, but the barrier properties of each aluminum-coated film against water vapor and oxygen are also ensured, providing a better bonding interface for subsequent film deposition. Composite deposition is performed after the magnetron sputtering aluminum deposition process, achieving precise control of the composite performance. Ultimately, through double aluminum deposition and double composite deposition, a high barrier property against water vapor and oxygen, along with increased bending strength, is achieved in the aluminum-coated composite film.

[0008] The second objective of this invention is to provide an application of a double-layer aluminized composite film based on magnetron sputtering aluminization process as a base film structure in the preparation of waterproof, high-barrier, and weather-resistant materials. This double-layer aluminized composite film has high barrier properties against water vapor and oxygen and weather resistance, which can further improve the structural mechanical properties and high barrier properties of waterproof materials. Combined with a heat-sealing adhesive layer, it further expands the application scenarios.

[0009] This invention is achieved through the following technical solution:

[0010] A method for preparing a double-layer aluminum-coated composite film based on magnetron sputtering aluminum deposition process includes the following steps:

[0011] S1, in 2×10 -4 Under a background vacuum environment above Pa, an aluminized substrate is selected and a functional coating is applied to one side of it, followed by drying.

[0012] After controlling the partial pressure of argon gas in the environment to reach 0.13~0.15Pa by mass flow meter, the target surface is heated and bombarded with plasma. Then, after the first magnetron sputtering aluminum deposition treatment, thin film A is obtained.

[0013] S2. The wound film A is flipped over, and a functional coating is applied to the other side of the aluminized substrate. After drying, the surface of the target material is bombarded again with plasma under a background vacuum and argon partial pressure atmosphere. Then, a second magnetron sputtering aluminization treatment is performed to obtain a composite film.

[0014] Preferably, in S1, the aluminized substrate is any one of polyethylene terephthalate film, polypropylene film, polyethylene film, and polyvinylidene fluoride film.

[0015] The thickness of the aluminized substrate is 5~10μm;

[0016] The functional coating is an acrylic resin or a polyurethane resin;

[0017] The acrylic resin is a thermoplastic acrylic resin;

[0018] The coating is performed using a coating machine at a speed of 10-100 m / min and a coating amount of 1-10 g / m. 2 ;

[0019] The drying temperature is 40~150℃, and the time is 3~5 minutes;

[0020] The first magnetron sputtering aluminum plating process is as follows: under a base vacuum and argon partial pressure of 0.13~0.15Pa, the temperature is raised to 175~180℃ and the sputtering power is 1100~1200w for 10~60min.

[0021] Preferably, in S2, the background vacuum is 2×10⁻⁶. -4 With an argon partial pressure of 0.13~0.15Pa and a temperature of 175~180℃, a second magnetron sputtering aluminum plating process is performed for 10~60 minutes at a sputtering power of 1100~1200W.

[0022] A double-layer aluminum-coated composite film based on magnetron sputtering aluminum deposition process is obtained by the aforementioned preparation method.

[0023] The application of a double-layer aluminized composite film based on magnetron sputtering aluminization process in the preparation of waterproof, high-barrier, and weather-resistant materials includes:

[0024] Assembly A: Hot-press release fabric layers onto both sides of the double-layer aluminum-coated composite film based on magnetron sputtering aluminum plating process. After annealing, curing, cooling, unloading, and slitting, a waterproof, high-barrier, and weather-resistant material is obtained.

[0025] or,

[0026] Assembly B: On one side of the double-layer aluminum-plated composite film based on magnetron sputtering aluminum plating process, a release fabric layer is hot-pressed together, and on the other side, a heat-sealing adhesive layer is hot-pressed together. After annealing, curing, cooling, unloading, and slitting, a waterproof, high-barrier, and weather-resistant material is obtained.

[0027] Preferably, the preparation method of assembly A is as follows:

[0028] A double-layer aluminized composite film is selected, and adhesive is applied to its sides. It is then hot-pressed with a release fabric layer. After annealing, curing, cooling, unloading, and slitting, the final product is obtained.

[0029] Preferably, the release fabric layer is polyethylene terephthalate.

[0030] Preferably, the preparation method of assembly B is as follows:

[0031] A double-layer aluminized composite film is selected, and after applying adhesive to one side, it is hot-pressed together with the release fabric layer.

