Natural gas crude helium selective adsorption, impurity removal and purification device and working method thereof

Abstract

The invention discloses a natural gas crude helium selective adsorption, impurity removal and purification device and a working method thereof, and belongs to the technical field of natural gas crude helium purification. The device comprises a first sealing valve, a first-stage shell, a second sealing valve, a second-stage shell, a third sealing valve, a third-stage shell, a flange for sealing the third-stage shell and a first low-temperature plate system; a second low-temperature plate system, a third low-temperature plate system and a male-female joint. Wherein the front ends and the rear ends of the first-stage shell, the second-stage shell and the third-stage shell are respectively connected with the first sealing valve, the second sealing valve and the third sealing valve through flanges, and a rear flange of the third-stage shell is connected with a flange for sealing the third-stage shell. The first low-temperature plate system, the second low-temperature plate system and the third low-temperature plate system are located in the first-stage shell, the second- Through graded low-temperature adsorption, the helium purification efficiency and the adsorption cycle stability are improved, the energy consumption is reduced, and an efficient and feasible technical scheme is provided for purification of natural gas crude helium.

Description

TECHNICAL FIELD

[0001] The present application belongs to the technical field of crude helium purification from natural gas, and particularly relates to a crude helium purification device for selective adsorption and impurity removal from natural gas and a working method thereof. BACKGROUND

[0002] Under the background of increasing demand for energy and industrial gases, helium, as a strategic resource with unique physical properties such as ultra-low boiling point, high thermal conductivity, and chemical inertness, is indispensable in high-end fields such as aerospace, low-temperature superconducting, and semiconductor manufacturing. However, the reserves of helium in nature are scarce, and extracting crude helium from natural gas and purifying it has become one of the important ways to obtain helium.

[0003] Currently, the impurity removal and purification technology of crude helium from natural gas mainly includes low-temperature condensation method, pressure swing adsorption method, membrane separation method, etc. Although the low-temperature condensation method can achieve high-purity helium separation, it has huge energy consumption and complex equipment; the pressure swing adsorption method has very high requirements for the performance of the adsorbent, and the efficiency of the adsorption and desorption process is limited; the separation effect of the membrane separation method is limited by the selectivity and permeation flux of the membrane material, which is difficult to meet the demand of large-scale and high-purity helium purification. At the same time, the existing purification device has the problems of insufficient sealing performance leading to gas leakage, single combination mode of low-temperature plate system affecting adsorption efficiency, and large heat conduction loss of connecting parts, which greatly restricts the efficiency and economy of crude helium purification from natural gas.

[0004] Currently, the technical solutions for helium purification include:

[0005] A helium purification system capable of removing hydrogen and neon (CN114988377B). This patent focuses on removing hydrogen and neon impurities from helium. However, this system has the following technical shortcomings: first, the impurity treatment mechanism is single, which is difficult to meet the comprehensive purification demand; second, the process is complex, which leads to high maintenance difficulty and poor deployment flexibility; third, the connection between the refrigerator and the device has serious cold loss and high risk of helium leakage, which greatly affects the system operation stability and helium purity.

[0006] A light-weight adsorption tower resistant to adsorption and desorption, a coating process, a helium purification system, and a method (CN119303406A). This patent focuses on the structural innovation of the adsorption tower and the optimization of the coating process. The adsorption tower is constructed with light-weight materials to reduce transportation and installation costs. A unique coating process is applied to the interior of the adsorption tower, improving the stability of the adsorbent and the tower body. However, this patent does not fully consider the differences in adsorption characteristics of different impurity gases under different temperature and pressure conditions, and lacks efficient selective adsorption strategies for the removal of common impurities such as methane, nitrogen, and hydrogen.

[0007] A system and method for cryogenic separation and purification of crude helium gas (CN118203949A). This patent is mainly based on the principle of low temperature separation. By gradually cooling the crude helium gas, the phase transition difference of different impurity gases at low temperature is used to realize separation. However, this method has huge energy consumption, and puts forward severe challenges to the sealing of equipment in low temperature environment, material performance, etc. At the same time, for some impurity gases with similar boiling points (such as nitrogen and hydrogen), the separation effect is not good, and it is not suitable for natural gas crude helium selective adsorption and impurity purification.

