Hydrofluoric acid rectifying tower for semiconductor industry and rectifying method

Abstract

The invention discloses a hydrofluoric acid rectifying tower for semiconductor industry and a rectifying method, and relates to the technical field of rectification, a gas inlet of the rectifying tower is connected with a vaporizer, a gas outlet of the rectifying tower is connected with a spraying absorption tower through an external condensation reflux system, the rectifying tower comprises a tower cover, a plurality of tower cylinders and a tower base, compared with an existing rectifying tower, the rectifying tower is provided with the adjusting mechanism and the cleaning mechanism, the distance between every two adjacent tower plates is freely adjusted through the adjusting mechanism in the working process, on one hand, entrainment is effectively avoided, and on the other hand, the cleaning mechanism is arranged on the tower base, so that the cleaning efficiency is improved; on the other hand, the application range of the rectifying tower is greatly expanded, after hydrofluoric acid rectifying work is finished, the tower plate can be effectively cleaned through cooperation of the adjusting mechanism and the cleaning mechanism, and then the frequency of cleaning the rectifying tower by workers is reduced.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of rectification, in particular to a hydrogen fluoride rectification tower for semiconductor industry and a rectification method. BACKGROUND

[0002] At present, with the rapid development of the semiconductor industry, hydrogen fluoride, as a key basic material in the chip manufacturing process, its purity and supply stability directly determine the performance and yield of semiconductor devices. From wafer cleaning, photoresist stripping to etching process, hydrogen fluoride has become an indispensable core chemical in the semiconductor manufacturing process due to its strong corrosive and unique chemical properties.

[0003] At present, industrial hydrogen fluoride usually needs to be subjected to rectification and other steps before being applied to the semiconductor industry. The existing hydrogen fluoride rectification tower mostly adopts a fixed tray structure (such as sieve tray tower, float valve tower). For example, the patents "CN112891974A Energy-saving electronic grade hydrogen fluoride production rectification tower" and "CN119425136A Production of electronic grade hydrogen fluoride purification device" both disclose a hydrogen fluoride rectification technical solution adopting a fixed tray structure. However, in the actual working process, the hydrogen fluoride rectification tower with a fixed tray structure is difficult to adapt to different working conditions of different gas inlet quantities and different impurity contents. Problems such as entrainment of mist, plugging of tray, etc. are prone to occur in the tower, resulting in fluctuations in product purity. Finally, after the hydrogen fluoride rectification is completed, some crystalline impurities are usually generated on the tray. At present, manual cleaning is usually relied on to clean the tower, which not only increases the labor intensity of the workers, but also sometimes leads to safety accidents. SUMMARY

[0004] The purpose of the present application is to provide a hydrogen fluoride rectification tower for semiconductor industry and a rectification method to solve the problems in the prior art.

[0005] To achieve the above object, the present application provides the following technical scheme: a semiconductor industry hydrogen fluoride rectifying tower, the gas inlet of the rectifying tower is connected with a vaporizer, the gas outlet of the rectifying tower is connected with a spray absorption tower through an external condensation reflux system, the rectifying tower comprises a tower cover, a plurality of tower barrels and a tower base, the plurality of tower barrels are sequentially arranged between the tower cover and the tower base, each tower barrel is internally provided with a plurality of tower plates, the gas inlet is arranged at the side end of the tower base, the gas outlet is arranged at the top end of the tower cover, a support frame is arranged inside the tower cover and the tower base, a fixing shaft is arranged between the two support frames, the fixing shaft penetrates through the plurality of tower plates, an adjusting mechanism is arranged below each tower plate, a reflux port is arranged on a tower barrel close to the tower cover, and the reflux port is connected with a reflux end of the external condensation reflux system, when the present application works, the hydrogen fluoride gas vaporized by the vaporizer enters the rectifying tower through the gas inlet and is discharged from the gas outlet by penetrating through the plurality of tower plates, in the process of flowing, the external condensation reflux system continuously sends hydrogen fluoride reflux liquid into the rectifying tower through the reflux port, the hydrogen fluoride reflux liquid flows downward along the tower plates layer by layer under the action of gravity, and then reversely contacts with the hydrogen fluoride gas flowing upward, so that the efficient separation of different components in the hydrogen fluoride mixture is realized, in the process, the staff can freely adjust the distance between adjacent two tower plates through the adjusting mechanism, on the one hand, the risk of tower plate blockage can be effectively avoided, and on the other hand, the application range of the rectifying tower is greatly expanded.