[0032] After rewinding and flipping, adhesive is applied to the other side of the double-layer aluminized composite film, and then it is hot-pressed with the heat-sealing adhesive layer. After annealing, curing, cooling, unloading, and slitting, the final product is obtained.

[0033] The heat-sealing adhesive layer is a polyethylene film.

[0034] Preferably, the annealing conditions are annealing at 200~300℃ for 30~120min;

[0035] The curing conditions are as follows: curing at 40~60℃ for 24~72 hours with humidity ≤60%RH.

[0036] The cooling rate is 8~10℃ / min.

[0037] Preferably, the thickness of the waterproof, high-barrier, and weather-resistant material is 450~500 Å.

[0038] Compared with the prior art, the present invention has at least the following technical effects:

[0039] This invention provides a method for preparing a double-layer aluminum-coated composite film based on magnetron sputtering aluminum deposition. This method provides the necessary plasma environment for magnetron sputtering aluminum deposition by heating and bombarding the target surface with plasma. When the aluminum-coated substrate is in a thermally stable state, the functional acrylic resin coating effectively reduces film deformation caused by thermal stress during sputtering. By performing two magnetron sputtering aluminum deposition processes on both sides, not only is the thickness and uniformity of the aluminum-coated film guaranteed, but the barrier properties of each deposition against water vapor and oxygen are also ensured, providing a better bonding interface for subsequent depositions. Composite deposition is performed after the magnetron sputtering aluminum deposition process, achieving precise control of the composite performance. Finally, through double aluminum deposition and double composite deposition, a high barrier property against water vapor and oxygen is achieved in the aluminum-coated composite film.

[0040] The application of this double-layer aluminized composite membrane based on magnetron sputtering aluminization process as a basic membrane structure in the preparation of waterproof, high-barrier, and weather-resistant materials. This double-layer aluminized composite membrane has high barrier properties against water vapor and oxygen and weather resistance, which can further improve the structural mechanical properties and high barrier properties of waterproof materials. Combined with a heat-sealing adhesive layer, it further expands the application scenarios.

[0041] The differences between this double-layer aluminum-coated composite film based on magnetron sputtering aluminum deposition technology and existing aluminum-coated films are as follows:

[0042] (1) Structural level: The most common structure of aluminized composite membrane is: PET fabric layer / adhesive layer / aluminized layer / aluminized substrate / heat-sealing layer. However, this product has upgraded the materials and structure to increase the water resistance of the composite membrane. A proprietary coating is added between the adhesive layer and the aluminized layer to enhance the uniformity and thickness of the aluminized layer. At the same time, the good chemical stability of the proprietary coating itself increases the weather resistance of the composite membrane. In addition, the composite membrane of this project adopts a double aluminized layer to further isolate air and water vapor penetration, and has good isolation properties.

[0043] (2) Process differences: The multi-layer aluminum coating structure design, conventional aluminum coating generally adopts vacuum aluminum coating. The disadvantages of vacuum aluminum coating are: 1. High technical requirements: Vacuum aluminum coating process has strict requirements for technical parameters such as vacuum degree and temperature control, which need to be precisely controlled to ensure product quality; 2. Possible adhesion problems: If the substrate surface is not properly treated, it may lead to insufficient adhesion between the aluminum coating layer and the substrate, affecting the performance and service life of the product; 3. Uniformity of aluminum coating film: Microscopic observation of VM-PET can reveal a large number of cracks and voids. This is because PET undergoes tensile deformation during vacuum evaporation. Currently, the commonly used coating method is vacuum aluminum evaporation, which results in a high ambient temperature, causing thermal expansion of the aluminum coating substrate PET. After the coating is completed, the volume of the substrate shrinks, resulting in the destruction of the coating uniformity; 4. Maintenance costs: Daily maintenance and upkeep of vacuum vapor aluminum coating equipment also require certain costs to ensure the normal operation of the equipment and production efficiency. We abandoned vacuum aluminum coating and chose an argon environment. Aluminum coating in an argon environment, namely magnetron sputtering technology, is carried out in an argon atmosphere. Argon is an inert gas that can be used as a protective atmosphere in the sputtering process to improve coating adhesion. In magnetron sputtering, argon ions are accelerated and bombard an aluminum target, causing aluminum atoms to be sputtered and deposited on the substrate. This method can be performed at lower temperatures, is suitable for heat-sensitive substrates, and yields uniform and dense coatings at a lower overall cost.