[0008] Therefore, it is of great practical significance to develop a high-efficiency, energy-saving and reliable natural gas crude helium selective adsorption and impurity purification device for improving the purification efficiency of natural gas crude helium and reducing production cost. SUMMARY

[0009] To solve the above technical problems, the present application relates to a natural gas crude helium selective adsorption and impurity purification device and its working method, which aims to realize efficient, energy-saving and stable separation of natural gas multi-component by optimizing the device structure and improving the working process.

[0010] In order to achieve the above purpose, the present application provides the following technical scheme:

[0011] A natural gas crude helium selective adsorption and impurity purification device, comprising a first sealing valve, a first shell, a second sealing valve, a second shell, a third sealing valve, a third shell, a flange for sealing the third shell, a first low temperature plate system, a second low temperature plate system, a third low temperature plate system and a male and female head.

[0012] The specific connection relationship is that the front and rear ends of the first, second and third shells are connected with the first, second and third sealing valves through the flanges respectively, and the rear flange of the third shell is connected with the flange for sealing the third shell. The first, second and third low temperature plate systems are located in the first, second and third shells respectively.

[0013] Further, the first shell, the second shell and the third shell are all provided with a refrigerant inlet, a refrigerant outlet and a regenerative gas outlet. The refrigerant inlet and outlet are both provided with a male and female head.

[0014] Further, the first, second and third sealing valves all comprise an actuator, a valve seat, a valve disc, a first rotating shaft, a second rotating shaft, a fixed cover plate of a first sealing member, a first sealing member, a second sealing member and a fixed cover plate of the second sealing member.

[0015] The specific connection relationship is that the valve disc is located in the valve seat and connected with the first rotating shaft and the second rotating shaft, the actuator is connected with the valve disc through the first rotating shaft, and the first sealing member and the second sealing member are assembled on both sides of the valve disc through the fixed cover plate of the first sealing member and the fixed cover plate of the second sealing member respectively.

[0016] Further, the valve disc has an adjustable rotation range of 0°-90°, and is provided with a bidirectional sealing groove structure. The valve disc is bidirectionally sealed by first and second sealing members.

[0017] Further, the first and second sealing members each have a cross-sectional shape of a curved section connected to a straight section.

[0018] Further, the first, second and third low-temperature plate systems are each composed of a plurality of low-temperature plates combined in a combination of series connection and parallel connection.

[0019] Further, the low-temperature plate is composed of a refrigerant flow channel and a fin. The refrigerant flow channel can have a circular tube shape or other shapes. The fin can have a cuboid shape or other shapes. The surface of the fin is coated with a selective adsorbent.

[0020] Further, the male and female heads include a first pipe of the male head, a second pipe of the male head, a third pipe of the male head, a male head flange, a female head flange, a sealing member between the male head flange and the female head flange, a first pipe of the female head, a second pipe of the female head, a third pipe of the female head, a connecting member between the second pipe and the third pipe of the male head, a heat insulation ring, and a connecting member between the second pipe and the third pipe of the female head.

[0021] The specific connection relationship is as follows: the male head flange is connected to the first pipe and the third pipe of the male head, the male head connecting member is connected to the second pipe and the third pipe of the male head, the connecting member is connected to the heat insulation ring, the female head flange is connected to the first pipe and the second pipe of the female head, the female head connecting member is connected to the second pipe and the third pipe of the female head, the sealing member is located between the male head flange and the female head flange, and the heat insulation ring is in contact with the female head connecting member.

[0022] Further, the third pipe of the male head and the second pipe of the female head each have a rectangular thread shape, but are not limited to a rectangular thread shape. The first pipe of the male head is provided with a male head evacuation port, and the first pipe of the female head is provided with a female head evacuation port.

[0023] A working method of the natural gas crude helium selective adsorption and impurity removal purification device is as follows:

[0024] The natural gas crude helium selective adsorption impurity removal and purification device works first by means of a vacuum pumping device to perform a vacuum pumping operation on the device to remove the original gas inside the device. Then the first, second and third low-temperature plate systems are cooled, and then the first, second and third sealing valves are opened in turn. When the raw gas passes through the primary, secondary and tertiary housings, the low-temperature plate system selectively adsorbs impurities. Then the purified helium is extracted and collected. Then the first, second and third sealing valves are closed in turn, and the first, second and third low-temperature plate systems are heated to regenerate the gas molecules adsorbed on the low-temperature plate system, and the regenerated gas in the primary, secondary and tertiary housings is discharged through the regenerated gas outlet on the housing, and finally the discharged gas is recycled.