[0006] Further, the tower base is connected with an external reboiler, a gas flow rate detection element is arranged above each tower plate, and a plurality of observation windows are arranged at the side end of each tower barrel (the external reboiler, the gas flow rate detection element and the observation window are not shown in the figure), the hydrogen fluoride in the tower base is heated and vaporized by the external reboiler, so that high-boiling-point impurities are enriched in the tower base, and the staff can conveniently discharge them regularly, the gas phase flow speed data above each tower plate and the severity of mist entrainment are conveniently collected by the staff in real time through the gas flow rate detection element and the observation window, and then the staff can conveniently dynamically adjust the distance between the tower plates in the corresponding region in time through the adjusting mechanism.

[0007] Further, a plurality of sieve holes are arranged on the tower plate, and an overflow weir is arranged at each end of the tower plate, and a liquid descending assembly is arranged on one side of the overflow weir away from the axis of the tower plate, the sieve holes on the tower plate serve as the main channel for the upward flow of the gas phase, the residence height of the liquid phase hydrogen fluoride on the tower plate is controlled through the two overflow weirs on the tower plate, and the time of gas-liquid contact is fully ensured.

[0008] Further, the adjusting mechanism comprises a first adjusting rod, a second adjusting rod and a mounting seat, the mounting seat is arranged on the fixed shaft, the first adjusting rod and the second adjusting rod are oppositely arranged at two ends of the mounting seat, a driving assembly is arranged in the mounting seat, one end of the first adjusting rod is connected with the driving assembly through a first rotating shaft, the other end of the first adjusting rod is connected with the tower plate through a first connecting block, one end of the second adjusting rod is connected with the driving assembly through a second rotating shaft, the other end of the second adjusting rod is connected with the tower plate through a second connecting block, the inclination angle of the first adjusting rod and the second adjusting rod is controlled by the driving assembly, when the first adjusting rod and the second adjusting rod rotate towards the direction close to the fixed shaft, the tower plate will automatically rise, when the first adjusting rod and the second adjusting rod rotate away from the fixed shaft, the tower plate will automatically descend, the staff can realize the purpose of adjusting the distance between two adjacent tower plates by controlling the descent or rise of the tower plate, through the above technical scheme, the problem that the mist splashes and is entrained due to the excessive hydrogen fluoride gas suddenly entering in the production process is effectively avoided, and the subsequent impurity separation is avoided from being affected.

[0009] Further, the driving assembly comprises an adjusting motor, a transmission gear and a reversing gear, a first adjusting gear is arranged on the first rotating shaft, a second adjusting gear is arranged on the second rotating shaft, the first adjusting gear is connected with the transmission gear, the second adjusting gear is connected with the transmission gear through the reversing gear, and the working end of the adjusting motor is connected with the transmission gear, the transmission gear is driven to rotate by the adjusting motor, under the action of the reversing gear, it is ensured that the first adjusting gear and the second adjusting gear can rotate in opposite directions with the first adjusting rod and the second adjusting rod, and then the purpose that the adjusting motor controls the first adjusting rod and the second adjusting rod to synchronously approach or move away from the fixed shaft is realized.

[0010] Further, the liquid descending assembly comprises a first liquid descending pipe, a second liquid descending pipe and a sealing cover, the second liquid descending pipe is arranged in the first liquid descending pipe, the sealing cover is arranged at one end of the first liquid descending pipe close to the tower cylinder axis, a linear motor is arranged in the sealing cover, and the working end of the linear motor is connected with the second liquid descending pipe, the length of the second liquid descending pipe extending out of the first liquid descending pipe is controlled by the linear motor, the first liquid descending pipe and the second liquid descending pipe play the purpose of guiding flow, and it is ensured that the liquid-phase hydrofluoric acid can stably flow downwards layer by layer.

[0011] Further, one cleaning mechanism is arranged above each tower plate, and the tower plate is cleaned by cooperation of the cleaning mechanism and the adjusting mechanism.