[0044] (3) Performance advantages: The aluminum composite film produced by the new technology has a denser and more uniform aluminum coating layer and a multi-layer composite structure, resulting in a lower water vapor permeability; better tensile strength, elongation at break and shear strength; and significantly improved overall weather resistance. Attached Figure Description

[0045] Figure 1 This is a schematic diagram of the double-layer aluminum-coated composite film structure prepared in Example 1;

[0046] Figure 2 This is a schematic diagram of the double-layer aluminum-coated composite film structure prepared in Example 5;

[0047] Figure 3 This is a schematic diagram of the double-layer aluminum-coated composite film structure prepared in Example 6;

[0048] Figure 4 This is a schematic diagram of the molded product and related sealing equipment prepared using Example 1.

[0049] Among them, 1-release fabric layer; 2-adhesive layer; 3-aluminized layer; 4-functional coating; 5-aluminized substrate; 6-heat-sealing adhesive layer. Detailed Implementation

[0050] The embodiments of the present invention will be described in detail below with reference to the examples. However, those skilled in the art will understand that the following examples are only for illustrating the present invention and should not be regarded as limiting the scope of the present invention. Specific conditions not specified in the examples shall be carried out according to conventional conditions or conditions recommended by the manufacturer. Reagents or instruments whose manufacturers are not specified are all conventional products that can be purchased commercially.

[0051] Example 1:

[0052] A method for preparing a double-layer aluminum-coated composite film based on magnetron sputtering aluminum deposition process includes the following steps:

[0053] S1, in 2×10 -4 Under a background vacuum environment of Pa or higher, an aluminized substrate 5 is selected and a functional coating 4 is applied to one side of it, and then dried.

[0054] After controlling the partial pressure of argon gas in the environment to reach 0.15 Pa by mass flow meter, the surface of the target material is heated and bombarded with plasma. Then, after the first magnetron sputtering aluminum deposition treatment, a thin film A3 is obtained.

[0055] S2. The wound film A is flipped over, and a functional coating is applied to the other side of the aluminized substrate. After drying, the surface of the target material is bombarded again with plasma under a background vacuum and argon partial pressure atmosphere. Then, a second magnetron sputtering aluminization treatment is performed to obtain a composite film.

[0056] In S1, the aluminum-plated substrate is a polyethylene terephthalate film;

[0057] The thickness of the aluminized substrate is 5 μm;

[0058] The functional coating is an acrylic resin;

[0059] The acrylic resin is a thermoplastic acrylic resin;

[0060] The coating is performed using a coating machine at a speed of 30 m / min and a coating amount of 5 g / m. 2 ;

[0061] The drying temperature is 45℃ and the time is 5 minutes;

[0062] The first magnetron sputtering aluminum plating process is as follows: under a base vacuum and argon partial pressure of 0.15 Pa, the temperature is raised to 175°C and the sputtering power is 1200 W for 20 minutes.

[0063] In S2, the background vacuum is 2×10⁻⁶. -4With an argon partial pressure of 0.15 Pa and a temperature above 175°C, a second magnetron sputtering aluminum plating process is performed for 20 minutes at a sputtering power of 1200 W.

[0064] The specific structure is as follows: Figure 1 The diagram shown is shown in the image.

[0065] like Figure 4 The diagram shows the molded product prepared using Example 1 (first and second figures from left to right) and the related sealing device (third figure from left to right).

[0066] Example 2:

[0067] A method for preparing a double-layer aluminum-coated composite film based on magnetron sputtering aluminum deposition process includes the following steps:

[0068] S1, in 2×10 -4 Under a background vacuum environment above Pa, an aluminized substrate is selected and a functional coating is applied to one side of it, followed by drying.

[0069] After controlling the partial pressure of argon gas in the environment to reach 0.15 Pa by mass flow meter, the target surface is heated and bombarded with plasma. Then, after the first magnetron sputtering aluminum deposition treatment, thin film A is obtained.