[0025] The beneficial effects of the present application are:

[0026] 1. The three-stage gradient low-temperature plate system (80K / 40K / 15K) is used in combination with the surface functionalized adsorbent to realize the stepwise removal of impurity gases such as , , , etc. The helium recovery rate is increased to more than 95%, and the purity is higher than 99.999%.

[0027] 2. The low-temperature plate system uses a combination of series and parallel connection to optimize fluid distribution and heat and mass transfer efficiency. In addition, the combination of the low-temperature plate system and the type of adsorbent on the low-temperature plate surface can be adjusted according to the composition of the raw gas, and is suitable for purification treatment of different gas sources. In addition, through low-temperature adsorption and controllable temperature regeneration, compared with the traditional high-temperature desorption process, the energy consumption can be reduced by 30%~50%.

[0028] 3. The male and female heads use a quick plug-in connection structure to reduce the assembly difficulty of the device. In combination with the heat insulation ring and the rectangular thread design of the pipe cross section, the cold loss is effectively reduced.

[0029] 4. The bidirectional sealing groove and special cross-section sealing element of the sealing valve have a leakage rate of less than under high pressure (maximum 5 MPa) and low temperature (minimum 4.5 K).

[0030] 5. The present application uses modular design to facilitate online maintenance, and a single module can be isolated independently when it fails. In addition, the modular design can flexibly add or reduce processing modules according to the composition of the raw gas, so that the device can be quickly deployed on mobile platforms such as vehicles and skids. BRIEF DESCRIPTION OF DRAWINGS

[0031] Figure 1 is a structural schematic view of a natural gas crude helium selective adsorption impurity removal and purification device;

[0032] Figure 2A cross-sectional structural schematic diagram of a natural gas crude helium selective adsorption and impurity removal purification device;

[0033] Figure 3 A structural schematic diagram of a sealing valve;

[0034] Figure 4 A cross-sectional structural schematic diagram of a sealing valve;

[0035] Figure 5 A Figure 4 A local enlarged view of H of

[0036] Figure 6 A structural schematic diagram of a sealing element of a sealing valve;

[0037] Figure 7 A structural schematic diagram of a low-temperature plate;

[0038] Figure 8 A refrigerant cycle schematic diagram of a low-temperature plate system;

[0039] Figure 9 A cross-sectional structural schematic diagram of a male and female head;

[0040] Figure 10 A working flowchart of a natural gas crude helium selective adsorption and impurity removal purification device.

[0041] The reference signs include:

[0042] 1 is a first sealing valve, 101 is an actuator, 102 is a valve seat, 103 is a valve disc, 104 is a first rotating shaft, 105 is a second rotating shaft, 106 is a fixed cover plate of a first sealing element, 107 is a first sealing element, 108 is a second sealing element, 109 is a fixed cover plate of a second sealing element, 110 is a sealing groove for sealing the first rotating shaft, 111 is a fixed hole, 2 is a first shell, 201 is a refrigerant inlet for cooling a first low-temperature plate system, 202 is a refrigerant outlet for cooling the first low-temperature plate system, 203 is a regenerative gas outlet of the first shell, 204 is a front flange of the first shell, 205 is a rear flange of the first shell, 3 is a second sealing valve, 4 is a second shell, 401 is a refrigerant inlet for cooling a second low-temperature plate system, 402 is a refrigerant outlet for cooling the second low-temperature plate system, 403 is a regenerative gas outlet of the second shell, 404 is a front flange of the second shell, 405 is a rear flange of the second shell, 5 is a third sealing valve, 6 is a third shell, 601 is a refrigerant inlet for cooling a third low-temperature plate system, 602 is a refrigerant outlet for cooling the third low-temperature plate system, 603 is a regenerative gas outlet of the third shell, 604 is a front flange of the third shell, 605 is a rear flange of the third shell, 7 is a flange for sealing the third shell, 8 is a low-temperature plate, 801 is a refrigerant flow channel, 802 is a fin, x1 is a first low-temperature plate system, x2 is a second low-temperature plate system, x3 is a third low-temperature plate system, A is a male and female head, 9 is a first pipe of the male head, 901 is a vacuumizing port of the male head, 10 is a second pipe of the male head, 11 is a male head flange, 12 is a female head flange, 13 is a sealing element of the male head flange and the female head flange, 14 is a first pipe of the female head, 1401 is a vacuumizing port of the female head, 15 is a second pipe of the female head, 16 is a third pipe of the male head, 17 is a male head connecting piece, 18 is a heat insulation ring, 19 is a female head connecting piece, 20 is a third pipe of the female head, L1 is a dehydration and deacidification device, L2 is a cooler, L3 is a buffer tank, L4 is a natural gas crude helium selective adsorption impurity removal and purification device, P1 is a first mechanical pump, P2 is a second mechanical pump, P3 is a third mechanical pump, S1 is a first collecting device, S2 is a second collecting device, S3 is a third collecting device. DETAILED DESCRIPTION