[0012] Further, the cleaning mechanism comprises a ring cover, an exhaust pipe, a gas guide pipe, a cleaning frame and a rotating disc, the rotating disc is arranged on a fixed shaft, the gas guide pipe is arranged below the side end of the rotating disc, the cleaning frame is arranged below the gas guide pipe, the ring cover is arranged above the rotating disc, the rotating disc is internally provided with a ring groove, one end of the ring cover is inserted into the ring groove, and the other end of the ring cover is connected with an external fan through the exhaust pipe, after work, the staff can start the external fan to generate a group of suction force, at this time, the impurities on the tower plate will flow along the cleaning frame, the gas guide pipe, the ring cover and the exhaust pipe under the action of the suction force, through the above technical scheme, the frequency of the staff cleaning the rectifying tower can be effectively reduced.

[0013] Further, the ring cover is fixedly connected with the fixed shaft, the fixed shaft is internally provided with a driving shaft, the rotating disc is connected with the driving shaft, a sealing tank is arranged on the support frame in the tower cover, a rotary motor is arranged in the sealing tank, and the rotary motor is connected with the driving shaft, when the cleaning mechanism in the application cleans the tower plate, the rotary motor synchronously controls the rotation of the driving shaft and the rotating disc, through the above technical scheme, the cleaning area of the cleaning mechanism on the tower plate can be effectively increased.

[0014] A rectification method used on a hydrogen fluoride rectifying tower for semiconductor industry, comprising the following steps: S1: Pumping anhydrous hydrogen fluoride into a vaporizer for gasification through a raw material pump, and then continuously feeding the gasified hydrogen fluoride gas into a rectifying tower; S2: Controlling the temperature at the bottom of the rectifying tower through an external reboiler, so that high-boiling-point impurities are enriched in the tower base and are periodically discharged; S3: Condensing and treating high-purity hydrogen fluoride enriched at the top of the rectifying tower through an external condensing reflux system, part of the hydrogen fluoride returns to the rectifying tower as reflux liquid, and part of the hydrogen fluoride is fed into a spray absorption tower for subsequent treatment.

[0015] Compared with the prior art, the beneficial effects of the application are: Compared with the current rectifying tower, the adjusting mechanism and the cleaning mechanism are arranged, when working, through the gas flow rate detection element and the observation window, the gas phase flow speed data above each layer of tray and whether the entrainment phenomenon appears are obtained by the staff in real time, the distance between the adjacent two trays is freely adjusted through the adjusting mechanism during the working process, on the one hand, the entrainment is effectively avoided, and the risk of the tray being blocked is reduced, on the other hand, the application range of the rectifying tower is greatly expanded, the adjusting mechanism controls the lifting of the tray through the first adjusting rod and the second adjusting rod, the tray is ensured to always keep horizontal during the lifting through the first adjusting rod and the second adjusting rod, the liquid phase distribution caused by the inclination of the tray is avoided, the separation stability is further ensured, in addition, when the rectifying tower needs to be repaired or cleaned, the distance between the adjacent two trays is changed through the adjusting mechanism, the maintenance and cleaning space of the staff can be expanded, so that the subsequent work is not difficult due to the narrow maintenance and cleaning space, finally, when the hydrofluoric acid rectification work is finished, the staff can drive the tray to move to the direction of the cleaning mechanism through the adjusting mechanism, until the tray is in contact with the cleaning mechanism, then the cleaning mechanism is driven to rotate on the tray through the rotating motor, the tray is cleaned through the cleaning mechanism, through the above technical scheme, the cleaning efficiency is greatly improved, and the frequency of the staff cleaning the rectifying tower is reduced, so that the labor burden of the staff is fundamentally reduced. BRIEF DESCRIPTION OF DRAWINGS

[0016] Figure 1 It is the installation position schematic view of the application; Figure 2 It is the appearance structure schematic view of the application; Figure 3 It is the tower barrel internal structure schematic view of the application; Figure 4 It is the cleaning mechanism and adjusting mechanism position schematic view of the application; Figure 5 It is the liquid falling assembly structure schematic view of the application; Figure 6 It is the adjusting mechanism structure schematic view of the application; Figure 7 It is the driving assembly structure schematic view of the application; Figure 8 It is the cleaning mechanism structure schematic view of the application; Figure 9 It is the tower cover internal structure schematic view of the application.

