Supporting point replacement device based on wafer detection equipment

Abstract

The invention relates to a supporting point replacement device based on wafer detection equipment, which comprises a fixed table, a circular positioning concave cavity is formed at the top of the fixed table, and at least two supporting seats which are detachably fixed at the edge of the bottom surface of the circular positioning concave cavity and are uniformly distributed at equal angles along the circumferential direction; a triangular extending section is outwards formed on the side, facing the circle center of the circular positioning cavity, of the supporting base, a first notch groove is formed in the upper portion of the end of the triangular extending section, and a vertically-arranged first positioning column is upwards formed on the bottom face of the first notch groove; a detachable V-shaped extension seat is also fixed on each supporting seat, and the triangular extension section extends into an opening of the V-shaped extension seat; according to the method, the replacement process of the supporting points is simplified, so that the time-saving and labor-saving effects are achieved, and the replacement efficiency is greatly improved; meanwhile, the influence on the operation of a production line is greatly reduced, so that the production efficiency is ensured; in addition, the production cost is reduced, and resource waste is avoided.

Description

Technical Field

[0001] The present invention relates to the field of wafer detection technology, and in particular to a support point replacement device based on wafer detection equipment. Background Art

[0002] With the rapid development of the semiconductor industry, wafer inspection technology plays an increasingly important role in improving production efficiency and ensuring product quality. Wafer inspection is an indispensable part of the semiconductor manufacturing process. It accurately detects surface defects, pattern alignment, etc. of wafers to ensure that the quality of wafers meets manufacturing requirements.

[0003] However, existing wafer inspection equipment has some problems with the replacement of support points. First, when the size of the wafer does not match the size of the support point, the support point must be replaced with a matching size. However, the process is cumbersome, time-consuming and labor-intensive, because the support point at the original position must be manually removed first, and then the support point with the matching size must be installed at the original position, and the technician must re-level it, so the replacement efficiency is low. Secondly, since the replacement process is more cumbersome, the equipment requires a long period of downtime maintenance, which not only affects the continuous operation of the production line, but also directly leads to a decrease in production efficiency. In addition, in order to adapt to wafers of various sizes, it is necessary to equip support points of various sizes, which will increase production costs and cause waste of resources, which urgently needs to be resolved. Summary of the Invention

[0004] In view of the current status of the above-mentioned prior art, the technical problem to be solved by the present invention is to provide a support point replacement device based on wafer inspection equipment that simplifies the support point replacement process to achieve the effect of saving time and labor, thereby greatly improving the replacement efficiency, while greatly reducing the impact on the operation of the production line to ensure production efficiency, and reducing production costs to avoid waste of resources.

[0005] The technical solution adopted by the present invention to solve the above technical problems is: a support point replacement device based on wafer inspection equipment, including a fixed platform, a circular positioning cavity formed on the top of the fixed platform, and at least three detachable support seats fixed to the edge of the bottom surface of the circular positioning cavity and evenly distributed at equal angles along the circumferential direction, characterized in that:

[0006] A triangular extension section is formed outwardly on one side of the support seat toward the center of the circular positioning cavity, a first notch groove is formed above the end of the triangular extension section, and a first positioning column is vertically formed upward on the bottom surface of the first notch groove;

[0007] A detachable V-shaped extension seat is also fixed to each of the support seats, and the triangular extension section extends into the interior of the opening of the V-shaped extension seat;

[0008] A second notch is formed above the end of the V-shaped extension seat, and the bottom surface of the second notch is flush with the bottom surface of the first notch;

[0009] A second positioning column is vertically formed on the bottom surface of the second notch, and the end of the second positioning column is flush with the end of the first positioning column.

[0010] Preferably, a step surface is formed on the top of the V-shaped extension seat, the bottom surface of the step surface is flush with the top of the triangular extension section, and the distance between the outer edge of the bottom surface of the first notch groove and the center of the circular positioning cavity is smaller than the distance between the outer edge of the bottom surface of the step surface and the center of the circular positioning cavity.

[0011] Preferably, two grooves are provided on the support seat on one side facing the center of the circular positioning cavity, which are symmetrically arranged on the left and right sides of the triangular extension section. Correspondingly, a protrusion is formed on both sides of the opening of the V-shaped extension seat toward the direction of the support seat, and the two protrusions are respectively detachably inserted and fixed in the two grooves.

[0012] Preferably, each of the two protrusions is provided with a vertically distributed first through hole, and correspondingly, two vertically distributed second through holes are provided between the top inner walls of the two grooves and the top outer wall of the support seat and are respectively located directly above the two first through holes.

[0013] Preferably, a vertically arranged and detachable positioning sleeve is inserted and fixed into each of the first through holes and a corresponding second through hole.