[0043] The application will be described in greater detail below with reference to the drawings and specific embodiments. The following embodiments are only intended to explain the application, and the scope of protection of the application should include the entire content of the claims. Moreover, through the description of the following embodiments, those skilled in the art can fully realize the entire content of the claims of the application.

[0044] EMBODIMENT

[0045] As Figure 1 , 2As shown, the natural gas crude helium selective adsorption and impurity removal device provided by the embodiment mainly comprises three-stage series adsorption units. The first-stage adsorption unit comprises a first sealing valve 1, a first-stage shell 2, and a first low-temperature plate system x1, a second sealing valve 3, a second-stage shell 4, and a second low-temperature plate system x2, and a third sealing valve 5, a third-stage shell 6, and a third low-temperature plate system x3.

[0046] The connection mode of each stage shell is as follows:

[0047] The front end of the first sealing valve 1 is connected with a raw gas inlet pipeline, and the rear end is connected with the front end of the first-stage shell 2 through a flange; the rear end of the first-stage shell 2 is connected with the front end of the second sealing valve 3 through a flange; the rear end of the second sealing valve 3 is connected with the front end of the second-stage shell 4 through a flange; the rear end of the second-stage shell 4 is connected with the front end of the third sealing valve 5 through a flange; the rear end of the third sealing valve 5 is connected with the front end of the third-stage shell 6 through a flange; and the rear end of the third-stage shell 6 is closed through a sealing flange.

[0048] Each stage shell is provided with an independent low-temperature plate system:

[0049] The first-stage shell 2 is provided with the first low-temperature plate system x1; the second-stage shell 4 is provided with the second low-temperature plate system x2; and the third-stage shell 6 is provided with the third low-temperature plate system x3.

[0050] Further, the positions of the flange structure, the refrigeration working medium inlet, and the refrigeration working medium outlet are as shown in Figure 1 Specifically, the positions comprise:

[0051] a refrigeration working medium inlet 201 cooled by the first low-temperature plate system, a refrigeration working medium outlet 202 cooled by the first low-temperature plate system, a regeneration gas outlet 203 of the first-stage shell, a front flange 204 of the first-stage shell, and a rear flange 205 of the first-stage shell;

[0052] a refrigeration working medium inlet 401 cooled by the second low-temperature plate system, a refrigeration working medium outlet 402 cooled by the second low-temperature plate system, a regeneration gas outlet 403 of the second-stage shell, a front flange 404 of the second-stage shell, and a rear flange 405 of the second-stage shell;

[0053] a refrigeration working medium inlet 601 cooled by the third low-temperature plate system, a refrigeration working medium outlet 602 cooled by the third low-temperature plate system, a regeneration gas outlet 603 of the third-stage shell, a front flange 604 of the third-stage shell, a rear flange 605 of the third-stage shell, and a flange 7 for sealing the third-stage shell.

[0054] As shown in Figures 3-6 The sealing valve (for example, the first sealing valve) comprises:

[0055] The actuator 101 is used to drive the valve to open and close, and the rotation range is 0° (closed) to 90° (fully open); the valve seat 102 constitutes the main structure of the valve; the valve disc 103 is installed in the valve seat through the first rotating shaft 104 and the second rotating shaft 105; the first sealing element 107 and the second sealing element 108 are provided with fixing holes 111 and are installed on both sides of the valve disc through the fixed cover plates (the fixed cover plate 106 of the first sealing element and the fixed cover plate 109 of the second sealing element) respectively.

[0056] The low-temperature plate system is arranged in a series-parallel hybrid manner by a plurality of low-temperature plates 8 as shown in Figure 7 、 8 Each low-temperature plate 8 comprises: a refrigeration working medium flow channel 801 made of a copper pipe and through which a refrigerant such as liquid nitrogen or liquid helium flows; and fins 802 made of an aluminum alloy and in the shape of a cuboid and coated with an adsorbent on the surface.