[0017] In the figure: 1, rectifying tower; 11, tower cover; 111, gas outlet; 112, support frame; 113, sealing tank; 12, reflux inlet; 13, tower cylinder; 131, tower plate; 1311, overflow weir; 132, fixed shaft; 133, cleaning mechanism; 1331, ring cover; 13311, exhaust pipe; 1332, gas guide pipe; 1333, cleaning frame; 1334, rotating disc; 134, adjusting mechanism; 1341, first adjusting rod; 1342, second adjusting rod; 1343, mounting seat; 13431, first adjusting gear; 13432, adjusting motor; 13433, transmission gear; 13434, reversing gear; 13435, second adjusting gear; 135, liquid downflow assembly; 1351, first liquid downflow pipe; 1352, second liquid downflow pipe; 1353, sealing cover; 14, tower base; 141, gas inlet. DETAILED DESCRIPTION

[0018] All other embodiments obtained by a person of ordinary skill in the art based on the embodiments in the present application without creative labor fall within the scope of protection of the present application.

[0019] Embodiment: As Figures 1-9As shown, the present application provides a technical scheme, a semiconductor industry hydrogen fluoride rectification tower, the gas inlet 141 of the rectification tower 1 is connected with the vaporizer, the gas outlet 111 of the rectification tower 1 is connected with the spray absorption tower through the external condensation reflux system, the rectification tower 1 includes tower cover 11, tower barrel 13 and tower base 14, the tower barrel 13 is provided with several, several tower barrels 13 are installed between the tower cover 11 and the tower base 14 in turn, each tower barrel 13 is provided with several tower plates 131 inside, the gas inlet 141 is arranged at the side end of the tower base 14, the gas outlet 111 is arranged at the top end of the tower cover 11, the tower cover 11 and the tower base 14 are both provided with a support frame 112 inside, a fixed shaft 132 is arranged between the two support frames 112, the fixed shaft 132 penetrates through the several tower plates 131, each tower plate 131 is provided with an adjusting mechanism 134 below, a tower barrel 13 close to the tower cover 11 is provided with a reflux port 12, the reflux port 12 is connected with the reflux end of the external condensation reflux system, when the present application works, the hydrogen fluoride gas vaporized by the vaporizer enters into the rectification tower 1 along the gas inlet 141, and is discharged from the gas outlet 111 by penetrating through the several tower plates 131, in the process of flowing, the external condensation reflux system will continuously send the hydrogen fluoride reflux liquid into the rectification tower 1 through the reflux port 12, the hydrogen fluoride reflux liquid flows down along the tower plates 131 layer by layer under the action of gravity, and then forms reverse contact with the hydrogen fluoride gas flowing upwards, so as to realize the efficient separation of different components in the hydrogen fluoride mixture, in this process, the staff can freely adjust the spacing of the adjacent two tower plates 131 through the adjusting mechanism 134, on the one hand, it can effectively avoid the entrainment of mist, reduce the risk of tower plate blockage, on the other hand, it can greatly expand the application range of the rectification tower 1, and at the same time, it is convenient for subsequent maintenance and cleaning of the rectification tower 1.

[0020] As Figures 2-3 shown, the tower base 14 is connected with the external reboiler, the upper side of each tower plate 131 is provided with a gas flow rate detection element, the side end of each tower barrel 13 is provided with several observation windows (the external reboiler, the gas flow rate detection element and the observation window are not drawn in the figure), the hydrogen fluoride in the tower base 14 is heated and vaporized through the external reboiler, so that the high-boiling-point impurities are enriched in the tower base 14, which is convenient for the staff to discharge regularly, the gas phase flow velocity data above each tower plate 131 and the severity of mist entrainment are collected by the staff in real time through the gas flow rate detection element and the observation window, and then the staff can dynamically adjust the spacing between the tower plates 131 in the corresponding area in time through the adjusting mechanism.