[0014] Preferably, an annular flange is formed outward on the outer edge of the upper opening of each positioning sleeve, and correspondingly, an annular step hole that cooperates with the annular flange is formed on the edge of the upper opening of each second through hole, and the annular flange on each positioning sleeve is embedded in a corresponding annular step hole.

[0015] Compared with the prior art, the advantages of the present invention are: the present invention simplifies the process of replacing the support points to achieve the effect of saving time and labor. When the size of the wafer does not match the size of the support point, there is no need to remove the original support point. The V-shaped extension seat can be installed on the support seat in a nested manner. There is no need to re-level it after installation and it can be used directly, thereby greatly improving the replacement efficiency; at the same time, since the replacement process is relatively simple, the equipment only needs to be shut down for a short time, which greatly reduces the impact on the operation of the production line, thereby ensuring production efficiency; in addition, there is no need to equip support points of various sizes and specifications, thereby reducing production costs and avoiding waste of resources. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] Figure 1 It is a top side structural diagram of the present invention;

[0017] Figure 2 It is a top-side structural diagram of the support seat and the V-shaped extension seat of the present invention;

[0018] Figure 3 This is a top view of the V-shaped extension seat of the present invention;

[0019] Figure 4 A top-side structural diagram of the support base of the present invention;

[0020] Figure 5 It is a top side structural diagram of the positioning sleeve of the present invention. DETAILED DESCRIPTION

[0021] Unless otherwise defined, the technical or scientific terms used in the present invention shall have the usual meanings understood by persons of ordinary skill in the field to which the present invention belongs. The words "first", "second" and similar terms used in the present invention do not indicate any order, quantity or importance, but are only used to distinguish different components. Words such as "include" or "comprise" mean that the elements or objects preceding the word include the elements or objects listed after the word and their equivalents, without excluding other elements or objects. Words such as "connect" or "connected" are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. "Up", "down", "left", "right" and the like are only used to indicate relative positional relationships. When the absolute position of the object being described changes, the relative positional relationship may also change accordingly.

[0022] In order to keep the following description of the embodiments of the present invention clear and concise, detailed descriptions of known functions and known components are omitted.

[0023] like Figures 1 to 5 As shown, a support point replacement device based on a wafer inspection device includes a fixing table 1, a circular positioning cavity 11 is formed on the top of the fixing table 1, and at least three detachable support seats 2 fixed to the bottom edge of the circular positioning cavity 11 and evenly distributed at equal angles along the circumferential direction;

[0024] A triangular extension section 21 is formed outwardly on one side of the support base 2 facing the center of the circular positioning cavity 11. A first notch groove 22 is formed above the end of the triangular extension section 21. A first positioning column 23 is vertically formed upward on the bottom surface of the first notch groove 22.

[0025] A detachable V-shaped extension seat 3 is also fixed to each support seat 2, and a triangular extension section 21 extends into the interior of the opening of the V-shaped extension seat 3;

[0026] A second notch groove 32 is formed above the end of the V-shaped extension seat 3, and the bottom surface of the second notch groove 32 is flush with the bottom surface of the first notch groove 22;

[0027] A second positioning post 33 is vertically formed on the bottom surface of the second notch 32 , and the end of the second positioning post 33 is flush with the end of the first positioning post 23 .

[0028] A step surface 31 is formed on the top of the V-shaped extension seat 3, and the bottom surface of the step surface 31 is flush with the top of the triangular extension section 21. The distance between the outer edge of the bottom surface of the first notch groove 22 and the center of the circular positioning cavity 11 is smaller than the distance between the outer edge of the bottom surface of the step surface 31 and the center of the circular positioning cavity 11.

[0029] Two grooves 24 are symmetrically arranged on the left and right sides of the triangular extension section 21 on the side of the support seat 2 facing the center of the circular positioning cavity 11. Correspondingly, a protrusion 34 is formed on the left and right sides of the opening of the V-shaped extension seat 3 facing the direction of the support seat 2. The two protrusions 34 are respectively detachably inserted and fixed in the two grooves 24.

[0030] A vertically distributed first through hole 35 is defined in each of the two protrusions 34 . Correspondingly, two vertically distributed second through holes 26 are defined between the top inner walls of the two grooves 24 and the top outer wall of the support base 2 and are located directly above the two first through holes 35 .

[0031] A vertically arranged and detachable positioning sleeve 4 is inserted and fixed in each first through hole 35 and a corresponding second through hole 26 .

[0032] An annular flange 41 is formed outward on the outer edge of the upper opening of each positioning sleeve 4. Correspondingly, an annular step hole 25 that cooperates with the annular flange 41 is formed on the edge of the upper opening of each second through hole 26. The annular flange 41 on each positioning sleeve 4 is embedded in a corresponding annular step hole 25.