[0057] As shown in Figure 9 , the male and female heads A include a first pipe 9 of the male head, a second pipe 10 of the male head, a third pipe 16 of the male head, a male head flange 11, a female head flange 12, a sealing element 13 between the male head flange and the female head flange, a first pipe 14 of the female head, a second pipe 15 of the female head, a third pipe 20 of the female head, a male head connecting piece 17, a heat insulation ring 18, and a female head connecting piece 10.

[0058] Specific connection relationship: the male head flange 11 is connected with the first pipe 9 of the male head and the third pipe 16 of the male head respectively, the male head connecting piece 17 is connected with the second pipe 10 of the male head and the third pipe 16 of the male head respectively, the male head connecting piece 17 is connected with the heat insulation ring 18, the female head flange 12 is connected with the first pipe 14 of the female head and the second pipe 15 of the female head respectively, the female head connecting piece 19 is connected with the second pipe 15 of the female head and the third pipe 20 of the female head respectively, the sealing element 13 between the male head flange and the female head flange is located between the male head flange 11 and the female head flange 12, and the heat insulation ring 18 is in contact with the female head connecting piece 19. The first pipe 9 of the male head is provided with an evacuation port 901 of the male head, and the first pipe 14 of the female head is provided with an evacuation port 1401 of the female head.

[0059] As shown in Figure 10 , Figure 10 It is a working flow chart of the natural gas crude helium selective adsorption impurity removal and purification device, wherein: L1 is a dehydration and deacidification device, L2 is a cooler, L3 is a buffer tank, L4 is a natural gas crude helium selective adsorption impurity removal and purification device, P1 is a first mechanical pump, P2 is a second mechanical pump, P3 is a third mechanical pump, S1 is a first collection device, S2 is a second collection device, and S3 is a third collection device.

[0060] The device is used for adsorbing methane ( ), nitrogen ( ), and hydrogen ) For example, the low-temperature plate system is specially configured as follows:

[0061] First low-temperature plate system x1: working temperature 70-90 K (preferably 80 K), used for adsorbing methane ( ) ;

[0062] Second low-temperature plate system x2: working temperature 30-45 K (preferably 40 K), used for adsorbing nitrogen ( ) and residual methane ( ) ;

[0063] Third low-temperature plate system x3: working temperature 10-20 K (preferably 15 K), used for deeply adsorbing hydrogen ( ) and residual nitrogen ( ), and outputting high-purity helium.

[0064] Adsorbent configuration:

[0065] The fin 802 surface of the first low-temperature plate system x1 is coated with coconut shell activated carbon adsorbent;

[0066] The fin 802 surface of the second low-temperature plate system x2 is coated with activated carbon-metal organic framework composite adsorbent;

[0067] The fin 802 surface of the third low-temperature plate system x3 is coated with activated carbon-metal organic framework composite adsorbent added with nano copper oxide particles, which deeply removes hydrogen by using the chemical adsorption reaction principle between hydrogen and copper oxide.

[0068] The working method of the natural gas crude helium selective adsorption and impurity removal purification device provided in the embodiment is as follows:

[0069] S1: system preparation stage,

[0070] Pumping to stage high vacuum.

[0071] S2: start the refrigeration system in stages,

[0072] The first stage uses liquid nitrogen refrigeration to reduce the x1 system to 80 K;

[0073] The second stage uses liquid helium refrigeration to reduce the x2 system to 40 K;

[0074] The third stage uses liquid helium refrigeration to reduce the x3 system to 15 K.

[0075] S3: adsorption stage,

[0076] The mixed gas enters the system at a pressure of 0.1-0.3 MPa;

[0077] Primary shell: >99% methane ( ) adsorbed by x1 system;

[0078] Secondary shell: >95% nitrogen ( ) adsorbed by x2 system;

[0079] Tertiary shell: >99% hydrogen ( ) adsorbed by x3 system.

[0080] Purified helium (purity >99.999%) is discharged from the tertiary shell outlet.

[0081] S4: Regeneration phase,

[0082] Regeneration: x1 system is warmed to 320-350 K, collected through primary regeneration gas outlet;

[0083] Regeneration: x2 system is warmed to 100-130 K, collected through secondary regeneration gas outlet;

[0084] Regeneration: x3 system is warmed to 60-80 K, collected through tertiary regeneration gas outlet.