[0070] S2. The wound film A is flipped over, and a functional coating is applied to the other side of the aluminized substrate. After drying, the surface of the target material is bombarded again with plasma under a background vacuum and argon partial pressure atmosphere. Then, a second magnetron sputtering aluminization treatment is performed to obtain a composite film.

[0071] In S1, the aluminum-plated substrate is a polypropylene film;

[0072] The thickness of the aluminized substrate is 5 μm;

[0073] The functional coating is an acrylic resin;

[0074] The acrylic resin is a thermoplastic acrylic resin;

[0075] The coating is performed using a coating machine at a speed of 30 m / min and a coating amount of 5 g / m. 2 ;

[0076] The drying temperature is 45℃ and the time is 5 minutes;

[0077] The first magnetron sputtering aluminum plating process is as follows: under a base vacuum and argon partial pressure of 0.15 Pa, the temperature is raised to 175°C and the sputtering power is 1200 W for 60 minutes.

[0078] In S2, the background vacuum is 2×10⁻⁶.-4 With an argon partial pressure of 0.15 Pa and a temperature above 180°C, a second magnetron sputtering aluminum plating process is performed for 60 minutes at a sputtering power of 1200 W.

[0079] Example 3:

[0080] A method for preparing a double-layer aluminum-coated composite film based on magnetron sputtering aluminum deposition process includes the following steps:

[0081] S1, in 2×10 -4 Under a background vacuum environment above Pa, an aluminized substrate is selected and a functional coating is applied to one side of it, followed by drying.

[0082] After controlling the partial pressure of argon gas in the environment to reach 0.15 Pa by mass flow meter, the target surface is heated and bombarded with plasma. Then, after the first magnetron sputtering aluminum deposition treatment, thin film A is obtained.

[0083] S2. The wound film A is flipped over, and a functional coating is applied to the other side of the aluminized substrate. After drying, the surface of the target material is bombarded again with plasma under a background vacuum and argon partial pressure atmosphere. Then, a second magnetron sputtering aluminization treatment is performed to obtain a composite film.

[0084] In S1, the aluminized substrate is a polyethylene film;

[0085] The thickness of the aluminized substrate is 5 μm;

[0086] The functional coating is an acrylic resin;

[0087] The acrylic resin is a thermoplastic acrylic resin;

[0088] The coating is performed using a coating machine at a speed of 30 m / min and a coating amount of 5 g / m. 2 ;

[0089] The drying temperature is 45℃ and the time is 5 minutes;

[0090] The first magnetron sputtering aluminum plating process is as follows: under a base vacuum and argon partial pressure of 0.15 Pa, the temperature is raised to 175°C and the sputtering power is 1200 W for 20 minutes.

[0091] In S2, the background vacuum is 2×10⁻⁶. -4 With an argon partial pressure of 0.15 Pa and a temperature above 175°C, a second magnetron sputtering aluminum plating process is performed for 20 minutes at a sputtering power of 1200 W.

[0092] Example 4:

[0093] A method for preparing a double-layer aluminum-coated composite film based on magnetron sputtering aluminum deposition process includes the following steps:

[0094] S1, in 2×10 -4 Under a background vacuum environment above Pa, an aluminized substrate is selected and a functional coating is applied to one side of it, followed by drying.

[0095] After controlling the partial pressure of argon gas in the environment to reach 0.15 Pa by mass flow meter, the target surface is heated and bombarded with plasma. Then, after the first magnetron sputtering aluminum deposition treatment, thin film A is obtained.

[0096] S2. The wound film A is flipped over, and a functional coating is applied to the other side of the aluminized substrate. After drying, the surface of the target material is bombarded again with plasma under a background vacuum and argon partial pressure atmosphere. Then, a second magnetron sputtering aluminization treatment is performed to obtain a composite film.

[0097] In S1, the aluminum-plated substrate is a polyvinylidene fluoride film;

[0098] The thickness of the aluminized substrate is 5 μm;

[0099] The functional coating is an acrylic resin;

[0100] The acrylic resin is a thermoplastic acrylic resin;

[0101] The coating is performed using a coating machine at a speed of 30 m / min and a coating amount of 5 g / m. 2 ;

[0102] The drying temperature is 45℃ and the time is 5 minutes;

[0103] The first magnetron sputtering aluminum plating process is as follows: under a base vacuum and argon partial pressure of 0.15 Pa, the temperature is raised to 175°C and the sputtering power is 1200 W for 20 minutes.