[0033] Directions:

[0034] Under normal circumstances, a stable supporting surface will be formed between the three supporting seats 2. The wafer 5 is placed horizontally between the three supporting seats 2, and the end of the first positioning column 23 on each supporting seat 2 is made to fit the bottom outer edge of the wafer 5, thereby achieving support and fixation of the wafer 5.

[0035] When the outer diameter of the wafer 5 is smaller than the diameter of the circle surrounded by the ends of the three first positioning columns 23, the three support seats 2 cannot be used. At this time, a V-shaped extension seat 3 can be fixed on each support seat 2. The diameter of the circular area surrounded by the ends of the second positioning columns 33 on each V-shaped extension seat 3 is smaller than the outer diameter of the wafer 5. In this way, the three V-shaped extension seats 3 will form a new plane, and since the bottom surface of the second notch groove 32 is flush with the bottom surface of the first notch groove 22, and the end of the second positioning column 33 is flush with the end of the first positioning column 23, the positioning height of the three V-shaped extension seats 3 is equal to the positioning height of the three support seats 2. There is no need to spend extra time and energy on leveling. You only need to select a V-shaped extension seat 3 of corresponding size according to the outer diameter of the wafer 5 and replace and fix it. The operation is simple and convenient.

[0036] When installing the V-shaped extension seat 3, first insert the two protrusions 34 on the V-shaped extension seat 3 into the two grooves 24 respectively, then insert and fix each positioning sleeve 4 into a corresponding first through hole 35 and a second through hole 26, and then fix the V-shaped extension seat 3 on the support seat 2.

[0037] The present invention simplifies the process of replacing the support points to achieve the effect of saving time and labor. When the size of the wafer does not match the size of the support point, there is no need to remove the original support point. The V-shaped extension seat 3 can be installed on the support seat 2 in a nested manner. There is no need to re-level after installation and it can be used directly, thereby greatly improving the replacement efficiency. At the same time, since the replacement process is relatively simple, the equipment only needs to be shut down for a short time, which greatly reduces the impact on the operation of the production line and ensures production efficiency. In addition, there is no need to equip support points of various sizes and specifications, thereby reducing production costs and avoiding waste of resources.

[0038] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit it. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or make equivalent replacements for some of the technical features therein. However, these modifications or replacements do not deviate the essence of the corresponding technical solutions from the spirit and scope of the technical solutions of the various embodiments of the present invention.

Claims

1. A support point replacement device for wafer inspection equipment, comprising a fixed platform having a circular positioning cavity formed on the top of the fixed platform, and at least three detachable support seats fixed to the bottom edge of the circular positioning cavity and evenly distributed at equal angles along the circumference, characterized in that: A triangular extension section is formed outwardly on one side of the support seat toward the center of the circular positioning cavity, a first notch groove is formed above the end of the triangular extension section, and a first positioning column is vertically formed upward on the bottom surface of the first notch groove; A detachable V-shaped extension seat is also fixed to each of the support seats, and the triangular extension section extends into the interior of the opening of the V-shaped extension seat; A second notch is formed above the end of the V-shaped extension seat, and the bottom surface of the second notch is flush with the bottom surface of the first notch; A second positioning column is vertically formed on the bottom surface of the second notch, and the end of the second positioning column is flush with the end of the first positioning column.

2. The support point replacement device based on wafer inspection equipment according to claim 1, characterized in that: A step surface is formed on the top of the V-shaped extension seat, the bottom surface of the step surface is flush with the top of the triangular extension section, and the distance between the outer edge of the bottom surface of the first notch groove and the center of the circular positioning cavity is smaller than the distance between the outer edge of the bottom surface of the step surface and the center of the circular positioning cavity.

3. The support point replacement device based on wafer inspection equipment according to claim 1, characterized in that: Two grooves are symmetrically arranged on the left and right sides of the triangular extension section on one side of the support seat facing the center of the circular positioning cavity. Correspondingly, a protrusion is formed on the left and right sides of the opening of the V-shaped extension seat facing the direction of the support seat, and the two protrusions are removably inserted and fixed in the two grooves.

4. The support point replacement device based on wafer inspection equipment according to claim 3, characterized in that: A vertically distributed first through hole is provided in each of the two protrusions. Correspondingly, two vertically distributed second through holes are provided between the top inner walls of the two grooves and the top outer wall of the support seat and are respectively located directly above the two first through holes.

5. The support point replacement device based on wafer inspection equipment according to claim 4, characterized in that: A vertically arranged and detachable positioning sleeve is inserted and fixed in each of the first through holes and a corresponding second through hole.

6. The support point replacement device based on wafer inspection equipment according to claim 5, characterized in that: The outer edge of the upper opening of each positioning sleeve is formed with an annular flange outward, and correspondingly, the edge of the upper opening of each second through hole is formed with an annular step hole that cooperates with the annular flange, and the annular flange on each positioning sleeve is embedded in a corresponding annular step hole.

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