[0021] As Figures 3-4As shown, the tower plate 131 is provided with a plurality of sieve holes, and two overflow weirs 1311 are arranged at the upper ends of the tower plate 131, one of the overflow weirs 1311 is provided with a liquid descending assembly 135 away from the axis of the tower plate 131, the sieve holes of the tower plate 131 serve as the main channel for the upward movement of the gas phase, and the residence height of the liquid phase hydrofluoric acid on the tower plate 131 is controlled through the two overflow weirs 1311 of the tower plate 131, thereby fully ensuring the contact time of the gas-liquid. As shown in the figure, Figures 4-7 As shown, the adjusting mechanism 134 includes a first adjusting rod 1341, a second adjusting rod 1342 and a mounting seat 1343, the mounting seat 1343 is arranged on the fixed shaft 132, the first adjusting rod 1341 and the second adjusting rod 1342 are oppositely arranged at the two ends of the mounting seat 1343, the mounting seat 1343 is internally provided with a driving assembly, one end of the first adjusting rod 1341 is connected with the driving assembly through a first rotating shaft, the other end of the first adjusting rod 1341 is connected with the tower plate 131 through a first connecting block, one end of the second adjusting rod 1342 is connected with the driving assembly through a second rotating shaft, the other end of the second adjusting rod 1342 is connected with the tower plate 131 through a second connecting block, the inclination angle of the first adjusting rod 1341 and the second adjusting rod 1342 is controlled by the driving assembly, when the first adjusting rod 1341 and the second adjusting rod 1342 rotate towards the direction close to the fixed shaft 132, the tower plate 131 will automatically rise, when the first adjusting rod 1341 and the second adjusting rod 1342 rotate away from the fixed shaft 132, the tower plate 131 will automatically descend, the staff can realize the purpose of adjusting the distance between the adjacent two tower plates 131 by controlling the descent or rise of the tower plate 131, through the above technical solution, the present application effectively avoids the problem that the mist splashes and is entrained due to the sudden excessive hydrogen fluoride gas in the production process, and avoids the influence on the subsequent impurity separation.

[0022] As shown in the figure, Figures 6-7 As shown, the driving assembly includes an adjusting motor 13432, a transmission gear 13433 and a reversing gear 13434, a first adjusting gear 13431 is arranged on the first rotating shaft, a second adjusting gear 13435 is arranged on the second rotating shaft, the first adjusting gear 13431 is connected with the transmission gear 13433, the second adjusting gear 13435 is connected with the transmission gear 13433 through the reversing gear 13434, and the working end of the adjusting motor 13432 is connected with the transmission gear 13433, the present application drives the transmission gear 13433 to rotate through the adjusting motor 13432, under the action of the reversing gear 13434, it is ensured that the first adjusting gear 13431 and the second adjusting gear 13435 can rotate in opposite directions with the first adjusting rod 1341 and the second adjusting rod 1342, thereby realizing the purpose that the adjusting motor 13432 controls the first adjusting rod 1341 and the second adjusting rod 1342 to synchronously approach or move away from the fixed shaft 132.

[0023] As Figure 4 , Figure 5 shown, the liquid downcomer assembly 135 includes a first liquid downcomer 1351, a second liquid downcomer 1352 and a sealing cover 1353, the second liquid downcomer 1352 is arranged inside the first liquid downcomer 1351, the sealing cover 1353 is arranged at one end of the first liquid downcomer 1351 close to the axis of the tower drum 13, a linear motor is arranged inside the sealing cover 1353, the working end of the linear motor is connected with the second liquid downcomer 1352, the length of the second liquid downcomer 1352 extending out of the first liquid downcomer 1351 is controlled through the linear motor, the first liquid downcomer 1351 and the second liquid downcomer 1352 play the purpose of guiding flow, and it is ensured that the liquid phase hydrofluoric acid can flow down layer by layer stably.

[0024] As Figure 4 , Figure 8 shown, each tower plate 131 is provided with a cleaning mechanism 133, when the hydrofluoric acid rectification work is finished, the staff can drive the tower plate 131 to move to the direction of the cleaning mechanism 133 through the adjusting mechanism 134, until the tower plate 131 is in contact with the cleaning mechanism 133, and the cleaning mechanism 133 cleans the tower plate 131.

[0025] As Figure 8 shown, the cleaning mechanism 133 includes an annular cover 1331, an exhaust pipe 13311, a gas guide pipe 1332, a cleaning frame 1333 and a rotating disc 1334, the rotating disc 1334 is arranged on the fixed shaft 132, the gas guide pipe 1332 is arranged below the side end of the rotating disc 1334, the cleaning frame 1333 is arranged below the gas guide pipe 1332, the annular cover 1331 is arranged above the rotating disc 1334, the rotating disc 1334 is provided with an annular groove inside, one end of the annular cover 1331 is inserted into the annular groove, and the other end of the annular cover 1331 is connected with an external fan through the exhaust pipe 13311, after the work is finished, the staff can start the external fan, a group of suction force is generated through the external fan, at this time, the impurities on the tower plate 131 will flow along the cleaning frame 1333, the gas guide pipe 1332, the annular cover 1331 and the exhaust pipe 13311 under the action of the suction force, through the above technical scheme, the frequency of the staff cleaning the rectification tower 1 can be effectively reduced.