[0104] In S2, the background vacuum is 2×10⁻⁶. -4 With an argon partial pressure of 0.15 Pa and a temperature above 175°C, a second magnetron sputtering aluminum plating process is performed for 20 minutes at a sputtering power of 1200 W.

[0105] Preparation method of assembly A:

[0106] A double-layer aluminized composite film is selected, and adhesive 2 is coated on its sides. Then, it is hot-pressed with release fabric layer 1. After annealing, curing, cooling, unloading, and slitting, the final product is obtained.

[0107] The release fabric layer is polyethylene terephthalate.

[0108] The annealing conditions are as follows: annealing at 300°C for 50 minutes;

[0109] The curing conditions are: curing at 60%RH and 60℃ for 24 hours;

[0110] The cooling rate is 8~10℃ / min.

[0111] The thickness of the waterproof, high-barrier, and weather-resistant material is 500 Å.

[0112] The specific structure is as follows: Figure 2 The diagram shown is shown in the image.

[0113] The preparation method of assembly B is as follows:

[0114] A double-layer aluminized composite film is selected, and after applying adhesive 2 to one side, it is hot-pressed together with the release fabric layer 1.

[0115] After rewinding and flipping, adhesive 2 is applied to the other side of the double-layer aluminized composite film, and then it is hot-pressed with the heat-sealing adhesive layer 6. After annealing, curing, cooling, unloading, and slitting, the final product is obtained.

[0116] The heat-sealing adhesive layer is a polyethylene film.

[0117] The annealing conditions are as follows: annealing at 300°C for 50 minutes;

[0118] The curing conditions are: curing at 60%RH and 60℃ for 24 hours;

[0119] The cooling rate is 8~10℃ / min.

[0120] The thickness of the waterproof, high-barrier, and weather-resistant material is 500 Å.

[0121] The specific structure is as follows: Figure 3 The diagram shown is shown in the image.

[0122] Experimental Example 1:

[0123] Verification results based on the basic double-layer aluminum-coated composite film structure prepared in Examples 1-4:

[0124]

[0125] Experimental Example 2:

[0126] Since offshore photovoltaic (PV) technology has only emerged in the last two years, the corresponding modules still use traditional manufacturing processes. Currently, there are no aluminum-containing composite film products available on the market for use in offshore PV modules. Existing composite films on the market cannot be directly applied to offshore PV modules, mainly due to three reasons: 1. Insufficient water resistance; 2. Insufficient tensile strength; 3. Insufficient adhesion; 4. Insufficient weather resistance.

[0127] Experimental subjects: Examples 1-4 and high water-resistant pressure-sensitive adhesive.

[0128] High water-resistant pressure-sensitive adhesives primarily function to adhere glass and composite films, enhancing adhesion.

[0129] Figure 2 The sealing equipment used is an aluminum foil edge sealing machine, which automates the encapsulation of composite films. It incorporates a composite film sealing process into the existing production process, enabling rapid mass production.

[0130] The following are the performance comparison results of various parameters of Examples 1-4 of this technical solution and high water-resistant pressure-sensitive adhesive.

[0131]

[0132] Based on the above results, it can be seen that the product prepared by the technical solution of this application can effectively fill the market gap. Regardless of the water vapor barrier performance or various mechanical strengths of the double-layer aluminum-coated composite film, it is superior to the high water-resistant sealants currently on the market.

[0133] Finally, it should be noted that the above description is merely a preferred embodiment of the present invention and is not intended to limit the scope of protection of the present invention. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present invention should be included within the scope of protection of the present invention.