[0085] After regeneration is complete, the cooling-adsorption cycle is repeated.

[0086] The above description is merely that of a specific implementation of the present application, and thus is not intended to limit the scope of the application. Various modifications can be made by those skilled in the art, without departing from the spirit or scope of the application, and the general principles defined herein can be applied to other implementations without departing from the spirit or scope of the application. Accordingly, the present application is not to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A natural gas crude helium selective adsorption and purification device, characterized in that: include: A first sealing valve (1), a first-stage housing (2), a second sealing valve (3), a second-stage housing (4), a third sealing valve (5), and a third-stage housing (6) connected in series in sequence; A flange (7) sealing the rear end of the third stage housing; a first cryopanel system (x1) in the primary housing, a second cryopanel system (x2) in the secondary housing, and a third cryopanel system (x3) in the tertiary housing; Connect the male and female connectors (A) for the refrigerant pipes; Each level of the shell is provided with a refrigerant inlet, a refrigerant outlet and a regeneration gas outlet.

2. The natural gas crude helium selective adsorption and purification device according to claim 1, characterized in that: The first sealing valve, the second sealing valve and the third sealing valve each include: Actuator (101), valve seat (102), valve disc (103), first rotating shaft (104), second rotating shaft (105); The first sealing member (107) is assembled on one side of the valve disc through the fixed cover plate (106), and the second sealing member (108) is assembled on the other side through the fixed cover plate (109); The valve disc (103) has a rotation range of 0°-90° and is provided with a bidirectional sealing groove.

3. The natural gas crude helium selective adsorption and purification device according to claim 2, characterized in that: The cross-sectional shape of the first sealing member (107) and the second sealing member (108) is a curved section connected to a straight section.

4. The natural gas crude helium selective adsorption and purification device according to claim 1, characterized in that: The first cryopanel system (x1), the second cryopanel system (x2) and the third cryopanel system (x3) are all composed of a plurality of cryopanels (8) connected in series and in parallel; The cryopanel is composed of a refrigerant flow channel (801) and fins (802) with an adsorbent coated on the surface.

5. The natural gas crude helium selective adsorption and purification device according to claim 1, characterized in that: The first cryopanel system (x1) operates at 70-90K and is coated with coconut shell activated carbon adsorbent; The second cryopanel system (x2) operates at 30-45K and is coated with activated carbon-metal organic framework composite adsorbent; The third cryopanel system (x3) operates at 10-20K and is coated with an activated carbon composite adsorbent containing nano-copper oxide.

6. The natural gas crude helium selective adsorption and purification device according to claim 1, characterized in that: The male and female connectors (A) include: Male part: male flange (11), male first pipe (9) with evacuation port (901), male second pipe (10), male third pipe (16), connector (17), thermal insulation ring (18); Female part: female flange (12), female first tube (14) with evacuation port (1401), female second tube (15), female third tube (20), connector (19); A sealing member (13) is provided between the male and female flanges, and the heat insulating ring (18) is in contact with the female connector (19).

7. The natural gas crude helium selective adsorption and purification device according to claim 6, characterized in that: The cross-sections of the third tube (16) of the male connector and the second tube (15) of the female connector are both rectangular threaded.

8. The natural gas crude helium selective adsorption and purification device according to claim 1, characterized in that: Under the working conditions of 5MPa high pressure and 4.5K low temperature, the sealing valve leakage rate is ≤ .

9. A working method using the device according to any one of claims 1 to 8, characterized in that: include: Vacuum: Evacuate the device to ; Gradual cooling: The first cryopanel system is cooled to 80K. The second cryopanel system is cooled to 40K. The third cryopanel system is cooled to 15K; Adsorption: Open the valve, the raw gas flows through the three-stage shell in sequence, the impurities are selectively adsorbed, and helium with a purity of ≥99.999% is collected; Regeneration: Close the valve, heat up the cryopanel systems at all levels, and recover the desorbed gas through the regeneration gas outlet.

10. The method according to claim 9, characterized in that Regeneration phase: The first cryopanel system heats up to 320-350K to recover methane. The second cryopanel system heats up to 100-130K to recover nitrogen. The third cryopanel system is heated to 60-80K to recover hydrogen.

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