[0026] As Figure 8 , Figure 9As shown, the annular cover 1331 is fixedly connected with the fixed shaft 132, the fixed shaft 132 is internally provided with a driving shaft, the rotating disc 1334 is connected with the driving shaft, the support frame 112 in the tower cover 11 is provided with a sealed tank 113, the sealed tank 113 is provided with a rotating motor, the rotating motor is connected with the driving shaft, when the cleaning mechanism 133 in the application cleans the tray 131, the rotating motor synchronously controls the driving shaft and the rotating disc 1334 to rotate, through the above technical scheme, the cleaning area of the cleaning mechanism 133 on the tray 131 can be effectively increased.

[0027] A distillation method used on a semiconductor industry hydrofluoric acid rectifying tower, comprising the following steps: S1: Pumping anhydrous hydrogen fluoride into a vaporizer for gasification by a raw material pump, and then continuously feeding the gasified hydrogen fluoride gas into a rectifying tower 1; S2: Controlling the bottom temperature of the rectifying tower 1 by an external reboiler, so that high-boiling-point impurities are enriched in the tower base 14 and are periodically discharged; S3: Condensing and treating the high-purity hydrogen fluoride enriched at the top of the rectifying tower 1 by an external condensing reflux system, part of the hydrogen fluoride returns to the rectifying tower as reflux liquid, and part is fed into a spray absorption tower for subsequent treatment.

[0028] The working principle of the application: when working, the hydrogen fluoride acid gas gasified by the vaporizer enters the rectifying tower 1 through the gas inlet 141, and is discharged from the gas outlet 111 by passing through a plurality of trays 131, in the process of flowing, the external condensing reflux system continuously feeds hydrogen fluoride acid reflux liquid into the rectifying tower 1 through the reflux port 12, the hydrogen fluoride acid reflux liquid flows downward along the trays 131 layer by layer under the action of gravity, and then forms reverse contact with the upward flowing hydrogen fluoride acid gas, so as to realize efficient separation of different components in the hydrogen fluoride acid mixture, when the hydrogen fluoride gas flow suddenly increases during work, the staff can freely adjust the distance between the adjacent two trays 131 through the adjusting mechanism 134, so as to avoid mist entrainment, ensure the impurity separation effect, and reduce the risk of tray blockage, when the application stops working, the staff can start the external fan and the rotating motor, a group of suction force is generated by the external fan, at this time, the impurities on the tray 131 will flow along the cleaning frame 1333, the air guide pipe 1332, the annular groove annular cover 1331 and the exhaust pipe 13311 under the action of the suction force, and the rotating motor controls the driving shaft and the rotating disc 1334 to rotate, so as to increase the cleaning area.

[0029] Finally, it should be noted that the above only describes the preferred embodiments of the present application and is not intended to limit the present application. Although the present application has been described in detail with reference to the foregoing embodiments, those skilled in the art will appreciate that the technical solutions described in the foregoing embodiments can be modified or some technical features thereof can be replaced by equivalent ones. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application shall be included in the protection scope of the present application.

Claims

1. A hydrofluoric acid distillation tower for the semiconductor industry, wherein the air inlet (141) of the distillation tower (1) is connected to a vaporizer, and the air outlet (111) of the distillation tower (1) is connected to a spray absorption tower through an external condensation reflux system, characterized in that: The distillation tower (1) comprises a tower cover (11), a tower barrel (13) and a tower base (14), wherein a plurality of tower barrels (13) are provided, and the plurality of tower barrels (13) are sequentially installed between the tower cover (11) and the tower base (14), and a plurality of tower plates (131) are provided inside each tower barrel (13), the air inlet (141) is provided at the side end of the tower base (14), and the air outlet (111) is provided at the top end of the tower cover (11), and a support frame (112) is provided inside each of the tower cover (11) and the tower base (14), a fixed shaft (132) is provided between the two support frames (112), the fixed shaft (132) passes through the plurality of tower plates (131), and an adjustment mechanism (134) is provided below each tower plate (131).

2. A hydrofluoric acid distillation tower for semiconductor industry according to claim 1, characterized in that: A reflux port (12) is provided on a tower barrel (13) near the tower cover (11), and the reflux port (12) is connected to the reflux end of the external condensation reflux system. The tower base (14) is connected to the external reboiler. A gas flow rate detection element is provided above each tower plate (131), and a plurality of observation windows are provided on the side end of each tower barrel (13).