Claims

1. A method for preparing a double-layer aluminum-coated composite film based on magnetron sputtering aluminum deposition process, characterized in that, Includes the following steps: S1, in 2×10 -4 Under a background vacuum environment above Pa, an aluminized substrate is selected and a functional coating is applied to one side of it, followed by drying. After controlling the partial pressure of argon gas in the environment to reach 0.13~0.15Pa by mass flow meter, the target surface is heated and bombarded with plasma. Then, after the first magnetron sputtering aluminum deposition treatment, thin film A is obtained. S2. The wound film A is flipped over, and a functional coating is applied to the other side of the aluminized substrate. After drying, the surface of the target material is bombarded again with plasma under a background vacuum and argon partial pressure atmosphere. Then, a second magnetron sputtering aluminization treatment is performed to obtain a composite film. In step S1, the aluminized substrate is any one of polyethylene terephthalate film, polypropylene film, polyethylene film, and polyvinylidene fluoride film. The thickness of the aluminized substrate is 5~10μm; The functional coating is an acrylic resin or a polyurethane resin; The acrylic resin is a thermoplastic acrylic resin; The coating is performed using a coating machine at a speed of 10-100 m / min and a coating amount of 1-10 g / m. 2 ; The drying temperature is 40~150℃, and the time is 3~5 minutes; The first magnetron sputtering aluminum plating process is as follows: under a base vacuum and an argon partial pressure of 0.13~0.15Pa, the temperature is raised to 175~180℃ and the sputtering power is 1100~1200w for 10~60min. In S2, the background vacuum is 2×10⁻⁶. -4 With an argon partial pressure of 0.13~0.15Pa and a temperature of 175~180℃, a second magnetron sputtering aluminum plating process is performed for 10~60 minutes at a sputtering power of 1100~1200W.

2. A double-layer aluminum-coated composite film based on magnetron sputtering aluminum deposition process, characterized in that, It is obtained by the preparation method described in claim 1.

3. The application of a double-layer aluminized composite film based on magnetron sputtering aluminization process as described in claim 2 in the preparation of waterproof, high-barrier, and weather-resistant materials, characterized in that... include: Assembly A: Hot-press release fabric layers onto both sides of the double-layer aluminum-coated composite film based on magnetron sputtering aluminum plating process. After annealing, curing, cooling, unloading, and slitting, a waterproof, high-barrier, and weather-resistant material is obtained. or, Assembly B: On one side of the double-layer aluminum-plated composite film based on magnetron sputtering aluminum plating process, a release fabric layer is hot-pressed together, and on the other side, a heat-sealing adhesive layer is hot-pressed together. After annealing, curing, cooling, unloading, and slitting, a waterproof, high-barrier, and weather-resistant material is obtained.

4. The application of the double-layer aluminized composite film based on magnetron sputtering aluminization process according to claim 3 in the preparation of waterproof, high-barrier, and weather-resistant materials, characterized in that, The preparation method of assembly A is as follows: A double-layer aluminized composite film is selected, and adhesive is applied to its sides. It is then hot-pressed with a release fabric layer. After annealing, curing, cooling, unloading, and slitting, the final product is obtained.

5. The application of the double-layer aluminized composite film based on magnetron sputtering aluminization process according to claim 4 in the preparation of waterproof, high-barrier, and weather-resistant materials, characterized in that, The release fabric layer is polyethylene terephthalate.

6. The application of the double-layer aluminized composite film based on magnetron sputtering aluminization process according to claim 3 in the preparation of waterproof, high-barrier, and weather-resistant materials, characterized in that, The preparation method of assembly B is as follows: A double-layer aluminized composite film is selected, and after applying adhesive to one side, it is hot-pressed together with the release fabric layer. After rewinding and flipping, adhesive is applied to the other side of the double-layer aluminized composite film, and then it is hot-pressed with the heat-sealing adhesive layer. After annealing, curing, cooling, unloading, and slitting, the final product is obtained. The heat-sealing adhesive layer is a polyethylene film.

7. The application of the double-layer aluminized composite film based on magnetron sputtering aluminization process according to claim 3 in the preparation of waterproof, high-barrier, and weather-resistant materials, characterized in that, The annealing conditions are as follows: annealing at 200~300℃ for 30~120min; The curing conditions are as follows: curing at 40~60℃ for 24~72 hours with humidity ≤60%RH. The cooling rate is 8~10℃ / min.

8. The application of the double-layer aluminized composite film based on magnetron sputtering aluminization process according to claim 3 in the preparation of waterproof, high-barrier, and weather-resistant materials, characterized in that, The thickness of the waterproof, high-barrier, and weather-resistant material is 450~500A.

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