3. A hydrofluoric acid distillation tower for semiconductor industry according to claim 1, characterized in that: The tower plate (131) is provided with a plurality of sieve holes. An overflow weir (1311) is provided at each of the upper ends of the tower plate (131). A downcomer assembly (135) is provided on a side of one of the overflow weirs (1311) away from the axis of the tower plate (131).

4. A hydrofluoric acid distillation tower for semiconductor industry according to claim 1, characterized in that: The adjusting mechanism (134) includes a first adjusting rod (1341), a second adjusting rod (1342) and a mounting seat (1343); the mounting seat (1343) is arranged on the fixed shaft (132); the first adjusting rod (1341) and the second adjusting rod (1342) are arranged at two ends of the mounting seat (1343) relative to each other; a driving assembly is arranged inside the mounting seat (1343); one end of the first adjusting rod (1341) is connected to the driving assembly via a first rotating shaft; the other end of the first adjusting rod (1341) is connected to the tower plate (131) via a first connecting block; one end of the second adjusting rod (1342) is connected to the driving assembly via a second rotating shaft; the other end of the second adjusting rod (1342) is connected to the tower plate (131) via a second connecting block.

5. A hydrofluoric acid distillation tower for semiconductor industry according to claim 4, characterized in that: The driving assembly comprises an adjusting motor (13432), a transmission gear (13433) and a reversing gear (13434); a first adjusting gear (13431) is provided on the first rotating shaft; a second adjusting gear (13435) is provided on the second rotating shaft; the first adjusting gear (13431) is connected to the transmission gear (13433); the second adjusting gear (13435) is connected to the transmission gear (13433) via the reversing gear (13434); and the working end of the adjusting motor (13432) is connected to the transmission gear (13433).

6. A hydrofluoric acid distillation tower for semiconductor industry according to claim 3, characterized in that: The downcomer assembly (135) comprises a first downcomer (1351), a second downcomer (1352) and a sealing cover (1353); the second downcomer (1352) is arranged inside the first downcomer (1351); the sealing cover (1353) is arranged at one end of the first downcomer (1351) close to the axis of the tower (13); a linear motor is arranged inside the sealing cover (1353); and a working end of the linear motor is connected to the second downcomer (1352).

7. A hydrofluoric acid distillation tower for semiconductor industry according to claim 6, characterized in that: A cleaning mechanism (133) is provided above each tower plate (131), and the tower plate (131) is cleaned by the cooperation of the cleaning mechanism (133) and the regulating mechanism (134).

8. A hydrofluoric acid distillation tower for semiconductor industry according to claim 7, characterized in that: The cleaning mechanism (133) comprises an annular cover (1331), an exhaust pipe (13311), an air guide pipe (1332), a cleaning frame (1333) and a turntable (1334); the turntable (1334) is arranged on the fixed shaft (132); the air guide pipe (1332) is arranged below the side end of the turntable (1334); the cleaning frame (1333) is arranged below the air guide pipe (1332); the annular cover (1331) is arranged above the turntable (1334); an annular groove is arranged inside the turntable (1334); one end of the annular cover (1331) is inserted into the annular groove; the other end of the annular cover (1331) is connected to an external fan through the exhaust pipe (13311).

9. A hydrofluoric acid distillation tower for semiconductor industry according to claim 8, characterized in that: The annular cover (1331) is fixedly connected to the fixed shaft (132), a driving shaft is provided inside the fixed shaft (132), the turntable (1334) is connected to the driving shaft, a sealing tank (113) is provided on the support frame (112) inside the tower cover (11), a rotating motor is provided inside the sealing tank (113), and the rotating motor is connected to the driving shaft.

10. A distillation method using a hydrofluoric acid distillation tower for semiconductor industry according to claim 2, characterized in that : Includes the following steps: S1: Anhydrous hydrogen fluoride is pumped into a vaporizer through a raw material pump for vaporization, and then the vaporized hydrogen fluoride gas is continuously fed into a distillation tower (1); S2: Control the bottom temperature of the distillation tower (1) through an external reboiler, so that high-boiling-point impurities are concentrated at the tower base (14) and discharged regularly; S3: The high-purity hydrogen fluoride enriched at the top of the distillation tower (1) is condensed and processed through an external condensation reflux system. Part of the hydrogen fluoride is returned to the distillation tower as reflux liquid, and part is sent to the spray absorption tower for subsequent treatment.

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